System and method for determining gas flow in a gas delivery device

Abstract

The present disclosure relates to systems and methods for determining gas flow in a gas delivery device. A system (100) for determining a gas flow in a gas delivery device (200), wherein the system (100) comprises: a data processing device (1); a flow meter (3) adapted to detect a flow rate of the gas mixture (11), the gas mixture (11) comprising a target gas compound (51) and at least one foreign gas compound (53, 55), where the flow meter (3) is adapted to provide gas mixture flow rate information (5) to the data processing device (1) based on the detected flow rate; a first compound concentration analyzer (7) calibrated for at least one first impurity gas compound (53) and adapted to detect the concentration of the first impurity gas compound (53) in the gas mixture (11); wherein the first compound concentration analyzer (7) is adapted to provide first impurity concentration information (9) to the data processing device (1) on the basis of the detected concentration of the first impurity gas compound (53) in the gas mixture (11), wherein the data processing device (1) is adapted to determine a target gas compound flow based on gas mixture flow information (5) received from the flow meter (3) and first impurity concentration information (9) received from the first compound concentration analyzer (7).

Description

Technical Field

[0001] This invention relates to a system and method for determining the gas flow rate in a gas delivery device, a computer program product, and a computer-readable medium. Background Technology

[0002] In gas delivery systems, including gas custody transfer applications (such as those for natural gas or hydrogen), gas chromatography (GC) is typically used to determine the composition of the delivered gas. A problem with the GC measurement principle is generally the low update rate, which makes it impossible to detect changes in concentration. Varying impurity concentrations in the gas can lead to incorrect quality determinations, particularly gas quality deterioration, and, for example, inaccurate billing. Furthermore, for some gases, there are only vague assumptions about the actual impurities in the gas stream at a particular measurement location. Therefore, both the concentration and its temporal variation are unknown. However, if the gas is to be fed from various manufacturers at multiple different locations within the gas delivery network, and, for example, in the case of hydrogen, utilizes different gas production technologies, rapid changes in impurity concentrations can occur. Additionally, gas can be fed into the network from different storage locations (e.g., salt caverns, gas field storage, liquefied storage), each characterized by different types and concentrations of impurity gases.

[0003] Therefore, there is a need for an improved system and method for determining the gas flow rate in a gas delivery device. Summary of the Invention

[0004] This objective is achieved by the invention according to the independent claims. Preferred embodiments of the invention are provided in the dependent claims, the specification, and the drawings.

[0005] This invention relates to a system for determining the flow rate of a gas in a gas delivery device, wherein the system includes a data processing device; a flow meter adapted to detect the flow rate of a gas mixture comprising a target gas compound and at least one impurity gas compound, wherein the flow meter is adapted to provide gas mixture flow rate information to the data processing device based on the detected flow rate; a first compound concentration analyzer calibrated for at least one first impurity gas compound and adapted to detect the concentration of the first impurity gas compound in the gas mixture, wherein the first compound concentration analyzer is adapted to provide first impurity concentration information to the data processing device based on the detected concentration of the first impurity gas compound in the gas mixture, wherein the data processing device is adapted to determine the flow rate of the target gas compound based on the gas mixture flow rate information received from the flow meter and the first impurity concentration information received from the first compound concentration analyzer.

[0006] Therefore, the combined use of a flow meter and a compound concentration analyzer provides an improved system for determining gas flow rates in gas delivery devices. In particular, this system allows for rapid sampling rates and high sensitivity when detecting impurities contained in gas mixtures. Furthermore, the system according to the invention is generally cheaper and less complex than existing technologies. This also reduces investment costs and operational expenses. Moreover, impurities can be better controlled, enabling safe and high-quality gas delivery. Finally, the reduced layout complexity also improves the service and maintenance of the proposed system compared to existing solutions.

[0007] Gas delivery devices can include any type of gas distribution equipment or pipeline system network, wherein gas (e.g., pure gas or gas mixture) can be delivered from a source, gas generator, or supplier, to an endpoint, such as a customer or consumer receiving the gas. In a particular embodiment, a gas delivery device may correspond to a transfer metering device, and specifically refers to a hydrogen (H2) transfer metering device.

[0008] The target gas can be the primary gas to be distributed, and payment can be made for it, for example. In a particular embodiment, the target gas can be hydrogen. Therefore, the gas delivery system can preferably be a hydrogen delivery system.

[0009] The data processing device may include any suitable digital data processing apparatus and may include a corresponding processor and temporary and / or permanent data storage devices, such as random access memory (RAM), read-only memory (ROM), or any other type of volatile or non-volatile memory. Data transmission may be achieved between corresponding components of the system, flow meter, and / or first compound concentration analyzer via appropriate data transmission devices, such as wired or wireless data transmission devices. Furthermore, the data processing device may be enabled to receive input data from a user and / or to send data information to a user. Additionally, the data processing device may be enabled to at least partially control any components provided in the system.

[0010] The gas mixture may include one or more target gaseous compounds, preferably one target gaseous compound. In particular, the target gaseous compound may include or consist of H2. Similarly, the gas mixture may include one or more impurity gaseous compounds. This "gaseous compound" may include any suitable substrate that is at least partially gaseous. The impurity gaseous compound may include one or more gaseous compounds different from the target gaseous compound. In some examples, the impurity gaseous compound may include one or more of nitrogen (N2), oxygen (O2), water (H2O), methane (CH4), argon (Ar), carbon dioxide (CO2), ammonia (NH3), and carbon monoxide (CO). However, other different impurity gaseous compounds are also conceivable.

[0011] A flow meter can include any device capable of directly or indirectly determining or detecting gas flow rate. That is, a flow meter can include one or more devices suitable for measuring flow rate through a specific area, volume, or space, for example, defined in a piping system of a gas delivery device. Accordingly, the flow meter can determine and provide corresponding gas mixture flow rate information, including flow rate-related information for the gas mixture within at least a portion of the gas delivery device. Furthermore, the flow meter may include further information related to the detected gas mixture flow rate, which can support further processing via data processing equipment.

[0012] The first compound concentration analyzer may include any device capable of detecting the concentration of one or more impurity gaseous compounds in a gas mixture, the gas mixture including, for example, impurity gaseous compounds and a target gaseous compound. In particular, the first compound concentration analyzer may not include a GC or similar slow gas measuring device or may consist of a GC or similar slow gas measuring device. In other words, the first compound concentration analyzer may be a non-GC analyzer.

[0013] Generally, a primary component concentration analyzer can be adapted to determine any desired impurity concentration. In one example, considering hydrogen as the target gaseous compound, the system can allow for ensuring the desired mass flow rate accuracy. The relative hydrogen mass flow rate error is, for example, less than 0.5% or 1%. Each impurity gaseous compound may include a maximum permissible concentration given in ppm, as summarized below, which indicates an upper limit for the impurity concentration. Exceeding this upper limit, the impurity should be identified to ensure that the calculated relative hydrogen mass flow rate error is less than 0.5% and 1%, respectively.

[0014] Table 1 – Impurity Concentration

[0015]

[0016] Therefore, the first compound concentration analyzer can be calibrated for a first impurity gaseous compound, wherein calibration may include the ability to appropriately detect the first impurity gaseous compound in a gas mixture, for example, with low error and high sensitivity. Calibration can be performed manually, or at least partially automatically, or fully automatically. The concentration of the first impurity gaseous compound in the gas mixture can be detected, and the data processing device can be accordingly notified via appropriate first impurity concentration information or concentration-related data detected by the first compound concentration analyzer. The first impurity concentration information may accordingly include the detected concentration of the first impurity gaseous compound, and may potentially include additional information related to the detected impurity gaseous compound, which may support further processing via the data processing device. The first impurity concentration information may accordingly include information regarding one or more detected concentrations of one or more impurity gaseous compounds.

[0017] The target gaseous compound flow rate can represent the flow rate of the target gaseous compound within at least a portion of the gas delivery device. In other words, the target gaseous compound flow rate can represent the amount of substantially pure target gaseous compound, such as mass flow rate or volumetric flow rate. For example, the system can accordingly allow the determination of the flow rate of pure hydrogen through the gas delivery device by measuring the flow rate of the gas mixture within the gas delivery device. Exemplarily, the caloric value or volume (e.g., in m³) of the target gaseous compound delivered over a given time interval (e.g., in seconds) can be used. 3 (in units) or standard volume (e.g., in Nm³) 3 The flow rate of the target gaseous compound is determined in terms of energy (e.g., joules or kWh) over a given time interval, using units of mass (e.g., kg) and / or mass (e.g., kg). However, of course, any other suitable physical expression can also be used to determine the flow rate of the target gaseous compound.

[0018] The system may also include means suitable for recording or storing the determined target gas compound flow rate records and outputting or reporting, for example, information about the determined target gas compound flow rate, corresponding impurity information, and / or gas mixture composition to, for example, a user. This enables traceability of parameters determined by the system. According to one aspect, this can enhance the financial billing or taxation of the delivered gas. In one example, the system may include outputting the gas composition to the user. Furthermore, in one example, the system may include outputting a gas flow of the desired gas type, such as the target gas compound, wherein, for example, it may be in kg / h or Nm³. 2 Information is provided in units of / h. Additionally, in one example, the system may include recording gas flow rate and / or integral gas volume, which may be expressed, for example, in kg or Nm³. 3The system records relevant information for each unit. Additionally, in one example, the system may include recording the gas components of a gas mixture. Recording, output, or reporting can be performed based on user requests or automatically at regular intervals (e.g., at predetermined time intervals).

[0019] In a preferred embodiment, the first compound concentration analyzer is adapted to detect the concentration of the first impurity gaseous compound in the gas mixture at a sampling rate of less than 60 seconds, more preferably less than 30 seconds, even more preferably less than 10 seconds, and most preferably less than 1 second.

[0020] Therefore, rapid and reliable updates to the impurity concentration of gas mixtures can be achieved. Fluctuations in impurity concentrations can thus be determined at a rapid sampling rate (e.g., in real time), ensuring accurate hydrogen billing and trust between gas mixture suppliers and buyers, particularly in regulatory handover scenarios. As an added value, real-time determination of the target gas stream composition (e.g., hydrogen flow) can be used to improve process control in hydrogen production units or as a decision value for further use. Furthermore, for example, sampling can be combined with alarm triggering if the impurity concentration exceeds a certain threshold.

[0021] In a preferred embodiment, the flow meter is a mass flow meter (MFM) suitable for detecting the mass flow rate of a gas mixture, wherein the mass flow meter is adapted to provide gas mixture mass flow rate information to a data processing device based on the detected mass flow rate, and wherein the data processing device is adapted to determine the target gas compound flow rate based on the gas mixture mass flow rate information received from the mass flow meter and first impurity concentration information received from a first compound concentration analyzer.

[0022] Therefore, the flow rate of a gas mixture can be determined quickly and reliably based on the mass of the gas mixture being transported. Gas mixture mass flow rate information can include information related to the mass flow rate of the gas mixture passing through one or more sections or areas of the gas delivery device. The mass flow rate information can accordingly include information about the mass flow rate, such as the mass of the gas mixture that has flowed through the area or space within a specific time period. Therefore, the flow rate of a target gaseous compound can be determined based on the detected gas mixture mass flow rate.

[0023] Accordingly, the flow meter can determine and provide corresponding gas mixture flow rate information, including mass flow rate information related to the gas mixture within at least a portion of the gas delivery device, and further information related to the detected gas mixture flow rate, which can support further processing, for example, via a data processing device. For instance, the target gas compound flow rate can be determined based on the mass of the target gas compound delivered within a given time interval.

[0024] In a preferred embodiment, the flow meter is a volumetric flow meter (VFM) suitable for detecting the volumetric flow rate of a gas mixture, wherein the volumetric flow meter is adapted to provide gas mixture volumetric flow rate information to a data processing device based on the detected volumetric flow rate, and wherein the data processing device is further adapted to determine the target gas compound flow rate based on the gas mixture volumetric flow rate information received from the volumetric flow meter and first impurity concentration information received from a first compound concentration analyzer.

[0025] Therefore, the flow rate of a gas mixture can be determined quickly and reliably based on the transported volume of the gas mixture. The mass flow rate information of the gas mixture can include information related to the volumetric flow rate of the gas mixture passing through one or more sections or areas of the gas transport device. The volumetric flow rate information can correspondingly include information about the volumetric flow rate, such as the volume of the gas mixture that has flowed through an area or space within a specific time period. Therefore, the flow rate of a target gaseous compound can be determined based on the detected volumetric flow rate of the gas mixture.

[0026] Accordingly, the flow meter can determine and provide corresponding gas mixture flow rate information, including volumetric flow rate information related to the gas mixture within at least a portion of the gas delivery device, and further information related to the detected gas mixture flow rate, which can support further processing, for example, via a data processing device. For instance, the target gas compound flow rate can be determined based on the volume of the target gas compound delivered within a given time interval.

[0027] In a preferred embodiment, the data processing device is adapted to determine the calorific value of the gas mixture based on the first impurity concentration information.

[0028] Therefore, the calorific value or calorific value of a gas mixture can be reliably determined. In this paper, the known or measured calorific value (also referred to as calorific value) of one or more target gas compounds can be used, together with the mass flow rate and / or volume flow rate of the gas mixture and / or the determined flow rate of the target gas compound, to calculate, for example, the energy value of a gas mixture flowing through a gas conveying device over a certain time period.

[0029] Therefore, the quality of the gas mixture in terms of its heating capacity can be determined, and, for example, billing of the gas mixture can be performed based on its calorie value. In some embodiments, in addition to or as an alternative to the first impurity concentration information, as described in further detail below, second impurity concentration information obtained from a second compound concentration analyzer can also be used to determine the calorie value of the gas mixture. For example, the calorie value can be used to determine the flow rate of a target gaseous compound based on the energy within a given time interval.

[0030] In some examples, the accuracy of calorific value determination can be improved by additionally considering pressure and / or temperature information of the gas mixture. Therefore, in some examples, the calorific value can be determined based on the gas composition, and preferably also by considering pressure and / or temperature, or in some examples, it can be measured directly by an analyzer. This value can then be multiplied by, for example, the amount of gas supplied in kg or moles to determine the amount of energy supplied, which can then be billed.

[0031] In a preferred embodiment, the system further includes at least one pressure sensor adapted to determine at least one pressure of the gas mixture, wherein the pressure sensor is adapted to provide pressure information based on the detected pressure to a data processing device, wherein the data processing device is adapted to further determine the flow rate of the target gas compound based on the received pressure information, and / or wherein the system further includes at least one temperature sensor adapted to determine at least one temperature of the gas mixture, wherein the temperature sensor is adapted to provide temperature information based on the detected temperature to the data processing device, wherein the data processing device is adapted to further determine the flow rate of the target gas compound based on the received temperature information.

[0032] Therefore, the accuracy of gas flow rate determination can be further improved based on additional pressure and / or temperature information of the gas mixture. This, in turn, enhances the reliability and accuracy of target gas compound flow rate determination. Pressure sensors can include any suitable device adapted to directly or indirectly detect or determine gas pressure. It is understood that more than one pressure sensor may also be used. Pressure can be measured or monitored intermittently or continuously, or it can be determined based on user requests.

[0033] Furthermore, the calorific value of the gas mixture can be further refined based on additional pressure information, for example, by taking into account the small changes in calorific value caused by pressure variations.

[0034] Similarly, temperature sensors can include any suitable device for detecting or determining the temperature of a gas. It is understood that more than one temperature sensor may also be used. Temperature can be measured or monitored intermittently or continuously, or it can be determined based on user requests.

[0035] In some examples, when the flow meter cannot directly measure mass flow rate, temperature and / or pressure information can be used together with gas composition information to calculate the net quantity of the gas type, which can then be billed and reported accordingly. This may include, for example, calculating gas compressibility and / or gas density using equations of state.

[0036] Furthermore, the calorific value of the gas mixture can be further refined based on additional temperature information, for example, by taking into account the small changes in calorific value caused by temperature variations.

[0037] In one example, the data processing device may additionally or alternatively be adapted to determine the calorie value of the gas mixture based on received pressure information, and / or the data processing device may additionally or alternatively be adapted to determine the calorie value of the gas mixture based on received temperature information.

[0038] The system (particularly the data processing equipment) can also be adapted to record and store the temperature and / or pressure values ​​of the determined gas mixture. The recording, output, or reporting of temperature and / or pressure values ​​can be performed automatically based on user requests or at regular intervals (e.g., at predetermined time intervals).

[0039] In a preferred embodiment, the system further includes: a second compound concentration analyzer, which is calibrated for at least one second impurity gaseous compound and is adapted to detect the concentration of the second impurity gaseous compound in the gas mixture, wherein the second compound concentration analyzer is adapted to provide second impurity concentration information to a data processing device based on the detected concentration of the second impurity gaseous compound in the gas mixture, wherein the data processing device is adapted to further determine the flow rate of the target gaseous compound based on the second impurity concentration information received from the second compound concentration analyzer.

[0040] Therefore, the flow rate of the target gaseous compound can be determined with particular reliability. This improves the accuracy of identifying the target gaseous compound (e.g., H2). The second component concentration analyzer can include a paramagnetic oxygen analyzer and / or a laser-based analyzer, which enables specific gas analysis, fast response time, and low-maintenance operation. Generally, the type of second compound concentration analyzer can be appropriately selected to cooperate and synergize with a selected type of first compound analyzer and / or a selected type of flow meter. Second impurity concentration information generally includes information on one or more detected concentrations of one or more impurity gaseous compounds. In particular, if more than one impurity gaseous compound needs to be detected, a corresponding second compound concentration analyzer can be used to facilitate the detection of the second impurity gaseous compounds. Furthermore, for example, if a laser spectroscopy (LSA) analyzer is used as the second compound concentration analyzer, it can also simultaneously detect more than one second gaseous impurity compound.

[0041] Generally, the second impurity gas compound may differ from the first impurity gas compound. However, the first impurity gas compound may also correspond to the second impurity gas compound. Therefore, any descriptions herein given of the first impurity gas compound and its determination apply accordingly to the second impurity gas compound.

[0042] In one example, the data processing device may additionally or alternatively be adapted to determine the calorific value of the gas mixture based on the second impurity concentration information received from the second compound concentration analyzer.

[0043] In a preferred embodiment, the second compound concentration analyzer is adapted to detect the concentration of the second impurity gaseous compound in the gas mixture at a sampling rate of less than 60 seconds, more preferably less than 30 seconds, even more preferably less than 10 seconds, and most preferably less than 1 second.

[0044] Therefore, rapid and reliable updates to the impurity concentration of gas mixtures can be achieved. Fluctuations in impurity concentrations can thus be determined at a rapid sampling rate (e.g., in real time), ensuring accurate hydrogen billing and trust between gas mixture suppliers and buyers, particularly in regulatory handover scenarios. As an added value, real-time determination of the target gas stream composition (e.g., hydrogen flow) can be used to improve process control in hydrogen production units or as a decision value for further use. Furthermore, for example, sampling can be combined with alarm triggering if the impurity concentration exceeds a certain threshold.

[0045] In a preferred embodiment, the first compound concentration analyzer and / or the second compound concentration analyzer includes one or more of an optical absorption analyzer, a thermal conductivity analyzer (TCA), and a speed of sound gas analyzer (SOS).

[0046] Therefore, a specific analyzer specially selected for reliably determining at least one second impurity gas compound can be used alone or in combination. The corresponding analyzer can be suitably adapted to determine one or more impurities in a gas mixture. The type of analyzer can be adapted to the corresponding gas mixture to be analyzed. An optical absorption analyzer can include, for example, one or more spectrometers or components thereof, which operate based on electromagnetic radiation absorption in the ultraviolet, visible, and / or infrared spectral ranges. In one example, when H2 is used as the target gas compound, the first compound analyzer can be a TCA. A TCA offers the advantage that it can be very sensitive to impurity mixtures of H2, where the thermal conductivity of the impurity gas can differ from that of hydrogen. Most impurity gas species present in industrial hydrogen processes (e.g., N2, O2, H2O, CH4, Ar, CO2, NH3, and CO) can well represent this difference. For example, a second component concentration analyzer can include or be composed of LSAs. However, the invention is not limited thereto and can also include any other suitable compound concentration analyzer, such as a Raman spectroscopy-based analyzer.

[0047] In one non-limiting example of the system, the first compound analyzer may be a TCA, the flow meter may be an MFM, and a second compound analyzer may not be required. In another non-limiting example of the system, the first compound analyzer may be a TCA, the second compound analyzer may be an LSA, and the flow meter may be an MFM. In another non-limiting example of the system, the first compound analyzer may be an SOS, the flow meter may be an MFM, and a second compound analyzer may not be required. In another non-limiting example of the system, the first compound analyzer may be a TCA, the flow meter may be a VFM, and a second compound analyzer may not be required. In another non-limiting example of the system, the first compound analyzer may be an SOS, the flow meter may be a VFM, and a second compound analyzer may not be required. In another non-limiting example of the system, the first compound analyzer may be an SOS, the second compound analyzer may be a TCA, and the flow meter may be an MFM. In another non-limiting example of the system, the first compound analyzer may be an LSA, the flow meter may be an MFM, and a second compound analyzer may not be required.

[0048] In a preferred embodiment, the second compound concentration analyzer is adapted to provide second impurity concentration information to the first compound concentration analyzer, wherein the first compound concentration analyzer is adapted to use additional calibration data based on the second impurity concentration information received from the second compound concentration analyzer, wherein the first compound concentration analyzer is adapted to provide calibrated first impurity concentration information based on the first impurity concentration and second impurity concentration information to a data processing device, wherein the data processing device is adapted to determine the target gas compound flow rate based on gas mixture flow rate information received from a flow meter and the calibrated first impurity concentration information received from the first compound concentration analyzer.

[0049] Therefore, the determination of the target gas compound flow rate can be further improved. In particular, the accuracy of determining the first impurity concentration can be improved due to the presence of corrected first impurity concentration information. Thus, the error in determining the target gas component flow rate can be reduced.

[0050] The first and second compound concentration analyzers can be suitably coupled to allow data transmission between the respective analyzers, for example, via wired or wireless means. In some examples, the system can be configured such that a data processing device receives and uses both calibrated first and second impurity concentration information to determine the target gaseous compound flow rate. Accordingly, the second compound concentration analyzer can report the concentration of the second impurity compound to the data processing device and can simultaneously report the concentration of the second impurity component to the first compound concentration analyzer to calculate a calibration function, thereby improving the first compound concentration analyzer's determination of the first impurity compound. Other calibration data may include an adjusted characteristic calibration plot or an adjusted calibration dataset.

[0051] Additional information from flow meters (such as mass flow meters or volumetric flow meters) can be provided to data processing equipment and therefore can be taken into account by the data processing equipment when determining the flow rate of the target gas composition.

[0052] In one example, the data processing device may additionally or alternatively be adapted to determine the calorific value of the gas mixture based on gas mixture flow information received from a flow meter and corrected first impurity concentration information received from a first compound concentration analyzer.

[0053] The present invention also relates to a method for determining the gas flow rate in a gas delivery device, wherein the method includes the following steps: detecting the flow rate of a gas mixture, the gas mixture including a target gas compound and at least one impurity gas compound, by a flow meter; providing gas mixture flow rate information to a data processing device based on the detected flow rate; calibrating a first compound concentration analyzer for at least one first impurity gas compound; detecting the concentration of the first impurity gas compound in the gas mixture by the first compound concentration analyzer; providing first impurity concentration information to the data processing device by the first compound concentration analyzer based on the detected concentration of the first impurity gas compound in the gas mixture; and determining the target gas compound flow rate by the data processing device based on the gas mixture flow rate information received from the flow meter and the first impurity concentration information received from the first compound concentration analyzer.

[0054] Therefore, the combined use of a flow meter and a compound concentration analyzer provides an improved method for determining gas flow rates in gas delivery systems. In particular, this method allows for rapid sampling rates and high sensitivity when detecting impurities contained in gas mixtures. Furthermore, compared to existing methods, this method allows for more cost-effective and less complex determination of target component flow rates. This also reduces investment costs and operational expenses. Moreover, impurities can be better controlled, enabling safe and high-quality gas delivery. Finally, this method allows for a less complex detection setup, thereby improving the service and maintenance of the proposed system.

[0055] Any interpretation given above regarding the features of the system for determining the gas flow rate in a gas conveying device according to the present invention shall be accordingly applied to the corresponding features of the method for determining the gas flow rate in a gas conveying device according to the present invention.

[0056] In addition, an additional step may be provided to determine the calorific value of the gas mixture based on the first impurity concentration information and / or the second impurity concentration, preferably taking into account additional temperature information and / or pressure information.

[0057] In a preferred embodiment, the method further includes the following steps: calibrating a second compound concentration analyzer for at least one second impurity gaseous compound; detecting the concentration of the second impurity gaseous compound in the gas mixture; providing second impurity concentration information from the second compound concentration analyzer to a data processing device based on the detected concentration of the second impurity gaseous compound in the gas mixture; and determining the target gaseous compound flow rate from the data processing device based on the second impurity concentration information received from the second compound concentration analyzer.

[0058] Therefore, the flow rate of the target gaseous compound can be determined with particular reliability. Furthermore, the accuracy of identifying the target gaseous compound (e.g., H2) can be improved. The second component concentration analyzer may include a paramagnetic oxygen analyzer and / or a laser-based analyzer, which enables specific gas analysis, fast response time, and low-maintenance operation. Generally, the type of the second compound concentration analyzer can be appropriately selected to cooperate and synergize with a selected type of the first compound analyzer and / or a selected type of flow meter.

[0059] In particular, if more than one impurity gaseous compound needs to be detected, a corresponding second compound concentration analyzer can be used to facilitate the detection of the second impurity gaseous compound.

[0060] In a preferred embodiment, the method further includes the following steps: providing second impurity concentration information to a first compound concentration analyzer from a second compound concentration analyzer; using additional calibration data of the first compound concentration analyzer based on the second impurity concentration information received from the second compound concentration analyzer; providing calibrated first impurity concentration information based on the first and second impurity concentration information to a data processing device from the first compound concentration analyzer; and determining the target gas compound flow rate by the data processing device based on gas mixture flow rate information received from a flow meter and the calibrated first impurity concentration information received from the first compound concentration analyzer.

[0061] Therefore, the determination of the target gaseous compound flow rate can be further improved. In particular, the accuracy of determining the first impurity concentration can be improved due to the presence of corrected first impurity concentration information. Thus, the error in determining the target component flow rate can be reduced.

[0062] The first and second compound concentration analyzers can be suitably coupled to allow data transmission between the respective analyzers. In some examples, the system can be configured such that a data processing device receives and uses both calibrated first and second impurity concentration information to determine the target gaseous compound flow rate. Accordingly, the second compound concentration analyzer can report the concentration of the second impurity compound to the data processing device and can simultaneously report the concentration of the second impurity component to the first compound concentration analyzer to calculate a calibration function, thereby improving the first compound concentration analyzer's determination of the first impurity compound. Other calibration data may include an adjusted characteristic calibration plot or an adjusted calibration dataset.

[0063] Additional information from flow meters (such as mass flow meters or volumetric flow meters) can be provided to the data processing equipment and thus taken into account by the data processing equipment when determining the flow rate of the target gas component.

[0064] The present invention also relates to a computer program product comprising instructions that, when executed by a data processing device, cause the data processing device to at least partially perform and / or control the method according to the present invention.

[0065] The features and advantages described above, outlined in the context of systems and methods for determining gas flow rates in gas delivery devices, are similarly applicable to the computer program products described herein.

[0066] The features of the method according to the invention can be implemented by a suitable digital or computing device, which may include, for example, one or more computers, applications, and / or networks. The method can be implemented at least in part by a computer and can be implemented in software or hardware, or both. The data processing device can be any suitable computing device or apparatus, such as a computer, electronic control module, etc., or a distributed computer system. The data processing device may include one or more of a processor, memory, data interface, etc.

[0067] Computer program products may be stored / distributed on suitable media, such as optical storage media or solid-state media provided with or as part of other hardware, but may also be distributed in other forms, such as via the Internet or other wired or wireless telematics systems.

[0068] The present invention also relates to a computer-readable medium containing instructions that, when executed by a data processing device, cause the data processing device to at least partially perform and / or control the method according to the invention.

[0069] The features and advantages described above, outlined in the context of systems and methods for determining gas flow rates in gas delivery devices and computer program products, similarly apply to the computer-readable media described herein.

[0070] Other features, examples, and advantages will become apparent from the following detailed description and accompanying drawings of preferred embodiments. Attached Figure Description

[0071] To better understand the invention and illustrate its practicality, accompanying drawings are provided and referenced below. It should be understood that the drawings are merely illustrative of exemplary embodiments and therefore do not limit the scope of the claimed invention in any way. Identical or similar elements are denoted by the same reference numerals throughout the text. No reference numerals in the claims should be construed as limiting the scope of the claims. The drawings are merely illustrative and are only used to illustrate examples of this disclosure.

[0072] In the attached diagram,

[0073] Figure 1 This is a schematic diagram of a system for determining the gas flow rate in a gas conveying device according to an embodiment of the present invention.

[0074] Figure 2 This is a schematic diagram of a system for determining the gas flow rate in a gas conveying device according to an embodiment of the present invention.

[0075] Figures 3A to 3C These are flowcharts illustrating methods for determining gas flow rate in a gas conveying device according to embodiments of the present invention.

[0076] Figure 4A and Figure 4B It is a graph showing a dataset of impurity concentrations in a gas mixture.

[0077] Figure 5A and Figure 5B These are graphs showing the relative error and error reduction coefficient of the target gaseous compound's mass flow rate, respectively.

[0078] Figure 6A and Figure 6B These are graphs showing the signal and relative mass flow error of the first compound concentration analyzer.

[0079] Figure 7 This is a graph showing the calibration function for the speed of sound in a gas mixture. Detailed Implementation

[0080] Figure 1 This is a schematic diagram of a system 100 for determining the gas flow rate in a gas delivery device 200 according to an embodiment of the present invention.

[0081] The gas delivery device 200 includes a conduit 21 through which a gas mixture 11 flows, wherein the gas mixture 11 includes a target gaseous compound 51 and a first impurity gaseous compound 53, and the flow is indicated by corresponding arrows. As will be understood, the gas delivery device 200 may also include multiple conduits 21. It is also understood that the gas mixture 11 may include more than one first impurity gaseous compound 53. The target gaseous component may be, for example, H2, and the first impurity gaseous compound may be, for example, N2.

[0082] System 100 includes a data processing device 1, adapted to receive information from various measuring devices, such as a first compound concentration analyzer 7 and a flow meter 3. The flow meter 3 is adapted to detect the flow rate of a gas mixture 11 comprising a target gas compound 51 and an impurity gas compound 53. Accordingly, the flow meter 3 is adapted to provide gas mixture flow rate information 5 to the data processing device 1 based on the detected flow rate. For example, the flow meter 3 may be a mass flow meter, adapted to detect the mass flow rate of the gas mixture 11, wherein the mass flow meter 3 is adapted to provide gas mixture mass flow rate information to the data processing device 1 based on the detected mass flow rate. In another example, the flow meter 3 may be a volumetric flow meter, adapted to detect the volumetric flow rate of the gas mixture 11, wherein the volumetric flow meter is adapted to provide gas mixture volumetric flow rate information to the data processing device 1 based on the detected volumetric flow rate.

[0083] The first compound concentration analyzer 7 is calibrated for impurity gaseous compound 53 and is adapted to detect the concentration of the first impurity gaseous compound 53 in the gas mixture 11. However, if the gas mixture 11 includes more than one impurity different from impurity gaseous compound 53, the first component concentration analyzer 7 may be additionally or alternatively calibrated for other impurity gaseous compounds, and may also be adapted to detect the corresponding concentrations of other impurity gaseous compounds in the gas mixture 11. The first compound concentration analyzer 7 is adapted to provide first impurity concentration information 9 to the data processing device 1 based on the detected concentration of the first impurity gaseous compound 53, or, if more than one impurity gaseous compound is present, based on the detected concentration of more than one impurity in the gas mixture 11. Therefore, the corresponding data can be transmitted from the first compound concentration analyzer 7 to the data processing device 1, for example, via a wired or wireless data transmission device.

[0084] The data processing device 1 is adapted to determine the flow rate of a target gas compound based on the gas mixture flow rate information 5 received from the flow meter 3 and the first impurity concentration information 9 received from the first compound concentration analyzer 7. Therefore, according to the example above, the flow rate of H2 can be determined. Accordingly, the corresponding target gas compound flow rate information 23 can be provided, for example, presented to a user.

[0085] When the flow meter 3 is a mass flow meter, the data processing device 1 is adapted to determine the target gas compound flow rate based on the gas mixture mass flow rate information 5 received from the mass flow meter and the first impurity concentration information 9 received from the first compound concentration analyzer 7. Similarly, if the flow meter 3 is a volumetric flow meter, the data processing device 1 is adapted to determine the target gas compound flow rate based on the gas mixture volumetric flow rate information received from the volumetric flow meter and the first impurity concentration information 9 received from the first compound concentration analyzer 7.

[0086] The data processing device 1 is also adapted to determine the calorific value (calorie value) of the gas mixture based on the first impurity concentration information 9 and / or the second impurity concentration 27. In this document, the known or measured calorific value (also referred to as calorie value) of one or more target gas compounds 51 can be used together with the mass flow rate and / or volume flow rate of the gas mixture and / or the determined flow rate of the target gas compounds to calculate, for example, the energy value of the gas mixture 11 flowing through the gas conveying device 200 over a given time period. Furthermore, the accuracy of the calorific value determination can be improved by additionally considering the pressure information 15 and / or temperature information 19 of the gas mixture 11, as can be further described below.

[0087] The first compound concentration analyzer 7 is adapted to detect the concentration of the first impurity gaseous compound 53 in the gas mixture 11 at a sampling rate of less than 60 seconds. However, in other examples, further reduced sampling times are also possible, such as less than 30 seconds, less than 10 seconds, or less than 1 second.

[0088] In the illustrated embodiment, the first compound concentration analyzer 7 is a thermal conductivity analyzer. In the case of a thermal conductivity analyzer, the reported impurity concentration can be non-specific. Therefore, it can correspond to a signal that depends on the sum of all included impurity concentrations multiplied by a concentration calibration factor. However, in other configurations, an optical absorption analyzer or a sound velocity gas analyzer can be provided. In one example, as an alternative to a separate sound velocity analyzer, the sound velocity value provided by an ultrasonic volumetric flow meter 3 calibrated for sound velocity measurement can also be used as the first impurity concentration information 9. The actual impurity concentration 10 can then be determined by the data processing device 1 using a lookup table derived from the equation of state of the gas mixture 11 (see, for example, [link to relevant documentation]). Figure 7 It is done internally.

[0089] In the illustrated embodiment, system 100 further includes a pressure sensor 13 adapted to determine at least one pressure of the gas mixture 11. It will be understood that in other different configurations, more than one pressure sensor 13 may be provided. The pressure sensor 13 is adapted to provide pressure information 15 based on the detected pressure to data processing device 1, and data processing device 1 is accordingly adapted to further determine the flow rate and calorific value of the target gas compound based on the received pressure information 15.

[0090] In the illustrated embodiment, system 100 further includes a temperature sensor 17 adapted to determine at least one temperature of the gas mixture 11. It will be understood that in other different configurations, more than one temperature sensor 17 may be provided. The temperature sensor 17 is adapted to provide temperature information 19 based on the detected temperature to data processing device 1, and data processing device 1 is accordingly adapted to further determine the flow rate and calorific value of the target gas compound based on the received temperature information 19.

[0091] Generally, system 100 may include one or more pressure sensors 13 and / or one or more temperature sensors 17 as needed.

[0092] Furthermore, a computer program product 60 and a computer-readable medium 70, each containing instructions, are shown that, when executed by the data processing device 1, cause the data processing device 1 to at least partially perform and / or control the methods described in any embodiment of the present invention, particularly... Figures 3A to 3C Method 100 is shown in the figure.

[0093] In the illustrated embodiment, the computer program product 60 and the computer-readable medium 70 are depicted as internal elements of the data processing device 1. However, it should be understood that in other embodiments, the computer program product 60 and the computer-readable medium 70 may be configured to be remotely and operatively coupled to the data processing device 1, for example, via appropriate means for wired or wireless data transmission.

[0094] Figure 2 This is a schematic diagram of a system 100 for determining the gas flow rate in a gas delivery device 200 according to another embodiment of the present invention. As will be understood, for the sake of brevity, this embodiment is similar to those already described... Figure 1 Similar elements described in the previous embodiments shown will not be repeated here.

[0095] exist Figure 2 In the embodiment of system 100 shown, the gas mixture 11 also contains a second impurity gas compound 55. It is understood that the gas mixture 11 may also include more than one second impurity gas compound 53. The target gas component may be, for example, H2, the first impurity gas compound may be, for example, N2, and the second impurity gas compound may be, for example, CH4.

[0096] In the illustrated embodiment, the system 100 further includes a second compound concentration analyzer 25, which is calibrated for at least one second impurity gaseous compound 55 and adapted to detect the concentration of the second impurity gaseous compound 55 in the gas mixture 11. The second compound concentration analyzer 25 is adapted to provide second impurity concentration information 27 to the data processing device 1 based on the detected concentration of the second impurity gaseous compound 55 in the gas mixture 11.

[0097] The data processing device 1 is accordingly adapted to further determine the target gas compound flow rate based on the second impurity concentration information 27 received from the second compound concentration analyzer 25.

[0098] The second compound concentration analyzer 25 is adapted to detect the concentration of the second impurity gaseous compound 55 in the gas mixture 11 at a sampling rate of less than 60 seconds. However, in other examples, further reduced sampling times are also possible, such as less than 30 seconds, less than 10 seconds, or less than 1 second.

[0099] In the illustrated embodiment, the second compound concentration analyzer 25 is a laser spectrometer. However, in other configurations, other types of optical absorption analyzers, thermal conductivity analyzers, or acoustic gas analyzers may also be provided.

[0100] In the illustrated embodiment, the second compound concentration analyzer 25 is further adapted to provide second impurity concentration information 27 to the first compound concentration analyzer 7. The first compound concentration analyzer 7 is adapted to use additional calibration data based on the second impurity concentration information 27 received from the second compound concentration analyzer 25, and to provide the data processing device 1 with calibrated first impurity concentration information 10 based on the first impurity concentration and the second impurity concentration information 27.

[0101] Then, the data processing device 1 is adapted to determine the target gas compound flow rate based on the gas mixture flow rate information 5 received from the flow meter 3 and the corrected first impurity concentration information 10 received from the first compound concentration analyzer 7.

[0102] Figure 3A , Figure 3B and Figure 3C Flowcharts are shown illustrating methods 300 for determining gas flow rate in a gas delivery device 200 according to embodiments of the present invention. Figure 3A , Figure 3B and Figure 3C It also involves the above-mentioned Figure 1 and Figure 2 For the sake of brevity, the components of System 100, which are described in detail, will not be repeated here.

[0103] like Figure 3A As shown, method 300 includes step S1, where a flow meter 3 detects the flow rate of a gas mixture 11, the gas mixture 11 including a target gas compound 51 and at least one impurity gas compound 53, 55. Method 300 further includes step S2, where, based on the detected flow rate, gas mixture flow rate information 5 is provided to a data processing device 1. Method 300 further includes step S3, where a first compound concentration analyzer 7 is calibrated for at least one first impurity gas compound 53. Method 300 further includes step S4, where the first compound concentration analyzer 7 detects the concentration of the first impurity gas compound 53 in the gas mixture 11. Method 300 further includes step S5, where, based on the detected concentration of the first impurity gas compound 53 in the gas mixture 11, the first compound concentration analyzer 7 provides first impurity concentration information to the data processing device 1. Method 300 further includes step S6, where, based on the gas mixture flow rate information 5 received from the flow meter 3 and the first impurity concentration information received from the first compound concentration analyzer 7, the data processing device 1 determines the target gas compound flow rate. Optionally, step S1 may further include the step of determining the mass flow rate and / or volumetric flow rate of the gas mixture 11. In addition, an additional step S15 may be provided to determine the calorific value (calorie value) of the gas mixture based on the first impurity concentration information 9 and / or the second impurity concentration 27, preferably also taking into account the temperature information 19 and / or the pressure information 15.

[0104] like Figure 3B As shown, method 300 includes step S7, calibrating a second compound concentration analyzer 25 for at least one second impurity gaseous compound 55. Method 300 further includes step S8, detecting the concentration of the second impurity gaseous compound 55 in the gas mixture 11. Method 300 further includes step S9, providing second impurity concentration information 27 from the second compound concentration analyzer 25 to the data processing device 1 based on the detected concentration of the second impurity gaseous compound 55 in the gas mixture 11. Method 300 further includes step S10, determining the target gaseous compound flow rate from the data processing device 1 based on the second impurity concentration information 27 received from the second compound concentration analyzer 25.

[0105] like Figure 3C As shown, method 300 includes step S11, whereby a second compound concentration analyzer 25 provides second impurity concentration information 27 to a first compound concentration analyzer 7. Method 300 also includes step S12, using additional calibration data from the first compound concentration analyzer 7 based on the second impurity concentration information 27 received from the second compound concentration analyzer 25. Method 300 further includes step S13, whereby the first compound concentration analyzer 7 provides calibrated first impurity concentration information 10 based on the first impurity concentration and second impurity concentration information 27 to the data processing device 1. Method 300 further includes step S14, whereby the data processing device 1 determines the target gas compound flow rate based on gas mixture flow rate information 5 received from the flow meter 3 and the calibrated first impurity concentration information 10 received from the first compound concentration analyzer 7.

[0106] It should be understood that the method according to the present invention is not limited to the order of the above-described method steps. On the contrary, the above-described method steps may be provided in a different order, and one or more of the above-described method steps may be removed, or other method steps may be added as needed.

[0107] Figure 4A This is a graph showing a dataset of measured impurity concentrations in a gas mixture, which includes H2 as the target gaseous compound and one of O2, CH4, Ar, CO2, or CO as impurity gaseous compounds. Figure 4A The x-axis provides the actual impurity concentration in mol%. The y-axis provides the measured mole fraction or percentage of each impurity gaseous compound in mol%. In this example, the impurity concentration measurement was performed by TCA. Therefore, Figure 4A This indicates that the impurity concentration X′1 reported by the TCA varies with the actual impurity concentration Xi. In the illustrated embodiment, the experimental dataset of the TCA response is shown as a cross, where the TCA is calibrated against N2 contained in H2. Furthermore, a linear fit, indicated by dashed lines, was applied to this experimental dataset.

[0108] Figure 4B This is a graph showing a dataset of impurity concentrations in a gas mixture, which includes H2 as the target gaseous compound and one of N2, O2, CH4, Ar, CO2, or CO as impurity gaseous compounds. Figure 4B The x-axis provides the true impurity concentration in mol%, while the y-axis provides the impurity concentration error for each impurity gaseous compound in mol%. Therefore, Figure 4B It shows the basis Figure 4A The absolute impurity concentration error obtained from the TCA measurement results shown is illustrated.

[0109] Figure 5A This is a graph showing the relative error of the mass flow rate of the target gaseous compound. The gas mixture includes H2 as the target gaseous compound and one of N2, O2, CH4, Ar, CO2, or CO as an impurity gaseous compound. Figure 5A The graph provides impurity concentrations in mol% on the x-axis and relative mass flow rate errors for the target gas (here, H2) in mole fractions or percentages on the y-axis. Solid lines depict the relative mass flow rate errors when a first compound concentration analyzer (here, a TCA calibrated for N2 in H2) and a flow meter (here, a mass flow meter) are provided. Dashed lines represent the relative mass flow rate errors when each impurity gas compound is provided, without a first compound concentration analyzer. In the graph shown, the lines for CO and N2 correspond to each other.

[0110] Figure 5B This is a comparison chart showing the reduction factor of the relative mass flow rate error for the target gaseous compound (here, H2) using the method of the present invention, compared to the case using only a mass flow meter, assuming gas mixture 11 is pure H2, with the concentrations of each impurity gaseous compound given as mole fractions or percentages. For CO, the reduction factor approaches infinity because the relative mass flow rate error disappears (see also...). Figure 5A ).

[0111] Figure 6A This is a graph showing the signal of CH4 from the first compound concentration analyzer for different impurity concentrations. Figure 6A In the diagram, the main impurity concentration (X1) is provided in mol% on the x-axis. The dimensionless internal TCA signal is provided on the y-axis. Therefore, Figure 6A The internal TCA signal S(X1, X2) of CH4 with different mole fractions X2 is shown as a function of the molar concentration X1 of N2. The inverse function represents the output X′ used to calculate the TCA for different concentrations of the second impurity X2. R calibration function cal R(S(X1, X2), X2), as will be explained further below.

[0112] Figure 6B This is a graph showing the relative mass flow rate errors of N2 and CH4 (X1 and X2) with different impurity concentrations. Figure 6B The total impurity concentration (X1+X2) is provided in mol% on the x-axis. The relative mass flow rate error of the target gaseous compound (here, H2) is provided on the y-axis. Further error calculations are described below. In the example shown, a ternary mixture of H2 with N2 and CH4 is considered. The dashed line shows the relative mass flow error (calculated using Equation 3a via Equations 1a and 2a, 2b) without compensated impurities (X′1 = 0) as described herein. The dotted line shows the mass flow error obtained using only the TCA calibrated for N2 (calculated using Equations 1a and 2a, 2b via Equation 3a). The solid line shows the mass flow error calibrated using a parameterized TCA for N2 in H2 for different concentrations (X2) of CH4 (calculated using Equations 1a, 2a, and 5 via Equation 3a). Furthermore, in the example shown, for simplicity, perfect flowmeter calibration is assumed.

[0113] Figure 7 This is a graph showing the sound velocity calibration function for a gas mixture. Figure 7 In the diagram, the x-axis plots the impurity concentrations of the impurity gaseous compounds (here, N2, given in mol%) present in the target gaseous compound (H2). The y-axis plots the speed of sound in the gas mixture, given in meters per second. Clearly, the speed of sound decreases as the impurity concentration increases.

[0114] The following will refer to the above. Figure 4A , Figure 4B , Figure 5A , Figure 5B , Figure 6A , Figure 6B and Figure 7 Several different exemplary embodiments and scenarios are discussed to facilitate understanding of the invention. In the following examples, H2 is considered as the target gaseous compound, and different examples of the first and second impurity gaseous compounds are considered. However, it should be understood that the following examples are merely exemplary, and different target gaseous compounds and different first and second impurity gaseous compounds may also be considered. The corresponding exemplary equations may be adapted accordingly to meet the needs and construction of the systems and methods described above.

[0115] In a first embodiment, the system includes a TCA as a first compound concentration analyzer and an MFM as a flow meter. The target gaseous compound is assumed to be hydrogen. The TCA and MFM report their data to a data processing device to calculate the net mass flow rate of hydrogen in real time. The actual mass flow rate of hydrogen (which may be the billed amount) is calculated when the gas composition is known. Based on the total mass flow rate measured by MFM Calculation. In the case of a single impurity (e.g., N2), the mass flow rate of hydrogen can be calculated using the following formula:

[0116]

[0117] in,

[0118]

[0119] In the above equation, This is the actual hydrogen mass flow rate, also known as the ground truth. It is the true molar flow rate of all gas species, M H2 X is the molar mass of hydrogen gas. H2 This is the actual mole fraction of hydrogen. X1 is the mass flow rate measured by MFM, X1 is the true mole fraction of the first impurity gaseous compound, and M N2 It is the molar mass of nitrogen.

[0120] As will be understood, the proposed concept is independent of the equation of state, pressure, and temperature, and depends only on the variables X1 and The measurement uncertainties of these quantities will be described in detail below. Error-prone measurements or quantities calculated from these error-prone measurements are indicated by an apostrophe (′).

[0121] In one example of this embodiment, the TCA is calibrated for a binary mixture of N2 and H2, where the mole fractions of N2 and H2 are represented by X′1 and (1-X′1), respectively. In this calibration, a calibration function cal1 is determined such that the acquired signal S(X1) generated within the analyzer is mapped to the true mole fraction X1:

[0122] X′1=cal1(S(X1))=X1+ΔX′1

[0123] Where X1′ is the mole fraction or concentration of the first impurity gaseous compound, and cal1 is the TCA calibration function used to internally adjust the TCA from H2 to the mole fraction X. i The signal S(X) generated by the binary mixture of impurity gas i i ) is mapped to the molar impurity fraction X1 (i=1…n), and ΔX′1 is the impurity concentration error reported by the gas analyzer.

[0124] This mapping is achieved, for example, by minimizing the squared deviation (ΔX′1) between the measured and fitted data. 2 The summation is achieved. TCA reports the measured impurity mole fraction X′1 to the data processing device. In the example shown, this mapping is perfect only for the calibration gas (here, an N2-H2 mixture). For binary mixtures of H2 with gases other than nitrogen, there will be different obtained signals S(X′1). i Therefore, a separate calibration function cal is required. i For impurity gases other than nitrogen, the reported impurity concentration X′1 = cal1(S(X) i ))exist Figure 4A The diagram shows that the TCA (i = 2, ..., n) is calibrated simultaneously for N2 in H2. From this, the absolute concentration error of the impurities ΔX′1 = (X′1 - X i ), and accordingly in Figure 4B As shown in the image.

[0125] The data processing equipment is suitable for calculating the hydrogen mass flow rate as shown in the following equations.

[0126]

[0127] in,

[0128]

[0129] In the above equation, X′1 is the calculated molar flow rate of all gaseous compounds, and X′1 is the measured molar fraction of the first impurity gaseous compound reported by the first gaseous compound analyzer. Generally, the true mass flow rate of each impurity compound i (i = 1…n) can be expressed as… The calculation is based on the measured mass flow rate in the MFM report. And the impurity concentration X′1 reported by TCA. For simplicity, it is assumed that the mass flow rate reported by MFM in this example has no measurement error.

[0130] Figure 5A The relative error of the calculated hydrogen mass flow rate relative to the actual hydrogen mass flow rate is shown. Expressed by the following equation:

[0131]

[0132] in,

[0133]

[0134] Scenario 1 – A system without a gas component analyzer and considering a single impurity i (i=1):

[0135] In this scenario, the mass flow meter measures... When the gas composition is unknown, it must be assumed that the impurity concentration is zero, i.e., X′1 = 0. Therefore, data processing equipment is suitable for reporting. In this case, the relative error is:

[0136]

[0137] Where M1 is the molar mass of the first impurity gaseous compound. The relative error approximating X′1 << 1 is proportional to the fraction of the impurity's molar mass relative to the molar mass of hydrogen. Furthermore, the relative error is proportional to the true (unknown) impurity concentration. In this case, for impurity concentrations of 0.2 mol% to 0.3 mol%, a certain percentage relative error in the hydrogen mass flow rate can be obtained. These errors are expressed using... Figure 5A The colored dashed lines in the diagram represent...

[0138] Scenario 2 – The analyzer is calibrated only for the single impurity whose concentration can affect the accuracy of the calculated mass flow rate. Accuracy (e.g., N2 is a single impurity, and TCA is calibrated for N2 in H2):

[0139] In this scenario, the analyzer and data processing equipment fully account for the additional mass flow rate caused by impurities, and the calculated H2 mass flow rate... Equal to actual H2 mass flow rate This results in zero relative error (see Figure 5A The N2 line in the image coincides with the CO line.

[0140] In practical measurement scenarios that also include equipment errors, the accuracy of the flow meter and the accuracy and sensitivity of the analyzer generally determine the overall system accuracy. Assuming the flow meter error is <0.5% (of the reading) and ΔX... i The TCA error is 300 ppm (1% full-scale error at 3% impurity concentration), and the calculated combined error of the mass flow rate is...

[0141] Scenario 3 – Calibrating a gas compound analyzer for N2 and other unknown impurities besides N2 in H2:

[0142] In this context, the proposed solution allows for compatibility with N2 (such as...). Figure 4A (As shown) Similar sensitivity is used to detect impurities. Using this information, the hydrogen mass flow rate can be calculated based on the total mass flow rate reported by the MFM. Even in this case, the solution improves the accuracy of the hydrogen mass flow rate, reducing the relative error. Compared to the case without an analyzer (see Case 1 above), the reduction is 2 to 7.5 times. The degree of improvement can depend on the type of impurity gas(i) (e.g., Figure 5B (As shown). The obtained relative mass flow rate error Generally from two sources:

[0143] a. Impurity concentration error ΔX′1=X′1-X i (like Figure 4B As shown), where X i This is the actual mole fraction of the impurity gaseous compound i (i = 1…n). In an exemplary combination with a TCA, the TCA reports lower impurity concentrations (ΔX′1 < 0) for gases significantly lighter than N2 (e.g., CH4) and higher concentrations (ΔX′1 > 0) for gases significantly heavier than N2 (e.g., CO2) (see [link to TCA diagram]). Figure 4B ).

[0144] b. Molar mass of impurities: Since the type of gas is unknown, it is assumed that the molar mass of N2 is used for calculation.

[0145] Advantageously, from the assumption M N2 The error (b) is partially compensated by the error ΔX′1(a), which allows for a smaller hydrogen mass flow rate error even when the type of impurity is unknown. As a further advantage, TCA can also report the concentration of unknown impurities with minimal error (see...). Figure 4B It can also be used as an indicator of total impurity concentration to determine whether it is advantageous to set up other specific gas compound analyzers at the measurement location.

[0146] Therefore, the proposed concept is also robust for other unknown impurities besides nitrogen: for example, binary hydrogen mixtures containing other possible impurities in the hydrogen stream, such as binary mixtures of O2, CH4, Ar, CO2, and CO, etc. Figure 4A As shown. Considering, for example, CO2 as an impurity, if the CO2 concentration is below 0.39 mol%, then the relative error... Less than 2% (see Figure 5A Considering, for example, Ar as an impurity, if the Ar concentration is below 0.36 mol%, the relative error... Less than 2% (see Figure 5A Considering, for example, O2 as an impurity, if the O2 concentration is below 0.78 mol%, then the relative error... Less than 2% (see Figure 5A Considering, for example, CH4 as an impurity, if the CH4 concentration is below 0.45 mol%, the relative error... Less than 2% (see Figure 5A Considering, for example, CO as an impurity, there is practically no mass flow error across the entire range of the analyzer.

[0147] In the second embodiment, to improve the accuracy of hydrogen mass flow rate determination, one or more second compound concentration analyzers may be added. These analyzers may be, for example, optical absorption analyzers, thermal conductivity analyzers, or acoustic gas analyzers, paramagnetic oxygen analyzers, and / or laser-based analyzers, designed for specific gas analysis, fast response times, and low-maintenance operation. The additional gas analyzers report the type of impurity gas X′ analyzed to the data processing equipment. i The mole fraction (i = 2…n). Then, the data processing device uses X′ i The molar flow rate is calculated using the following equation:

[0148]

[0149] And X′ R X is the mole fraction of N2 in the presence of impurity gaseous compounds other than N2, i.e., the corrected mole fraction of N2 in the stream. i ′ is the mole fraction of impurity gaseous compounds i (i = 2…n) other than gaseous compounds in a non-gas-specific analyzer (e.g., a first gas compound analyzer) for its calibration (either by specific analyzer measurement calibration or from derived measurement calibration), and M i X′ is the molar mass of impurity gas compound i. R It is possible to use a thermal conductivity analyzer to perform such... Figure 4A The known sensitivity differences of other impurities shown were calculated from the apparent N2 mole percentage X′1 reported by the TCA using an appropriate correction function. The simplest correction formula, for example, is to correct the apparent mole fraction X′1 by linear compensation: X′ R =X′1-∑cal1(S(X′) i )), while cal1(S(X′ i The TCA is for situations like... Figure 4A The mole fraction X′ of impurity i shown i The reported impurity concentration. Generally, cal i This can be viewed as a calibration function of TCA, used to adjust the signal S(X) i Mapped to molar impurity fraction X i Other correction functions can potentially be derived based on kinetic gas theory.

[0150] One such implementation is shown as a specific example of a frequently occurring situation, where N2 and CH4 are the only impurities with mole fractions X1 and X2 exceeding 300 ppm. Therefore, ternary mixtures of H2 with N2 and CH4 can be considered, and for such impurity combinations, for example, LSA can be combined with TCA, which corresponds to... Figure 2The constructed configuration is described. In the example shown, the LSA is adapted to measure a specific concentration X'2 of CH4 and can report the molar concentration X'2 to the TCA accordingly. This amount is then used to select the correct calibration function cal. R (S(X1, X2), X2). TCA can use this function to calculate the corrected concentration X′ of the first impurity (here, N2). R Calibration function cal R (S(X1, X2), X2) can be derived from the internal signal S(X1, X2), for example, through multi-point calibration of X2 at different levels. In other words, considering the gas-specific concentrations of the first and / or second compounds, the analyzer can report the concentrations of additional impurities X2...X. i , cal R This can be viewed as a calibration function of TCA, used to adjust the signal S(X1, X2...X... i Mapped to molar impurity fraction X1.

[0151] Figure 6A The internal TCA signals S(X1, X2) for three different CH4 concentrations X'2 (i.e., 0.1 mol%, 0.25 mol%, and 1.0 mol% CH4) are shown. In this respect, the signals within the TCA are determined based on the molar fraction of H2 with the primary impurity X1 and the molar fraction of H2 with the secondary impurity Xi. i The signal generated by the ternary mixture can be called S(X1, X). i ).

[0152] The data processing equipment (at least) reports the quantities X'2 and X' according to LSA and TCA. R and the report by MFM Calculate and report the mass flow rate of hydrogen. Use the formula from Equation 5. As input, perform the calculations described by equation 2a. Figure 6B The relative mass flow rate error of the resulting combined solution is plotted exemplarily. This error is close to zero for all considered CH4 and N2 concentrations. For CH4 concentrations < 1 mol%, the relative error using TCA alone is ( Figure 6B The relative error (as shown in the point curve) is <4%. Without an analyzer, when the combined impurity concentration X′1+X′2 < 1%, the relative error can even exceed 10%.

[0153] In the third embodiment, a speed of sound (SOS) gas analyzer and a mass flow meter report data to a data processing device. The SOS analyzer can be intentionally selected to be unspecific to the type of impurity, but is highly sensitive to any possible mixture of impurities.

[0154] The analyzer can be calibrated for binary mixtures with the most abundant impurities (e.g., nitrogen (N2) in hydrogen (H2)) to report the mole fraction X′1 of the impurities to the data processing device. This calculation is similar to that of the first embodiment. The advantage of the third embodiment is that the velocity of sound at a constant temperature inside the analyzer... It can also be expressed as γ = c, which varies only with the adiabatic index or exponent γ. p / c v The sound velocity is expressed in terms of molar mass. Since γ≈1.5 for almost all gas species, the dependence on molar mass M results in a strong sensitivity of the sound velocity to impurities in hydrogen. The functional dependence of the sound velocity in a gas mixture can be well described by a simple mixing rule (i.e., summing over all species i). The sound velocity c of a binary gas mixture... mix It can be represented as:

[0155]

[0156] in, It is the specific heat capacity of impurity i under constant pressure, and It is the specific heat capacity of impurity i at constant volume.

[0157] This ensures a functional dependence that makes all possible impurities identical, and enables the aggregation detection of different types of impurities with low error in the calculated H2 mass flow rate. The velocity of sound c for gas type i. i Dependence on molar mass This partially compensates for the different molar masses of unknown species. The following table shows the calculated hydrogen mass flow rate per unit time for 1 mole of gas:

[0158] Table 2 – Calculation of 1 mole of gas flow rate per unit time: Hydrogen mass flow rate

[0159]

[0160] The above results were obtained using only a non-gas-specific analyzer, without considering its measurement accuracy. If the SOS analyzer is calibrated for an H2-N2 mixture and N2 is the sole impurity in the gas, it can correctly report the H2 mass flow rate. However, for mixtures of other possible impurities, such as CO2, up to 2%, the resulting H2 mass flow rate error is less than 1%. If impurities other than CO2 are present, and the molar concentration of such other impurities is less than 2 mol%, the resulting mass flow rate error is also less than 1%. In electrolyzer applications, N2 and O2 are the main impurities, and even at 2 mol% O2, the relative hydrogen mass flow rate accuracy is better than 0.25%. Therefore, in streams containing up to 2 mol% oxygen, nitrogen, or mixtures thereof, the maximum permissible error of the measurement system is <1%. Similarly, small (e.g., <0.6%) molar percentages of H2O will not significantly affect this accuracy. Furthermore, the system is relatively insensitive to small mixtures of methane, as such mixtures may be present in pipeline systems intended for different uses. Similarly, in this embodiment, in order to improve accuracy, other analyzers, such as LSA, can be added to handle high-concentration impurities or impurities that have a significant impact on mass flow error, similar to those in the second embodiment (e.g., CO2).

[0161] In the fourth embodiment, at least a thermal conductivity analyzer and a volumetric flow meter are used. Information from the analyzer is used for:

[0162] 1. Enables the calculation of mass flow rate or standard volumetric flow rate based on equations of state and using the temperature and pressure of the gas flow recorded by pressure and temperature measurement devices. This calculation can directly output the hydrogen mass flow rate or total mass flow rate.

[0163] 2. The hydrogen mass flow rate is calculated based on the total mass flow rate by subtracting the impurity mass flow rate, as shown in the first embodiment.

[0164] In the fifth embodiment, at least a sound velocity analyzer and a volumetric flow meter are used. Information from the analyzer is used for:

[0165] 1. This enables the calculation of mass flow rate or standard volumetric flow rate based on the equation of state and using the temperature and pressure of the flow recorded by pressure and temperature measuring devices. This calculation can directly output the hydrogen mass flow rate or total mass flow rate. Alternatively, sound velocity information can be provided through measurement within the volumetric flow meter and sent to a data processing device. This device can then use a lookup table based on the equation of state for the gas mixture (see...). Figure 7 To determine the impurity concentration.

[0166] 2. The hydrogen mass flow rate is calculated based on the total mass flow rate by subtracting the impurity mass flow rate, as shown in the second embodiment.

[0167] Alternatively, for mass flow rate, energy flow rate can be calculated using calorific values ​​based on hydrogen and impurity concentrations.

[0168] In the sixth embodiment, the SOS gas analyzer, the TCA gas analyzer, and the mass flow meter report data to the data processing device to calculate the impurity-corrected hydrogen mass flow rate.

[0169] In the seventh embodiment, at least one laser spectroscopy-based analyzer and flow meter report data to a data processing device to calculate the true hydrogen mass flow rate corrected for impurities.

[0170] It should be noted that the above embodiments are merely exemplary, and other combinations of features covered within the scope of the claims are of course conceivable. Therefore, in the course of practicing the claimed disclosure, other variations of the disclosed embodiments will be understood and implemented by those skilled in the art through study of the drawings, this disclosure, and the appended claims. In the claims, the words “comprising” or “including” do not exclude other elements or steps; the indefinite articles “a” or “an” do not exclude multiple. The fact that certain measures are described in mutually different dependent claims does not indicate that a combination of these measures cannot be used to obtain an advantage.

[0171] List of reference numerals

[0172] 1. Data processing equipment

[0173] 3 Flowmeter

[0174] 5. Gas mixture flow rate information

[0175] 7 First Compound Concentration Analyzer

[0176] 9. First impurity concentration information

[0177] 10. Corrected first impurity concentration information

[0178] 11. Gas mixtures

[0179] 13 Pressure Sensor

[0180] 15. Stress Information

[0181] 17 Temperature sensor

[0182] 19 Temperature Information

[0183] 21 Pipelines

[0184] 23. Target gas compound flow information

[0185] 25 Second Compound Concentration Analyzer

[0186] 27 Second impurity concentration information

[0187] 51 Target gaseous compounds

[0188] 53 First impurity gaseous compound

[0189] 55 Second impurity gaseous compounds

[0190] 60 Computer program products

[0191] 70 Computer-readable media

[0192] 100 System

[0193] 200 Gas Conveying Device

[0194] 300 methods

[0195] S1-S15 Method Steps

Claims

1. A system (100) for determining the gas flow rate in a gas conveying device (200), wherein, The system (100) includes: Data processing equipment (1), A flow meter (3) adapted to detect the flow rate of a gas mixture (11), the gas mixture (11) comprising a target gas compound (51) and at least one impurity gas compound (53, 55). The flow meter (3) is adapted to provide gas mixture flow information (5) to the data processing device (1) based on the detected flow rate. A first compound concentration analyzer (7), calibrated for at least one first impurity gaseous compound (53), and adapted to detect the concentration of the first impurity gaseous compound (53) in the gas mixture (11), The first compound concentration analyzer (7) is adapted to provide first impurity concentration information (9) to the data processing device (1) based on the detected concentration of the first impurity gaseous compound (53) in the gas mixture (11). The data processing device (1) is adapted to determine the flow rate of the target gas compound based on the gas mixture flow rate information (5) received from the flow meter (3) and the first impurity concentration information (9) received from the first compound concentration analyzer (7).

2. The system (100) according to the preceding claims, in, The first compound concentration analyzer (7) is adapted to detect the concentration of the first impurity gaseous compound (53) in the gas mixture (11) at a sampling rate of less than 60 seconds, more preferably less than 30 seconds, even more preferably less than 10 seconds, and most preferably less than 1 second.

3. The system (100) according to any one of claims 1 or 2, in, The flow meter (3) is a mass flow meter suitable for detecting the mass flow rate of the gas mixture (11). The mass flow meter is adapted to provide gas mixture mass flow information to the data processing device (1) based on the detected mass flow rate, and The data processing device (1) is adapted to determine the flow rate of the target gas compound based on the mass flow rate information (5) of the gas mixture received from the mass flow meter and the first impurity concentration information (9) received from the first compound concentration analyzer (7).

4. The system (100) according to any one of the preceding claims, in, The flow meter (3) is a volumetric flow meter suitable for detecting the volumetric flow rate of the gas mixture (11). The volumetric flow meter is adapted to provide gas mixture volumetric flow information to the data processing device (1) based on the detected volumetric flow rate, and The data processing device (1) is adapted to determine the target gas compound flow rate based on the gas mixture volume flow rate information received from the volume flow meter and the first impurity concentration information (9) received from the first compound concentration analyzer (7).

5. The system (100) according to any one of claims 3 or 4, in, The data processing device (1) is adapted to determine the calorific value of the gas mixture based on the first impurity concentration information (9).

6. The system (100) according to any one of the preceding claims, in, The system (100) further includes at least one pressure sensor (13) adapted to determine at least one pressure of the gas mixture (11). The pressure sensor (13) is adapted to provide pressure information (15) based on the detected pressure to the data processing device (1). The data processing device (1) is adapted to further determine the flow rate of the target gaseous compound based on the received pressure information (15), and / or The system (100) further includes at least one temperature sensor (17) adapted to determine at least one temperature of the gas mixture (11). The temperature sensor (17) is adapted to provide the data processing device (1) with temperature information (19) based on the detected temperature. The data processing device (1) is adapted to further determine the flow rate of the target gas compound based on the received temperature information (19).

7. The system (100) according to any one of the preceding claims, in, The system (100) also includes: A second compound concentration analyzer (25), calibrated for at least one second impurity gaseous compound (55), and adapted to detect the concentration of the second impurity gaseous compound (55) in the gas mixture (11), The second compound concentration analyzer (25) is adapted to provide second impurity concentration information (27) to the data processing device (1) based on the detected concentration of the second impurity gaseous compound (55) in the gas mixture (11). The data processing device (1) is adapted to further determine the flow rate of the target gas compound based on the second impurity concentration information (27) received from the second compound concentration analyzer (25).

8. The system (100) according to the preceding claims, in, The second compound concentration analyzer (25) is adapted to detect the concentration of the second impurity gaseous compound (55) in the gas mixture (11) at a sampling rate of less than 60 seconds, more preferably less than 30 seconds, even more preferably less than 10 seconds, and most preferably less than 1 second.

9. The system (100) according to any one of the preceding claims, in, The first compound concentration analyzer (7) and / or the second compound concentration analyzer (25) include one or more of an optical absorption analyzer, a thermal conductivity analyzer, and a sound velocity gas analyzer.

10. The system (100) according to any one of claims 7 to 9, in, The second compound concentration analyzer (25) is adapted to provide the first compound concentration analyzer (7) with second impurity concentration information (27). The first compound concentration analyzer (7) is adapted to use additional calibration data based on the second impurity concentration information (27) received from the second compound concentration analyzer (25). The first compound concentration analyzer (7) is adapted to provide the data processing device (1) with corrected first impurity concentration information (10) based on the first impurity concentration and the second impurity concentration information (27). The data processing device (1) is adapted to determine the flow rate of the target gas compound based on the gas mixture flow rate information (5) received from the flow meter (3) and the corrected first impurity concentration information (10) received from the first compound concentration analyzer (7).

11. A method (300) for determining the gas flow rate in a gas conveying device (200), wherein the method (300) comprises the following steps: The flow rate of the gas mixture (11), comprising a target gas compound (51) and at least one impurity gas compound (53, 55), is detected (S1) by a flow meter (3). Based on the detected flow rate, the gas mixture flow rate information (5) is provided to the data processing device (1) (S2). For at least one first impurity gaseous compound (53), calibrate (S3) the first compound concentration analyzer (7). The concentration of the first impurity gaseous compound (53) in the gas mixture (11) is detected (S4) by the first compound concentration analyzer (7). Based on the detected concentration of the first impurity gaseous compound (53) in the gas mixture (11), the first compound concentration analyzer (7) provides (S5) the first impurity concentration information to the data processing device (1). Based on the gas mixture flow rate information (5) received from the flow meter (3) and the first impurity concentration information received from the first compound concentration analyzer (7), the data processing device (1) determines (S6) the target gas compound flow rate.

12. The method (300) according to the preceding claim, It also includes the following steps: For at least one second impurity gaseous compound (55), calibrate (S7) the second compound concentration analyzer (25). Detect (S8) the concentration of the second impurity gaseous compound (55) in the gas mixture (11), Based on the detected concentration of the second impurity gaseous compound (55) in the gas mixture (11), the second compound concentration analyzer (25) provides (S9) second impurity concentration information (27) to the data processing device (1). Based on the second impurity concentration information (27) received from the second compound concentration analyzer (25), the data processing device (1) determines (S10) the flow rate of the target gas compound.

13. The method (300) according to the preceding claim, It also includes the following steps: The second compound concentration analyzer (25) provides (S11) the second impurity concentration information (27) to the first compound concentration analyzer (7). Using (S12) additional calibration data of the first compound concentration analyzer (7) based on the second impurity concentration information (27) received from the second compound concentration analyzer (25), The first compound concentration analyzer (7) provides (S13) the data processing device (1) with corrected first impurity concentration information (10) based on the first impurity concentration and the second impurity concentration information (27), and Based on the gas mixture flow rate information (5) received from the flow meter (3) and the corrected first impurity concentration information (10) received from the first compound concentration analyzer (7), the target gas compound flow rate is determined (S14) by the data processing device (1).

14. A computer program product (60) comprising instructions which, when executed by a data processing device (1), cause the data processing device (1) to at least partially perform and / or control the method (300) according to any one of claims 11 to 13.

15. A computer-readable medium (70) containing instructions that, when executed by a data processing device (1), cause the data processing device (1) to at least partially perform and / or control the method (300) according to any one of claims 11 to 13.

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