Touch screen with scratch-resistant coating

Abstract

The invention belongs to the technical field of touch screens, and particularly relates to a touch screen with a scratch-resistant coating. The touch screen is high in sensitivity, the coating prepared through hybridization of the organic silicon emulsion and the inorganic silica sol can form nanoscale honeycomb-shaped pores, the problem that a pure inorganic silicon dioxide coating is prone to cracking can be solved, the inorganic silica sol forms cross-linked silicon dioxide particles in the curing process, and when the surface of the touch screen is scratched, the surface of the touch screen is not prone to cracking. The particles can support each other, so that the surface hardness and the scratch resistance are improved; according to the glass substrate, alkali metal is replaced with boron oxide, the melting processing performance of glass is improved during glass melting, the problem of screen failure caused by rapid diffusion of alkali metal cations in the glass after the alkali metal is added is solved, the prepared glass substrate has excellent hardness due to high-content aluminum oxide, and the service life of the glass substrate is prolonged. Through zirconium dioxide, the hardness, wear resistance and chemical corrosion resistance of the glass are further improved, the impact resistance of the substrate is enhanced, and the service life of the touch screen is prolonged.

Description

Technical Field

[0001] This invention belongs to the field of touch screen technology, and specifically relates to a touch screen with a scratch-resistant coating. Background Technology

[0002] A touchscreen, also known as a touch panel or touch screen, is a type of sensor-based liquid crystal display device. There are several types of touchscreens: resistive, capacitive, acoustic wave, and infrared. Resistive touchscreens use pressure on the surface to deform the screen, utilizing the resulting change in resistance to determine the touch position. However, they suffer from low touch accuracy and short lifespan. Capacitive touchscreens, on the other hand, sense touch position through capacitance created by the human body and electrodes. They offer advantages such as fast response, high accuracy, and long lifespan, and have gradually replaced resistive touchscreens as the dominant human-computer interaction panel product on the market. However, because the capacitance of capacitive touchscreens varies with temperature, humidity, and ambient electric fields, there are still unresolved technical problems related to poor stability and susceptibility to wear and tear leading to touchscreen failure.

[0003] Chinese invention patent CN112860118B discloses a touchscreen for projection touch control and its processing technology. The touchscreen body includes a wear-resistant layer, a touch-sensing layer, a projection display layer, and a reinforcing layer. The inner side of the wear-resistant layer is bonded to the outer side of the touch-sensing layer, the inner side of the touch-sensing layer is bonded to the outer side of the projection display layer, and the inner side of the projection display layer is bonded to the outer side of the reinforcing layer. The touch-sensing layer includes a first fixing layer disposed on the outer side of the projection display layer. Inside the first fixing layer is a magnetic layer for forming a sensing magnetic field. Multiple first bumps are arrayed on the magnetic layer. An insulating layer is disposed inside the magnetic layer. Inside the insulating layer is a second fixing layer. The outer side of the second fixing layer has second bumps for exchanging charge with the first bumps to form a stronger sensing magnetic field, and the inner side has a conductive layer. This invention provides a high-strength, wear-resistant touchscreen whose sensitivity is unaffected by screen size. However, existing technologies lack the technical problem of improving the wear and scratch resistance of the touchscreen by modifying the composition of the glass and surface coating. Summary of the Invention

[0004] The purpose of this invention is to provide a touch screen with a scratch-resistant coating, which solves the technical problem in the prior art that the glass and surface coating of the touch screen are not modified to improve the wear resistance and scratch resistance of the touch screen.

[0005] To achieve the above objectives, the present invention adopts the following technical solution:

[0006] A touch screen with a scratch-resistant coating includes, from bottom to top, a glass substrate layer, an adhesive layer, a transparent electrode layer, a protective layer, an anti-reflective layer, and a scratch-resistant coating;

[0007] The glass substrate is an aluminosilicate-borate composite glass with indium tin oxide plating on both sides, with an average thickness of 1.6~2mm, an average thickness of 30~40nm for the indium tin oxide plating, and a thermal expansion coefficient of 3×10⁻⁶. -6 / ℃~3.3×10 -6 / ℃.

[0008] The chemical composition of the aluminosilicate-borate composite glass is as follows: 60-65% silicon dioxide, 12-17% aluminum oxide, 5-10% boron oxide, 5-10% calcium oxide, 4-6% magnesium oxide, 2-4% strontium oxide, and 0.05-0.1% zirconium dioxide.

[0009] The anti-reflective layer comprises a titanium dioxide coating and a silicon dioxide coating from bottom to top, which are deposited sequentially by magnetron sputtering. The average thickness of the titanium dioxide coating is 70-80 nm, and the average thickness of the silicon dioxide coating is 40-50 nm.

[0010] The protective layer is made of microcrystalline glass with an average thickness of 1~1.5mm.

[0011] The adhesive layer is an acrylate resin UV-curable optical adhesive with an average thickness of 10~15μm.

[0012] The average thickness of the scratch-resistant coating is 1.5~3μm.

[0013] The method for preparing the glass substrate includes the following steps:

[0014] S11. Based on the chemical composition of aluminosilicate-borate composite glass, the corresponding raw materials are added to a mixer and mixed evenly, then added to a furnace and heated to melt, thus obtaining molten glass.

[0015] S12. After clarifying and homogenizing the glass melt, it is float-formed on the surface of the molten tin. The thickness is controlled by the edge-pulling machine, and the glass is cooled and shaped to obtain ultra-thin glass.

[0016] S13. The ultra-thin glass is annealed and cooled in an annealing furnace to eliminate stress, and then placed in a magnetron sputtering furnace for double-sided indium tin oxide sputtering. After cooling, it is cut into different specifications to obtain glass substrates.

[0017] Preferably, the temperature in S11 is raised to 1500~1600℃ and melted for 2~3 hours.

[0018] Preferably, in step S12, after adding a clarifying agent, the glass is clarified at 1600~1650℃ for 2~3 hours. The clarifying agent is prepared by mixing tin oxide, cerium oxide and titanium dioxide in a mass ratio of 5~8:1~2:0.5~0.8. The amount of clarifying agent added is 0.5~1.3% of the mass of the glass melt. Argon gas is introduced for bubbling, and the mixture is stirred and homogenized at a speed of 10~15 rpm for 1~2 hours. The glass melt is then floated on the surface of the tin melt at 1050~1150℃ and formed by flotation. The temperature is then lowered to 880~950℃ and the glass thickness is controlled by drawing with an edge-drawing machine. Finally, the glass is cooled to 600~750℃ for shaping.

[0019] Preferably, the annealing process in S13 involves heating to 700~780℃ and holding for 5~15 minutes, then cooling to 500~600℃ and holding for 1~2 hours, and then cooling to room temperature at a rate of 3~8℃ / min.

[0020] Preferably, in step S13, the temperature is raised to 250~350℃ in an argon atmosphere for sputtering deposition for 20~40 minutes.

[0021] The method for preparing the scratch-resistant coating includes the following steps:

[0022] S21. Vinyltrimethoxysilane, methyltrimethoxysilane, epoxytrimethoxysilane and toluene are added to a reaction vessel, 1~2wt% hydrochloric acid is added dropwise and reacted at room temperature. The mixture is heated to dehydrate and polycondense. After the reaction is completed, the mixture is allowed to stand and separated. The upper liquid is washed with water until neutral. Anhydrous sodium sulfate is added to remove water. Impurities are removed by filtration and the polysiloxane is obtained by vacuum distillation.

[0023] S22. Polysiloxane, tetrahydrofuran, methacrylic acid and butyl acrylate are added to a reaction vessel under a nitrogen atmosphere, and azobisisobutyronitrile is added to initiate the reaction to obtain an organosilicon emulsion.

[0024] S23. Alkaline silica sol and organosilicon emulsion are mixed and modified, and then allowed to stand at room temperature to mature to obtain a scratch-resistant coating liquid. The scratch-resistant coating liquid and amine end-curing agent are mixed and sprayed onto the surface of the anti-reflective layer of the touch screen. The mixture is dried at room temperature and then cured by heating to obtain a scratch-resistant coating.

[0025] Preferably, in S21, the mass ratio of vinyltrimethoxysilane, methyltrimethoxysilane, and epoxytrimethoxysilane is 8.8~9.2:4~4.2:7~7.3, the amount of hydrochloric acid added is 10~15% of the mass of toluene, the reaction is carried out at room temperature for 10~30 min, and then the temperature is raised to 60~70℃ for dehydration and polycondensation for 1~2 h.

[0026] Preferably, in S22, the mass ratio of polysiloxane, tetrahydrofuran, methacrylic acid and butyl acrylate is 1~2:300~600:70~80:20~30, and the amount of azobisisobutyronitrile added is 1~1.5% of the total mass of methacrylic acid and butyl acrylate. The reaction is carried out at 75~80℃ for 1~2 hours.

[0027] Preferably, in S23, the mass ratio of alkaline silica sol to silicone emulsion is 100:5~10, the mixture is allowed to stand at room temperature for 1~2 hours, the amount of amine end-capping curing agent added is 3~6% of the mass of the scratch-resistant coating liquid, the mixture is dried at room temperature for 10~15 minutes, and then heated to 120~140℃ for 0.5~1 hours for curing.

[0028] A method for preparing a touchscreen with a scratch-resistant coating includes the following steps:

[0029] S1. After cleaning and drying the glass substrate, plasma treatment is performed on one side of the glass substrate to treat indium tin oxide, and then UV-curable optical adhesive is applied.

[0030] S2. The outer layer of the microcrystalline glass is sequentially coated with a titanium dioxide coating and a silicon dioxide coating by magnetron sputtering to obtain an anti-reflective layer. A scratch-resistant coating is then sprayed and cured to obtain a scratch-resistant coating.

[0031] S3. The inner layer of the microcrystalline glass is laser-etched to deposit an indium tin oxide pattern layer, which is then bonded to the glass substrate with UV-curable optical adhesive and cured by UV irradiation to obtain a touch screen with a scratch-resistant coating.

[0032] In summary, due to the adoption of the above technical solution, the beneficial effects of the present invention are:

[0033] 1. The touch screen of the present invention has high sensitivity. The coating obtained by the hybridization of organosilicon emulsion and inorganic silica sol can effectively prevent the problem of easy cracking of pure inorganic silica coating and effectively prevent touch screen damage. In addition, organosilicon can form nano-sized honeycomb pores during the coating process, which improves the transparency and toughness of the coating. When the inorganic silica sol is cured, it forms cross-linked silica particles. When the touch screen surface is scratched, these particles can support each other, improving surface hardness and scratch resistance.

[0034] 2. The glass substrate of this invention is an aluminosilicate-borate composite glass. By replacing alkali metals with boron oxide, the melting and processing performance of the glass is improved during the glass melting process. This prevents the problem of alkali metal cations inside the glass rapidly diffusing to the surface and causing screen failure after the addition of alkali metals. The high content of aluminum oxide gives the glass substrate excellent hardness. Zirconia is used to further improve the hardness, wear resistance and chemical corrosion resistance of the glass, strengthen the impact resistance of the substrate, and extend the service life of the touch screen. Attached Figure Description

[0035] To more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0036] Figure 1 A layered schematic diagram of a touch screen with a scratch-resistant coating according to the present invention is shown;

[0037] Reference numerals: 1. Glass substrate layer; 2. Adhesive layer; 3. Transparent electrode layer; 4. Protective layer; 5. Anti-reflective layer; 6. Scratch-resistant coating. Detailed Implementation

[0038] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0039] The UV-curable optical adhesive of the acrylate resin involved in this invention is model PAR-36, the amine end-capping curing agent is model T-31, and the alkaline silica sol has an average particle size of 15nm and a pH of 9.5.

[0040] The chemical composition of the aluminosilicate-borate composite glass of the present invention is as follows: 65% silicon dioxide, 13.5% aluminum oxide, 6% boron oxide, 6% calcium oxide, 5.9% magnesium oxide, 3.5% strontium oxide, and 0.1% zirconium dioxide. Its coefficient of thermal expansion is 3.2 × 10⁻⁶. -6 / ℃.

[0041] Example 1, according to Figure 1 As shown, a touch screen with a scratch-resistant coating in this embodiment includes, from bottom to top, a glass substrate layer 1, an adhesive layer 2, a transparent electrode layer 3, a protective layer 4, an anti-reflective layer 5, and a scratch-resistant coating 6.

[0042] The glass substrate of the glass substrate layer is an aluminosilicate-borate composite glass with indium tin oxide plating on both sides, with an average thickness of 1.6 mm and an average thickness of 30 nm for the indium tin oxide plating layer.

[0043] The anti-reflective layer comprises a titanium dioxide coating and a silicon dioxide coating from bottom to top, which are deposited sequentially by magnetron sputtering. The average thickness of the titanium dioxide coating is 70 nm, and the average thickness of the silicon dioxide coating is 45 nm.

[0044] The protective layer is made of microcrystalline glass with an average thickness of 1.5 mm.

[0045] The adhesive layer is an acrylate resin UV-curable optical adhesive with an average thickness of 14 μm.

[0046] The average thickness of the scratch-resistant coating is 1.5 μm.

[0047] The method for preparing the glass substrate in this embodiment includes the following steps:

[0048] S11. Based on the chemical composition of aluminosilicate-borate composite glass, the corresponding raw materials are added to a mixer and mixed evenly. The mixture is then added to a furnace and heated to 1580℃ for 2 hours to melt and obtain molten glass.

[0049] S12. Tin oxide, cerium oxide and titanium dioxide are mixed in a mass ratio of 8:1.5:0.5 to prepare a clarifying agent, which is then added to the glass melt. The clarification treatment is carried out at 1610℃ for 2 hours. The amount of clarifying agent added is 1% of the mass of the glass melt. Argon gas is bubbled through and the mixture is stirred and homogenized at a speed of 10 rpm for 2 hours. The glass melt is then floated on the surface of the tin melt at 1150℃ to form a glass. The temperature is lowered to 950℃ and the thickness is controlled by an edge-pulling machine. The glass is then cooled to 750℃ to solidify and obtain ultra-thin glass.

[0050] S13. The ultra-thin glass is placed in an annealing furnace and heated to 780°C and held for 8 minutes. Then it is cooled to 600°C and held for 2 hours. Then it is cooled to room temperature at a cooling rate of 7°C / min to relieve stress. It is then placed in a magnetron sputtering furnace and heated to 300°C in an argon atmosphere for sputtering deposition for 30 minutes to deposit indium tin oxide on both sides. After cooling, it is cut into different specifications to obtain glass substrates.

[0051] The method for preparing the scratch-resistant coating in this embodiment includes the following steps:

[0052] S21. Add 8.9g of vinyltrimethoxysilane, 4.1g of methyltrimethoxysilane, 7.1g of epoxytrimethoxysilane and 100g of toluene to a reaction vessel, add 15g of 1.5wt% hydrochloric acid dropwise, react at room temperature for 30min, heat to 60℃ for dehydration and polycondensation for 2h, after the reaction is completed, let stand and separate the liquids, take the upper liquid and wash with water until neutral, add anhydrous sodium sulfate to remove water, filter to remove impurities, and distill under reduced pressure to obtain polysiloxane;

[0053] S22. 2g of polysiloxane, 500g of tetrahydrofuran, 80g of methacrylic acid and 20g of butyl acrylate were added to a reaction vessel under a nitrogen atmosphere. 1g of azobisisobutyronitrile was added and the mixture was reacted at 80°C for 2h to obtain an organosilicon emulsion.

[0054] S23. Mix 100g of alkaline silica sol and 10g of organosilicon emulsion for modification, let stand at room temperature for 2 hours to obtain a scratch-resistant coating liquid. Mix 100g of the scratch-resistant coating liquid and 6g of amine end-curing agent and spray it onto the surface of the anti-reflective layer of the touch screen. Dry at room temperature for 15 minutes and heat to 140℃ for 1 hour to obtain a scratch-resistant coating.

[0055] This embodiment provides a method for preparing a touchscreen with a scratch-resistant coating, comprising the following steps:

[0056] S1. After cleaning and drying the glass substrate, plasma treatment is performed on one side of the glass substrate to treat indium tin oxide, and then UV-curable optical adhesive is applied.

[0057] S2. The outer layer of the microcrystalline glass is sequentially coated with a titanium dioxide coating and a silicon dioxide coating by magnetron sputtering to obtain an anti-reflective layer. A scratch-resistant coating is then sprayed and cured to obtain a scratch-resistant coating.

[0058] S3. The inner layer of the microcrystalline glass is laser-etched to deposit an indium tin oxide pattern layer, which is then bonded to the glass substrate with UV-curable optical adhesive and cured by UV irradiation to obtain a touch screen with a scratch-resistant coating.

[0059] Example 2, according to Figure 1 As shown, a touch screen with a scratch-resistant coating in this embodiment includes, from bottom to top, a glass substrate layer 1, an adhesive layer 2, a transparent electrode layer 3, a protective layer 4, an anti-reflective layer 5, and a scratch-resistant coating 6.

[0060] The glass substrate of the glass substrate layer is an aluminosilicate-borate composite glass with indium tin oxide plating on both sides, with an average thickness of 1.7 mm and an average thickness of 40 nm for the indium tin oxide plating layer.

[0061] The anti-reflective layer comprises a titanium dioxide coating and a silicon dioxide coating from bottom to top, which are deposited sequentially by magnetron sputtering. The average thickness of the titanium dioxide coating is 75 nm, and the average thickness of the silicon dioxide coating is 40 nm.

[0062] The protective layer is made of microcrystalline glass with an average thickness of 1.2 mm.

[0063] The adhesive layer is an acrylate resin UV-curable optical adhesive with an average thickness of 12 μm.

[0064] The average thickness of the scratch-resistant coating is 1.8 μm.

[0065] The method for preparing the glass substrate in this embodiment includes the following steps:

[0066] S11. Based on the chemical composition of aluminosilicate-borate composite glass, the corresponding raw materials are added to a mixer and mixed evenly. The mixture is then added to a furnace and heated to 1560℃ for 3 hours to melt and obtain molten glass.

[0067] S12. Tin oxide, cerium oxide and titanium dioxide are mixed in a mass ratio of 7:2:0.8 to prepare a clarifying agent, which is then added to the glass melt. The clarification treatment is carried out at 1620℃ for 3 hours. The amount of clarifying agent added is 0.5% of the mass of the glass melt. Argon gas is bubbled through and the mixture is stirred and homogenized at a speed of 15 rpm for 1.5 hours. The glass melt is then floated on the surface of the tin melt at 1100℃ to form a glass. The temperature is lowered to 900℃ and the thickness is controlled by an edge-drawing machine. The glass is then cooled to 700℃ to solidify and obtain ultra-thin glass.

[0068] S13. The ultra-thin glass is placed in an annealing furnace and heated to 750°C and held for 10 minutes. Then it is cooled to 580°C and held for 1.5 hours. Then it is cooled to room temperature at a rate of 6°C / min to relieve stress. It is then placed in a magnetron sputtering furnace and heated to 320°C in an argon atmosphere for 40 minutes to deposit indium tin oxide on both sides. After cooling, it is cut into glass substrates of different specifications.

[0069] The method for preparing the scratch-resistant coating in this embodiment includes the following steps:

[0070] S21. Add 9g of vinyltrimethoxysilane, 4.1g of methyltrimethoxysilane, 7.2g of epoxytrimethoxysilane and 80g of toluene to a reaction vessel, add 10g of 2wt% hydrochloric acid dropwise, react at room temperature for 20min, heat to 65℃ for dehydration and polycondensation for 1.5h, after the reaction is completed, let stand and separate the liquids, take the upper liquid and wash with water until neutral, add anhydrous sodium sulfate to remove water, filter to remove impurities, and distill under reduced pressure to obtain polysiloxane;

[0071] S22. 1.5g of polysiloxane, 400g of tetrahydrofuran, 75g of methacrylic acid and 25g of butyl acrylate were added to a reaction vessel under a nitrogen atmosphere, and 1.2g of azobisisobutyronitrile was added. The reaction was carried out at 80°C for 1.5h to obtain an organosilicon emulsion.

[0072] S23. Mix 100g of alkaline silica sol and 8g of organosilicon emulsion for modification, let stand at room temperature for 2 hours to obtain a scratch-resistant coating liquid. Mix 100g of the scratch-resistant coating liquid and 5g of amine end-curing agent and spray it onto the surface of the anti-reflective layer of the touch screen. Dry at room temperature for 15 minutes and heat to 130℃ for 1 hour to obtain a scratch-resistant coating.

[0073] Example 3, according to Figure 1 As shown, a touch screen with a scratch-resistant coating in this embodiment includes, from bottom to top, a glass substrate layer 1, an adhesive layer 2, a transparent electrode layer 3, a protective layer 4, an anti-reflective layer 5, and a scratch-resistant coating 6.

[0074] The glass substrate of the glass substrate layer is an aluminosilicate-borate composite glass with indium tin oxide plating on both sides, with an average thickness of 1.8 mm and an average thickness of 35 nm for the indium tin oxide plating layer.

[0075] The anti-reflective layer comprises a titanium dioxide coating and a silicon dioxide coating from bottom to top, which are deposited sequentially by magnetron sputtering. The average thickness of the titanium dioxide coating is 80 nm, and the average thickness of the silicon dioxide coating is 50 nm.

[0076] The protective layer is made of microcrystalline glass with an average thickness of 1.5 mm.

[0077] The adhesive layer is an acrylate resin UV-curable optical adhesive with an average thickness of 10 μm.

[0078] The average thickness of the scratch-resistant coating is 2.5 μm.

[0079] The method for preparing the glass substrate in this embodiment includes the following steps:

[0080] S11. Based on the chemical composition of aluminosilicate-borate composite glass, the corresponding raw materials are added to a mixer and mixed evenly. The mixture is then added to a furnace and heated to 1550℃ for 2.5 hours to melt and obtain molten glass.

[0081] S12. Tin oxide, cerium oxide and titanium dioxide are mixed in a mass ratio of 8:1.4:0.6 to prepare a clarifying agent, which is then added to the glass melt. The clarification treatment is carried out at 1630℃ for 2.5h. The amount of clarifying agent added is 1.3% of the mass of the glass melt. Argon gas is bubbled in and stirred and homogenized at a speed of 13rpm for 1.5h. The glass melt is then floated on the surface of the tin melt at 1120℃ to form a glass. The temperature is lowered to 890℃ and the thickness is controlled by an edge-pulling machine. The glass is then cooled to 680℃ to solidify and obtain ultra-thin glass.

[0082] S13. The ultra-thin glass is placed in an annealing furnace and heated to 730℃ and held for 7.5 min. Then it is cooled to 550℃ and held for 1 h. Then it is cooled to room temperature at a cooling rate of 4.5℃ / min to relieve stress. It is then placed in a magnetron sputtering furnace and heated to 300℃ in an argon atmosphere for sputtering deposition for 25 min to deposit indium tin oxide on both sides. After cooling, it is cut into glass substrates of different specifications.

[0083] The method for preparing the scratch-resistant coating in this embodiment includes the following steps:

[0084] S21. Add 9.2g of vinyltrimethoxysilane, 4.2g of methyltrimethoxysilane, 7.3g of epoxytrimethoxysilane and 90g of toluene to a reaction vessel, add 10g of 1.5wt% hydrochloric acid dropwise, react at room temperature for 15min, heat to 70℃ for dehydration and polycondensation for 1h, after the reaction is completed, let stand and separate the liquids, take the upper liquid and wash with water until neutral, add anhydrous sodium sulfate to remove water, filter to remove impurities, and distill under reduced pressure to obtain polysiloxane;

[0085] S22. 1g of polysiloxane, 300g of tetrahydrofuran, 70g of methacrylic acid and 30g of butyl acrylate were added to a reaction vessel under a nitrogen atmosphere, and 1.5g of azobisisobutyronitrile was added. The reaction was carried out at 75°C for 1.5h to obtain an organosilicon emulsion.

[0086] S23. Mix 100g of alkaline silica sol and 6g of organosilicon emulsion for modification, let stand at room temperature for 1 hour to obtain a scratch-resistant coating liquid. Mix 100g of the scratch-resistant coating liquid and 3g of amine end-curing agent and spray it onto the surface of the anti-reflective layer of the touch screen. Dry at room temperature for 15 minutes and heat to 120℃ for 1 hour to obtain a scratch-resistant coating.

[0087] Example 4, according to Figure 1 As shown, a touch screen with a scratch-resistant coating in this embodiment includes, from bottom to top, a glass substrate layer 1, an adhesive layer 2, a transparent electrode layer 3, a protective layer 4, an anti-reflective layer 5, and a scratch-resistant coating 6.

[0088] The glass substrate of the glass substrate layer is an aluminosilicate-borate composite glass with indium tin oxide plating on both sides, with an average thickness of 1.9 mm and an average thickness of 30 nm for the indium tin oxide plating.

[0089] The anti-reflective layer comprises a titanium dioxide coating and a silicon dioxide coating from bottom to top, which are deposited sequentially by magnetron sputtering. The average thickness of the titanium dioxide coating is 80 nm, and the average thickness of the silicon dioxide coating is 40 nm.

[0090] The protective layer is made of microcrystalline glass with an average thickness of 1.4 mm.

[0091] The adhesive layer is an acrylate resin UV-curable optical adhesive with an average thickness of 11 μm.

[0092] The average thickness of the scratch-resistant coating is 2.8 μm.

[0093] The method for preparing the glass substrate in this embodiment includes the following steps:

[0094] S11. Based on the chemical composition of aluminosilicate-borate composite glass, the corresponding raw materials are added to a mixer and mixed evenly. The mixture is then added to a furnace and heated to 1540℃ for 2 hours to melt and obtain molten glass.

[0095] S12. Tin oxide, cerium oxide and titanium dioxide are mixed in a mass ratio of 6:1.3:0.7 to prepare a clarifying agent, which is then added to the glass melt. The clarification treatment is carried out at 1630℃ for 2 hours. The amount of clarifying agent added is 1.3% of the mass of the glass melt. Argon gas is bubbled through and the mixture is stirred and homogenized at a speed of 15 rpm for 1 hour. The glass melt is then floated on the surface of the tin melt at 1050℃ to form a glass. The temperature is lowered to 880℃ and the thickness is controlled by an edge-pulling machine. The glass is then cooled to 600℃ to solidify and obtain ultra-thin glass.

[0096] S13. The ultra-thin glass is placed in an annealing furnace and heated to 700℃ and held for 15 minutes. Then it is cooled to 520℃ and held for 1 hour. Then it is cooled to room temperature at a cooling rate of 4℃ / min to relieve stress. It is then placed in a magnetron sputtering furnace and heated to 350℃ in an argon atmosphere for 20 minutes to deposit indium tin oxide on both sides. After cooling, it is cut into different specifications to obtain glass substrates.

[0097] The method for preparing the scratch-resistant coating in this embodiment includes the following steps:

[0098] S21. Add 8.8g of vinyltrimethoxysilane, 4.2g of methyltrimethoxysilane, 7g of epoxytrimethoxysilane and 100g of toluene to a reaction vessel, add 10g of 2wt% hydrochloric acid dropwise, react at room temperature for 20min, heat to 70℃ for dehydration and polycondensation for 1h, after the reaction is completed, let stand and separate the liquids, take the upper liquid and wash with water until neutral, add anhydrous sodium sulfate to remove water, filter to remove impurities, and distill under reduced pressure to obtain polysiloxane;

[0099] S22. 1.5g of polysiloxane, 500g of tetrahydrofuran, 70g of methacrylic acid and 30g of butyl acrylate were added to a reaction vessel under a nitrogen atmosphere. 1g of azobisisobutyronitrile was added and the mixture was reacted at 75°C for 1h to obtain an organosilicon emulsion.

[0100] S23. Mix 100g of alkaline silica sol and 5g of organosilicon emulsion for modification, let stand at room temperature for 2 hours to obtain a scratch-resistant coating liquid. Mix 100g of the scratch-resistant coating liquid and 4g of amine end-curing agent and spray it onto the surface of the anti-reflective layer of the touch screen. Dry at room temperature for 15 minutes and heat to 120℃ to cure for 0.5 hours to obtain a scratch-resistant coating.

[0101] Comparative Example 1 differs from Example 1 in that the aluminosilicate-borate composite glass is replaced with soda-lime-silicon glass, the chemical composition of which is as follows: silicon dioxide 72%, sodium oxide 12.6%, calcium oxide 12%, magnesium oxide 0.95%, zirconium dioxide 0.05%, and strontium oxide 2.4%.

[0102] Comparative Example 2 differs from Example 1 in that it does not include a scratch-resistant coating.

[0103] Comparative Example 3 differs from Example 1 in that the scratch-resistant coating is replaced with an inorganic silica coating prepared by alkaline silica sol spraying.

[0104] Performance testing

[0105] The hardness of the touch screens prepared according to the test examples and comparative examples in GB / T 6739-2022 "Test Method for Pencil Hardness of Paints and Varnishes".

[0106] According to GB / T 1768-2006 "Determination of Abrasion Resistance of Paints and Varnishes - Rotary Rubber Grinding Wheel Method", the touch screens prepared in the examples and comparative examples were abraded with an eraser 2000 times, and the surface of the touch screens was tested for scratches, cracks and other phenomena.

[0107] The impact resistance of the touch screens prepared according to the test examples and comparative examples were determined in accordance with GB / T 1732-2007 "Test Method for Impact Resistance of Coating Film".

[0108] The test results are shown in Table 1 below:

[0109] Table 1 Test Results

[0110] Test Project hardness Scratch resistance <![CDATA[Impact resistance (kJ / m 2 )]]> Example 1 8H Smooth surface 50 Example 2 8H Smooth surface 50 Example 3 8H Smooth surface 50 Example 4 8H Smooth surface 50 Comparative Example 1 8H Smooth surface 40 Comparative Example 2 7H Surface wear and scratches 40 Comparative Example 3 6H The surface has scratches and cracks. 30

[0111] According to the data in Table 1 above, the surface hardness of the touch screens obtained in Examples 1-4 is 8H, and the surface is smooth after 2000 abrasions with an eraser. The impact resistance is 50kJ / m. 2 The glass substrate of Comparative Example 1 is soda-lime-silicon glass containing alkali metal ions, resulting in a relatively loose network structure. This leads to a decrease in the overall impact resistance of the touchscreen, with an impact resistance of 40 kJ / m. 2 In contrast, the scratch-resistant coating of Comparative Example 3 was replaced with an inorganic silica coating prepared by alkaline silica sol spraying. This coating was brittle and showed scratches and cracks on the surface after being rubbed with an eraser 2000 times. This indicates that the touch screen prepared by the present invention has excellent scratch resistance.

[0112] The above description is only a preferred embodiment of the present invention, but the scope of protection of the present invention is not limited thereto. Any equivalent substitutions or modifications made by those skilled in the art within the scope of the technology disclosed in the present invention, based on the technical solution and inventive concept of the present invention, should be covered within the scope of protection of the present invention.

[0113] The preferred embodiments of the present invention disclosed above are merely illustrative of the invention. These preferred embodiments do not exhaustively describe all details, nor do they limit the invention to specific implementations. Clearly, many modifications and variations can be made based on the content of this specification. This specification selects and specifically describes these embodiments to better explain the principles and practical applications of the invention, thereby enabling those skilled in the art to better understand and utilize the invention. The invention is limited only by the claims and their full scope and equivalents.

Claims

1. A touchscreen with a scratch-resistant coating, characterized in that, From bottom to top, it includes a glass substrate layer, an adhesive layer, a transparent electrode layer, a protective layer, an anti-reflective layer, and a scratch-resistant coating; The glass substrate is an aluminosilicate-borate composite glass with indium tin oxide plating on both sides, with an average thickness of 1.6~2mm, an average thickness of 30~40nm for the indium tin oxide plating, and a thermal expansion coefficient of 3×10⁻⁶. -6 / ℃~3.3×10 -6 / ℃; The chemical composition of the aluminosilicate-borate composite glass is as follows: 60-65% silicon dioxide, 12-17% aluminum oxide, 5-10% boron oxide, 5-10% calcium oxide, 4-6% magnesium oxide, 2-4% strontium oxide, and 0.05-0.1% zirconium dioxide.

2. A touchscreen with a scratch-resistant coating according to claim 1, characterized in that, The anti-reflective layer comprises a titanium dioxide coating and a silicon dioxide coating from bottom to top, which are deposited sequentially by magnetron sputtering. The average thickness of the titanium dioxide coating is 70-80 nm, and the average thickness of the silicon dioxide coating is 40-50 nm. The protective layer is made of microcrystalline glass with an average thickness of 1~1.5mm; The adhesive layer is an acrylic resin UV-curable optical adhesive with an average thickness of 10~15μm; The average thickness of the scratch-resistant coating is 1.5~3μm.

3. A touchscreen with a scratch-resistant coating according to claim 1, characterized in that, The method for preparing the glass substrate includes the following steps: S11. Based on the chemical composition of aluminosilicate-borate composite glass, the corresponding raw materials are added to a mixer and mixed evenly, then added to a furnace and heated to melt, thus obtaining molten glass. S12. After clarifying and homogenizing the glass melt, it is float-formed on the surface of the molten tin. The thickness is controlled by the edge-pulling machine, and the glass is cooled and shaped to obtain ultra-thin glass. S13. The ultra-thin glass is annealed and cooled in an annealing furnace to eliminate stress, and then placed in a magnetron sputtering furnace for double-sided indium tin oxide sputtering. After cooling, it is cut into different specifications to obtain glass substrates.

4. A touchscreen with a scratch-resistant coating according to claim 3, characterized in that, The temperature in S11 is raised to 1500~1600℃ and melted for 2~3 hours.

5. A touchscreen with a scratch-resistant coating according to claim 3, characterized in that, After adding a clarifying agent in step S12, the glass is clarified at 1600~1650℃ for 2~3 hours. The clarifying agent is prepared by mixing tin oxide, cerium oxide and titanium dioxide in a mass ratio of 5~8:1~2:0.5~0.

8. The amount of clarifying agent added is 0.5~1.3% of the mass of the glass melt. Argon gas is introduced for bubbling, and the mixture is stirred and homogenized at a speed of 10~15 rpm for 1~2 hours. The glass melt is then floated on the surface of the tin melt at 1050~1150℃ and formed by flotation. The temperature is then lowered to 880~950℃ and the glass thickness is controlled by drawing through an edge-drawing machine. Finally, the glass is cooled to 600~750℃ for shaping.

6. A touchscreen with a scratch-resistant coating according to claim 3, characterized in that, The annealing process in S13 involves heating to 700-780℃ and holding for 5-15 minutes, then cooling to 500-600℃ and holding for 1-2 hours, followed by cooling to room temperature at a rate of 3-8℃ / min, and then sputtering deposition at 250-350℃ in an argon atmosphere for 20-40 minutes.

7. A touchscreen with a scratch-resistant coating according to claim 1, characterized in that, The method for preparing a scratch-resistant coating includes the following steps: S21. Vinyltrimethoxysilane, methyltrimethoxysilane, epoxytrimethoxysilane and toluene are added to a reaction vessel, 1~2wt% hydrochloric acid is added dropwise and reacted at room temperature. The mixture is heated to dehydrate and polycondense. After the reaction is completed, the mixture is allowed to stand and separated. The upper liquid is washed with water until neutral. Anhydrous sodium sulfate is added to remove water. Impurities are removed by filtration and the polysiloxane is obtained by vacuum distillation. S22. Polysiloxane, tetrahydrofuran, methacrylic acid and butyl acrylate are added to a reaction vessel under a nitrogen atmosphere, and azobisisobutyronitrile is added to initiate the reaction to obtain an organosilicon emulsion. S23. Alkaline silica sol and organosilicon emulsion are mixed and modified, and then allowed to stand at room temperature to mature to obtain a scratch-resistant coating liquid. The scratch-resistant coating liquid and amine end-curing agent are mixed and sprayed onto the surface of the anti-reflective layer of the touch screen. The mixture is dried at room temperature and then cured by heating to obtain a scratch-resistant coating.

8. A touchscreen with a scratch-resistant coating according to claim 5, characterized in that, The mass ratio of vinyltrimethoxysilane, methyltrimethoxysilane and epoxytrimethoxysilane in S21 is 8.8~9.2:4~4.2:7~7.

3. The amount of hydrochloric acid added is 10~15% of the mass of toluene. The reaction is carried out at room temperature for 10~30 min, and then heated to 60~70℃ for dehydration and polycondensation for 1~2 h.

9. A touchscreen with a scratch-resistant coating according to claim 5, characterized in that, In S22, the mass ratio of polysiloxane, tetrahydrofuran, methacrylic acid, and butyl acrylate is 1~2:300~600:70~80:20~30, and the amount of azobisisobutyronitrile added is 1~1.5% of the total mass of methacrylic acid and butyl acrylate. The reaction is carried out at 75~80℃ for 1~2 hours. In S23, the mass ratio of alkaline silica sol and organosilicon emulsion is 100:5~10. The mixture is allowed to stand at room temperature for 1~2 hours. The amount of amine end-capping curing agent added is 3~6% of the mass of the scratch-resistant coating liquid. The mixture is dried at room temperature for 10~15 minutes and then cured at 120~140℃ for 0.5~1 hours.

Images