Gas delivery system applied to ion implanter

Abstract

The invention discloses a gas delivery system applied to an ion implanter, and relates to the technical field of ion implantation equipment. The gas conveying system is used for conveying gas to a vacuum chamber of the ion implanter and comprises a high-pressure gas conveying unit, a low-pressure gas conveying unit, a gas purging unit and a main pipeline connected with the vacuum chamber, the high-pressure gas conveying unit for conveying the high-pressure gas and the low-pressure gas conveying unit for conveying the low-pressure gas are arranged according to the pressure of the process gas, and meanwhile, the pressure monitoring devices are arranged in the corresponding conveying units, so that the strict requirements of ion implantation on gas parameters can be met; the whole device not only ensures accurate regulation and control of high-pressure / low-pressure gas, but also improves the equipment reliability through targeted purging and multi-layer protection, finally realizes double improvement of process stability and operation safety, and ensures the ion generation efficiency and stability of the ion source.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of ion implantation equipment, and more particularly to a gas delivery system applied to an ion implanter. BACKGROUND

[0002] In a wafer processing process, ion implantation is a core process for wafer doping, which finally completes ion implantation into a wafer through ion generation, extraction, filtering, acceleration, screening, scanning and parallelization and other steps. Among them, the gas delivery and purging system plays a crucial role in ion generation, which quantitatively, safely and stably delivers the required process gas to the ion source. The ion source generates electrons by heating the filament, and the electrons collide with the process gas at high speed under the action of the source magnetic field, thereby generating the required ions.

[0003] The ion generation efficiency and stability of the ion source directly depend on the delivery quality of the process gas, so the gas delivery system is a key component of the ion implanter.

[0004] The existing gas delivery system of the ion implanter has the following defects: (1) the toxicity and pressure characteristics of the process gas are not differentiated for control, the same delivery path and control logic are used for non-toxic high-pressure gas and toxic low-pressure gas, which increases the risk of toxic gas leakage and makes it difficult to meet the delivery accuracy requirements of different gases; (2) the pipeline cleaning mechanism is simple and cannot completely remove residual gas in the pipeline before gas delivery or when the gas cylinder is replaced, which not only pollutes the subsequent process gas and affects the ion purity, but also may react with the newly introduced gas to cause safety hazards; (3) the pressure monitoring is not perfect, which easily causes abnormal operation of the ion source and causes equipment failure or safety accidents.

[0005] Therefore, it is necessary to provide a new gas delivery and pressure monitoring system applied to an ion implanter. SUMMARY

[0006] Therefore, the purpose of the present application is to provide a gas delivery system applied to an ion implanter to solve the problems in the prior art.

[0007] To achieve the above purpose, the technical solution of the present application is as follows: A gas delivery system applied to an ion implanter for delivering gas to a vacuum chamber of the ion implanter, comprising: a high-pressure gas delivery unit, a low-pressure gas delivery unit, a gas purging unit and a main pipeline connected with the vacuum chamber, wherein, The high-pressure gas conveying unit comprises: a first pipeline, an inlet end of the first pipeline is connected with a first gas cylinder for storing high-pressure gas, an outlet end of the first pipeline is connected with the main pipeline, and a first one-way valve, a first pressure gauge, a first pressure reducing valve, a first pressure gauge, a first switch valve, a first flowmeter and a second switch valve are sequentially arranged on the first pipeline; The low-pressure gas conveying unit comprises: a second pipeline, an inlet end of the second pipeline is connected with a second gas cylinder for storing low-pressure gas, an outlet end of the second pipeline is connected with the main pipeline, and a second pressure gauge, a third switch valve, a second flowmeter and a fourth switch valve are sequentially arranged on the second pipeline; The gas purging unit comprises: a first purging main pipeline, a first purging branch pipeline and a second purging branch pipeline, one end of the first purging main pipeline is connected with a purging gas source, the other end is connected with inlets of the first purging branch pipeline and the second purging branch pipeline; an outlet end of the first purging branch pipeline is connected with the first pipeline, and the connection is close to the first gas cylinder side; an outlet end of the second purging branch pipeline is connected with the second pipeline, and the connection is close to the second gas cylinder side; a third pressure gauge, a second pressure reducing valve, a second pressure gauge and a fifth switch valve are sequentially arranged on the first purging main pipeline, a sixth switch valve and a second one-way valve are sequentially arranged on the first purging branch pipeline, and a seventh switch valve and a third one-way valve are sequentially arranged on the second purging branch pipeline; Further, a first pressure gauge, a second pressure gauge, a third pressure gauge, a first pressure gauge, a second pressure gauge, a first flowmeter and a second flowmeter are electrically connected with the processing unit.

[0008] Further, the connection between the outlet end of the first purging branch pipeline and the first pipeline is located between the first pressure gauge and the first pressure reducing valve; and the connection between the outlet end of the second purging branch pipeline and the second pipeline is located between the second pressure gauge and the third switch valve.

[0009] Further, the gas purging unit further comprises a second purging main pipeline, a third purging branch pipeline and a fourth purging branch pipeline, an outlet end of the second purging main pipeline is connected with the main pipeline, and the connection between the second purging main pipeline and the main pipeline is located on a downstream side of the connection between the first pipeline and the main pipeline and the connection between the second pipeline and the main pipeline; An inlet end of the second purging main pipeline is connected with the third purging branch pipeline and the fourth purging branch pipeline respectively, the other end of the third purging branch pipeline is connected with the first pipeline, and the connection is located between the first pressure gauge and the first switch valve; the other end of the fourth purging branch pipeline is connected with the second pipeline, and the connection is located between the second pressure gauge and the third switch valve; An eighth switch valve is installed on the third purging branch pipe, a ninth switch valve is installed on the fourth purging branch pipe, and a tenth switch valve is installed on the second purging main pipe.

[0010] Furthermore, it also includes a first solenoid valve group and a second solenoid valve group, wherein the first switching valve, the second switching valve, the third switching valve, the fourth switching valve, the fifth switching valve, the sixth switching valve, the seventh switching valve, the eighth switching valve, the ninth switching valve, and the tenth switching valve are all pneumatic valves; The first switching valve, the second switching valve, the fifth switching valve, the sixth switching valve, and the eighth switching valve are all electrically connected to the first solenoid valve group; The third, fourth, seventh, ninth, and tenth switching valves are electrically connected to the second solenoid valve group.

[0011] Furthermore, a hand valve is also installed on the main pipeline near the vacuum chamber.

[0012] Furthermore, both the first flow meter and the second flow meter are mass flow meters (MFC).

[0013] Furthermore, the processing unit includes a circuit board and an ADIO module. The first pressure gauge, the second pressure gauge, the third pressure gauge, the first pressure gauge, the second pressure gauge, the first flow meter, and the second flow meter are all connected to the circuit board. The ADIO module is connected to both the circuit board and the industrial control computer.

[0014] Furthermore, the high-pressure gas filled in the first gas cylinder is a non-toxic gas, including argon, nitrogen, and xenon.

[0015] Furthermore, the low-pressure gas filled in the second gas cylinder is a toxic gas, including boron trifluoride and arsine.

[0016] The beneficial effects of this invention are as follows: The gas delivery system provided by this invention includes a high-pressure gas delivery unit for delivering high-pressure gas and a low-pressure gas delivery unit for delivering low-pressure gas, based on the pressure of the process gas. Each delivery unit is equipped with a pressure monitoring device to meet the stringent requirements of ion implantation for gas parameters. The high-pressure gas delivery unit combines a first pressure reducing valve with a first flow meter to achieve dual control of the high-pressure gas from pressure reduction to stable flow. The low-pressure gas delivery unit eliminates redundant pressure reduction steps, directly using a low-pressure gas cylinder and low-pressure gas path to deliver toxic gases. This ensures effective gas delivery while preventing accidental leakage of toxic gases, avoiding personnel safety issues. Pressure monitoring covers multiple pipelines, providing early warning of insufficient cylinder pressure and pressure reducing valve failure. Furthermore, each unit is equipped with multiple switching valves, forming redundant protection. Even if one valve fails, another valve can immediately shut off the gas, preventing overpressure explosions or gas leaks. Overall, the system ensures precise control of high / low-pressure gases and enhances equipment reliability through targeted purging and multi-layered protection, ultimately achieving a dual improvement in process stability and operational safety, guaranteeing the ion generation efficiency and stability of the ion source. Attached Figure Description

[0017] To more clearly illustrate the technical solutions in the embodiments of this application or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other embodiments can be obtained based on these drawings.

[0018] Figure 1 This is a schematic diagram of the structure of the present invention.

[0019] Figure 2 This is a schematic diagram of the control flow in this invention.

[0020] Explanation of reference numerals in the attached figures: 1. Vacuum chamber; 2. Main pipeline; 3. First pipeline; 4. First gas cylinder; 5. First check valve; 6. First pressure gauge; 7. First pressure reducing valve; 8. First pressure gauge; 9. First switching valve; 10. First flow meter; 11. Second switching valve; 12. Second pipeline; 13. Second pressure gauge; 14. Third switching valve; 15. Second flow meter; 16. Fourth switching valve; 17. First purge main pipe; 18. First purge branch pipe; 19. Second purge branch pipe; 20. Purge gas source; 21. Second gas cylinder; 22. 23. Second pressure reducing valve; 24. Second pressure gauge; 25. Fifth switching valve; 26. Sixth switching valve; 27. Second check valve; 28. Seventh switching valve; 29. ​​Third check valve; 30. Industrial control computer; 31. Circuit board; 32. ADIO module; 33. Second purge main pipe; 34. Third purge branch pipe; 35. Fourth purge branch pipe; 36. Eighth switching valve; 37. Ninth switching valve; 38. Tenth switching valve; 39. First solenoid valve group; 40. Second solenoid valve group; 41. Manual valve. Detailed Implementation

[0021] The structure provided by the present invention will be explained and described in detail below with reference to the accompanying drawings.

[0022] refer to Figure 1 and Figure 2 As shown, this embodiment specifically discloses a gas delivery system for use in an ion implanter, used to deliver gas to the vacuum chamber of the ion implanter, including: a high-pressure gas delivery unit, a low-pressure gas delivery unit, a gas purging unit, and a main pipeline 2 connected to the vacuum chamber 1, wherein... In this embodiment, the high-pressure gas delivery unit includes: a first pipeline 3, the inlet end of which is connected to a first gas cylinder 4 for storing high-pressure gas, the outlet end of the first pipeline 3 being connected to a main pipeline 2, and the first pipeline 3 being sequentially provided with a first check valve 5, a first pressure gauge 6, a first pressure reducing valve 7, a first pressure gauge 8, a first switching valve 9, a first flow meter 10, and a second switching valve 11. The system includes a first one-way valve 5 to prevent gas from flowing back into the first gas cylinder 4, thus avoiding safety risks; a first pressure gauge 6 to monitor the original pressure of the first gas cylinder 4 in real time to determine if the gas supply is sufficient; a first pressure reducing valve 7 to reduce the high-pressure gas to the working pressure required by the vacuum chamber, and to prevent excessive pressure from damaging the switching valves, flow meters, etc. in the subsequent pipeline; a first pressure gauge 8 to monitor whether the pressure after pressure reduction reaches the required pressure in real time, ensuring that the pressure is stable and without fluctuations; a first switching valve 9 to control the on / off of the first pipeline 3 (such as starting and stopping the gas supply); and a first flow meter 10 to accurately detect the gas flow rate. In some preferred embodiments, the first flow meter 10 is selected as a mass flow meter (MFC), which can realize the detection and adjustment of the flow rate, control the flow rate within the required range, and ensure the stability of the subsequent ion source gas flow. The second switching valve 11 serves as a secondary on / off control, providing dual protection for controllable gas supply.

[0023] Optionally, the high-pressure gas filled in the first gas cylinder 4 is a non-toxic gas, including any one of argon, nitrogen, xenon, etc. It is understood that the same gas is delivered each time, and when the gas needs to be replaced, it can be replaced with the first gas cylinder containing the required gas. Among them, argon is delivered to the ion source through the high-pressure delivery unit, ionized into argon ions, and then injected into the wafer for doping. Nitrogen can be used as the source of nitrogen ions. When nitrogen element needs to be doped in the wafer, nitrogen can be delivered to the vacuum chamber through the high-pressure gas delivery unit for subsequent ionization, extraction and other processes.

[0024] In this embodiment, the low-pressure gas delivery unit includes: a second pipeline 12, the inlet end of the second pipeline 12 is connected to a second gas cylinder 21 for storing low-pressure gas, the outlet end of the second pipeline 12 is connected to the main pipeline 2, and a second pressure gauge 13, a third switch valve 14, a second flow meter 15 and a fourth switch valve 16 are sequentially arranged on the second pipeline 12. Optionally, the low-pressure gas filled in the second gas cylinder 21 is generally a toxic gas, including any one of boron trifluoride, arsine, etc.

[0025] This low-pressure gas delivery unit is designed specifically for low-pressure gas sources. Therefore, it does not require pressure reduction processing, simplifying the components while retaining the core control functions. The second pressure gauge 12 is used to detect the pressure of the second gas cylinder 21, and the third switch valve 14 controls the on / off of the low-pressure gas. The second flow meter 15 monitors the low-pressure gas flow rate, preferably a mass flow meter (MFC), to achieve precise control and regulation of the gas flow rate on the second pipeline. The fourth switch valve 16 serves as a secondary on / off control to ensure that the low-pressure gas supply is also precise and controllable.

[0026] In this embodiment, the gas purging unit includes: a first purging main pipe 17, a first purging branch pipe 18, and a second purging branch pipe 19. One end of the first purging main pipe 17 is connected to a purging gas source 20, and the other end is connected to the inlet of the first purging branch pipe 18 and the second purging branch pipe 19. The outlet end of the first purging branch pipe 18 is connected to the first pipeline 3, and the connection point is close to the side of the first gas cylinder 4. The outlet end of the second purging branch pipe 19 is connected to the second pipeline 12, and the connection point is close to the side of the second gas cylinder 21. The first purging main pipe 17 is sequentially equipped with a third pressure gauge 22, a second pressure reducing valve 23, a second pressure gauge 24, and a fifth switching valve 25. The first purging branch pipe 18 is sequentially equipped with a sixth switching valve 26 and a second one-way valve 27. The second purging branch pipe is sequentially equipped with a seventh switching valve 28 and a third one-way valve 29. Understandably, ion implanters have extremely high requirements for gas purity. In this embodiment, the gas purging unit uses a dedicated gas source to clean the pipeline, avoiding residual contamination when switching between different gases. The gas (such as nitrogen) from the purging gas source 20 is delivered through the first purging main pipe 17. The third pressure gauge 22, the second pressure reducing valve 23, and the second pressure gauge 24 control the purging gas pressure, and the fifth switching valve 25 controls the opening and closing of the first purging main pipe.

[0027] In this embodiment, a first purge branch pipe 18 and a second purge branch pipe 19 are respectively set to realize directional purge of the branch pipe. The first purge branch pipe 18 is connected to the first pipeline 3. In a preferred embodiment, the specific connection point is located between the first pressure gauge 6 and the first pressure reducing valve 7.

[0028] The purge gas is injected from this location to purge multiple key precision components on the first pipeline 3, thereby ensuring their service life. Furthermore, since this connection is located downstream of the first pressure gauge 6 (near the first pressure reducing valve 7), the purge gas will not flow back into the first pressure gauge 6 or the first gas cylinder 4. This prevents the purge gas from interfering with the first pressure gauge's detection of the true pressure of the first gas cylinder and avoids the problem of the system misjudging the gas source status. Similarly, the second purging branch pipe 19 is connected to the second pipeline 12 for purging the second pipeline 12, and preferably the connection is located between the second pressure gauge 13 and the third switch valve 14.

[0029] When the purge gas is injected from this location, it can directly clean the pipeline from the outlet of the second pressure gauge 13 to the inlet of the third switch valve 14. At the same time, with the third switch valve 14 open, the purge gas can flow further downstream to clean the third switch valve 14, the second flow meter 15, and subsequent pipelines, achieving full-path cleaning of the low-pressure pipeline from the gas source side to the vacuum chamber side. This means that impurities in the second pipeline can be blown out before the low-pressure gas enters these components, protecting downstream precision components from the source and reducing maintenance frequency and failure risk. Similarly, if the connection is located upstream of the second pressure gauge 13 (near the second gas cylinder), the purge gas may enter the detection area of ​​the second pressure gauge, causing the pressure gauge to misread, leading to misjudgment of the gas source status by the system and affecting the stability of the gas supply.

[0030] The gas delivery system also includes an industrial control computer 30 and a processing unit electrically connected to it. The first pressure gauge 6, the second pressure gauge 13, the third pressure gauge 22, the first pressure gauge 8, the second pressure gauge 24, the first flow meter 10, and the second flow meter 15 are all electrically connected to the processing unit.

[0031] Specifically, in combination Figure 2 As shown, the processing unit includes a circuit board 31 and an ADIO module 32. The first pressure gauge 6, the second pressure gauge 13, the third pressure gauge 22, the first pressure gauge 8, the second pressure gauge 24, the first flow meter 10, and the second flow meter 15 are all connected to the circuit board 31. The ADIO module 32 is electrically connected to the circuit board 31 and the industrial computer 30 respectively.

[0032] Among them, the first pressure gauge 6, the second pressure gauge 13, the third pressure gauge 22, the first pressure gauge 8, the second pressure gauge 24, the first flow meter 10, and the second flow meter 15 are all data acquisition devices, which respectively transmit the detected pressure information, flow information, etc. to the circuit board 31. The circuit board 31 centrally receives all data information and can integrate preprocessing circuits such as filtering, amplification, and isolation: for example, filtering out high-frequency electromagnetic noise through RC filter circuit, and enhancing weak signals (such as small flow signals under low pressure) through signal amplification circuit, thereby improving the accuracy of data information and anti-interference ability.

[0033] The ADIO module 32 accurately converts the pre-processed analog signals from the circuit board 31 into digital signals, and unifies different types of signals into a digital communication format that the industrial computer 30 can recognize, ensuring the reliability of data transmission.

[0034] In a specific embodiment, the first pressure gauge 6 monitors the pressure value of the first gas cylinder, with an alarm value set to 20 PSI; the first pressure gauge 8 monitors the inlet pressure of the first flow meter 10, with a threshold value set to 5-35 PSI; the second pressure gauge 13 monitors the pressure value of the second gas cylinder, with an alarm value set to 30 torr; the third pressure gauge 22 monitors the pressure value of the purging gas source, with an alarm value set to 20 PSI; the second pressure gauge 24 monitors the inlet pressure of nitrogen purging, with a threshold value set to 5-35 PSI; the first flow meter 10 and the second flow meter 15 can be input with the required flow values ​​according to process requirements; the industrial control computer 30 monitors the flow and pressure of each pipeline through the processing unit, and when a certain value is detected to exceed the set range, it can send an alarm command to the host computer (such as an alarm device, monitoring center, etc.).

[0035] Understandably, the above settings can be adjusted according to different process conditions.

[0036] Continue to refer to Figure 1 As shown, the gas purging unit also includes a second purging main pipe 33, a third purging branch pipe 34 and a fourth purging branch pipe 35. The outlet end of the second purging main pipe 33 is connected to the main pipe 2, and the connection between the second purging main pipe 33 and the main pipe 2 is located downstream of the connection between the first pipe 3 and the main pipe 2, and the connection between the second pipe 12 and the main pipe 2. The inlet end of the second purge main pipe 33 is connected to the third purge branch pipe 34 and the fourth purge branch pipe 35 respectively. The other end of the third purge branch pipe 34 is connected to the first pipeline 3, and the connection point is located between the first pressure gauge 8 and the first switch valve 9. The other end of the fourth purge branch pipe 35 is connected to the second pipeline 12, and the connection point is located between the second pressure gauge 13 and the third switch valve 14. The third purge branch pipe 34 is equipped with an eighth switch valve 36, the fourth purge branch pipe 35 is equipped with a ninth switch valve 37, and the second purge main pipe 33 is equipped with a tenth switch valve 38.

[0037] In this embodiment, the eighth switch valve 36 and the tenth switch valve 38 are opened, and the purging gas enters from the first purging branch pipe 18, which can clean the midstream pipeline of "first pressure reducing valve 7 outlet → first pressure gauge 8 → first switch valve 9 inlet". Residual impurities or gas are carried into the vacuum chamber 1 along the third purging branch pipe 34 and the second purging main pipe 33. Usually, the vacuum chamber is used to evacuate the gas and purge it to achieve the purging of the pipeline. If the ninth switch valve 37 and the tenth switch valve 38 are opened, the purging gas enters from the second branch pipe, passes through the fourth purging branch pipe 35 and the second purging main pipe 33 and enters the vacuum chamber 1. In conjunction with the vacuum chamber to evacuate, the corresponding pipeline can also be purged.

[0038] With the third and fourth purge branch pipes and the corresponding switch valves on the branch pipes, the purge gas can directly enter the downstream section of the main pipeline, blowing the residual gas into the vacuum chamber, and then pumping it away through the vacuum system of the chamber, preventing it from mixing with the new gas during the next gas supply, which can adapt to different scenario requirements.

[0039] Continue to refer to Figure 1 The gas delivery system also includes a first solenoid valve group 39 and a second solenoid valve group 40. The first switch valve 9, the second switch valve 11, the third switch valve 14, the fourth switch valve 16, the fifth switch valve 25, the sixth switch valve 26, the seventh switch valve 28, the eighth switch valve 36, the ninth switch valve 37, and the tenth switch valve 38 are all pneumatic valves. The first switching valve 9, the second switching valve 11, the fifth switching valve 25, the sixth switching valve 26, and the eighth switching valve 36 are all electrically connected to the first solenoid valve group 39. The third switch valve 14, the fourth switch valve 16, the seventh switch valve 28, the ninth switch valve 37, and the tenth switch valve 38 are electrically connected to the second solenoid valve group 40.

[0040] By setting up the first solenoid valve group 39 and the second solenoid valve group 40, automatic control and adjustment of each switching valve can be realized; and the two solenoid valve groups have a clear division of labor, and can be controlled in zones according to the first pipeline and the second pipeline and the corresponding matching purging components, which can improve the reliability of the system.

[0041] In some embodiments, a manual valve 41 is also provided on the main pipeline 2 near the vacuum chamber 1. The manual valve 41 is provided to prevent operators from accidentally supplying gas during machine maintenance, which could cause personal injury. Therefore, during machine maintenance, the manual valve 41 is manually closed and locked to ensure personnel safety. Understandably, after maintenance is completed and normal use is resumed, the manual valve 41 can be unlocked and manually opened.

[0042] The following is a description of the overall usage process of the system of the present invention: When high-pressure gas needs to be delivered, the first gas cylinder and the hand valve are opened, and the first and second switching valves are opened by controlling the first solenoid valve group. The high-pressure gas is delivered to the first pressure gauge through the first check valve. The first pressure gauge is used to monitor the pressure of the first gas cylinder in real time. The pressure of the high-pressure gas is adjusted to the required pressure value by the first pressure reducing valve. The first pressure gauge monitors the high-pressure gas after the pressure is adjusted in real time. Then, the flow rate of the high-pressure gas is monitored and controlled to the set value by the first flow meter, so as to deliver the high-pressure gas into the vacuum chamber. When low-pressure gas needs to be delivered, the second gas cylinder and the hand valve are opened, and the third and fourth switch valves are opened by the second solenoid valve group. The low-pressure gas is delivered to the second pressure gauge through the second pipeline. The second pressure gauge is used to monitor the pressure of the second gas cylinder in real time. Then, the flow rate of the low-pressure gas is monitored and controlled to the set value by the second flow meter, so as to deliver the low-pressure gas into the vacuum chamber. The gas purging unit is used to purge and clean the pipeline before supplying gas to the high and low pressure gas lines, or to purge the residual gas in the pipeline when changing gas cylinders to ensure safety.

[0043] The purging process is as follows: the high-purity purging gas source monitors the gas pressure in real time through the third pressure gauge 22, adjusts the purging gas pressure through the second pressure reducing valve 23, and then monitors the purging gas after the pressure adjustment through the second pressure gauge 24. The corresponding switch valve on the required purging pipeline is opened, and the manual valve 31 is opened. The vacuum chamber 1 then removes the purged gas.

[0044] In summary, the gas delivery system provided by this invention includes a high-pressure gas delivery unit for delivering high-pressure gas and a low-pressure gas delivery unit for delivering low-pressure gas, based on the pressure of the process gas. Each delivery unit is equipped with a pressure monitoring device to meet the stringent requirements of ion implantation for gas parameters. The high-pressure gas delivery unit combines a first pressure reducing valve with a first flow meter to achieve dual control of the high-pressure gas from pressure reduction to stable flow. The low-pressure gas delivery unit eliminates redundant pressure reduction steps, directly using a low-pressure gas cylinder and low-pressure gas path to deliver toxic gases. This ensures effective gas delivery while preventing accidental leakage of toxic gases, avoiding personnel safety issues. Pressure monitoring covers multiple pipelines, providing early warning of insufficient cylinder pressure and pressure reducing valve failure. Furthermore, each unit is equipped with multiple switching valves, forming redundant protection. Even if one valve fails, another valve can immediately shut off the gas, preventing overpressure explosions or gas leaks. Overall, the system ensures precise control of high / low pressure gases and improves equipment reliability through targeted purging and multi-layer protection, ultimately achieving a dual improvement in process stability and operational safety, and guaranteeing the ion generation efficiency and stability of the ion source.

[0045] In the description of this invention, it should be understood that the terms "center," "longitudinal," "lateral," "length," "width," "thickness," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," "clockwise," "counterclockwise," "axial," "radial," and "circumferential" indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are used only for the convenience of describing this invention and simplifying the description, and are not intended to indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this invention.

[0046] In this invention, unless otherwise explicitly specified and limited, the terms "installation," "connection," "linking," and "fixing," etc., should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components, unless otherwise explicitly limited. Those skilled in the art can understand the specific meaning of the above terms in this invention according to the specific circumstances.

[0047] In the description of this specification, the references to terms such as "this embodiment," "an embodiment," "some embodiments," "example," "specific example," or "some examples," etc., refer to specific features, structures, materials, or characteristics described in connection with that embodiment or example, which are included in at least one embodiment or example of the present invention. In this specification, the illustrative expressions of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics described may be combined in a suitable manner in any at least one embodiment or example. Moreover, without contradiction, those skilled in the art can combine and integrate the different embodiments or examples described in this specification, as well as the features of different embodiments or examples.

[0048] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include at least one of that feature. In the description of this invention, "a plurality of" means at least two, such as two, three, etc., unless otherwise explicitly specified.

[0049] The above description is merely a preferred embodiment of the present invention and is not intended to limit the present invention. Any modifications, equivalent substitutions, and simple improvements made on the substantive content of the present invention should be included within the protection scope of the present invention.

Claims

1. A gas delivery system for use in an ion implanter, used to deliver gas to the vacuum chamber of the ion implanter, characterized in that, include: The system includes a high-pressure gas delivery unit, a low-pressure gas delivery unit, a gas purging unit, and a main pipeline (2) connected to the vacuum chamber (1). The high-pressure gas delivery unit includes: a first pipeline (3), the inlet end of which is connected to a first gas cylinder (4) for storing high-pressure gas, the outlet end of which is connected to the main pipeline (2), and the first pipeline (3) is sequentially provided with a first check valve (5), a first pressure gauge (6), a first pressure reducing valve (7), a first pressure gauge (8), a first switching valve (9), a first flow meter (10), and a second switching valve (11); The low-pressure gas delivery unit includes: a second pipeline (12), the inlet end of which is connected to a second gas cylinder (21) for storing low-pressure gas, the outlet end of which is connected to the main pipeline (2), and a second pressure gauge (13), a third switch valve (14), a second flow meter (15), and a fourth switch valve (16) are sequentially arranged on the second pipeline (12). The gas purging unit includes: a first purging main pipe (17), a first purging branch pipe (18), and a second purging branch pipe (19). One end of the first purging main pipe (17) is connected to a purging gas source (20), and the other end is connected to the inlet of the first purging branch pipe (18) and the second purging branch pipe (19). The outlet end of the first purging branch pipe (18) is connected to the first pipeline (3), and the connection point is close to the side of the first gas cylinder (4). The outlet end of the second purging branch pipe (19) is connected to the second pipeline (12), and the connection point is close to the side of the second gas cylinder (21). The first purging main pipe (17) is sequentially equipped with a third pressure gauge (22), a second pressure reducing valve (23), a second pressure gauge (24), and a fifth switching valve (25). The first purging branch pipe (18) is sequentially equipped with a sixth switching valve (26) and a second check valve (27). The second purging branch pipe is sequentially equipped with a seventh switching valve (28) and a third check valve (29). It also includes an industrial control computer (30) and a processing unit electrically connected thereto. The first pressure gauge (6), the second pressure gauge (13), the third pressure gauge (22), the first pressure gauge (8), the second pressure gauge (24), the first flow meter (10), and the second flow meter (15) are all electrically connected to the processing unit.

2. The gas delivery system according to claim 1, characterized in that, The outlet end of the first purge branch pipe (18) is connected to the first pipeline (3) between the first pressure gauge (6) and the first pressure reducing valve (7); the outlet end of the second purge branch pipe (19) is connected to the second pipeline (12) between the second pressure gauge (13) and the third switch valve (14).

3. The gas delivery system according to claim 2, characterized in that, The gas purging unit further includes a second purging main pipe (33), a third purging branch pipe (34) and a fourth purging branch pipe (35). The outlet end of the second purging main pipe (33) is connected to the main pipeline (2), and the connection between the second purging main pipe (33) and the main pipeline (2) is located downstream of the connection between the first pipeline (3) and the main pipeline (2) and the connection between the second pipeline (12) and the main pipeline (2). The inlet end of the second purge main (33) is connected to the third purge branch (34) and the fourth purge branch (35) respectively. The other end of the third purge branch (34) is connected to the first pipeline (3), and the connection point is located between the first pressure gauge (8) and the first switch valve (9). The other end of the fourth purge branch (35) is connected to the second pipeline (12), and the connection point is located between the second pressure gauge (13) and the third switch valve (14). The third purge branch pipe (34) is provided with an eighth switch valve (36), the fourth purge branch pipe (35) is provided with a ninth switch valve (37), and the second purge main pipe (33) is provided with a tenth switch valve (38).

4. The gas delivery system according to claim 3, characterized in that, It also includes a first solenoid valve group (39) and a second solenoid valve group (40), wherein the first switching valve (9), the second switching valve (11), the third switching valve (14), the fourth switching valve (16), the fifth switching valve (25), the sixth switching valve (26), the seventh switching valve (28), the eighth switching valve (36), the ninth switching valve (37), and the tenth switching valve (38) are all pneumatic valves; The first switching valve (9), the second switching valve (11), the fifth switching valve (25), the sixth switching valve (26), and the eighth switching valve (36) are all electrically connected to the first solenoid valve group (39); The third switch valve (14), the fourth switch valve (16), the seventh switch valve (28), the ninth switch valve (37), and the tenth switch valve (38) are electrically connected to the second solenoid valve group (40).

5. The gas delivery system according to claim 4, characterized in that, A hand valve (41) is also provided on the main pipeline (2) near the vacuum chamber (1).

6. The gas delivery system according to claim 5, characterized in that, Both the first flow meter (10) and the second flow meter (15) are mass flow meters (MFC).

7. The gas delivery system according to claim 6, characterized in that, The processing unit includes a circuit board (31) and an ADIO module (32). The first pressure gauge (6), the second pressure gauge (13), the third pressure gauge (22), the first pressure gauge (8), the second pressure gauge (24), the first flow meter (10), and the second flow meter (15) are all connected to the circuit board (31). The ADIO module (32) is electrically connected to the circuit board (31) and the industrial computer (30) respectively.

8. The gas delivery system according to claim 3, characterized in that, The high-pressure gas filled in the first gas cylinder (4) is a non-toxic gas, including argon, nitrogen and xenon.

9. The gas delivery system according to claim 3, characterized in that, The low-pressure gas filled in the second gas cylinder (21) is a toxic gas, including boron trifluoride and arsine.

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