Mask pattern verification method and device, electronic equipment, storage medium and program product
By cross-validating the complement values of the mask pattern using multiple tools, the problem of incomplete verification by a single tool is solved, enabling more accurate complement value verification, ensuring the quality of the mask pattern, and improving the manufacturing effect of semiconductor products.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- CHENGDU ZIGUANG SEMICON TECH CO LTD
- Filing Date
- 2024-11-04
- Publication Date
- 2026-05-08
AI Technical Summary
In the existing technology, the verification of the complement of the mask pattern by a single tool is not comprehensive enough, resulting in poor verification accuracy and potentially causing deficiencies in the mask pattern.
At least two tools, each corresponding to a different complement verification strategy, are used to verify the complement of the mask image. Information is extracted using the first tool, and complement verification is performed using the second tool. The rationality of the complement is cross-verified by combining the tool characteristics of the OPC platform and Recipe dissection information.
This improves the accuracy of mask pattern compensation verification, avoids mask pattern deficiencies, and enhances product quality in the semiconductor manufacturing process.
Smart Images
Figure CN121997884A_ABST
Abstract
Description
Technical Field
[0001] This disclosure relates to the field of semiconductor technology, and more specifically, to a method, apparatus, electronic device, storage medium, and program product for verifying mask patterns. Background Technology
[0002] Photomasks are an important part of semiconductor manufacturing technology. By pre-setting patterns on photomasks, the patterns are then transferred from the photomasks to the surface of silicon wafers using photolithography to form semiconductor products that meet the design requirements.
[0003] The pattern design on the photomask can affect the quality of the final semiconductor product. Therefore, pattern verification is usually performed on the designed photomask pattern. Summary of the Invention
[0004] The purpose of this disclosure is to provide a method, apparatus, electronic device, storage medium, and program product for verifying mask patterns. This method, apparatus, electronic device, storage medium, and program product can perform a more comprehensive verification of the complement values of mask patterns, thereby improving the accuracy of the complement value verification of mask patterns.
[0005] To achieve the above objectives, in a first aspect, this disclosure provides a method for verifying a mask pattern, comprising: obtaining a mask pattern and a complement value corresponding to the mask pattern; verifying the complement value corresponding to the mask pattern using at least two tools based on the mask pattern, and obtaining a verification result for the complement value corresponding to the mask pattern, wherein the verification result is used to characterize whether the complement value corresponding to the mask pattern is a reasonable complement value, and the at least two tools correspond to different complement value verification strategies.
[0006] Optionally, the step of verifying the complement value corresponding to the mask image based on the mask image using at least two tools to obtain the verification result of the complement value corresponding to the mask image includes: extracting information based on the mask image using a first tool to obtain graphic information related to the complement value verification; and verifying the complement value corresponding to the mask image using a second tool based on the graphic information, the mask image, the complement value corresponding to the mask image, and the complement value verification strategy corresponding to the second tool to obtain the verification result.
[0007] Optionally, the step of extracting information from the mask pattern using a first tool to obtain graphic information related to complement verification includes: dividing the mask pattern into multiple parts using the first tool to obtain a segmented mask pattern; obtaining a preset parameter set, which includes multiple parameters involved in semiconductor manufacturing processes based on optical proximity correction; and extracting information from the segmented mask pattern using the first tool based on the preset parameter set to obtain graphic information related to complement verification.
[0008] Optionally, the step of verifying the complement value corresponding to the mask image using a second tool based on the graphic information, the mask image, the complement value corresponding to the mask image, and the complement value verification strategy corresponding to the second tool, to obtain the verification result, includes: determining a target image using the second tool based on the mask image and the complement value corresponding to the mask image; verifying the target image using the second tool based on the graphic information and the complement value verification strategy corresponding to the second tool to obtain a target image verification result; and determining the verification result based on the target image verification result.
[0009] Optionally, there are multiple second tools, and different second tools correspond to different complement verification strategies. The verification result includes the verification results corresponding to each of the multiple second tools. The verification method for the mask pattern further includes: if the verification results corresponding to each of the multiple second tools all indicate that the complement value corresponding to the mask pattern is a reasonable complement value, then the final verification result indicates that the complement value corresponding to the mask pattern is a reasonable complement value; if the verification results corresponding to each of the multiple second tools include verification results indicating that the complement value corresponding to the mask pattern is not a reasonable complement value, then the final verification result indicates that the complement value corresponding to the mask pattern is not a reasonable complement value.
[0010] Optionally, the step of verifying the complement value corresponding to the mask pattern using at least two tools to obtain a verification result for the complement value of the mask pattern includes: verifying the complement value corresponding to the mask pattern using a first tool based on the mask pattern and the complement value verification strategy corresponding to the first tool to obtain a first verification result for the complement value of the mask pattern; verifying the complement value corresponding to the mask pattern using a second tool based on the mask pattern and the complement value verification strategy corresponding to the second tool to obtain a second verification result for the complement value of the mask pattern; and determining the final verification result based on the first verification result and the second verification result.
[0011] Optionally, the verification method for the mask pattern further includes: if the verification result indicates that the complement value corresponding to the mask pattern is not a reasonable complement value, the complement value corresponding to the mask pattern is corrected based on the mask pattern using the at least two tools to obtain the corrected complement value, wherein the at least two tools correspond to different complement value correction strategies.
[0012] Secondly, this disclosure provides a verification device for a mask pattern, comprising: an acquisition module configured to acquire a mask pattern and a corresponding complement value of the mask pattern; and a verification module configured to verify the complement value corresponding to the mask pattern using at least two tools based on the mask pattern, thereby obtaining a verification result for the complement value corresponding to the mask pattern, wherein the verification result is used to characterize whether the complement value corresponding to the mask pattern is a reasonable complement value, and the at least two tools correspond to different complement value verification strategies.
[0013] Thirdly, this disclosure provides a computer-readable storage medium having a computer program stored thereon, which, when executed by a processor, implements the mask pattern verification method described in the first aspect.
[0014] Fourthly, this disclosure provides an electronic device, comprising: a memory storing a computer program thereon; and a processor for executing the computer program in the memory to implement the mask pattern verification method described in the first aspect.
[0015] Fifthly, this disclosure provides a computer program product, including a computer program that, when executed by a processor, implements the mask pattern verification method described in the first aspect.
[0016] The above technical solution utilizes at least two tools to verify the complement values corresponding to the mask pattern, thereby verifying the rationality of these complement values. Verification using a single tool cannot provide a comprehensive assessment of the complement values, resulting in poor accuracy and potentially leading to deficiencies in the mask pattern. Therefore, employing at least two tools with corresponding different complement value verification strategies to verify the complement values of the mask pattern allows for a more comprehensive verification, improving the accuracy of complement value verification and preventing deficiencies in the mask pattern.
[0017] Other features and advantages of this disclosure will be described in detail in the following detailed description section. Attached Figure Description
[0018] The accompanying drawings are provided to further illustrate the present disclosure and form part of the specification. They are used together with the following detailed description to explain the present disclosure, but do not constitute a limitation thereof. In the drawings: Figure 1 This is an example diagram illustrating a mask pattern according to an exemplary embodiment.
[0019] Figure 2 This is a flowchart illustrating a method for verifying a mask pattern according to an exemplary embodiment.
[0020] Figure 3 This is a schematic diagram illustrating the extraction of graphic information according to an exemplary embodiment.
[0021] Figure 4 This is a schematic diagram illustrating a graphical verification process according to an exemplary embodiment.
[0022] Figure 5 This is a structural block diagram of a mask pattern verification device according to an exemplary embodiment.
[0023] Figure 6 This is a block diagram illustrating an electronic device according to an exemplary embodiment. Detailed Implementation
[0024] The specific embodiments of this disclosure will be described in detail below with reference to the accompanying drawings. It should be understood that the specific embodiments described herein are for illustration and explanation only and are not intended to limit this disclosure.
[0025] In this disclosure, unless otherwise stated, directional terms such as "up," "down," "left," "right," "front," and "back" are used only for the convenience of describing this disclosure and for simplifying the description, and are not intended to indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this disclosure.
[0026] In semiconductor manufacturing, photolithography is often involved. Photolithography involves photomasks. Patterns are pre-set on the photomasks, and then photolithography is used to transfer the patterns from the photomasks to the surface of the silicon wafer to form a semiconductor product that meets the design requirements.
[0027] It is evident that the pattern design on the photomask can affect the quality of the final semiconductor product. Therefore, pattern verification is typically performed on the designed photomask pattern. This image verification can identify and correct any defects in the pattern, thereby ensuring the effective application of the photomask pattern in semiconductor manufacturing and ensuring that the final manufactured semiconductor product meets the corresponding product requirements.
[0028] It is understandable that this image verification step can be performed during the mask design process, without involving specific semiconductor manufacturing processes.
[0029] Regarding the verification of mask images, it involves the main images of the mask, which are further divided into regular images and complementary values.
[0030] Figure 1 This is an example diagram illustrating a mask pattern according to an exemplary embodiment, such as... Figure 1 As shown, this involves conventional patterns and complements. Complements can be considered a supplement to conventional patterns and can be used in subsequent semiconductor manufacturing processes.
[0031] In related technologies, the complement of the main pattern of a photomask can be monitored using conventional patterns; that is, the main pattern is checked by inspecting conventional patterns. However, in actual products, there are many combinations of patterns. If only conventional patterns are inspected, there will be some deficiencies. When software or hardware problems occur, the missing parts of the conventional image are not easily detected.
[0032] Based on this, this disclosure provides a technical solution. In this solution, considering that a single tool cannot comprehensively verify the complement values, resulting in poor accuracy of the verification results, the mask pattern may have deficiencies. Therefore, by using at least two tools with different complement verification strategies to verify the complement values of the mask pattern, a more comprehensive verification of the complement values can be achieved, improving the accuracy of the complement value verification and thus avoiding deficiencies in the mask pattern.
[0033] In semiconductor manufacturing, as design dimensions continue to shrink, they become close to or smaller than the wavelength of light used in the photolithography process. The diffraction and interference effects of light become increasingly pronounced, causing severe distortion of the actual photolithographic pattern relative to the pattern on the mask. Ultimately, the actual pattern formed on the silicon wafer by photolithography becomes different from the design pattern. This phenomenon is known as the optical proximity effect.
[0034] Therefore, semiconductor manufacturing processes also involve OPC (Optical Proximity Correction) technology. OPC is an etching enhancement technique mainly used in the production process of semiconductor devices to ensure that the edges of the designed patterns are completely etched during production. Thus, the etching step can be achieved using OPC technology.
[0035] It can be seen that the mask pattern is crucial for the implementation of OPC technology. Therefore, the verification of the mask pattern can be implemented by the OPC platform, which can be understood as the hardware or software platform required to implement OPC technology. Thus, the technical solution of this disclosure embodiment can be applied to the OPC platform.
[0036] Figure 2This is a flowchart illustrating a method for verifying a mask pattern according to an exemplary embodiment, such as... Figure 2 As shown, the verification method includes the following steps: Step S21: Obtain the mask image and the corresponding complement value of the mask image.
[0037] Step S22: Using at least two tools, the complement value corresponding to the mask pattern is verified to obtain the verification result of the complement value corresponding to the mask pattern. The verification result is used to characterize whether the complement value corresponding to the mask pattern is a reasonable complement value. The at least two tools correspond to different complement value verification strategies.
[0038] In step S21, the complement values corresponding to the mask image and the mask graphic can be pre-designed in the OPC platform, so they can be directly obtained from the OPC platform.
[0039] The OPC platform allows the configuration of various tools, each with different features. Depending on these features, the corresponding graphical verification methods also differ.
[0040] Therefore, in step S22, at least two tools in the OPC platform can be used to verify the complement value corresponding to the mask image based on the mask image, and the verification result of the complement value corresponding to the mask image can be obtained.
[0041] In some embodiments, in addition to the OPC platform, other platforms for graphical verification can be configured. In this implementation, at least two tools can belong to different platforms.
[0042] Therefore, at least two tools may belong to one platform or different platforms, and this disclosure does not limit them.
[0043] At least two tools are required, which can be detection software or programs, each corresponding to different complementation verification strategies. The complementation verification strategy determines the complementation verification logic of the corresponding tool; for example, detection based on a standard graph, detection based on complementation values, or detection based on the main graph. Furthermore, the detection methods can also differ, for example, by using different detection parameters or different detection standards.
[0044] The verification result is used to characterize whether the compensation value corresponding to the mask pattern is a reasonable compensation value. A reasonable compensation value can be understood as a compensation value that will not cause deficiencies in the main pattern. This compensation value may be unreasonable in size or position, etc. Specifically, the criteria for judging whether it is reasonable can be defined by the OPC Recipe dissection.
[0045] A recipe refers to a set of parameters that guide equipment in performing specific process operations, including temperature, pressure, and time. This concept is crucial in the semiconductor industry because it directly impacts product quality and production efficiency. Recipe verification is a critical step, involving every step and condition in the semiconductor manufacturing process to ensure the correct execution of semiconductor processes. Simply put, when a wafer enters the processing equipment, the specific steps provided by the equipment and the conditions required for each step constitute the recipe. This includes specific parameters such as the reaction chamber the wafer passes through after entering the equipment, the gases used, and their flow rates. Therefore, a recipe is not only a technical guide in the semiconductor manufacturing process but also a key factor in ensuring product quality and production efficiency.
[0046] Dissection, in the context of OPC (Optical Proximity Coding) processes, refers to the operation of resolving and moving corners of a mask pattern. The corners of the mask can be resolved into multiple segments, which are then moved and arranged to improve optical proximity. This process aims to optimize the mask design to ensure accurate replication onto the silicon wafer during photolithography, thereby improving the precision and reliability of integrated circuits.
[0047] Therefore, based on the relevant information defined in the OPC Recipe dissection, the validity of the complement value can be verified.
[0048] Therefore, as an optional implementation, step S22 includes: extracting information based on the mask image using a first tool to obtain graphic information related to the complement verification; verifying the complement value corresponding to the mask image using a second tool based on the graphic information, the mask image, the complement value corresponding to the mask image, and the complement verification strategy corresponding to the second tool, to obtain the verification result.
[0049] In this implementation, information is extracted using a first tool, which may not perform verification, and then a second tool performs value verification based on the extracted information.
[0050] In some embodiments, the first tool can be a tool in the OPC platform. Since the OPC platform defines OPCRecipe dissection-related information, the first tool can accurately extract information related to complement verification.
[0051] In some embodiments, information extraction based on a mask pattern using a first tool to obtain graphic information related to complement verification includes: dividing the mask pattern into multiple parts using the first tool to obtain a segmented mask pattern; obtaining a preset parameter set, which includes multiple parameters involved in the semiconductor manufacturing process based on optical proximity correction; and extracting information from the segmented mask pattern using the first tool based on the preset parameter set to obtain graphic information related to complement verification.
[0052] In some embodiments, the segmented mask pattern can be understood as a mask pattern with segmentation information.
[0053] In some embodiments, the preset parameter set can be understood as a set of parameters composed of OPC Recipe dissection related information. Therefore, the preset parameter set includes multiple parameters involved in the semiconductor manufacturing process based on optical proximity correction.
[0054] In some embodiments, information is extracted based on OPC Recipe dissection related information to obtain graphical information related to the complement value.
[0055] It is understandable that the preset parameter set can define multiple parameter items and reasonable parameter values for multiple parameter items. For the first tool, it can extract the corresponding graphic information according to multiple parameter items. Then, the second tool uses the extracted graphic information to perform graphic verification.
[0056] Figure 3 This is a schematic diagram illustrating the extraction of graphic information according to an exemplary embodiment, such as... Figure 3 As shown, the original graphic is divided into multiple parts, and then the corresponding information is extracted from each part, such as size, compensation value and blank area width. These are detailed settings in OPC, and you can refer to the mature OPC technology in this field for details. They will not be described in detail here.
[0057] After obtaining the graphic information related to the complement verification, the first tool can synchronize this information to the second tool, so that the second tool can perform graphic verification based on the graphic information, the mask graphic, the complement value corresponding to the mask graphic, and the complement verification strategy corresponding to the second tool.
[0058] In some embodiments, the verification of the complement value corresponding to the mask image using a second tool based on graphic information, the mask image, the complement value corresponding to the mask image, and the complement value verification strategy of the second tool, to obtain a verification result, may include: determining the target image using the second tool based on the mask image and the complement value corresponding to the mask image; verifying the target image using the second tool based on the graphic information and the complement value verification strategy of the second tool, to obtain a target image verification result; and determining the verification result based on the target image verification result.
[0059] In this implementation, the second tool processes the mask image according to the complement value corresponding to the mask image to obtain the target image, i.e., the actual image. Then, the actual image is verified using the image information and the corresponding complement value verification strategy, and the verification result of the complement value is determined based on the verification result of the actual image.
[0060] For example, the complementation verification strategy can be: determine whether the graphic information is consistent with the corresponding information of the target graphic, that is, the graphic information is used as reference information and the corresponding information of the target image is used as the information to be verified. If the two are consistent, it proves that the target graphic verification is passed (there is no defect); if the two are inconsistent, it proves that the target graphic verification is failed (there is a defect).
[0061] The complement verification strategy presented here is just an example. In practical applications, other complement verification strategies can also be used.
[0062] Furthermore, if the target image passes verification, it means the complement value is a reasonable complement value. If the target image fails verification, it means the complement value is not a reasonable complement value.
[0063] In some embodiments, there can be multiple second tools, each corresponding to a different complement verification strategy, while there can be only one first tool. Therefore, the verification result can include the verification results corresponding to each of the multiple second tools.
[0064] Furthermore, the verification method for the mask pattern may further include: if the verification results corresponding to multiple second tools all indicate that the complement value corresponding to the mask pattern is a reasonable complement value, then the final verification result indicates that the complement value corresponding to the mask pattern is a reasonable complement value; if the verification results corresponding to multiple second tools include verification results indicating that the complement value corresponding to the mask pattern is not a reasonable complement value, then the final verification result indicates that the complement value corresponding to the mask pattern is not a reasonable complement value.
[0065] In this implementation, the verification results of multiple second tools are integrated. Only when all multiple second tools determine that the complement value corresponding to the mask pattern is a reasonable complement value can the final verification result characterize the complement value corresponding to the mask pattern as a reasonable complement value. Otherwise, the final verification result characterizes the complement value corresponding to the mask pattern as an unreasonable complement value.
[0066] Figure 4 This is a schematic diagram illustrating a graphical verification process according to an exemplary embodiment, such as... Figure 4 As shown, the mask image is first obtained, and then the OPC platform tool extracts the OPC Recipe dissection information. Next, this information is integrated into another tool platform for a validity check. For a segmented graphic portion, CD represents the size, and SP represents the width of the blank area. Finally, after the validity check, the approximation of the graphic's padding values can be verified. It can be seen that in cases of invalidation, a portion of the padding value is missing, resulting in deficiencies in the final graphic, requiring correction.
[0067] This implementation method allows for cross-validation by leveraging the characteristics of different tool platforms, and can also improve the final product quality.
[0068] In some embodiments, step S22 may include: verifying the complement value corresponding to the mask pattern using a first tool based on the mask pattern and the complement value verification strategy corresponding to the first tool, to obtain a first verification result of the complement value corresponding to the mask pattern; verifying the complement value corresponding to the mask pattern using a second tool based on the mask pattern and the complement value verification strategy corresponding to the second tool, to obtain a second verification result of the complement value corresponding to the mask pattern; and determining the final verification result based on the first verification result and the second verification result.
[0069] In this implementation, the first tool and the second tool each verify the complement values corresponding to the mask pattern according to their respective complement verification strategies to obtain their respective verification results, namely the first verification result and the second verification result. Then, the first verification result and the second verification result are integrated to obtain the final verification result.
[0070] In some embodiments, the specific methods by which the first tool and the second tool perform verification using their respective complementation verification strategies can be referred to in the foregoing embodiments or to mature complementation verification methods in the field, and will not be described in detail here.
[0071] In some embodiments, the complement value can be corrected after the verification result is obtained.
[0072] Therefore, as an optional implementation, the verification method further includes: if the verification result indicates that the complement value corresponding to the mask pattern is not a reasonable complement value, the complement value corresponding to the mask pattern is corrected based on the mask pattern using at least two tools to obtain the corrected complement value, wherein the at least two tools correspond to different complement value correction strategies.
[0073] In this implementation, at least two tools, in addition to their graphical verification capabilities, also possess graphical correction capabilities. Therefore, corrections can be made using at least two tools.
[0074] In some embodiments, if at least two tools do not have graphic correction capabilities, graphic correction can also be performed using at least two other tools that do have graphic correction capabilities.
[0075] In some embodiments, the complementation correction strategies of at least two tools can be compared to determine the accuracy of the complementation correction strategies. Then, the tool with the lower accuracy of its complementation correction strategy performs the correction first, followed by the tool with the higher accuracy. The accuracy of the complementation correction strategy can be pre-configured information that can be directly obtained; alternatively, it can be determined by comparing relevant information such as strategy complexity and strategy execution difficulty. For example, higher strategy complexity generally corresponds to higher accuracy, as does higher strategy execution difficulty.
[0076] In some embodiments, by verifying and correcting the mask pattern, defects or deficiencies in the mask pattern can be compensated for, thereby resulting in better quality semiconductor products obtained when semiconductor manufacturing is carried out based on the mask pattern.
[0077] Through the above embodiments, this disclosure utilizes at least two tools to verify the complement values corresponding to a mask pattern, based on the mask pattern itself, to verify the rationality of these complement values. Verification using a single tool cannot provide a comprehensive assessment of the complement values, resulting in poor accuracy and potentially leading to deficiencies in the mask pattern. Therefore, by employing at least two tools with different complement value verification strategies to verify the complement values of the mask pattern, a more comprehensive verification can be achieved, improving the accuracy of complement value verification and thus preventing deficiencies in the mask pattern.
[0078] Figure 5 This is a structural block diagram of a mask pattern verification device 500 according to an exemplary embodiment, such as... Figure 5 As shown, the device includes: The acquisition module 501 is configured to acquire the mask pattern and the corresponding complement value of the mask pattern.
[0079] The verification module 502 is configured to verify the complement value corresponding to the mask pattern based on the mask pattern using at least two tools, and obtain the verification result of the complement value corresponding to the mask pattern. The verification result is used to characterize whether the complement value corresponding to the mask pattern is a reasonable complement value. The at least two tools correspond to different complement value verification strategies.
[0080] Optionally, the verification module 502 is further configured to: extract information based on the mask image using a first tool to obtain graphic information related to the complement verification; and verify the complement value corresponding to the mask image using a second tool based on the graphic information, the mask image, the complement value corresponding to the mask image, and the complement verification strategy corresponding to the second tool to obtain the verification result.
[0081] Optionally, the verification module 502 is further configured to: extract information based on the mask pattern using a first tool to obtain graphic information related to complement verification, including: dividing the mask pattern into multiple parts using the first tool to obtain a segmented mask pattern; obtaining a preset parameter set, the preset parameter set including multiple parameters involved in the semiconductor manufacturing process based on optical proximity correction; and extracting information from the segmented mask pattern using the first tool based on the preset parameter set to obtain graphic information related to complement verification.
[0082] Optionally, the verification module 502 is further configured to: determine a target graphic based on the mask graphic and the complement value corresponding to the mask graphic using the second tool; verify the target graphic based on the graphic information and the complement value verification strategy corresponding to the second tool using the second tool to obtain a target graphic verification result; and determine the verification result based on the target graphic verification result.
[0083] Optionally, there are multiple second tools, and different second tools correspond to different complement verification strategies. The verification module 502 is further configured to: if the verification results corresponding to the multiple second tools all indicate that the complement value corresponding to the mask pattern is a reasonable complement value, determine that the final verification result indicates that the complement value corresponding to the mask pattern is a reasonable complement value; if the verification results corresponding to the multiple second tools include verification results indicating that the complement value corresponding to the mask pattern is not a reasonable complement value, determine that the final verification result indicates that the complement value corresponding to the mask pattern is not a reasonable complement value.
[0084] Optionally, the verification module 502 is further configured to: if the verification results corresponding to the plurality of second tools all indicate that the complement value corresponding to the mask pattern is a reasonable complement value, determine that the final verification result indicates that the complement value corresponding to the mask pattern is a reasonable complement value; if the verification results corresponding to the plurality of second tools include verification results indicating that the complement value corresponding to the mask pattern is not a reasonable complement value, determine that the final verification result indicates that the complement value corresponding to the mask pattern is not a reasonable complement value.
[0085] Optionally, the verification module 502 is further configured to: verify the complement value corresponding to the mask pattern using a first tool based on the mask pattern and the complement value verification strategy corresponding to the first tool, to obtain a first verification result of the complement value corresponding to the mask pattern; verify the complement value corresponding to the mask pattern using a second tool based on the mask pattern and the complement value verification strategy corresponding to the second tool, to obtain a second verification result of the complement value corresponding to the mask pattern; and determine the final verification result based on the first verification result and the second verification result.
[0086] Optionally, the verification module 502 is further configured to: if the verification result indicates that the complement value corresponding to the mask pattern is not a reasonable complement value, correct the complement value corresponding to the mask pattern based on the mask pattern using the at least two tools to obtain the corrected complement value, wherein the at least two tools correspond to different complement value correction strategies.
[0087] Regarding the apparatus in the above embodiments, the specific manner in which each module performs its operation has been described in detail in the embodiments related to the method, and will not be elaborated upon here.
[0088] Figure 6 This is a block diagram illustrating an electronic device 600 according to an exemplary embodiment. For example... Figure 6 As shown, the electronic device 600 may include a processor 601 and a memory 602. The electronic device 600 may also include one or more of a multimedia component 603, an input / output (I / O) interface 604, and a communication component 605.
[0089] The processor 601 controls the overall operation of the electronic device 600 to complete all or part of the steps in the mask pattern verification method described above. The memory 602 stores various types of data to support the operation of the electronic device 600. This data may include, for example, instructions for any application or method operating on the electronic device 600, and application-related data such as contact data, sent and received messages, images, audio, video, etc. The memory 602 can be implemented by any type of volatile or non-volatile storage device or a combination thereof, such as Static Random Access Memory (SRAM), Electrically Erasable Programmable Read-Only Memory (EEPROM), Erasable Programmable Read-Only Memory (EPROM), Programmable Read-Only Memory (PROM), Read-Only Memory (ROM), magnetic storage, flash memory, magnetic disk, or optical disk. The multimedia component 603 may include a screen and audio components. The screen may be, for example, a touchscreen, and the audio component is used to output and / or input audio signals. For example, the audio component may include a microphone for receiving external audio signals. The received audio signals may be further stored in memory 602 or transmitted via communication component 605. The audio component also includes at least one speaker for outputting audio signals. I / O interface 604 provides an interface between processor 601 and other interface modules, such as a keyboard, mouse, buttons, etc. These buttons may be virtual or physical buttons. Communication component 605 is used for wired or wireless communication between the electronic device 600 and other devices. Wireless communication may include Wi-Fi, Bluetooth, Near Field Communication (NFC), 2G, 3G, or 4G, or a combination thereof; therefore, the corresponding communication component 605 may include a Wi-Fi module, a Bluetooth module, or an NFC module.
[0090] In an exemplary embodiment, the electronic device 600 may be implemented by one or more application-specific integrated circuits (ASICs), digital signal processors (DSPs), digital signal processing devices (DSPDs), programmable logic devices (PLDs), field-programmable gate arrays (FPGAs), controllers, microcontrollers, microprocessors, or other electronic components to perform the mask pattern verification method described above.
[0091] In another exemplary embodiment, a computer-readable storage medium including program instructions is also provided, which, when executed by a processor, implement the steps of the mask pattern verification method described above. For example, the computer-readable storage medium may be the memory 602 including the program instructions described above, which may be executed by the processor 601 of the electronic device 600 to complete the mask pattern verification method described above.
[0092] In another exemplary embodiment, a computer program product is also provided, which includes a computer program executable by a processor, which, when executed by the processor, implements the steps of the above-described mask pattern verification method.
[0093] The preferred embodiments of this disclosure have been described in detail above with reference to the accompanying drawings. However, this disclosure is not limited to the specific details of the above embodiments. Within the scope of the technical concept of this disclosure, various simple modifications can be made to the technical solutions of this disclosure, and these simple modifications all fall within the protection scope of this disclosure.
[0094] It should also be noted that the various specific technical features described in the above specific embodiments can be combined in any suitable manner without contradiction. In order to avoid unnecessary repetition, this disclosure will not describe the various possible combinations separately.
[0095] Furthermore, various different embodiments of this disclosure can be combined in any way, as long as they do not violate the spirit of this disclosure, they should also be regarded as the content disclosed in this disclosure.
Claims
1. A method for verifying a mask pattern, characterized in that, include: Obtain the mask image and the corresponding complement value of the mask image; The complement value corresponding to the mask pattern is verified using at least two tools to obtain the verification result of the complement value corresponding to the mask pattern. The verification result is used to characterize whether the complement value corresponding to the mask pattern is a reasonable complement value. The at least two tools correspond to different complement value verification strategies.
2. The method for verifying mask patterns according to claim 1, characterized in that, The step of verifying the complement value corresponding to the mask image using at least two tools to obtain the verification result of the complement value corresponding to the mask image includes: The first tool is used to extract information based on the mask image to obtain graphic information related to the complement verification. The second tool verifies the complement value corresponding to the mask image based on the graphic information, the mask image, the complement value corresponding to the mask image, and the complement value verification strategy corresponding to the second tool, and obtains the verification result.
3. The method for verifying mask patterns according to claim 2, characterized in that, The step of extracting information based on the mask image using the first tool to obtain graphic information related to the complement verification includes: The first tool is used to cut the mask pattern into multiple parts to obtain the cut mask pattern; Obtain a preset parameter set, which includes multiple parameters involved in the semiconductor manufacturing process based on optical proximity correction; The first tool extracts information from the segmented mask image based on the preset parameter set to obtain graphic information related to the complement verification.
4. The method for verifying mask patterns according to claim 2 or 3, characterized in that, The verification of the complement value corresponding to the mask image using a second tool based on the graphic information, the mask image, the complement value corresponding to the mask image, and the complement value verification strategy corresponding to the second tool, to obtain the verification result, includes: The second tool is used to determine the target image based on the mask image and the corresponding complement value of the mask image; The target graphic is verified using the second tool based on the graphic information and the corresponding complement verification strategy of the second tool, and the target graphic verification result is obtained. The verification result is determined based on the verification result of the target image.
5. The method for verifying a mask pattern according to claim 2, characterized in that, The number of the second tools is multiple, and different second tools correspond to different value complementation verification strategies. The verification result includes the verification results corresponding to each of the multiple second tools. The verification method for the mask pattern also includes: If the verification results corresponding to the plurality of second tools all indicate that the complement value corresponding to the mask pattern is a reasonable complement value, then the final verification result indicates that the complement value corresponding to the mask pattern is a reasonable complement value. If the verification results corresponding to the plurality of second tools include verification results indicating that the complement value corresponding to the mask pattern is not a reasonable complement value, the final verification result is determined to indicate that the complement value corresponding to the mask pattern is not a reasonable complement value.
6. The method for verifying a mask pattern according to claim 1, characterized in that, The step of verifying the complement value corresponding to the mask image using at least two tools to obtain the verification result of the complement value corresponding to the mask image includes: The first tool verifies the complement value corresponding to the mask pattern based on the mask pattern and the complement value verification strategy corresponding to the first tool, and obtains the first verification result of the complement value corresponding to the mask pattern. The second tool verifies the complement value corresponding to the mask pattern based on the mask pattern and the complement value verification strategy corresponding to the second tool, and obtains the second verification result of the complement value corresponding to the mask pattern. Based on the first verification result and the second verification result, the final verification result is determined.
7. The method for verifying a mask pattern according to claim 1, characterized in that, The verification method for the mask pattern also includes: If the verification result indicates that the complement value corresponding to the mask pattern is not a reasonable complement value, the complement value corresponding to the mask pattern is corrected based on the mask pattern using at least two tools to obtain a corrected complement value. The at least two tools correspond to different complement value correction strategies.
8. A verification device for a mask pattern, characterized in that, include: The acquisition module is configured to acquire the mask image and the corresponding complement value of the mask image; The verification module is configured to verify the complement value corresponding to the mask pattern based on the mask pattern using at least two tools, and obtain the verification result of the complement value corresponding to the mask pattern. The verification result is used to characterize whether the complement value corresponding to the mask pattern is a reasonable complement value. The at least two tools correspond to different complement value verification strategies.
9. A computer-readable storage medium having a computer program stored thereon, characterized in that, When executed by a processor, the program implements the method for verifying the mask pattern as described in any one of claims 1 to 7.
10. An electronic device, characterized in that, include: A memory on which computer programs are stored; A processor for executing the computer program in the memory to implement the method for verifying the mask pattern according to any one of claims 1 to 7.
11. A computer program product, comprising a computer program, characterized in that, When executed by a processor, the computer program implements the method for verifying the mask pattern as described in any one of claims 1 to 7.