Photovoltaic support arrangement method, device, equipment and medium

Abstract

The embodiment of the invention provides a photovoltaic support arrangement method and device, equipment and a medium, and relates to the field of photovoltaic technologies. According to the method, after support parameters of photovoltaic supports and topographic data of a to-be-arranged area are obtained, a two-dimensional arrangement scheme is generated through a preset plane arrangement rule according to the support parameters and plane data of the topographic data, and the to-be-adjusted height of a stand column of each photovoltaic support is determined according to the support parameters and slope data of the topographic data; and automatic updating from two-dimensional arrangement to three-dimensional arrangement is realized. Therefore, manual intervention can be greatly reduced, the arrangement efficiency of the photovoltaic supports under the complex terrain can be remarkably improved, unreasonable arrangement caused by human factors can be avoided, it is ensured that the photovoltaic assemblies can still receive light evenly under the complex terrain, shielding is reduced, the overall power generation amount of a photovoltaic power station is guaranteed, and economic benefits are improved.

Description

Technical Field

[0001] This application relates to the field of photovoltaic technology, and in particular to a method, apparatus, equipment and medium for arranging photovoltaic support structures. Background Technology

[0002] In photovoltaic power plants, a reasonable arrangement of photovoltaic support structures can enable photovoltaic modules to receive sunlight as much as possible and evenly, thereby improving the efficiency of converting light energy into electrical energy, and thus increasing the overall power generation of the photovoltaic power plant and improving economic benefits.

[0003] Currently, the arrangement of photovoltaic support structures mainly relies on manual arrangement by relevant technicians, who adjust the position and angle of each photovoltaic support structure one by one based on terrain data and their own experience.

[0004] However, when faced with complex terrain, relying solely on manual arrangement by technical personnel is not only time-consuming but also prone to errors due to human factors, such as some photovoltaic modules being shaded or unevenly receiving sunlight. This can negatively impact the overall power generation of the photovoltaic power station, thereby affecting its economic benefits. Summary of the Invention

[0005] To address the aforementioned issues, this application provides a photovoltaic support arrangement method, apparatus, equipment, and medium that can improve the overall power generation of photovoltaic power plants and enhance economic benefits.

[0006] The embodiments of this application disclose the following technical solutions:

[0007] In a first aspect, this application discloses a method for arranging photovoltaic support structures, the method comprising:

[0008] Obtain the support parameters of the photovoltaic support and the terrain data of the area to be arranged, wherein the terrain data includes planar data and slope data;

[0009] Based on the bracket parameters and the planar data, a two-dimensional layout scheme is generated through planar layout rules, including boundary layout rules, alignment layout rules, slope layout rules, center layout rules, or rectangle copying rules.

[0010] Based on the bracket parameters and the slope data, determine the adjustable height of the column of each photovoltaic bracket in the two-dimensional layout scheme;

[0011] The two-dimensional layout scheme is updated based on the height to be adjusted to obtain the three-dimensional layout scheme.

[0012] Optionally, the two-dimensional layout scheme is generated based on the support parameters and the planar data using boundary layout rules as follows:

[0013] The outer contour of the area to be arranged is determined based on the boundary line coordinates in the planar data;

[0014] Along the X-axis direction of the outer contour, multiple longitudinal arrangement reference lines are generated with the preset arrangement spacing in the bracket parameters as the step size;

[0015] For each of the aforementioned vertical layout baselines, perform the following operations to generate a two-dimensional layout scheme:

[0016] The effective layout range is determined by identifying the set of intersection points between the longitudinal layout baseline and the outer contour.

[0017] Starting from the minimum Y-coordinate point of the effective arrangement interval, a two-dimensional arrangement scheme is generated along the longitudinal arrangement baseline based on the support parameters of the first support.

[0018] Optionally, based on the support parameters and the planar data, the two-dimensional layout scheme of the photovoltaic support is generated according to the slope layout rules as follows:

[0019] The outer contour of the area to be arranged is determined based on the boundary line coordinates in the planar data;

[0020] Based on the slope data, determine the slope boundary line in the area to be arranged;

[0021] Along the X-axis direction of the outer contour, multiple longitudinal arrangement reference lines are generated with the preset arrangement spacing in the bracket parameters as the step size;

[0022] For each of the aforementioned vertical layout baselines, perform the following operations to generate a two-dimensional layout scheme:

[0023] The effective layout interval is determined by identifying the set of intersection points between the longitudinal layout baseline and the slope boundary line;

[0024] Starting from the minimum Y-coordinate point of the effective arrangement interval, a two-dimensional arrangement scheme is generated along the longitudinal arrangement baseline based on the support parameters of the first support.

[0025] Optionally, based on the support parameters and the planar data, the two-dimensional layout scheme of the photovoltaic support is generated according to the center layout rules as follows:

[0026] The outer contour of the area to be arranged is determined based on the boundary line coordinates in the planar data;

[0027] Along the X-axis direction of the outer contour, multiple longitudinal arrangement reference lines are generated with the preset arrangement spacing in the bracket parameters as the step size;

[0028] For each of the aforementioned vertical layout baselines, perform the following operations to generate a two-dimensional layout scheme:

[0029] The effective layout range is determined by identifying the set of intersection points between the longitudinal layout baseline and the outer contour.

[0030] Starting from the average Y-coordinate of the effective arrangement interval, and based on the support parameters of the first support, the first support is symmetrically arranged on both the upper and lower sides of the starting point along the longitudinal arrangement baseline to generate a two-dimensional arrangement scheme.

[0031] Optionally, the method further includes:

[0032] Determine the corner coordinates of each first bracket in the two-dimensional layout scheme of the longitudinal layout baseline;

[0033] If spatial overlap is detected between corner coordinates, a two-dimensional layout scheme is generated along the longitudinal layout baseline, starting from the minimum Y coordinate point of the effective layout interval and based on the support parameters of the second support. The size of the first support is larger than the size of the second support.

[0034] Continue executing the step of determining the corner coordinates of each second bracket in the two-dimensional layout scheme of the longitudinal layout baseline until no spatial overlap between the corner coordinates is detected.

[0035] Optionally, the two-dimensional layout scheme is generated based on the support parameters and the planar data by means of alignment and layout rules as follows:

[0036] The outer contour of the area to be arranged is determined based on the boundary line coordinates in the planar data;

[0037] Along the X-axis direction of the outer contour, multiple longitudinal arrangement reference lines are generated with the preset arrangement spacing in the bracket parameters as the step size;

[0038] For each of the aforementioned vertical layout baselines, perform the following operations to generate a two-dimensional layout scheme:

[0039] The effective layout range is determined by identifying the set of intersection points between the longitudinal layout baseline and the outer contour.

[0040] Starting from the minimum Y-coordinate point of the effective arrangement interval, an initial arrangement scheme is generated along the longitudinal arrangement baseline based on the support parameters of the third support.

[0041] A two-dimensional layout scheme for the longitudinal layout baseline is generated by inserting a fourth support into the gap between two adjacent third supports in the initial layout scheme, wherein the length of the third support is greater than the length of the fourth support.

[0042] Optionally, determining the adjustable height of the column of each photovoltaic support in the two-dimensional layout scheme based on the support parameters and the slope data includes:

[0043] For each photovoltaic support in the two-dimensional layout scheme: if the slope data of the location of the photovoltaic support is greater than the slope threshold, then the height to be adjusted of the column of the photovoltaic support is determined according to the support parameters and the slope data.

[0044] The step of updating the two-dimensional layout scheme according to the height to be adjusted includes:

[0045] If the height to be adjusted is within the height tolerance range of the photovoltaic module's support column, then the two-dimensional layout scheme is updated according to the height to be adjusted.

[0046] Optionally, the method further includes:

[0047] If the height to be adjusted is outside the height tolerance range of the photovoltaic module's support column, then the excavation area and / or filling area are determined based on the slope data of the location, or the photovoltaic module layout at the location is abandoned.

[0048] Optionally, the method for determining the height to be adjusted is as follows:

[0049] By projecting the coordinates of the center point of the photovoltaic module onto a terrain triangulation grid, a target triangle including the center point is determined;

[0050] Obtain the coordinates of the three vertices of the target triangle and their corresponding elevation values;

[0051] Construct the 2x2 affine transformation matrix and offset of the target triangle;

[0052] The difference between the actual coordinates and the offset of the photovoltaic module is converted into a centroid coordinate weighting coefficient through the 2x2 affine transformation matrix. The actual coordinates are obtained through the two-dimensional arrangement scheme.

[0053] Based on the centroid coordinate weighting coefficient, the elevation values ​​corresponding to the coordinates of the three vertices of the target triangle are weighted and averaged to obtain the height to be adjusted.

[0054] Optionally, updating the two-dimensional layout scheme according to the height to be adjusted to obtain the three-dimensional layout scheme includes:

[0055] The two-dimensional layout scheme is updated according to the height to be adjusted to obtain the initial three-dimensional layout scheme;

[0056] In the initial three-dimensional layout scheme, the outer support area located at the edge of the area to be arranged is identified, and the inner support area surrounded by the outer support area is identified.

[0057] By updating the photovoltaic brackets in the outer bracket area according to the first arrangement parameters, and updating the photovoltaic brackets in the inner bracket area according to the second arrangement parameters, a target three-dimensional arrangement scheme is obtained, wherein the arrangement density indicated by the first arrangement parameters is higher than the arrangement density indicated by the second arrangement parameters.

[0058] Secondly, this application provides a photovoltaic support arrangement device, the device comprising: a data acquisition module, a scheme generation module, a height determination module, and a scheme update module;

[0059] The height acquisition module is used to acquire the support parameters of the photovoltaic support and the terrain data of the area to be arranged, the terrain data including planar data and slope data;

[0060] The scheme generation module is used to generate a two-dimensional layout scheme based on the bracket parameters and the planar data through planar layout rules. The planar layout rules include boundary layout rules, alignment layout rules, slope layout rules, center layout rules, or rectangle copying rules.

[0061] The height determination module is used to determine the adjustable height of the column of each photovoltaic support in the two-dimensional layout scheme based on the support parameters and the slope data.

[0062] The scheme update module is used to update the two-dimensional layout scheme according to the height to be adjusted, so as to obtain the three-dimensional layout scheme.

[0063] Optionally, based on the support parameters and the planar data, the unit that generates the two-dimensional layout scheme according to the boundary layout rules is shown below:

[0064] The first generation unit is used to determine the outer contour of the area to be arranged based on the boundary line coordinates in the planar data;

[0065] The second generation unit is used to generate multiple longitudinal arrangement reference lines along the X-axis direction of the outer contour, with the preset arrangement spacing in the bracket parameters as the step size.

[0066] The third generation unit is used to perform the following operations on each of the longitudinal layout baselines to generate a two-dimensional layout scheme: by determining the set of intersection points between the longitudinal layout baseline and the outer contour, an effective layout interval is determined; taking the minimum Y-coordinate point of the effective layout interval as the starting point, a two-dimensional layout scheme is generated along the longitudinal layout baseline according to the support parameters of the first support.

[0067] Optionally, based on the support parameters and the planar data, the following unit generates a two-dimensional layout scheme for the photovoltaic support according to the slope arrangement rules:

[0068] The fourth generation unit is used to determine the outer contour of the area to be arranged based on the boundary line coordinates in the planar data;

[0069] The fifth generation unit is used to determine the slope boundary line in the area to be arranged based on the slope data;

[0070] The sixth generation unit is used to generate multiple longitudinal arrangement reference lines along the X-axis direction of the outer contour, with the preset arrangement spacing in the bracket parameters as the step size;

[0071] The seventh generation unit is used to perform the following operations on each of the longitudinal layout baselines to generate a two-dimensional layout scheme: by determining the set of intersection points of the longitudinal layout baselines and the slope boundary lines, an effective layout interval is determined; taking the minimum Y-coordinate point of the effective layout interval as the starting point, a two-dimensional layout scheme is generated along the longitudinal layout baselines according to the support parameters of the first support.

[0072] Optionally, based on the support parameters and the planar data, the following unit generates a two-dimensional layout scheme for the photovoltaic support according to the center layout rules:

[0073] The eighth generation unit is used to determine the outer contour of the area to be arranged based on the boundary line coordinates in the planar data;

[0074] The ninth generation unit is used to generate multiple longitudinal arrangement reference lines along the X-axis direction of the outer contour, with the preset arrangement spacing in the bracket parameters as the step size;

[0075] The tenth generation unit is used to perform the following operations on each of the longitudinal layout baselines to generate a two-dimensional layout scheme: by determining the set of intersection points between the longitudinal layout baseline and the outer contour, an effective layout interval is determined; taking the average Y-coordinate of the effective layout interval as the starting point, the first support is symmetrically arranged along the longitudinal layout baseline to the upper and lower sides of the starting point according to the support parameters of the first support, thereby generating a two-dimensional layout scheme.

[0076] Optionally, the unit further includes:

[0077] The first detection unit is used to determine the corner coordinates of each first bracket in the two-dimensional layout scheme of the longitudinal layout baseline;

[0078] The second detection unit is used to generate a two-dimensional layout scheme along the longitudinal layout baseline based on the support parameters of the second support, starting from the minimum Y coordinate point of the effective layout interval if spatial overlap is detected between the corner coordinates. The size of the first support is larger than the size of the second support.

[0079] The third detection unit is used to continue executing the step of determining the corner coordinates of each second bracket in the two-dimensional layout scheme of the longitudinal layout baseline until it is detected that there is no spatial overlap between the corner coordinates.

[0080] Optionally, based on the support parameters and the planar data, the unit that generates the two-dimensional layout scheme according to the alignment rules is shown below:

[0081] The eleventh generation unit is used to determine the outer contour of the area to be arranged based on the boundary line coordinates in the planar data.

[0082] The twelfth generation unit is used to generate multiple longitudinal arrangement reference lines along the X-axis direction of the outer contour, with the preset arrangement spacing in the bracket parameters as the step size.

[0083] The thirteenth generation unit is used to perform the following operations on each of the longitudinal layout baselines to generate a two-dimensional layout scheme: determining an effective layout interval by determining the set of intersection points between the longitudinal layout baseline and the outer contour; using the minimum Y-coordinate point of the effective layout interval as the starting point, generating an initial layout scheme along the longitudinal layout baseline according to the support parameters of the third support; and generating a two-dimensional layout scheme for the longitudinal layout baseline by inserting a fourth support into the gap between two adjacent third supports in the initial layout scheme, wherein the length of the third support is greater than the length of the fourth support.

[0084] Optionally, the height determination module is specifically used for: for each photovoltaic support in the two-dimensional layout scheme: if the slope data of the location of the photovoltaic support is greater than the slope threshold, then determine the adjustable height of the column of the photovoltaic support according to the support parameters and the slope data;

[0085] The scheme update module is specifically used to update the two-dimensional layout scheme according to the height to be adjusted if the height to be adjusted is within the height tolerance range of the photovoltaic module's support column.

[0086] Optionally, the scheme update module is further configured to: if the height to be adjusted is outside the height tolerance range of the photovoltaic module's support column, determine the excavation area and / or filling area based on the slope data of the location, or abandon the photovoltaic module layout at the location.

[0087] Optionally, the unit for determining the height to be adjusted is as follows:

[0088] The first determining unit is used to determine a target triangle including the center point by projecting the coordinates of the center point of the photovoltaic module onto a terrain triangular mesh.

[0089] The second determining unit is used to obtain the coordinates of the three vertices of the target triangle and their corresponding elevation values;

[0090] The third determining unit is used to construct the 2x2 affine transformation matrix and offset of the target triangle;

[0091] The fourth determining unit is used to convert the difference between the actual coordinates of the photovoltaic module and the offset into a centroid coordinate weighting coefficient through the 2x2 affine transformation matrix, wherein the actual coordinates are obtained through the two-dimensional arrangement scheme;

[0092] The fifth determining unit is used to perform a weighted average of the elevation values ​​corresponding to the coordinates of the three vertices of the target triangle based on the centroid coordinate weighting coefficient to obtain the height to be adjusted.

[0093] Optionally, the scheme update module is specifically used to: update the two-dimensional layout scheme according to the height to be adjusted to obtain an initial three-dimensional layout scheme; in the initial three-dimensional layout scheme, identify the outer support area located at the edge of the area to be arranged, and the inner support area surrounded by the outer support area; obtain a target three-dimensional layout scheme by updating the photovoltaic supports in the outer support area according to a first layout parameter, and updating the photovoltaic supports in the inner support area according to a second layout parameter, wherein the layout density indicated by the first layout parameter is higher than the layout density indicated by the second layout parameter.

[0094] Thirdly, this application discloses a photovoltaic support arrangement device, the device comprising: a memory and a processor;

[0095] The memory is used to store programs;

[0096] The processor is used to execute the program to implement the various steps of the photovoltaic support arrangement method as described in the first aspect.

[0097] Fourthly, this application discloses a computer-readable medium having a computer program stored thereon, which, when executed by a processor, implements the various steps of the photovoltaic support arrangement method as described in the first aspect.

[0098] Compared with the prior art, this application has the following beneficial effects:

[0099] This application provides a method, apparatus, device, and medium for arranging photovoltaic (PV) brackets. The method includes: acquiring bracket parameters and terrain data of the area to be arranged, the terrain data including planar data and slope data; generating a two-dimensional arrangement scheme based on the bracket parameters and planar data using planar arrangement rules, including boundary arrangement rules, alignment arrangement rules, slope arrangement rules, center arrangement rules, or rectangle replication rules; determining the adjustable height of the columns of each PV bracket in the two-dimensional arrangement scheme based on the bracket parameters and slope data; and updating the two-dimensional arrangement scheme based on the adjustable height to obtain a three-dimensional arrangement scheme. Therefore, the PV bracket arrangement method provided in this application automatically generates a two-dimensional arrangement scheme through preset planar arrangement rules and automatically determines the adjustable height of the columns based on slope data and bracket parameters, achieving automated updating from two-dimensional to three-dimensional arrangement. This not only significantly reduces human intervention and greatly improves the efficiency of photovoltaic support layout in complex terrain, but also avoids unreasonable layout caused by human factors, ensuring that photovoltaic modules can still receive light evenly and reduce shading in complex terrain, thereby guaranteeing the overall power generation of photovoltaic power plants and improving economic benefits. Attached Figure Description

[0100] To more clearly illustrate the technical solutions in the embodiments of this application or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0101] Figure 1 A flowchart illustrating a photovoltaic support arrangement method provided in this application embodiment;

[0102] Figure 2 A schematic diagram of the layout interface of a photovoltaic support provided in an embodiment of this application;

[0103] Figure 3 A schematic diagram of a two-dimensional arrangement scheme provided in an embodiment of this application;

[0104] Figure 4 A schematic diagram illustrating a boundary arrangement rule provided in an embodiment of this application;

[0105] Figure 5 A schematic diagram illustrating a slope arrangement rule provided in an embodiment of this application;

[0106] Figure 6 A schematic diagram illustrating a central arrangement rule provided in an embodiment of this application;

[0107] Figure 7A schematic diagram illustrating an alignment and arrangement rule provided in an embodiment of this application;

[0108] Figure 8 A flowchart illustrating a method for determining the height to be adjusted, as provided in an embodiment of this application;

[0109] Figure 9 A schematic diagram of a three-dimensional arrangement scheme provided in an embodiment of this application;

[0110] Figure 10 A schematic diagram of a photovoltaic power station provided in an embodiment of this application;

[0111] Figure 11 A schematic diagram of a photovoltaic support arrangement device provided in an embodiment of this application;

[0112] Figure 12 This is a schematic diagram of a computer-readable medium provided in an embodiment of this application. Detailed Implementation

[0113] As described above, the arrangement of photovoltaic brackets mainly relies on manual arrangement by relevant technicians. That is, the relevant technicians adjust the position and angle of each photovoltaic bracket one by one based on the terrain data and their own experience.

[0114] However, when faced with complex terrain, relying solely on manual arrangement by technical personnel is not only time-consuming but also prone to errors due to human factors, such as some photovoltaic modules being shaded or unevenly receiving sunlight. This can negatively impact the overall power generation of the photovoltaic power station, thereby affecting its economic benefits.

[0115] Through research, the inventors have proposed a method, device, equipment, and medium for arranging photovoltaic (PV) supports. The PV support arrangement method provided in this application automatically generates a two-dimensional arrangement scheme based on preset planar arrangement rules and automatically determines the adjustable height of the columns based on slope data and support parameters, achieving automated updates from two-dimensional to three-dimensional arrangement. This not only significantly reduces manual intervention and greatly improves the arrangement efficiency of PV supports in complex terrain, but also avoids unreasonable arrangement caused by human factors, ensuring that PV modules can still receive uniform sunlight and reduce shading in complex terrain, thereby guaranteeing the overall power generation of the PV power station and improving economic benefits.

[0116] To enable those skilled in the art to better understand the present application, the technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present application, and not all embodiments. Based on the embodiments in the present application, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the scope of protection of the present application.

[0117] See Figure 1 This figure is a flowchart of a photovoltaic support arrangement method provided in an embodiment of this application. The method is applied to electronic devices and includes:

[0118] S101: Obtain the support parameters of the photovoltaic bracket and the terrain data of the area to be arranged. The terrain data includes planar data and slope data.

[0119] The parameters of a photovoltaic (PV) mounting system determine its layout specifications and performance. These parameters include the mounting system type (horizontal single-axis tracking mounting system or fixed mounting system, 1P single-row vertical module placement / 2P double-row vertical module placement, etc.), module dimensions (length, width, etc.), module power, preset layout spacing, and maximum tracking angle.

[0120] The terrain data for the area to be arranged includes planar data and slope data. Planar data includes boundary line coordinates (X, Y), used to determine the planar layout range of the photovoltaic support structures. Slope data includes slope information, which can be obtained through contour interpolation and used to adjust the height of the photovoltaic support columns.

[0121] See Figure 2 This figure is a schematic diagram of a photovoltaic support layout interface provided in an embodiment of this application. The photovoltaic support layout interface is a user interface (UI) built using PyQt5. In one specific implementation, the user can directly access the interface... Figure 2 The interface shown allows users to manually input the photovoltaic support parameters and terrain data of the area to be arranged. Interface controls (such as input boxes and drop-down menus) receive this data and convert it into an internally calculable numerical type (e.g., converting the component length from a string to a floating-point number). In another specific implementation, the user can first open a folder selection window using QFileDialog.getExistingDirectory and then... Figure 2 The interface shown imports a JSON or TXT file containing the photovoltaic support parameters and the terrain data of the area to be laid out, so that the software can determine the photovoltaic support parameters and the terrain data of the area to be laid out by traversing the data in the JSON or TXT file.

[0122] It should be noted that the photovoltaic support parameters and the terrain data of the area to be arranged can be dynamically adjusted based on user input. For example, the activity-triggered modification function of a QRadioButton can be used to switch the support type (e.g., from 1P to 2P) and update the class attributes. Alternatively, the activity-triggered function of a QCheckBox can be used to modify the logical state of associated attributes (e.g., enabling / disabling a certain type of layout rule). Or, the activity-triggered parameter modification function of a QSpinBox can be used to perform type conversion (e.g., converting integers to floating-point numbers) on the input photovoltaic support parameters and the terrain data of the area to be arranged, and update the class attributes to ensure that the parameters adapt to design requirements in real time.

[0123] S102: Based on the support parameters and planar data, generate a two-dimensional layout scheme through planar layout rules. The planar layout rules include boundary layout rules, alignment layout rules, slope layout rules, center layout rules, or rectangle copying rules.

[0124] See Figure 3 This figure is a schematic diagram of a two-dimensional layout scheme provided in an embodiment of this application. Based on the support parameters and planar data, the two-dimensional layout scheme of the photovoltaic support is automatically drawn in CAD according to the planar layout rules.

[0125] See Figure 4 This figure is a schematic diagram of a boundary layout rule provided in an embodiment of this application. Specifically, the method for generating a two-dimensional layout scheme based on the support parameters and planar data through the boundary layout rule is shown in steps A1-A3 below:

[0126] A1: Determine the outer contour of the area to be arranged based on the boundary line coordinates in the planar data.

[0127] The outer contour of the area to be arranged is usually closed. For example, if the boundary line is composed of coordinates (0,0), (0,50), (100,50), and (100,0), then the outer contour of the area to be arranged is a rectangular area, which limits the arrangement of photovoltaic brackets to not exceed this range.

[0128] A2: Along the X-axis direction of the outer contour, multiple longitudinal layout baselines are generated with the preset layout spacing in the bracket parameters as the step size.

[0129] Starting from the minimum X-coordinate point of the outer contour, iterate to the right with a step size of the preset arrangement spacing (e.g., 5m) in the support parameters to generate at least one longitudinal arrangement baseline (blue dashed line) parallel to the Y-axis. For example, if the X range of the outer contour is 0-100m and the preset spacing is 5m, then 21 baselines will be generated for X=0, 5, 10, ..., 100.

[0130] It is understandable that the maximum X-coordinate of the outer contour can be used as the starting point, and the iteration can be carried out to the left with the preset arrangement spacing in the bracket parameters as the step size. This application does not limit this.

[0131] A3: For each longitudinal layout baseline, perform the following operations to generate a two-dimensional layout scheme: Determine the effective layout interval by determining the set of intersection points between the longitudinal layout baseline and the outer contour; Using the minimum Y-coordinate point of the effective layout interval as the starting point, generate a two-dimensional layout scheme along the longitudinal layout baseline according to the support parameters of the first support.

[0132] First, the effective layout interval (red solid line) is determined by identifying the set of intersection points between each longitudinal layout baseline and the outer contour. For example, if the set of intersection points includes (X1, 10) and (X1, 20), then the effective layout interval is [10, 20], and the photovoltaic support can only be arranged within the interval [10, 20].

[0133] Subsequently, starting from the minimum Y-coordinate point of the effective arrangement interval (e.g., Y=10), the first support is arranged along the longitudinal arrangement baseline in the positive Y-axis direction according to the support parameters of the first support (e.g., the support type of the photovoltaic module, the module length, the preset arrangement spacing, etc.) until the maximum Y-coordinate point of the effective arrangement interval (e.g., Y=20) is reached, or the distance between the maximum Y-coordinate point of the effective arrangement interval and the maximum Y-coordinate point is insufficient to arrange the first support, thus obtaining a two-dimensional arrangement scheme.

[0134] Understandably, boundary layout rules are mainly applied to terrain scenarios where the site boundaries are irregularly shaped, thereby maximizing the use of edge space and improving space utilization.

[0135] See Figure 5 This figure is a schematic diagram of a slope arrangement rule provided in an embodiment of this application. Specifically, based on the support parameters and planar data, the method for generating a two-dimensional arrangement scheme for the photovoltaic support through the slope arrangement rule is shown in steps B1-B4 below:

[0136] B1: Determine the outer contour of the area to be arranged based on the boundary line coordinates in the planar data.

[0137] B2: Based on the slope data, determine the slope boundary line in the area to be arranged.

[0138] Understandably, the placement of photovoltaic (PV) mounting systems is subject to terrain slope requirements. Installing PV systems on slopes that are too steep (e.g., greater than 15°) not only makes the systems prone to collapse but also increases the risk of maintenance. Therefore, slope boundary lines are used to distinguish between "flat areas where PV systems can be safely placed" and "steep slope areas where PV systems cannot be placed." For example, if the slope at the foot of a mountain is 2° and the slope above the mountainside is 20°, then the slope abrupt change line at the mountainside is the slope boundary line, and PV systems can only be placed in the flat area between the foot and the mountainside.

[0139] B3: Along the X-axis direction of the outer contour, multiple longitudinal layout baselines are generated with the preset layout spacing in the bracket parameters as the step size.

[0140] B4: For each longitudinal layout baseline, perform the following operations to generate a two-dimensional layout scheme: Determine the effective layout interval by determining the set of intersection points between the longitudinal layout baseline and the slope boundary line; Using the minimum Y-coordinate point of the effective layout interval as the starting point, generate a two-dimensional layout scheme along the longitudinal layout baseline according to the support parameters of the first support.

[0141] Understandably, slope layout rules are mainly applied to terrain scenarios with varying slopes, such as mountains and hills. By defining safe layout areas through "slope boundary lines," photovoltaic supports are avoided from being placed on steep slopes (to prevent collapse and reduce maintenance risks), while the longitudinal baseline ensures the neatness of the layout, achieving safe and efficient utilization of photovoltaic supports in complex sloping terrain.

[0142] See Figure 6 This figure is a schematic diagram of a central arrangement rule provided in an embodiment of this application. Specifically, based on the support parameters and planar data, the two-dimensional arrangement scheme of the photovoltaic support is generated through the central arrangement rule as shown in steps C1-C3 below:

[0143] C1: Determine the outer contour of the area to be arranged based on the boundary line coordinates in the planar data.

[0144] C2: Along the X-axis direction of the outer contour, multiple longitudinal layout baselines are generated with the preset layout spacing in the bracket parameters as the step size.

[0145] C3: For each longitudinal layout baseline, perform the following operations to generate a two-dimensional layout scheme: Determine the effective layout interval by determining the set of intersection points between the longitudinal layout baseline and the outer contour; Using the average Y-coordinate of the effective layout interval as the starting point, arrange the first support symmetrically on both the upper and lower sides of the starting point along the longitudinal layout baseline according to the support parameters of the first support, thereby generating a two-dimensional layout scheme.

[0146] First, the effective layout range is determined by identifying the set of intersection points between each longitudinal layout baseline and the outer contour. For example, if the set of intersection points includes (X1, 10) and (X1, 20), then the effective layout range is [10, 20], and the photovoltaic support can only be arranged within the range [10, 20].

[0147] Subsequently, taking the average Y-coordinate point of the effective arrangement range (e.g., Y=15) as the starting point, according to the support parameters of the first support (e.g., the support type of photovoltaic module, module length, preset arrangement spacing, etc.), the first support is symmetrically arranged on both the upper and lower sides of the starting point along the longitudinal arrangement baseline until the effective arrangement range is reached, or the remaining space is insufficient to arrange another complete first support, thus obtaining a two-dimensional arrangement scheme.

[0148] Understandably, the central layout rule is mainly applied to terrain scenarios that require maximizing the use of the central area, such as terrain scenarios where the center of the site is flat but the edges are irregular, thereby reducing the space waste caused by the irregular edges and improving space utilization.

[0149] It should be noted that after arranging the first support using boundary layout rules, slope layout rules, or center layout rules to generate a two-dimensional layout scheme, the following steps D1-D3 can still be performed:

[0150] D1: Determine the corner coordinates of each first support in the two-dimensional layout scheme of the longitudinal layout baseline.

[0151] After generating a two-dimensional layout scheme for the first support frame using boundary layout, slope layout, or center layout rules, the coordinates of the four corner points of each first support frame are extracted. The corner point coordinates directly reflect the spatial occupancy range of the photovoltaic support frame in the plane and are the basic data for determining whether different photovoltaic support frames overlap.

[0152] D2: If spatial overlap is detected between corner coordinates, a two-dimensional layout scheme is generated along the longitudinal layout baseline, starting from the minimum Y coordinate point of the effective layout interval and based on the support parameters of the second support. The size of the first support is larger than the size of the second support.

[0153] If, by determining the corner coordinates of the first support, spatial overlap is detected between the corner coordinates (i.e., the areas enclosed by the corner coordinates of any two first supports intersect), then the first support with spatial overlap can be replaced with the second support. The second support is an alternative with a smaller size than the first support, such as a short-row component support.

[0154] D3: Continue executing the steps of determining the corner coordinates of each second support in the two-dimensional layout scheme of the longitudinal layout baseline until no spatial overlap between the corner coordinates is detected.

[0155] Continue performing operations similar to D1, i.e., continue determining the corner coordinates of each second support, and continue performing operations similar to D2, i.e., again checking whether there is spatial overlap between the corner coordinates. If spatial overlap exists, replace the second support with the third support (the third support is an alternative with a smaller size than the second support); continue until all support corner coordinates are found to have no spatial overlap, stop iterating, and output the final two-dimensional layout scheme.

[0156] Therefore, by adopting the strategy of "gradually replacing with smaller brackets", the problem of bracket conflicts in complex terrain or densely arranged scenarios is solved while ensuring space utilization.

[0157] See Figure 7 This figure is a schematic diagram of an alignment and arrangement rule provided in an embodiment of this application. Specifically, based on the support parameters and planar data, the method for generating a two-dimensional arrangement scheme for the photovoltaic support through the alignment and arrangement rule is shown in steps E1-E3 below:

[0158] E1: Determine the outer contour of the area to be arranged based on the boundary line coordinates in the planar data.

[0159] E2: Along the X-axis direction of the outer contour, multiple longitudinal layout baselines are generated with the preset layout spacing in the bracket parameters as the step size.

[0160] E3: For each longitudinal layout baseline, perform the following operations to generate a two-dimensional layout scheme: Determine the effective layout interval by identifying the set of intersection points between the longitudinal layout baseline and the outer contour; Using the minimum Y-coordinate point of the effective layout interval as the starting point, generate an initial layout scheme along the longitudinal layout baseline based on the support parameters of the third support; Generate a two-dimensional layout scheme for the longitudinal layout baseline by inserting a fourth support in the gap between two adjacent third supports in the initial layout scheme, wherein the length of the third support is greater than the length of the fourth support.

[0161] First, the effective layout range is determined by identifying the set of intersection points between each longitudinal layout baseline and the outer contour. For example, if the set of intersection points includes (X1, 10) and (X1, 20), then the effective layout range is [10, 20], and the photovoltaic support can only be arranged within the range [10, 20].

[0162] Next, starting from the minimum Y-coordinate point of the effective arrangement range (e.g., Y=10), based on the support parameters of the third support (e.g., the support type of the photovoltaic module, module length, preset arrangement spacing, etc.), the third support is arranged along the longitudinal arrangement baseline in the positive Y-axis direction until the maximum Y-coordinate point of the effective arrangement range (e.g., Y=20) is reached, or the distance between the maximum Y-coordinate point of the effective arrangement range and the maximum Y-coordinate point is insufficient to arrange the third support, thus obtaining the initial arrangement scheme.

[0163] Subsequently, since the length of the effective arrangement interval is not necessarily an integer multiple of the length of the third support, there may be unused remaining space. Therefore, the gap between two adjacent third supports in the initial arrangement can be detected, and based on the length of the gap, a fourth support with a length shorter than the third support is selected and inserted into the gap until the gap is filled or the remaining space is insufficient to accommodate a fourth support, thus obtaining the final two-dimensional arrangement.

[0164] For example, if the gap between two third supports is S, and the length of the fourth support is l (l < S), then one or more fourth supports can be inserted until the gap S is filled, or the remaining space is insufficient to accommodate a fourth support. In the final generated two-dimensional arrangement, the third supports serve as a reference to ensure overall alignment, and the fourth supports fill the gaps to maximize space utilization.

[0165] Understandably, alignment and arrangement rules are mainly applied to terrain scenarios where the overall neatness of the support structure needs to be ensured (e.g., for ease of construction and maintenance) and where there is irregular remaining space on the site. This allows for both maintaining the neatness of the arrangement and maximizing the use of space, thereby improving land utilization.

[0166] The rectangular copying rule is a set of rules applicable to the rapid replacement or rearrangement of photovoltaic (PV) brackets within a specified rectangular area. First, the rectangular area to be copied is clearly defined. Then, a layout rule matching this rectangular area is determined (including any one of boundary layout rules, alignment layout rules, slope layout rules, or center layout rules), and a two-dimensional layout scheme is determined based on this rule. The rectangular copying rule is suitable for scenarios in PV power plant construction where the original layout of a specific area needs to be adjusted, or for testing different bracket layout schemes on a specific rectangular plot during the design phase. Through a standardized process, it achieves precise bracket placement within a specified area, effectively improving design efficiency and scheme accuracy.

[0167] S103: Based on the support parameters and slope data, determine the adjustable height of the column of each photovoltaic support in the two-dimensional layout scheme.

[0168] The stent parameters include the maximum allowable slope of the stent design (i.e., the slope threshold, such as 3°) and the allowable height adjustment range (i.e., the height tolerance range, ensuring that the adjustment range is within a safe range), etc.

[0169] For each photovoltaic (PV) support in a two-dimensional layout scheme, if the slope data (obtained through contour line difference processing) at the location of the PV support, as determined by the slope judgment function, is greater than the slope threshold, then the height of the PV support's columns needs to be adjusted based on the support parameters and slope data. This will reduce the overall slope of the PV support to within the slope threshold, thereby meeting the installation requirements for structural stability and safe operation and maintenance. For example, if the slope data at the location of the PV support is 5°, while the slope threshold is 3°, then the height of the columns needs to be raised or lowered (e.g., raising the front column and lowering the rear column) to reduce the overall slope of the PV support to within the slope threshold.

[0170] See Figure 8 The figure is a flowchart illustrating a method for determining the height to be adjusted according to an embodiment of this application. This method utilizes the Numba pre-compiled core combined with NumPy and SciPy to achieve high-frequency interpolation calculations. The specific steps are as follows:

[0171] F1: Determine the target triangle including the center point by projecting the coordinates of the center point of the photovoltaic module onto the terrain triangulation mesh.

[0172] If the center point coordinates of the photovoltaic module in the two-dimensional arrangement scheme are (x, y), then the target triangle including (x, y) is determined in the terrain triangulation mesh (an unstructured mesh generated by Delaunay subdivision).

[0173] F2: Get the coordinates of the three vertices of the target triangle and their corresponding elevation values.

[0174] Extract the three-dimensional coordinates (x1, y1, z1), (x2, y2, z2), and (x3, y3, z3) of the three vertices of the target triangle, where z1, z2, and z3 are the elevation values ​​corresponding to the vertex coordinates.

[0175] F3: Construct the 2x2 affine transformation matrix and offset of the target triangle.

[0176] For the target triangle, construct a 2x2 affine transformation matrix (describing the geometric transformation relationship of the triangle) and an offset (the positional deviation of the triangle vertices from the origin) as the basis for subsequent coordinate transformations.

[0177] F4: The difference between the actual coordinates and the offset of the photovoltaic module is converted into a centroid coordinate weighting coefficient through a 2x2 affine transformation matrix. The actual coordinates are obtained through a two-dimensional layout scheme.

[0178] First, calculate the difference between the actual coordinates of the center point of the photovoltaic module (from the two-dimensional layout scheme) and the offset of the target triangle.

[0179] Subsequently, using the affine transformation matrix constructed in step F3, the above coordinate differences are converted into centroid coordinate weight coefficients (a, b, c), where a, b, and c correspond to the weights of the three vertices, and c = 1 - ab, which is used to quantify the relative position of the center point within the target triangle.

[0180] F5: Based on the centroid coordinate weighting coefficient, the elevation values ​​corresponding to the coordinates of the three vertices of the target triangle are weighted and averaged to obtain the height to be adjusted.

[0181] First, using the centroid coordinate weighting coefficients (a, b, c) obtained in step F4, the elevation values ​​of the three vertices of the target triangle obtained in step F2 are weighted and summed (i.e., interpolated elevation = a×z1 + b×z2 + c×z3) to obtain the terrain elevation corresponding to the center point of the photovoltaic module. Then, by comparing this terrain elevation with the slope threshold, the height to be adjusted is determined.

[0182] Understandably, to meet the real-time requirements of high-frequency calculations, the LLVM compiler is used to compile Python code into optimized machine code in real time, improving the efficiency of interpolation calculations and height adjustment, and ensuring rapid response even in complex terrain scenarios.

[0183] S104: Update the two-dimensional layout scheme according to the height to be adjusted to obtain the three-dimensional layout scheme.

[0184] If the height to be adjusted is within the height tolerance range of the photovoltaic module's support column, the two-dimensional layout scheme is updated based on the height to be adjusted to obtain the three-dimensional layout scheme. See also Figure 9 The figure is a schematic diagram of a three-dimensional layout scheme provided in an embodiment of this application. In this scheme, the orderly layout of the two-dimensional stage is maintained, and the height adjustment precisely adapts to the terrain slope, ensuring that the overall slope of the support structure meets the threshold requirements.

[0185] It should be noted that if the height to be adjusted is outside the height tolerance range of the photovoltaic module's support column, that is, the support cannot meet the slope requirements by simply adjusting the column height, then it is necessary to determine the excavation area and / or backfill area based on the slope data of the location, or abandon the photovoltaic module layout at the location.

[0186] Specifically, if the user selects "site leveling," the "excavation area" above the leveling height and / or the "fill area" below the leveling height need to be determined based on the slope data of the location. The site is leveled to adapt the terrain slope to the support requirements, and then the column height is recalculated to generate a three-dimensional layout plan. If the user selects "no site leveling," the photovoltaic module layout at that location is directly abandoned to avoid structural instability (such as support collapse) or maintenance safety risks (such as the dangers of working on steep slopes) due to excessive slope.

[0187] It should also be noted that after executing step S104, an initial three-dimensional layout scheme can be obtained. Subsequently, to consider the regional wind resistance requirements of the overall photovoltaic power station, the following operations can also be performed:

[0188] First, in the initial 3D layout scheme, the outer support area located at the edge of the area to be arranged, and the inner support area surrounded by the outer support area, are identified. The outer support area refers to the set of photovoltaic supports located at the edge of the area to be arranged; this type of area is more significantly affected by natural wind loads. The inner support area refers to the set of photovoltaic supports completely surrounded by the outer support area; this type of area is less directly impacted by external wind loads (the wind load is attenuated after being buffered by the outer photovoltaic supports). Figure 3 As shown in the right figure, the blue and green areas are the outer support area, and the purple area is the inner support area.

[0189] Subsequently, by updating the photovoltaic supports in the outer support area according to the first arrangement parameters, and updating the photovoltaic supports in the inner support area according to the second arrangement parameters, a target three-dimensional arrangement scheme is obtained, wherein the arrangement density indicated by the first arrangement parameters is higher than the arrangement density indicated by the second arrangement parameters.

[0190] For example, the first arrangement parameter can indicate reducing the spacing between supports and increasing the number of columns, because the outer photovoltaic supports directly bear the impact of strong winds, and higher density can enhance the overall rigidity of the area and resist overturning or deformation caused by wind loads. The second arrangement parameter can indicate increasing the spacing between supports and reducing unnecessary columns, because the inner photovoltaic supports are buffered by the outer photovoltaic supports, significantly reducing wind loads, and lower density can optimize land use and reduce material costs while ensuring structural safety. Therefore, the photovoltaic support arrangement method provided in this application embodiment can generate a target three-dimensional arrangement scheme that takes into account both wind resistance safety and economy.

[0191] It should also be noted that after executing step S104, the slope information, centerline height, terrain height, column tolerance, inner and outer perimeter information, and earthwork volume required under site leveling conditions of the photovoltaic support can be output to a preset table based on the 3D layout scheme. The method for saving the earthwork volume required under site leveling conditions is as follows: First, determine the actual height of the column. Second, if the column height is lower than the minimum design requirement (the terrain is too low, requiring backfilling), multiply the difference between "minimum required height - actual height" by twice the base width (covering both sides of the support) and add it to the total backfill area. If the column height is higher than the maximum design requirement (the terrain is too high, requiring excavation to lower it), multiply the difference between "actual height - maximum required height" by twice the base width and add it to the total excavation area. Finally, store the total backfill area and / or the total excavation area in the preset table.

[0192] It should also be noted that after performing step S104, a 3D layout scheme can be drawn in CAD, and different colors can be assigned according to the slope value (e.g., red for steep slope areas and green for gentle slope areas) to obtain a schematic diagram of the photovoltaic power station. See [link to documentation]. Figure 10 This figure is a schematic diagram of a photovoltaic power station provided in an embodiment of this application. The specific method for drawing a photovoltaic power station is as follows:

[0193] The first step is to determine the 3D component panel. The 3D component panel is a rectangular structure. To align it with the terrain's slope, its 3D coordinates need to be reconstructed based on the slope direction. Specifically, first, based on the column coordinates (e.g., the top of the front column A, the top of the rear column B) and the corner information of the original 2D rectangular panel, calculate the direction vector (reflecting the slope direction) of the line connecting points A and B and the actual slope value. Then, redraw the rectangle on the horizontal projection plane, ensuring the long side is parallel to the line connecting A and B, the short side is perpendicular to the long side, and the rectangle's area remains unchanged (to avoid component size distortion). Finally, using the equation of the vertical plane containing the line connecting points A and B (e.g., ax + by + cz + d = 0), project the rectangular frame of the horizontal projection plane onto this 3D plane, and then calculate the Z-coordinate (height) of each corner point. This yields the 3D component panel coordinates adapted to the slope, ensuring precise alignment between the 3D component panel and the top of the columns.

[0194] The second step is to correct the vertical projection of the column and the 3D component panel. To ensure a vertical connection between the top of the column and the component panel, the Z-coordinate of the column's base point needs to be corrected. Specifically, first, the normal vector of the 3D component panel is calculated based on its coordinates, and a point-normal plane equation is established. Then, for the column's base point (whose X and Y coordinates are fixed in the 2D layout), while keeping the X and Y coordinates unchanged, the Z-coordinate of its vertical projection point on the panel plane is calculated by solving the vertical plane equation (e.g., ax + by + cz + d = 0), which is the required height of the column's top, thus ensuring that the column's top accurately falls on the panel plane.

[0195] The third step involves using the calculated 3D coordinates to generate a complete 3D support structure via a CAD drawing interface. Specifically, first, the AddLine function is used to draw a 3D line segment of the column, starting from the column's base point and ending at the corrected panel projection point. Second, the AddFace function connects the four corner points of the 3D component panel to generate a rectangular 3D surface. Then, the AddCircle function is used to draw details such as the fixing ring at the bottom of the column. Finally, different areas of the support structure are colored according to their slope (e.g., red for slopes > 10°, yellow for 5°-10°, and green for < 5°) to visually distinguish slope differences.

[0196] Therefore, by accurately calculating coordinates to match the slope and using CAD to draw the photovoltaic power station, it is ensured that the support structure meets the slope safety requirements (vertical support of columns and panel conformity to the terrain), and an intuitive three-dimensional construction model is provided for engineers, reducing the risk of errors during on-site installation.

[0197] It should also be noted that after executing step S104, the total capacity of the photovoltaic power station can be calculated based on the number of brackets and the power parameters of the components, providing core data for project benefit assessment. Specifically, based on the number of components and the power of a single component (e.g., 550W / component) of each photovoltaic bracket, the capacity of a single bracket is calculated (e.g., a 2P bracket contains 2 components, so the capacity = 2 × 550W), and the data is categorized by bracket type and stored in a capacity list. Subsequently, the CAD's AddTable function is called to generate a statistical table near the site boundary line, writing the capacity of different bracket types, the capacity of each area, and the total capacity of the entire power station (the sum of the capacities of all brackets) into the table, and simultaneously displaying it on the user interface to intuitively present the project's power generation scale.

[0198] In summary, the photovoltaic support arrangement method provided in this application automatically generates a two-dimensional arrangement scheme through preset planar arrangement rules, and automatically determines the adjustable height of the columns based on slope data and support parameters, realizing automated updates from two-dimensional to three-dimensional arrangement. This not only significantly reduces manual intervention and greatly improves the arrangement efficiency of photovoltaic supports in complex terrain, but also avoids unreasonable arrangement caused by human factors, ensuring that photovoltaic modules can still receive uniform sunlight and reduce shading in complex terrain, thereby guaranteeing the overall power generation of the photovoltaic power station and improving economic benefits.

[0199] See Figure 11 The figure is a schematic diagram of a photovoltaic support arrangement device provided in an embodiment of this application. The photovoltaic support arrangement device includes: a data acquisition module 1101, a scheme generation module 1102, a height determination module 1103, and a scheme update module 1104.

[0200] The height acquisition module 1101 is used to acquire the support parameters of the photovoltaic support and the terrain data of the area to be arranged. The terrain data includes planar data and slope data.

[0201] The scheme generation module 1102 is used to generate a two-dimensional layout scheme based on the support parameters and planar data through planar layout rules. The planar layout rules include boundary layout rules, alignment layout rules, slope layout rules, center layout rules, or rectangle copying rules.

[0202] The height determination module 1103 is used to determine the adjustable height of the column of each photovoltaic support in the two-dimensional layout scheme based on the support parameters and slope data.

[0203] The scheme update module 1104 is used to update the two-dimensional layout scheme according to the height to be adjusted, so as to obtain the three-dimensional layout scheme.

[0204] In one specific implementation, the cells for generating a two-dimensional layout scheme based on the support parameters and planar data and boundary layout rules are shown below:

[0205] The first generation unit is used to determine the outer contour of the area to be arranged based on the boundary line coordinates in the planar data;

[0206] The second generation unit is used to generate multiple longitudinal arrangement reference lines along the X-axis direction of the outer contour, with the preset arrangement spacing in the bracket parameters as the step size.

[0207] The third generation unit performs the following operations for each longitudinal layout baseline to generate a two-dimensional layout scheme: by determining the set of intersection points between the longitudinal layout baseline and the outer contour, the effective layout interval is determined; taking the minimum Y-coordinate point of the effective layout interval as the starting point, a two-dimensional layout scheme is generated along the longitudinal layout baseline according to the support parameters of the first support.

[0208] In one specific implementation, based on the support parameters and planar data, and through slope arrangement rules, the unit of the two-dimensional arrangement scheme of the photovoltaic support is generated as shown below:

[0209] The fourth generation unit is used to determine the outer contour of the area to be arranged based on the boundary line coordinates in the planar data;

[0210] The fifth generation unit is used to determine the slope boundary line in the area to be arranged based on the slope data;

[0211] The sixth generation unit is used to generate multiple longitudinal arrangement reference lines along the X-axis direction of the outer contour, with the preset arrangement spacing in the bracket parameters as the step size;

[0212] The seventh generation unit performs the following operations for each longitudinal layout baseline to generate a two-dimensional layout scheme: by determining the set of intersection points between the longitudinal layout baseline and the slope boundary line, the effective layout interval is determined; taking the minimum Y-coordinate point of the effective layout interval as the starting point, a two-dimensional layout scheme is generated along the longitudinal layout baseline according to the support parameters of the first support.

[0213] In one specific implementation, based on the support parameters and planar data, and through the center arrangement rules, the unit of the two-dimensional arrangement scheme of the photovoltaic support is generated as shown below:

[0214] The eighth generation unit is used to determine the outer contour of the area to be arranged based on the boundary line coordinates in the planar data;

[0215] The ninth generation unit is used to generate multiple longitudinal arrangement reference lines along the X-axis direction of the outer contour, with the preset arrangement spacing in the bracket parameters as the step size;

[0216] The tenth generation unit is used to perform the following operations on each longitudinal layout baseline to generate a two-dimensional layout scheme: by determining the set of intersection points between the longitudinal layout baseline and the outer contour, the effective layout interval is determined; taking the average Y-coordinate of the effective layout interval as the starting point, the first support is symmetrically arranged along the longitudinal layout baseline to the upper and lower sides of the starting point according to the support parameters of the first support, thereby generating a two-dimensional layout scheme.

[0217] In one specific implementation, the unit also includes:

[0218] The first detection unit is used to determine the corner coordinates of each first support in the two-dimensional layout scheme of the longitudinal layout baseline;

[0219] The second detection unit is used to generate a two-dimensional layout scheme along the longitudinal layout baseline based on the support parameters of the second support, starting from the minimum Y coordinate point of the effective layout interval if spatial overlap is detected between the corner coordinates. The size of the first support is larger than the size of the second support.

[0220] The third detection unit is used to continue executing the step of determining the corner coordinates of each second bracket in the two-dimensional layout scheme of the longitudinal layout baseline until it is detected that there is no spatial overlap between the corner coordinates.

[0221] In one specific implementation, the cells for generating a two-dimensional layout scheme based on the support parameters and planar data and alignment rules are shown below:

[0222] The eleventh generation unit is used to determine the outer contour of the area to be arranged based on the boundary line coordinates in the planar data;

[0223] The twelfth generation unit is used to generate multiple longitudinal layout baselines along the X-axis direction of the outer contour, with the preset layout spacing in the bracket parameters as the step size.

[0224] The thirteenth generation unit performs the following operations for each longitudinal layout baseline to generate a two-dimensional layout scheme: by determining the set of intersection points between the longitudinal layout baseline and the outer contour, an effective layout interval is determined; starting from the minimum Y-coordinate point of the effective layout interval, an initial layout scheme is generated along the longitudinal layout baseline according to the support parameters of the third support; by inserting a fourth support in the gap between two adjacent third supports in the initial layout scheme, a two-dimensional layout scheme for the longitudinal layout baseline is generated, wherein the length of the third support is greater than the length of the fourth support.

[0225] In one specific implementation, the height determination module 1103 is specifically used for: for each photovoltaic support in the two-dimensional layout scheme: if the slope data of the location of the photovoltaic support is greater than the slope threshold, then the adjustable height of the column of the photovoltaic support is determined according to the support parameters and the slope data;

[0226] The scheme update module 1104 is specifically used to update the two-dimensional layout scheme according to the height to be adjusted if the height to be adjusted is within the height tolerance range of the photovoltaic module's support column.

[0227] In one specific implementation, the scheme update module 1104 is further used to: if the height to be adjusted is outside the height tolerance range of the photovoltaic module's support column, then determine the excavation area and / or filling area based on the slope data of the location, or abandon the photovoltaic module layout at the location.

[0228] In one specific implementation, the unit for determining the height to be adjusted is shown below:

[0229] The first determining unit is used to determine the target triangle including the center point by projecting the coordinates of the center point of the photovoltaic module onto the terrain triangular mesh;

[0230] The second determining unit is used to obtain the coordinates of the three vertices of the target triangle and their corresponding elevation values;

[0231] The third determining unit is used to construct the 2x2 affine transformation matrix and offset of the target triangle;

[0232] The fourth determining unit is used to convert the difference between the actual coordinates and the offset of the photovoltaic module into a centroid coordinate weighting coefficient through a 2x2 affine transformation matrix. The actual coordinates are obtained through a two-dimensional layout scheme.

[0233] The fifth determining unit is used to perform a weighted average of the elevation values ​​corresponding to the coordinates of the three vertices of the target triangle based on the centroid coordinate weighting coefficient, so as to obtain the height to be adjusted.

[0234] In one specific implementation, the scheme update module 1104 is specifically used to: update the two-dimensional layout scheme according to the height to be adjusted to obtain an initial three-dimensional layout scheme; in the initial three-dimensional layout scheme, identify the outer support area located at the edge of the area to be arranged, and the inner support area surrounded by the outer support area; obtain the target three-dimensional layout scheme by updating the photovoltaic supports in the outer support area according to the first layout parameters, and updating the photovoltaic supports in the inner support area according to the second layout parameters, wherein the layout density indicated by the first layout parameters is higher than the layout density indicated by the second layout parameters.

[0235] In summary, the photovoltaic support arrangement device provided in this application automatically generates a two-dimensional arrangement scheme based on preset planar arrangement rules, and automatically determines the adjustable height of the columns based on slope data and support parameters, realizing automated updates from two-dimensional to three-dimensional arrangement. This not only significantly reduces manual intervention and greatly improves the arrangement efficiency of photovoltaic supports in complex terrain, but also avoids unreasonable arrangement caused by human factors, ensuring that photovoltaic modules can still receive uniform sunlight and reduce shading in complex terrain, thereby guaranteeing the overall power generation of the photovoltaic power station and improving economic benefits.

[0236] This application also provides corresponding photovoltaic support arrangement equipment and computer-readable medium for implementing the photovoltaic support arrangement method provided in this application.

[0237] The photovoltaic support arrangement device includes a memory and a processor. The memory is used to store instructions or code, and the processor is used to execute the instructions or code so that the device performs a photovoltaic support arrangement method according to any embodiment of this application.

[0238] See Figure 12 This figure is a schematic diagram of a computer-readable medium provided in an embodiment of this application. The computer-readable medium 1200 stores a computer program 1211, which, when executed by a processor, implements the above-described... Figure 1 The steps of photovoltaic bracket arrangement method.

[0239] It should be noted that, in the context of this application, a machine-readable medium can be a tangible medium that may contain or store a program for use by or in conjunction with an instruction execution system, apparatus, or device. A machine-readable medium can be a machine-readable signal medium or a machine-readable storage medium. Machine-readable media can be, but is not limited to, electronic, magnetic, optical, electromagnetic, infrared, or semiconductor systems, apparatus, or devices, or any suitable combination of the foregoing. More specific examples of machine-readable storage media include electrical connections based on one or more wires, portable computer disks, hard disks, random access memory (RAM), read-only memory (ROM), erasable programmable read-only memory (EPROM or flash memory), optical fibers, portable compact disk read-only memory (CD-ROM), optical storage devices, magnetic storage devices, or any suitable combination of the foregoing.

[0240] It should be noted that the machine-readable medium described above in this application can be a computer-readable signal medium or a computer-readable storage medium, or any combination of the two. A computer-readable storage medium can be, for example,—but not limited to—an electrical, magnetic, optical, electromagnetic, infrared, or semiconductor system, apparatus, or device, or any combination thereof. More specific examples of a computer-readable storage medium may include, but are not limited to: an electrical connection having one or more wires, a portable computer disk, a hard disk, random access memory (RAM), read-only memory (ROM), erasable programmable read-only memory (EPROM or flash memory), optical fiber, portable compact disk read-only memory (CD-ROM), optical storage device, magnetic storage device, or any suitable combination thereof. In this application, a computer-readable storage medium can be any tangible medium containing or storing a program that can be used by or in conjunction with an instruction execution system, apparatus, or device. In this application, a computer-readable signal medium can include a data signal propagated in baseband or as part of a carrier wave, carrying computer-readable program code. Such propagated data signals can take various forms, including but not limited to electromagnetic signals, optical signals, or any suitable combination thereof. A computer-readable signal medium can be any computer-readable medium other than a computer-readable storage medium, which can send, propagate, or transmit a program for use by or in connection with an instruction execution system, apparatus, or device. The program code contained on the computer-readable medium can be transmitted using any suitable medium, including but not limited to: wires, optical fibers, RF (radio frequency), etc., or any suitable combination thereof.

[0241] The aforementioned computer-readable medium may be included in the aforementioned electronic device; or it may exist independently and not assembled into the electronic device.

[0242] Although the subject matter has been described using language specific to structural features and / or methodological logic, it should be understood that the subject matter defined in the appended claims is not necessarily limited to the specific features or actions described above. Rather, the specific features and actions described above are merely illustrative examples of implementing the claims.

[0243] While several specific implementation details are included in the foregoing discussion, these should not be construed as limiting the scope of this application. Certain features described in the context of individual embodiments may also be implemented in combination in a single embodiment. Conversely, various features described in the context of a single embodiment may also be implemented individually or in any suitable sub-combination in multiple embodiments.

[0244] The above description is merely a preferred embodiment of this application and an explanation of the technical principles employed. Those skilled in the art should understand that the scope of disclosure in this application is not limited to technical solutions formed by specific combinations of the above-described technical features, but should also cover other technical solutions formed by arbitrary combinations of the above-described technical features or their equivalents without departing from the above-described concept. For example, technical solutions formed by substituting the above features with (but not limited to) technical features with similar functions disclosed in this application.

Claims

1. A method for arranging photovoltaic support structures, characterized in that, The method includes: Obtain the support parameters of the photovoltaic bracket and the terrain data of the area to be arranged, wherein the terrain data includes planar data and slope data; Based on the bracket parameters and the planar data, a two-dimensional layout scheme is generated through planar layout rules, including boundary layout rules, alignment layout rules, slope layout rules, center layout rules, or rectangle copying rules. Based on the bracket parameters and the slope data, determine the adjustable height of the column of each photovoltaic bracket in the two-dimensional layout scheme; The two-dimensional layout scheme is updated based on the height to be adjusted to obtain the three-dimensional layout scheme.

2. The method according to claim 1, characterized in that, Based on the support parameters and the planar data, the method for generating a two-dimensional layout scheme using boundary layout rules is as follows: The outer contour of the area to be arranged is determined based on the boundary line coordinates in the planar data; Along the X-axis direction of the outer contour, multiple longitudinal arrangement reference lines are generated with the preset arrangement spacing in the bracket parameters as the step size; For each of the aforementioned vertical layout baselines, perform the following operations to generate a two-dimensional layout scheme: The effective layout range is determined by identifying the set of intersection points between the longitudinal layout baseline and the outer contour. Starting from the minimum Y-coordinate point of the effective arrangement interval, a two-dimensional arrangement scheme is generated along the longitudinal arrangement baseline based on the support parameters of the first support.

3. The method according to claim 1, characterized in that, Based on the support parameters and the planar data, the two-dimensional layout scheme of the photovoltaic support is generated according to the slope arrangement rules as follows: The outer contour of the area to be arranged is determined based on the boundary line coordinates in the planar data; Based on the slope data, determine the slope boundary line in the area to be arranged; Along the X-axis direction of the outer contour, multiple longitudinal arrangement reference lines are generated with the preset arrangement spacing in the bracket parameters as the step size; For each of the aforementioned vertical layout baselines, perform the following operations to generate a two-dimensional layout scheme: The effective layout interval is determined by identifying the set of intersection points between the longitudinal layout baseline and the slope boundary line. Starting from the minimum Y-coordinate point of the effective arrangement interval, a two-dimensional arrangement scheme is generated along the longitudinal arrangement baseline based on the support parameters of the first support.

4. The method according to claim 1, characterized in that, Based on the bracket parameters and the planar data, the two-dimensional layout scheme of the photovoltaic bracket is generated according to the center layout rules as follows: The outer contour of the area to be arranged is determined based on the boundary line coordinates in the planar data; Along the X-axis direction of the outer contour, multiple longitudinal arrangement reference lines are generated with the preset arrangement spacing in the bracket parameters as the step size; For each of the aforementioned vertical layout baselines, perform the following operations to generate a two-dimensional layout scheme: The effective layout range is determined by identifying the set of intersection points between the longitudinal layout baseline and the outer contour. Starting from the average Y-coordinate of the effective arrangement interval, and based on the support parameters of the first support, the first support is symmetrically arranged on both the upper and lower sides of the starting point along the longitudinal arrangement baseline to generate a two-dimensional arrangement scheme.

5. The method according to any one of claims 2-4, characterized in that, The method further includes: Determine the corner coordinates of each first bracket in the two-dimensional layout scheme of the longitudinal layout baseline; If spatial overlap is detected between corner coordinates, a two-dimensional layout scheme is generated along the longitudinal layout baseline, starting from the minimum Y coordinate point of the effective layout interval and based on the support parameters of the second support. The size of the first support is larger than the size of the second support. Continue executing the step of determining the corner coordinates of each second bracket in the two-dimensional layout scheme of the longitudinal layout baseline until no spatial overlap between the corner coordinates is detected.

6. The method according to claim 1, characterized in that, Based on the bracket parameters and the planar data, the method for generating a two-dimensional layout scheme using alignment rules is as follows: The outer contour of the area to be arranged is determined based on the boundary line coordinates in the planar data; Along the X-axis direction of the outer contour, multiple longitudinal arrangement reference lines are generated with the preset arrangement spacing in the bracket parameters as the step size; For each of the aforementioned vertical layout baselines, perform the following operations to generate a two-dimensional layout scheme: The effective layout range is determined by identifying the set of intersection points between the longitudinal layout baseline and the outer contour. Starting from the minimum Y-coordinate point of the effective arrangement interval, an initial arrangement scheme is generated along the longitudinal arrangement baseline based on the support parameters of the third support. A two-dimensional layout scheme for the longitudinal layout baseline is generated by inserting a fourth support into the gap between two adjacent third supports in the initial layout scheme, wherein the length of the third support is greater than the length of the fourth support.

7. The method according to claim 1, characterized in that, The step of determining the adjustable height of the column of each photovoltaic support in the two-dimensional layout scheme based on the support parameters and the slope data includes: For each photovoltaic support in the two-dimensional layout scheme: if the slope data of the location of the photovoltaic support is greater than the slope threshold, then the height to be adjusted of the column of the photovoltaic support is determined according to the support parameters and the slope data. The step of updating the two-dimensional layout scheme according to the height to be adjusted includes: If the height to be adjusted is within the height tolerance range of the photovoltaic module's support column, then the two-dimensional layout scheme is updated according to the height to be adjusted.

8. The method according to claim 7, characterized in that, The method further includes: If the height to be adjusted is outside the height tolerance range of the photovoltaic module's support column, then the excavation area and / or filling area are determined based on the slope data of the location, or the photovoltaic module layout at the location is abandoned.

9. The method according to claim 7, characterized in that, The method for determining the height to be adjusted is as follows: By projecting the coordinates of the center point of the photovoltaic module onto a terrain triangulation grid, a target triangle including the center point is determined; Obtain the coordinates of the three vertices of the target triangle and their corresponding elevation values; Construct the 2x2 affine transformation matrix and offset of the target triangle; The difference between the actual coordinates and the offset of the photovoltaic module is converted into a centroid coordinate weighting coefficient through the 2x2 affine transformation matrix. The actual coordinates are obtained through the two-dimensional arrangement scheme. Based on the centroid coordinate weighting coefficient, the elevation values ​​corresponding to the coordinates of the three vertices of the target triangle are weighted and averaged to obtain the height to be adjusted.

10. The method according to claim 1, characterized in that, The step of updating the two-dimensional layout scheme according to the height to be adjusted to obtain the three-dimensional layout scheme includes: The two-dimensional layout scheme is updated according to the height to be adjusted to obtain the initial three-dimensional layout scheme; In the initial three-dimensional layout scheme, the outer support area located at the edge of the area to be arranged is identified, and the inner support area surrounded by the outer support area is identified. By updating the photovoltaic brackets in the outer bracket area according to the first arrangement parameters, and updating the photovoltaic brackets in the inner bracket area according to the second arrangement parameters, a target three-dimensional arrangement scheme is obtained, wherein the arrangement density indicated by the first arrangement parameters is higher than the arrangement density indicated by the second arrangement parameters.

11. A photovoltaic support arrangement device, characterized in that, The device includes: a data acquisition module, a scheme generation module, an altitude determination module, and a scheme update module; The height acquisition module is used to acquire the support parameters of the photovoltaic support and the terrain data of the area to be arranged, the terrain data including planar data and slope data; The scheme generation module is used to generate a two-dimensional layout scheme based on the bracket parameters and the planar data through planar layout rules. The planar layout rules include boundary layout rules, alignment layout rules, slope layout rules, center layout rules, or rectangle copying rules. The height determination module is used to determine the adjustable height of the column of each photovoltaic support in the two-dimensional layout scheme based on the support parameters and the slope data. The scheme update module is used to update the two-dimensional layout scheme according to the height to be adjusted, so as to obtain a three-dimensional layout scheme.

12. A photovoltaic support arrangement device, characterized in that, The device includes: a memory and a processor; The memory is used to store programs; The processor is used to execute the program to implement each step of the photovoltaic support arrangement method as described in any one of claims 1 to 10.

13. A computer-readable medium having a computer program stored thereon, characterized in that, When the computer program is executed by the processor, it implements each step of the photovoltaic support arrangement method as described in any one of claims 1 to 10.

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