Cleaning jig and cup body cleaning method

Abstract

The invention provides a cleaning jig and a cup body cleaning method, and relates to the technical field of semiconductor manufacturing. The cleaning device is used for cleaning a cup body on the gluing developing equipment and comprises an upper ring body, a disc body and a lower ring body, the upper ring body and the lower ring body are concentric and connected at intervals, the inner ring diameter of the upper ring body is smaller than that of the lower ring body, and an annular liquid storage area is formed between the upper ring body and the lower ring body and used for storing cleaning liquid; the disc body is connected to one face of the lower ring body and used for being externally connected with a rotating disc, the diameter of the disc body is larger than the inner ring diameter of the upper ring body and smaller than the inner ring diameter of the lower ring body, and a liquid supply area is formed between the inner ring of the lower ring body and the disc body and used for being externally connected with a liquid supply device. And the rotating disc rotates to drive the upper ring body and the lower ring body to rotate, so that the cleaning liquid is discharged to the cup body from the edge of the annular liquid storage area to clean the cup body. The complex process of repeated low-speed water storage and high-speed throwing-out due to the fact that the single-time liquid storage amount is insufficient is avoided, the cleaning time is remarkably shortened, and the cleaning efficiency is improved.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of semiconductor manufacturing, in particular to a cleaning jig and a cup cleaning method. BACKGROUND

[0002] In the semiconductor manufacturing process, the coating and developing equipment is one of the key equipment to complete the photoetching process. The coating unit is the core process unit, and the cleanliness of the internal cup directly affects the stability of the subsequent process and the product yield. In the actual coating process, the high-speed rotation of the substrate will cause the photoresist to be thrown out and attached to the inner wall of the cup, forming stubborn residual glue, so the cup must be cleaned regularly.

[0003] The prior art generally injects a small amount of cleaning liquid into the cleaning jig, which is thrown out to the inner wall of the cup under the action of centrifugal force for cleaning. However, due to insufficient liquid storage capacity at a time, it is often necessary to repeat multiple low-speed water storage and high-speed throwing to achieve the expected cleaning effect, resulting in long cleaning time and low cleaning efficiency. SUMMARY

[0004] The technical problem to be solved by the present application is to provide a cleaning jig and a cup cleaning method which can avoid long cleaning time and low cleaning efficiency due to insufficient liquid storage capacity at a time.

[0005] The technical solution adopted by the present application to solve the above technical problem is: The present application provides a cleaning jig for cleaning a cup on a coating and developing equipment, comprising an upper ring body, a disc body and a lower ring body; the upper ring body and the lower ring body are concentric and connected with a gap, the inner ring diameter of the upper ring body is smaller than the inner ring diameter of the lower ring body, and the gap between the upper ring body and the lower ring body forms an annular liquid storage area for storing cleaning liquid; the disc body is connected to one side of the upper ring body facing the lower ring body, and the disc body is used to circumscribe a rotating disc, the diameter of the disc body is greater than the inner ring diameter of the upper ring body and smaller than the inner ring diameter of the lower ring body, and the area between the inner ring of the lower ring body and the disc body forms a liquid supply area in communication with the annular liquid storage area, and the liquid supply area is used to circumscribe a liquid supply device; wherein the rotating disc rotates to drive the upper ring body and the lower ring body to rotate synchronously, so that the cleaning liquid is discharged from the edge of the annular liquid storage area to the cup to clean the cup.

[0006] Optionally, a guide piece is connected to the edge of the lower ring body, the guide piece is inclined towards the upper ring body, and the guide piece is used to adjust the discharge direction of the cleaning liquid; a plurality of liquid discharge holes are uniformly arranged on the surface of the lower ring body near the guide piece in the circumferential direction for discharging the cleaning liquid.

[0007] Optionally, the inclination angle of the guide piece is adjustable, and the inclination angle of the guide piece is adjustable in the range of 10° to 45°.

[0008] Optionally, an inclined surface is provided on the outer edge of the upper ring body, and the angle between the inclined surface and the surface of the upper ring body is 10°~45°.

[0009] Optionally, the disk body includes a connecting part and a sealing suction cup that are connected to each other. The connecting part has a boss structure, and the protrusion of the connecting part is embedded in the inner ring of the upper ring body. The bottom of the connecting part is connected to the upper ring body, and the sealing suction cup is used to connect the rotating disk.

[0010] Optionally, the disc body and the upper ring body are concentrically arranged, and the weight of the disc body is greater than the weight of the upper ring body and the lower ring body.

[0011] This application also provides a cup cleaning method, which uses the above-mentioned cleaning fixture for cleaning, including: connecting the plate to the rotating disk; injecting cleaning fluid into the liquid storage area; adjusting the tilt angle of the guide; controlling the rotation speed of the rotating disk according to the area of ​​the cup that needs to be cleaned, so as to splash the cleaning fluid from the edge of the liquid storage area to clean the cup.

[0012] Optionally, the rotation speed of the rotating disk is controlled according to the area of ​​the cup body that needs to be cleaned, including: when cleaning the first area of ​​the cup body, controlling the rotation speed of the rotating disk to be lower than a first threshold; when cleaning the second area of ​​the cup body, controlling the rotation speed of the rotating disk to be higher than a second threshold; when cleaning the middle area of ​​the cup body, controlling the rotation speed of the rotating disk to be between the first threshold and the second threshold; wherein, the first area is located below the second area, and the middle area is located between the first area and the second area.

[0013] Optionally, when the tilt angle of the guide is 10° to 45°, the range of the first threshold is 600 rpm to 1200 rpm, and the range of the second threshold is 1200 rpm to 2000 rpm; wherein, as the tilt angle of the guide increases, the first threshold shows a trend of first increasing and then decreasing, and the second threshold shows a trend of first increasing and then decreasing.

[0014] Optionally, the tilt angle of the adjusting guide includes: when the cleanliness of the second area is lower than that of the first area, the tilt angle of the guide increases.

[0015] This application provides a cleaning fixture and a cup cleaning method. By connecting the upper and lower rings at intervals to form an annular liquid storage area, sufficient cleaning liquid can be stored at one time. This avoids the tedious process of repeatedly storing water at low speed and shaking it out at high speed when the liquid volume is insufficient at one time, significantly shortening the cleaning time and improving the cleaning efficiency. Attached Figure Description

[0016] To more clearly illustrate the technical solutions of this application, the accompanying drawings used in the embodiments will be briefly introduced below. It should be understood that the following drawings only show some embodiments of this application and should not be regarded as a limitation of the scope. For those skilled in the art, other related drawings can be obtained based on these drawings without creative effort.

[0017] Figure 1 This is one of the structural schematic diagrams of the cleaning fixture in this application; Figure 2 This is the second schematic diagram of the cleaning fixture in this application; Figure 3 This is a side sectional view of the cleaning fixture of this application; Figure 4 This is a partially enlarged schematic diagram of the side of the cleaning fixture of this application; Figure 5 This is a schematic diagram showing the fit between the cleaning fixture and the cup body in this application.

[0018] Icons: 10-Upper ring; 11-Inclined surface; 20-Lower ring; 21-Guide component; 22-Drainage through hole; 30-Disc; 31-Connecting part; 40-Annular liquid storage area; 50-Liquid supply area; 60-Cleaning fluid; 70-First area; 80-Second area.

[0019] The realization of the purpose, functional features and advantages of this application will be further explained in conjunction with the embodiments and with reference to the accompanying drawings. Detailed Implementation

[0020] To make the objectives, technical solutions, and advantages of this invention clearer, the technical solutions in the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only a part of the embodiments of this application, and not all of the embodiments. Based on the embodiments in this application, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the scope of protection of this application.

[0021] It should be noted that all directional indications (such as up, down, left, right, front, back, etc.) in the embodiments of this invention are only used to explain the relative positional relationship and movement of the components in a specific posture (as shown in the figure). If the specific posture changes, the directional indication will also change accordingly.

[0022] In this application, unless otherwise expressly specified and limited, the terms "connection," "fixed," etc., should be interpreted broadly. For example, "fixed" can mean a fixed connection, a detachable connection, or an integral part; it can mean a mechanical connection or an electrical connection; it can mean a direct connection or an indirect connection through an intermediate medium; it can mean the internal communication of two components or the interaction between two components, unless otherwise expressly limited. Those skilled in the art can understand the specific meaning of the above terms in this invention according to the specific circumstances.

[0023] Furthermore, if the embodiments of this application involve descriptions such as "first" or "second," these descriptions are for descriptive purposes only and should not be construed as indicating or implying their relative importance or implicitly specifying the number of technical features indicated. Therefore, a feature defined with "first" or "second" may explicitly or implicitly include at least one of those features. Additionally, the meaning of "and / or" throughout the text includes three parallel solutions; for example, "A and / or B" includes solution A, solution B, or a solution where both A and B are satisfied simultaneously. Furthermore, the technical solutions of the various embodiments can be combined with each other, but this must be based on the ability of those skilled in the art to implement them. When the combination of technical solutions is contradictory or impossible to implement, it should be considered that such a combination of technical solutions does not exist and is not within the scope of protection claimed in this application.

[0024] Existing technologies generally involve injecting a small amount of cleaning fluid into a cleaning fixture, which then uses centrifugal force to eject the fluid onto the inner wall of the container for cleaning. However, due to insufficient fluid volume at a single injection, multiple cycles of low-speed fluid intake and high-speed ejection are often required to achieve the desired cleaning effect, resulting in long cleaning times and low cleaning efficiency. To address these issues, the embodiments of this application refer to... Figures 1 to 5 The following technical solutions are provided to overcome the above problems.

[0025] Please refer to Figures 1 to 5This application provides a cleaning fixture for cleaning a cup on a coating and developing device, comprising an upper ring body 10, a disc body 30, and a lower ring body 20; the upper ring body 10 and the lower ring body 20 are concentric and spaced apart, the inner ring diameter of the upper ring body 10 is smaller than the inner ring diameter of the lower ring body 20, and the gap between the upper ring body 10 and the lower ring body 20 forms an annular liquid storage area 40 for storing cleaning liquid 60; the disc body 30 is connected to the upper ring body 10 facing the lower ring body 20. On the other hand, the diameter of the disc 30 is larger than the inner ring diameter of the upper ring 10 and smaller than the inner ring diameter of the lower ring 20. The area between the inner ring of the lower ring 20 and the disc 30 forms a liquid supply area 50 that communicates with the annular liquid storage area 40. The liquid supply area 50 is used to connect an external liquid supply device. The rotation of the rotating disc drives the upper ring 10 and the lower ring 20 to rotate synchronously, so that the cleaning liquid 60 is discharged from the edge of the annular liquid storage area 40 to the cup to clean the cup.

[0026] Specifically, during the semiconductor coating process, when the substrate is rotated at high speed, the photoresist on the upper surface of the substrate will spread and form photoresist contaminants on the cup. A cleaning fixture is needed to clean the cup in the coating and developing machine. In this embodiment, the upper ring 10 and lower ring 20 of the cleaning fixture are concentric and spaced apart. The inner diameter of the upper ring 10 is smaller than the inner diameter of the lower ring 20. The gap between the upper ring 10 and the lower ring 20 forms an annular liquid storage area 40 for storing the cleaning liquid 60. The tray 30... The cleaning fixture is connected to the side of the upper ring 10 facing the lower ring 20. Its diameter is between the inner ring diameter of the upper ring 10 and the inner ring diameter of the lower ring 20. The cleaning fixture is connected to the turntable in the coating and developing machine through the disc body 30. The area between the inner ring of the lower ring 20 and the disc body 30 forms the liquid supply area 50, which is used to connect the liquid supply device in the coating and developing machine. When the turntable rotates, it drives the upper ring 10 and the lower ring 20 to rotate synchronously, so that the cleaning liquid 60 is discharged from the edge of the annular liquid storage area 40 to clean the cup body.

[0027] Understandably, the upper ring 10 and lower ring 20 are connected at intervals to form an annular liquid storage area 40, which can store enough cleaning liquid 60 at once, reducing the time wasted due to repeated water storage and dissipation, and significantly shortening the cleaning time. Furthermore, the annular liquid storage area 40 can evenly store and dissipate the cleaning liquid 60, allowing it to more evenly cover the inner wall of the cup, improving the uniformity and thoroughness of the cleaning.

[0028] In practical applications, the cleaning fixture is first installed on the rotating disk of the coating and developing equipment, ensuring the structural stability and concentricity of the upper ring 10, disk 30, and lower ring 20. Cleaning solution 60 is injected into the supply area 50 via an external supply device, flowing into the annular storage area 40 for storage. The rotating disk is then started, causing the upper ring 10 and lower ring 20 to rotate synchronously. At this time, the cleaning solution 60, under centrifugal force, is evenly ejected from the edge of the annular storage area 40, thoroughly cleaning the inner wall of the container. By controlling the rotation speed of the rotating disk, the ejection speed and direction of the cleaning solution 60 can be adjusted to meet different cleaning needs.

[0029] This application provides a cleaning fixture, in which an upper ring 10 and a lower ring 20 are connected at intervals to form an annular liquid storage area 40, which can store sufficient cleaning liquid 60 at one time. This avoids the tedious process of repeatedly storing water at low speed and then splashing it out at high speed when the liquid volume is insufficient at one time, significantly shortening the cleaning time and improving the cleaning efficiency. In one embodiment, a guide 21 is connected to the edge of the lower ring 20, the guide 21 is inclined toward the upper ring 10, and the guide 21 is used to adjust the discharge direction of the cleaning fluid 60; a plurality of drainage holes 22 are uniformly opened in the circumferential direction on the surface of the lower ring 20 near the guide 21 for discharging the cleaning fluid 60.

[0030] Specifically, a guide member 21 inclined towards the upper ring 10 is connected to the edge of the lower ring 20, and multiple drainage holes 22 are evenly formed circumferentially on the surface of the lower ring 20 near the guide member 21. The inclination angle of the guide member 21 is... Figure 4 and Figure 5 The guide 21 is used to adjust the discharge direction of the cleaning fluid 60, so that the cleaning fluid 60 can be discharged in a preset direction and angle. The drain hole 22 allows the cleaning fluid 60 to be discharged in another direction and angle, so that the cleaning fluid 60 can more comprehensively cover different areas of the cup body and enhance the cleaning effect.

[0031] Understandably, when the cleaning fluid 60 is ejected from the annular reservoir 40, the tilt angle of the guide 21 guides the flow direction of the cleaning fluid 60, causing it to discharge at a specific angle and direction. Furthermore, multiple drainage holes 22 are evenly distributed circumferentially, ensuring that the cleaning fluid 60 can be evenly discharged from different positions, thereby achieving complete coverage of the inner wall of the cup. Through the combined action of the guide 21 and the drainage holes 22, the distribution and discharge effect of the cleaning fluid 60 are optimized.

[0032] In one embodiment, the tilt angle of the guide member 21 is adjustable, and the tilt angle adjustment range of the guide member 21 is 10°~45°.

[0033] Specifically, the guide 21 is detachably connected to the lower ring 20. Guides 21 with different tilt angles can be connected to the edge of the lower ring 20 according to actual needs. The tilt angle adjustment range of the guide 21 is 10°~45° so that the discharge range of the cleaning fluid 60 can be adjusted.

[0034] In practical applications, the lower ring 20 is first installed on the cleaning fixture. Based on the area within the cup that needs cleaning, a guide 21 with an appropriate tilt angle is installed at the edge of the lower ring 20. For example, if the upper area of ​​the cup needs cleaning, a guide 21 with a larger tilt angle (e.g., 40°) can be installed at the edge of the lower ring 20. When the cleaning fluid 60 is ejected from the annular reservoir 40, the guide 21 guides the cleaning fluid 60 to flow in a preset direction, allowing it to precisely act on different areas of the inner wall of the cup.

[0035] In one embodiment, an inclined surface 11 is provided on the outer edge of the upper ring body 10, and the angle between the inclined surface 11 and the surface of the upper ring body 10 is 10°~45°.

[0036] Specifically, an inclined surface 11 is formed on the outer edge of the upper ring 10, and the angle between the inclined surface 11 and the surface of the upper ring 10 is 10° to 45°. This design can effectively guide the flow direction of the cleaning fluid 60 and prevent the cleaning fluid 60 from being blocked by the edge of the upper ring 10 during the splashing process.

[0037] Understandably, when the cleaning fluid 60 is ejected from the annular reservoir 40, the inclined surface 11 prevents the edge of the upper ring 10 from blocking the cleaning fluid 60, allowing the cleaning fluid 60 to drain smoothly and ensuring that the cleaning fluid 60 can evenly cover different areas of the inner wall of the cup.

[0038] In one embodiment, the disk body 30 includes a connecting part 31 and a sealing suction cup that are connected to each other. The connecting part 31 has a boss structure. The protrusion of the connecting part 31 is embedded in the inner ring of the upper ring body 10. The bottom of the connecting part 31 is connected to the upper ring body 10. The sealing suction cup is used to connect the rotating disk.

[0039] Specifically, the disc body 30 consists of a connecting part 31 and a sealing suction cup. The connecting part 31 is designed as a boss structure, with its protruding portion embedded in the inner ring of the upper ring body 10 and connected to the bottom of the upper ring body 10. The sealing suction cup is used to connect with the rotating disc to ensure the stability and sealing of the cleaning fixture during rotation.

[0040] It should be noted that the boss structure of the connecting part 31 fits tightly with the inner ring of the upper ring body 10, forming a stable mechanical connection, ensuring that there is no relative displacement between the disc body 30 and the upper ring body 10 during high-speed rotation. The sealing suction cup, through its elastic or adhesive properties, fits tightly with the rotating disc, ensuring that the power of the rotating disc can be efficiently transmitted to the cleaning fixture.

[0041] In practical applications, the protruding part of the connecting part 31 is first precisely embedded into the inner ring of the upper ring body 10, ensuring that the bottom of the connecting part 31 is firmly connected to the upper ring body 10. Then, the sealing suction cup is installed at the bottom of the connecting part 31, making it fit tightly against the rotating disk. When the rotating disk starts to rotate, the cleaning fixture rotates synchronously, and the cleaning fluid 60 flows from the supply area 50 into the annular storage area 40 and is thrown out under the action of centrifugal force to clean the inner wall of the cup.

[0042] In one embodiment, the disc body 30 is concentrically arranged with the upper ring body 10, and the weight of the disc body 30 is greater than the weight of the upper ring body 10 and the lower ring body 20.

[0043] Specifically, the disc body 30 and the upper ring body 10 are concentrically arranged to ensure that they maintain a consistent motion state during rotation. At the same time, the weight of the disc body 30 is designed to be greater than the weight of the upper ring body 10 and the lower ring body 20, thereby adjusting the center of gravity of the entire cleaning fixture by increasing the weight of the disc body 30.

[0044] It should be noted that the distribution of the center of gravity plays a crucial role in the stability of the cleaning fixture during rotation. By making the weight of the disc 30 greater than the weight of the upper ring 10 and the lower ring 20, the center of gravity of the cleaning fixture can be lowered, bringing it closer to the axis of rotation. This distribution of the center of gravity helps reduce vibration and swaying during rotation, ensuring the cleaning fixture remains stable at high speeds, with a smaller moment of inertia, shorter torque, and lower required torque and energy. Simultaneously, the concentric arrangement ensures uniform and consistent rotation, allowing the cleaning fluid 60 to be evenly ejected from the annular reservoir 40, covering all areas of the inner wall of the cup.

[0045] This application embodiment also provides a cup cleaning method, which uses the above-mentioned cleaning fixture for cleaning, including: connecting the plate 30 to the rotating plate; injecting cleaning liquid 60 into the liquid storage area; adjusting the tilt angle of the guide 21; controlling the rotation speed of the rotating plate according to the area of ​​the cup that needs to be cleaned, so as to splash the cleaning liquid 60 from the edge of the liquid storage area to clean the cup.

[0046] Specifically, the cleaning fixture is installed on the coating and developing equipment, ensuring that the disc 30 is securely connected to the rotating disc. Next, an appropriate amount of cleaning fluid 60 is injected into the storage area via an external liquid supply device, filling the annular storage area 40 with liquid. Depending on the area of ​​the cup that needs cleaning, guide members 21 with appropriate tilt angles are installed. For example, if the upper area of ​​the cup needs focused cleaning, guide members 21 with larger tilt angles can be installed at the edge of the lower ring 20, allowing more cleaning fluid 60 to be sprayed upwards. Then, the rotation speed of the rotating disc is controlled according to the needs of the cleaning area. For example, for the bottom area of ​​the cup, the rotation speed can be reduced, causing the cleaning fluid 60 to be ejected from the drain hole 22 at a lower speed; for the upper area of ​​the cup, the rotation speed can be increased, causing the cleaning fluid 60 to be ejected from the guide members 21 at a higher speed. Through this control method, the cleaning fluid 60 can be precisely applied to different areas of the inner wall of the cup, achieving a comprehensive and uniform cleaning effect.

[0047] Please refer to Figure 4 and Figure 5 In one embodiment, controlling the rotation speed of the rotating disk according to the area of ​​the cup body that needs to be cleaned includes: when cleaning the first area 70 of the cup body, controlling the rotation speed of the rotating disk to be lower than a first threshold; when cleaning the second area 80 of the cup body, controlling the rotation speed of the rotating disk to be higher than a second threshold; when cleaning the middle area of ​​the cup body, controlling the rotation speed of the rotating disk to be between the first threshold and the second threshold; wherein the first area 70 is located below the second area 80, and the middle area is located between the first area 70 and the second area 80.

[0048] Specifically, the cleaning needs of different areas are different. By adjusting the rotation speed of the rotating disc, the speed and distribution range of the cleaning fluid 60 can be changed.

[0049] First area 70 (below): A lower rotation speed is required so that the cleaning fluid 60 is thrown out from the drain hole 22 at a slower speed, ensuring that the cleaning fluid 60 can fully cover the area and avoid the cleaning fluid 60 not being evenly distributed due to excessive speed.

[0050] Second zone 80 (above): A higher rotation speed is required to make the cleaning fluid 60 splashed out at a faster speed, ensuring that the cleaning fluid 60 can reach the higher area and achieve effective cleaning.

[0051] Middle area: A moderate rotation speed is required to ensure that the cleaning fluid 60 can evenly cover the middle area, avoiding excessive concentration or dispersion of the cleaning fluid 60.

[0052] In this embodiment, by adjusting the rotation speed, precise cleaning can be achieved according to the cleaning needs of different areas, thus improving the cleaning effect. Adapting to the cleaning needs of different areas ensures that the cleaning solution 60 can evenly cover all areas of the inner wall of the cup, avoiding insufficient or excessive cleaning in certain areas. This reduces repeated cleaning caused by uneven distribution of the cleaning solution 60, improving overall cleaning efficiency.

[0053] In one embodiment, when the tilt angle of the guide 21 is 10° to 45°, the range of the first threshold is 600 rpm to 1200 rpm, and the range of the second threshold is 1200 rpm to 200 rpm; wherein, as the tilt angle of the guide 21 increases, the first threshold shows a trend of first increasing and then decreasing, and the second threshold shows a trend of first increasing and then decreasing.

[0054] Specifically, the tilt angle of the guide member 21 affects the discharge direction and distribution range of the cleaning fluid 60. By adjusting the rotation speed of the rotating disk, the discharge speed and distribution of the cleaning fluid 60 can be further optimized to adapt to the flow characteristics of the cleaning fluid 60 under different tilt angles.

[0055] Lower tilt angle (around 15°): The direction of the cleaning fluid 60 discharge is relatively horizontal, requiring a lower rotation speed to ensure that the cleaning fluid 60 can evenly cover the bottom area of ​​the cup.

[0056] Higher tilt angle (around 40°): The discharge direction of the cleaning fluid 60 is more vertical, requiring a higher rotation speed to ensure that the cleaning fluid 60 can reach the upper area of ​​the cup.

[0057] Medium tilt angle: A moderate rotation speed is needed to balance the distribution of the cleaning fluid 60 and ensure the cleaning effect in the middle area.

[0058] Understandably, as the tilt angle of the guide 21 increases, the discharge direction of the cleaning fluid 60 gradually changes, requiring adjustment of the rotation speed to adapt to this change. Therefore, the first threshold and the second threshold first increase and then decrease with increasing tilt angle to ensure optimal cleaning results at different tilt angles.

[0059] In practical applications, the tilt angle of the guide 21 is first set according to the actual cleaning requirements. For example, when the tilt angle of the guide 21 is set to 15°, the first threshold is set to 800 rpm and the second threshold is set to 1500 rpm. At this time, when cleaning the first area 70 (lower area) of the cup body, the rotation speed of the rotating disk is set to 700 rpm (lower than the first threshold of 800 rpm) so that the cleaning fluid 60 is thrown out from the drain hole 22 into the first area 70; when cleaning the second area 80 (upper area) of the cup body, the rotation speed of the rotating disk is set to 1700 rpm (higher than the second threshold of 1500 rpm) so that the cleaning fluid 60 is thrown out from the guide 21 into the second area 80; when cleaning the middle area, the rotation speed of the rotating disk is set to 1200 rpm.

[0060] By adjusting the rotation speed according to the tilt angle of the guide 21, it can be ensured that the cleaning fluid 60 can be ejected at the most suitable speed and direction at different tilt angles, achieving precise cleaning of different areas of the cup and significantly improving the cleaning effect and efficiency.

[0061] In one embodiment, adjusting the tilt angle of the guide 21 includes: when the cleanliness of the second region 80 is lower than that of the first region 70, the tilt angle of the guide 21 increases.

[0062] Specifically, when the cleanliness of the second region 80 (upper region) of the cup is detected to be lower than that of the first region 70 (lower region), the tilt angle of the guide 21 is gradually increased. In this way, the discharge direction and distribution of the cleaning fluid 60 can be changed, allowing more cleaning fluid 60 to act on the second region 80, thereby improving its cleanliness. Understandably, the tilt angle of the guide 21 directly affects the discharge direction and distribution range of the cleaning fluid 60. Increasing the tilt angle of the guide 21 can make the discharge direction of the cleaning fluid 60 more biased towards the second region 80 (upper region), thereby increasing the flow rate and impact force of the cleaning fluid 60 in this region and improving the cleaning effect. By dynamically adjusting the tilt angle, the distribution of the cleaning fluid 60 can be optimized in real time according to the actual cleanliness requirements of different regions, ensuring that the cleanliness of each region is consistent. The principle for cleaning the first region 70 is the same and will not be elaborated here.

[0063] The above description is merely a specific implementation of the embodiments of this application, but the protection scope of the embodiments of this application is not limited thereto. Any changes or substitutions within the technical scope disclosed in the embodiments of this application should be covered within the protection scope of the embodiments of this application. Therefore, the protection scope of the embodiments of this application should be determined by the protection scope of the claims.

Claims

1. A cleaning fixture for cleaning cups on a coating and developing equipment, characterized in that, It includes an upper ring body, a disc body, and a lower ring body; The upper ring body and the lower ring body are concentric and connected at intervals. The inner ring diameter of the upper ring body is smaller than the inner ring diameter of the lower ring body. The gap between the upper ring body and the lower ring body forms an annular liquid storage area for storing cleaning liquid. The disc body is connected to the side of the upper ring body facing the lower ring body. The disc body is used to connect to an external rotating disc. The diameter of the disc body is larger than the inner ring diameter of the upper ring body and smaller than the inner ring diameter of the lower ring body. The area between the inner ring of the lower ring body and the disc body forms a liquid supply area that communicates with the annular liquid storage area. The liquid supply area is used to connect to an external liquid supply device. The rotating disk drives the upper and lower rings to rotate synchronously, causing the cleaning fluid to drain from the edge of the annular storage area to the cup body to clean the cup body.

2. The cleaning fixture according to claim 1, characterized in that, A guide is connected to the edge of the lower ring body, and the guide is inclined toward the upper ring body. The guide is used to adjust the discharge direction of the cleaning fluid. The lower ring body has multiple drainage holes evenly distributed circumferentially on the surface near the guide member for discharging the cleaning fluid.

3. The cleaning fixture according to claim 2, characterized in that, The tilt angle of the guide is adjustable, and the adjustment range of the tilt angle of the guide is 10°~45°.

4. The cleaning fixture according to claim 3, characterized in that, An inclined surface is provided on the outer edge of the upper ring body, and the angle between the inclined surface and the surface of the upper ring body is 10°~45°.

5. The cleaning fixture according to claim 1, characterized in that, The disc body includes a connecting part and a sealing suction cup that are connected to each other. The connecting part has a boss structure. The protrusion of the connecting part is embedded in the inner ring of the upper ring body. The bottom of the connecting part is connected to the upper ring body. The sealing suction cup is used to connect the rotating disc.

6. The cleaning fixture according to claim 1, characterized in that, The disc body and the upper ring body are concentrically arranged, and the weight of the disc body is greater than the weight of the upper ring body and the lower ring body.

7. A cup cleaning method, comprising cleaning using the cleaning fixture described in any one of claims 1-6, characterized in that, include: Connect the disc body to the rotating disc; Inject cleaning fluid into the storage area; Adjust the tilt angle of the guide component; The rotation speed of the rotating disk is controlled according to the area of ​​the cup body that needs to be cleaned, so as to splash the cleaning liquid from the edge of the liquid storage area to clean the cup body.

8. The cup cleaning method according to claim 7, characterized in that, The rotation speed of the rotating disk is controlled according to the area of ​​the cup that needs to be cleaned, including: When cleaning the first area of ​​the cup, the rotation speed of the rotating disk is controlled to be lower than a first threshold. When cleaning the second area of ​​the cup, the rotation speed of the rotating disk is controlled to be higher than the second threshold. When cleaning the middle area of ​​the cup, the rotation speed of the rotating disk is controlled to be between a first threshold and a second threshold. The first region is located below the second region, and the middle region is located between the first region and the second region.

9. The cup cleaning method according to claim 8, characterized in that, When the tilt angle of the guide is 10° to 45°, the range of the first threshold is 600 rpm to 1200 rpm, and the range of the second threshold is 1200 rpm to 2000 rpm. As the tilt angle of the guide increases, the first threshold first increases and then decreases, and the second threshold first increases and then decreases.

10. The cup cleaning method according to claim 9, characterized in that, The tilt angle of the adjusting guide includes: When the cleanliness of the second area is lower than that of the first area, the tilt angle of the guide increases.

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