Optical fiber mode multiplexing quasi-homochromatic marginal light suppression super-resolution photoetching system

Abstract

The invention discloses an optical fiber mode multiplexing quasi-homochromatic marginal light suppression super-resolution photoetching system. The system aims to solve the problem of nonlinear dispersion of femtosecond laser in optical fiber transmission and the problem of poor stability of annular suppression light spots generated by a traditional spatial light path. The core lies in three modules: firstly, a fiber-grating-fiber dispersion compensation module (a large-mode-field-diameter photonic crystal fiber is combined with a grating pair) is adopted, so that broadening of femtosecond pulses is effectively inhibited, and high-peak power required by inscribing is ensured; the optical fiber generation of an incoherent Hermite-Gaussian mode is realized, annular suppression and Gaussian excitation light spots (collectively called PPI light spots) with stable intensity distribution are synthesized, and the anti-interference capability of the system is remarkably improved. And parallel direct writing is realized through the multi-channel optical fiber array and the high-speed scanning module. According to the invention, the PPI light spot array with low dispersion and high stability is generated by using the optical fiber, the expansibility is good, and high-precision and high-flux three-dimensional super-resolution photoetching processing can be realized.

Description

Technical Field

[0001] This invention belongs to the fields of micro-nano optics technology and micro-nano additive manufacturing, specifically relating to a fiber mode multiplexing quasi-color edge light suppression super-resolution lithography system. Background Technology

[0002] Two-photon laser direct-write lithography has attracted much attention due to its ability to overcome the diffraction limit and achieve nanoscale three-dimensional structure processing. Current two-photon laser direct-write processing precision is generally above 100 nm, and its large-area processing capability is insufficient. Edge-suppressed direct-write lithography (PPI), similar to the stimulated emission loss (STED) principle, effectively improves the precision of two-photon processing; however, it often employs complex spatial optical path modulation, resulting in bulky systems with poor stability and scalability, severely restricting its industrial application and performance improvement. While fiber optic systems offer high integration and scalability, the nonlinear dispersion and intermodal interference generated during femtosecond laser transmission in fiber optics limit their application in high-speed, high-precision processing.

[0003] Patent application CN112666803A discloses a parallel direct-write device based on edge light suppression dot matrix generation and independent control. It comprises two beams: one beam generates a vortex suppression light array through a vortex film MLA, while simultaneously using a microluminescent lamp (SLM) to control the position and morphology of each vortex beam, and combining this with a digital dimming device (DMD) to independently adjust the intensity of the vortex beams, thereby controlling the size of the aggregation region; the other beam generates an excitation light array through the MLA, while simultaneously using an SLM to control the position of each excitation light, achieving precise overlap between the excitation light and the vortex light array. This invention can generate a high-quality PPI array with independently controllable write dot size. Each PPI spot consists of an excitation light and a vortex suppression light. Using PPI arrays with the same write dot size for processing offers advantages such as ultra-high resolution, high throughput, and high uniformity. By controlling the write dot size to achieve a specific distribution, it can also realize grayscale lithography, processing arbitrary high-uniformity curved surface structures and true three-dimensional microstructures, and can be applied to super-resolution lithography.

[0004] Patent application CN112859534A discloses a parallel direct-write device and method based on an edge light suppression array. This device can generate an N×N high-quality PPI array with independently controllable intensity. Each PPI writing point is formed by the overlap of an interference lattice dark spot and an excitation beam, providing high-throughput super-resolution writing capability. The device mainly includes two beams: one beam generates an array of equally spaced and intensified light spots through four-beam interference, with the dark spots serving as vortex suppression beams; the other beam generates an N×N excitation beam array through an MLA, while the position and intensity of each excitation beam are controlled by an SLM and a DMD respectively, achieving precise overlap between the vortex beam array and the excitation beam array, and ensuring independent controllability of the writing point size. This device and method, by generating a PPI array with the same writing point size, can perform high-throughput super-resolution direct-write processing of highly uniform three-dimensional structures, control the writing point size to achieve a specific distribution, and can also process arbitrary curved surface structures in parallel, making it applicable to fields such as super-resolution lithography.

[0005] However, the systems disclosed in the aforementioned patent applications cannot achieve multi-channel parallel output and independent control, resulting in only a slight improvement in processing efficiency. Therefore, developing a lithography system that can simultaneously achieve high resolution, high stability, high throughput parallel processing capabilities, and is easy to integrate is of great significance. Summary of the Invention

[0006] The purpose of this invention is to overcome the shortcomings of the prior art and provide a super-resolution lithography technology for suppressing quasi-chromatic edge light in fiber mode multiplexing, which aims to solve key problems such as dispersion management, suppression of spot generation stability, and high-throughput parallelization of the system in femtosecond laser fiber transmission.

[0007] Compared with the prior art, the beneficial effects of the present invention are as follows: This invention constructs a "fiber-grating-fiber" cascaded dispersion compensation structure using a large-mode-area-diameter photonic crystal fiber, grating pairs, a roof-shaped reflective prism, and fiber modules. By introducing a controllable nonlinear phase shift through the large-mode-area-diameter photonic crystal fiber and combining it with the grating pairs for time-frequency reversal, it synchronously compensates for higher-order nonlinear dispersion and system linear dispersion in femtosecond laser transmission, effectively suppressing pulse broadening and ensuring that the excitation light maintains a high peak power when it reaches the processing focus, thus providing a reliable energy basis for two-photon polymerization.

[0008] This invention also utilizes a Dowell prism to incoherently combine two orthogonally polarized Hermitian-Gaussian modes to generate a hollow suppression spot with stable intensity distribution. This spot is insensitive to external environmental disturbances, overcoming the defect of the spot being easily affected by phase fluctuations in traditional coherent combining schemes, and significantly improving the system's anti-interference capability and long-term operational stability.

[0009] This invention also utilizes all-fiber beam splitting and independent acousto-optic modulation technology in the beam splitting module to achieve multi-channel parallel output of the PPI beam and independent switching and intensity control of the beam spot in each channel. This not only significantly improves the processing throughput but also endows the system with "grayscale writing" capability, opening up a new path for the high-flexibility and high-uniformity fabrication of complex three-dimensional microstructures. Ultimately, the all-fiber design concept makes the system compact and easy to integrate, freeing it from the constraints of vibration sensitivity in traditional spatial optical paths, and providing solid technical support for building high-precision, high-throughput, and high-stability industrial-grade super-resolution lithography equipment. Attached Figure Description

[0010] Figure 1 A schematic diagram of a fiber mode multiplexing quasi-color edge light suppression super-resolution lithography system provided for a specific embodiment of the present invention; Figure 2 This is a schematic diagram of a beam splitter module provided for a specific embodiment of the present invention. Detailed Implementation

[0011] The technical solution of the present invention will be described in detail below with reference to the accompanying drawings. The following description is intended to clearly demonstrate the working principle and implementation process of the present invention, and is not intended to limit the scope of protection of this patent.

[0012] Specific embodiments of the present invention provide a fiber-mode multiplexed quasi-chromatic edge light suppression super-resolution lithography system, such as... Figure 1 As shown, it includes a dispersion compensation module, a PPI spot control module, and a writing module. The dispersion compensation module includes a method for performing nonlinear dispersion pre-compensation on the excitation light through a large mode field diameter photonic crystal fiber, and then performing linear dispersion compensation on the excitation light through a grating pair and a roof reflection prism.

[0013] Specifically, the dispersion compensation module provided in this embodiment includes an excitation light source 1, a first quarter-wave plate 2, a first electrically controlled mirror 3, a second electrically controlled mirror 4, a first objective lens 8, a large-mode-field diameter photonic crystal fiber 9, a few-mode fiber array 41, a second objective lens 10, a first mirror 11, a grating pair 12, and a roof prism 13. The excitation light source 1 provided in this embodiment is corrected to linearly polarized light by the first quarter-wave plate 2, then passes through the first electrically controlled mirror 3 and the second electrically controlled mirror 4 before being incident on the first objective lens 8. It is then coupled to the large-mode-field diameter photonic crystal fiber 9 to pre-compensate for the nonlinear dispersion generated by the subsequent few-mode fiber array 41. After exiting the second objective lens 10, it passes through the first mirror 11 and enters the grating pair 12 and the roof prism 13 to compensate for the remaining linear dispersion of the system.

[0014] In a specific embodiment of this invention, to achieve high-precision two-photon lithography, it is necessary to maintain the narrow pulse width and high peak power of the femtosecond laser. When the femtosecond laser propagates in an optical fiber, the self-phase modulation effect introduces a nonlinear phase shift, resulting in pulse broadening. Conventional grating pairs mainly compensate for linear dispersion, but have limited ability to compensate for higher-order nonlinear dispersion. The "fiber-grating-fiber" compensation structure introduced in this invention works by first introducing a controllable nonlinear phase shift (time-domain effect) through a large-mode-area diameter photonic crystal fiber 9, and then performing time-frequency distribution reversal (introducing negative linear dispersion) through grating pair 12. The nonlinear dispersion generated by this pre-compensated optical pulse during subsequent propagation in the few-mode fiber array 41 can be canceled out by the pre-compensation. Therefore, by precisely adjusting the length of the photonic crystal fiber and the spacing of the grating pairs, effective management of the dispersion (including linear and nonlinear) of the entire system can be achieved.

[0015] In one specific embodiment, the dispersion compensation module provided in this embodiment further includes a first half-wave plate 5, a first PBS 6, and a first energy detector 7; The light beam after passing through the first electrically controlled reflector 3 and the second electrically controlled reflector 4 is split after passing through the first half-wave plate 5 and the first PBS 6. One beam of light is incident on the first objective lens 8, and the other beam of light enters the first energy detector 7. The first energy detector 7 is used to read the real-time power detection map position of the two received light by receiving the excitation light from the first PBS 6 in proportion. When the map position deviates, the linearly polarized light is corrected by adjusting the first electrically controlled reflector and the second electrically controlled reflector.

[0016] The PPI beam control module provided in this specific embodiment of the invention is used to modulate the suppression light into a 0-π phase HG using a spatial modulator. 01 The beam is split into two beams with mutually perpendicular polarization by the third PBS. One beam is mirrored by the Dowell prism and then combined with the other beam to obtain a hollow ring spot. The emitted hollow ring spot is combined with the dispersion-compensated excitation light to obtain PPI light.

[0017] In one specific embodiment, the PPI beam control module provided by this invention includes a suppressed light source 16, a second quarter-wave plate 17, a third electrically controlled mirror 18, a fourth electrically controlled mirror 19, a beam expander 23, a third half-wave plate 24, a fourth mirror 25, a spatial light modulator (SLM) 26, a fifth mirror 27, a third half-wave plate 28, a third PBS 29, a sixth mirror 30, a Dove prism 31, a seventh mirror 32, a fourth PBS 35, and a first BS 36, wherein... The suppressed light generated by the suppressed light source 16 is corrected into linearly polarized light by the second quarter-wave plate 17, and then expanded by the beam expander 23 after passing through the third and fourth electrically controlled mirrors 18 and 19. It then passes through the third half-wave plate 24 and the fourth mirror 25 and is incident on the spatial light modulator SLM 26, where it is modulated into a 0-π phase HG01 mode. The third half-wave plate 24 is used to distribute the power ratio of different diffraction orders of the SLM. The light then passes through the fifth mirror 27 and the third half-wave plate 28 and is incident on the third PBS. Beam splitting at 29 yields two beams with mutually perpendicular polarization: the transmitted P-beam and the reflected S-beam. The power ratio of these two beams is adjusted to be as close as possible by rotating the third half-wave plate 28. The P-beam is incident on the Dowell prism 31 via the sixth reflecting mirror 30. The Dowell prism 31 mirrors the incident P-beam, which is then incident on the fourth PBS 35 via the seventh reflecting mirror 32. There, it is combined with the S-beam from the eighth and ninth reflecting mirrors 33 and 34 to form a hollow annular spot. The perpendicular polarization directions of the two beams ensure incoherence during combining, thus reducing the influence of external interference. The emitted annular suppression beam is combined with the excitation beam from the third reflecting mirror 15 in the first BS 36 to form a PPI beam.

[0018] The core of the PPI spot control module provided in this specific embodiment of the invention lies in the use of a Dove prism to achieve incoherent mode synthesis. Specifically, the HG emitted from the third PBS 29... 01 Mode (P-light) and HG 01 The mode (S-beam) is converted into orthogonal polarization states and processed through the Dove prism and mirror optical paths, respectively, and finally combined into a hollow spot in the fourth PBS 35. Because the combined beams are orthogonally polarized, their superposition is incoherent, and the intensity distribution of the spot is only the sum of the intensities of the two modes. It is not sensitive to relative phase fluctuations caused by environmental disturbances (such as temperature changes and vibrations), and therefore can maintain higher stability in different environments compared to coherent combining schemes.

[0019] The spatial light modulator (SLM) 26 provided in this specific embodiment of the invention symmetrically divides the effective pixel region into two units, introducing a phase difference of π between the two units. This enables the continuous suppression light emitted from the suppression light source 16 to be modulated into a 0-π phase HG when emitted from the spatial light modulator (SLM) 26. 01 model.

[0020] The PPI beam control module provided in the specific embodiment of the present invention further includes a second half-wave plate 20, a second PBS 21, and a second energy detector 22. The beam after passing through the third electrically controlled reflector 18 and the fourth electrically controlled reflector 19 is split after passing through the second half-wave plate 20 and the second PBS 21. One beam of light is incident on the beam expander 23, and the other beam of light enters the second energy detector 22. The second energy detector 22 is used to read the position of the light power detection map by receiving the suppressed light in real time. When the position of the map is deviated, the linearly polarized light is corrected by adjusting the third electrically controlled reflector 18 and the fourth electrically controlled reflector 19.

[0021] The writing module provided in the specific embodiment of the present invention is used to split PPI light into multiple beams through a beam splitting module, and each beam can be modulated individually. The modulated multiple beams are coupled to the fiber optic module through the objective lens array for transmission and synthesis into a dot matrix beam. The dot matrix beam is incident on the high-speed scanning galvanometer through the third objective lens and then imaged on the writing plane by the photolithography module.

[0022] Specifically, the PPI light is incident on the beam splitter module 38 through the tenth reflector 37 and split into eight beams. After passing through the objective lens array 39, the fiber flange array 40, and the few-mode fiber array 41, it is combined into a dot matrix beam in the fiber V-groove 42 and exited from the third objective lens 43. After being reflected by the eleventh reflector 44 and the second BS 45, it is incident on the high-speed scanning galvanometer 47 to realize the scanning function of the photolithography system. After passing through the scanning lens 48, the field lens 49, the dichroic mirror 50, and the third BS 52, it is imaged onto the writing plane 54 by the fourth objective lens 53. The PPI beam array in the plane undergoes a two-photon aggregation effect caused by the excitation light and a light suppression effect caused by the suppression light, realizing super-resolution parallel direct writing processing.

[0023] The beam splitting module provided in the specific embodiments of the present invention includes multiple half-wave plates, multiple PBS, multiple reflectors, and multiple acousto-optic modulators.

[0024] In this process, the PPI light is split into multiple beams by different PBSs, and the split beams are then modulated by half-wave plates to achieve a power ratio of 1:1 for each split. One beam is then passed through a reflector and its optical path is aligned with that of the other beam. The split beams are then individually modulated without crosstalk by their respective acousto-optic modulators and then coupled to the fiber optic module for transmission.

[0025] In one specific embodiment, such as Figure 2As shown, the beam splitting module 38 provided in this embodiment includes a twelfth reflector 55, fourth to tenth half-wave plates 56-62, fourth to tenth PBS 63-69, thirteenth to sixteenth reflectors 70-73, eleventh to eighteenth half-wave plates 74-81, and first to eighth acousto-optic modulators (AOMs) 82-89. The PPI beam incident through the tenth reflector 37 passes through the twelfth reflector 55 and sequentially through the fourth to tenth PBS 63-69. The fourth to tenth half-wave plates 56-62 are rotated to ensure that the power ratio of each beam split is 1:1, so that the eight split PPI beams enter the objective lens array 39 and are coupled into the few-mode fiber array 41 with equal power to the fiber flange array 40. The independent half-wave plate PBS combination and AOM controller realize crosstalk-free independent control between the eight channels, enabling grayscale writing and facilitating parallel direct writing of complex three-dimensional patterns.

[0026] In a specific embodiment of the present invention, a PPI beam array from an optical fiber V-groove 42 is incident on a high-speed scanning galvanometer 47 to achieve a deflection scanning function for the writing light. The deflection angle of the high-speed scanning galvanometer 47 is then reduced by a scanning lens 48. θ , φ ) and the image plane coordinates of the scanning lens 48 ( x , y The corresponding mapping is formed, and the field lens 49 shapes the image plane of the scanning lens 48 into a plane. After being imaged onto the writing plane 54 by the fourth objective lens 53, the deflection angle of the high-speed scanning galvanometer 47 is achieved. θ , φ ) and the coordinates of the writing plane ( x ', y The mapping relationship between the ') is used to align the written structural data with the coordinate system in the actual space, thereby enabling the processing of highly uniform microstructures.

[0027] In a specific embodiment of the present invention, the first CCD 46 receives the writing PPI spot array transmitted from the second BS 45 to realize the observation and adjustment of the array distribution and uniformity in real time. The second CCD 55 receives the writing PPI spot array reflected from the writing plane 54 and the illumination light to observe the situation of the writing plane 54 in real time, thereby realizing the alignment and writing of the focal plane.

[0028] In one specific embodiment, the excitation optical path provided in this embodiment uses a femtosecond laser 1 with a center wavelength of 520 nm as the excitation source, with a pulse width of less than 150 fs and a repetition frequency of 80 MHz. After laser emission, it is first adjusted to the optimal linear polarization state by a first quarter-wave plate 2. The excitation beam is guided by a first electrically controlled mirror 3 and a second electrically controlled mirror 4, and coupled into a specific length of large-mode-field diameter photonic crystal fiber 9 through a first objective lens 8. This fiber is used to introduce a nonlinear phase shift with a sign opposite to that of the subsequent transmission fiber and an amplitude controllable, to achieve pre-compensation. Subsequently, the beam is collimated by a second objective lens 10 and guided by a first mirror 11 to an adjustable dispersion module composed of a grating pair 12 and a roof prism 13. By finely adjusting the grating spacing, the accumulated linear dispersion of the system is accurately compensated, ensuring that the femtosecond pulse width at the output end is close to the transformation limit and maintaining high peak power. In addition, the large negative linear dispersion provided by the grating pair 12 simultaneously achieves sign reversal of the nonlinear effect provided by the large-mode-field diameter photonic crystal fiber 9.

[0029] The suppression optical path provided in this embodiment uses a 532 nm continuous wave laser 16 as the suppression light source. Its output beam is also adjusted to linearly polarized light via a second quarter-wave plate 17. The suppressed beam is guided by a third electrically controlled mirror 18 and a fourth electrically controlled mirror 19 to a beam expander 23, and after beam expansion, it is incident on a spatial light modulator (SLM) 26. The SLM loads a pre-calculated 0-π grayscale phase map, converting the incident Gaussian light into HG. 01 Mode. The HG 01 The mode beam is reflected by the fifth reflecting mirror 27, and after its polarization direction is adjusted by the third half-wave plate 28, it is split by the third PBS 29 according to its polarization state: the transmitted P-polarized light (maintaining HG) 01 (mode) and reflected S-polarized light (maintaining HG) 01 (Mode). In the P-polarized optical path, the beam is perpendicularly incident on the Vickers prism 31 after passing through the sixth reflecting mirror 30. Its unique mirroring characteristics will cause the HG... 01 Convert mode to HG 10 The converted beam is reflected by the seventh mirror 32. The S-polarized beam is then reflected by the eighth mirror 33 and the ninth mirror 34. Ultimately, these two beams carry HG... 10 Mode (S-polarization) and HG 01 The beams of mode (P-polarized) converge at the fourth PBS 35. Since their polarization states are orthogonal, they combine into an incoherent superposition, forming a hollow annular spot with stable intensity distribution that is insensitive to environmental disturbances.

[0030] The aforementioned ring-shaped suppression light and the dispersion-compensated excitation light guided by the third reflector 15 are spatially combined at the first BS 36 to form a complete PPI beam. The combined beam then enters the beam splitter module 38 via the tenth reflector 37.

[0031] like Figure 2 As shown, this embodiment demonstrates Figure 1 The specific structure of the beam splitting module 38 is that the module consists of a beam splitting tree composed of precisely arranged half-wave plates 56-62 and PBS 63-69. By adjusting the angle of each half-wave plate, the incident light is divided into eight channels with equal power.

[0032] The eight optical paths are coupled to eight independent few-mode fibers 41 via objective lens array 39 and fiber flange array 40, respectively. The output end of each fiber is precisely located within the fiber V-groove 42 to ensure the parallelism of the emitted beam and the consistency of the array. Each optical path integrates an independent acousto-optic modulator AOM 82-89 to achieve independent switching and intensity modulation of each channel, thereby enabling grayscale writing and complex pattern control.

[0033] Eight parallel PPI beams emitted from the fiber array are collimated by the third objective lens 43, reflected by the eleventh reflector 44 and the second BS 45, and then enter the scanning system consisting of a high-speed scanning galvanometer 47, a scanning lens 48, and a field lens 49. The beams finally pass through a dichroic mirror 50, the third BS 52, and are focused by a high numerical aperture fourth objective lens 53 onto a photoresist-coated writing plane 54.

[0034] At the focal point, 520 nm femtosecond excitation light induces two-photon aggregation, while 532 nm suppression light effectively suppresses the reaction in the surrounding region, thus limiting the effective processing volume to the sub-diffraction scale. By coordinating and controlling the motion trajectory of the scanning galvanometer and the state of each channel's AOM (Automatic Oscillator), a pre-defined high-precision three-dimensional micro / nano structure can be fabricated in parallel on the writing plane.

[0035] In addition, the first energy detector 7 and the second energy detector 22 monitor the real-time power of the excitation light and the suppression light, respectively, to ensure the system operates stably for a long time. The first CCD 46 is used to monitor the morphology and uniformity of the PPI spot array. The illumination light source 51 and the second CCD 55 constitute the observation system, realizing real-time imaging and autofocus of the writing plane.

[0036] Those skilled in the art should understand that the above embodiments are merely specific implementations of the present invention and are not intended to limit the scope of protection of the present invention. Any adjustments, equivalent substitutions, or optimizations made within the technical solution and spirit of the present invention should be included within the scope of the claims of the present invention.

Claims

1. A fiber-optic mode multiplexing quasi-color edge light suppression super-resolution lithography system, characterized in that, include: The dispersion compensation module includes a method for performing nonlinear dispersion pre-compensation on the excitation light through a large mode field diameter photonic crystal fiber, and then performing linear dispersion compensation on the excitation light through a grating pair and a roof reflector prism. The PPI beam control module is used to modulate the suppression light into a 0-π phase HG using a spatial modulator. 01 The beam is split into two beams with mutually perpendicular polarization by the third PBS. One beam is mirrored by the Dowell prism and then combined with the other beam to obtain a hollow ring spot. The emitted hollow ring spot is combined with the dispersion-compensated excitation light to obtain PPI light. The writing module is used to split the PPI light into multiple beams through the beam splitting module, and each beam can be modulated individually. The modulated multiple beams are coupled to the fiber optic module through the objective lens array for transmission and synthesis into a dot matrix beam. The dot matrix beam is incident on the high-speed scanning galvanometer through the third objective lens and then imaged on the writing plane by the photolithography module.

2. The fiber-optic mode multiplexing quasi-color edge light suppression super-resolution lithography system according to claim 1, characterized in that, The dispersion compensation module includes an excitation light source, a first quarter-wave plate, a first electrically controlled mirror, a second electrically controlled mirror, a first objective lens, a large mode field diameter photonic crystal fiber, a second objective lens, a first mirror, a grating pair, and a roof reflector prism along the direction of light propagation. The excitation light generated by the excitation light source is corrected into linearly polarized light by the first 1 / 4 wave plate, and then incident on the first objective lens after passing through the first and second electrically controlled mirrors. It is then coupled to a large mode field diameter photonic crystal fiber to pre-compensate the nonlinear dispersion generated by the fiber module. After exiting the second objective lens, it passes through the first mirror and enters the grating pair and the roof prism to compensate for linear dispersion.

3. The fiber-optic mode multiplexing quasi-color edge light suppression super-resolution lithography system according to claim 2, characterized in that, The dispersion compensation module also includes a first half-wave plate, a first PBS, and a first energy detector; The light beam after passing through the first and second electrically controlled reflectors is split after passing through the first half-wave plate and the first PBS. One beam of light is incident on the first objective lens, and the other beam of light enters the first energy detector. The first energy detector is used to detect the position of the excitation light by receiving the real-time power of the excitation light. When the position of the image is deviated, the linearly polarized light is corrected by adjusting the first and second electrically controlled reflectors.

4. The fiber-optic mode multiplexing quasi-chromatic edge light suppression super-resolution lithography system according to claim 1, characterized in that, The PPI beam control module includes a suppressed light source, a second quarter-wave plate, a third electrically controlled mirror, a fourth electrically controlled mirror, a beam expander, a third half-wave plate, a fourth mirror, a spatial light modulator (SLM), a fifth mirror, a third half-wave plate, a third PBS, a sixth mirror, a Dowell prism, a seventh mirror, a fourth PBS, and a first BS. The suppressed light generated by the suppressed light source is corrected to linearly polarized light by the second 1 / 4 wave plate, and then expanded by the beam expander after passing through the third and fourth electrically controlled mirrors. It is then incident on the spatial light modulator through the third half-wave plate and the fourth mirror to be modulated into the 0-π phase HG01 mode. The third half-wave plate is used to allocate the power ratio of different diffraction orders of the SLM. The light is incident on the third PBS through the fifth mirror and the third half-wave plate to split the beam, resulting in two beams with mutually perpendicular polarization, namely the transmitted P-beam and the reflected S-beam. The power ratio of the two beams is adjusted by rotating the third half-wave plate to make the power of the P-beam and the S-beam close. The P-beam is incident on the Dowell prism through the sixth mirror. The Dowell prism mirrors the incident P-beam and then incident on the fourth PBS through the seventh mirror, where it is combined with the S-beam to form a hollow ring light spot. The emitted hollow ring suppressed light and the dispersion-compensated excitation light are combined in the first BS to form the PPI light.

5. The fiber-optic mode multiplexing quasi-color edge light suppression super-resolution lithography system according to claim 4, characterized in that, The PPI spot control module also includes a second half-wave plate, a second PBS, and a second energy detector; The beam after passing through the third and fourth electrically controlled reflectors is split after passing through the second half-wave plate and the second PBS. One beam is incident on the beam expander, and the other beam enters the second energy detector. The second energy detector is used to detect the position of the image by receiving the real-time power of the suppressed light. When the image position deviates, the linearly polarized light is corrected by adjusting the third and fourth electrically controlled reflectors.

6. The fiber-optic mode multiplexing quasi-color edge light suppression super-resolution lithography system according to claim 1, characterized in that, The spatial light modulator is used to symmetrically divide the effective pixel region into two units, introducing a phase difference of π between the two units, so that the continuous suppression light emitted from the suppression light source is modulated into a 0-π phase HG when emitted from the spatial light modulator. 01 model.

7. The fiber-optic mode multiplexing quasi-chromatic edge light suppression super-resolution lithography system according to claim 1, characterized in that, The beam splitting module includes multiple half-wave plates, multiple PBS, multiple mirrors, and multiple acousto-optic modulators; In this process, the PPI light is split into multiple beams by different PBSs, and the split beams are then modulated by half-wave plates to achieve a power ratio of 1:1 for each split. One beam is then passed through a reflector and its optical path is aligned with that of the other beam. The split beams are then individually modulated without crosstalk by their respective acousto-optic modulators and then coupled to the fiber optic module for transmission.

8. The fiber-optic mode multiplexing quasi-color edge light suppression super-resolution lithography system according to claim 1, characterized in that, The fiber optic module includes a fiber flange array, a few-mode fiber array, and a fiber V-groove. The modulated multiple beams of light are combined into a dot matrix beam in the V-groove of the fiber after passing through the fiber flange array and the few-mode fiber array.

9. The fiber-optic mode multiplexing quasi-chromatic edge light suppression super-resolution lithography system according to claim 1, characterized in that, The photolithography module includes, in sequence along the direction of light propagation, a scanning lens, a field lens, a dichroic mirror, a third BS, and a fourth objective lens; The beam passing through the high-speed scanning galvanometer achieves the deflection and scanning function of the writing light. The image plane coordinates are obtained through the scanning lens, and the image plane coordinates are mapped with the deflection angle obtained through the high-speed scanning galvanometer. The field lens shapes the image plane obtained through the scanning lens into a plane. After passing through the dichroic mirror and the third BS in sequence, the image is imaged onto the writing plane through the fourth objective lens, realizing the mapping relationship between the deflection angle of the writing light and the plane coordinates. This completes the alignment of the writing structure data with the coordinate system in actual space, thereby completing the fabrication of the microstructure.

10. The fiber-optic mode multiplexing quasi-chromatic edge light suppression super-resolution lithography system according to claim 9, characterized in that, The photolithography module also includes a second CCD, which is used to receive the writing PPI spot array and illumination light reflected from the writing plane through the third BS to observe the situation of the writing plane in real time, so as to realize the alignment and writing of the focal plane.

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