Method suitable for preparing porous Ni-W coating on surface of reactor internal component

Abstract

The embodiment of the invention relates to the technical field of coating preparation, in particular to a method suitable for preparing a porous Ni-W coating on the surface of a reactor internal part. According to the preparation method provided by the embodiment of the invention, the Ni-W coating is deposited and prepared on the surface of the component in a magnetron sputtering mode, then the component with the Ni-W coating is heated in a segmented heating mode, controllable phase change and element diffusion of the Ni-W coating can be induced, and therefore the porous Ni-W coating is formed on the surface of the component; nano-porous structures are evenly distributed in the porous Ni-W coating, when cracks are generated on the part, stress borne by the part can be buffered, so that the cracks are effectively prevented from penetrating and extending, meanwhile, heat can be prevented from being accumulated on the combined interface of the part and the porous Ni-W coating, the risk that the porous Ni-W coating falls off from the part due to thermal expansion is reduced, and the service life of the part is prolonged. And the thermal shock resistance of the component is improved, so that the operation safety and the service life of a reactor system are ensured.

Description

Technical Field

[0001] The embodiments of this application relate to the field of coating preparation technology, and more specifically to a method suitable for preparing a porous Ni-W coating on the surface of reactor internals. Background Technology

[0002] The statements herein are provided merely as background information in connection with this application and do not necessarily constitute prior art.

[0003] With the rapid development of aerospace technology, long-duration and highly challenging deep space exploration missions are becoming increasingly common, leading to a growing demand for energy from spacecraft. Nuclear energy, as a clean and efficient new energy source, does not rely on chemical reactions or light conditions and is less affected by surrounding environmental factors, making it suitable for the harsh environment of deep space.

[0004] Currently, the most widely used type of nuclear energy system uses heat pipes as heat transfer devices. These systems typically operate in high-temperature, high-vacuum environments, making the materials used to manufacture the heat pipes prone to volatility. Because heat pipes require a long service life, not only are the mechanical properties and structural stability of the materials used in their manufacture demanding, but these materials also need to possess good thermal shock resistance. Therefore, improving the thermal shock resistance of the materials used to manufacture heat pipes within the reactor is crucial. Summary of the Invention

[0005] A brief overview of this application is provided below to offer a basic understanding of certain aspects thereof. It should be understood that this overview is not an exhaustive summary of the application. It is not intended to identify key or essential parts of the application, nor is it intended to limit its scope. Its purpose is merely to present certain concepts in a simplified form as a prelude to the more detailed description that follows.

[0006] This application provides a method for preparing a porous Ni-W coating on the surface of reactor internal components, comprising the following steps: S1, depositing a Ni-W coating on the surface of the component using magnetron sputtering; S2, heating the component obtained in step S1 at a predetermined vacuum level according to a first predetermined heating rate while simultaneously pressurizing it until the temperature reaches a first predetermined temperature and the pressure reaches a first predetermined pressure, and holding the temperature for a first predetermined time; S3, placing the component obtained in step S2 in a vacuum environment and heating it at a second predetermined heating rate until the temperature reaches a second predetermined temperature; S4, heating the component according to a third predetermined... The component obtained in step S3 is heated at a heating rate until the temperature reaches a third predetermined temperature, and then held at that temperature for a second predetermined time; S5, the component obtained in step S4 is heated at a fourth predetermined heating rate until the temperature reaches a fourth predetermined temperature, and then held at that temperature for a third predetermined time; S6, the component obtained in step S5 is cooled, and then the component is heated at a fifth predetermined heating rate until the temperature reaches a fifth predetermined temperature, and then held at that temperature for a fourth predetermined time; S7, the component obtained in step S6 is cooled to obtain a component with a porous Ni-W coating on its surface; wherein, the fifth predetermined heating rate is greater than the first to fourth predetermined heating rates.

[0007] The preparation method provided in the embodiments of this application first uses magnetron sputtering to deposit a Ni-W coating on the surface of the component. Then, the component with the Ni-W coating is heated in a segmented heating manner, which can induce a controllable phase transition and element diffusion in the Ni-W coating, thereby forming a porous Ni-W coating on the surface of the component. The porous Ni-W coating has uniformly distributed nanoporous structures. When cracks occur in the component, it can buffer the stress on the component, thereby effectively preventing crack propagation. At the same time, it can avoid the accumulation of heat at the interface between the component and the porous Ni-W coating, reducing the risk of the porous Ni-W coating falling off the component due to thermal expansion, improving the thermal shock resistance of the component, and thus ensuring the operational safety and service life of the reactor system.

[0008] These and other advantages of this application will become more apparent from the following detailed description of preferred embodiments in conjunction with the accompanying drawings. Attached Figure Description

[0009] To further illustrate the above and other advantages and features of this application, the specific embodiments of this application will be described in more detail below with reference to the accompanying drawings. The drawings, together with the following detailed description, are included in and form a part of this specification. Elements having the same function and structure are indicated by the same reference numerals. It should be understood that these drawings only depict typical examples of this application and should not be considered as limiting the scope of this application.

[0010] Figure 1 This is a schematic flowchart of a method for preparing a porous Ni-W coating on the surface of reactor internals according to an embodiment of this application.

[0011] It should be noted that the accompanying drawings are not necessarily drawn to scale, but are shown only in a schematic manner without affecting the reader's understanding. Detailed Implementation

[0012] Exemplary embodiments of this application will be described below with reference to the accompanying drawings. For clarity and brevity, not all features of actual implementations are described in the specification. However, it should be understood that many implementation-specific decisions must be made in the development of any such actual embodiment to achieve the developer's specific goals, such as complying with constraints related to the system and business, and these constraints may vary depending on the implementation. Furthermore, it should be understood that while development work can be very complex and time-consuming, such development work is merely a routine task for those skilled in the art who benefit from the content of this application.

[0013] It should also be noted that, in order to avoid obscuring this application with unnecessary details, only the equipment structure and / or processing steps closely related to the solution according to this application are shown in the accompanying drawings, while other details that are not closely related to this application are omitted.

[0014] It should be noted that, unless otherwise defined, the technical or scientific terms used in this application shall have the ordinary meaning as understood by a person with ordinary skills in the field to which this application pertains.

[0015] In the description of the embodiments of this application, "multiple" means at least two, such as two, three, etc., unless otherwise explicitly specified.

[0016] Currently, the metallic materials used in heat pipes, such as nickel-based alloys, differ significantly from Ni-W coatings in their coefficients of thermal expansion. When heat pipes undergo repeated start-ups and shutdowns or power fluctuations, cumulative thermal stress is generated at the heat pipe interface. This causes microcracks perpendicular to the interface to easily form within the coating on the heat pipe surface, which then propagate along columnar grain boundaries. Ultimately, this leads to large-area cracking or even lamellar peeling of the coating, which not only directly damages the protective function of the coating but also affects the operational safety and service life of the reactor system.

[0017] To address the aforementioned technical problems, embodiments of this application provide a method suitable for preparing a porous Ni-W coating on the surface of reactor internals. Figure 1 This is a schematic flowchart of a method for preparing a porous Ni-W coating on the surface of reactor internals according to an embodiment of this application, as shown below. Figure 1As shown, the preparation method includes at least the following steps S1 to S7.

[0018] S1. A Ni-W coating is deposited on the surface of the component using magnetron sputtering.

[0019] S2. Under conditions where the vacuum level reaches a predetermined vacuum level, the component obtained in step S1 is heated at a first predetermined heating rate and pressurized simultaneously until the temperature reaches a first predetermined temperature and the pressure reaches a first predetermined pressure, and then kept at that temperature for a first predetermined time.

[0020] S3. Place the component obtained in step S2 in a vacuum environment and heat the component at a second predetermined heating rate until the temperature reaches the second predetermined temperature.

[0021] S4. Heat the component obtained in step S3 at a third predetermined heating rate until the temperature reaches the third predetermined temperature, and then keep it at that temperature for a second predetermined time.

[0022] S5. Heat the component obtained in step S4 according to the fourth predetermined heating rate until the temperature reaches the fourth predetermined temperature, and then keep it at that temperature for a third predetermined time.

[0023] S6. Cool the component obtained in step S5, and then heat the component according to the fifth predetermined heating rate until the temperature reaches the fifth predetermined temperature, and then keep it at the temperature for the fourth predetermined time, wherein the fifth predetermined heating rate is greater than the first predetermined heating rate to the fourth predetermined heating rate.

[0024] S7. Cool the part obtained in step S6 to obtain a part with a porous Ni-W coating on its surface.

[0025] The preparation method provided in the embodiments of this application first uses magnetron sputtering to deposit a Ni-W coating on the surface of the component. Then, the component with the Ni-W coating is heated in a segmented heating manner, which can induce a controllable phase transition and element diffusion in the Ni-W coating, thereby forming a porous Ni-W coating on the surface of the component. The porous Ni-W coating has uniformly distributed nanoporous structures. When cracks occur in the component, it can buffer the stress on the component, thereby effectively preventing crack propagation. At the same time, it can avoid the accumulation of heat at the interface between the component and the porous Ni-W coating, reducing the risk of the porous Ni-W coating falling off the component due to thermal expansion, improving the thermal shock resistance of the component, and thus ensuring the operational safety and service life of the reactor system.

[0026] In some embodiments, the component for which the porous Ni-W coating is to be prepared may include, but is not limited to, components composed of nickel-based alloys, austenitic stainless steel, and refractory alloys disposed in a special space power reactor.

[0027] In some embodiments, step S2 includes the following steps: controlling the first predetermined heating rate to be in the range of 8~15℃ / min, and / or controlling the first predetermined temperature to be in the range of 900~1300℃, and / or controlling the first predetermined pressure to be in the range of 150~200MPa.

[0028] In some embodiments, step S3 includes the following steps: controlling the second predetermined heating rate to be in the range of 10~20℃ / min, and / or controlling the second predetermined temperature to be in the range of 450~650℃.

[0029] In some embodiments, step S4 includes the following steps: controlling the third predetermined heating rate to be in the range of 5~15℃ / min, and / or controlling the third predetermined temperature to be in the range of 750~950℃.

[0030] In some embodiments, step S5 includes the following steps: controlling the fourth predetermined heating rate to be in the range of 2~10℃ / min, and / or controlling the fourth predetermined temperature to be in the range of 1000~1100℃.

[0031] In some embodiments, step S6 includes the following steps: controlling the fifth predetermined heating rate within the range of 30~50℃ / min, and / or controlling the fifth predetermined temperature within the range of 650~850℃.

[0032] The preparation method provided in the embodiments of this application sets a first predetermined heating rate to a fifth predetermined heating rate and a first predetermined temperature range to a fifth predetermined temperature range according to the predetermined heating rate range and temperature range, respectively, and performs segmented heat treatment on the Ni-W coating. The resulting porous Ni-W coating can effectively alleviate the stress on the coating in actual use, thereby avoiding cracking of the porous Ni-W coating.

[0033] In some embodiments, the first predetermined heating rate may be, for example, 9°C / min, 11°C / min, 12°C / min, or 14°C / min.

[0034] In some embodiments, the first predetermined temperature may be, for example, 950°C, 1000°C, 1050°C, or 1100°C.

[0035] In some embodiments, the first predetermined pressure may be, for example, 155 MPa, 160 MPa, 170 MPa, or 180 MPa.

[0036] In some embodiments, the second predetermined heating rate may be, for example, 11°C / min, 13°C / min, 15°C / min, or 17°C / min.

[0037] In some embodiments, the second predetermined temperature may be, for example, 460°C, 500°C, 540°C, or 580°C.

[0038] In some embodiments, the third predetermined heating rate may be, for example, 6°C / min, 8°C / min, 10°C / min, or 12°C / min.

[0039] In some embodiments, the third predetermined temperature may be, for example, 760°C, 800°C, 850°C, or 900°C.

[0040] In some embodiments, the fourth predetermined heating rate may be, for example, 4°C / min, 5°C / min, 7°C / min, or 9°C / min.

[0041] In some embodiments, the fourth predetermined temperature may be, for example, 1030°C, 1040°C, 1050°C, or 1080°C.

[0042] In some embodiments, the fifth predetermined heating rate may be, for example, 35°C / min, 40°C / min, or 45°C / min.

[0043] In some embodiments, the fifth predetermined temperature may be, for example, 700°C, 750°C, 800°C, or 850°C.

[0044] In some embodiments, step S1 includes the following steps: S11, obtaining the component to be coated with Ni-W and the W and Ni targets for preparing the Ni-W coating; S12, clamping and fixing the component using a clamping device, and then adjusting the position between the component and the W and Ni targets; S13, depositing the Ni-W coating on the surface of the component by magnetron sputtering when the temperature reaches a predetermined temperature and the vacuum level reaches a predetermined vacuum level; S14, cooling the component with the Ni-W coating on its surface.

[0045] The preparation method provided in the embodiments of this application uses magnetron sputtering to deposit a Ni-W coating on the surface of a component. The obtained Ni-W coating has equiaxed nanocrystals with fine and uniform grains and uniform internal alloying elements. It can maintain good structural integrity on the surface of the component and is not easy to fall off. This gives the component good thermal vacuum volatilization performance in high temperature and ultra-high vacuum environments. At the same time, due to the long-term bombardment of the component by sputtered atoms during the deposition process, the prepared Ni-W coating has a certain temperature rise. After the preparation is completed, the component with the Ni-W coating is cooled, which helps to reduce the internal stress of the component and prevents the surface of the Ni-W coating from being oxidized by air.

[0046] In some embodiments, W targets and Ni targets can be prepared by methods such as vacuum arc furnace melting, powder metallurgy, or spark plasma sintering, and this application does not limit this.

[0047] In some embodiments, prior to step S11, the following steps are included: determining that the content of W element in the W target is greater than or equal to 99.9 wt%, and determining that the content of Ni element in the Ni target is greater than or equal to 99.9 wt%, thereby ensuring the uniformity of the Ni-W coating prepared using high-purity target material and its stability on the surface of the component.

[0048] In some embodiments, in step S12, adjusting the position between the component and the W target and the Ni target includes the following steps: controlling the distance between the component and the W target and the Ni target to be within the range of 55mm to 65mm.

[0049] The preparation method provided in the embodiments of this application sets the distance between the component and the W target and the Ni target to 55mm~65mm, which can prevent unevenness of the Ni-W coating obtained during the deposition process due to different deposition distances.

[0050] In some embodiments, the distance between the component and the W target and the Ni target can be, for example, 58 mm, 60 mm or 63 mm.

[0051] In some embodiments, the component, the W target, and the Ni target are disposed within a vacuum device. Step S13 includes the following steps: S131, evacuating and heating the vacuum device to a predetermined temperature and a predetermined vacuum level; S132, introducing an inert gas into the vacuum device and maintaining the pressure within the vacuum device at a predetermined pressure; S133, performing glow discharge and bombardment on the component using the W target and the Ni target, and then depositing a coating to deposit a Ni-W coating on the surface of the component.

[0052] The preparation method provided in the embodiments of this application deposits a Ni-W coating on the surface of the component according to the above steps, which can ensure that the surface of the obtained Ni-W coating is smooth and reduce the effective volatilization area, thereby improving the stability and service reliability of the Ni-W coating in a thermal vacuum environment.

[0053] In some embodiments, step S131 includes the following step: controlling the temperature inside the vacuum device to 350°C~450°C.

[0054] In some embodiments, step S131 further includes the step of controlling the vacuum level within the vacuum device to be lower than or equal to... Pa.

[0055] In some embodiments, the vacuum level in the vacuum device can be pre-evacuated to below 4.0 Pa, and then finely evacuated until the vacuum level is reached. Below Pa.

[0056] In some embodiments, the vacuum level in the vacuum device is pre-evacuated to 4.0 Pa as a coarse evacuation process. The vacuum pump used at this time is a coarse evacuation pump. Only when the vacuum level reaches below 4.0 Pa can the working requirements of the molecular pump be met. Then, the molecular pump is used to perform fine evacuation in the vacuum device. This can reduce the risk of tungsten-based coating being contaminated during sputtering, thereby obtaining a tungsten-based coating with higher purity and more accurate composition. At the same time, it is also beneficial to protect the vacuum pump group, extend the life of the vacuum pump group, and reduce maintenance costs.

[0057] In some embodiments, the vacuum device may be pre-evacuated to a vacuum level below 4.0 Pa, followed by fine evacuation until the vacuum level is reached. The deposition temperature was set to 350~400℃, and the rotation speed of the vacuum apparatus was set to 30~50Hz clockwise. When the temperature and vacuum level inside the vacuum apparatus reached 400℃ and... Glow discharge and bombardment were performed at Pa, with Ar gas introduced at a flow rate of 100 sccm to 250 sccm. The angle of the throttle valve in the vacuum device was adjusted to 0° to ensure that the pressure inside the vacuum device was stable at 1 to 2 Pa. Then, during bombardment, a high-power Cr target was turned on with a power setting of 0.8 kW, and the throttle valve was adjusted to 45° to ensure that the deposition pressure inside the vacuum device was 0.8 Pa. During the aforementioned operations, the intermediate frequency bias power supply of the vacuum device was turned on and the bias high-level setting was adjusted to achieve a substrate bias voltage of -800 V and a duty cycle of 87%. Subsequently, the glow discharge cleaning time of the vacuum device was set to 25 to 35 minutes, and the bombardment cleaning time of the target surface and component surface was set to 8 to 10 minutes. Finally, deposition coating was performed with the power of the Ni target and W target set to 0.8 to 2 kW and the deposition time set to 60 to 350 minutes to obtain a Ni-W coating with a thickness in the range of 1.0 to 5.0 μm.

[0058] In some embodiments, step S11 involves obtaining a component to which a Ni-W coating is to be prepared, including the following steps: S111, chamfering the component; S112, progressively grinding and polishing the component obtained in step S11; S113, wet sandblasting the surface of the component obtained in step S12 to remove the oxide layer on the surface of the component and improve the adhesion between the Ni-W coating and the component.

[0059] The preparation method provided in the embodiments of this application involves chamfering the component to prevent the oxide film at the edge of the component from cracking due to stress concentration, and then grinding and polishing the component step by step to ensure that the surface of the component is smooth.

[0060] In some embodiments, coarse sandpaper can be used to remove wire cutting marks on the surface of the component, and then 600-3000 grit sandpaper can be used for polishing.

[0061] In some embodiments, step S113 includes the following step: using a 100-250 mesh material. Using a ball to perform wet sandblasting on the surface of the component helps to improve the removal effect of the oxide layer on the component surface.

[0062] In some embodiments, after step S113, the following steps are also included: S114, ultrasonically cleaning the component after wet sandblasting with a deionizing and decontaminating cleaning agent for a predetermined time, and then drying it with cold air; S115, ultrasonically cleaning the component obtained in step S114 with alcohol for a second predetermined time, and then drying it with warm air. This can remove oil and impurities from the surface of the component, thereby ensuring the preparation effect of the subsequent Ni-W coating.

[0063] In some embodiments, the components can be ultrasonically cleaned for 30-60 minutes using deionizing agents and detergents to remove oil and dirt, and then dried with cold air; then ultrasonically cleaned with alcohol for 30-60 minutes, and then dried with warm air, and placed in a high-purity nitrogen environment for later use.

[0064] In some embodiments, the prepared porous Ni-W coating was subjected to a thermal shock test. After more than 10 cycles of heat treatment at a temperature of 900°C and a predetermined heating rate of 30-50°C / min, the porous Ni-W coating was still able to maintain the integrity of the structure and did not peel off from the component.

[0065] The following detailed description of specific embodiments illustrates the process of preparing porous Ni-W coatings using the methods provided in the embodiments of this application.

[0066] Example 1 Step 1: Obtain the nickel-based alloy component, pure Ni target, and pure W target to be coated with Ni-W. The nickel-based alloy component is a component in the reactor made of nickel-based alloy.

[0067] Step 2: Chamfer the nickel-based alloy parts, then use coarse sandpaper to remove the wire cutting marks on the surface of the nickel-based alloy parts, and then continue to polish them with 2000-grit sandpaper.

[0068] Step 3: Utilize 150 mesh The surface of the nickel-based alloy component is wet-blasted to remove the surface oxide layer and enhance the adhesion between the coating and the substrate. Then, it is ultrasonically cleaned for 30 minutes with deionizer and detergent, dried with cold air, ultrasonically cleaned with alcohol for 30 minutes, removed and dried with warm air, and then dried under high-purity nitrogen for later use.

[0069] Step 4: Place the nickel-based alloy component into the designated position of the sample fixture, fix and clamp it. Use a wire to place the fixture with the sample in it onto the coating chamber rotating frame and adjust and fix it so that the distance between the target and the nickel-based alloy component is 60mm. After checking that everything is correct, turn off the vacuum device.

[0070] Step 5: First, pre-evacuate the vacuum device to a vacuum level below 4.0 Pa, then perform a fine evacuation until the vacuum level is reached. Below Pa, the deposition temperature is set to 400℃, and the rotation speed is set to 40Hz forward.

[0071] Step Six: When the temperature and vacuum level inside the vacuum device reach 400℃ and At a pressure of 1.5 Pa, glow discharge and bombardment were performed, and Ar gas was introduced at a flow rate of 150 sccm. The throttle valve angle was adjusted to 0° to ensure that the pressure inside the vacuum device was stable at 1.5 Pa. Then, during bombardment, a high-power Cr target was turned on, the target power was set to 0.8 kW, and the throttle valve was adjusted to 45° to ensure that the deposition pressure inside the vacuum device was 0.8 Pa. Then, the glow discharge cleaning time of the vacuum device was set to 30 min, and the bombardment cleaning time of the target surface and the nickel-based alloy component surface was set to 10 min. Finally, deposition coating was performed, with the Ni target and W target power set to 1.4 kW and the deposition time set to 300 min to obtain a Ni-W coating with a thickness in the range of 2.1 μm.

[0072] Step 7: After deposition, remove the material after it has been fully cooled in the vacuum apparatus with the furnace.

[0073] Step 8: Place the nickel-based alloy component with the Ni-W coating into a heat treatment apparatus, and then evacuate it to... Below Pa, the temperature is increased at 10℃ / min, and the pressure is increased simultaneously during the heating process, so that the temperature and pressure in the heat treatment device reach the temperature and pressure of hot isostatic pressing at the same time. Then, the temperature is held for 3 hours, and finally cooled to room temperature with the furnace. The sample is then taken out. The temperature of hot isostatic pressing is 1100℃ and the pressure is 170MPa.

[0074] Step 9: Fix the hot isostatically pressed Ni-W coating onto the shelf, place it in a high-temperature vacuum furnace, and evacuate until... Below Pa.

[0075] Step 10: Vacuum degree reaches After Pa is below 600°C, the temperature is increased to 600°C at a predetermined heating rate of 15°C / min; then increased to 850°C at a predetermined heating rate of 10°C / min, held for 15 min, and then increased to 1020°C at a predetermined heating rate of 5°C / min, held for 30 min.

[0076] Step 11: After the heat preservation is completed, cool the furnace to a temperature below 50°C, then heat to 770°C at a predetermined heating rate of 30°C / min, hold for 360 minutes, and then cool to room temperature in the furnace before taking it out. This will yield a nickel-based alloy part with a porous Ni-W coating on its surface.

[0077] In such an embodiment, the prepared porous Ni-W coating was subjected to a thermal shock test. After more than 20 cycles of heat treatment at a predetermined heating rate of 35°C / min at a temperature of 800°C, the porous Ni-W coating was still able to maintain the integrity of the structure and did not peel off from the nickel-based alloy component.

[0078] Example 2 Step 1: Obtain the nickel-based alloy component, pure Ni target, and pure W target to be coated with Ni-W. The nickel-based alloy component is a component made of 316 austenitic stainless steel within the reactor.

[0079] Step 2: Chamfer the nickel-based alloy parts, then use coarse sandpaper to remove the wire cutting marks on the surface of the nickel-based alloy parts, and then continue to polish them with 2000-grit sandpaper.

[0080] Step 3: Utilize 150 mesh The surface of the nickel-based alloy component is wet-blasted to remove the surface oxide layer and enhance the adhesion between the coating and the substrate. Then, it is ultrasonically cleaned for 30 minutes with deionizer and detergent, dried with cold air, ultrasonically cleaned with alcohol for 30 minutes, removed and dried with warm air, and then dried under high-purity nitrogen for later use.

[0081] Step 4: Place the nickel-based alloy component into the designated position of the sample fixture, fix and clamp it. Use a wire to place the fixture with the sample in it onto the coating chamber rotating frame and adjust and fix it so that the distance between the target and the nickel-based alloy component is 60mm. After checking that everything is correct, turn off the vacuum device.

[0082] Step 5: First, pre-evacuate the vacuum device to a vacuum level below 4.0 Pa, then perform a fine evacuation until the vacuum level is reached. Below Pa, the deposition temperature is set to 400℃, and the rotation speed is set to 40Hz forward.

[0083] Step Six: When the temperature and vacuum level inside the vacuum device reach 400℃ and At a pressure of 1.5 Pa, glow discharge and bombardment were performed, and Ar gas was introduced at a flow rate of 150 sccm. The throttle valve angle was adjusted to 0° to ensure that the pressure inside the vacuum device was stable at 1.5 Pa. Then, during bombardment, a high-power Cr target was turned on, the target power was set to 0.8 kW, and the throttle valve was adjusted to 45° to ensure that the deposition pressure inside the vacuum device was 0.8 Pa. Then, the glow discharge cleaning time of the vacuum device was set to 30 min, and the bombardment cleaning time of the target surface and the nickel-based alloy component surface was set to 10 min. Finally, deposition coating was performed, with the Ni target and W target power set to 1.7 kW and the deposition time set to 350 min to obtain a Ni-W coating with a thickness in the range of 2.3 μm.

[0084] Step 7: After deposition, remove the material after it has been fully cooled in the vacuum apparatus with the furnace.

[0085] Step 8: Place the nickel-based alloy component with the Ni-W coating into a heat treatment apparatus, and then evacuate it to... Below Pa, the temperature is increased at 10℃ / min, and the pressure is increased simultaneously during the heating process, so that the temperature and pressure in the heat treatment device reach the temperature and pressure of hot isostatic pressing at the same time. Then, the temperature is held for 4 hours, and finally cooled to room temperature with the furnace. The nickel-based alloy parts are then taken out. The temperature of hot isostatic pressing is 1200℃ and the pressure is 160MPa.

[0086] Step 9: Fix the hot isostatically pressed Ni-W coating onto the shelf, place it in a high-temperature vacuum furnace, and evacuate until... Below Pa.

[0087] Step 10: Vacuum degree reaches After Pa is below 650°C, the temperature is increased to 650°C at a predetermined heating rate of 20°C / min; then increased to 850°C at a predetermined heating rate of 15°C / min, held for 20 min, and then increased to 1020°C at a predetermined heating rate of 5°C / min, held for 60 min.

[0088] Step 11: After the heat preservation is completed, cool the furnace to a temperature below 50°C, then heat to 800°C at a predetermined heating rate of 35°C / min, hold for 300 minutes, and then cool to room temperature in the furnace before taking it out. This will yield a nickel-based alloy part with a porous Ni-W coating on its surface.

[0089] In such an embodiment, the prepared porous Ni-W coating was subjected to a thermal shock test. After more than 20 cycles of heat treatment at a predetermined heating rate of 35°C / min at a temperature of 850°C, the porous Ni-W coating was still able to maintain the integrity of the structure and did not peel off from the nickel-based alloy component.

[0090] Regarding the embodiments of this application, it should also be noted that, without conflict, the embodiments of this application and the features in the embodiments can be combined with each other to obtain new embodiments.

[0091] The above description is merely a specific embodiment of this application, but the scope of protection of this application is not limited thereto. The scope of protection of this application shall be determined by the scope of the claims.

Claims

1. A method suitable for preparing a porous Ni-W coating on the surface of a reactor component, characterized in that, It comprises the following steps: S1, depositing and preparing a Ni-W coating on the surface of the component by magnetron sputtering; S2, heating the component obtained in step S1 at a first predetermined heating rate in a vacuum environment with a predetermined vacuum degree, while pressurizing, until the temperature reaches a first predetermined temperature and the pressure reaches a first predetermined pressure, and then maintaining the temperature for a first predetermined time length; S3, placing the component obtained in step S2 in a vacuum environment and heating the component at a second predetermined heating rate until the temperature reaches a second predetermined temperature; S4, heating the component obtained in step S3 at a third predetermined heating rate until the temperature reaches a third predetermined temperature, and then maintaining the temperature for a second predetermined time length; S5, heating the component obtained in step S4 at a fourth predetermined heating rate until the temperature reaches a fourth predetermined temperature, and then maintaining the temperature for a third predetermined time length; S6, cooling the component obtained in step S5, and then heating the component at a fifth predetermined heating rate until the temperature reaches a fifth predetermined temperature, and then maintaining the temperature for a fourth predetermined time length; S7, cooling the component obtained in step S6 to obtain the component with the porous Ni-W coating prepared on the surface thereof; Wherein, the fifth predetermined heating rate is greater than the first to fourth predetermined heating rates.

2. The method of claim 1, wherein, In step S2, the following steps are included: controlling the first predetermined heating rate to be within the range of 8-15 ℃ / min, and / or controlling the first predetermined temperature to be within the range of 900-1300 ℃, and / or controlling the first predetermined pressure to be within the range of 150-200 MPa.

3. The method of claim 1, wherein, In step S3, the following steps are included: controlling the second predetermined heating rate to be within the range of 10-20 ℃ / min, and / or controlling the second predetermined temperature to be within the range of 450-650 ℃.

4. The method of claim 3, wherein, In step S4, the following steps are included: controlling the third predetermined heating rate to be within the range of 5-15 ℃ / min, and / or controlling the third predetermined temperature to be within the range of 750-950 ℃.

5. The method of claim 4, wherein, In step S5, the following steps are included: controlling the fourth predetermined heating rate to be within the range of 2-10 ℃ / min, and / or controlling the fourth predetermined temperature to be within the range of 1000-1100 ℃.

6. The method of claim 1, wherein, In step S6, the following steps are included: controlling the fifth predetermined heating rate to be within the range of 30-50 ℃ / min, and / or controlling the fifth predetermined temperature to be within the range of 650-850 ℃.

7. The method according to any one of claims 1 to 6, characterized in that, In step S1, the following steps are included: S11, obtaining a component to be prepared with the Ni-W coating and W and Ni target materials for preparing the Ni-W coating; S12, clamping and fixing the component by using a clamping device, and then adjusting the positions between the component and the W and Ni target materials; S13, depositing and preparing the Ni-W coating on the surface of the component by magnetron sputtering when the temperature reaches a predetermined temperature and the vacuum degree reaches a predetermined vacuum degree. S14, cooling the component with the Ni-W coating prepared on the surface.

8. The method of claim 7, wherein, The component, the W target and the Ni target are arranged in a vacuum device, and in the step S13, the following steps are included: S131, vacuumizing and heating the vacuum device, so that the temperature reaches the predetermined temperature and the vacuum degree reaches the predetermined vacuum degree; S132, introducing inert gas into the vacuum device, and keeping the pressure in the vacuum device at a predetermined pressure; S133, using the W target and the Ni target to glow and bombard the component, and then depositing a film to deposit the Ni-W coating on the surface of the component.

9. The method of claim 8, wherein, In the step S131, the following steps are included: The temperature in the vacuum device is controlled to be 350-450°C.

10. The method of claim 8, wherein, In the step S131, the following steps are also included: controlling a vacuum level within the vacuum device to be less than or equal to Pa.

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