Polishing method of glass substrate for wearable liquid crystal display

Abstract

The invention provides a polishing method of a glass substrate for a wearable liquid crystal display. The polishing method comprises the following steps that S10, the positions of a bearing disc and a spraying pipe relative to a workbench are determined, and the bearing disc and the spraying pipe are arranged in a bilateral symmetry mode; s20, the glass substrate is adsorbed and fixed to the bottom face of the bearing disc through a negative pressure structure arranged on the bearing disc; s30, the glass substrate is driven to move downwards through the bearing disc until the lower surface of the glass substrate abuts against a polishing pad on a polishing machine workbench, and the pressure between the lower surface of the glass substrate and the polishing pad ranges from 0.1 Mpa to 0.3 Mpa; and S40, polishing the glass substrate. According to the technical scheme, the chemical corrosion effect and the mechanical grinding effect are combined, the glass substrate is polished, and the polishing effect and efficiency are improved.

Description

Technical Field

[0001] This invention belongs to the field of glass polishing technology for displays, and in particular relates to a polishing method for a glass substrate for wearable liquid crystal displays. Background Technology

[0002] Wearable LCD displays refer to LCD technology integrated into wearable devices, such as smartwatches and smart glasses. These devices can present information to users in a visual way and are usually lightweight and wearable. They are mainly used to display health data, navigation information, communication content, etc. in real time.

[0003] An LCD screen uses liquid crystal material as its basic component. The liquid crystal material is filled between two parallel glass substrates. By changing the arrangement of molecules inside the liquid crystal material through voltage, the purpose of blocking and transmitting light can be achieved to display images of varying shades and staggered patterns. Moreover, by adding a three-color filter layer between the two flat plates, color images can be displayed.

[0004] During the production process of LCD screens, the glass substrate needs to be polished to reduce the surface roughness of the glass substrate and obtain a bright and smooth surface.

[0005] However, after polishing the glass substrate using existing polishing processes, the surface roughness of the glass varies greatly, resulting in low precision of the liquid crystal glass. The subsequent reprocessing of the low-precision glass leads to a decrease in production efficiency. Summary of the Invention

[0006] In view of this, the present invention aims to provide a polishing method for glass substrates used in wearable liquid crystal displays, so as to improve the polishing effect and efficiency of glass substrates used in wearable liquid crystal displays.

[0007] To achieve the above objectives, the technical solution of the present invention is implemented as follows:

[0008] A polishing method for a glass substrate used in wearable liquid crystal displays includes the following steps:

[0009] S10. Determine the position of the support plate and spray pipe relative to the worktable:

[0010] The support plate and spray pipe are arranged symmetrically from left to right, and the support plate is installed on the lowering element of the polishing machine through an elastic connection structure.

[0011] S20, Fixing the glass substrate:

[0012] The glass substrate is adsorbed and fixed to the bottom surface of the carrier plate by the negative pressure structure set in the carrier plate;

[0013] S30, Lowering the glass substrate:

[0014] The glass substrate is moved downward by the support plate until the lower surface of the glass substrate abuts the polishing pad on the polishing machine table. The downward movement of the support plate is adjusted so that the pressure between the glass substrate and the polishing pad is 0.1 to 0.3 MPa.

[0015] S40, Glass substrate polishing:

[0016] Connect the spray pipe and polishing liquid storage tank to spray the polishing liquid onto the surface of the polishing pad. Then, start the power source that drives the worktable and the carrier plate to rotate. The worktable rotates and the carrier plate rotates along with the glass substrate. The polishing pad polishes the glass substrate. The operation takes 6-10 minutes.

[0017] Furthermore, the elastic connection structure includes a lower plate and an upper plate. The upper plate is connected to the downward pushing element of the polishing machine. The bearing plate is installed at the center of the lower plate through a rotating shaft. A motor for driving the bearing plate to rotate is provided on the top surface of the lower plate. Several connecting posts are provided on the upper side of the lower plate. The upper end of each connecting post passes through the upper plate and is matched with a nut. A spring is fitted on the connecting post between the upper plate and the lower plate.

[0018] Furthermore, the polishing solution comprises deionized water, polishing powder, dispersant, pH adjuster, corrosion inhibitor, and fluoride, wherein:

[0019] Polishing powder: Nano-cerium oxide is used as abrasive, with an average particle size controlled at 50-80nm and a concentration of 5-10wt%.

[0020] Dispersant: Polyvinyl alcohol is used as the dispersant, with an addition amount of 0.3-0.8 wt%.

[0021] pH adjuster: Potassium hydroxide is used as a pH adjuster to control the pH value of the polishing solution at 9.6-10.5;

[0022] Corrosion inhibitor: Add 0.1-0.2 wt% benzotriazole as a corrosion inhibitor;

[0023] Fluoride: Ammonium bifluoride is used as the fluoride, with an addition amount of 0.1-0.15 wt%.

[0024] Furthermore, the polishing powder is coated with a poly(N-isopropylacrylamide) thermosensitive polymer shell.

[0025] Furthermore, at 25°C, the viscosity of the polishing slurry was controlled at 50-80 mPa·s.

[0026] Furthermore, the rotation speed of the bearing disk is set to 25-35 r / min, the rotation speed of the worktable is set to 30-40 r / min, and the flow rate of the polishing fluid is controlled at 100-150 mL / min.

[0027] Furthermore, the support plate and the worktable rotate in opposite directions.

[0028] Furthermore, the radial pattern on the polishing pad has a depth of 40-80μm, a width controlled at 80-150μm, and a spacing between two adjacent radial patterns set at 2-3mm.

[0029] Compared with existing technologies, the polishing method for glass substrates for wearable liquid crystal displays described in this invention has the following advantages:

[0030] In this invention, a glass substrate is polished by combining chemical corrosion and mechanical abrasion. During this process, the chemical reagents in the polishing solution react with the surface of the glass substrate to generate easily removable chemical reaction products. At the same time, the coordinated movement of the polishing pad, the support plate, and the worktable generates mechanical abrasion force to remove the chemical reaction products generated on the surface of the glass substrate. This ultimately achieves the flattening and fine processing of the surface of the glass substrate for displays, improving the polishing effect and efficiency. This invention is suitable for polishing glass panels for wearable displays. Attached Figure Description

[0031] The accompanying drawings, which form part of this invention, are used to provide a further understanding of the invention. The illustrative embodiments of the invention and their descriptions are used to explain the invention and do not constitute an undue limitation of the invention. In the drawings:

[0032] Figure 1 This is a flowchart of the glass substrate polishing method according to an embodiment of the present invention;

[0033] Figure 2 This is a schematic diagram of the elastic connection structure in this invention.

[0034] Explanation of reference numerals in the attached figures:

[0035] 1-Bearing plate; 2-Lower plate; 3-Motor; 4-Upper plate; 5-Spring; 6-Connecting column; 7-Nut. Detailed Implementation

[0036] It should be noted that, unless otherwise specified, the embodiments and features described in the present invention can be combined with each other.

[0037] In the description of this invention, it should be understood that the terms "center," "longitudinal," "lateral," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," and "outer," etc., indicating orientations or positional relationships based on the orientations or positional relationships shown in the accompanying drawings, are only for the convenience of describing the invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of the invention. Furthermore, the terms "first," "second," etc., are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of indicated technical features. Thus, a feature defined with "first," "second," etc., may explicitly or implicitly include one or more of that feature. In the description of this invention, unless otherwise stated, "a plurality of" means two or more.

[0038] In the description of this invention, it should be noted that, unless otherwise explicitly specified and limited, the terms "installation," "connection," and "linking" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal connection of two components. Those skilled in the art will understand the specific meaning of the above terms in this invention based on the specific circumstances.

[0039] The present invention will now be described in detail with reference to the accompanying drawings and embodiments.

[0040] like Figure 1 As shown, a polishing method for a glass substrate for a wearable liquid crystal display includes the following steps:

[0041] S10. Determine the position of the support plate and spray pipe relative to the worktable: Ensure that the support plate and spray pipe are arranged symmetrically from left to right. This structure ensures that the position of the polishing liquid sprayed onto the polishing pad corresponds to the position of the glass substrate. That is, the distance from the center of the worktable to the center of the glass substrate and the position of the polishing liquid spraying position are equal. This ensures that the polishing pad set on the platform can carry the polishing liquid to the glass substrate position when the platform rotates. At the same time, the support plate is installed on the downward push element of the polishing machine through an elastic connection structure. The polishing pad is preferably made of polyurethane with radial patterns on the top surface to facilitate carrying the polishing liquid to the glass substrate position. The radial patterns also have the function of discharging waste, which helps to remove waste and impurities generated during polishing, thereby improving the polishing effect and quality for grinding and polishing the wave flow substrate.

[0042] S20, Fixing the glass substrate:

[0043] The glass substrate is adsorbed and fixed to the bottom surface of the carrier plate by the negative pressure structure set in the carrier plate; this structure is existing technology and will not be described in detail here.

[0044] S30, Lowering the glass substrate:

[0045] The support plate is movable up and down. The support plate moves the glass substrate downward until the lower surface of the glass substrate abuts the polishing pad on the polishing machine table. The downward movement of the support plate is adjusted so that the pressure between the glass substrate and the polishing pad is 0.1 to 0.3 MPa.

[0046] S40, Glass substrate polishing:

[0047] Connect the spray pipe and polishing liquid storage tank to spray the polishing liquid onto the surface of the polishing pad. Then, start the power source that drives the worktable and the carrier plate to rotate, so that the worktable rotates and the carrier plate rotates along with the glass substrate, and the polishing pad polishes the glass substrate.

[0048] In this invention, the elastic connection structure is as follows: Figure 2 As shown, the assembly includes a lower plate 2 and an upper plate 4. The upper plate 4 is connected to the downward pushing element of the polishing machine. The support plate 1 is mounted at the center of the lower plate 2 via a rotating shaft. A motor 3 that drives the support plate 1 to rotate is installed on the top surface of the lower plate 2. Several connecting posts 6 are arranged upwards on the lower plate 2. The upper end of each connecting post 6 protrudes from the upper plate 4 and is fitted with a nut 7. A spring 5 is fitted onto the connecting post 6 between the upper plate 4 and the lower plate 2. The preload of the spring 5 can be adjusted by the nut 7. This structure gives the support plate 1 vertical floating capability to cope with rapid wear of polishing powder particles (such as in the coarse polishing stage) and ensures a compensation response speed ≤0.1s.

[0049] In this invention, the polishing slurry comprises deionized water, polishing powder, dispersant, pH adjuster, corrosion inhibitor, and fluoride. At 25°C, the viscosity of the polishing slurry is controlled at 50-80 mPa·s. Among the components of the polishing slurry, the polishing powder uses nano-cerium oxide as the abrasive, with an average particle size controlled at 50-80 nm and a concentration of 5-10 wt%. It exhibits good chemical stability and minimal damage to the glass substrate surface. The dispersant uses polyvinyl alcohol as the dispersant, with an addition amount of 0.3-0.8 wt%. Polyvinyl alcohol has excellent dispersing properties, enabling the nano-cerium oxide to be uniformly dispersed in the polishing slurry, preventing abrasive agglomeration, and thus ensuring the stability of the polishing process and the consistency of the polishing effect. The pH adjuster uses potassium hydroxide as the pH adjuster, controlling the pH value of the polishing slurry at 9.6-10.5. The corrosion inhibitor uses 0.1-0.2 wt% benzotriazole as a corrosion inhibitor, which can form a protective film on the glass substrate surface, inhibiting excessive corrosion of the glass substrate surface by the polishing slurry and reducing the generation of surface defects. Fluorides: Using ammonium bifluoride as a fluoride, with an addition amount of 0.1-0.15 wt%, can enhance the polishing effect, speed up the polishing process, and help remove minor scratches on the glass surface.

[0050] In a preferred embodiment, the polishing powder is coated with a layer of poly(N-isopropylacrylamide) thermosensitive polymer shell. When the polishing temperature exceeds 30°C (the lower critical melting temperature of PNIPAM), the polymer shell shrinks, and the abrasive particle size temporarily decreases by 8-12 nm, reducing the grinding intensity and avoiding over-polishing at high temperatures; when the temperature is below 32°C, the shell expands, and the abrasive particle size recovers to 50-100 nm, ensuring normal polishing efficiency and achieving temperature adaptive adjustment.

[0051] In this invention, the support plate and the worktable rotate in opposite directions, and the rotation speed of the support plate is set to 25-35 r / min, the rotation speed of the worktable is set to 30-40 r / min, and the flow rate of the polishing fluid is controlled at 100-150 mL / min.

[0052] In this invention, the radial texture depth on the polishing pad is 40-80 μm, the width is controlled between 80-150 μm, and the spacing between two adjacent radial textures is set to 2-3 mm. This structure ensures that the polishing slurry is evenly distributed on the surface of the polishing pad, while also ensuring sufficient contact area between the polishing pad and the glass substrate, thereby improving polishing efficiency and consistency of polishing quality.

[0053] The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of the present invention should be included within the protection scope of the present invention.

Claims

1. A polishing method of a glass substrate for a wearable liquid crystal display, characterized by: The method comprises the following steps: S10, determining the position of the bearing disc and the spraying pipe relative to the workbench: The bearing disc and the spraying pipe are symmetrically arranged on both sides above the workbench, and the bearing disc is installed on the lower pushing element of the polishing machine through the elastic connecting structure; S20, fixing the glass substrate: The glass substrate is adsorbed and fixed on the bottom surface of the bearing disc through the negative pressure structure arranged on the bearing disc; S30, moving the glass substrate downward: The glass substrate is moved downward by the bearing disc until the lower surface of the glass substrate abuts against the polishing pad on the polishing machine workbench, and the position of the bearing disc is adjusted to make the pressure between the glass substrate and the polishing pad 0.1-0.3 MPa; S40, polishing the glass substrate: The polishing liquid is sprayed to the surface of the polishing pad by connecting the spraying pipe and the polishing liquid tank, and then the power sources for driving the workbench and the bearing disc are started respectively to make the workbench and the bearing disc rotate, and the polishing pad polishes the glass substrate, and the polishing time is 6-10 minutes. 2.The polishing method of a glass substrate for a wearable liquid crystal display according to claim 1, wherein: The elastic connecting structure comprises a lower plate (2) and an upper plate (4), the upper plate (4) is connected to the lower pushing element of the polishing machine, the bearing disc (1) is installed at the center of the lower plate (2) through a rotating shaft, a motor (3) for driving the bearing disc (1) to rotate is arranged on the top surface of the lower plate (2), a plurality of connecting columns (6) are arranged upward on the lower plate (2), the upper ends of the connecting columns (6) pass through the upper plate (4) and are matched with nuts (7), and springs (5) are sleeved on the connecting columns (6) between the upper plate (4) and the lower plate (2). 3.The polishing method of a glass substrate for a wearable liquid crystal display according to claim 1, wherein: The polishing liquid comprises deionized water, polishing powder, dispersant, pH regulator, corrosion inhibitor and fluoride, wherein: The polishing powder uses nanometer cerium oxide as abrasive, the average particle size is controlled to be 50-80 nm, and the concentration is 5-10 wt%; The dispersant uses polyvinyl alcohol as dispersant, and the addition amount is 0.3-0.8 wt%; The pH regulator uses potassium hydroxide as pH regulator, and the pH value of the polishing liquid is controlled to be 9.6-10.5; The corrosion inhibitor adds 0.1-0.2 wt% of benzotriazole as corrosion inhibitor; The fluoride uses ammonium hydrogen fluoride as fluoride, and the addition amount is 0.1-0.15 wt%. 4.The polishing method of a glass substrate for a wearable liquid crystal display according to claim 3, characterized in that: The polishing powder is wrapped with a layer of poly-N-isopropyl acrylamide temperature-sensitive polymer shell outside. 5.The polishing method of a glass substrate for a wearable liquid crystal display according to claim 1, wherein: The viscosity of the polishing liquid is controlled to be 50-80 mPa·s at 25°C. 6.The polishing method of a glass substrate for a wearable liquid crystal display according to claim 1, wherein: The rotating speed of the bearing disc is set to be 25-35 r / min, the rotating speed of the workbench is set to be 30-40 r / min, and the flow of the polishing liquid is controlled to be 100-150 mL / min. 7.The polishing method of a glass substrate for a wearable liquid crystal display according to claim 6, wherein: The bearing disc and the workbench rotate in opposite directions. 8.The polishing method of a glass substrate for a wearable liquid crystal display according to claim 1, wherein: The depth of the radial pattern on the polishing pad is 40-80 μm, the width is controlled to be 80-150 μm, and the interval between the adjacent two radial patterns is set to be 2-3 mm.

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