Multi-component alloy electrode plasma surface modification treatment equipment

Abstract

The invention discloses multi-component alloy electrode plasma surface modification treatment equipment, and particularly relates to the field of plasma surface modification treatment.The equipment comprises a vacuum cavity, a box door is arranged on the outer side of the vacuum cavity, and an inflation mechanism, a vacuum mechanism and a waste gas treatment mechanism are arranged on the outer side of the vacuum cavity; a detection mechanism, an electrifying mechanism and a limiting mechanism are mounted in the vacuum cavity, and the limiting mechanism comprises a metal grid plate. Through the arrangement of the detection mechanism and the limiting mechanism, ions in the plasma are controlled to move within a certain range by utilizing an electric field force generated by bias voltage, so that the generation rate of the ions in the plasma is not influenced while gas in the vacuum cavity is exhausted, and meanwhile, according to the concave-convex condition of the surface of a material, the plasma can be accurately detected. The ion spraying rate and the ion generation rate are controlled, the working time of the device is shortened, and the working efficiency of the device is improved.

Description

Technical Field

[0001] This invention relates to the field of plasma surface modification technology, and more specifically, to a plasma surface modification device for multi-element alloy electrodes. Background Technology

[0002] Multi-element alloy electrode plasma usually refers to the ionized gas state produced by the interaction of an alloy composed of multiple metallic elements with the surrounding medium under specific conditions (such as high voltage, high temperature or gas discharge environment).

[0003] Existing plasma surface modification equipment for multi-alloy electrodes is an industrial device that uses plasma technology to clean, activate, etch, or coat the surface of materials. Its core lies in using the physical or chemical reaction between ionized gas and the material surface to improve surface properties such as adhesion, wettability, and wear resistance.

[0004] In the process of cleaning materials using multi-alloy electrode plasma cleaning equipment, high-energy ions bombard the surface to decompose organic matter. Free radicals react with oxides to generate volatile substances such as CO2 and H2O. The generated CO2 and H2O molecules increase the total number of gas molecules in the chamber, which may change the mean free path of electrons and neutral particles, thus affecting the ionization efficiency and stability of the plasma. Therefore, it is necessary to remove CO2 and H2O molecules in a timely manner. Existing methods for removing CO2 and H2O molecules allow the vacuum pumping system to directly discharge them. However, in this process, some ions are extracted out of the chamber along with the gas molecules, resulting in a decrease in the ion concentration inside the chamber. Since the device cannot control the ion generation rate according to the condition of the material surface, cleaning the material in this way will greatly prolong the working time of the equipment and reduce the working efficiency of the device. Furthermore, the gases directly discharged through the vacuum system during this process, such as sulfur-containing gas molecules and CO2, will pollute the environment, which is inconsistent with the concept of environmental protection. Summary of the Invention

[0005] The present invention provides a plasma surface modification treatment device for multi-electrode alloy electrodes. The problem to be solved is that the existing multi-electrode alloy electrode plasma generates gas molecules when cleaning materials. When the gas molecules are vacuumed, the generated ions are also expelled with the gas molecules, which leads to a decrease in ion concentration, prolongs the cleaning time of the device, and reduces the working efficiency of the device.

[0006] To achieve the above objectives, the present invention provides the following technical solution: a multi-alloy electrode plasma surface modification treatment device, comprising a vacuum chamber, an air filling mechanism, a vacuum mechanism and a waste gas treatment mechanism arranged on the outside of the vacuum chamber, a detection mechanism, a power supply mechanism and a limiting mechanism installed inside the vacuum chamber, the limiting mechanism comprising a metal grid plate, the metal grid plate being disposed inside the vacuum chamber, a support block being fixedly connected to the outside of the metal grid plate, a protective sleeve being fixedly connected between the metal grid plate and the vacuum chamber, a bias voltage power supply being fixedly connected to the outside of the vacuum chamber, and connecting wires being arranged inside the protective sleeve; The testing mechanism includes a laser profilometer, which is fixedly connected inside a vacuum chamber. A fixed block is fixedly connected inside the vacuum chamber. A slide groove is provided on the upper side of the fixed block. A hydraulic rod and an L-shaped plate are provided inside the slide groove. A fixed plate is fixedly connected to the upper side of the L-shaped plate. A hydraulic rod is fixedly connected to the outer side of the fixed plate. A push plate is fixedly connected to the output end of the hydraulic rod. The exhaust gas treatment system includes a treatment box. Pipes three and four are fixedly connected to the outside of the treatment box. Gas tank two is movably connected to the end of pipe four away from the treatment box. A one-way valve is fixedly connected to the inside of the end of pipe four near gas tank two. Valve two and an infrared carbon dioxide detector are installed on the outside of pipe four.

[0007] In a preferred embodiment, the inflation mechanism includes an air tank, which is disposed on the outside of the vacuum chamber. An air pipe is movably connected to the outlet end of the air tank. A dual-axis module is fixedly connected inside the vacuum chamber. A nozzle is fixedly connected to the output moving end of the dual-axis module. A valve and a pressure reducing valve are disposed on the outside of the vacuum chamber via the air pipe.

[0008] In a preferred embodiment, the end of the air pipe away from the air tank passes through the vacuum chamber and is fixedly connected to the nozzle. The air pipe is located in a section of the vacuum chamber and is fixedly connected to the vacuum chamber. A semi-circular block is fixedly connected to the outside of the dual-axis module. Two semi-circular blocks are provided. The air pipe is located in a section of the vacuum chamber and passes through the semi-circular block.

[0009] In a preferred embodiment, the power supply mechanism includes a high-frequency high-voltage power supply, which is fixedly connected to the outside of the vacuum chamber. A square plate is fixedly connected to the inside of the vacuum chamber, a cathode plate is fixedly connected to the outside of the square plate, an anode plate is fixedly connected to the inside of the vacuum chamber, and a coaxial cable is fixedly connected to the outside of the high-frequency high-voltage power supply.

[0010] In a preferred embodiment, two coaxial cables are provided. The ends of the two coaxial cables away from the high-frequency high-voltage power supply pass through the vacuum cavity, and the two coaxial cables are fixedly connected to the cathode plate and the anode plate, respectively. The ends of the two coaxial cables located in the vacuum cavity are fixedly connected to the vacuum cavity.

[0011] In a preferred embodiment, the vacuum mechanism includes a vacuum pump, which is fixedly connected to the outside of the vacuum chamber. A square hole is opened inside the vacuum chamber, and a square slot is provided on the outside of the square hole. The slot of the square slot is fixedly connected to the vacuum chamber. A pipe is fixedly connected between the vacuum pump and the square slot, and a pipe is fixedly connected to the output end of the vacuum pump.

[0012] In a preferred embodiment, a vacuum gauge is fixedly connected to the outside of the vacuum chamber, a three-way valve is provided on the outside of the second pipe, and the end of the third pipe away from the processing box is fixedly connected to the three-way valve.

[0013] In a preferred embodiment, a door is provided on the outside of the vacuum chamber, and an operation screen device is provided on the outside of the door. The processing box includes a box body, which is located on the outside of the vacuum chamber. A box cover is movably connected to the outside of the box body. A threaded groove is provided on the outside of the box body, and a threaded hole is provided on the outside of the box cover. There are four threaded grooves and four threaded holes. Bolts are provided inside the threaded grooves and the corresponding threaded holes. The bolts are threadedly connected to the box body and the box cover.

[0014] In a preferred embodiment, four support blocks are provided. The end of the support block away from the metal grid plate is fixedly connected to the vacuum cavity. The upper end of the connecting wire is fixedly connected to the metal grid plate. The lower end of the connecting wire passes through the vacuum cavity and is fixedly connected to the output terminal of the bias voltage power supply.

[0015] In a preferred embodiment, one end of the hydraulic rod is fixedly connected to the vacuum chamber, and the other end of the hydraulic rod is fixedly connected to the L-shaped plate. The L-shaped plate and the fixed block are slidably connected. A material block is provided on the outer side of the L-shaped plate. The push plate is U-shaped and is slidably connected to the L-shaped plate. The material block is provided on the inner side of the push plate.

[0016] The beneficial effects of this invention are as follows: This invention, through the setting of detection and limiting mechanisms, uses the electric field force generated by bias voltage to control the movement of ions inside the plasma within a certain range, allowing the gas inside the vacuum chamber to be discharged without affecting the ion generation rate in the plasma. At the same time, it can control the spraying ion rate and ion generation rate according to the unevenness of the material surface, reducing the working time of the device and increasing the working efficiency of the device.

[0017] The present invention facilitates the storage of CO2 in the waste gas generated during the cleaning of materials by setting up a waste gas treatment mechanism, thereby enabling the recovery and reuse of CO2. Attached Figure Description

[0018] Figure 1 This is a schematic diagram of the overall structure of the present invention.

[0019] Figure 2 This is a schematic diagram of part of the energizing mechanism of the present invention.

[0020] Figure 3 This is a partial structural diagram of the present invention.

[0021] Figure 4 This is a schematic diagram of the structure of some of the detection mechanisms of the present invention.

[0022] Figure 5 This is a schematic diagram of the limiting mechanism of the present invention.

[0023] Figure 6 This is a schematic diagram of the structure of another part of the present invention: the energizing mechanism and the vacuum mechanism.

[0024] Figure 7 This is a schematic diagram of the waste gas treatment mechanism of the present invention.

[0025] Figure 8 This is a schematic diagram of the processing box of the present invention.

[0026] The attached diagram is labeled as follows: 1. Vacuum chamber; 2. Box door; 3. Inflation mechanism; 31. Gas tank one; 32. Gas pipe; 33. Dual-axis module; 34. Nozzle; 35. Valve one; 36. Pressure reducing valve; 4. Detection mechanism; 41. Laser profilometer; 42. Fixing block; 43. Slide groove; 44. Hydraulic rod one; 45. L-shaped plate; 46. Fixing plate; 47. Hydraulic rod two; 48. Push plate; 49. Operation panel equipment; 5. Power supply mechanism; 51. High-frequency high-voltage power supply; 52. Square plate; 53. Coaxial cable; 54. Cathode plate; 55. Anode plate; 6. Restriction mechanism; 1. Metal mesh plate; 62. Support block; 63. Protective sleeve; 64. Bias voltage power supply; 65. Connecting wire; 7. Vacuum mechanism; 71. Vacuum pump; 72. Square hole; 73. Square groove block; 74. Pipe 1; 75. Pipe 2; 76. Vacuum gauge; 77. Three-way valve; 8. Waste gas treatment mechanism; 81. Treatment box; 811. Box body; 812. Box cover; 813. Threaded groove; 814. Threaded hole; 815. Bolt; 82. Pipe 3; 83. Pipe 4; 84. Gas tank 2; 85. Valve 2; 86. Infrared carbon dioxide detector; 9. Material block. Detailed Implementation

[0027] The present application will now be described in further detail with reference to the accompanying drawings. It should be noted that the following specific embodiments are only used to further illustrate the present application and should not be construed as limiting the scope of protection of the present application. Those skilled in the art can make some non-essential improvements and adjustments to the present application based on the above application content.

[0028] Refer to the instruction manual appendix Figure 1 , Figure 2 , Figure 3 , Figure 4 , Figure 5 and Figure 7 A multi-alloy electrode plasma surface modification treatment device includes a vacuum chamber 1, a door 2 on the outside of the vacuum chamber 1, an inflation mechanism 3, a vacuum mechanism 7 and a waste gas treatment mechanism 8 on the outside of the vacuum chamber 1, a detection mechanism 4, a power supply mechanism 5 and a limiting mechanism 6 installed inside the vacuum chamber 1, the limiting mechanism 6 includes a metal mesh plate 61, the metal mesh plate 61 is disposed inside the vacuum chamber 1, a support block 62 is fixedly connected to the outside of the metal mesh plate 61, a protective sleeve 63 is fixedly connected between the metal mesh plate 61 and the vacuum chamber 1, a bias voltage power supply 64 is fixedly connected to the outside of the vacuum chamber 1, and a connecting wire 65 is disposed inside the protective sleeve 63; The testing mechanism 4 includes a laser profilometer 41, which is fixedly connected inside the vacuum chamber 1. A fixed block 42 is fixedly connected inside the vacuum chamber 1. A slide groove 43 is provided on the upper side of the fixed block 42. A hydraulic rod 44 and an L-shaped plate 45 are arranged inside the slide groove 43. A fixed plate 46 is fixedly connected to the upper side of the L-shaped plate 45. A hydraulic rod 47 is fixedly connected to the outer side of the fixed plate 46. A push plate 48 is fixedly connected to the output end of the hydraulic rod 47. An operation screen device 49 is provided on the outer side of the door 2. The exhaust gas treatment mechanism 8 includes a treatment box 81. Pipeline 3 82 and pipeline 4 83 are fixedly connected to the outside of the treatment box 81. Gas tank 2 84 is movably connected to the end of pipeline 4 83 away from the treatment box 81. A one-way valve is fixedly connected to the inside of the end of pipeline 4 83 near gas tank 2 84. Valve 2 85 and infrared carbon dioxide detector 86 are installed on the outside of pipeline 4 83.

[0029] It should be noted that the door 2 is equipped with a transparent glass panel, the height of the fixing block 42 is equal to the height of the mesh metal plate, and the lowest point of the square plate 52 is higher than the highest point of the push plate 48.

[0030] In this embodiment, the specific implementation scenario is as follows: After placing the material block 9 inside the vacuum chamber 1, the laser profilometer 41 is first activated to transmit the data on the surface irregularities of the material block 9 to the operating screen device 49. Then, hydraulic rod 1 44 is activated, moving the L-shaped block until it adheres to the metal mesh plate 61. At this point, hydraulic rod 1 44 is closed, and hydraulic rod 2 47 is activated, moving the push plate 48. The push plate 48 moves the material block 9 along the upper surface of the L-shaped block until it is pushed onto the metal mesh plate 61. After other conditions for the material block 9 are met, the bias voltage power supply 64 is activated to energize the metal mesh plate 61. The electric field force generated by the energized metal mesh plate 61 confines the ions within a certain range. The gas ejected from the nozzle 34 carries these high-energy ions to bombard the surface of the material block 9, cleaning impurities. The high-energy particles react with and remove organic matter on the surface of the material block 9. When the reaction gas is introduced, the vacuum chamber 1 is opened. The air pump 71 opens the three-way valve 77 to allow the third pipe 82 to pass through, and the end of the second pipe 75 away from the three-way valve 77 is closed. At this time, according to the data of the vacuum gauge 76, a vacuum is formed inside the reaction chamber. The cleaning of the material block 9 will produce by-product gas molecules. The gas molecules will enter the square slot block 73 through the square hole 72, and then enter the third pipe 82 through the first pipe 74 and part of the second pipe 75. Then the gas passes through the treatment box 81 to absorb and treat the gas except for the gaseous carbon dioxide. Then the untreated gaseous carbon dioxide enters the gas tank 84 through the fourth pipe 83. Through the setting of the detection mechanism 4 and the limiting mechanism, the electric field force generated by the bias voltage is used to control the ions inside the plasma to move within a certain range, so that the gas inside the vacuum chamber 1 is discharged without affecting the ion generation rate in the plasma. At the same time, the spraying ion rate and ion generation rate can be controlled according to the unevenness of the material surface, reducing the working time of the device and increasing the working efficiency of the device.

[0031] Refer to the instruction manual appendix Figure 1 and Figure 3 The inflation mechanism 3 includes an air tank 31, which is located on the outside of the vacuum chamber 1. An air pipe 32 is movably connected to the outlet end of the air tank 31. A dual-axis module 33 is fixedly connected inside the vacuum chamber 1. A nozzle 34 is fixedly connected to the output moving end of the dual-axis module 33. A valve 35 and a pressure reducing valve 36 are provided on the outside of the vacuum chamber 1.

[0032] It should be noted that, with Figure 1 From the perspective of frontal view, valve 35 is located to the left of pressure reducing valve 36. Valve 35 is used to control the addition of reaction gas, and pressure reducing valve 36 is used to control the airflow speed in gas pipe 32. The dual-axis module 33 includes an X-axis and a Y-axis.

[0033] Refer to the instruction manual appendix Figure 1 and Figure 3 The end of the air pipe 32 away from the air tank 31 passes through the vacuum chamber 1 and is fixedly connected to the nozzle 34. The air pipe 32 is located in a section of the vacuum chamber 1 and is fixedly connected to the vacuum chamber 1. A semi-circular block is fixedly connected to the outside of the dual-axis module 33. There are two semi-circular blocks. The air pipe 32 is located in a section of the vacuum chamber 1 and passes through the semi-circular block.

[0034] It should be noted that the detection mechanism 4 is used to detect the unevenness of the surface of the material block 9 and transmit the data to the operation screen device 49. Then, the data is transmitted to the dual-axis module 33 to control the movement of the nozzle 34, and then controls the ion spray to spray onto the surface of the material block 9, thereby cleaning the material block 9.

[0035] Refer to the instruction manual appendix Figure 2 and Figure 6 The power supply mechanism 5 includes a high-frequency high-voltage power supply 51, which is fixedly connected to the outside of the vacuum chamber 1. A square plate 52 is fixedly connected inside the vacuum chamber 1. A cathode plate 54 is fixedly connected to the outside of the square plate 52. An anode plate 55 is fixedly connected inside the vacuum chamber 1. A coaxial cable 53 is fixedly connected to the outside of the high-frequency high-voltage power supply 51.

[0036] It should be noted that the cathode plate 54 and anode plate 55 are parallel and perpendicular to each other, and the plates are made of multi-element alloy materials. The height of the metal mesh plate 61 does not exceed the minimum height of the cathode plate 54 and anode plate 55, while the minimum height of the nozzle 34 is greater than the maximum height of the cathode plate 54 and anode plate 55. This ensures that the metal mesh plate 61 and nozzle 34 will not be damaged by electric shock. Figure 1 From a frontal viewing angle, the square plate 52 is positioned on the left side of the dual-axis module 33, and the metal mesh plate 61 is positioned on the lower side of the dual-axis module 33. The fixing block 42 is positioned on the left side inside the vacuum chamber 1 and on the left side of the square plate 52. The laser profilometer 41 is also positioned on the left side of the square plate 52. The cathode plate 54 is fixedly connected to the right side of the square plate, and the anode plate 55 is fixedly connected to the right side inside the vacuum chamber 1. The square hole 72 is opened on the right side inside the vacuum chamber 1, and the square groove block 73 is positioned on the right side of the vacuum chamber 1.

[0037] Refer to the instruction manual appendix Figure 2 and Figure 6 Two coaxial cables 53 are provided. The ends of the two coaxial cables 53 away from the high-frequency high-voltage power supply 51 pass through the vacuum chamber 1. The two coaxial cables 53 are fixedly connected to the cathode plate 54 and the anode plate 55 respectively. The ends of the two coaxial cables 53 located in the vacuum chamber 1 are fixedly connected to the vacuum chamber 1.

[0038] It should be noted that the coaxial cable 53 installed inside the vacuum chamber 1 is relatively short, and the two coaxial cables 53 are perpendicular to the cathode plate 54 and the anode plate 55, respectively.

[0039] Refer to the instruction manual appendix Figure 1 and Figure 8 The vacuum mechanism 7 includes a vacuum pump 71, which is fixedly connected to the outside of the vacuum chamber 1. A square hole 72 is opened inside the vacuum chamber 1, and a square slot 73 is provided on the outside of the square hole 72. The slot opening of the square slot 73 is fixedly connected to the vacuum chamber 1. A pipe 74 is fixedly connected between the vacuum pump 71 and the square slot 73, and a pipe 75 is fixedly connected to the output end of the vacuum pump 71.

[0040] It should be noted that, with Figure 1 For a frontal view, the square hole 72 is located on the right side near the limiting mechanism, that is, the square hole 72 is opened at the bottom right side inside the vacuum chamber 1. It works in conjunction with the square groove to facilitate the absorption and treatment of the gas generated during the cleaning process of the material block 9, and to prevent the gas generated during the cleaning of the material block 9 from drifting to the cathode plate 54 and anode plate 55 and being re-ionized.

[0041] Refer to the instruction manual appendix Figure 6 and Figure 7 A vacuum gauge 76 is fixedly connected to the outside of the vacuum chamber 1, a three-way valve 77 is installed on the outside of the second pipe 75, and the end of the third pipe 82 away from the processing box 81 is fixedly connected to the three-way valve 77.

[0042] It should be noted that the vacuum gauge 76 is used to constantly detect and maintain the vacuum condition inside the vacuum chamber 1, and the three-way valve 77 facilitates the control of the gas flow direction.

[0043] Refer to the instruction manual appendix Figure 8 The processing box 81 includes a box body 811, which is located outside the vacuum chamber 1. A box cover 812 is movably connected to the outside of the box body 811. A threaded groove 813 is provided on the outside of the box body 811, and a threaded hole 814 is provided on the outside of the box cover 812. There are four threaded grooves 813 and four threaded holes 814. Bolts 815 are provided inside the threaded grooves 813 and the corresponding threaded holes 814. The bolts 815 are threadedly connected to the box body 811 and to the box cover 812.

[0044] It should be noted that the interior of the treatment chamber 81 is used for activated carbon treatment, and the activated carbon is layered according to its purpose to remove gases such as carbon dioxide, water molecules, small molecule hydrocarbons such as methane and ethylene, nitrogen oxides such as nitric oxide and nitrogen dioxide, and sulfur compounds such as sulfur dioxide. The treatment chamber 81 is detachable, which facilitates the replacement of the activated carbon structure. The lower side of the chamber cover 812 is provided with a sealing block to prevent gas from escaping.

[0045] Refer to the instruction manual appendix Figure 5 There are four support blocks 62. The end of the support block 62 away from the metal grid plate 61 is fixedly connected to the vacuum chamber 1. The upper end of the connecting wire 65 is fixedly connected to the metal grid plate 61. The lower end of the connecting wire 65 passes through the vacuum chamber 1 and is fixedly connected to the output end of the bias voltage power supply 64.

[0046] It should be noted that the protective sleeve 63 is used to protect the connecting wire 65 from damage by external objects and extend the service life of the connecting wire 65, and the support block is used to support the metal mesh plate 61.

[0047] Refer to the instruction manual appendix Figure 4 One end of the hydraulic rod 44 is fixedly connected to the vacuum chamber 1, and the other end of the hydraulic rod 44 is fixedly connected to the L-shaped plate 45. The L-shaped plate 45 and the fixing block 42 are slidably connected. A material block 9 is provided on the outer side of the L-shaped plate 45. The push plate 48 is U-shaped and is slidably connected to the L-shaped plate 45. The material block 9 is provided on the inner side of the push plate 48.

[0048] It should be noted that the L-shaped plate 45 and the fixing block 42 are parallel, which makes it easier to push the material block 9 onto the upper side of the metal grid plate 61.

[0049] In this embodiment, the specific implementation scenario is as follows: when the staff prepares to clean material block 9, Figure 1From the main perspective, firstly, the chamber door 2 is opened, then the material block 9 is placed inside the push plate 48 on the upper side of the L-shaped block of the detection mechanism 4, aligning the material block 9 with the laser profilometer 41. Then, the chamber door 2 is closed. Next, the laser profilometer 41 is activated, transmitting data on the surface irregularities of the material block 9 to the operating screen device 49. Then, hydraulic rod 1 44 is activated, moving the L-shaped block until it is flush with the metal mesh plate 61. At this point, hydraulic rod 1 44 is closed, and hydraulic rod 2 47 is activated, moving the push plate 48. The push plate 48 moves the material block 9 along the upper surface of the L-shaped block until it is pushed onto the metal mesh plate 61. Then, the vacuum pump 71 is activated, and the three-way valve 77 is opened to connect the pipeline. Pipeline 75 is open, and pipe 82 is closed. Vacuum pump 71 expels air from inside vacuum chamber 1 through square hole 72, square slot 73, and pipes 74 and 75. The vacuum state inside vacuum chamber 1 is monitored in real time by vacuum gauge 76. When the reaction chamber is under vacuum, valve 35 is opened, and the reaction gas inside gas tank 31 is introduced into nozzle 34 through gas pipe 32. At the same time, high-frequency high-voltage power supply 51 is activated, supplying electricity to cathode plate 54 and anode plate 55. The reaction gas ejected from nozzle 34 is ionized into ions, thus forming plasma. Simultaneously, bias voltage power supply 64 is activated, energizing metal mesh plate 61. The electric field force generated by the energized metal mesh plate 61 confines the ions within a certain range. The gas ejected from nozzle 34 carries high-energy ions to bombard the surface of material block 9, cleaning impurities. The dual-axis module 33 obtains the surface roughness data of material block 9 from the control panel 49, and then moves nozzle 34 according to the data from a camera on the upper side of the vacuum chamber 1, bombarding material block 9 with ions. When nozzle 34 encounters a concave side of material block 9, pressure relief valve 36 is adjusted to increase the airflow pressure, thus increasing the bombardment force. When nozzle 34 encounters a convex side, airflow pressure in gas pipe 32 is reduced to decrease the bombardment force. Thus, the device adjusts the airflow pressure, i.e., the bombardment force, according to the unevenness of the material block 9's surface. To facilitate the cleaning of material block 9, when the reaction gas is introduced, the vacuum pump 71 is turned on, the three-way valve 77 is opened to allow pipe three 82 to be open, and the end of pipe two 75 away from the three-way valve 77 is closed. At this time, according to the data of vacuum gauge 76, a vacuum is formed inside the reaction chamber. Cleaning material block 9 will produce by-product gas molecules. The gas molecules will enter the square slot block 73 through the square hole 72, and then enter pipe three 82 through pipe one 74 and part of pipe two 75. Then the gas passes through the treatment box 81 to absorb and treat the gas except for carbon dioxide. Then the untreated carbon dioxide gas enters the gas tank two 84 through pipe four 83. The infrared carbon dioxide detector 86 detects the concentration of carbon dioxide in pipe four 83.Once the carbon dioxide concentration inside the pipeline drops below 99.5%, valve 2 (85) is closed. This indicates that the activated carbon structure inside the treatment chamber 81 needs to be disassembled and replaced. When the activated carbon inside the treatment chamber 81 needs to be replaced, the worker rotates bolt 815 out of the threaded groove 813 and threaded hole 814, then holds the cover 812 and slides it out of the chamber 811 with the sealing block. After replacing the activated carbon, the worker then holds the cover 812 again and slides it back into the chamber 811 with the sealing block. Then, the worker controls bolt 815 to rotate into the threaded groove 813 and threaded hole 814, thus sealing the treatment chamber 81. After cleaning the material block 9, the worker shuts off the power supply mechanism 5 and the vacuum mechanism 7, then restores the pressure inside the vacuum chamber 1, and replaces the material block 9 with a new one for cleaning.

[0050] Working principle: First, the staff should open the box door 2, then place the material block 9 on the L-shaped plate 45 of the detection mechanism 4, close the upper box door 2, and then detect the unevenness of the surface of the material block 9 and transmit the relevant data to the operation screen device 49 for storage.

[0051] Second, the staff then activates the vacuum mechanism 7 to evacuate the interior of the vacuum chamber 1 into a vacuum state.

[0052] Third, the power-on mechanism 5 is then activated to supply power, and at this time the gas-filling structure 3 is activated to blow the reaction gas between the plates. After the reaction gas is ionized, the dual-axis module 33 learns about the surface condition of the material block 9 through the operation screen device 49. At the same time, based on the camera on the upper side inside the vacuum chamber 1, the nozzle 34 is controlled to move to clean the material block 9.

[0053] Fourth, while cleaning material block 9, the vacuum mechanism 7 is activated to draw the generated byproduct gas into the waste gas treatment mechanism 8 for waste gas treatment and to recover the carbon dioxide in it. After cleaning material block 9 is completed, the pressure inside the vacuum chamber 1 is restored. Reaction gas can be directly introduced to restore the internal pressure. Compared with directly introducing air, this can prevent external impurities from adhering to the surface of the cleaned material block 9. After that, the cleaned material block 9 is taken out, and then a new material can be replaced for further processing.

[0054] 5. The activated carbon inside the treatment box 81 can be processed, disassembled and replaced.

[0055] The above embodiments merely illustrate several implementation methods of the present invention, and their descriptions are relatively specific and detailed, but they should not be construed as limiting the scope of the present invention. It should be noted that those skilled in the art can make various modifications and improvements without departing from the concept of the present invention, and these all fall within the protection scope of the present invention.

Claims

1. A plasma surface modification treatment device for multi-electrode alloy electrodes, comprising a vacuum chamber (1), wherein an inflation mechanism (3), a vacuum mechanism (7), and a waste gas treatment mechanism (8) are provided on the outside of the vacuum chamber (1), and a detection mechanism (4), an energizing mechanism (5), and a limiting mechanism (6) are installed inside the vacuum chamber (1), characterized in that: The limiting mechanism (6) includes a metal mesh plate (61), which is disposed inside the vacuum chamber (1). A support block (62) is fixedly connected to the outside of the metal mesh plate (61). A protective sleeve (63) is fixedly connected between the metal mesh plate (61) and the vacuum chamber (1). A bias voltage power supply (64) is fixedly connected to the outside of the vacuum chamber (1). A connecting wire (65) is disposed inside the protective sleeve (63). The detection mechanism (4) includes a laser profilometer (41), which is fixedly connected inside the vacuum chamber (1). A fixed block (42) is fixedly connected inside the vacuum chamber (1). A sliding groove (43) is provided on the upper side of the fixed block (42). A hydraulic rod (44) and an L-shaped plate (45) are provided inside the sliding groove (43). A fixed plate (46) is fixedly connected on the upper side of the L-shaped plate (45). A hydraulic rod (47) is fixedly connected on the outer side of the fixed plate (46). A push plate (48) is fixedly connected to the output end of the hydraulic rod (47). The waste gas treatment mechanism (8) includes a treatment box (81). Pipeline 3 (82) and pipeline 4 (83) are fixedly connected to the outside of the treatment box (81). Pipeline 4 (83) is movably connected to gas tank 2 (84) at the end away from the treatment box (81). A one-way valve is fixedly connected to the inside of the end of pipeline 4 (83) near gas tank 2 (84). Valve 2 (85) and infrared carbon dioxide detector (86) are provided on the outside of pipeline 4 (83).

2. The plasma surface modification equipment for multi-element alloy electrodes according to claim 1, characterized in that: The inflation mechanism (3) includes an air tank (31), which is located on the outside of the vacuum chamber (1). An air pipe (32) is movably connected to the outlet end of the air tank (31). A dual-axis module (33) is fixedly connected inside the vacuum chamber (1). A nozzle (34) is fixedly connected to the output moving end of the dual-axis module (33). A valve (35) and a pressure reducing valve (36) are provided on the outside of the vacuum chamber (1) via the air pipe (32).

3. The plasma surface modification equipment for multi-element alloy electrodes according to claim 2, characterized in that: The end of the air pipe (32) away from the air tank (31) passes through the vacuum chamber (1) and is fixedly connected to the nozzle (34). The air pipe (32) is located in a section of the vacuum chamber (1) and is fixedly connected to the vacuum chamber (1). A semi-circular block is fixedly connected to the outside of the dual-axis module (33). There are two semi-circular blocks. The air pipe (32) is located in a section of the vacuum chamber (1) and passes through the semi-circular block.

4. The plasma surface modification equipment for multi-element alloy electrodes according to claim 3, characterized in that: The power supply mechanism (5) includes a high-frequency high-voltage power supply (51), which is fixedly connected to the outside of the vacuum chamber (1). A square plate (52) is fixedly connected inside the vacuum chamber (1). A cathode plate (54) is fixedly connected to the outside of the square plate (52). An anode plate (55) is fixedly connected to the inside of the vacuum chamber (1). A coaxial cable (53) is fixedly connected to the outside of the high-frequency high-voltage power supply (51).

5. The plasma surface modification equipment for multi-element alloy electrodes according to claim 4, characterized in that: Two coaxial cables (53) are provided. The ends of the two coaxial cables (53) away from the high-frequency high-voltage power supply (51) pass through the vacuum cavity (1). The two coaxial cables (53) are fixedly connected to the cathode plate (54) and the anode plate (55) respectively. The ends of the two coaxial cables (53) are fixedly connected to the vacuum cavity (1).

6. The plasma surface modification equipment for multi-element alloy electrodes according to claim 5, characterized in that: The vacuum mechanism (7) includes a vacuum pump (71), which is fixedly connected to the outside of the vacuum chamber (1). A square hole (72) is opened inside the vacuum chamber (1), and a square slot (73) is provided on the outside of the square hole (72). The slot of the square slot (73) is fixedly connected to the vacuum chamber (1). A pipe (74) is fixedly connected between the vacuum pump (71) and the square slot (73), and a pipe (75) is fixedly connected to the output end of the vacuum pump (71).

7. The plasma surface modification equipment for multi-element alloy electrodes according to claim 6, characterized in that: A door (2) is provided on the outside of the vacuum chamber (1), and an operation panel device (49) is provided on the outside of the door (2). A vacuum gauge (76) is fixedly connected to the outside of the vacuum chamber (1). A three-way valve (77) is provided on the outside of the second pipe (75). The end of the third pipe (82) away from the processing box (81) is fixedly connected to the three-way valve (77).

8. The plasma surface modification equipment for multi-element alloy electrodes according to claim 7, characterized in that: The processing box (81) includes a box body (811), which is located on the outside of the vacuum chamber (1). A box cover (812) is movably connected to the outside of the box body (811). A threaded groove (813) is provided on the outside of the box body (811), and a threaded hole (814) is provided on the outside of the box cover (812). There are four threaded grooves (813) and four threaded holes (814). Bolts (815) are provided inside the threaded grooves (813) and the corresponding threaded holes (814). The bolts (815) are threadedly connected to the box body (811) and to the box cover (812).

9. The plasma surface modification equipment for multi-element alloy electrodes according to claim 8, characterized in that: Four support blocks (62) are provided. The end of the support block (62) away from the metal grid plate (61) is fixedly connected to the vacuum cavity (1). The upper end of the connecting wire (65) is fixedly connected to the metal grid plate (61). The lower end of the connecting wire (65) passes through the vacuum cavity (1) and is fixedly connected to the output end of the bias voltage power supply (64).

10. The plasma surface modification equipment for multi-element alloy electrodes according to claim 9, characterized in that: One end of the hydraulic rod (44) is fixedly connected to the vacuum chamber (1), and the other end of the hydraulic rod (44) is fixedly connected to the L-shaped plate (45). The L-shaped plate (45) is slidably connected to the fixing block (42). A material block (9) is provided on the outer side of the L-shaped plate (45). The push plate (48) is U-shaped. The push plate (48) is slidably connected to the L-shaped plate (45). The material block (9) is provided on the inner side of the push plate (48).

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