A power supply system for an ion implanter

Abstract

The application provides a power supply system of an ion implanter, and relates to the technical field of power supply control. In the application, a main power distribution device is used to output a first power supply voltage for an ion source module of the ion implanter and output a second power supply voltage for an ion beam transmission module of the ion implanter; a voltage stabilizing device is used to output a first stable voltage and a second stable voltage based on the first power supply voltage and the second power supply voltage, and transmit the first stable voltage and the second stable voltage to the main power distribution device; a first isolation transformer device is used to output a third stable voltage based on the first stable voltage, so that a first slave power distribution device performs voltage stabilizing power supply on the ion source module based on the third stable voltage; and a second isolation transformer device is used to output a fourth stable voltage based on the second stable voltage, so that a second slave power distribution device performs voltage stabilizing power supply on the ion beam transmission module based on the fourth stable voltage. In this way, the influence of voltage fluctuation on an isolation transformer used by the ion implanter is improved.

Description

Technical Field

[0001] This application relates to the field of power supply control technology, and in particular to a power supply system for an ion implanter. Background Technology

[0002] Ion implanters are critical equipment in semiconductor manufacturing processes, and fluctuations in the output voltage of their power supply system directly affect the semiconductor doping depth and concentration distribution, thereby impacting the performance and stability of the final semiconductor product. Voltage fluctuations typically refer to sudden changes in the output voltage of the power supply system, either instantaneously or over a short period, caused by load variations or unstable output from power distribution devices (e.g., distribution cabinets).

[0003] Due to voltage fluctuations in the power supply system, the isolation transformers used in ion implanters (such as source region isolation transformers and bundle region isolation transformers) may trip, which can severely affect the normal operation of the ion implanter. Therefore, how to mitigate the impact of voltage fluctuations on the isolation transformers used in ion implanters is a pressing issue that needs to be addressed. Summary of the Invention

[0004] This application provides a power supply system for an ion implanter to mitigate the impact of voltage fluctuations in the power supply system on the isolation transformer used in the ion implanter.

[0005] In a first aspect, embodiments of this application provide a power supply system for an ion implanter. The power supply system includes: a main power distribution unit, a voltage regulator, a first isolation transformer, a second isolation transformer, a first slave power distribution unit, and a second slave power distribution unit. The main power distribution unit is electrically connected to the voltage regulator, the first isolation transformer, and the second isolation transformer, respectively. The first isolation transformer is also electrically connected to the first slave power distribution unit, and the second isolation transformer is also electrically connected to the second slave power distribution unit.

[0006] The main power distribution device is used to output a first power supply voltage to the ion source module of the ion implanter and a second power supply voltage to the ion beam transmission module of the ion implanter.

[0007] The voltage regulator is used to stabilize and output a first stable voltage and a second stable voltage based on the first supply voltage and the second supply voltage, and to transmit the first stable voltage and the second stable voltage to the main power distribution device.

[0008] The first isolation transformer is used to output a third stable voltage based on the first stable voltage, so that the first slave power distribution device can provide regulated power supply to the ion source module based on the third stable voltage;

[0009] The second isolation transformer is used to output a fourth stable voltage based on the second stable voltage, so that the second slave power distribution device can provide regulated power to the ion beam transmission module based on the fourth stable voltage.

[0010] In one optional embodiment, the main power distribution device includes: a three-phase power supply module, a voltage output module, and a neutral wire; the three-phase power supply module includes: a first phase wire, a second phase wire, and a third phase wire; wherein,

[0011] The voltage output module is electrically connected to the first phase line and the second phase line through the first power supply line, and the first power supply voltage output by the voltage output module is the line voltage between the first phase line and the second phase line.

[0012] The voltage output module is electrically connected to the third phase line through the second power supply line, and the second power supply voltage output by the voltage output module is the line voltage between the third phase line and the neutral line.

[0013] In an optional embodiment, the power supply system further includes: a third isolation transformer and a circuit selection device, wherein the third isolation transformer is electrically connected to the main power distribution device and the circuit selection device respectively, and the circuit selection device is also electrically connected to the second isolation transformer and the second slave power distribution device; wherein,

[0014] The main power distribution device is also used to output a third power supply voltage to the ion beam transmission module;

[0015] The third isolation transformer is used to output a fourth power supply voltage based on the third power supply voltage, and to supply power to the ion beam transmission module based on the fourth power supply voltage;

[0016] The circuit selection device is used to select a target isolation transformer from the second isolation transformer and the third isolation transformer, so that the target isolation transformer supplies power to the ion beam transmission module based on the fourth stable voltage or the third power supply voltage.

[0017] In an optional embodiment, the voltage output module is also electrically connected to the first phase line, the second phase line and the third phase line via a third power supply line, and the third power supply voltage output by the voltage output module is the line voltage between any two of the first phase line, the second phase line and the third phase line.

[0018] In one optional embodiment, the fourth supply voltage is any one of the three supply voltages output by the third isolation transformer based on the third supply voltage, wherein the three supply voltages are three line voltages with the same amplitude but different phases.

[0019] In one optional embodiment, the circuit selection device includes: a circuit control module and a circuit switching module, wherein the circuit switching module is electrically connected to the circuit control module; wherein,

[0020] The circuit control module is used to generate a control signal for the circuit switching module after receiving a user's request for regulated power supply to the power supply system; the control signal is used to indicate that the second isolation transformer is used as the target isolation transformer.

[0021] The circuit switching module is used to disconnect the circuit connection between the third isolation transformer and the circuit switching module and to close the circuit connection between the circuit switching module and the second slave power distribution device based on the control signal.

[0022] In one optional embodiment, the circuit switching module includes a single-pole double-throw switch, the fixed end of which is electrically connected to the circuit control module.

[0023] In one optional embodiment, the power supply system further includes a load connection device; wherein the phase connection line of the load connection device is electrically connected to the fixed terminal of the single-pole double-throw switch.

[0024] In one optional embodiment, circuit breakers are provided between the first power supply line, the second power supply line, the third power supply line, the phase line of the load connection device and the fixed terminal of the single-pole double-throw switch, between the main power distribution device and the first isolation transformer, and between the main power distribution device and the second isolation transformer.

[0025] In one optional embodiment, the main power distribution device further includes a first connector, a second connector, and a third connector, wherein the first connector is electrically connected to the second connector and the third connector, respectively;

[0026] The main power distribution device is electrically connected to the voltage stabilizing device through the first connector, and is electrically connected to the first isolation transformer device through the first connector and the second connector in sequence, and is electrically connected to the second isolation transformer device through the first connector and the third connector in sequence.

[0027] The beneficial effects of this application are as follows:

[0028] In the power supply system of the ion implanter provided in this application embodiment, a voltage regulator is introduced into the power supply system to regulate the first power supply voltage output by the main power distribution device to the ion source module of the ion implanter and the second power supply voltage output by the ion beam transmission module of the ion implanter, thereby outputting a first stable voltage and a second stable voltage. In this way, the first isolation transformer corresponding to the ion source module can generate a third stable voltage based on the first stable voltage, so that the first slave power distribution device can provide regulated power to the ion source module based on the third stable voltage, and the second isolation transformer corresponding to the ion beam transmission module can generate a fourth stable voltage based on the second stable voltage, so that the second slave power distribution device can provide regulated power to the ion beam transmission module based on the fourth stable voltage. This improves the impact of voltage fluctuations in the power supply system on the isolation transformer used in the ion implanter, ensuring the normal operation of the ion implanter.

[0029] Furthermore, other features and advantages of this application will be set forth in the following description and will be apparent in part from the description, or may be learned by practicing the application. The objectives and other advantages of this application may be realized and obtained by means of the structures particularly pointed out in the written description, claims, and drawings. Attached Figure Description

[0030] To more clearly illustrate the technical solutions in the embodiments of this application, the accompanying drawings used in the description of the embodiments will be briefly introduced below. Obviously, the accompanying drawings described herein are used to provide a further understanding of this application, constitute a part of this application, and do not constitute an improper limitation of this application. In the accompanying drawings:

[0031] Figure 1 This is a schematic diagram of the composition of a power supply system and an ion implanter provided in an embodiment of this application.

[0032] Figure 2 This is a schematic diagram of the composition structure of another power supply system provided in an embodiment of this application.

[0033] Figure 3 This is a schematic diagram of the composition structure of another power supply system provided in an embodiment of this application.

[0034] Figure 4 This is a schematic diagram of the specific circuit structure of a power supply system provided in an embodiment of this application.

[0035] Reference numerals: 1 - Power supply system; 11 - Main power distribution unit; 111 - Three-phase power supply module; 112 - Voltage output module; 113 - First connector; 114 - Second connector; 115 - Third connector; 12 - Voltage regulator; 13 - First isolation transformer; 14 - Second isolation transformer; 15 - First slave power distribution unit; 16 - Second slave power distribution unit; 17 - Third isolation transformer; 18 - Circuit selection device; 181 - Circuit control module; 182 - Circuit switching module; K - Single-pole double-throw switch; 19 - Load connection device; S1 - First power supply line; S2 - Second power supply line; S3 - Third power supply line; S4 - Phase line connection line; R1 ~ R8 circuit breakers; 2 - Ion source module; 3 - Ion beam transmission module. Detailed Implementation

[0036] The embodiments of this application are described in detail below. Examples of the embodiments are shown in the accompanying drawings. Throughout the drawings, the same or similar reference numerals denote the same or similar elements or elements having the same or similar functions. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain this application, and should not be construed as limiting this application.

[0037] To enable those skilled in the art to better understand the solutions of this application, the technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only a part of the embodiments of this application, and not all of them. Based on the embodiments of this application, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this application. In the embodiments of this application, it should be noted that, in this document, relational terms such as "first" and "second" are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any such actual relationship or order between these entities or operations.

[0038] Furthermore, the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such a process, method, article, or apparatus. Without further limitation, an element defined by the phrase "comprising one..." does not exclude the presence of other identical elements in the process, method, article, or apparatus that includes said element.

[0039] In the description of the embodiments of this application, the words "example" or "for example" are used to indicate exemplification, illustration, or description. Any embodiment or design described as "example" or "for example" in the embodiments of this application is not to be construed as being better or having more advantages than another embodiment or design. The use of the words "example" or "for example" is intended to present relative concepts in a clear manner. In addition, "multiple" in the embodiments of this application refers to two or more. Therefore, "multiple" can also be understood as "at least two" in the embodiments of this application. "At least one" can be understood as one or more, such as one, two, or more. For example, including at least one means including one, two, or more, and is not limited to which ones are included. For example, including at least one of A, B, and C, then it can include A, B, C, A and B, A and C, B and C, or A and B and C.

[0040] It should be noted that in the embodiments of this application, "and / or" describes the relationship between associated objects, indicating that three relationships can exist. For example, A and / or B can represent: A existing alone, A and B existing simultaneously, or B existing alone. Additionally, the character " / ", unless otherwise specified, generally indicates that the preceding and following associated objects have an "or" relationship. It should be pointed out that in the embodiments of this application, "connection" can be understood as an electrical connection. The connection between two electrical components can be a direct or indirect connection between the two electrical components. For example, the connection between A and B can be a direct connection between A and B, or an indirect connection between A and B through one or more other electrical components.

[0041] Furthermore, the names of the messages or information exchanged between the multiple devices in the embodiments of this application are for illustrative purposes only and are not intended to limit the scope of these messages or information.

[0042] The design concept of the embodiments of this application is briefly introduced below:

[0043] Ion implanters are critical equipment in semiconductor manufacturing processes, and fluctuations in the output voltage of their power supply system directly affect the semiconductor doping depth and concentration distribution, thereby impacting the performance and stability of the final semiconductor product. Voltage fluctuations typically refer to sudden changes in the output voltage of the power supply system, either instantaneously or over a short period, caused by load variations or unstable output from power distribution devices (e.g., distribution cabinets).

[0044] Due to voltage fluctuations in the power supply system, the isolation transformers used in the ion implanter (such as the source region isolation transformer and the beamline region isolation transformer) may trip, which can seriously affect the normal operation of the ion implanter.

[0045] In view of this, in order to solve or improve the above-mentioned problems, embodiments of this application provide a power supply system for an ion implanter. See also... Figure 1 As shown, the power supply system 1 may include: a main power distribution device 11, a voltage stabilizing device 12, a first isolation transformer device 13, a second isolation transformer device 14, a first slave power distribution device 15, and a second slave power distribution device 16.

[0046] The main power distribution device 11 is electrically connected to the voltage stabilizing device 12, the first isolation transformer 13, and the second isolation transformer 14. The first isolation transformer 13 can also be electrically connected to the first slave power distribution device 15, and the second isolation transformer 14 can also be electrically connected to the second slave power distribution device 16.

[0047] The main power distribution unit 11 can output a first power supply voltage to the ion source module 2 of the ion implanter and a second power supply voltage to the ion beam transmission module 3 of the ion implanter. The ion source module 2 is the operating environment of the ion source, and the ion beam transmission module 3 is a device that ionizes neutral atoms or molecules and extracts an ion beam. It is an indispensable component of various types of ion accelerators, mass spectrometers, electromagnetic isotope separators, ion implanters, ion beam etching devices, ion thrusters, and neutral beam injectors in controlled fusion devices. The ion beam transmission module 3 can be used to transmit the ion beam extracted from the ion source module 2. It should be understood that the power supply system 1, the ion source module 2, and the ion beam transmission module 3 are all components of the ion implanter; of course, the ion implanter may also include other modules.

[0048] The first supply voltage mentioned above can be expressed as: V sup.1 The aforementioned second supply voltage can be expressed as: V sup.2 It is understandable that the magnitude of the first power supply voltage can be determined based on the operating voltage of the ion source module 2, and the magnitude of the second power supply voltage can be determined based on the operating voltage of the ion beam transmission module 3.

[0049] The voltage regulator 12 can be used to regulate and output a first stable voltage and a second stable voltage based on a first supply voltage and a second supply voltage, and transmit the first stable voltage and the second stable voltage to the main power distribution device 11. For example, the aforementioned first stable voltage can be expressed as: V sta.1 The aforementioned second stable voltage can be expressed as: V sta.2 .

[0050] The voltage regulator 12 can also be called a constant voltage constant frequency (CVCF) module. The voltage regulator 12 is a voltage-regulating power supply that achieves constant voltage and constant frequency by controlling the output voltage or output frequency to remain constant. Optionally, after rectifying, filtering, and inverting the input voltage signal (i.e., the first supply voltage and the second supply voltage), the voltage regulator 12 can adjust the output waveform through a frequency converter to keep it constant at the set voltage and frequency values, i.e., outputting a first stable voltage and a second stable voltage.

[0051] For example, the rectifier stage converts the input AC power to DC power, and the filter stage eliminates voltage ripple through capacitor filtering, ensuring stable DC voltage and suppressing harmonics. This keeps the total harmonic distortion (THD) at a low level, meeting the requirements of precision equipment. The inverter stage uses insulated-gate bipolar transistors (IGBTs) to control the output sine wave through switching frequency, and synchronous 60° pulse-width modulation (PWM) ensures waveform quality. Furthermore, the voltage regulator 12 can also provide closed-loop feedback, real-time monitoring of the output voltage and frequency, and automatically adjusting excitation parameters to compensate for deviations based on load changes.

[0052] Through the voltage regulator 12, the power supply system 1 can maintain a constant output voltage and frequency, unaffected by the output fluctuations or load changes of the main power distribution device 11. This ensures that the input voltage of the isolation transformer is stable, preventing voltage instability from causing the first isolation transformer 13 and the second isolation transformer 14 to trip, which could have serious consequences for the ion implanter. This improves the impact on doping depth, concentration distribution, and device performance stability during ion implantation or semiconductor fabrication.

[0053] The first isolation transformer 13 can be used to output a third stable voltage based on a first stable voltage, so that the first slave power distribution device 15 can provide regulated power to the ion source module 2 based on the third stable voltage. For example, the aforementioned third stable voltage can be expressed as: V sta.3 The first isolation transformer 13 can either boost the first stable voltage to obtain the third stable voltage, or it can buck the first stable voltage to obtain the third stable voltage. In other words, the embodiments of this application do not specifically limit the magnitude relationship between the first stable voltage and the third stable voltage.

[0054] The second isolation transformer 14 can be used to output a fourth stable voltage based on the second stable voltage, so that the second slave power distribution device 16 can provide regulated power to the ion beam transmission module 3 based on the fourth stable voltage. For example, the aforementioned fourth stable voltage can be expressed as: V sta.4 The second isolation transformer 14 can either boost the second stable voltage to obtain a fourth stable voltage, or it can buck the second stable voltage to obtain a fourth stable voltage. In other words, the embodiments of this application do not specifically limit the magnitude relationship between the second stable voltage and the fourth stable voltage.

[0055] It should also be noted that the first isolation transformer 13 can also be called a source area isolation transformer, and the second isolation transformer 14 can also be called a bundle control isolation transformer. Of course, the first isolation transformer 13 and the second isolation transformer 14 can also have other names, and this application embodiment does not specifically limit them.

[0056] based on Figure 1 The power supply system 1 shown incorporates a voltage regulator 12 to regulate the first power supply voltage output by the main power distribution device 11 to the ion source module 2 and the second power supply voltage output by the ion beam transmission module 3, thereby outputting a first stable voltage and a second stable voltage. In this way, the first isolation transformer 13 corresponding to the ion source module 2 can generate a third stable voltage based on the first stable voltage, enabling the first slave power distribution device 15 to provide regulated power to the ion source module 2 based on the third stable voltage. Similarly, the second isolation transformer 14 corresponding to the ion beam transmission module 3 can generate a fourth stable voltage based on the second stable voltage, enabling the second slave power distribution device 16 to provide regulated power to the ion beam transmission module 3 based on the fourth stable voltage. This mitigates the impact of voltage fluctuations in the power supply system 1 on the isolation transformers used in the ion implanter (i.e., the first isolation transformer 13 and the second isolation transformer 14), ensuring the normal operation of the ion implanter.

[0057] In one alternative implementation, see [link to relevant documentation]. Figure 2 As shown, the main power distribution device 11 may include: a three-phase power supply module 111, a voltage output module 112, and a neutral line N. The three-phase power supply module 111 may include: a first phase line L1, a second phase line L2, and a third phase line L3. The voltage output module 112 is electrically connected to the first phase line L1 and the second phase line L2 via a first power supply line S1, and the first power supply voltage output by the voltage output module 112 is the line voltage between the first phase line L1 and the second phase line L2. The voltage output module 112 is electrically connected to the third phase line L3 via a second power supply line S2, and the second power supply voltage output by the voltage output module 112 is the line voltage between the third phase line L3 and the neutral line N.

[0058] It is understandable that the first power supply line S1 includes the power supply lines corresponding to the first phase line L1 and the second phase line L2 respectively, that is, two power supply lines, and the second power supply line S2 includes the power supply line corresponding to the third phase line L3, that is, one power supply line.

[0059] In this way, the main power distribution device 11 or the voltage output module 112 can generate a first power supply voltage that can ensure the normal operation of the ion source module 2 through the line voltage between the first phase line L1 and the second phase line L2, and generate a second power supply voltage that can ensure the normal operation of the ion beam transmission module 3 through the line voltage between the third phase line L3 and the neutral line N.

[0060] In one alternative implementation, it is still as follows Figure 2 As shown, the power supply system 1 may further include: a third isolation transformer 17 and a circuit selection device 18. The third isolation transformer 17 is electrically connected to the main power distribution device 11 and the circuit selection device 18, respectively, and the circuit selection device 18 is also electrically connected to the second isolation transformer 14 and the second slave power distribution device 16.

[0061] At this time, the main power distribution unit 11 can also be used to output a third power supply voltage to the ion beam transmission module 3. The third isolation transformer 17 can be used to output a fourth power supply voltage based on the third power supply voltage, and to power the ion beam transmission module 3 based on the fourth power supply voltage. The circuit selection device 18 can be used to select a target isolation transformer from the second isolation transformer 14 and the third isolation transformer 17, so that the target isolation transformer powers the ion beam transmission module 3 based on the fourth stable voltage or the fourth power supply voltage. For example, the aforementioned third power supply voltage can be expressed as: V sup.3 The aforementioned fourth supply voltage can be expressed as: V sup.4 .

[0062] In this way, not only can the second isolation transformer 14 be selected by the circuit selection device 18 to supply power to the ion beam transmission module 3, so as to realize the regulated power supply of the power supply system 1 to the ion beam transmission module 3, but the third isolation transformer 17 can also be used by the circuit selection device 18 to supply power to the ion beam transmission module 3, so as to ensure that the power supply system 1 can still supply power to the ion beam transmission module 3 when the second isolation transformer 14 is abnormal or malfunctions, thus ensuring the normal operation of the ion beam transmission module 3.

[0063] Optionally, the voltage output module 112 is also electrically connected to the first phase line L1, the second phase line L2 and the third phase line L3 via the third power supply line S3. The third power supply voltage output by the voltage output module 112 is the line voltage between any two of the first phase line L1, the second phase line L2 and the third phase line L3.

[0064] It should be understood that the third power supply voltage output by the voltage output module 112 can also be the line voltage between any one of the first phase line L1, the second phase line L2 and the third phase line L3 and the neutral line N.

[0065] At this time, the fourth supply voltage can be any one of the three supply voltages output by the third isolation transformer 17 based on the third supply voltage. The three supply voltages are three line voltages with the same amplitude but different phases. For example, the aforementioned three supply voltages are 120V and the phase difference between the supply voltages is 120°.

[0066] In one alternative implementation, see [link to relevant documentation]. Figure 3 As shown, the circuit selection device 18 includes a circuit control module 181 and a circuit switching module 182. The circuit switching module 182 is electrically connected to the circuit control module 181. The circuit control module 181 can generate a control signal for the circuit switching module 182 after receiving a voltage regulation request from a user for the power supply system 1. This control signal can be used to indicate that the second isolation transformer 14 is the target isolation transformer. The circuit switching module 182 can be used to disconnect the circuit connection between the third isolation transformer 17 and the circuit switching module 182 based on the control signal, and to close the circuit connection between the circuit switching module 182 and the second slave power distribution device 16.

[0067] In this way, once the circuit control module 181 in the power supply system 1 receives a power supply request from the outside, it can control the circuit switching module 182 to switch the target isolation transformer from the third isolation transformer 17 to the second isolation transformer 14 through the generated control signal, thereby ensuring that the power supply system 1 provides a stable power supply to the ion beam transmission module 3.

[0068] Still Figure 3 As shown, the circuit switching module 182 includes a single-pole double-throw (SPD) switch K. The fixed terminal b of the SPD switch K is electrically connected to the circuit control module 181, and the first selection terminal a of the SPD switch K is electrically connected to the third isolation transformer 17. The second selection terminal c of the SPD switch K is electrically connected to the second slave power distribution device 16. In this way, the target isolation transformer can be flexibly selected through the SPD switch K. That is, when the first selection terminal a of the SPD switch K is connected to the fixed terminal b, the third isolation transformer 17 is used as the target isolation transformer; when the second selection terminal c of the SPD switch K is connected to the fixed terminal b, the second isolation transformer 14 is used as the target isolation transformer.

[0069] Optionally, the power supply system 1 may further include a load connection device 19. The phase line of the load connection device 19 is electrically connected to the fixed terminal b of the single-pole double-throw switch K. The load connection device 19 is used for any one or a combination of analog input, analog output, digital input, and digital output. The load connection device 19 can be considered as an ADIO module.

[0070] In one alternative implementation, see [link to relevant documentation]. Figure 4 As shown, circuit breakers are installed between the first power supply line S1, the second power supply line S2, the third power supply line S3, the phase line connection line S4 (i.e., L line) of the load connection device 19 and the fixed terminal b of the single-pole double-throw switch K, between the main power distribution device 11 and the first isolation transformer 13, and between the main power distribution device 11 and the second isolation transformer 14. These circuit breakers are, in order, circuit breaker R1, circuit breaker R2, circuit breaker R3, circuit breaker R4, circuit breaker R5, and circuit breaker R6. In this embodiment, the number and type of each circuit breaker R1 to R6 are not limited.

[0071] Based on the above method, by switching circuit breakers R1 to R6 on and off, the power supply system 1 can provide regulated power to the ion implanter and also protect the power supply circuit in the power supply system 1.

[0072] In an optional implementation, the main power distribution device 11 may further include a first connector 113, a second connector 114, and a third connector 115. The first connector 113 is electrically connected to both the second connector 114 and the third connector 115. The main power distribution device 11 is electrically connected to the voltage regulator 12 via the first connector 113, to the first isolation transformer 13 via the first connector 113 and the second connector 114, and to the second isolation transformer 14 via the first connector 113 and the third connector 115. Thus, the electrical connections of the various components of the power supply system 1 are achieved through the first connector 113, the second connector 114, and the third connector 115, ensuring the stable power supply of the power supply system 1.

[0073] Based on the above Figure 4The specific circuit structure of the power supply system of the ion implanter shown is as follows: the main power distribution device 11 connects the power supply socket J1, which supplies power to the first isolation transformer 13 and the second isolation transformer 14, with the conversion socket P1 of the voltage regulator 12. That is, the original power supply to the first isolation transformer 13 and the second isolation transformer 14 is processed by the voltage regulator module 12 to output a first stable voltage and a second stable voltage. Both the power supply socket J1 and the conversion socket P1 are components of the first connector 113. Then, the main power distribution device 11 can output the first stable voltage to the socket J2 of the second connector 114 to provide regulated power to the first isolation transformer 13, thereby achieving regulated power supply to the first slave power distribution device 15. Similarly, it can output the second stable voltage to the socket J3 of the third connector 115 to provide regulated power to the second isolation transformer 14, thereby achieving regulated power supply to the second slave power distribution device 16. The power supply to the first isolation transformer 13 is connected to pins C1 and C2 of the J1 socket via a 2P circuit breaker (circuit breaker R1) within the main power distribution device 11, with pin C3 of the J1 socket grounded. Pins B1 and B2 of the J1 socket within the main power distribution device 11 are connected to pins A1 and A2 of the J2 socket via a 2P circuit breaker (circuit breaker R5), with pins B3 of the J1 socket and A3 of the J2 socket grounded. The power supply to the second isolation transformer 14 is connected to pins E1 and E2 of the J1 socket via a 1P circuit breaker (circuit breaker R2) within the main power distribution device 11, with pin E3 of the J1 socket grounded. Pin D1 of socket J1 in main power distribution device 11 is connected to pin F1 of socket J3 via 1P circuit breaker (i.e. circuit breaker R6), and pin D2 of socket J1 is connected to pin F2 of socket J3. Pin D3 of socket J1 and pin F3 of socket J3 are grounded.

[0074] The power supply of the third isolation transformer 17 is connected to the input pins G1, G2 and G3 of the third isolation transformer 17 through the first phase line L1, the second phase line L2 and the third phase line L3 in the main power distribution device 11 via a 3P circuit breaker (i.e. circuit breaker R3). The input pin G4 of the third isolation transformer 17 is grounded.

[0075] Still Figure 4 As shown, power supply system 1 switches between normal power supply and regulated power supply for load connection device 19 via single-pole double-throw switch K. Specifically, main distribution device 11 directly supplies power to third isolation transformer 17, which in turn supplies normal power to load connection device 19 via single-pole double-throw switch K. Main distribution device 11 supplies regulated power to second isolation transformer 14 via voltage regulator 12, and second isolation transformer 14 supplies regulated power to load connection device 19 via second slave distribution device 16 and single-pole double-throw switch K in sequence.

[0076] The first selection terminal a of the single-pole double-throw switch K is equipped with a circuit breaker R7. When the first selection terminal a and the fixed terminal b of the single-pole double-throw switch K are connected, normal power supply is provided to the load connection device 19. When the second selection terminal c and the fixed terminal b of the single-pole double-throw switch K are connected, regulated power supply is provided to the load connection device 19.

[0077] Optional, as before Figure 4 As shown, the power supply system may also include circuit breaker R8, and of course, other circuit breakers may also be included. This application embodiment does not specifically limit the setting and number of circuit breakers.

[0078] In summary, the power supply system of the ion implanter provided in this application embodiment introduces a voltage regulator to stabilize the first power supply voltage output by the main power distribution device to the ion source module and the second power supply voltage output by the ion beam transmission module, thereby outputting a first stable voltage and a second stable voltage. In this way, the first isolation transformer corresponding to the ion source module can generate a third stable voltage based on the first stable voltage, enabling the first slave power distribution device to provide a regulated power supply to the ion source module based on the third stable voltage. Similarly, the second isolation transformer corresponding to the ion beam transmission module can generate a fourth stable voltage based on the second stable voltage, enabling the second slave power distribution device to provide a regulated power supply to the ion beam transmission module based on the fourth stable voltage. This improves the impact of voltage fluctuations in the power supply system on the isolation transformer used in the ion implanter, ensuring the normal operation of the ion implanter.

[0079] Furthermore, it should be understood that the above-disclosed embodiments are merely preferred embodiments of this application and are not intended to limit this application in any way. Although this application has been disclosed above with reference to preferred embodiments, it is not intended to limit this application. Any person skilled in the art can make some modifications or alterations to the above-disclosed technical content to create equivalent embodiments without departing from the scope of the technical solution of this application. Any simple modifications, equivalent changes, and alterations made to the above embodiments based on the technical essence of this application without departing from the content of the technical solution recorded in this application shall still fall within the scope of the technical solution of this application.

Claims

1. A power supply system for an ion implanter, comprising: a power supply; a power supply controller; a power supply monitor; and a power supply monitor controller. The application relates to a power supply device for an ion implanter. The power supply device comprises a main power distribution device, a voltage stabilizing device, a first isolation transformer device, a second isolation transformer device, a first slave power distribution device, a second slave power distribution device, a third isolation transformer device and a circuit selection device. The main power distribution device is electrically connected with the voltage stabilizing device, the first isolation transformer device and the second isolation transformer device. The first isolation transformer device is electrically connected with the first slave power distribution device. The second isolation transformer device is electrically connected with the second slave power distribution device. The third isolation transformer device is electrically connected with the main power distribution device and the circuit selection device. The circuit selection device is electrically connected with the second isolation transformer device and the second slave power distribution device. The main power distribution device is used for outputting a first power supply voltage for an ion source module of the ion implanter and outputting a second power supply voltage and a third power supply voltage for an ion beam transmission module of the ion implanter.

2. The power supply system of claim 1, wherein, The main power distribution device comprises a three-phase power supply module, a voltage output module and a zero line.

3. The power supply system of claim 1 or 2, wherein The three-phase power supply module comprises a first phase line, a second phase line and a third phase line.

4. The power supply system of claim 1 or 2, wherein The voltage output module is electrically connected with the first phase line and the second phase line through a first power supply line. The voltage output module outputs the first power supply voltage as a line voltage between the first phase line and the second phase line. The voltage output module is electrically connected with the third phase line through a second power supply line. The voltage output module outputs the second power supply voltage as a line voltage between the third phase line and the zero line. The voltage stabilizing device is used for stabilizing and outputting a first stable voltage and a second stable voltage based on the first power supply voltage and the second power supply voltage and transmitting the first stable voltage and the second stable voltage to the main power distribution device. The first isolation transformer device is used for outputting a third stable voltage based on the first stable voltage so that the first slave power distribution device performs stable power supply for the ion source module based on the third stable voltage. The second isolation transformer device is used for outputting a fourth stable voltage based on the second stable voltage. The third isolation transformer device is used for outputting a fourth power supply voltage based on the third power supply voltage. The circuit selection device is used for selecting a target isolation transformer device from the second isolation transformer device and the third isolation transformer device so that the target isolation transformer device performs power supply for the ion beam transmission module based on the fourth stable voltage or the fourth power supply voltage. The voltage output module is also electrically connected with the first phase line, the second phase line and the third phase line through a third power supply line. The voltage output module outputs the third power supply voltage as a line voltage between any two phase lines of the first phase line, the second phase line and the third phase line. The fourth power supply voltage is any one of three power supply voltages outputted by the third isolation transformer device based on the third power supply voltage. The three power supply voltages have the same amplitude but different phases. The circuit selection device comprises a circuit control module and a circuit switching module. The circuit switching module is electrically connected with the circuit control module. The circuit control module is configured to generate a control signal of the circuit switching module after receiving a voltage stabilization power supply request of the power supply system by a user; the control signal is used to indicate that the second isolation transformer device is used as the target isolation transformer device. The circuit switching module is configured to disconnect the circuit connection between the third isolation transformer device and the circuit switching module and close the circuit connection between the circuit switching module and the second slave power distribution device based on the control signal.

5. The power supply system of claim 4, wherein, The circuit switching module comprises a single-pole double-throw switch, and a fixed end of the single-pole double-throw switch is electrically connected to the circuit control module.

6. The power supply system of claim 5, wherein, The power supply system further comprises a load access device, and a phase line access line of the load access device is electrically connected to the fixed end of the single-pole double-throw switch.

7. The power supply system of claim 6, wherein, The first power supply line, the second power supply line, the third power supply line, the phase line access line of the load access device, and the fixed end of the single-pole double-throw switch, the main power distribution device and the first isolation transformer device, and the main power distribution device and the second isolation transformer device are all provided with circuit breakers.

8. The power supply system of claim 1, wherein, The main power distribution device further comprises a first connector, a second connector and a third connector, and the first connector is electrically connected to the second connector and the third connector respectively; The main power distribution device is electrically connected to the voltage stabilization device through the first connector, is electrically connected to the first isolation transformer device through the first connector and the second connector in sequence, and is electrically connected to the second isolation transformer device through the first connector and the third connector in sequence.

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