Suppression device, system, control method, and control device

Abstract

The invention provides a suppression device, a suppression system, a control method and a control device, and relates to the technical field of ion chromatographic analysis. The device comprises a switching valve, a first suppression column, a second suppression column and a liquid supply module, the switching valve is respectively connected with the first suppression column, the second suppression column, the liquid supply module, the chromatographic column module and the conductance cell module; the switching valve is used for switching a first state and a second state; in the first state, the liquid supply module is communicated with the first suppression column, and the chromatographic column module, the second suppression column and the conductance cell module are communicated; in the second state, the liquid supply module is communicated with the second suppression column, and the chromatographic column module, the first suppression column and the conductance cell module are communicated; and the liquid supply module is used for supplying the regeneration liquid of the regeneration liquid supply part or the cleaning liquid of the cleaning liquid supply part to the first inhibition column or the second inhibition column through the switching valve. The suppression device can improve the overall effect of ion detection.

Description

TECHNICAL FIELD

[0001] The application belongs to the technical field of ion chromatography analysis, and particularly relates to an inhibition device, a system, a control method and a control device. BACKGROUND

[0002] At present, in an ion chromatograph, an inhibitor is a crucial component, which mainly functions to significantly improve detection sensitivity by reducing background conductivity. In ion chromatography analysis, an eluent itself is usually a strong electrolyte with high conductivity, which can cover the signal of target ions and reduce detection sensitivity.

[0003] In the related art, a column inhibitor converts high-conductivity substances in an eluent into low-conductivity substances through ion exchange, thereby reducing background conductivity and improving detection signals. However, the inhibition capacity of the column inhibitor will decrease after working for a period of time, resulting in a decrease in the overall effect of detection.

[0004] Therefore, in the related art, the capacity of the column inhibitor decreases, and there is a problem of a decrease in the overall effect of detection, which needs to be further optimized. SUMMARY

[0005] The application aims to solve the above problems in the prior art and provides an inhibition device, a system, a control method and a control device. The inhibition device can be used for ion chromatography detection and regeneration of a column inhibitor at the same time, so that the capacity of the column inhibitor can be maintained, and the overall effect of ion detection can be improved.

[0006] In a first aspect, an embodiment of the application provides an inhibition device, comprising:

[0007] a switching valve, a first inhibition column, a second inhibition column and a liquid supply module;

[0008] The switching valve is connected with the first inhibition column, the second inhibition column, the liquid supply module, a chromatographic column module and a conductivity cell module, respectively;

[0009] The liquid supply module is connected with a regeneration liquid supply part and a cleaning liquid supply part, respectively;

[0010] The switching valve is used for switching between a first state and a second state. In the first state, the liquid supply module is in communication with the first inhibition column, and the chromatographic column module, the second inhibition column and the conductivity cell module are in communication. In the second state, the liquid supply module is in communication with the second inhibition column, and the chromatographic column module, the first inhibition column and the conductivity cell module are in communication;

[0011] The liquid supply module is used for supplying the regeneration liquid of the regeneration liquid supply part or the cleaning liquid of the cleaning liquid supply part to the first inhibition column or the second inhibition column through the switching valve.

[0012] In some embodiments of the first aspect, the liquid supply module comprises a liquid switching module and a peristaltic pump;

[0013] The liquid switching module is connected to the regenerating liquid supply part, the cleaning liquid supply part and one end of the peristaltic pump, respectively;

[0014] The other end of the peristaltic pump is connected to the switching valve;

[0015] The liquid switching module is used to switch the liquid supplied to the first suppression column or the second suppression column through the peristaltic pump and the switching valve; the liquid is the regenerating liquid of the regenerating liquid supply part or the cleaning liquid of the cleaning liquid supply part.

[0016] In some embodiments of the first aspect, the liquid switching module is a two-position three-way valve;

[0017] The first channel of the two-position three-way valve is connected to the regenerating liquid supply part, the second channel is connected to the cleaning liquid supply part, and the third channel is connected to one end of the peristaltic pump;

[0018] The regenerating liquid supply part corresponds to the pickling position of the two-position three-way valve, and the cleaning liquid supply part corresponds to the water washing position of the two-position three-way valve.

[0019] In some embodiments of the first aspect, further comprising: a regenerating liquid recovery module;

[0020] The regenerating liquid recovery module is connected to the switching valve;

[0021] When the switching valve is in the first state, the regenerating liquid recovery module is in communication with the first suppression column;

[0022] When the switching valve is in the second state, the regenerating liquid recovery module is in communication with the second suppression column.

[0023] In some embodiments of the first aspect, the switching valve is a ten-way valve.

[0024] Based on the same inventive concept, the second aspect, the embodiments of the present application also provide a suppression system, comprising a control device and a suppression device according to any one of the first aspect;

[0025] The control device is connected to the suppression device;

[0026] The control device is used to control the switching valve in the suppression device to switch between the first state and the second state, and to control the liquid supply module in the suppression device to supply the regenerating liquid of the regenerating liquid supply part or the cleaning liquid of the cleaning liquid supply part to the first suppression column or the second suppression column.

[0027] In some embodiments of the second aspect, further comprising:

[0028] A chromatographic column module and a conductivity cell module;

[0029] The chromatographic column module is connected with the switching valve in the suppression device;

[0030] The conductivity cell module is connected with the switching valve in the suppression device.

[0031] Based on the same inventive concept, in a third aspect, the embodiments of the present application further provide a control method, based on the suppression system of any one of the second aspect, applied to the control device of any one of the second aspect, the method comprising:

[0032] Determining a target suppression column used for sample injection detection from the first suppression column and the second suppression column in the suppression device;

[0033] Controlling the switching valve to switch to a corresponding state according to the target suppression column, so as to make the chromatographic column module, the target suppression column and the conductivity cell module communicate, and the liquid supply module and another suppression column communicate;

[0034] Controlling the liquid supply module to supply the regeneration liquid of the regeneration liquid supply part to the other suppression column through the switching valve, so as to perform pickling on the other suppression column until the pickling time length reaches a first preset pickling time length threshold;

[0035] Controlling the liquid supply module to supply the cleaning liquid of the cleaning liquid supply part to the other suppression column through the switching valve, so as to perform water washing on the other suppression column until the water washing time length reaches a first preset water washing time length threshold.

[0036] In some embodiments of the third aspect, determining the target suppression column used for sample injection detection from the first suppression column and the second suppression column in the suppression device comprises:

[0037] If the pickling time length of the first suppression column meets the corresponding first preset time length requirement and the water washing time length meets the corresponding second preset time length requirement, the first suppression column is determined as the target suppression column;

[0038] If the pickling time length of the second suppression column meets the corresponding first preset time length requirement and the water washing time length meets the corresponding second preset time length requirement, the second suppression column is determined as the target suppression column.

[0039] In some embodiments of the third aspect, before determining the target suppression column used for sample injection detection from the first suppression column and the second suppression column in the suppression device, the method further comprises:

[0040] Controlling the liquid supply module to supply the regeneration liquid of the regeneration liquid supply part to the current suppression column through the switching valve, so as to perform pickling on the current suppression column until the pickling time length reaches a second preset pickling time length threshold; the current suppression column is the first suppression column or the second suppression column;

[0041] The control liquid supply module supplies the cleaning liquid from the cleaning liquid supply part to the current suppression column through the switching valve to perform water washing on the current suppression column until a water washing time reaches a second preset water washing time threshold.

[0042] The other suppression column other than the current suppression column is taken as a new current suppression column, and the step of controlling the liquid supply module to supply the regeneration liquid from the regeneration liquid supply part to the current suppression column through the switching valve is performed.

[0043] In some embodiments of the third aspect, before determining the target suppression column used for sample injection detection from the first suppression column and the second suppression column in the suppression device, the method further comprises:

[0044] Receiving a preparation sample signal sent by the ion chromatography control system;

[0045] After the first preset waiting time, if an actual sample signal sent by the ion chromatography control system is received, the step of determining the target suppression column used for sample injection detection from the first suppression column and the second suppression column in the suppression device is performed.

[0046] In some embodiments of the third aspect, after the control liquid supply module supplies the cleaning liquid from the cleaning liquid supply part to the other suppression column through the switching valve to perform water washing on the other suppression column until a water washing time reaches a first preset water washing time threshold, the method further comprises:

[0047] After the second preset waiting time, if a new actual sample signal sent by the ion chromatography control system is received, the switching state of the switching valve is controlled to be switched to enable communication among the chromatographic column module, the other suppression column, and the conductivity cell module, and enable communication between the liquid supply module and the target suppression column.

[0048] The control liquid supply module supplies the regeneration liquid from the regeneration liquid supply part to the target suppression column through the switching valve to perform acid washing on the target suppression column until an acid washing time reaches a third preset acid washing time threshold.

[0049] The control liquid supply module supplies the cleaning liquid from the cleaning liquid supply part to the target suppression column through the switching valve to perform water washing on the target suppression column until a water washing time reaches a third preset water washing time threshold.

[0050] Based on the same inventive concept, the fourth aspect, the embodiments of the present application further provide a control device, which is applied to the suppression system of any one of the second aspect and the control device of any one of the second aspect, and the device comprises:

[0051] The determination module is configured to determine the target suppression column used for sample injection detection from the first suppression column and the second suppression column in the suppression device;

[0052] The first control module is configured to control the switching valve to switch to a corresponding state according to the target suppression column, so as to enable the chromatographic column module, the target suppression column and the conductivity cell module to be in communication, and the liquid supply module and another suppression column to be in communication;

[0053] The second control module is configured to control the liquid supply module to supply the regeneration liquid of the regeneration liquid supply part to the another suppression column through the switching valve, so as to perform acid washing on the another suppression column until the acid washing time length reaches a first preset acid washing time length threshold.

[0054] The third control module is configured to control the liquid supply module to supply the cleaning liquid of the cleaning liquid supply part to the another suppression column through the switching valve, so as to perform water washing on the another suppression column until the water washing time length reaches a first preset water washing time length threshold.

[0055] In some embodiments of the fourth aspect, the determination module is specifically configured to:

[0056] If the acid washing time length of the first suppression column meets the corresponding first preset time length requirement and the water washing time length meets the corresponding second preset time length requirement, the first suppression column is determined as the target suppression column.

[0057] If the acid washing time length of the second suppression column meets the corresponding first preset time length requirement and the water washing time length meets the corresponding second preset time length requirement, the second suppression column is determined as the target suppression column.

[0058] In some embodiments of the fourth aspect, the device further comprises:

[0059] The regeneration module is configured to control the liquid supply module to supply the regeneration liquid of the regeneration liquid supply part to the current suppression column through the switching valve, so as to perform acid washing on the current suppression column until the acid washing time length reaches a second preset acid washing time length threshold; the current suppression column is the first suppression column or the second suppression column; control the liquid supply module to supply the cleaning liquid of the cleaning liquid supply part to the current suppression column through the switching valve, so as to perform water washing on the current suppression column until the water washing time length reaches a second preset water washing time length threshold; another suppression column other than the current suppression column among the first suppression column and the second suppression column is taken as a new current suppression column, and the step of controlling the liquid supply module to supply the regeneration liquid of the regeneration liquid supply part to the current suppression column through the switching valve is executed.

[0060] In some embodiments of the fourth aspect, the device further comprises:

[0061] The sample injection judgment module is configured to receive a preparation sample injection signal sent by the ion chromatography control system; after a first preset waiting time length, if an actual sample injection signal sent by the ion chromatography control system is received, the step of determining the target suppression column used for sample injection detection from the first suppression column and the second suppression column in the suppression device is executed.

[0062] In some embodiments of the fourth aspect, the device further comprises:

[0063] The detection module is configured to, after the second preset waiting time, if a new actual injection signal sent by the ion chromatography control system is received, control the switching valve to switch the state so as to make the chromatographic column module, the other suppression column, and the conductivity cell module communicate with each other, and make the liquid supply module and the target suppression column communicate with each other; control the liquid supply module to supply the regeneration liquid of the regeneration liquid supply part to the target suppression column through the switching valve, so as to perform acid washing on the target suppression column until the acid washing time reaches a third preset acid washing time threshold; and control the liquid supply module to supply the cleaning liquid of the cleaning liquid supply part to the target suppression column through the switching valve, so as to perform water washing on the target suppression column until the water washing time reaches a third preset water washing time threshold.

[0064] According to the suppression device, system, control method, and control device provided in the embodiments of the present application, the suppression device comprises a switching valve, a first suppression column, a second suppression column, and a liquid supply module; the switching valve is connected with the first suppression column, the second suppression column, the liquid supply module, a chromatographic column module, and a conductivity cell module; and the liquid supply module is connected with a regeneration liquid supply part and a cleaning liquid supply part. The suppression device provided in the embodiments of the present application switches the first state and the second state through the switching valve. The first state is that the liquid supply module and the first suppression column communicate with each other, and the chromatographic column module, the second suppression column, and the conductivity cell module communicate with each other. The second state is that the liquid supply module and the second suppression column communicate with each other, and the chromatographic column module, the first suppression column, and the conductivity cell module communicate with each other. The liquid supply module supplies the regeneration liquid of the regeneration liquid supply part or the cleaning liquid of the cleaning liquid supply part to the first suppression column or the second suppression column. When injection detection is performed, one of the suppression columns performs ion chromatography detection, and the other suppression column can be regenerated, so that ion chromatography detection and regeneration of the column suppressor can be performed at the same time, the capacity of the column suppressor can be maintained, and the overall effect of ion detection can be improved. BRIEF DESCRIPTION OF DRAWINGS

[0065] Figure 1 FIG. 1 shows a structure schematic diagram of a suppression device provided in an embodiment of the present application;

[0066] Figure 2 FIG. 2 shows another structure schematic diagram of a suppression device provided in an embodiment of the present application;

[0067] Figure 3 FIG. 3 shows a structure schematic diagram of a suppression system provided in an embodiment of the present application;

[0068] Figure 4 FIG. 4 shows a flow schematic diagram of a control method provided in an embodiment of the present application;

[0069] Figure 5 FIG. 5 shows another flow schematic diagram of a control method provided in an embodiment of the present application;

[0070] Figure 6 Another flowchart showing the control method provided by the embodiments of the present application is shown.

[0071] Figure 7 A structure diagram of the control device provided by the embodiments of the present application is shown.

[0072] Symbol explanation:

[0073] 10, switching valve; 21, first suppression column; 23, second suppression column; 30, liquid supply module; 31, liquid switching module; 33, peristaltic pump; 40, chromatographic column module; 50, conductivity cell module; 60, regeneration liquid supply part; 70, cleaning liquid supply part; 80, regeneration liquid recovery module; 100, suppression device; 200, control device. DETAILED DESCRIPTION

[0074] In order for those skilled in the art to better understand the technical solutions of the present application, the present application will be further described in detail below in combination with the drawings and embodiments.

[0075] The features and exemplary embodiments of various aspects of the present application will be described in detail below, and in order to make the purposes, technical solutions and advantages of the present application more clear and apparent, the present application will be further described in detail below in combination with the drawings and specific embodiments. It should be understood that the specific embodiments described herein are only configured to explain the present application and are not configured to limit the present application. The present application can be implemented without some of these specific details for those skilled in the art. The following description of the embodiments is only to provide a better understanding of the present application by showing examples of the present application.

[0076] It should be noted that in this document, relational terms such as first and second and the like are used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any such actual relationship or order between such entities or actions. Moreover, the terms "comprises", "comprising", or any other variations thereof are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but can include other elements not expressly listed or inherent to such process, method, article, or apparatus.

[0077] The capacity of the column suppressor in the related art may be reduced, and there is a problem of overall detection effect reduction, which needs to be further optimized.

[0078] Embodiment 1

[0079] The suppression device provided by the embodiments of the present application can be applied to ion chromatography detection processes in various technical fields, and can also be applied to processes before ion chromatography detection.

[0080] As shown in Figure 1 The suppression device provided by the embodiments of the present application comprises a switching valve 10, a first suppression column 21, a second suppression column 23 and a liquid supply module 30.

[0081] The switching valve 10 is connected with the first suppression column 21, the second suppression column 23, the liquid supply module 30, a chromatographic column module 40 and a conductivity cell module 50 respectively.

[0082] The liquid supply module 30 is connected with a regeneration liquid supply part 60 and a cleaning liquid supply part 70 respectively.

[0083] The switching valve 10 is used to switch between a first state and a second state. In the first state, the liquid supply module 30 is in communication with the first suppression column 21, and the chromatographic column module 40, the second suppression column 23 and the conductivity cell module 50 are in communication. In the second state, the liquid supply module 30 is in communication with the second suppression column 23, and the chromatographic column module 40, the first suppression column 21 and the conductivity cell module 50 are in communication.

[0084] The liquid supply module 30 is used to supply the regeneration liquid of the regeneration liquid supply part 60 or the cleaning liquid of the cleaning liquid supply part 70 to the first suppression column 21 or the second suppression column 23 through the switching valve 10.

[0085] For example, the first suppression column 21 and the second suppression column 23 can be suppression columns of the same type or different types. When the first suppression column 21 performs ion exchange in the sample injection detection process, the second suppression column 23 can perform regeneration treatment, and when the second suppression column 23 performs ion exchange in the sample injection detection process, the first suppression column 21 can perform regeneration treatment, so that the first suppression column 21 and the second suppression column 23 can stably maintain the capacity and avoid the decrease of the detection effect caused by the decrease of the capacity, thereby improving the overall effect of ion detection.

[0086] For example, the liquid supply module 30 is used to provide regeneration and cleaning liquid to the first suppression column 21 and the second suppression column 23, so as to realize the cleaning of the pipeline before sample injection, reduce the possible errors in the test process, and at the same time, maintain the capacity of the first suppression column 21 and the second suppression column 23, thereby providing a basis for sample injection detection.

[0087] The liquid supply module 30 can obtain the corresponding liquid from the regeneration liquid supply part 60 or the cleaning liquid supply part 70 and deliver the liquid to the first suppression column 21 or the second suppression column 23.

[0088] For example, the liquid supply module 30 generally supplies regeneration liquid first and then supplies cleaning liquid.

[0089] For example, in the first state, the liquid supply module 30 is connected to the first suppression column 21, and the first suppression column 21 undergoes regeneration and cleaning. The chromatographic column module 40, the second suppression column 23, and the conductivity cell module 50 are connected, with the second suppression column 23 participating in sample injection and detection. In the second state, the liquid supply module 30 is connected to the second suppression column 23, and the second suppression column 23 undergoes regeneration and cleaning. The chromatographic column module 40, the first suppression column 21, and the conductivity cell module 50 are connected, with the first suppression column 21 participating in sample injection and detection.

[0090] For example, the cleaning fluid supply unit 70 is a key module for system maintenance and performance recovery in ion chromatography detection. Its core function is to remove residual contaminants from the system, prevent component blockage or performance degradation, and ensure the stability and accuracy of long-term analysis.

[0091] For example, the chromatographic column module 40 can separate ions in a mixture based on differences in affinity, according to the interaction between the stationary phase and the mobile phase. The retention time of the target ions can be controlled by adjusting the properties of the stationary phase.

[0092] For example, the conductivity cell module 50 is the core component of the conductivity detector, and its function is to convert the separated ionic components into measurable electrical signals, thereby realizing quantitative and qualitative analysis.

[0093] For example, by cooperating with the switching valve 10, the liquid supply module 30 and the two suppression columns, the regeneration of the first suppression column 21 and the second suppression column 23 can be realized more conveniently, thereby improving the regeneration efficiency and, to a certain extent, the detection efficiency.

[0094] like Figure 2 As shown, in some embodiments, the liquid supply module 30 includes a liquid switching module 31 and a peristaltic pump 33.

[0095] The liquid switching module 31 is connected to the regeneration liquid supply unit 60, the cleaning liquid supply unit 70, and one end of the peristaltic pump 33.

[0096] The other end of the peristaltic pump 33 is connected to the switching valve 10.

[0097] The liquid switching module 31 is used to switch the liquid supplied to the first suppression column 21 or the second suppression column 23 via the peristaltic pump 33 and the switching valve 10. The liquid is either the regeneration liquid from the regeneration liquid supply unit 60 or the cleaning liquid from the cleaning liquid supply unit 70.

[0098] The liquid switching module 31 and the peristaltic pump 33 can supply regeneration liquid or cleaning liquid to the first inhibition column 21 or the second inhibition column 23, providing a basis for the regeneration of the inhibition column.

[0099] The peristaltic pump 33 is used to deliver the eluent or the cleaning liquid to the first column 21 or the second column 23. The liquid switching module 31 is used to select the specific liquid to be delivered.

[0100] The liquid switching module 31 can be a multi-way valve, which is used to select the specific liquid to be delivered.

[0101] In some embodiments, the liquid switching module 31 is a two-position three-way valve.

[0102] The first channel of the two-position three-way valve is connected to the eluent supply 60, the second channel is connected to the cleaning liquid supply 70, and the third channel is connected to one end of the peristaltic pump 33.

[0103] The eluent supply 60 corresponds to the pickling position of the two-position three-way valve, and the cleaning liquid supply 70 corresponds to the water washing position of the two-position three-way valve.

[0104] By using a two-position three-way valve, only one peristaltic pump 33 is used to deliver the eluent or the cleaning liquid to the first column 21 or the second column 23, which reduces the complexity of the structure of the liquid supply module 30 and also reduces the cost of the liquid supply module 30.

[0105] When the two-position three-way valve selects the pickling position, the eluent is obtained and provided to the first column 21 or the second column 23 through the peristaltic pump 33, so as to realize pickling of the first column 21 or the second column 23 and the pipeline. When the two-position three-way valve selects the water washing position, the cleaning liquid is obtained and provided to the first column 21 or the second column 23 through the peristaltic pump 33, so as to realize water washing of the first column 21 or the second column 23 and the pipeline.

[0106] In some embodiments, the liquid supply module 30 further comprises an eluent recovery module 80.

[0107] The eluent recovery module 80 is connected to the switching valve 10.

[0108] When the switching valve 10 is in the first state, the eluent recovery module 80 is in communication with the first column 21.

[0109] When the switching valve 10 is in the second state, the eluent recovery module 80 is in communication with the second column 23.

[0110] The eluent recovery module 80 can automatically recover the eluent, thereby improving the eluent recovery efficiency.

[0111] In some embodiments, the switching valve 10 is a ten-way valve.

[0112] By selecting a ten-way valve as the switching valve, a strategy of using one suppression column for sample injection and another for regeneration can be more applicable, providing the necessary pathway for the aforementioned strategy.

[0113] For example, in a ten-way valve, four channels are used for sample injection and detection, four channels are used for regeneration, and two channels are used for regenerated liquid recovery.

[0114] The regeneration process example of the suppression device provided in this application embodiment can be specifically as follows, wherein the liquid switching module 31 adopts a two-position three-way valve:

[0115] (1) When not performing sample testing, switch valve 10 to the first state and switch the two-position three-way valve to the acid washing position.

[0116] (2) Obtain the running time P1 of the suppression device 100 in the equilibrium state.

[0117] (3) Determine whether the running time P1 in the balanced state has reached the balanced pickling time T1. If P1 < T1, continue pickling. If P1 = T1, switch the two-position three-way valve to the water washing position.

[0118] (4) Determine whether the equilibrium running time P1 after switching to the water washing position has reached the equilibrium water washing time T2. If P1 < T2, continue water washing. If P1 = T2, switch the switching valve 10 to another state and switch the two-position three-way valve to the acid washing position. Repeat steps (3) and (4). If the switching valve 10 is in the first state when step (4) is performed, the other state refers to the second state. If the switching valve 10 is in the second state when step (4) is performed, the other state refers to the first state.

[0119] (5) Determine whether an injection signal has been received. If no injection signal has been received, repeat steps (3) and (4). If an injection signal has been received, proceed to step (6).

[0120] (6) When the injection signal is received, the suppression column connected to the two-position three-way valve is switched to the acid washing position.

[0121] (7) Start the sample injection detection and obtain the running time P2 of the two column suppressors in the sample injection state.

[0122] (8) Determine whether the sample injection running time P2 has reached the sample injection acid washing time T3. If P2 < T3, continue acid washing. If P2 = T3, switch the two-position three-way valve to the water washing position.

[0123] (9) Determine whether the sample injection state running time P2 after entering the water washing position has reached the sample injection water washing time T4. If P2 < T4, continue water washing. If P2 = T4, switch valve 10 to another state and repeat step (5).

[0124] The above-mentioned operation of the suppression device can ensure that the first suppression column 21 and the second suppression column 23 can be sampled at any time, and the column can be regenerated in time to ensure that the suppression device can work continuously online. In addition, the setting of the balance acid washing time, the balance water washing time, the sampling acid washing time and the sampling water washing time can ensure that the column being regenerated in the two-column suppressor can be completely regenerated, thereby improving the accuracy of subsequent detection.

[0125] According to the suppression device provided in the embodiments of the present application, the switching valve 10 is switched between the first state and the second state. In the first state, the liquid supply module 30 is in communication with the first suppression column 21, and the chromatographic column module 40, the second suppression column 23 and the conductivity cell module 50 are in communication. In the second state, the liquid supply module 30 is in communication with the second suppression column 23, and the chromatographic column module 40, the first suppression column 21 and the conductivity cell module 50 are in communication. The liquid supply module 30 supplies the regeneration liquid from the regeneration liquid supply part 60 or the cleaning liquid from the cleaning liquid supply part 70 to the first suppression column 21 or the second suppression column 23. When sampling and detection are performed, one of the suppression columns is subjected to ion chromatography detection, and the other suppression column can be regenerated, so that ion chromatography detection and column suppressor regeneration can be performed simultaneously, thereby maintaining the capacity of the column suppressor and improving the overall effect of ion detection.

[0126] Embodiment 2

[0127] As shown in Figure 3 The suppression system provided in the embodiments of the present application is based on the suppression device provided in Embodiment 1 of the present application.

[0128] The suppression system comprises a control device 200 and the suppression device 100 of Embodiment 1.

[0129] The control device 200 is connected to the suppression device 100.

[0130] The control device 200 is configured to control the switching valve 10 in the suppression device 100 to switch between the first state and the second state, and control the liquid supply module 30 in the suppression device 100 to supply the regeneration liquid from the regeneration liquid supply part 60 or the cleaning liquid from the cleaning liquid supply part 70 to the first suppression column 21 or the second suppression column 23.

[0131] For example, the control device 200 can be a microcontroller, a single-chip microcomputer or other device with a control function.

[0132] The control device 200 can be in communication connection with the switching valve 10 and the liquid supply module 30 in the suppression device 100.

[0133] In some embodiments, the control device 200 further comprises:

[0134] The chromatographic column module 40 and the conductivity cell module 50.

[0135] The chromatographic column module 40 is connected with the switching valve 10 in the suppression device 100.

[0136] The conductivity cell module 50 is connected with the switching valve 10 in the suppression device 100.

[0137] Through the chromatographic column module 40, ions in a mixture can be separated according to the difference in affinity based on the interaction between the stationary phase and the mobile phase, and through the conductivity cell module 50, the separated ion components can be converted into measurable electrical signals, so as to realize quantitative and qualitative analysis.

[0138] The suppression system provided in the embodiment can automatically control the suppression device 100 to perform corresponding sample injection detection and suppression column regeneration through the control device 200, so as to improve the efficiency of sample injection detection and suppression column regeneration. In addition, ion chromatography detection and column suppressor regeneration can be performed at the same time, so as to maintain the capacity of the column suppressor and improve the overall effect of ion detection.

[0139] Embodiment 3

[0140] As shown in Figure 4 The control method provided in the embodiment of the application is applied to the control device 200 based on the suppression system of embodiment 2, and can include steps S401 to S404.

[0141] S401, determining a target suppression column used for sample injection detection from the first suppression column and the second suppression column in the suppression device.

[0142] For example, the way of determining the target suppression column can be to select the first suppression column or the second suppression column that meets the time length requirement of acid washing and water washing, to select the first suppression column or the second suppression column that has just completed acid washing and water washing, or to directly select the suppression column currently connected with the chromatographic column module and the conductivity cell module as the target suppression column.

[0143] In some embodiments, S401 can be specifically as follows:

[0144] If the acid washing time length of the first suppression column meets the corresponding first preset time length requirement and the water washing time length meets the corresponding second preset time length requirement, the first suppression column is determined as the target suppression column.

[0145] If the acid washing time length of the second suppression column meets the corresponding first preset time length requirement and the water washing time length meets the corresponding second preset time length requirement, the second suppression column is determined as the target suppression column.

[0146] For example, the acid washing time meets the first preset time requirement, and the water washing time meets the second preset time requirement, which means that the regeneration of the suppression column and the cleaning of the pipeline meet the actual application requirements, and thus the suppression column meeting the requirements can be used as the target suppression column.

[0147] For example, if the first suppression column and the second suppression column both meet the requirements, the suppression column currently in communication with the chromatographic column module and the conductivity cell module can be used as the target suppression column.

[0148] In some embodiments, before S401, the process further includes a pipeline cleaning and suppression column regeneration process, which is specifically as follows:

[0149] The liquid supply module supplies the regeneration liquid in the regeneration liquid supply part to the current suppression column through the switching valve to perform acid washing on the current suppression column until the acid washing time reaches the second preset acid washing time threshold. The current suppression column is the first suppression column or the second suppression column.

[0150] The liquid supply module supplies the cleaning liquid in the cleaning liquid supply part to the current suppression column through the switching valve to perform water washing on the current suppression column until the water washing time reaches the second preset water washing time threshold.

[0151] Another suppression column other than the current suppression column among the first suppression column and the second suppression column is used as a new current suppression column, and the step of controlling the liquid supply module to supply the regeneration liquid in the regeneration liquid supply part to the current suppression column through the switching valve is performed.

[0152] For example, before sample injection detection, the first suppression column and the second suppression column can be continuously subjected to acid washing and water washing, so as to maintain the capacity of the suppression column and the cleaning of the pipeline.

[0153] The second preset acid washing time threshold can be the same as or less than the first preset acid washing time threshold, for example, can be set to 5 minutes, 10 minutes, etc.

[0154] The second preset water washing time threshold can be the same as or less than the first preset water washing time threshold, for example, can be set to 5 minutes, 10 minutes, etc.

[0155] In some embodiments, before S401, the process further includes a sample injection judgment process, which is specifically as follows:

[0156] A preparation sample signal sent by the ion chromatography control system is received.

[0157] After the first preset waiting time, if an actual sample signal sent by the ion chromatography control system is received, the step of determining the target suppression column used for sample injection detection from the first suppression column and the second suppression column in the suppression device is performed.

[0158] The ion chromatography control system is an overall control of ion chromatography detection. When sample injection detection is performed, the ion chromatography control system sends a control instruction for sample injection detection. The sample generally passes through a sample injection pump, a six-way valve, a chromatographic column, reaches a suppressor, and then flows through a detector for detection. In the suppressor system provided in this embodiment, the sample passes through a sample injection pump, a six-way valve, a chromatographic column module, a switching valve, a target suppressor column, and a conductivity cell module, and then generates an electrical signal of a detection result.

[0159] The first preset waiting time length may be set according to actual application, for example, 1 second, 2 seconds, etc.

[0160] The preparation sample injection signal and the actual sample injection signal sent by the ion chromatography control system can provide time buffer for sample injection detection of the suppressor system, thereby providing a better basis for subsequent sample injection detection.

[0161] The suppressor system may directly perform the step of determining the target suppressor column used for sample injection detection from the first suppressor column and the second suppressor column in the suppressor device within the first preset waiting time length, and directly perform a sample injection detection process after receiving the actual sample injection signal sent by the ion chromatography control system, thereby improving the efficiency of sample injection detection.

[0162] S402, according to the target suppressor column, the switching valve is controlled to switch to a corresponding state to make the chromatographic column module, the target suppressor column, and the conductivity cell module communicate, and the liquid supply module and another suppressor column communicate.

[0163] The corresponding state is the second state if the target suppressor column is the first suppressor column, and the corresponding state is the first state if the target suppressor column is the second suppressor column.

[0164] S403, the liquid supply module is controlled to supply the regeneration liquid of the regeneration liquid supply part to the other suppressor column through the switching valve to perform acid washing on the other suppressor column until the acid washing time length reaches a first preset acid washing time threshold.

[0165] The other suppressor column is the second suppressor column if the target suppressor column is the first suppressor column, and the other suppressor column is the first suppressor column if the target suppressor column is the second suppressor column.

[0166] The first preset acid washing time threshold may be set according to actual application, for example, may be set to 15 minutes, 20 minutes, etc.

[0167] S404, the liquid supply module is controlled to supply the cleaning liquid of the cleaning liquid supply part to the other suppressor column through the switching valve to perform water washing on the other suppressor column until the water washing time length reaches a first preset water washing time threshold.

[0168] Exemplarily, the first preset water washing time threshold value can be set according to actual application, for example, can be set to 20 minutes, 25 minutes, etc.

[0169] In some embodiments, after S404, a new sample injection detection process is further included, and specifically as follows:

[0170] After the second preset waiting time, if a new actual sample injection signal sent by the ion chromatography control system is received, the switching valve is controlled to switch the state, so as to make the chromatographic column module, the other suppression column, and the conductivity cell module communicate, and the liquid supply module and the target suppression column communicate.

[0171] The liquid supply module is controlled to supply the regeneration liquid of the regeneration liquid supply part to the target suppression column through the switching valve, so as to perform acid washing on the target suppression column until the acid washing time reaches a third preset acid washing time threshold value.

[0172] The liquid supply module is controlled to supply the cleaning liquid of the cleaning liquid supply part to the target suppression column through the switching valve, so as to perform water washing on the target suppression column until the water washing time reaches a third preset water washing time threshold value.

[0173] Exemplarily, the second preset waiting time can be set according to actual application, for example, can be set to 10 minutes, 20 minutes, etc. The second preset waiting time is related to the time of the current sample injection detection.

[0174] The third preset acid washing time threshold value can be the same as the second preset acid washing time threshold value and the first preset acid washing time threshold value, or can be different. The third preset acid washing time threshold value can be set to 10 minutes, 15 minutes, etc.

[0175] The third preset water washing time threshold value can be the same as the second preset water washing time threshold value and the first preset water washing time threshold value, or can be different. The third preset water washing time threshold value can be set to 20 minutes, 25 minutes, etc.

[0176] Exemplarily, after the last detection is completed, the switching valve can be directly controlled to switch the state, so as to make the chromatographic column module, the other suppression column, and the conductivity cell module communicate, and the liquid supply module and the target suppression column communicate, to perform pipeline cleaning and suppression column regeneration.

[0177] The control method provided by the embodiment of the application has the beneficial effects and implementation manners of the suppression device provided by the embodiment 1 and the suppression system provided by the embodiment 2. For details, refer to the specific description of the suppression device and the suppression system in the above embodiments 1 and 2. The embodiment will not be described here.

[0178] In order to further describe the control method provided by the embodiment, the following will be described in detail in combination with the drawings.

[0179] AsFigure 5 In the embodiment, the first suppression column is referred to as the first column, the second suppression column is referred to as the second column, and the first suppression column and the second suppression column are collectively referred to as a two-column suppressor. The liquid switching module uses a two-position three-way valve.

[0180] S501, before sample injection detection, switch the two-position three-way valve connected with the first column (current column) to the acid washing position.

[0181] S502, obtain the running time P1 of the two-column suppressor in the equilibrium state.

[0182] S503, determine whether the equilibrium state running time P1 reaches the equilibrium acid washing time T1, if yes, i.e. P1=T1, execute S504, if not, execute S505.

[0183] S504, switch the two-position three-way valve to the water washing position, and execute S506.

[0184] S505, continue acid washing until P1=T1, and execute S504.

[0185] S506, determine whether the equilibrium state running time P1 reaches the equilibrium water washing time T2 after switching to the water washing position, if yes, i.e. P1=T2, execute S507, if not, execute S508.

[0186] S507, switch the switching valve to another state, connect the two-position three-way valve with the second column (another column), and switch the two-position three-way valve to the acid washing position. The second column serves as the new current column.

[0187] S508, continue water washing until P1=T2, and execute S507.

[0188] S509, during the process of S501 to S508, determine whether a sample injection signal is received, if not, execute S503, if yes, execute S510.

[0189] S510, switch the column connected with the two-position three-way valve to the acid washing position when the sample injection signal is received.

[0190] S511, obtain the running time P2 of the two-column suppressor in the sample injection state.

[0191] S512, determine whether the sample injection state running time P2 reaches the sample injection acid washing time T3, if yes, execute S514, if not, execute S513.

[0192] S513, continue acid washing until the sample injection acid washing time T3 is reached, and execute S514.

[0193] S514, switch the two-position three-way valve to the water washing position.

[0194] S515, judging whether the sampling state running time P2 reaches the sampling water washing time T4 after switching into the water washing position, if yes, executing S516, if no, executing S517.

[0195] S516, switching off the column and executing S509.

[0196] S517, continuing water washing until P2 reaches the sampling water washing time T4, executing S516.

[0197] As shown in Figure 6 , further adding a preparation judgment process, as follows:

[0198] S601, before sampling detection, switching the two-position three-way valve connected with the first column (current column) into the acid washing position.

[0199] S602, obtaining the running time P1 of the two-column suppressor in the equilibrium state.

[0200] S603, judging whether the equilibrium state running time P1 reaches the equilibrium acid washing time T1, if yes, i.e. P1=T1, executing S604, if no, executing S605.

[0201] S604, switching the two-position three-way valve into the water washing position, executing S606.

[0202] S605, continuing acid washing until P1=T1, executing S604.

[0203] S606, judging whether the equilibrium state running time P1 reaches the equilibrium water washing time T2 after switching into the water washing position, if yes, i.e. P1=T2, executing S607, if no, executing S608.

[0204] S607, switching the switching valve into another state, connecting the two-position three-way valve with the second column (another column), and switching the two-position three-way valve into the acid washing position. The second column is the new current column.

[0205] S608, continuing water washing until P1=T2, executing S607.

[0206] S609, during the process of S601 to S608, judging whether the preparation sampling signal S1 is received, if no, executing S603, if yes, executing S610.

[0207] S610, judging whether the determination sampling signal S2 is received within the first delay time, if no, executing S603, if yes, executing S611.

[0208] S611, switching the column connected with the two-position three-way valve into the acid washing position when the determination sampling signal is received.

[0209] S612, acquire the running time P2 of the two-column suppressor in the sample injection state.

[0210] S613, determine whether the running time P2 in the sample injection state reaches the sample injection and pickling time T3, if yes, execute S615, if no, execute S614.

[0211] S614, continue pickling until the sample injection and pickling time T3 is reached, and execute S615.

[0212] S615, cut the two-position three-way valve into the water washing position.

[0213] S616, determine whether the running time P2 in the sample injection state reaches the sample injection and water washing time T4 after cutting into the water washing position, if yes, execute S617, if no, execute S618.

[0214] S617, determine whether a sample injection signal S2 is received within the tailing time, if yes, execute S619, if no, execute S603.

[0215] S618, continue water washing until P2 reaches the sample injection and water washing time T4, and execute S617.

[0216] S619, cut the column and execute S610.

[0217] The control method provided in the embodiment can ensure that the two-column suppressor can inject at any time, and the column can be regenerated in time and sufficiently, so that the two-column suppressor can work continuously online, and the balance pickling time, the balance water washing time, and the sample injection and pickling time and the sample injection and water washing time are set, so that the column being regenerated in the two-column suppressor can be completely regenerated, thereby improving the accuracy of subsequent detection.

[0218] In the ion chromatography detection process, switching the suppressor column will cause abnormal peaks to appear on the spectrum, and in the control method provided in the embodiment, the sample injection detection is started after receiving the preparation sample injection signal and the actual sample injection signal, which can avoid abnormal peaks in the detection spectrum and ensure the accuracy of the detection result.

[0219] Embodiment 4

[0220] As shown in Figure 7 The control device 700 provided in the embodiment of the application can include:

[0221] The determination module 701 is configured to determine a target suppression column used for sample injection detection from the first suppression column and the second suppression column in the suppression device.

[0222] The first control module 702 is configured to control the switching valve to switch to a corresponding state according to the target suppression column, so as to enable the communication between the chromatographic column module, the target suppression column and the conductivity cell module, and the communication between the liquid supply module and another suppression column.

[0223] The second control module 703 is configured to control the liquid supply module to supply the regeneration liquid of the regeneration liquid supply part to the another suppression column through the switching valve, so as to perform acid washing on the another suppression column until the acid washing time length reaches a first preset acid washing time length threshold.

[0224] The third control module 704 is configured to control the liquid supply module to supply the cleaning liquid of the cleaning liquid supply part to the another suppression column through the switching valve, so as to perform water washing on the another suppression column until the water washing time length reaches a first preset water washing time length threshold.

[0225] In some embodiments, the determination module 701 is specifically configured to:

[0226] If the acid washing time length of the first suppression column meets the corresponding first preset time length requirement and the water washing time length meets the corresponding second preset time length requirement, the first suppression column is determined as the target suppression column.

[0227] If the acid washing time length of the second suppression column meets the corresponding first preset time length requirement and the water washing time length meets the corresponding second preset time length requirement, the second suppression column is determined as the target suppression column.

[0228] In some embodiments, the control device 700 further comprises:

[0229] The regeneration module is configured to control the liquid supply module to supply the regeneration liquid of the regeneration liquid supply part to the current suppression column through the switching valve, so as to perform acid washing on the current suppression column until the acid washing time length reaches a second preset acid washing time length threshold. The current suppression column is the first suppression column or the second suppression column. The liquid supply module is controlled to supply the cleaning liquid of the cleaning liquid supply part to the current suppression column through the switching valve, so as to perform water washing on the current suppression column until the water washing time length reaches a second preset water washing time length threshold. Another suppression column other than the current suppression column among the first suppression column and the second suppression column is taken as a new current suppression column, and the step of controlling the liquid supply module to supply the regeneration liquid of the regeneration liquid supply part to the current suppression column through the switching valve is executed.

[0230] In some embodiments, the control device 700 further comprises:

[0231] The sample injection judgment module is configured to receive a preparation sample injection signal sent by the ion chromatography control system. After a first preset waiting time length, if an actual sample injection signal sent by the ion chromatography control system is received, the step of determining the target suppression column used for sample injection detection from the first suppression column and the second suppression column in the suppression device is executed.

[0232] In some embodiments, the control device 700 further comprises:

[0233] The detection module is configured to, after the second preset waiting time, if a new actual injection signal sent by the ion chromatography control system is received, control the switching valve to switch the state, so that the chromatographic column module, the other suppression column, and the conductivity cell module are in communication, and the liquid supply module and the target suppression column are in communication. The liquid supply module is controlled to supply the regeneration liquid of the regeneration liquid supply part to the target suppression column through the switching valve, so as to perform acid washing on the target suppression column until the acid washing time reaches a third preset acid washing time threshold. The liquid supply module is controlled to supply the cleaning liquid of the cleaning liquid supply part to the target suppression column through the switching valve, so as to perform water washing on the target suppression column until the water washing time reaches a third preset water washing time threshold.

[0234] The control device provided by the embodiments of the present application has the beneficial effects and implementation manners of the control method provided by the embodiment 3 of the present application, and specific descriptions can be referred to the specific description of the control method in the above-mentioned embodiment 3, which will not be described herein again.

[0235] It can be understood that the above embodiments are only exemplary embodiments adopted for illustrating the principles of the present application, and the present application is not limited thereto. Various modifications and improvements can be made by those skilled in the art without departing from the spirit and essence of the present application, and these modifications and improvements are also regarded as the protection scope of the present application.

Claims

1. A suppression device characterized by, The suppression device comprises: a switching valve, a first suppression column, a second suppression column and a liquid supply module; the switching valve is connected with the first suppression column, the second suppression column, the liquid supply module, the chromatographic column module and the conductivity cell module respectively; the liquid supply module is connected with a regeneration liquid supply part and a cleaning liquid supply part respectively; the switching valve is used to switch between a first state and a second state; in the first state, the liquid supply module is connected with the first suppression column, and the chromatographic column module, the second suppression column and the conductivity cell module are connected with each other; in the second state, the liquid supply module is connected with the second suppression column, and the chromatographic column module, the first suppression column and the conductivity cell module are connected with each other; the liquid supply module is used to supply the regeneration liquid of the regeneration liquid supply part or the cleaning liquid of the cleaning liquid supply part to the first suppression column or the second suppression column through the switching valve.

2. The apparatus of claim 1, wherein, The liquid supply module comprises a liquid switching module and a peristaltic pump; the liquid switching module is connected with the regeneration liquid supply part, the cleaning liquid supply part and one end of the peristaltic pump respectively; the other end of the peristaltic pump is connected with the switching valve; the liquid switching module is used to switch the liquid supplied to the first suppression column or the second suppression column through the peristaltic pump and the switching valve; the liquid is the regeneration liquid of the regeneration liquid supply part or the cleaning liquid of the cleaning liquid supply part.

3. The apparatus of claim 2, wherein, The liquid switching module is a two-position three-way valve; a first channel of the two-position three-way valve is connected with the regeneration liquid supply part, a second channel is connected with the cleaning liquid supply part, and a third channel is connected with one end of the peristaltic pump; the regeneration liquid supply part corresponds to an acid washing position of the two-position three-way valve, and the cleaning liquid supply part corresponds to a water washing position of the two-position three-way valve.

4. The apparatus of claim 1, wherein, Further comprising: a regeneration liquid recovery module; the regeneration liquid recovery module is connected with the switching valve; when the switching valve is in the first state, the regeneration liquid recovery module is connected with the first suppression column; when the switching valve is in the second state, the regeneration liquid recovery module is connected with the second suppression column.

5. The apparatus of claim 1, wherein, The switching valve is a ten-way valve.

6. A suppression system characterized by, The control device comprises a control device and a suppression device according to any one of claims 1 to 5; the control device is connected with the suppression device; the control device is used to control the switching valve in the suppression device to switch between the first state and the second state, and control the liquid supply module in the suppression device to supply the regeneration liquid of the regeneration liquid supply part or the cleaning liquid of the cleaning liquid supply part to the first suppression column or the second suppression column.

7. The system of claim 6, wherein, Further comprising: a chromatographic column module and a conductivity cell module; the chromatographic column module is connected with the switching valve in the suppression device; the conductivity cell module is connected with the switching valve in the suppression device.

8. A control method characterized by, The method is applied to the control device according to claim 6 or 7, and the method comprises: determining a target suppression column used for sample injection detection from the first suppression column and the second suppression column in the suppression device; controlling the switching valve to switch to a corresponding state according to the target suppression column, so as to connect the chromatographic column module, the target suppression column and the conductivity cell module with each other, and connect the liquid supply module with the other suppression column. The control liquid supply module supplies the regeneration liquid of the regeneration liquid supply part to the other suppression column through the switching valve to perform pickling on the other suppression column until the pickling time length reaches a first preset pickling time length threshold value; The control liquid supply module supplies the washing liquid of the washing liquid supply part to the other suppression column through the switching valve to perform water washing on the other suppression column until the water washing time length reaches a first preset water washing time length threshold value.

9. The method of claim 8, wherein, The method further includes: If the pickling time length of the first suppression column meets the corresponding first preset time length requirement and the water washing time length meets the corresponding second preset time length requirement, the first suppression column is determined as the target suppression column; If the pickling time length of the second suppression column meets the corresponding first preset time length requirement and the water washing time length meets the corresponding second preset time length requirement, the second suppression column is determined as the target suppression column.

10. The method of claim 8, wherein, Before determining the target suppression column from the first suppression column and the second suppression column in the suppression device, the method further includes: The control liquid supply module supplies the regeneration liquid of the regeneration liquid supply part to the current suppression column through the switching valve to perform pickling on the current suppression column until the pickling time length reaches a second preset pickling time length threshold value; the current suppression column is the first suppression column or the second suppression column; The control liquid supply module supplies the washing liquid of the washing liquid supply part to the current suppression column through the switching valve to perform water washing on the current suppression column until the water washing time length reaches a second preset water washing time length threshold value; Another suppression column other than the current suppression column among the first suppression column and the second suppression column is taken as a new current suppression column, and the step of supplying the regeneration liquid of the regeneration liquid supply part to the current suppression column through the switching valve by the control liquid supply module is performed.

11. The method of claim 8, wherein, Before determining the target suppression column from the first suppression column and the second suppression column in the suppression device, the method further includes: Receiving a preparation sample signal sent by an ion chromatography control system; After a first preset waiting time length, if an actual sample signal sent by the ion chromatography control system is received, the step of determining the target suppression column from the first suppression column and the second suppression column in the suppression device is performed.

12. The method of claim 8, wherein, After the control liquid supply module supplies the washing liquid of the washing liquid supply part to the other suppression column through the switching valve to perform water washing on the other suppression column until the water washing time length reaches a first preset water washing time length threshold value, the method further includes: After a second preset waiting time length, if a new actual sample signal sent by the ion chromatography control system is received, the switching state of the switching valve is controlled to make the chromatographic column module, the other suppression column, and the conductivity cell module communicate with each other, and the liquid supply module and the target suppression column communicate with each other; The control liquid supply module supplies the regeneration liquid of the regeneration liquid supply part to the target suppression column through the switching valve to perform pickling on the target suppression column until the pickling time length reaches a third preset pickling time length threshold value. The liquid supply module supplies the eluent in the eluent supply part to the target suppression column through the switching valve to perform water washing on the target suppression column until a water washing time reaches a third preset water washing time threshold.

13. A control device characterized by comprising: The control device of claim 6 or 7, wherein the device comprises: a determination module configured to determine a target suppression column used for sample injection detection from among the first suppression column and the second suppression column in the suppression device; a first control module configured to control the switching valve to switch to a corresponding state according to the target suppression column, so that the chromatographic column module, the target suppression column, and the conductivity cell module are in communication, and the liquid supply module is in communication with another suppression column; a second control module configured to control the liquid supply module to supply the regenerant in the regenerant supply part to the another suppression column through the switching valve to perform acid washing on the another suppression column until an acid washing time reaches a first preset acid washing time threshold; a third control module configured to control the liquid supply module to supply the eluent in the eluent supply part to the another suppression column through the switching valve to perform water washing on the another suppression column until a water washing time reaches a first preset water washing time threshold.

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