Glass ceramic and forming method thereof, glass ceramic product and electronic equipment

Abstract

The embodiment of the invention relates to the technical field of microcrystalline glass, in particular to microcrystalline glass, a forming method thereof, a microcrystalline glass product and electronic equipment. Wherein the microcrystalline glass comprises a plurality of grooves and a plurality of convex parts, a convex part is formed in an area between any two adjacent grooves, and a groove is formed in an area between any two adjacent convex parts. The surface of each convex portion is a smooth surface, and the arithmetic average roughness of the surface of each convex portion is 1.5 nm or less. The haze of the microcrystalline glass is less than or equal to 1%, the transmittance of the microcrystalline glass to light with the wavelength of 550 nm is greater than or equal to 89%, and the mass ratio of a crystal phase of the microcrystalline glass in the microcrystalline glass is greater than or equal to 30%. As the surfaces of the convex parts are smooth surfaces and have relatively small arithmetic mean roughness, the microcrystalline glass provided by the invention has relatively small haze and relatively high transmittance, is relatively bright in vision and good in visual effect, and the microcrystalline glass is relatively high in crystal phase content, can give consideration to good mechanical properties and is wide in application range.

Description

Technical Field

[0001] This application relates to the field of microcrystalline glass technology, and more particularly to a microcrystalline glass and its forming method, microcrystalline glass articles and electronic devices. Background Technology

[0002] By subjecting the base glass (or "ordinary glass") to specific heat treatment, glass-ceramics can be obtained. Glass-ceramics include a crystalline phase and a glassy phase (or "amorphous phase"), which gives them superior mechanical properties. Therefore, glass-ceramics are widely used in electronic devices such as mobile phones, watches, or tablets.

[0003] Currently, it is possible to etch microcrystalline glass to create micron-scale uneven structures on it. These uneven structures form a fine texture, giving the microcrystalline glass a decorative function while also providing unique light and shadow effects and a tactile feel. However, current textured microcrystalline glass suffers from problems such as light and shadow pitting and breakpoints, resulting in unsatisfactory visual effects. Summary of the Invention

[0004] To address the aforementioned problems, this application provides an electronic device. The electronic device provided by this application will be described below, and the following multiple beneficial effects can be combined with each other.

[0005] In a first aspect, embodiments of this application provide a microcrystalline glass, comprising multiple grooves and multiple protrusions, wherein a protrusion is formed in the region between any two adjacent grooves, and a groove is formed in the region between any two adjacent protrusions. The surface of the protrusion is a smooth surface, and the arithmetic mean roughness of the surface of the protrusion is less than or equal to 1.5 nm. The haze of the microcrystalline glass is less than or equal to 1%, the transmittance of the microcrystalline glass to light with a wavelength of 550 nm is greater than or equal to 89%, and the mass percentage of the crystalline phase in the microcrystalline glass is greater than or equal to 30%.

[0006] The aforementioned microcrystalline glass has a smooth surface on its convex portion, and this surface has a low arithmetic mean roughness. Therefore, the microcrystalline glass provided in this application has low haze and high transmittance, making it visually brighter and further enhancing its visual effect. Furthermore, the microcrystalline glass has a high crystalline phase content, which allows it to maintain good mechanical properties and broaden its application range.

[0007] In one possible implementation of the first aspect described above, the parameters of the glass-ceramic shall at least satisfy one of the following: the arithmetic mean roughness of the surface of the protrusion is preferably 0.5 nm to 1 nm, preferably 0.5 nm to 0.7 nm, preferably 0.3 nm to 0.7 nm, or preferably 0.3 nm to 1.2 nm; the haze of the glass-ceramic is preferably 0.18% to 0.32%, preferably 0.2% to 0.5%, preferably 0.5% to 0.6%, preferably 0.5% to 0.9%; the transmittance of the glass-ceramic to light with a wavelength of 550 nm is preferably 89.5% to 91.5%, preferably 89.8% to 91.2%, preferably 90.2% to 91.5%, preferably 90.5% to 91.5%; and the mass percentage of the crystalline phase in the glass-ceramic is preferably 30% to 40%, preferably 40% to 50%, preferably 75% to 80%, preferably 85% to 92%.

[0008] According to the embodiments of this application, the arithmetic mean roughness of the surface of the protrusion is preferably 0.5nm to 1nm, preferably 0.5nm to 0.7nm, preferably 0.3nm to 0.7nm, or preferably 0.3nm to 1.2nm. In this way, the surface of the protrusion can be smoother and more rounded, thereby giving the microcrystalline glass a good visual effect.

[0009] The haze of the microcrystalline glass is preferably 0.18% to 0.32%, more preferably 0.2% to 0.5%, more preferably 0.5% to 0.6%, and more preferably 0.5% to 0.9%. This gives the microcrystalline glass good transparency and excellent visual effect.

[0010] The transmittance of microcrystalline glass to light with a wavelength of 550nm is preferably 89.5% to 91.5%, more preferably 89.8% to 91.2%, more preferably 90.2% to 91.5%, and even more preferably 90.5% to 91.5%. This makes the microcrystalline glass more transparent and provides a better visual effect.

[0011] The preferred mass percentage of the crystalline phase in the glass-ceramic is 30% to 40%, more preferably 40% to 50%, more preferably 75% to 80%, and more preferably 85% to 92%. This allows the glass-ceramic to maintain good mechanical properties and has a wider range of applications.

[0012] In one possible implementation of the first aspect described above, the main crystalline phase of the glass-ceramic includes at least one of lithium disilicate, petalite, lithium silicate, quartz, quartz solid solution, spinel, sodium nepheline, potassium nepheline, cordierite, and zirconium oxide.

[0013] In one possible implementation of the first aspect described above, the glass-ceramic comprises the following components in weight percentages: lithium oxide: 5% to 15%; silicon dioxide: 50% to 78%; aluminum oxide: 4% to 15%; phosphorus pentoxide: 1% to 5%; zirconium dioxide: 2% to 10%; sodium oxide: 0% to 5%; potassium oxide: 0% to 5%; boron trioxide: 0% to 5%; and the remaining components: 0% to 5%.

[0014] In one possible implementation of the first aspect described above, the composition of the glass-ceramic satisfies at least one of the following: the mass percentage of lithium oxide is preferably 8% to 15%, more preferably 9% to 14%, even more preferably 10% to 13%, and further preferably 11% to 12%; the mass percentage of silicon dioxide is preferably 60% to 75%, more preferably 62% to 73%, even more preferably 65% ​​to 70%, and further preferably 66% to 68%; the mass percentage of aluminum oxide is preferably 4% to 12%, more preferably 4% to 10%, even more preferably 4% to 8%, and further preferably 4% to 7%; the mass percentage of phosphorus pentoxide is preferably 1% to 4%, more preferably 1% to 3%, even more preferably 1% to 2%, and further preferably... The mass percentage of zirconium dioxide is preferably 2% to 9%, more preferably 3% to 8%, more preferably 4% to 8%, and even more preferably 4% to 7%; the mass percentage of sodium oxide is preferably 0% to 4%, more preferably 0% to 3%, more preferably 0% to 2%, and even more preferably 0% to 1%; the mass percentage of potassium oxide is preferably 0% to 4%, more preferably 0% to 3%, more preferably 0% to 2% or 0% to 1%; the mass percentage of boron trioxide is preferably 0% to 4%, more preferably 0% to 3%, more preferably 0% to 2%, and even more preferably 0% to 1%; the mass percentage of the remaining components is preferably 0% to 4%, more preferably 0% to 3%, more preferably 0% to 2%, and even more preferably 0% to 1%.

[0015] In one possible implementation of the first aspect described above, the remaining components include titanium dioxide.

[0016] In one possible implementation of the first aspect described above, the maximum height roughness of the convex surface is less than 100 nm. Thus, microscopically, the surface of the convex portion can be a flat surface; macroscopically, it can effectively improve the problems of light and shadow pitting and breakpoints, thereby enabling the microcrystalline glass to have good visual effects.

[0017] For example, the maximum height roughness of the convex surface can be 0.5 nm to 60 nm, 0.5 nm to 40 nm, 0.5 nm to 20 nm, or 0.5 nm to 10 nm.

[0018] In one possible implementation of the first aspect described above, the surface of the trench is a smooth surface, and the arithmetic mean roughness of the trench surface is less than or equal to 1.5 nm. This allows the glass-ceramic to emit a smooth and continuous light source under point or surface light sources, thereby further enhancing the visual effect of the glass-ceramic.

[0019] For example, the arithmetic mean roughness of the trench surface can be 0.5 nm to 1 nm, 0.5 nm to 0.7 nm, 0.3 nm to 0.7 nm, or 0.3 nm to 1.2 nm.

[0020] In one possible implementation of the first aspect described above, the maximum height roughness of the trench surface is less than 100 nm. Thus, microscopically, the trench surface can be a smooth surface; macroscopically, it can effectively improve the problems of light and shadow pitting and breakpoints, thereby enabling the microcrystalline glass to have good visual effects.

[0021] For example, the maximum height roughness of the trench surface can be 0.5 nm to 60 nm, 0.5 nm to 40 nm, 0.5 nm to 20 nm, or 0.5 nm to 10 nm.

[0022] In one possible implementation of the first aspect described above, the light and shadow on the microcrystalline glass are smooth and continuous under point or surface light sources, thus giving the microcrystalline glass a good visual effect.

[0023] In one possible implementation of the first aspect described above, the dimensions of the glass-ceramic satisfy at least one of the following: the ratio between the average width of the trench and the depth of the trench is 10 to 500 in the cross-section of the trench, and the cross-section of the trench is perpendicular to the extension direction of the trench; the ratio between the average width of the trench and the average width of the protrusion is 0.1 to 10; the depth of the trench is 0.1 μm to 30 μm; the average width of the trench is greater than or equal to 10 μm; and the average width of the protrusion is greater than or equal to 10 μm.

[0024] This helps to create smooth convex and / or grooved surfaces, and the uneven structure formed by the convex and grooved surfaces can also be more aesthetically pleasing and symmetrical.

[0025] In one possible implementation of the first aspect described above, the dimensions of the glass-ceramic satisfy at least one of the following: the ratio between the average width of the trench and the depth of the trench is 20 to 50, 10 to 30, 10 to 50, or 50 to 100 in the cross-section of the trench, and the cross-section of the trench is perpendicular to the extension direction of the trench; the ratio between the average width of the trench and the average width of the protrusion is 1 to 5, 5 to 7, 7 to 9, or 7 to 10; the depth of the trench is 1 μm to 5 μm, 3 μm to 5 μm, 4 μm to 10 μm, or 10 μm to 20 μm; the average width of the trench is 10 μm to 50 μm, 50 μm to 150 μm, 100 μm to 200 μm, or 100 μm to 300 μm; and the average width of the protrusion is 10 μm to 50 μm, 50 μm to 150 μm, 100 μm to 200 μm, or 100 μm to 300 μm.

[0026] This further helps to create smooth convex and / or groove surfaces, while also enhancing the aesthetics and uniformity of the convex and groove structure.

[0027] In one possible implementation of the first aspect described above, the surface of the protrusion includes a first side surface and a second side surface, the first side surface and the second side surface are disposed opposite to each other along the width direction of the protrusion, and the distance between the first side surface and the second side surface gradually decreases along the protrusion direction of the protrusion.

[0028] In one possible implementation of the first aspect described above, the first side surface and the second side surface are inclined surfaces that are tilted in the direction of the convexity of the opposing convex portion. In this way, the first side surface and the second side surface can reflect light better, thereby making the microcrystalline glass more visually radiant and producing a better visual effect.

[0029] In one possible implementation of the first aspect described above, the angle between the first side surface and the convex direction of the protrusion is 5° to 45°, and / or, the angle between the second side surface and the convex direction of the protrusion is 5° to 45°. This can further enhance the visual effect of the microcrystalline glass.

[0030] For example, the angle between the first side surface and the protruding direction of the protrusion can be 15° to 30°, 10° to 20°, 5° to 15°, or 7° to 15°, etc. Similarly, the angle between the second side surface and the protruding direction of the protrusion can be 15° to 30°, 10° to 20°, 5° to 15°, or 7° to 15°, etc.

[0031] In one possible implementation of the first aspect described above, the surface of the protrusion includes a top surface that connects the first side surface and the second side surface, and the top surface is a curved surface that protrudes along the protrusion direction of the protrusion. Thus, the surface of the protrusion is generally similar to a semi-curved smooth surface, thereby the shape of the cross-section of the protrusion can be generally similar to a semi-curved shape.

[0032] In one possible implementation of the first aspect described above, the surface of the trench includes a bottom surface that connects a first side surface of a protrusion adjacent to the trench and a second side surface of another protrusion adjacent to the trench. The bottom surface is a curved surface that protrudes in the opposite direction to the protrusion direction of the protrusion. Thus, the surface of the trench is also generally similar to a semi-chordal smooth surface, and consequently, the shape of the trench's cross-section can also be generally similar to a semi-chordal shape. In this way, the shape formed by the cross-section of the protrusion and the cross-section of the trench together is chordal.

[0033] In one possible implementation of the first aspect described above, the groove is a straight groove, a curved groove, or an annular groove.

[0034] In one possible implementation of the first aspect described above, the arithmetic mean roughness of the surface of the convex portion is measured using an atomic force microscope, wherein the length and width of the test area are both less than or equal to 1 μm.

[0035] For example, the length and width of the test area can be 1μm, meaning the test area is a square area of ​​1μm × 1μm; or, the length and width of the test area can be 0.5μm, meaning the test area is a square area of ​​0.5μm × 0.5μm; or, the length of the test area can be 1μm and the width of the test area can be 0.5μm, meaning the test area is a rectangular area of ​​1μm × 0.5μm.

[0036] In one possible implementation of the first aspect above, the haze and transmittance of the glass-ceramic are tested using a colorimeter with a D65 light source.

[0037] In one possible implementation of the first aspect above, the morphology of the surface of the convex portion is tested in any of the following ways: by using a white light interferometer, with the test light source being a white light source of a light-emitting diode, and the test mode being a multi-focal surface superposition mode; or by slicing the microcrystalline glass along a direction perpendicular to the extension direction of the convex portion and testing it with an optical microscope at a magnification of 20x to 200x.

[0038] In one possible implementation of the first aspect above, the surface morphology of the protrusion is obtained by any of the following methods: polishing the surface of the protrusion; polishing the surface of the protrusion and placing the protrusion in an alkaline solution for ultrasonic alkaline washing, wherein the mass concentration of the alkaline solution is 1% to 50%.

[0039] In one possible implementation of the first aspect described above, the polishing process parameters satisfy at least one of the following: the polishing pad has a Shore hardness of 5D to 60D; the polishing pad is made of sponge; the abrasive particles have a particle size of 0.1μm to 5μm; the abrasive particles include at least one of cerium dioxide particles, alumina particles, and silica particles; the abrasion removal amount is greater than or equal to 0.3μm; and the ratio between the abrasion removal amount and the depth of the groove before polishing is 1 / 30 to 3 / 4. This allows for better achievement of fine polishing at the micron scale.

[0040] In one possible implementation of the first aspect described above, the surface morphology of the protrusion is obtained by: polishing the surface of the protrusion and subjecting it to ultrasonic alkaline washing in an alkaline solution, wherein the mass concentration of the alkaline solution is 1% to 50%; the process parameters of the ultrasonic alkaline washing process satisfy at least one of the following: the ultrasonic frequency of the ultrasonic alkaline washing process is 40kHz to 100kHz; the processing time of the ultrasonic alkaline washing process is greater than or equal to 30s. This allows for more thorough removal of fluorosilicates generated during the etching process of the protrusions and trenches, further reducing the haze of the glass-ceramic.

[0041] Secondly, embodiments of this application provide a method for forming a microcrystalline glass. The method includes: forming a concave-convex structure on a first surface of a microcrystalline glass body, the concave-convex structure including multiple grooves and multiple protrusions, a protrusion being formed in the region between any two adjacent grooves, and a groove being formed in the region between any two adjacent protrusions; performing a first processing on the concave-convex structure, the first processing including at least polishing the surface of the protrusion, the surface of the protrusion after the first processing being a smooth surface, and the arithmetic mean roughness of the surface of the protrusion being less than or equal to 1.5 nm.

[0042] The above-described forming method, through the initial treatment of the uneven structure, can effectively improve the visual effect of the glass-ceramic. Furthermore, a more feasible method (e.g., etching) can be flexibly selected according to actual needs to form the uneven structure, thereby improving the forming yield.

[0043] In one possible implementation of the second aspect described above, the first processing further includes polishing the surface of the trench, the surface of the trench after the first processing is a smooth surface, and the arithmetic mean roughness of the surface of the trench is less than or equal to 1.5 nm.

[0044] This allows the light source of the microcrystalline glass to be smooth and continuous under point light sources or surface light sources, thereby further enhancing the visual effect of the microcrystalline glass.

[0045] In one possible implementation of the second aspect described above, the polishing process parameters satisfy at least one of the following: the polishing pad has a Shore hardness of 5D to 60D; the polishing pad is made of sponge; the abrasive particles have a particle size of 0.1μm to 5μm; the abrasive particles include at least one of cerium dioxide particles, alumina particles, and silica particles; the abrasion removal amount is greater than or equal to 0.3μm; and the ratio between the abrasion removal amount and the depth of the groove before polishing is 1 / 30 to 3 / 4. This allows for better achievement of fine polishing at the micron scale.

[0046] In one possible implementation of the second aspect described above, the polishing process parameters satisfy at least one of the following: the Shore hardness of the polishing pad is preferably 7D to 12D, preferably 7D to 18D, preferably 12D to 24D, and preferably 12D to 18D; the particle size of the abrasive particles is preferably 0.5μm to 1.5μm, preferably 1μm to 1.5μm, preferably 1μm to 2.5μm, and preferably 0.5μm to 2μm; the abrasion removal amount is preferably 1μm to 2μm, preferably 10μm to 15μm, preferably 5μm to 10μm, and preferably 3μm to 5μm; the ratio between the abrasion removal amount and the depth of the groove before polishing is preferably 1 / 6 to 1 / 2, preferably 1 / 6 to 1 / 3, preferably 1 / 10 to 1 / 6, and preferably 1 / 3 to 1 / 2. This allows for better achievement of fine polishing at the micron scale.

[0047] In one possible implementation of the second aspect above, forming a concave-convex structure on the first surface of the microcrystalline glass body includes: etching the first surface with hydrofluoric acid to obtain the concave-convex structure; the first process further includes: placing the concave-convex structure in an alkaline solution for ultrasonic alkaline washing treatment, wherein the mass concentration of the alkaline solution is 1% to 50%.

[0048] This removes the fluorosilicates produced during the etching process, resulting in lower haze in the glass-ceramic, making it more transparent and providing a better visual effect.

[0049] In one possible implementation of the second aspect described above, the process parameters of the ultrasonic alkaline cleaning treatment satisfy at least one of the following: the ultrasonic frequency of the ultrasonic alkaline cleaning treatment is 40kHz to 100kHz; the treatment time of the ultrasonic alkaline cleaning treatment is greater than or equal to 30s. This allows for more thorough removal of fluorosilicates, further reducing the haze of the glass-ceramic.

[0050] In one possible implementation of the second aspect described above, the process parameters of the ultrasonic alkaline washing treatment satisfy at least one of the following: the ultrasonic frequency of the ultrasonic alkaline washing treatment is preferably 50kHz to 60kHz, more preferably 40kHz to 60kHz, even more preferably 60kHz to 80kHz, and even more preferably 80kHz to 100kHz; the treatment time of the ultrasonic alkaline washing treatment is preferably 180s to 240s, more preferably 240s to 300s, even more preferably 300s to 600s, and even more preferably 600s to 900s; the mass concentration of the alkaline solution is preferably 5% to 10%, more preferably 20% to 30%, even more preferably 30% to 40%, and even more preferably 40% to 50%. This allows for more thorough removal of fluorosilicates, further reducing the haze of the glass-ceramic.

[0051] Thirdly, embodiments of this application provide a microcrystalline glass article, which includes a substrate. The substrate is made of microcrystalline glass as described in the first aspect and any possible implementation of the first aspect, or is made of microcrystalline glass formed by the molding method of microcrystalline glass as described in the second aspect and any possible implementation of the second aspect.

[0052] It should be understood that the beneficial effects of the third aspect mentioned above can be referred to in the first aspect and any possible implementation of the first aspect, and will not be elaborated here.

[0053] In one possible implementation of the third aspect described above, the microcrystalline glass product further includes a functional film layer disposed on the substrate.

[0054] According to the embodiments of this application, different functions can be achieved by setting functional film layers. For example, the functional film layer can be an anti-fingerprint layer, an anti-reflective layer, a scratch-resistant layer, or colored ink, etc., deposited on a substrate; alternatively, the functional film layer can also be other types of decorative films. Specifically, the anti-fingerprint layer can reduce the probability of users' fingers leaving dirt on the surface of the microcrystalline glass product, ensuring a cleaner surface; the anti-reflective layer can reduce the reflection of light by the microcrystalline glass product; the scratch-resistant layer can improve the scratch resistance of the microcrystalline glass product; the colored ink can give the microcrystalline glass product a rich variety of colors, making the microcrystalline glass product more decorative; and the decorative film can enhance the aesthetics of the microcrystalline glass product.

[0055] Fourthly, embodiments of this application provide an electronic device, which includes electronic components and a housing, wherein the electronic components are disposed in the housing, and the housing includes the microcrystalline glass article described in the third aspect and any possible implementation thereof.

[0056] In one possible implementation of the fourth aspect above, the housing includes a display cover and a back cover assembled on opposite sides of the electronic device, wherein the display cover and / or back cover comprises microcrystalline glass articles.

[0057] In one possible implementation of the fourth aspect above, the electronic device includes a camera, and the housing also includes a camera decorative cover, which is disposed on the camera and includes a microcrystalline glass article.

[0058] It should be understood that the beneficial effects of the fourth aspect and any possible implementation thereof can be referred to the beneficial effects of the third aspect and any possible implementation thereof, and will not be elaborated here. Attached Figure Description

[0059] Figure 1A A perspective view of a mobile phone according to an embodiment of this application is shown;

[0060] Figure 1B An exploded view of a mobile phone according to an embodiment of this application is shown;

[0061] Figure 1C A schematic diagram of the structure of a watch according to an embodiment of this application is shown;

[0062] Figure 1D A schematic diagram of the structure of a flat plate according to an embodiment of this application is shown;

[0063] Figure 2A A partial structural schematic diagram of a back cover comprising a microcrystalline glass article is shown in an embodiment of this application;

[0064] Figure 2B This paper shows a partial enlarged view of the microcrystalline glass article in a region according to an embodiment of this application;

[0065] Figure 3 Exemplary structures of glass-ceramics in some technical solutions are shown;

[0066] Figure 4A according to Figure 3 The diagram shows the contour scans of the protrusions and grooves of microcrystalline glass in some technical solutions from both three-dimensional and top-down perspectives.

[0067] Figure 4B according to Figure 3 The cross-sectional profile scans of the protrusions and grooves of glass-ceramics in some technical solutions are shown;

[0068] Figure 4C according to Figure 3 Physical images of glass-ceramics in some technical solutions are shown;

[0069] Figure 5AA physical image of the glass-ceramic before hydrofluoric acid etching is shown in the embodiments of this application;

[0070] Figure 5B This document shows a scanning electron microscope image of the microcrystalline glass before hydrofluoric acid etching in an embodiment of this application.

[0071] Figure 6A A physical image of the microcrystalline glass after etching with hydrofluoric acid is shown in the embodiments of this application;

[0072] Figure 6B The image shows a scanning electron microscope image of the microcrystalline glass after hydrofluoric acid etching in an embodiment of this application.

[0073] Figure 7A A top view of a microcrystalline glass according to an embodiment of this application is shown;

[0074] Figure 7B An embodiment of the present application shows a microcrystalline glass along... Figure 7A A sectional view obtained by cutting through section AA in the middle;

[0075] Figure 8A according to Figure 7A and Figure 7B The diagram shows contour scans of the grooves in the microcrystalline glass in the embodiments of this application from both three-dimensional and top-view perspectives.

[0076] Figure 8B according to Figure 7A and Figure 7B A cross-sectional profile scan of the grooves in the microcrystalline glass in an embodiment of this application is shown;

[0077] Figure 8C according to Figure 7A and Figure 7B A physical image of the microcrystalline glass in the embodiments of this application is shown;

[0078] Figure 9A Exemplary structures of the cross-section of the protrusion are shown in some other embodiments of this application;

[0079] Figure 9B An exemplary structure of the cross-section of the protrusion is shown in some embodiments of this application;

[0080] Figure 10 Exemplary structures of the cross-section of the protrusion are shown in some other embodiments of this application;

[0081] Figure 11 Exemplary structures of the cross-section of the protrusion are shown in some embodiments of this application;

[0082] Figure 12AA photograph of the microcrystalline glass after ultrasonic alkaline washing is shown in an embodiment of this application.

[0083] Figure 12B The image shows a scanning electron microscope image of the microcrystalline glass after ultrasonic alkaline washing in an embodiment of this application.

[0084] Figure 13 An exemplary structure of the trench in an embodiment of this application is shown;

[0085] Figure 14A according to Figure 13 The diagram shows contour scans of the grooves in the microcrystalline glass in the embodiments of this application from both three-dimensional and top-view perspectives.

[0086] Figure 14B according to Figure 13 A cross-sectional profile scan of the grooves in the microcrystalline glass in an embodiment of this application is shown;

[0087] Figure 15A An exemplary structure of the protrusion is shown in some other embodiments of this application;

[0088] Figure 15B An exemplary structure two of the protrusions in other embodiments of this application is shown;

[0089] Figure 16A An exemplary structure of the protrusion is shown in some other embodiments of this application;

[0090] Figure 16B An exemplary structure two of the protrusions in some other embodiments of this application is shown;

[0091] Figure 17 A flowchart illustrating the forming process of the microcrystalline glass in an embodiment of this application is shown;

[0092] Figure 18A This illustrates an exemplary process for forming an uneven structure on a microcrystalline glass body according to an embodiment of this application;

[0093] Figure 18B This illustrates an exemplary process two for forming an uneven structure on a microcrystalline glass body according to an embodiment of this application;

[0094] Figure 18C This illustrates an exemplary process three for forming an uneven structure on a microcrystalline glass body according to an embodiment of this application;

[0095] Figure 18D This illustrates an exemplary process four for forming an uneven structure on a microcrystalline glass body in an embodiment of this application;

[0096] Figure 18EThis illustrates an exemplary process five for forming an uneven structure on a microcrystalline glass body in an embodiment of this application;

[0097] Figure 18F This illustrates an exemplary process six for forming an uneven structure on a microcrystalline glass body according to an embodiment of this application;

[0098] Figure 19 according to Figure 17 A block diagram of a molded microcrystalline glass according to an embodiment of this application is shown;

[0099] Figure 20 An exemplary structure of a microcrystalline glass article according to an embodiment of this application is shown. Detailed Implementation

[0100] The specific embodiments of this application will be described in detail below with reference to the accompanying drawings.

[0101] This application provides a microcrystalline glass and a microcrystalline glass article made from the microcrystalline glass, which can be used in electronic devices. It is understood that the electronic devices provided in this application may be, for example, mobile phones, wearable devices (e.g., watches, bracelets, or rings), tablets, notebooks, displays, in-vehicle devices, monitors, automotive parts, e-book readers, televisions, or intelligent robots.

[0102] The following describes exemplary structures of several electronic devices with reference to the accompanying drawings.

[0103] Figure 1A and Figure 1B This paper shows a schematic diagram of the structure of a mobile phone 1a according to an embodiment of the present application, wherein, Figure 1A This is a 3D image of the mobile phone 1a. Figure 1B This is an exploded view of mobile phone 1a, with dashed lines indicating the assembly direction of each component in mobile phone 1a. Figure 1C A schematic diagram of the structure of a watch 1b according to an embodiment of this application is shown. Figure 1D A schematic diagram of the structure of a flat panel 1c according to an embodiment of this application is shown. For example, the electronic device in this application can be... Figure 1A and Figure 1B Mobile phone 1a in the middle Figure 1C Watch 1b or Figure 1D The tablet 1c in the example. For ease of understanding, the embodiments of this application are combined with... Figure 1A and Figure 1B The basic structure of the electronic device in this application will be introduced using mobile phone 1a as an example.

[0104] refer to Figure 1A and Figure 1BThe mobile phone 1a may include a housing 10a and electronic components 20a. The housing 10a forms a receiving cavity 30a for the mobile phone 1a. In some embodiments of this application, the housing 10a may include a mid-frame 11a, a back cover 12a (or "battery cover"), and a display screen cover 13a. The mid-frame 11a is generally frame-like and surrounds the receiving cavity 30a around the circumference of the mobile phone 1a. The back cover 12a and the display screen cover 13a are respectively located on opposite sides of the mid-frame 11a; that is, the back cover 12a and the display screen cover 13a may be respectively assembled on opposite sides of the mobile phone 1.

[0105] In some of these implementations, the middle frame 11a and the back cover 12a can be a single, indivisible structure, without the need for later assembly of the middle frame 11a and the back cover 12a. In other words, the structure formed by the middle frame 11a and the back cover 12a is a single, indivisible whole structure, rather than being assembled from multiple physically independent parts. In other words, the middle frame 11a and the back cover 12a are integrally formed.

[0106] In some other implementations, the middle frame 11a and the back cover 12a can also be separate structures. For example, the middle frame 11a and the back cover 12a can be molded separately and then assembled together with the display cover 13a to form the outer shell 10a. This application does not impose any specific limitations on this.

[0107] A screen module (not shown) is provided on the side of the display cover 13a facing the receiving cavity 30a. The screen module is used to display images and videos, and can also integrate touch functionality. The display cover 13a protects the screen module and can also receive user touch gestures (e.g., swipe, tap, or long press) for human-computer interaction. Furthermore, the display screen cover 13a allows the user to view the image displayed on the screen module.

[0108] Electronic device 20a is disposed in receiving cavity 30a. Electronic device 20a can be, for example, a camera, circuit board, battery, microphone, speaker, screen module or chip, etc., used to realize various functions of mobile phone 1a. This application does not make specific limitations in this regard.

[0109] For example, in Figure 1A and Figure 1B In the embodiment shown, the electronic device 20a can be a camera. An opening 14a is provided on the back cover 12a, and the opening 14a penetrates the back cover 12a. A camera decorative cover 15a is provided on the side of the opening 14a facing away from the electronic device 20a. The camera decorative cover 15a is positioned opposite to the electronic device 20a. The camera decorative cover 15a is used to protect the electronic device 20a and also serves as an appearance decoration, making the back of the mobile phone 1a more stylish.

[0110] It is understood that this application does not limit the shape of the camera decorative cover 15a. For example, in Figure 1A and Figure 1B In the illustrated embodiment, the camera decorative cover 15a is circular. In other embodiments, the camera decorative cover 15a may also be a regular shape such as a triangle, rectangle, or ellipse. Alternatively, in other embodiments, the camera decorative cover 15a may be an irregular shape.

[0111] In the aforementioned mobile phone 1a, at least a portion of the outer casing 10a may be made of microcrystalline glass, or in other words, the outer casing 10a includes microcrystalline glass. For example, one or more of the mid-frame 11a, back cover 12a, display cover 13a, and camera decorative cover 15a of the outer casing 10a may include microcrystalline glass, and this application does not impose specific limitations in this regard.

[0112] Similarly, the above Figure 1B The case 10b of the watch 1b shown may also include a microcrystalline glass article, or, as described above Figure 1C The outer casing 10c of the plate 1c shown may also include microcrystalline glass, which will not be elaborated here. It should be noted that the outer casing 10b of the watch 1b may also be referred to as the watch case.

[0113] It should be noted that microcrystalline glass products are structural components made of microcrystalline glass as the substrate. Microcrystalline glass has excellent mechanical properties, which can effectively improve the strength, drop resistance and wear resistance of microcrystalline glass products, thereby making the casing of electronic devices more reliable.

[0114] Taking the back cover 12a of mobile phone 1a, which includes microcrystalline glass, as an example, Figure 2A This illustration shows a partial structural diagram of a back cover 12a comprising a microcrystalline glass article 10 according to an embodiment of this application. Figure 2B A partial enlarged view of the microcrystalline glass article 10 in the S0 region is shown in an embodiment of this application.

[0115] refer to Figure 2A and Figure 2B The back cover 12a may include a glass-ceramic article 10, which may include a substrate 200 made of glass-ceramic 100.

[0116] The microcrystalline glass 100 may include multiple protrusions 110 and multiple grooves 120. A groove 120 is formed between any two adjacent protrusions 110, and a protrusion 110 is formed between any two adjacent grooves 120. Thus, the multiple protrusions 110 and multiple grooves 120 together constitute a textured surface 130. The textured surface 130 is a micrometer-scale texture, or in other words, its size is on the micrometer scale. The textured surface 130 allows the microcrystalline glass 100 to have a decorative function, while also providing special light and shadow effects and a tactile feel, thereby improving the aesthetics and refinement of the back cover 12a of the mobile phone 1a.

[0117] In some technical solutions, the microcrystalline glass 100 can be etched to form multiple protrusions 110 and multiple grooves 120, thereby obtaining a concave-convex structure 130. Figure 3 Exemplary structures of the microcrystalline glass 100 in some technical solutions are shown. (Reference) Figure 3 After etching the microcrystalline glass 100, the etched area forms a trench 120, and the unetched area forms a protrusion 110. The protrusions 110 and trenches 120 can be arranged alternately along the X direction. The protrusions 110 protrude along the Z1 direction, and the trenches 120 are recessed in the opposite direction of Z1. The Z1 direction can be the thickness direction of the microcrystalline glass 100, and it is perpendicular to the X direction. The cross-sectional shape of the protrusion 110 is trapezoidal, and its cross-section is perpendicular to its extension direction. Correspondingly, the cross-sectional shape of the trench 120 is also trapezoidal, and its cross-section is perpendicular to its extension direction. Figure 3 In the illustrated embodiment, the extending direction of the protrusion 110 and the groove 120 may be, for example, a direction perpendicular to the paper surface.

[0118] It is worth noting that glass-ceramic 100 is a composite structure that includes a crystalline phase and a glassy phase. The etching rate of the etchant (e.g., hydrofluoric acid) is inconsistent between the crystalline phase and the glassy phase. Therefore, for glass-ceramic 100, especially when the crystalline phase content is high, even small process fluctuations such as the concentration of the etchant and the deviation of the etched lines can cause uneven etching, resulting in poor visual effect of glass-ceramic 100.

[0119] For example, Figure 4A and Figure 4B according to Figure 3 The diagram shows contour scans of the protrusions 110 and grooves 120 of the microcrystalline glass 100 in some technical solutions, wherein, Figure 4A These are contour scans of the microcrystalline glass 100 from both stereoscopic and top-down perspectives. Figure 4B This is a cross-sectional profile scan of the microcrystalline glass 100. Figure 4BThe vertical axis represents the dimension of the microcrystalline glass 100 along the Z1 direction, and the horizontal axis represents the dimension of the microcrystalline glass 100 along the X direction. (Reference) Figure 4A and Figure 4B Due to uneven etching, the contours of both the protrusion 110 and the groove 120 have serrations at the microscopic level. The S1 region of the surface 111 of the protrusion 110 and the S2 region of the surface 121 of the groove 120 have uneven etching. The surface 111 of the protrusion 110 and the surface 121 of the groove 120 are not smooth or rounded enough. As a result, the cross-sectional shape of the protrusion 110 and the cross-sectional shape of the groove 120 are both rough and sharp trapezoids.

[0120] Figure 4C according to Figure 3 Physical images of the microcrystalline glass 100 in some technical solutions are shown. (Reference) Figure 4C Due to uneven etching, macroscopically, the S3 region of the glass-ceramic 100 exhibits light and shadow pits and breaks, resulting in a poor visual effect. The contours of the protrusions 110 and grooves 120 in the S3 region of the glass-ceramic 100 also exhibit jagged edges.

[0121] In addition, in some embodiments, the etchant can be hydrofluoric acid. For the glass-ceramic 100, especially when the crystalline phase content of the glass-ceramic 100 is high, when the etchant is hydrofluoric acid, it will also cause etching fogging and haziness, thereby affecting the visual effect of the glass-ceramic 100. For ease of understanding, the following is an exemplary description in conjunction with chemical reaction equations (1) to (3).

[0122] SiO2 + 4HF = SiF4↑ + 2H2O (1)

[0123] SiF4 + 2HF = H2SiF6 (2)

[0124] 2Na + +SiF6 2- =Na2SiF6↓ (3)

[0125] Referring to equation (1) above, when hydrofluoric acid is used to etch the microcrystalline glass 100, the silica (SiO2) in the glass phase of the microcrystalline glass 100 will react chemically with hydrofluoric acid (HF) to generate silicon tetrafluoride (SiF4) gas and water, resulting in a porous and loose nanostructure on the microcrystalline glass 100. During this process, the crystalline phase of the microcrystalline glass 100 has not yet fully reacted with hydrofluoric acid, and the crystalline phase of the microcrystalline glass 100 will hinder the escape of silicon tetrafluoride gas. Therefore, referring to equation (2), the silicon tetrafluoride gas that has not escaped in time will react chemically with hydrofluoric acid to generate fluorosilicic acid (H2SiF6). Fluorosilicic acid can react with metal ions (e.g., sodium ions, potassium ions, etc.) in the microcrystalline glass 100 to generate insoluble fluorosilicate precipitates. Referring to equation (3), sodium ions (Na2SiF6) react with metal ions (Na2SiF6) to generate insoluble fluorosilicate precipitates. + For example, sodium ions can react chemically with fluorosilicic acid to form sodium fluorosilicate (Na2SiF6) precipitate. This fluorosilicate precipitate adheres to the surface of the glass-ceramic 100, making its surface rough and uneven. Incident light undergoes diffuse reflection on the surface of the glass-ceramic 100, resulting in a hazy visual effect, which is the aforementioned problem of "etching fogging" or "hazy appearance." Furthermore, it makes the surface more prone to adsorbing impurities, leading to discoloration of the glass-ceramic 100. Therefore, the visual effect of the glass-ceramic 100 is unsatisfactory.

[0126] For example, Figure 5A This paper shows a physical image of the microcrystalline glass 100 before hydrofluoric acid etching in the embodiments of this application. Figure 5B The image shows a scanning electron microscope image of the microcrystalline glass 100 before hydrofluoric acid etching in the embodiments of this application. Figure 6A The image shown is a physical photograph of the microcrystalline glass 100 after hydrofluoric acid etching, as described in an embodiment of this application. Figure 6B A scanning electron microscope (SEM) image of the microcrystalline glass 100 after hydrofluoric acid etching is shown in an embodiment of this application. Figure 5A and Figure 6A The line segment length is 100 nm, the electron beam acceleration voltage (extra high tension, EHT) of the scanning electron microscope is 10 kV, and the working distance (WD) is 4.1 mm.

[0127] contrast Figure 5A , Figure 5B and Figure 6A , Figure 6BBefore etching, the surface of the microcrystalline glass 100 is finely granular, with low haze and relatively clear overall. After etching with hydrofluoric acid, large-particle clusters of fluorosilicate precipitate M1 adhere to the surface of the microcrystalline glass 100, resulting in higher haze, a foggy and hazy appearance, and poor visual effect.

[0128] Haze is the percentage of transmitted light intensity that deviates from the incident light by more than 2.5° from the total transmitted light intensity. The degree of haze reflects the transparency of the microcrystalline glass 100. The greater the haze, the worse the transparency, and vice versa.

[0129] Therefore, in some other technical solutions, multiple protrusions 110 and multiple grooves 120 of the microcrystalline glass 100 can be formed by other means to obtain the concave-convex structure 130.

[0130] For example, multiple protrusions 110 and multiple grooves 120 of the microcrystalline glass 100 can be formed by laser engraving, thereby obtaining a concave-convex structure 130. However, this method leads to a significant decrease in the strength of the microcrystalline glass 100, making it prone to cracking and exhibiting numerous microcracks. Furthermore, the microcrystalline glass 100 still suffers from localized fogging and haziness, resulting in a less than ideal visual effect. Therefore, the laser engraving method has a low forming yield and is not highly feasible.

[0131] For example, multiple protrusions 110 and multiple grooves 120 of the glass-ceramic 100 can be formed by hot pressing with a mold, thereby obtaining a textured structure 130. However, this method requires high-temperature treatment of the glass-ceramic 100, which can lead to abnormal growth or crystal phase transformation of the glass-ceramic 100. The crystal phase transformation can cause the glass-ceramic 100 to turn blue. Furthermore, the current mold precision is limited, making it difficult to accurately form the micron-scale textured structure 130. Therefore, the molding yield of the hot pressing method is low, and its feasibility is not high.

[0132] In summary, current methods for forming microcrystalline glass with uneven structures have significant limitations, especially when the crystalline phase content of the microcrystalline glass is high. It is difficult to use feasible methods (such as etching) to form uneven structures while maintaining the visual effect of the microcrystalline glass.

[0133] In view of this, this application provides a microcrystalline glass and its forming method. After forming a concave-convex structure, the surface of the convex portion of the concave-convex structure is polished at the micrometer scale (or "fine polishing"), making the surface of the convex portion in the formed microcrystalline glass smooth, and the arithmetic mean roughness (or "Ra") of the convex portion surface is sufficiently small, thereby effectively improving the problem of poor visual effect of microcrystalline glass. Specifically, microscopically, the surface of the convex portion is a smooth and rounded surface, thus the cross-sectional shape of the convex portion is a smooth and rounded shape, rather than a rough and sharp trapezoid; macroscopically, it can effectively improve the problems of light and shadow pitting and discontinuities, thereby making the light and shadow smoother and more continuous. In this way, a more feasible method (e.g., etching) can be flexibly selected to form the concave-convex structure according to actual needs, improving the forming yield.

[0134] The technical solution of this application is described below with reference to the accompanying drawings.

[0135] Figure 7A and Figure 7B An exemplary structure of a microcrystalline glass 100 according to an embodiment of this application is shown, wherein, Figure 7A This is a top view of the microcrystalline glass 100. Figure 7B For microcrystalline glass 100 edge Figure 7A A sectional view obtained by cutting along section AA. (Reference) Figure 7A and Figure 7B The microcrystalline glass 100 may include a plurality of protrusions 110 and a plurality of grooves 120. The area between any two adjacent protrusions 110 forms a groove 120, and the area between any two adjacent grooves 120 forms a protrusion 110, so that the protrusions 110 and the grooves 120 together constitute a concave-convex structure 130.

[0136] It is understood that this application does not limit the number of protrusions 110 and grooves 120, for example, in Figure 7A and Figure 7B In the illustrated embodiment, the number of protrusions 110 can be three, and the number of grooves 120 can be two, with the three protrusions 110 and two grooves 120 arranged alternately along the X direction. In other embodiments, the number of protrusions 110 can also be two, four, five, six, or seven, and the number of grooves 120 can also be three, four, five, six, or seven, etc. Furthermore, the number of protrusions 110 and grooves 120 can be the same or different, and this application does not impose specific limitations in this regard.

[0137] It can also be understood that the protrusion 110 and the groove 120 are two interdependent structures. When the protrusion 110 and the groove 120 are formed, a part of the solid portion of the glass-ceramic 100 is removed, thereby forming the recessed groove 120, while the area that is not removed forms the raised protrusion 110.

[0138] In this case, the surface 111 of the protrusion 110 and the surface 121 of the groove 120 overlap. Figure 7B Taking the convex portion 110 located in the middle and the grooves 120 located on opposite sides of the convex portion 110 as examples in the embodiment shown, the surface 111 of the convex portion 110 may include a first side surface 1111, a second side surface 1112 and a top surface 1113. The first side surface 1111 and the second side surface 1112 are arranged opposite to each other along the width direction (e.g., the X direction) of the convex portion 110 and face the inner cavity 122 of the two grooves 120 respectively. Along the X direction, the top surface 1113 connects between the first side surface 1111 and the second side surface 1112.

[0139] At least a first side surface 1111 and a second side surface 1112 of a protrusion 110 may be part of the surfaces 121 of two grooves 120, respectively. Alternatively, the first side surface 1111 of a protrusion 110 adjacent to one groove 120 and the second side surface 1112 of another protrusion 110 adjacent to the groove 120 are two sides of the surface 121 of the groove 120. The surface 121 of the groove 120 may also include a bottom surface 1211, which connects the first side surface 1111 of the protrusion 110 adjacent to the groove 120 and the second side surface 1112 of the other protrusion 110 adjacent to the groove 120.

[0140] It should be noted that the above Figure 7B The boundary lines between the first side surface 1111, the second side surface 1112, the top surface 1113, and the bottom surface 1211 shown are merely exemplary. The boundary lines between the first side surface 1111, the second side surface 1112, the top surface 1113, and the bottom surface 1211 can be adjusted according to the specific structural design of the protrusion 110. This application does not impose any specific limitations on this, and the other figures in this application are also interpreted in the same way, and will not be described in detail below.

[0141] Among them, the surface 111 of the protrusion 110 is a smooth surface. That is to say, the surface 111 of the protrusion 110 is a smooth and rounded surface, and is relatively flat overall, rather than a rough and sharp surface. Or, the curvature of the surface 111 of the protrusion 110 changes continuously, rather than abruptly.

[0142] Furthermore, the arithmetic mean roughness of the surface 111 of the protrusion 110 is less than or equal to 1.5 nm. For example, the arithmetic mean roughness of the surface 111 of the protrusion 110 can be 1.5 nm, 1.2 nm, 1 nm, 0.9 nm, 0.8 nm, 0.7 nm, 0.6 nm, 0.5 nm, 0.4 nm, 0.3 nm, 0.2 nm, or 0.1 nm, etc.

[0143] The microcrystalline glass 100 provided in this application has a haze of less than or equal to 1%. For example, the haze of the microcrystalline glass 100 can be 1%, 0.95%, 0.9%, 0.85%, 0.8%, 0.75%, 0.7%, 0.65%, 0.6%, 0.55%, 0.5%, 0.45%, 0.44%, 0.43%, 0.42%, 0.41%, 0.4%, 0.35%, 0.34%, 0.33%, 0.32%, 0.31%, 0.3%, 0.25%, 0.24%, 0.23%, 0.22%, 0.21%, 0.2%, 0.15%, 0.14%, 0.13%, 0.12%, 0.11%, or 0.1%, etc. In other words, the microcrystalline glass 100 has a low haze, thus enabling it to have good transparency and excellent visual effects.

[0144] The transmittance of the microcrystalline glass 100 for light with a wavelength of 550nm is greater than or equal to 89%. For example, the transmittance of the microcrystalline glass 100 for light with a wavelength of 550nm can be 89%, 89.1%, 89.2%, 89.3%, 89.4%, 89.5%, 89.6%, 89.7%, 89.8%, 89.9%, 90%, 90.1%, 90.2%, 90.3%, 90.4%, 90.5%, 90.6%, 90.7%, 90.8%, 90.9%, 91%, 91.1%, 91.2%, 91.3%, 91.4%, 91.5%, 91.6%, 91.7%, 91.8%, 91.9%, 92%, 92.1%, 92.2%, 92.3%, 92.4%, 92.5%, 92.6%, 92.7%, 92.8%, 92.9%, or 93%, etc. In other words, the microcrystalline glass 100 has a high transmittance for light with a wavelength of 550nm.

[0145] 550nm is a typical wavelength in the visible light band. High transmittance of light with a wavelength of 550nm reflects the high visible light transmittance of the microcrystalline glass 100 in this embodiment, resulting in greater transparency and better visual effects. This allows it to better meet the optical requirements for display and photography when used as a display screen cover and camera decorative cover. The display screen cover and camera decorative cover can be, for example, the aforementioned... Figure 1A and Figure 1B The display cover 13a and camera decorative cover 15a are shown.

[0146] The crystalline phase in the glass-ceramic 100 accounts for more than or equal to 30% of the total mass. For example, the mass percentage of the crystalline phase in the glass-ceramic 100 can be 31%, 32%, 33%, 34%, 35%, 36%, 37%, 38%, 39%, 40%, 41%, 42%, 43%, 44%, 45%, 46%, 47%, 48%, 49%, or 50%, etc. In other words, the high content of the crystalline phase in the glass-ceramic 100 results in excellent mechanical properties, high reliability, and a wider range of applications.

[0147] In the aforementioned microcrystalline glass 100, the surface 111 of the protrusion 110 is a smooth surface, and the surface 111 of the protrusion 110 has a small arithmetic mean roughness. Therefore, the visual effect of the microcrystalline glass 100 can be effectively improved.

[0148] For example, Figure 8A and Figure 8B according to Figure 7A and Figure 7B This paper shows a contour scan of the groove 120 of the microcrystalline glass 100 in an embodiment of this application, wherein, Figure 8A These are contour scans of the microcrystalline glass 100 from both stereoscopic and top-down perspectives. Figure 8B This is a cross-sectional profile scan of the microcrystalline glass 100. Figure 8B The vertical axis represents the dimension of the microcrystalline glass 100 along the Z1 direction, and the horizontal axis represents the dimension of the microcrystalline glass 100 along the X direction. (Comparison) Figure 4A , Figure 4B and Figure 8A , Figure 8B At the microscopic level, in the microcrystalline glass 100 provided in this application, the surface 111 of the protrusion 110 does not have an unevenness problem. The surface 111 of the protrusion 110 is a smooth and rounded surface. The curvature of the surface 111 of the protrusion 110 changes continuously rather than abruptly. Thus, the cross-section of the protrusion 110 is a smooth and rounded shape, rather than a rough and sharp trapezoid.

[0149] Figure 8C according to Figure 7A and Figure 7B A physical image of the microcrystalline glass 100 in an embodiment of this application is shown. (Comparison) Figure 4C and Figure 8C On a macroscopic level, the light and shadow of the microcrystalline glass 100 provided in this application is generally smooth and continuous under point light sources or surface light sources, with virtually no light and shadow pits or breaks, or only a small number of light and shadow pits or breaks, thereby effectively improving the visual effect of the microcrystalline glass 100. Furthermore, the contour of the protrusions 110 of the microcrystalline glass 100 is free of jagged edges.

[0150] In summary, the microcrystalline glass 100 provided in this application can effectively improve the problem of poor visual effect caused by uneven etching. Therefore, a more feasible method (e.g., etching) can be flexibly selected according to actual needs to form the concave-convex structure 130 of the microcrystalline glass 100, thereby effectively improving the molding yield.

[0151] Furthermore, since the surface 111 of the protrusion 110 is a smooth surface and the arithmetic mean roughness of the surface 111 of the protrusion 110 is sufficiently small, the microcrystalline glass 100 provided in this application has a small haze and a high transmittance, thereby making the microcrystalline glass 100 more visually transparent and further improving the visual effect of the microcrystalline glass 100.

[0152] Furthermore, the high crystalline phase content of glass-ceramic 100 allows it to maintain good mechanical properties and has a wider range of applications.

[0153] The following describes some possible implementations of the haze, transmittance, and crystalline phase content of glass-ceramic 100.

[0154] In some embodiments of this application, the haze of the microcrystalline glass 100 may be less than or equal to 0.9%, 0.85%, 0.8%, 0.75%, 0.7%, 0.65%, 0.6%, 0.55%, 0.5%, 0.45%, 0.44%, 0.43%, 0.42%, 0.41%, 0.4%, 0.35%, 0.34%, 0.33%, 0.32%, 0.31%, 0.3%, 0.25%, 0.24%, 0.23%, 0.22%, 0.21%, 0.2%, 0.15%, 0.14%, 0.13%, 0.12%, 0.11%, or 0.1%, etc.

[0155] In some embodiments of this application, the haze of the microcrystalline glass 100 is preferably 0.18% to 0.32%, more preferably 0.2% to 0.5%, more preferably 0.5% to 0.6%, and more preferably 0.5% to 0.9%. Thus, the microcrystalline glass 100 has a low haze, thereby enabling it to have good transparency and excellent visual effects.

[0156] In some embodiments of this application, the transmittance of the microcrystalline glass 100 for light with a wavelength of 550 nm can be greater than or equal to 89.1%, 89.2%, 89.3%, 89.4%, 89.5%, 89.6%, 89.7%, 89.8%, 89.9%, 90%, 90.1%, 90.2%, 90.3%, 90.4%, 90.5%, 90.6%, 90.7%, 90.8%, 90.9%, 91%, 91.1%, 91.2%, 91.3%, 91.4%, 91.5%, 91.6%, 91.7%, 91.8%, 91.9%, 92%, 92.1%, 92.2%, 92.3%, 92.4%, 92.5%, 92.6%, 92.7%, 92.8%, 92.9%, or 93%, etc.

[0157] In some embodiments of this application, the transmittance of the microcrystalline glass 100 for light with a wavelength of 550 nm is preferably 89.5% to 91.5%, more preferably 89.8% to 91.2%, more preferably 90.2% to 91.5%, and even more preferably 90.5% to 91.5%. Thus, the microcrystalline glass 100 has high visible light transmittance, is visually brighter, and has a better visual effect.

[0158] In some embodiments of this application, the haze and transmittance of the microcrystalline glass 100 can be tested using a colorimeter, and the test light source can be a D65 light source.

[0159] Specifically, before testing, the colorimeter needs to be calibrated using black and white calibration blocks. These blocks are precisely calibrated standard samples. The black blocks reflect almost no light and transmit almost no light, serving as the zero reference for the colorimeter; the white blocks, with their high reflectivity and relatively stable optical properties, serve as the full-scale reference for the device. By measuring the black and white blocks, the colorimeter can adjust its optical system and detectors, ensuring the accuracy and reliability of the measurement data and eliminating errors and drift inherent in the colorimeter itself.

[0160] During testing, the D65 light source transmission mode can be used. The D65 light source simulates the standard illuminator D65, representing daylight with a color temperature of approximately 6500K, one of the standard lighting conditions recommended by the International Commission on Illumination (ICI). In many optical and color measurement applications, using the D65 light source makes the measurement results closer to the human eye's visual perception under natural light, ensuring good versatility and comparability of the test results. It is suitable for testing the optical properties of various transparent or translucent materials, such as glass, plastic films, and optical lenses. In this mode, the light emitted by the device's light source shines perpendicularly onto the sample, and the detector is located on the other side of the sample to receive the light that has passed through it. By comparing the intensity of the incident light and the intensity of the light transmitted through the sample, combined with specific algorithms and formulas, the transmittance and haze of the sample can be calculated.

[0161] In some implementations, the colorimeter can be a Konica Minolta CM36-DG colorimeter, or other similar devices.

[0162] In some embodiments of this application, the mass percentage of the crystalline phase in the microcrystalline glass 100 can be greater than or equal to 31%, 32%, 33%, 34%, 35%, 36%, 37%, 38%, 39%, 40%, 41%, 42%, 43%, 44%, 45%, 46%, 47%, 48%, 49%, or 50%.

[0163] In some embodiments of this application, the mass percentage of the crystalline phase in the glass-ceramic 100 is preferably 30% to 40%, more preferably 40% to 50%, more preferably 75% to 80%, and more preferably 85% to 92%. Thus, the glass-ceramic 100 has a high crystalline phase content, which can achieve good mechanical properties and a wider range of applications.

[0164] After introducing some possible realizations of the haze, transmittance and crystalline phase content of the microcrystalline glass 100, the following section will further describe the protrusion 110 and groove 120 of the microcrystalline glass 100 provided in this application with reference to the accompanying drawings.

[0165] Continue to refer to Figure 7A Multiple protrusions 110 and multiple grooves 120 can be distributed on the first surface 101 of the microcrystalline glass 100, or in other words, the multiple protrusions 110 and multiple grooves 120 are located on the first surface 101, and all of the multiple protrusions 110 and multiple grooves 120 overlap with the first surface 101. Alternatively, it can be understood that the multiple protrusions 110 and multiple grooves 120 are distributed along a direction parallel to the first surface 101, for example, in... Figure 7A and Figure 7BIn the embodiment shown, the plurality of protrusions 110 and the plurality of grooves 120 may be alternately distributed along the X direction, which is parallel to the first surface 101.

[0166] It is understood that the first surface 101 in this application is a physical surface of the glass-ceramic 100. The first surface 101 can be a surface of the glass-ceramic 100 used to form multiple protrusions 110 and multiple grooves 120. In other words, by processing the first surface 101, multiple protrusions 110 and multiple grooves 120 can be formed. For example, in some implementations, the first surface 101 can be etched to remove a portion of the solid portion of the glass-ceramic 100, thereby forming the grooves 120, and the area not removed forms the protrusions 110. The top surface 1113 of the protrusion 110 can be a part of the first surface 101.

[0167] It can also be understood that the first surface 101 can be a plane or a curved surface, and this application does not impose any specific restrictions on it.

[0168] The morphology of the surface 111 of the protrusion 110 and the surface 121 of the groove 120 will be described in turn. The morphology of the surface of each structure may include the roughness and shape of the surface.

[0169] In some embodiments of this application, the arithmetic mean roughness of the surface 111 of the protrusion 110 may be less than or equal to 1 nm, 0.9 nm, 0.8 nm, 0.7 nm, 0.6 nm, 0.5 nm, 0.4 nm, 0.3 nm, 0.2 nm, or 0.1 nm, etc.

[0170] In some embodiments of this application, the arithmetic mean roughness of the surface 111 of the protrusion 110 is preferably 0.5 nm to 1 nm, preferably 0.5 nm to 0.7 nm, preferably 0.3 nm to 0.7 nm, and preferably 0.3 nm to 1.2 nm. This makes the surface 111 of the protrusion 110 smoother and more rounded, thereby giving the microcrystalline glass 100 a better visual effect.

[0171] In some embodiments of this application, the arithmetic mean roughness of the surface 111 of the protrusion 110 can be tested using atomic force microscopy (AFM). The length and width of the test area can be less than 1 μm. For example, the length of the test area can be 1 μm, 0.9 μm, 0.8 μm, 0.7 μm, 0.6 μm, 0.5 μm, 0.4 μm, 0.3 μm, 0.2 μm, or 0.1 μm, etc. Similarly, the width of the test area can be 1 μm, 0.9 μm, 0.8 μm, 0.7 μm, 0.6 μm, 0.5 μm, 0.4 μm, 0.3 μm, 0.2 μm, or 0.1 μm, etc.

[0172] It is understood that the aforementioned test area refers to a region manually selected from the microcrystalline glass 100 for collecting the arithmetic mean roughness data of the surface 111 of the protrusion 110, and is not a specific area obtained through molding. By setting the size of the test area to be small, macroscopic shape errors (e.g., the unevenness formed by the protrusion 110 and the groove 120 themselves) can be eliminated, ensuring that the measured data can more accurately reflect the flatness of the surface 111 of the protrusion 110.

[0173] For example, in Figure 7A In the embodiment shown, the test area for detecting the arithmetic mean roughness of the surface 111 of the protrusion 110 can be region S4 on the microcrystalline glass 100. The length L1 and width W1 of region S4 can be less than or equal to 1 μm, and the arithmetic mean roughness of the surface 111 of the protrusion 110 can be measured at region S4.

[0174] In some implementations, the length of the test area can be less than 0.9μm, 0.8μm, 0.7μm, 0.6μm, 0.5μm, 0.4μm, 0.3μm, 0.2μm, or 0.1μm, and the width of the test area can be less than 0.9μm, 0.8μm, 0.7μm, 0.6μm, 0.5μm, 0.4μm, 0.3μm, 0.2μm, or 0.1μm, etc.

[0175] In some implementations, the length and width of the test area can be 1μm, meaning the test area is a square area of ​​1μm × 1μm; or, the length and width of the test area can be 0.5μm, meaning the test area is a square area of ​​0.5μm × 0.5μm; or, the length of the test area can be 1μm and the width of the test area can be 0.5μm, meaning the test area is a rectangular area of ​​1μm × 0.5μm.

[0176] In some of these implementations, the atomic force microscope can be a Bruker atomic force microscope or other atomic force microscopes, and this application does not impose any specific limitations on it.

[0177] In some embodiments of this application, the maximum height roughness (or "Rz") of the surface 111 of the protrusion 110 can be less than 100 nm. Thus, microscopically, the surface 111 of the protrusion 110 can be a flat surface; macroscopically, it can effectively improve the problems of light and shadow pitting and breakpoints, thereby enabling the microcrystalline glass 100 to have a good visual effect.

[0178] In some of these implementations, the maximum height roughness of the surface 111 of the protrusion 110 can be 100nm, 90nm, 85nm, 80nm, 75nm, 70nm, 65nm, 60nm, 55nm, 50nm, 45nm, 40nm, 35nm, 30nm, 25nm, 20nm, 15nm, or 10nm, etc.

[0179] In some of these implementations, the maximum height roughness of the surface 111 of the protrusion 110 can be less than 90nm, 85nm, 80nm, 75nm, 70nm, 65nm, 60nm, 55nm, 50nm, 45nm, 40nm, 35nm, 30nm, 25nm, 20nm, 15nm, or 10nm, etc.

[0180] In some implementations, the maximum height roughness of the surface 111 of the protrusion 110 can be 0.5 nm to 60 nm, 0.5 nm to 40 nm, 0.5 nm to 20 nm, or 0.5 nm to 10 nm. In this way, the surface 111 of the protrusion 110 can be smoother and more rounded, thereby giving the glass-ceramic 100 a good visual effect.

[0181] It is understood that the test method for the maximum height roughness of the surface 111 of the protrusion 110 is essentially the same as the test method for the arithmetic mean roughness of the surface 111 of the protrusion 110 described above. Therefore, the relevant description for testing the arithmetic mean roughness of the surface 111 of the protrusion 110 described above can be referred to, and will not be repeated here.

[0182] It is understood that the surface 111 of the protrusion 110 in the embodiments of this application can have various shapes, and correspondingly, the cross-section of the protrusion 110 can have various shapes. This application does not make specific limitations on this, as long as the surface 111 of the protrusion 110 is a smooth surface. The following describes several exemplary shapes of the cross-section of the protrusion 110 in conjunction with the accompanying drawings.

[0183] Continue to refer to Figure 7B In some embodiments of this application, along the protrusion direction of the protrusion 110, the distance between the first side surface 1111 and the second side surface 1112 of the protrusion 110 gradually decreases. The protrusion direction of the protrusion 110 can be the Z1 direction, which can be perpendicular to the X and Y directions. That is, the closer to the top surface 1113 of the protrusion 110, the smaller the distance between the first side surface 1111 and the second side surface 1112. Alternatively, along the Z1 direction, the width of the protrusion 110 gradually decreases; correspondingly, along the Z1 direction, the width of the groove 120 gradually increases. The width of the protrusion 110 can be the dimension of the protrusion 110 along the X direction, and the width of the groove 120 can be the dimension of the groove 120 along the X direction; further details will not be elaborated upon below.

[0184] In some implementations, when the protrusion 110 and the trench 120 are formed by etching, the etchant can etch the solid portion of the glass-ceramic 100 in the opposite direction of the Z1 direction and in the X direction. The removed portion forms the trench 120, and the remaining portion forms the protrusion 110. Specifically, along the Z1 direction, the solid portion near the top surface 1113 of the protrusion 110 is etched first and has the longest etching time; the solid portion away from the top surface 1113 of the protrusion 110 is etched last and has the shortest etching time. Therefore, in the final formed protrusion 110 and trench 120, the width of the protrusion 110 gradually decreases along the Z1 direction, and the width of the trench 120 gradually increases along the Z1 direction.

[0185] In some implementations, the first side surface 1111 and the second side surface 1112 of the protrusion 110 can be inclined surfaces relative to the Z1 direction. In this way, the first side surface 1111 and the second side surface 1112 can reflect light better, thereby making the microcrystalline glass 100 more visually dazzling and with a better visual effect.

[0186] In some implementations, when the first side surface 1111 and the second side surface 1112 are inclined planes relative to the Z1 direction, the angle α1 between the first side surface 1111 and the Z1 direction can be from 5° to 45°, and the angle α2 between the second side surface 1112 and the Z1 direction can be from 5° to 45°. This further enhances the visual effect of the microcrystalline glass 100.

[0187] For example, the included angle α1 between the first side 1111 and the Z1 direction can be 5°, 6°, 7°, 8°, 9°, 10°, 11°, 12°, 13°, 14°, 15°, 16°, 17°, 18°, 19°, 20°, 21°, 25°, 27°, 30°, 34°, 36°, 38°, 40°, 42° or 45°, etc.

[0188] For example, the included angle α1 between the first side 1111 and the Z1 direction can be 15° to 30°, 10° to 20°, 5° to 15°, or 7° to 15°, etc.

[0189] It is understandable that the method for determining the value of the angle α2 between the second side 1112 and the Z1 direction can refer to the above description of the angle α1 between the first side 1111 and the Z1 direction, and will not be repeated here.

[0190] It is understood that when the first side surface 1111 and the second side surface 1112 of the protrusion 110 are inclined surfaces relative to the Z1 direction, the cross-section of the protrusion 110 can have different shapes based on the different shapes of the top surface 1113 of the protrusion 110. The following is an exemplary description in conjunction with the accompanying drawings.

[0191] Continue to refer to Figure 7B In some embodiments of this application, the first side 1111 of the protrusion 110 is parallel to the N1 direction, the second side 1112 of the protrusion 110 is parallel to the N2 direction, the N1 direction and the N2 direction are respectively inclined relative to the Z1 direction, and the inclination directions are opposite.

[0192] The top surface 1113 of the protrusion 110 is a curved surface that protrudes along the Z1 direction. One end of the top surface 1113 of the protrusion 110 is smoothly connected to the first side surface 1111, and the other end of the top surface 1113 of the protrusion 110 is smoothly connected to the second side surface 1112.

[0193] Thus, the surface 111 of the protrusion 110 is generally similar to a semi-curved smooth surface, and the cross-sectional shape of the protrusion 110 can be generally similar to a semi-curved shape.

[0194] exist Figure 7B In the illustrated embodiment, the top surface 1113 of the protrusion 110 may include curved surfaces 1113a, 1113b, and 1113c. Curved surface 1113c protrudes with a slight arc along the Z1 direction; therefore, macroscopically, the top surface 1113 of the protrusion 1110 is approximately planar. One end of curved surface 1113c is smoothly connected to the first side surface 1111 via curved surface 1113a; the other end of curved surface 1113c is smoothly connected to the second side surface 1112 via curved surface 1113b.

[0195] Thus, the top surface 1113 of the protrusion 110 is generally similar to a gently convex curved surface, and the surface 111 of the protrusion 110 is generally similar to a relatively blunt semi-curved smooth surface. Therefore, the shape of the cross-section of the protrusion 110 can be generally similar to a relatively blunt semi-curved shape, but this application is not limited to this.

[0196] Figure 9A Exemplary structures of the cross-section of the protrusion 110 in other embodiments of this application are shown. Reference Figure 9A In some other embodiments of this application, the first side 1111 of the protrusion 110 is parallel to the N1 direction, the second side 1112 of the protrusion 110 is parallel to the N2 direction, the N1 direction and the N2 direction are respectively inclined relative to the Z1 direction, and the inclination directions are opposite.

[0197] The top surface 1113 of the protrusion 110 is a curved surface with a large arc along the Z1 direction. Furthermore, one end of the top surface 1113 of the protrusion 110 is connected to the first side surface 1111, and the tangent at this end is parallel to the first side surface 1111, thereby achieving a smooth transition between the top surface 1113 and the first side surface 1111; the other end of the top surface 1113 of the protrusion 110 is connected to the second side surface 1112, and the tangent at this end is parallel to the second side surface 1112, thereby achieving a smooth transition between the top surface 1113 and the second side surface 1112.

[0198] Thus, the top surface 1113 of the protrusion 110 is generally similar to a relatively sharp convex curved surface, and the surface 111 of the protrusion 110 is generally similar to a relatively sharp chordal smooth surface. Therefore, the shape of the cross-section of the protrusion 110 can be generally similar to a relatively sharp semi-chordal shape.

[0199] Figure 9B An exemplary structure of the cross-section of the protrusion 110 in some embodiments of this application is shown. Reference Figure 9B In some other embodiments of this application, the first side 1111 of the protrusion 110 is parallel to the N1 direction, the second side 1112 of the protrusion 110 is parallel to the N2 direction, the N1 direction and the N2 direction are respectively inclined relative to the Z1 direction, and the inclination directions are opposite.

[0200] The top surface 1113 of the protrusion 110 is a combination of a curved surface and a plane. Specifically, the top surface 1113 of the protrusion 110 includes a curved surface 1113d, a curved surface 1113e, and a plane 1113f. The plane 1113f is parallel to the X-direction. One end of the plane 1113f is smoothly connected to the first side surface 1111 via the curved surface 1113d. The tangents at both ends of the curved surface 1113d are parallel to the plane 1113f and the first side surface 1111, respectively, thus achieving a smooth transition between the plane 1113f and the first side surface 1111. The other end of the plane 1113f is smoothly connected to the second side surface 1112 via the curved surface 1113e. The tangents at both ends of the curved surface 1113e are parallel to the plane 1113f and the second side surface 1112, respectively, thus achieving a smooth transition between the plane 1113f and the second side surface 1112.

[0201] Thus, the surface 111 of the protrusion 110 is generally similar to a smooth trapezoidal surface after rounding, and the cross-sectional shape of the protrusion 110 can be generally similar to a trapezoid after rounding.

[0202] It is understandable that the above Figure 7B , Figure 9A and Figure 9B In the embodiment shown, the first side surface 1111 and the second side surface 1112 of the protrusion 110 are inclined surfaces that are inclined relative to the Z1 direction, but this application is not limited thereto.

[0203] For example, Figure 10 Exemplary structures of the cross-section of the protrusion 110 in some other embodiments of this application are shown. Reference Figure 10 In other embodiments of this application, the first side surface 1111 and the second side surface 1112 of the protrusion 110 are planes parallel to the Z1 direction. The top surface 1113 of the protrusion 110 is a curved surface that protrudes along the Z1 direction. One end of the top surface 1113 is connected to the first side surface 1111, and the tangent at this end is parallel to the first side surface 1111, thereby achieving a smooth transition between the top surface 1113 and the first side surface 1111; the other end of the top surface 1113 is connected to the second side surface 1112, and the tangent at this end is parallel to the second side surface 1112, thereby achieving a smooth transition between the top surface 1113 and the second side surface 1112.

[0204] Thus, the surface 111 of the protrusion 110 is generally similar to an n-shaped smooth surface, and the shape of the cross-section of the protrusion 110 is a combination of rectangle and semicircle.

[0205] For example, Figure 11 An exemplary structure of the cross-section of the protrusion 110 in some further embodiments of this application is shown. Reference Figure 11 In some embodiments of this application, the cross-sectional shape of the protrusion 110 can also be similar to a semi-circle, and the surface 111 of the protrusion 110 is a semi-circular smooth surface.

[0206] It should be noted that the above Figure 7B , Figures 9A to 11 The shapes of the surfaces 111 of several protrusions 110 and the corresponding cross-sectional shapes are shown only schematically and do not constitute a limitation of this application.

[0207] After introducing the morphology (e.g., roughness, shape) of the surface 111 of the protrusion 110, the following section will introduce the testing method and the method for obtaining the morphology of the surface 111 of the protrusion 110.

[0208] In some embodiments of this application, the morphology of the surface 111 of the protrusion 110 can be tested by slicing. Specifically, the microcrystalline glass 100 is sliced ​​along a direction perpendicular to the extension direction of the protrusion 110, and tested using an optical microscope at a magnification of 20 to 200 times.

[0209] It is understood that different magnifications can be set according to the different sizes of the microcrystalline glass 100. For example, the magnification can be 20x, 30x, 40x, 50x, 60x, 70x, 80x, 90x, 100x, 150x or 200x, etc. This application does not make specific restrictions in this regard.

[0210] In other embodiments of this application, the morphology of the surface 111 of the protrusion 110 can also be tested by a white light interferometer. The test light source can be a light-emitting diode (LED) white light source, and the test mode can be a multi-focal surface superposition mode.

[0211] In some of these implementations, the white light interferometer can be the Sensofar 3D confocal white light interferometric profilometer, Sensofar 90.

[0212] In some of these implementations, it is understood that test areas of different sizes can be set according to the different dimensions of the microcrystalline glass 100. For example, the test area can be a rectangular area of ​​0.7mm×0.8mm, 1mm×1mm, 5mm×5mm, 10mm×10mm or 50mm×50mm. This application does not impose any specific limitations on this.

[0213] In some embodiments of this application, the morphology of the surface 111 of the protrusion 110 can be obtained by polishing the surface 111 of the protrusion 110. It is understood that after forming the concave-convex structure 130, polishing the surface 111 of the protrusion 110 of the concave-convex structure 130 can make the surface 111 of the protrusion 110 in the formed microcrystalline glass 100 a smooth surface, and the surface 111 of the protrusion 110 has a low roughness.

[0214] Alternatively, in some other embodiments of this application, the morphology of the surface 111 of the protrusion 110 can also be obtained by polishing the surface 111 of the protrusion 110 and placing the protrusion 110 in an alkaline solution for ultrasonic alkaline cleaning (or "alkaline repair"), wherein the mass concentration of the alkaline solution is 1% to 50%. This application does not impose specific restrictions on the order of the polishing and ultrasonic alkaline cleaning processes.

[0215] It is understandable that after the concave-convex structure 130 is formed, the surface 111 of the protrusion 110 of the concave-convex structure 130 can be polished and ultrasonically alkaline washed to make the surface 111 of the protrusion 110 in the formed microcrystalline glass 100 smoother and the surface 111 of the protrusion 110 less rough.

[0216] In some implementations, the uneven structure 130 can be formed by hydrofluoric acid etching. After forming the uneven structure 130, it is placed in an alkaline solution for ultrasonic alkaline washing to remove the fluorosilicates generated during etching. This results in lower haze and higher transmittance of visible light to the glass-ceramic 100, making it more transparent and providing better visual effects. For ease of understanding, the following example is illustrated with chemical reaction equations.

[0217] Na2SiF6+6NaOH=Na2SiO3+6NaF+3H2O (4)

[0218] Referring to the above equation (4) and in conjunction with the aforementioned equations (1) to (3), taking sodium fluorosilicate as the precipitate and sodium hydroxide (NaOH) as the solute in the alkaline solution, sodium hydroxide can react chemically with sodium fluorosilicate to generate sodium silicate (Na2SiO3) and sodium fluoride (NaF), which are easily soluble in water, thereby achieving the removal of sodium fluorosilicate.

[0219] For example, Figure 12A The image shown is a physical photograph of the microcrystalline glass 100 after ultrasonic alkaline washing treatment in an embodiment of this application. Figure 12B A scanning electron microscope (SEM) image of the microcrystalline glass 100 after ultrasonic alkaline washing is shown in an embodiment of this application. Figure 12A The line segment length is 100 nm, the electron beam acceleration voltage (extra high tension, EHT) of the scanning electron microscope is 10 kV, and the working distance (WD) is 5.8 mm.

[0220] contrast Figure 6A , Figure 6B and Figure 12A , Figure 12B After etching with hydrofluoric acid, the surface of the microcrystalline glass 100 is covered with large-particle clusters of fluorosilicate precipitate M1, resulting in high haze and an overall foggy and cloudy appearance, lacking transparency and having poor visual effects. After ultrasonic alkaline washing, the surface of the microcrystalline glass 100 becomes finely granular, with lower haze and higher transmittance of visible light, resulting in greater transparency and better visual effects.

[0221] For the sake of brevity, the specific process parameters for polishing and ultrasonic alkaline washing can be found in the description of the forming method of the microcrystalline glass 100 in the following embodiments, and will not be repeated here.

[0222] After introducing the morphology (e.g., roughness, shape) of the surface 111 of the protrusion 110 and its testing and acquisition methods, the morphology of the surface 121 of the groove 120 and its testing and acquisition methods will be introduced below with reference to the accompanying drawings.

[0223] In some feasible solutions, the surface 121 of the groove 120 in the glass-ceramic 100 can also be a smooth surface, and the arithmetic mean roughness of the surface 121 of the groove 120 is small enough to further improve the problem of poor visual effect of the glass-ceramic 100.

[0224] Specifically, Figure 13 An exemplary structure of the trench 120 in an embodiment of this application is shown. (See reference...) Figure 13 The surface 121 of the groove 120 is a smooth, rounded surface, relatively flat overall, rather than a rough, sharp surface. In other words, the curvature of the surface 121 of the groove 120 changes continuously, rather than abruptly. Thus, the surface 111 of the convex portion 110 and the surface 121 of the groove 120 together form a wavy, smooth surface, with the surface 111 of the convex portion 110 including wavy crests and the surface 121 of the groove 120 including wavy troughs.

[0225] Furthermore, the arithmetic mean roughness of the surface 121 of the trench 120 is less than or equal to 1.5 nm. For example, the arithmetic mean roughness of the surface 121 of the trench 120 can be 1.5 nm, 1.2 nm, 1 nm, 0.9 nm, 0.8 nm, 0.7 nm, 0.6 nm, 0.5 nm, 0.4 nm, 0.3 nm, 0.2 nm, or 0.1 nm, etc.

[0226] In some embodiments of this application, the arithmetic mean roughness of the surface 121 of the trench 120 may be less than or equal to 1 nm, 0.9 nm, 0.8 nm, 0.7 nm, 0.6 nm, 0.5 nm, 0.4 nm, 0.3 nm, 0.2 nm, or 0.1 nm, etc.

[0227] In some embodiments of this application, the arithmetic mean roughness of the surface 121 of the trench 120 can be 0.5 nm to 1 nm, 0.5 nm to 0.7 nm, 0.3 nm to 0.7 nm, or 0.3 nm to 1.2 nm. This makes the surface 121 of the trench 120 smoother and more rounded, thereby giving the glass-ceramic 100 a better visual effect.

[0228] In some embodiments of this application, the maximum height roughness of the surface 121 of the trench 120 can be less than 100 nm. For example, the maximum height roughness of the surface 121 of the trench 120 can be 100 nm, 90 nm, 85 nm, 80 nm, 75 nm, 70 nm, 65 nm, 60 nm, 55 nm, 50 nm, 45 nm, 40 nm, 35 nm, 30 nm, 25 nm, 20 nm, 15 nm, or 10 nm, etc.

[0229] In some of these implementations, the maximum height roughness of the surface 121 of the trench 120 can be less than 90nm, 85nm, 80nm, 75nm, 70nm, 65nm, 60nm, 55nm, 50nm, 45nm, 40nm, 35nm, 30nm, 25nm, 20nm, 15nm, or 10nm, etc.

[0230] In some implementations, the maximum height roughness of the surface 121 of the trench 120 can be 0.5 nm to 60 nm, 0.5 nm to 40 nm, 0.5 nm to 20 nm, or 0.5 nm to 10 nm. This makes the surface 121 of the trench 120 smoother and more rounded, thus giving the glass-ceramic 100 a better visual effect.

[0231] It is understood that the test methods for the arithmetic mean roughness and maximum height roughness of the surface 121 of the groove 120 are essentially the same as the test methods for the arithmetic mean roughness of the surface 111 of the protrusion 110. Therefore, the relevant descriptions for testing the arithmetic mean roughness of the surface 111 of the protrusion 110 can be referred to above, and will not be repeated here.

[0232] Since the surface 121 of the groove 120 is a smooth surface, and the surface 121 of the groove 120 has a small arithmetic mean roughness and a maximum height roughness, the light source of the microcrystalline glass 100 under point light source or surface light source can be smooth and continuous, thereby further improving the visual effect of the microcrystalline glass 100.

[0233] For example, Figure 14A and Figure 14B according to Figure 13 This paper shows a contour scan of the groove 120 of the microcrystalline glass 100 in an embodiment of this application, wherein, Figure 14A These are contour scans of the microcrystalline glass 100 from both stereoscopic and top-down perspectives. Figure 14B This is a cross-sectional profile scan of the microcrystalline glass 100. Figure 14B The vertical axis represents the dimension of the microcrystalline glass 100 along the Z1 direction, and the horizontal axis represents the dimension of the microcrystalline glass 100 along the X direction. (Comparison) Figure 4A , Figure 4B and Figure 14A , Figure 14B At the microscopic level, in the glass-ceramic 100 provided in this application, there is no unevenness on the surface 111 of the protrusion 110 and the surface 121 of the groove 120. Both the surface 111 of the protrusion 110 and the surface 121 of the groove 120 are smooth and rounded surfaces. The curvature of the surface 111 of the protrusion 110 and the surface 121 of the groove 120 changes continuously rather than abruptly. Thus, the cross-sections of the protrusion 110 and the groove 120 are smooth and rounded shapes, rather than rough and sharp trapezoids.

[0234] On a macroscopic level, the microcrystalline glass 100 provided in this application exhibits smoother and more continuous light and shadow under point or surface light sources, resulting in a better visual effect. For details, please refer to the above. Figure 8C The relevant descriptions in the illustrated embodiments will not be repeated here.

[0235] It is understood that the surface 121 of the groove 120 in the embodiments of this application can have various shapes, and correspondingly, the cross-section of the groove 120 can also have various shapes. This application does not make specific limitations on this, as long as the surface 121 of the groove 120 is a smooth surface.

[0236] It can also be understood that the cross-sectional shape of the groove 120 is essentially the same as the cross-sectional shape of the protrusion 110; only the orientation needs to be changed accordingly. Therefore, please refer to the above for details. Figure 7B , Figures 9A to 11 The description of the protrusion 110 in the illustrated embodiment will not be repeated here. The shape of the cross-section of the groove 120 may be the same as or different from the shape of the cross-section of the protrusion 110; this application does not impose any restrictions on this.

[0237] For example, in Figure 13 In the embodiment shown, the first side surface 1111 and the second side surface 1112 of the protrusion 110 are inclined surfaces that are inclined relative to the Z1 direction, the top surface 1113 of the protrusion 110 is a curved surface that protrudes along the Z1 direction, and the bottom surface 1211 of the groove 120 is a curved surface that protrudes in the opposite direction of the Z1 direction.

[0238] Thus, the surface 111 of the protrusion 110 is generally similar to a semi-chordal smooth surface, and therefore, the cross-sectional shape of the protrusion 110 can be generally similar to a semi-chordal shape; the surface 121 of the groove 120 is also generally similar to a semi-chordal smooth surface, and therefore, the cross-sectional shape of the groove 120 can be generally similar to a semi-chordal shape. In this way, the shape formed by the cross-section of the protrusion 110 and the cross-section of the groove 120 is chordal, or in other words, the cross-sectional shape of the concave-convex structure 130 is chordal.

[0239] The specific structure of the protrusion 110 is the same as described above. Figure 7BThe protrusion 110 in the illustrated embodiment is substantially the same, therefore reference can be made to the above. Figure 7B The description of the protrusion 110 in the illustrated embodiment. The specific structure of the groove 120 is the same as described above. Figure 9A The protrusion 110 in the illustrated embodiment is essentially the same; only the orientation needs to be changed accordingly. Therefore, the above description can be used as a reference. Figure 9A Description of the protrusion 110 in the illustrated embodiment.

[0240] It is understandable that the above Figure 13 This is merely an illustrative representation of the shape combination of the protrusion 110 and the groove 120, and does not constitute a limitation of this application.

[0241] It is understood that the testing method and the method for obtaining the morphology of the surface 121 of the groove 120 are essentially the same as the testing method and the method for obtaining the morphology of the surface 111 of the protrusion 110. Therefore, the above description of the protrusion 110 can be referred to, and will not be repeated here.

[0242] After describing the morphology of the surface 111 of the protrusion 110 and the surface 121 of the groove 120 of the microcrystalline glass 100, the dimensions of the protrusion 110 and the groove 120 will be described below with reference to the accompanying drawings.

[0243] Continue to refer to Figure 13 In some embodiments of this application, the ratio between the average width of the groove 120 and the average width of the protrusion 110 can be from 0.1 to 10. This ensures that the average width of the groove 120 and the average width of the protrusion 110 are appropriately sized, thereby contributing to the formation of a smooth surface for the protrusion 110 and the groove 120. At the same time, the uneven structure 130 formed by the protrusion 110 and the groove 120 can also be more aesthetically pleasing and symmetrical.

[0244] The average width of the protrusion 110 can be the average dimension of the protrusion 110 in the X direction, and the average width of the groove 120 can be the average dimension of the groove 120 in the X direction.

[0245] In some implementations, the ratio between the average width of the groove 120 and the average width of the protrusion 110 can be 0.1, 0.2, 0.3, 0.4, 0.5, 0.6, 0.7, 0.8, 0.9, 1, 1.5, 2, 2.5, 3, 3.5, 4, 4.5, 5, 5.5, 6, 6.5, 7, 7.5, 8, 8.5, 9, 9.5, or 10.

[0246] In some implementations, the ratio between the average width of the groove 120 and the average width of the protrusion 110 is preferably 1 to 5, preferably 5 to 7, preferably 7 to 9, preferably 7 to 10, etc. This allows for a more suitable average width between the protrusion 110 and the groove 120, thereby contributing to a smoother surface finish on the protrusion 110 and the groove 120, and further enhancing the aesthetics and uniformity of the convex-concave structure 130 formed by the protrusion 110 and the groove 120.

[0247] In some embodiments of this application, the ratio between the average width of the groove 120 and its depth in the cross-section of the groove 120 can be from 10 to 500. This ensures that the average width and depth of the groove 120 are appropriately sized, which helps to form a smooth surface for the protrusion 110 and the groove 120. At the same time, the uneven structure 130 formed by the protrusion 110 and the groove 120 can also be more aesthetically pleasing and symmetrical.

[0248] Wherein, on the cross-section of the groove 120, the depth of the groove 120 is the dimension of the cross-section of the groove 120 along the Z1 direction.

[0249] In some implementations, the ratio between the average width of the trench 120 and the depth of the trench 120 in the cross-section of the trench 120 can be 10, 20, 30, 40, 50, 60, 70, 80, 90, 100, 120, 150, 180, 200, 210, 250, 270, 300, 330, 350, 380, 400, 420, 450, 490, or 500.

[0250] In some implementations, the ratio between the average width of the groove 120 and its depth on the cross-section of the groove 120 is preferably 20 to 50, more preferably 10 to 30, more preferably 10 to 50, and more preferably 50 to 100. This ensures that the average width and depth of the groove 120 are appropriately sized, which further facilitates the formation of smooth surfaces on the protrusions 110 and the grooves 120, and simultaneously enhances the aesthetics and symmetry of the convex-concave structure 130 formed by the protrusions 110 and the grooves 120.

[0251] In some embodiments of this application, the average width of the protrusion 110 can be greater than or equal to 10 μm. This ensures that the average width of the protrusion 110 is appropriate, thereby helping to form a more rounded protrusion 110. At the same time, the concave-convex structure 130 formed by the protrusion 110 and the groove 120 can also be more aesthetically pleasing and symmetrical.

[0252] In some implementations, the average width of the protrusion 110 can be 10μm, 15μm, 20μm, 25μm, 30μm, 35μm, 40μm, 45μm, 50μm, 51μm, 52μm, 53μm, 54μm, 55μm, 56μm, 57μm, 58μm, 59μm, 60μm, 61μm, 62μm, 63μm, 64μm, 65μm, 66μm, 70μm, 75μm, 80μm, 85μm, 90μm, 95μm, 100μm, 150μm, 200μm, 250μm, 300μm, or 350μm, etc.

[0253] In some implementations, the average width of the protrusion 110 can be greater than or equal to 15μm, 20μm, 25μm, 30μm, 35μm, 40μm, 45μm, 50μm, 51μm, 52μm, 53μm, 54μm, 55μm, 56μm, 57μm, 58μm, 59μm, 60μm, 61μm, 62μm, 63μm, 64μm, 65μm, 66μm, 70μm, 75μm, 80μm, 85μm, 90μm, 95μm, 100μm, 150μm, 200μm, 250μm, 300μm, or 350μm.

[0254] In some implementations, the average width of the protrusion 110 is preferably 10 μm to 50 μm, more preferably 50 μm to 150 μm, more preferably 100 μm to 200 μm, and more preferably 100 μm to 300 μm. This allows for a more suitable average width of the protrusion 110, further contributing to a more rounded protrusion 110, and simultaneously enhancing the aesthetics and symmetry of the convex-concave structure 130 formed by the protrusion 110 and the groove 120.

[0255] In some embodiments of this application, the average width of the groove 120 can be greater than or equal to 10 μm. This ensures that the average width of the groove 120 is appropriate, thereby helping to form a more rounded groove 120. At the same time, the uneven structure 130 formed by the protrusion 110 and the groove 120 can also be more aesthetically pleasing and symmetrical.

[0256] In some implementations, the average width of the trench 120 can be 10μm, 15μm, 20μm, 25μm, 30μm, 35μm, 40μm, 45μm, 50μm, 51μm, 52μm, 53μm, 54μm, 55μm, 56μm, 57μm, 58μm, 59μm, 60μm, 61μm, 62μm, 63μm, 64μm, 65μm, 66μm, 70μm, 75μm, 80μm, 85μm, 90μm, 95μm, 100μm, 150μm, 200μm, 250μm, 300μm, or 350μm, etc.

[0257] In some implementations, the average width of the trench 120 can be greater than or equal to 51μm, 52μm, 53μm, 54μm, 55μm, 56μm, 57μm, 58μm, 59μm, 60μm, 61μm, 62μm, 63μm, 64μm, 65μm, 66μm, 70μm, 75μm, 80μm, 85μm, 90μm, 95μm, 100μm, 150μm, 200μm, 250μm, 300μm, or 350μm.

[0258] In some implementations, the average width of the groove 120 is preferably 10 μm to 50 μm, more preferably 50 μm to 150 μm, more preferably 100 μm to 200 μm, and more preferably 100 μm to 300 μm. This allows for a more suitable average width of the groove 120, further contributing to a more rounded groove 120, and simultaneously enhancing the aesthetics and uniformity of the convex-concave structure 130 formed by the protrusion 110 and the groove 120.

[0259] In some embodiments of this application, the depth of the groove 120 can be from 0.1 μm to 30 μm. This ensures that the depth of the groove 120 is appropriate, thereby contributing to a smooth surface of the groove 120. At the same time, the uneven structure 130 formed by the protrusion 110 and the groove 120 can also be more aesthetically pleasing and symmetrical.

[0260] In some implementations, the depth of the trench 120 can be 0.1μm, 0.2μm, 0.3μm, 0.4μm, 0.5μm, 0.6μm, 0.7μm, 0.8μm, 0.9μm, 1μm, 1.5μm, 2μm, 2.5μm, 3μm, 3.5μm, 4μm, 4.5μm, 5μm, 5.5μm, 6μm, 6.5μm, 7μm, 7.5μm, 8μm, 8.5μm, 9μm, 9.5μm, 10μm, 11μm, 12μm, 15μm, 18μm, 20μm, 22μm, 25μm, or 30μm, etc.

[0261] In some implementations, the depth of the groove 120 is preferably 1 μm to 5 μm, preferably 3 μm to 5 μm, preferably 4 μm to 10 μm, preferably 10 μm to 20 μm, etc. This ensures that the depth of the groove 120 is more appropriate, thus contributing to a smoother groove surface and further enhancing the aesthetics and uniformity of the uneven structure 130 formed by the protrusion 110 and the groove 120.

[0262] It is understood that the dimensions of the protrusion 110 and the groove 120 can be arbitrarily combined according to actual needs, as illustrated below.

[0263] For example, in some embodiments of this application, the average width of the protrusion 110 can be 50 μm to 150 μm, the average width of the groove 120 can be 50 μm to 150 μm, and the depth of the groove 120 can be 4 μm to 10 μm.

[0264] For example, in some other embodiments of this application, the average width of the protrusion 110 can be 100μm to 200μm, the average width of the groove 120 can be 100μm to 200μm, and the depth of the groove 120 can be 4μm to 10μm.

[0265] For example, in some other embodiments of this application, the average width of the protrusion 110 can be from 100 μm to 300 μm, the average width of the groove 120 can be from 100 μm to 200 μm, and the depth of the groove 120 can be from 4 μm to 10 μm.

[0266] After introducing the dimensions of the protrusion 110 and groove 120 of the microcrystalline glass 100, the extended forms of the protrusion 110 and groove 120 will be introduced below with reference to the accompanying drawings.

[0267] In some embodiments of this application, the protrusion 110 can be a straight protrusion. As mentioned above, the protrusion 110 and the groove 120 are two interdependent structures; therefore, correspondingly, the groove 120 can also be a straight groove, thereby jointly constituting a straight striped convex-concave structure 130, which can be regarded as a straight array. Exemplarily, in... Figure 7A In the illustrated embodiment, the protrusion 110 and the groove 120 may extend along the Y direction, respectively.

[0268] Figure 15A and Figure 15B Exemplary structures of several protrusions 110 in other embodiments of this application are shown. Reference Figure 15A and Figure 15B In other embodiments of this application, the protrusion 110 can be a curved protrusion, and correspondingly, the groove 120 can be a curved groove. For example Figure 15A As shown, in some implementations, the protrusion 110 can be a C-shaped protrusion extending along the N3 direction, and correspondingly, the groove 120 can also be a C-shaped groove extending along the N3 direction. The protrusion 110 and the groove 120 can be arranged alternately along the X direction, thereby jointly forming a C-shaped striped concave-convex structure 130. For example... Figure 15B As shown, in some other implementations, the protrusion 110 can be an S-shaped protrusion extending along the N4 direction, and correspondingly, the groove 120 can also be an S-shaped groove extending along the N4 direction. The protrusion 110 and the groove 120 can be arranged alternately along the X direction to jointly form an S-shaped striped concave-convex structure 130.

[0269] Figure 16A and Figure 16B Exemplary structures of several protrusions 110 in other embodiments of this application are shown. Reference Figure 16A and Figure 16B In other embodiments of this application, the protrusion 110 can be an annular protrusion, and correspondingly, the groove 120 can be an annular groove. For example, Figure 16A As shown, in some implementations, the protrusion 110 can be a circular annular protrusion, and correspondingly, the groove 120 can be a circular annular groove. The protrusion 110 and the groove 120 can be arranged alternately along the radial direction of the circle, thereby jointly forming a concentric annular concave-convex structure 130, which can be regarded as a concentric circle array. For example... Figure 16B As shown, in some other implementations, the protrusion 110 can also be a rectangular annular protrusion, and correspondingly, the groove 120 can be a rectangular annular groove. The protrusion 110 and the groove 120 can be alternately nested to jointly form a concentric rectangular concave-convex structure 130.

[0270] It is understandable that the above Figure 7A , Figures 15A to 16B The above illustrations are merely schematic representations of several extension forms of the protrusions 110 and grooves 120 and do not constitute a limitation of this application. Figure 7A , Figures 15A to 16B The extension shapes of the protrusions 110 and grooves 120 shown can be arbitrarily combined. For example, in some other embodiments, a portion of the protrusions 110 and grooves 120 may be straight, while another portion may be C-shaped. Furthermore, in other embodiments, a portion of the protrusions 110 and grooves 120 may be straight, while another portion may be S-shaped; this application does not impose specific limitations on these aspects.

[0271] After introducing the protrusions 110 and grooves 120 of the glass-ceramic 100, the following will continue to introduce the main crystal phase type and composition ratio of the glass-ceramic 100 provided in this application.

[0272] In some embodiments of this application, the main crystalline phase of the glass-ceramic 100 may include at least one selected from lithium disilicate, lithium feldspar, lithium silicate, quartz, quartz solid solution, spinel, sodium nepheline, potassium nepheline, cordierite, and zirconium oxide. The main crystalline phase of the glass-ceramic 100 refers to the crystalline phase with the highest content in the glass-ceramic 100.

[0273] In some of these implementations, the main crystalline phase of the glass-ceramic 100 may include lithium disilicate, lithium feldspar, and lithium silicate.

[0274] In some other implementations, the main crystalline phase of the glass-ceramic 100 may include lithium disilicate and lithium feldspar.

[0275] In some other implementations, the main crystalline phase of the glass-ceramic 100 may include lithium silicate.

[0276] In some of these implementations, the main crystalline phase of the glass-ceramic 100 may include lithium disilicate, lithium feldspar, and quartz.

[0277] In some embodiments of this application, the glass-ceramic 100 may include the following components by mass percentage:

[0278] Lithium oxide (Li2O): 5% to 15%;

[0279] Silicon dioxide (SiO2): 50% to 78%;

[0280] Alumina (Al2O3): 4% to 15%;

[0281] Phosphorus pentoxide (P2O5): 1% to 5%;

[0282] Zirconium dioxide (ZrO2): 2% to 10%;

[0283] Sodium oxide (Na2O): 0% to 5%;

[0284] Potassium oxide (K2O): 0% to 5%;

[0285] Boron trioxide (B2O3): 0% to 5%;

[0286] Other components: 0% to 5%.

[0287] Lithium oxide is an essential component of the crystalline phase composition of the glass-ceramic 100 and is also necessary for chemical strengthening. Lithium oxide helps to form lithium-containing crystalline phases such as lithium silicate and petalite, and to obtain better ion exchange capacity. However, a large amount of lithium oxide may lead to a decrease in the chemical stability and a deterioration in the transmittance of the glass-ceramic. Taking into account the above effects, in the embodiments of this application, the mass percentage of lithium oxide can be controlled within the range of 5% to 15%. For example, the mass percentage of lithium oxide in the glass-ceramic 100 can be 5%, 5.5%, 6%, 6.5%, 7%, 7.5%, 8%, 8.5%, 9%, 9.5%, 10%, 10.5%, 11%, 11.5%, 12%, 12.5%, 13%, 13.5%, 14%, 14.5%, and 15%.

[0288] In some of these implementations, the mass percentage of lithium oxide is preferably 8% to 15%, more preferably 9% to 14%, even more preferably 10% to 13%, and even more preferably 11% to 12%.

[0289] Silica is a fundamental component in the formation of the glass-ceramic 100, used to stabilize its network structure. It is also one of the components forming the lithium silicate phase, quartz phase, and lithite phase. When the mass percentage of silica is below 50%, the number of crystalline phases formed in the glass-ceramic 100 decreases, the crystals become coarser, and the haze and impact resistance (e.g., drop ball test height) of the glass-ceramic decrease. When the mass percentage of silica is above 78%, the melting temperature of the glass-ceramic increases, making it difficult to form and affecting the consistency of the glass. Considering the above effects, in the embodiments of this application, the mass percentage of silica can be controlled between 50% and 78%. Exemplarily, the mass percentage of silica in the glass-ceramic 100 can be 50%, 55%, 60%, 65%, 70%, 72%, 75%, or 78%.

[0290] In some of these implementations, the mass percentage of silica is preferably 60% to 75%, more preferably 62% to 73%, even more preferably 65% ​​to 70%, and even more preferably 66% to 68%.

[0291] Alumina is an intermediate oxide in the formation of the glass-ceramic 100, which can improve the chemical stability of the glass-ceramic 100. Furthermore, since [AlO4] has a larger volume than [SiO4], it provides more space for ion exchange, thus promoting ion exchange. However, excessive alumina tends to increase the viscosity of the glass-ceramic, and the presence of alkaline earth metals increases the tendency for the glass phase to crystallize. Considering the effects of chemical stability, viscosity, and ion exchange capacity, in this embodiment, the mass percentage of alumina can be controlled between 4% and 15%. For example, the mass percentage of alumina in the glass-ceramic 100 can be 4%, 4.5%, 5%, 5.5%, 6%, 6.5%, 7%, 7.5%, 8%, 8.5%, 9%, 9.5%, 10%, 10.5%, 11%, 11.5%, 12%, 12.5%, 13%, 13.5%, 14%, 14.5%, and 15%.

[0292] In some of these implementations, the mass percentage of alumina is preferably 4% to 12%, more preferably 4% to 10%, even more preferably 4% to 8%, and even more preferably 4% to 7%.

[0293] Phosphorus pentoxide helps improve the low-temperature melting properties of the glass-ceramic 100, enabling phase separation and crystal nucleation within the glass-ceramic 100, and improving the thermal expansion stability of the glass-ceramic 100 during crystallization. However, excessive phosphorus pentoxide may lead to a decrease in the mechanical properties and transmittance of the glass-ceramic 100, increasing the risk of phase separation. Considering the above effects, in the embodiments of this application, the mass percentage of phosphorus pentoxide can be controlled between 1% and 5%. For example, the mass percentage of phosphorus pentoxide in the glass-ceramic 100 can be 1%, 1.5%, 2%, 2.5%, 3%, 3.5%, 4%, 4.5%, or 5%.

[0294] In some of these implementations, the mass percentage of phosphorus pentoxide is preferably 1% to 4%, more preferably 1% to 3%, even more preferably 1% to 2%, and even more preferably 1.2% to 1.5%.

[0295] Zirconia is an intermediate oxide in the formation of the glass-ceramic 100. It can improve the chemical stability of the glass-ceramic 100, increase its hardness, scratch resistance, and drop resistance. Simultaneously, due to its high cationic charge and strong field, zirconium dioxide has a significant accumulation effect on the structure of the glass-ceramic 100, acting as a nucleating agent. However, the introduction of a large amount of zirconium dioxide increases the viscosity of the glass-ceramic 100, affecting its molding ability. Considering the above effects, in the lithium oxide-alumina-silica system of the glass-ceramic 100 of this application embodiment, the mass percentage of zirconium dioxide can be controlled between 2% and 10%. Exemplarily, the mass percentage of zirconium dioxide in the glass-ceramic 100 can be 2%, 2.5%, 3%, 3.5%, 4%, 4.5%, 5%, 5.5%, 6%, 6.5%, 7%, 7.5%, 8%, 8.5%, 9%, 9.5%, or 10%.

[0296] In some of these implementations, the mass percentage of zirconium dioxide is preferably 2% to 9%, more preferably 3% to 8%, even more preferably 4% to 8%, and even more preferably 4% to 7%.

[0297] Sodium oxide, as an external oxide in the network formed by the glass-ceramic 100, can improve the viscosity of the glass-ceramic 100, promote the melting and clarification of the glass melt, and simultaneously, sodium oxide can also undergo ion exchange with the molten salt bath, enhancing the ion exchange capacity. However, excessive sodium oxide will reduce the chemical stability of the glass-ceramic 100 and increase the average coefficient of linear expansion. In the embodiments of this application, the mass percentage of sodium oxide can be controlled between 0% and 5%. Exemplarily, the mass percentage of sodium oxide in the glass-ceramic 100 can be 0%, 0.1%, 0.4%, 0.5%, 0.8%, 0.9%, 1%, 1.5%, 2%, 2.5%, 3%, 3.5%, 4%, 4.5%, or 5%.

[0298] In some of these implementations, the mass percentage of sodium oxide is preferably 0 to 4%, more preferably 0 to 3%, even more preferably 0 to 2%, and even more preferably 0 to 1%.

[0299] Potassium oxide helps improve the low-temperature melting and formability of the glass-ceramic 100, but excessive potassium oxide may reduce the chemical stability of the glass-ceramic 100 and increase its average coefficient of linear expansion. Considering these effects, in this embodiment, the mass percentage of potassium oxide can be controlled between 0% and 5%. For example, the mass percentage of potassium oxide in the glass-ceramic 100 can be 0%, 0.1%, 0.4%, 0.5%, 0.8%, 0.9%, 1%, 1.5%, 2%, 2.5%, 3%, 3.5%, 4%, 4.5%, or 5%.

[0300] In some of these implementations, the mass percentage of potassium oxide is preferably 0 to 4%, more preferably 0 to 3%, even more preferably 0 to 2%, and even more preferably 0 to 1%.

[0301] Boron trioxide, as a flux in the formation process of the glass-ceramic 100, can reduce the high-temperature viscosity of the glass-ceramic 100, accelerate its clarification, and reduce its crystallization ability. However, excessive boron trioxide will reduce the chemical stability and mechanical strength of the glass-ceramic 100. Considering the above effects, in the embodiments of this application, the mass percentage of boron trioxide can be controlled between 0% and 5%. For example, the mass percentage of boron trioxide in the glass-ceramic 100 can be 0%, 0.1%, 0.4%, 0.5%, 0.8%, 0.9%, 1%, 1.5%, 2%, 2.5%, 3%, 3.5%, 4%, 4.5%, or 5%.

[0302] In some of these implementations, the mass percentage of boron trioxide is preferably 0 to 4%, more preferably 0 to 3%, even more preferably 0 to 2%, and even more preferably 0 to 1%.

[0303] In some embodiments of this application, the mass percentage of the remaining components is preferably 0 to 4%, more preferably 0 to 3%, even more preferably 0 to 2%, and even more preferably 0 to 1%.

[0304] In some embodiments of this application, the remaining components may include titanium dioxide, which helps to lower the melting temperature of the glass-ceramic 100 and improve its chemical stability. In these embodiments, the mass percentage of titanium dioxide in the glass-ceramic 100 can be controlled within the range of 0% to 5%, which facilitates easier control of the crystallization process. Exemplarily, the mass percentage of titanium dioxide in the glass-ceramic 100 is 0%, 0.1%, 0.4%, 0.5%, 0.8%, 0.9%, 1%, 1.5%, 1.6%, 1.8%, 2%, 2.5%, 3%, 3.5%, 4%, 4.5%, or 5%.

[0305] In some of these implementations, the mass percentage of titanium dioxide can be 0 to 4%, 0 to 3%, 0 to 2%, or 0 to 1%.

[0306] In some embodiments of this application, the remaining components may include impurity components, and the mass percentage of the impurity components may be in the range of 0% to 5%. Exemplarily, the mass percentage of the impurity components in the glass-ceramic 100 may be 0%, 0.1%, 0.4%, 0.5%, 0.8%, 0.9%, 1%, 1.5%, 2%, 2.5%, 3%, 3.5%, 4%, 4.5%, or 5%.

[0307] In some of these implementations, the mass percentage of the impurity component can be 0 to 4%, 0 to 3%, 0 to 2%, or 0 to 1%.

[0308] It is understood that the mass percentages of the above components can be arbitrarily combined according to actual needs, as illustrated below.

[0309] For example, in some embodiments of this application, the microcrystalline glass 100 may include the following components by mass percentage:

[0310] Lithium oxide (Li2O): 10% to 13%;

[0311] Silicon dioxide (SiO2): 60% to 75%;

[0312] Alumina (Al2O3): 4% to 8%;

[0313] Phosphorus pentoxide (P2O5): 1% to 3%;

[0314] Zirconium dioxide (ZrO2): 3% to 8%;

[0315] Sodium oxide (Na2O): 0% to 2%;

[0316] Potassium oxide (K2O): 0 to 1%;

[0317] Boron trioxide (B2O3): 0% to 1%;

[0318] Other components: 0 to 3%.

[0319] For example, in other embodiments of this application, the microcrystalline glass 100 may include the following components in weight percentages:

[0320] Lithium oxide (Li2O): 8% to 15%;

[0321] Silicon dioxide (SiO2): 62% to 73%;

[0322] Alumina (Al2O3): 4% to 7%;

[0323] Phosphorus pentoxide (P2O5): 1% to 2%;

[0324] Zirconium dioxide (ZrO2): 3% to 8%;

[0325] Sodium oxide (Na2O): 0% to 4%;

[0326] Potassium oxide (K2O): 0 to 4%;

[0327] Boron trioxide (B2O3): 0 to 1%;

[0328] Other components: 0 to 4%.

[0329] For example, in other embodiments of this application, the microcrystalline glass 100 may include the following components in weight percentages:

[0330] Lithium oxide (Li2O): 11% to 12%;

[0331] Silicon dioxide (SiO2): 62% to 73%;

[0332] Alumina (Al2O3): 4% to 8%;

[0333] Phosphorus pentoxide (P2O5): 1% to 4%;

[0334] Zirconium dioxide (ZrO2): 2% to 9%;

[0335] Sodium oxide (Na2O): 0% to 1%;

[0336] Potassium oxide (K2O): 0 to 1%;

[0337] Boron trioxide (B2O3): 0 to 1%;

[0338] Other components: 0 to 3%.

[0339] It is understandable that by rationally designing the composition of the glass-ceramic 100 and coordinating with subsequent heat treatment, the target crystalline phase and the basic transmittance and haze can be produced. Different composition designs of the glass-ceramic 100 can result in the precipitation of different crystalline phases.

[0340] After introducing the structure of the microcrystalline glass 100 provided in this application, the molding method of the microcrystalline glass 100 provided in this application will be further described below with reference to the accompanying drawings.

[0341] Figure 17 A flowchart illustrating the forming process of the microcrystalline glass 100 in an embodiment of this application is shown. (Reference) Figure 17 The method for forming the microcrystalline glass 100 may include:

[0342] S110: A concave-convex structure 130 is formed on the first surface 101 of the microcrystalline glass body 140. The concave-convex structure 130 includes a plurality of protrusions 110 and a plurality of grooves 120. A groove 120 is formed in the area between any two adjacent protrusions 110, and a protrusion 110 is formed in the area between any two adjacent grooves 120.

[0343] In some feasible implementations, the uneven structure 130 can be formed by photolithography.

[0344] Specifically, Figures 18A to 18F This illustrates an exemplary process for forming the uneven structure 130 on a microcrystalline glass body 140 according to an embodiment of this application. (See reference...) Figure 18A Before forming the uneven structure 130, a microcrystalline glass body 140 needs to be obtained first. In some embodiments of this application, the raw materials of the components of the microcrystalline glass 100 can be mixed, melted and formed, and then cooled to room temperature to obtain a base glass block. Then, the base glass block is subjected to at least two heat treatments to obtain a microcrystalline glass block. The microcrystalline glass block is then thinned and polished to obtain a microcrystalline glass body 140 with suitable dimensions (e.g., thickness, length, and width) and surface roughness.

[0345] In some implementations, the raw materials corresponding to the components of the microcrystalline glass can be various forms of materials available in the glass manufacturing field, as long as they can provide the aforementioned components. For example, the aforementioned silicon dioxide can be silica sand, the aforementioned lithium oxide can be cerium oxide, alumina, aluminum hydroxide, etc., the aforementioned sodium oxide can be Na2CO3, and the aforementioned zirconium dioxide can be zirconium dioxide, zirconium silicate, etc.

[0346] In some implementations, melting involves melting various raw materials to form molten glass at temperatures ranging from 1300°C to 1600°C, such as 1300°C, 1350°C, 1400°C, 1450°C, 1500°C, 1550°C, and 1600°C. Forming is the process of transforming the molten glass into an article with a specific geometric shape. Forming methods may include, but are not limited to, casting, calendering, float glass, overflow forming, and slotted / up / down forming. This forming process can create glass blocks or sheets to be crystallized. After melting and forming, the glass is cooled to room temperature.

[0347] One of the heat treatments can be called "nucleation". Nucleation is to form a large number of crystal nuclei in the base glass block. These crystal nuclei are the basis for subsequent crystal phase growth. Appropriate treatment temperature and time can ensure that the number of crystal nuclei is moderate, laying the foundation for good subsequent crystallization.

[0348] In some of these implementations, the temperature of a single heat treatment can be from 400°C to 800°C, for example, 400°C, 450°C, 500°C, 550°C, 580°C, 600°C, 650°C, 700°C, 750°C, or 800°C.

[0349] In some of these implementations, the duration of a single heat treatment can be from 0.5 h to 8 h, for example, 0.5 h, 0.6 h, 0.7 h, 0.8 h, 0.9 h, 1 h, 1.5 h, 2 h, 2.5 h, 3 h, 3.5 h, 4 h, 4.5 h, 5 h, 5.5 h, 6 h, 6.5 h, 7 h, 7.5 h, 7.8 h, or 8 h.

[0350] In some of these implementations, secondary or higher heat treatments can be referred to as "crystallization." During crystallization, the crystal phase grows continuously, with the nuclei formed in the nucleation stage as the core, eventually forming microcrystalline glass bricks.

[0351] In some of these implementations, the temperature for secondary and subsequent heat treatments can be between 600°C and 1000°C, for example, 600°C, 650°C, 700°C, 750°C, 800°C, 850°C, 900°C, 950°C, or 1000°C.

[0352] In some implementations, the time for secondary and subsequent heat treatments can range from 1 min to 180 min, for example, 1 min, 1.5 min, 2 min, 2.5 min, 3 min, 3.5 min, 4 min, 4.5 min, 5 min, 5.5 min, 6 min, 6.5 min, 7 min, 7.5 min, 7.8 min, 1 h, 2 h, 3 h, 4 h, 5 h, 6 h, 7 h, or 8 h, etc.

[0353] In some of these implementations, primary and secondary heat treatments can be performed consecutively.

[0354] After obtaining the microcrystalline glass body 140, the concave-convex structure 130 can be formed on the microcrystalline glass body 140 by photolithography.

[0355] Specifically, refer to Figure 18B A layer of photoresist ink 150 is sprayed onto the first surface 101 of the microcrystalline glass body 140. The photoresist ink 150 is a photosensitive material that can undergo chemical changes in subsequent exposure steps to form a pattern that can protect the first surface 101.

[0356] Next, refer to Figure 18C The microcrystalline glass body 140 coated with photoresist ink 150 is exposed. During exposure, the light-receiving portion 151 of the photoresist ink 150 undergoes a chemical change, preparing it for subsequent development steps. In some embodiments of this application, the exposure method can be using a mask, which is a template with a specific pattern. During exposure, light passes through the patterned area on the mask and illuminates the photoresist ink 150, thereby achieving pattern transfer. Alternatively, in other embodiments of this application, the exposure method can be using laser direct imaging (LDI), which is an exposure technique that does not require a mask and directly uses a laser to draw patterns on the photoresist ink 150. It has the characteristics of high precision and flexibility, and can achieve more complex and fine pattern exposure.

[0357] Then, refer to Figure 18DThe exposed photoresist ink 150 is treated with a developer. After development, the light-receiving portion (not shown) of the photoresist ink 150 is dissolved and removed, thereby forming a unique graphic texture. At this point, the pattern of the photoresist ink 150 is consistent with the texture pattern that will eventually be transferred to the first surface 101 of the microcrystalline glass body 140.

[0358] Next, refer to Figure 18E The developed microcrystalline glass body 140 is then immersed in an etchant (e.g., hydrofluoric acid) for etching. Since the etchant can chemically react with the microcrystalline glass body 140, the area protected by the photoresist ink 150 will not be etched, thus transferring the patterned texture on the photoresist ink 150 to the microcrystalline glass body 140, resulting in a raised / concave structure 130.

[0359] Finally, refer to Figure 18F After etching, the remaining photoresist ink 150 is removed by stripping, ultimately yielding a microcrystalline glass body 140 with an uneven structure 130. The uneven structure 130 includes multiple protrusions 110 and multiple grooves 120. A groove 120 is formed between any two adjacent protrusions 110, and a protrusion 110 is formed between any two adjacent grooves 120. For a detailed description of the protrusions 110 and grooves 120, please refer to the above. Figure 7A and Figure 7B The relevant descriptions in the illustrated embodiments will not be repeated here.

[0360] In some embodiments of this application, the above Figures 18B to 18F The process shown can be carried out in the photolithography workshop to avoid contamination of the photoresist ink 150.

[0361] S120: Perform a first processing on the concave-convex structure 130. The first processing includes at least polishing the surface 111 of the protrusion 110. The surface of the protrusion 110 after the first processing is a smooth surface, and the arithmetic mean roughness of the surface 111 of the protrusion 110 is less than or equal to 1.5 nm.

[0362] In some feasible solutions, the above-mentioned result can be obtained by polishing the surface 111 of the protrusion 110. Figure 7A and Figure 7B The specific structure and beneficial effects of the microcrystalline glass 100 shown can be referred to the above. Figure 7A and Figure 7B The relevant descriptions in the illustrated embodiments will not be repeated here.

[0363] In some feasible solutions, the first processing may further include polishing the surface 121 of the trench 120, the surface 121 of the trench 120 after the first processing is a smooth surface, and the arithmetic mean roughness of the surface 121 of the trench 120 is less than or equal to 1.5 nm.

[0364] By polishing the surface 111 of the protrusion 110 and the surface 121 of the groove 120, the above-mentioned result can be obtained. Figure 13 The specific structure and beneficial effects of the microcrystalline glass 100 shown can be referred to the above. Figure 13 The relevant descriptions in the illustrated embodiments will not be repeated here.

[0365] In some embodiments of this application, the polishing pad used for polishing can have a Shore hardness of 5D to 60D to better achieve fine polishing at the micrometer scale, thereby obtaining the above-mentioned... Figure 7A , Figure 7B or Figure 13 The microcrystalline glass 100 shown.

[0366] In some of these implementations, the Shore hardness of the polishing pad used for polishing can be 5D, 6D, 7D, 8D, 9D, 10D, 15D, 20D, 25D, 30D, 35D, 40D, 45D, 50D, 55D, or 60D.

[0367] In some implementations, the Shore hardness of the polishing pad used for polishing is preferably 7D to 12D, preferably 7D to 18D, preferably 12D to 24D, and preferably 12D to 18D. This allows for better achievement of fine polishing at the micrometer scale.

[0368] In some embodiments of this application, the polishing pad used for polishing can be made of sponge to better achieve fine polishing at the micrometer scale, thereby obtaining the above-mentioned... Figure 7A , Figure 7B or Figure 13 The microcrystalline glass 100 shown.

[0369] In some of these implementations, the sponge can be a soft sponge, or in other words, the sponge's Shore hardness can be from 5D to 60D.

[0370] In some of these implementations, the sponge can be polyurethane sponge, polyethylene sponge, latex sponge, or neoprene sponge, etc., and this application does not impose any specific restrictions on it.

[0371] In some embodiments of this application, the particle size (or "D50") of the polishing abrasive particles can be from 0.1 μm to 5 μm to better achieve fine polishing at the micrometer scale, thereby obtaining the above-mentioned... Figure 7A , Figure 7B or Figure 13 The microcrystalline glass 100 shown is an example. The abrasive particles, also known as "abrasive media," are a type of powdery substance.

[0372] In some implementations, the particle size of the polishing abrasive particles can be 0.1μm, 0.2μm, 0.3μm, 0.4μm, 0.5μm, 0.6μm, 0.7μm, 0.8μm, 0.9μm, 1μm, 1.2μm, 1.5μm, 2μm, 2.5μm, 3μm, 3.5μm, 4μm, 4.5μm, or 5μm.

[0373] In some implementations, the particle size of the polishing abrasive particles is preferably 0.5 μm to 1.5 μm, more preferably 1 μm to 1.5 μm, more preferably 1 μm to 2.5 μm, and more preferably 0.5 μm to 2 μm. This allows for better achievement of fine polishing at the micrometer scale.

[0374] In some embodiments of this application, the polishing abrasive particles may include at least one of cerium dioxide particles, alumina particles, and silicon dioxide particles.

[0375] In some embodiments of this application, the abrasion removal amount of the polishing process can be greater than or equal to 0.3 μm, so as to better achieve fine polishing at the micron scale, which helps to simultaneously polish the protrusion 110 and the groove 120, thereby obtaining the above-mentioned... Figure 13 The microcrystalline glass 100 shown.

[0376] In some implementations, the abrasive removal amount of the polishing process can be 0.3μm, 0.4μm, 0.5μm, 0.6μm, 0.7μm, 0.8μm, 0.9μm, 1μm, 1.2μm, 1.5μm, 2μm, 2.5μm, 3μm, 3.5μm, 4μm, 4.5μm, 5μm, 5.5μm, 6μm, 6.5μm, 7μm, 7.5μm, 8μm, 8.5μm, 9μm, 9.5μm, 10μm, 10.5μm, 11μm, 11.5μm, 12μm, or 12.5μm.

[0377] In some implementations, the abrasive removal amount of the polishing process can be greater than or equal to 0.4μm, 0.5μm, 0.6μm, 0.7μm, 0.8μm, 0.9μm, 1μm, 1.2μm, 1.5μm, 2μm, 2.5μm, 3μm, 3.5μm, 4μm, 4.5μm, or 5μm.

[0378] In some implementations, the abrasion removal amount during polishing is preferably 1 μm to 2 μm, preferably 10 μm to 15 μm, preferably 5 μm to 10 μm, and preferably 3 μm to 5 μm. This allows for better achievement of fine polishing at the micrometer scale.

[0379] In some embodiments of this application, the ratio between the amount of material removed during polishing and the depth of the groove 120 before polishing can be 1 / 30 to 3 / 4, in order to better achieve fine polishing at the micrometer scale, which helps to simultaneously polish the protrusion 110 and the groove 120, thereby obtaining the above-mentioned... Figure 13 The microcrystalline glass 100 shown.

[0380] In some implementations, the ratio between the amount of material removed by polishing and the depth of the groove 120 before polishing can be 1 / 30, 1 / 25, 1 / 20, 1 / 15, 1 / 10, 1 / 6, 1 / 3, 1 / 2, or 3 / 4, etc.

[0381] In some implementations, the ratio between the amount of material removed during polishing and the depth of the groove 120 before polishing is preferably 1 / 6 to 1 / 2, more preferably 1 / 6 to 1 / 3, more preferably 1 / 10 to 1 / 6, and more preferably 1 / 3 to 1 / 2. This allows for better achievement of fine polishing at the micrometer scale.

[0382] In other embodiments of this application, the abrasion removal amount of the polishing process can also be less than 0.3 μm, thereby contributing to obtaining the above-mentioned... Figure 7A and Figure 7B The microcrystalline glass 100 shown.

[0383] In some of these implementations, the abrasion removal amount of the polishing process can be 0.25 μm, 0.2 μm, 0.15 μm, or 0.1 μm.

[0384] In some of these implementations, the amount of abrasive removal during polishing can be less than 0.25 μm, 0.2 μm, 0.15 μm, or 0.1 μm.

[0385] It is understood that the polishing process parameters can meet at least one of the above requirements to effectively improve the molding yield of the microcrystalline glass 100. Furthermore, it is understood that the above polishing process parameters can be arbitrarily combined according to actual needs, as illustrated below.

[0386] For example, in some embodiments of this application, the polishing pad for polishing can be a sponge with a Shore hardness of 12D to 24D, the abrasive particles can be cerium dioxide particles and alumina particles with a particle size of 0.5μm to 2μm, and the amount of material removed by polishing can be 1μm to 2μm.

[0387] For example, in some other embodiments of this application, the polishing pad for polishing can be a sponge with a Shore hardness of 7D to 18D, the abrasive particles can be cerium dioxide particles and alumina particles with a particle size of 1μm to 1.5μm, and the amount of abrasive removal can be 10μm to 15μm.

[0388] For example, in some other embodiments of this application, the polishing pad for polishing can be a sponge with a Shore hardness of 7D to 12D, the abrasive particles can be silica particles with a particle size of 0.5μm to 1.5μm, and the amount of material removed by polishing can be 1μm to 2μm.

[0389] In some feasible solutions, when the etching solution in S110 is hydrofluoric acid, and the first surface 101 is etched with hydrofluoric acid, the first treatment may also include ultrasonic alkaline washing treatment. That is, the concave-convex structure 130 is placed in an alkaline solution for ultrasonic alkaline washing treatment. The mass concentration of the alkaline solution can be 1% to 50%, for example, the mass concentration of the alkaline solution can be 1%, 1.5%, 2%, 2.5%, 3%, 3.5%, 4%, 4.5%, 5%, 5.5%, 6%, 6.5%, 7%, 7.5%, 8%, 8.5%, 9%, 9.5%, 10%, 15%, 20%, 25%, 30%, 35%, 40%, 45%, or 50%. In this way, the fluorosilicates generated during the etching process can be removed, thereby making the haze of the microcrystalline glass 100 lower, and thus making the microcrystalline glass 100 more transparent and having a better visual effect. The specific principle can be referred to the above description of chemical reaction equations (1) to (4), which will not be repeated here.

[0390] In some embodiments of this application, the ultrasonic tank may contain an alkaline solution. The uneven structure 130 can be placed in the alkaline solution, and then the ultrasonic tank is started to perform ultrasonic alkaline cleaning treatment on the uneven structure 130.

[0391] In some embodiments of this application, the mass concentration of the alkaline solution is preferably 5% to 10%, preferably 20% to 30%, preferably 30% to 40%, and preferably 40% to 50%. This allows for more thorough removal of fluorosilicates, further reducing the haze of the microcrystalline glass 100.

[0392] In some embodiments of this application, the acidity (or "pH value") of the alkaline solution can be greater than 13, such as 14, 15, 16 or 17.

[0393] In some embodiments of this application, the solute in the alkaline solution may include at least one of sodium hydroxide or potassium hydroxide.

[0394] In some embodiments of this application, the ultrasonic frequency of the ultrasonic alkaline washing treatment can be from 40kHz to 100kHz, so as to remove fluorosilicates more thoroughly and further reduce the haze of the microcrystalline glass 100.

[0395] In some of these implementations, the ultrasonic frequency of the ultrasonic alkaline washing process can be 40kHz, 50kHz, 60kHz, 70kHz, 80kHz, 90kHz, or 100kHz.

[0396] In some implementations, the ultrasonic frequency of the ultrasonic alkaline washing treatment is preferably 50kHz to 60kHz, preferably 40kHz to 60kHz, preferably 60kHz to 80kHz, and preferably 80kHz to 100kHz. This allows for more thorough removal of fluorosilicates, further reducing the haze of the microcrystalline glass 100.

[0397] In some embodiments of this application, the ultrasonic alkaline washing treatment time can be greater than or equal to 30 seconds, so that fluorosilicates can be removed more thoroughly and the haze of the microcrystalline glass 100 can be further reduced.

[0398] In some of these implementations, the ultrasonic alkaline washing treatment time is 30s, 35s, 40s, 45s, 50s, 55s, 60s, 65s, 70s, 75s, 80s, 85s, 90s, 95s, or 100s.

[0399] In some of these implementations, the ultrasonic alkaline washing treatment time can be greater than or equal to 30s, 35s, 40s, 45s, 50s, 55s, 60s, 65s, 70s, 75s, 80s, 85s, 90s, 95s, or 100s.

[0400] In some implementations, the ultrasonic alkaline washing treatment time is preferably 180s to 240s, more preferably 240s to 300s, more preferably 300s to 600s, and more preferably 600s to 900s. This allows for more thorough removal of fluorosilicates, further reducing the haze of the microcrystalline glass 100.

[0401] It is understood that the process parameters for ultrasonic alkaline washing can meet at least one of the above requirements to effectively improve the forming yield of glass-ceramic 100. Furthermore, it is understood that the above-mentioned process parameters for ultrasonic alkaline washing can be arbitrarily combined according to actual needs, as illustrated below.

[0402] For example, in some embodiments of this application, the mass concentration of the alkaline solution used in the ultrasonic alkaline washing treatment can be 20% to 30%, the ultrasonic frequency can be 80kHz to 100kHz, and the treatment time can be 180s to 240s.

[0403] For example, in some other embodiments of this application, the mass concentration of the alkaline solution used in the ultrasonic alkaline washing treatment can be 5% to 10%, the ultrasonic frequency can be 40kHz to 60kHz, and the treatment time can be 240s to 300s.

[0404] For example, in some other embodiments of this application, the mass concentration of the alkaline solution used in the ultrasonic alkaline washing treatment can be 5% to 10%, the ultrasonic frequency can be 60kHz to 80kHz, and the treatment time can be 300s to 600s.

[0405] It should be noted that this application does not specify the order of the polishing treatment and the ultrasonic alkaline washing treatment in the first process.

[0406] In some implementations, the concave-convex structure 130 can be polished first, for example, the surface of the protrusion 110 of the concave-convex structure 130 can be polished, or the protrusion 110 and the groove 120 of the concave-convex structure 130 can be polished together; then, the polished concave-convex structure 130 can be placed in an alkaline solution for ultrasonic alkaline washing.

[0407] In some other implementations, the concave-convex structure 130 may first be placed in an alkaline solution for ultrasonic alkaline washing; then the concave-convex structure 130 may be polished, for example, the surface of the protrusion 110 of the concave-convex structure 130 may be polished, or the protrusion 110 and the groove 120 of the concave-convex structure 130 may be polished together.

[0408] The above-described forming method, by performing a first treatment on the uneven structure 130, can effectively improve the visual effect of the glass-ceramic 100. Simultaneously, a more feasible method (e.g., etching) can be flexibly selected according to actual needs to form the uneven structure 130, thereby improving the forming yield.

[0409] To provide a more intuitive understanding of the molding process of the microcrystalline glass 100, an exemplary description is provided below with reference to the accompanying drawings.

[0410] Figure 19 according to Figure 17 A block diagram of a molded microcrystalline glass 100 according to an embodiment of this application is shown. (See reference...) Figure 19 First, the microcrystalline glass body 140 can be obtained.

[0411] Then, a raised / lowered structure 130 is formed on the microcrystalline glass body 140. Specifically, the microcrystalline glass body 140 is subjected to processes such as spraying photoresist ink 150, patterning exposure, development, and hydrofluoric acid etching to obtain the raised / lowered structure 130. The specific process can be referred to S110 and above. Figures 18A to 18F The relevant descriptions in the illustrated embodiments will not be repeated here.

[0412] Next, the concave-convex structure 130 is subjected to a first treatment, which may include polishing and ultrasonic alkaline washing. The polishing treatment includes polishing the surface 111 of the protrusion 110 and polishing the surface 121 of the groove 120. For details, please refer to the relevant description in S120 above, which will not be repeated here.

[0413] Continue to refer to Figure 19 In some embodiments of this application, the glass-ceramic 100 can also be post-processed to further optimize its performance, appearance, and applicability. For example, the glass-ceramic 100 can be cut to form specific dimensions and properties; or, the glass-ceramic 100 can be drilled to meet assembly or other functional requirements. This application does not impose specific limitations on these aspects.

[0414] It is worth noting that the above Figure 19 This is merely one example of a molding process; that is, although Figure 19 The diagram illustrates multiple steps required to mold the microcrystalline glass 100, including obtaining the microcrystalline glass body 140, spraying photoresist ink 150, patterning exposure, development, hydrofluoric acid etching, polishing, ultrasonic alkaline washing, and post-processing. However, in practical applications, the steps for molding the microcrystalline glass 100 may only include the above-mentioned steps. Figure 19 In the illustrated embodiment, some steps, such as the first treatment, may only include polishing and exclude ultrasonic alkaline cleaning. For ease of observation, Figure 19 The nature of the optional processes is outlined with a dashed line.

[0415] The following describes in more illustrative ways the microcrystalline glass 100 provided in this application is formed using multiple embodiments.

[0416] Table 1

[0417]

[0418] Table 1 (continued)

[0419]

[0420] Table 1 (continued)

[0421]

[0422] The following will first refer to Table 1 above and Figure 19 Comparative Examples 1, 2, and 3 are introduced. The main difference between them is that Comparative Example 1 does not include the first treatment, Comparative Example 2 includes the ultrasonic alkaline washing treatment in the first treatment but does not include the polishing treatment, and Comparative Example 3 includes both the ultrasonic alkaline washing treatment and the polishing treatment in the first treatment.

[0423] For Comparative Example 1, firstly, a microcrystalline glass body 140 can be obtained.

[0424] Specifically, the microcrystalline glass body 140 may include the following components by mass percentage: 70% silicon dioxide, 7.5% aluminum oxide, 11.5% lithium oxide, 0.9% sodium oxide, 0.1% potassium oxide, 5.5% zirconium dioxide, 2.5% phosphorus pentoxide, 0.4% boron trioxide, and the remaining components 1.6%. The components in these mass percentages can be mixed, ball-milled, melted, and cast into a basic glass block. The basic glass block undergoes a first heat treatment at 540°C for 10 hours; followed by a second heat treatment at 670°C for 1.5 hours, thus forming the microcrystalline glass block. The main crystalline phases of the microcrystalline glass block can be lithium disilicate and lithium feldspar, and the crystallinity of the microcrystalline glass block can be 90%, or in other words, the mass percentage of the crystalline phases in the microcrystalline glass block can be 90%. By cutting microcrystalline glass bricks with diamond wire, rough polishing with diamond abrasive pads, and grinding with polyurethane abrasive, square sheets with a thickness of 0.6 mm, a length of 50 mm, and a width of 50 mm can be obtained, ultimately forming the microcrystalline glass body 140.

[0425] Then, a textured structure 130 is formed on the microcrystalline glass body 140.

[0426] Specifically, the raised / concave structure 130 is designed as a linear stripe pattern, or in other words, the raised / concave structure 130 can be considered as a linear array (corresponding to "linear" in Table 1 above). A negative photoresist ink 150, such as TP-H200311 acid-resistant photoresist, is sprayed onto the microcrystalline glass body 140. Exposure is then performed using a laser direct imaging device, expanding from the center of a 50mm × 50mm square sheet towards the edges. The light source wavelength can be 365nm, the exposure energy can be 250mJ, the exposure line width (corresponding to "line width" in Table 1 above) can be 150μm, and the exposure line spacing (corresponding to "line spacing" in Table 1 above) can be 150μm, in a periodic array design. After exposure, an alkaline developer containing sodium carbonate (Na2CO3) can be used to remove the exposed areas, thus forming a pattern. Next, etching is performed using an etchant, which may include the following components in weight percentages: 5% to 10% hydrofluoric acid, 45% to 55% sulfuric acid (H2SO4), 5% to 10% nitric acid (HNO3), and 5% to 10% citric acid. The etching time can be 10 minutes, and the etching depth (corresponding to "depth" in Table 1 above) can be 12 μm. The pattern is then transferred to the microcrystalline glass body 140 to form a textured structure 130.

[0427] The microcrystalline glass 100 obtained through the process described in Comparative Example 1 has a transmittance of 87.9% for light with a wavelength of 550nm, a haze of 7.8%, and an arithmetic mean surface roughness of 5.8nm for the uneven structure 130. White light testing revealed that the cross-sectional shapes of the protrusions 110 and grooves 120 are similar to rough, sharp trapezoids, with burrs at the edges. Under a point light source, clear light and shadow pitting and breakpoint phenomena can be seen in the microcrystalline glass 100. For details, please refer to the above description. Figures 4A to 6B The relevant descriptions in the illustrated scheme will not be repeated here.

[0428] For Comparative Example 2, firstly, a microcrystalline glass body 140 can be obtained, as detailed in Comparative Example 1 above. However, unlike Comparative Example 1, in Comparative Example 2, the temperature of the first heat treatment can be 580℃, and the temperature of the second heat treatment can be 690℃.

[0429] Then, a textured structure 130 is formed on the microcrystalline glass body 140, as detailed in Comparative Example 1 above. However, unlike Comparative Example 1, in Comparative Example 2, the exposure line distance can be 200 μm, the etching time can be 6 min, and the etching depth can be 6 μm.

[0430] Next, the concave-convex structure 130 is subjected to ultrasonic alkaline washing treatment in the first process. The solute of the alkaline solution includes sodium hydroxide, the mass concentration of the alkaline solution is 40%, the temperature of the alkaline solution is 80°C, the ultrasonic frequency of the ultrasonic alkaline washing treatment can be 40kHz, and the treatment time of the ultrasonic alkaline washing treatment can be 40s.

[0431] Compared to Comparative Example 1, the microcrystalline glass 100 formed through the process in Comparative Example 2 shows an increase in transmittance of light with a wavelength of 550nm from 87.9% to 89.8%, a decrease in haze from 7.8% to 1%, and a decrease in the arithmetic mean roughness of the surface of the uneven structure 130 from 5.8nm to 1.5nm. White light testing revealed that the cross-sectional shapes of the protrusions 110 and grooves 120 are similar to relatively flat trapezoids, with burrs at the edges. Under a point light source, light-shadow pitting and breakage phenomena can be observed in the microcrystalline glass 100.

[0432] It is evident that ultrasonic alkaline washing can effectively improve the transmittance of the microcrystalline glass 100 and reduce its haze, thereby improving the problems of etching haze and fogging in the microcrystalline glass 100, making it more transparent and with better visual effects.

[0433] For Comparative Example 3, firstly, a microcrystalline glass body 140 can be obtained, as detailed in Comparative Example 1 above. However, unlike Comparative Example 1, in Comparative Example 3, the temperature of the first heat treatment can be 580℃, and the temperature of the second heat treatment can be 690℃.

[0434] Then, a textured structure 130 is formed on the microcrystalline glass body 140, as detailed in Comparative Example 1 above. However, unlike Comparative Example 1, in Comparative Example 3, the exposure line width can be 50 μm, the exposure line distance can be 50 μm, the etching time can be 6 min, and the etching depth can be 6 μm.

[0435] Next, the concave-convex structure 130 is subjected to ultrasonic alkaline cleaning and polishing treatments in the first process. This application does not specify the order of ultrasonic alkaline cleaning and polishing treatments.

[0436] The solute in the alkaline solution includes potassium hydroxide, the mass concentration of the alkaline solution can be 10%, the temperature of the alkaline solution can be 80℃, the ultrasonic frequency of the ultrasonic alkaline washing treatment can be 100kHz, and the treatment time of the ultrasonic alkaline washing treatment can be 600s.

[0437] The polishing process is performed on the surface 111 of the protrusion 110 of the uneven structure 130. The polishing pad is a sponge with a Shore hardness of 7D. The abrasive particles include cerium dioxide particles, alumina particles and silicon dioxide particles. The particle size of the abrasive particles is 1.2μm. The polishing time is 1min. The amount of material removed by polishing is 0.2μm.

[0438] Compared to Comparative Examples 1 and 2, the microcrystalline glass 100 formed through the process in Comparative Example 3 exhibits an increased transmittance of 90.2% for light with a wavelength of 550 nm, a reduced haze of 0.8%, and a reduced arithmetic mean roughness of the surface of the uneven structure 130 to 1.2 nm. White light testing revealed that the cross-sectional shape of the protrusion 110 is similar to a semi-chord shape with some serrations at the edges. Under a point light source, the microcrystalline glass 100 exhibits localized light and shadow pitting and breakpoint phenomena.

[0439] It can be seen that by polishing the surface 111 of the protrusion 110, the problems of pitting and breakage of the light source can be effectively improved, while the transmittance of the microcrystalline glass 100 is increased and the haze of the microcrystalline glass 100 is reduced, thereby improving the problems of etching haze and fogging of the microcrystalline glass 100, making the microcrystalline glass 100 more transparent and with better visual effect.

[0440] In summary, by performing the first treatment on the concave-convex structure 130, the visual effect of the microcrystalline glass 100 can be effectively improved.

[0441] The following continues to combine Table 1 and... Figure 19 Examples 1 to 10 are introduced. The main difference between the examples is that the microcrystalline glass 100 includes different component formulations, or in other words, the microcrystalline glass body 140 includes different component formulations.

[0442] For Example 1, firstly, a microcrystalline glass body 140 can be obtained, as detailed in Comparative Example 3 above. Unlike Comparative Example 3, the composition of the microcrystalline glass body 140 in Example 1 is different, as detailed in Table 1 above. The first heat treatment temperature can be 550°C, and the first heat treatment time can be 6 hours; the second heat treatment temperature can be 680°C, and the second heat treatment time can be 2 hours. The main crystalline phase of the microcrystalline glass block can be lithium silicate, with a crystallinity of 30%.

[0443] Then, a textured structure 130 is formed on the microcrystalline glass body 140, as detailed in Comparative Example 3 above. However, unlike Comparative Example 3, in Example 1, the width of the exposure lines can be 150 μm, and the distance between the exposure lines can be 150 μm.

[0444] Next, the uneven structure 130 undergoes a first treatment, as detailed in Comparative Example 3 above. However, unlike Comparative Example 3, in Example 1, the mass concentration of the alkaline solution used for ultrasonic alkaline washing can be 50%, and the treatment time can be 30 seconds. The polishing treatment involves polishing the surface 111 of the protrusion 110 and the surface 121 of the groove 120 of the uneven structure 130. The polishing pad can be a polyurethane sponge with a Shore hardness of 40D, the particle size of the abrasive particles can be 5 μm, the polishing time can be 8 minutes, and the amount of material removed by polishing can be 0.5 μm.

[0445] The microcrystalline glass 100 obtained by the process in Example 1 above has a transmittance of 90.3% for light with a wavelength of 550nm, a haze of 0.55%, and an arithmetic mean roughness of 1.2nm on the surface of the uneven structure 130. White light testing revealed that the cross-sectional shape of the uneven structure 130 is similar to a chord shape with smooth edges, and the light and shadow of the microcrystalline glass 100 under a point light source are smooth.

[0446] For Example 2, firstly, a microcrystalline glass body 140 can be obtained, as detailed in Example 1 above. However, unlike Example 1, the composition of the microcrystalline glass body 140 in Example 2 is different, as detailed in Table 1 above.

[0447] Then, a textured structure 130 is formed on the microcrystalline glass body 140, as described in Example 1 above. However, unlike Example 1, in Example 2, the exposure line width can be 50 μm, and the exposure line distance can be 50 μm.

[0448] Next, the uneven structure 130 undergoes a first treatment, as detailed in Example 1 above. However, unlike Example 1, in Example 2, the mass concentration of the alkaline solution used for ultrasonic alkaline washing can be 40%, the solute in the alkaline solution can be sodium hydroxide, the ultrasonic frequency can be 40 kHz, and the treatment time can be 60 seconds. For the polishing treatment, the polishing pad can be a sponge with a Shore hardness of 7D, the abrasive particles can be silica particles with a particle size of 0.1 μm, the polishing time can be 120 minutes, and the amount of material removed during polishing can be 1 μm.

[0449] The microcrystalline glass 100 obtained by the process in Example 2 above has a transmittance of 90.3% for light with a wavelength of 550nm, a haze of 0.58%, and an arithmetic mean roughness of 0.5nm on the surface of the uneven structure 130. White light testing revealed that the cross-sectional shape of the uneven structure 130 is similar to a chord shape with smooth edges, and the light and shadow of the microcrystalline glass 100 under a point light source are smooth.

[0450] For Example 3, firstly, a microcrystalline glass body 140 can be obtained, as detailed in Example 1 above. However, unlike Example 1, the composition of the microcrystalline glass body 140 in Example 3 is different, as detailed in Table 1 above.

[0451] Then, a concave-convex structure 130 is formed on the microcrystalline glass body 140, as can be seen in the above embodiment 1.

[0452] Next, the uneven structure 130 undergoes a first treatment, as detailed in Example 1 above. However, unlike Example 1, in Example 3, the mass concentration of the alkaline solution used for ultrasonic alkaline washing can be 30%, the ultrasonic frequency can be 80kHz, and the treatment time can be 120s. The polishing pad for polishing can be a soft sponge with a Shore hardness of 18D, the abrasive particles can be cerium dioxide particles and alumina particles, the particle size can be 1.5μm, the polishing time can be 20min, and the amount of material removed during polishing can be 1.2μm.

[0453] The microcrystalline glass 100 obtained by the process in Example 3 above has a transmittance of 90.2% for light with a wavelength of 550nm, a haze of 0.25%, and an arithmetic mean roughness of 0.5nm on the surface of the uneven structure 130. White light testing revealed that the cross-sectional shape of the uneven structure 130 is similar to a chord shape with smooth edges, and the light and shadow of the microcrystalline glass 100 under a point light source are smooth.

[0454] For Example 4, firstly, a microcrystalline glass body 140 can be obtained, as detailed in Example 1 above. The difference from Example 1 is that the composition of the microcrystalline glass body 140 in Example 4 is different, as detailed in Table 1 above. The first heat treatment temperature can be 580°C, and the second heat treatment temperature can be 700°C. The main crystalline phases of the microcrystalline glass block include lithium disilicate and lithium feldspar, with a crystallinity of 90%.

[0455] Then, a concave-convex structure 130 is formed on the microcrystalline glass body 140, as can be seen in the above embodiment 1.

[0456] Next, the uneven structure 130 undergoes a first treatment, as detailed in Example 1 above. However, unlike Example 1, in Example 4, the mass concentration of the alkaline solution used for ultrasonic alkaline washing can be 20%, and the treatment time can be 180 seconds. The polishing pad for polishing can be a soft sponge with a Shore hardness of 18D, and the abrasive particles used can be cerium dioxide and alumina particles with a particle size of 1.5 μm. The polishing time is 25 minutes, and the amount of material removed during polishing is 0.6 μm.

[0457] The microcrystalline glass 100 obtained by the process in Example 4 above has a transmittance of 90.3% for light with a wavelength of 550nm, a haze of 0.55%, and an arithmetic mean roughness of 1nm on the surface of the uneven structure 130. White light testing revealed that the cross-sectional shape of the uneven structure 130 is similar to a chord shape with smooth edges, and the light and shadow of the microcrystalline glass 100 under a point light source are smooth.

[0458] For Example 5, firstly, a microcrystalline glass body 140 can be obtained, as detailed in Example 1 above. The difference from Example 1 is that the composition of the microcrystalline glass body 140 in Example 5 is different, as detailed in Table 1 above. The first heat treatment temperature can be 580°C, and the second heat treatment temperature can be 700°C. The main crystalline phases of the microcrystalline glass block include lithium disilicate and lithium feldspar, with a crystallinity of 90%.

[0459] Then, a concave-convex structure 130 is formed on the microcrystalline glass body 140, as can be seen in the above embodiment 1.

[0460] Next, the uneven structure 130 undergoes a first treatment, as detailed in Example 1 above. However, unlike Example 1, in Example 5, the mass concentration of the alkaline solution used for ultrasonic alkaline washing is 10%, the ultrasonic frequency is 40kHz, and the treatment time is 300s. The polishing pad for polishing is a soft sponge with a Shore hardness of 18D, and the abrasive particles are cerium dioxide and alumina particles with a particle size of 1.2μm. The polishing time is 12min, and the amount of material removed during polishing is 0.7μm.

[0461] The microcrystalline glass 100 obtained by the process in Example 5 above has a transmittance of 90.8% for light with a wavelength of 550nm, a haze of 0.32%, and an arithmetic mean roughness of 0.7nm on the surface of the uneven structure 130. White light testing revealed that the cross-sectional shape of the uneven structure 130 is similar to a chord shape with smooth edges, and the light and shadow of the microcrystalline glass 100 under a point light source are smooth.

[0462] For Example 6, firstly, a microcrystalline glass body 140 can be obtained, as detailed in Example 1 above. The difference from Example 1 is that the composition of the microcrystalline glass body 140 in Example 6 is different, as detailed in Table 1 above. The first heat treatment temperature can be 580°C, and the second heat treatment temperature can be 700°C. The main crystalline phases of the microcrystalline glass block include lithium disilicate, lithium feldspar, and quartz, with a crystallinity of 90%.

[0463] Then, a concave-convex structure 130 is formed on the microcrystalline glass body 140, as can be seen in the above embodiment 1.

[0464] Next, the uneven structure 130 undergoes a first treatment, as detailed in Example 1 above. However, unlike Example 1, in Example 6, the mass concentration of the alkaline solution used for ultrasonic alkaline washing is 10%, the ultrasonic frequency is 40kHz, and the treatment time is 600s. The polishing pad for polishing is a soft sponge with a Shore hardness of 12D, and the abrasive particles are cerium dioxide and alumina particles with a particle size of 1.2μm. The polishing time is 25min, and the amount of material removed during polishing is 2μm.

[0465] The microcrystalline glass 100 obtained by the process in Example 6 above has a transmittance of 90.3% for light with a wavelength of 550nm, a haze of 0.35%, and an arithmetic mean roughness of 0.4nm on the surface of the uneven structure 130. White light testing revealed that the cross-sectional shape of the uneven structure 130 is similar to a chord shape with smooth edges, and the light and shadow of the microcrystalline glass 100 under a point light source are smooth.

[0466] For Example 7, firstly, a microcrystalline glass body 140 can be obtained, as detailed in Example 1 above. The difference from Example 1 is that the composition of the microcrystalline glass body 140 in Example 7 is different, as detailed in Table 1 above. The first heat treatment temperature can be 580°C, and the second heat treatment temperature can be 700°C. The main crystalline phases of the microcrystalline glass block include lithium disilicate and lithium feldspar, with a crystallinity of 90%.

[0467] Then, a textured structure 130 is formed on the microcrystalline glass body 140, as described in Example 1 above. However, unlike Example 1, in Example 7, the textured structure 130 is designed as a concentric ring, or in other words, the textured structure 130 can be considered as a concentric array of circles. The etching time is 35 minutes, and the etching depth is 30 μm.

[0468] Next, the uneven structure 130 undergoes a first treatment, as detailed in Example 1 above. However, unlike Example 1, in Example 7, the mass concentration of the alkaline solution used for ultrasonic alkaline washing is 5%, the ultrasonic frequency is 40kHz, and the treatment time is 600s. For polishing, the polishing pad can be a soft sponge with a Shore hardness of 12D, the abrasive particles can be cerium dioxide and alumina particles, the particle size can be 1.2μm, the polishing time can be 90min, and the amount of material removed during polishing can be 12μm.

[0469] The microcrystalline glass 100 obtained by the process in Example 7 above has a transmittance of 91% for light with a wavelength of 550nm, a haze of 0.25%, and an arithmetic mean roughness of 0.6nm on the surface of the uneven structure 130. White light testing revealed that the cross-sectional shape of the uneven structure 130 is similar to a chord shape with smooth edges, and the light and shadow of the microcrystalline glass 100 under a point light source are smooth.

[0470] For Example 8, firstly, a microcrystalline glass body 140 can be obtained, as detailed in Example 1 above. The difference from Example 1 is that the composition of the microcrystalline glass body 140 in Example 8 is different, as detailed in Table 1 above. The first heat treatment temperature can be 580°C, and the second heat treatment temperature can be 700°C. The main crystalline phases of the microcrystalline glass block include lithium disilicate and lithium feldspar, with a crystallinity of 90%.

[0471] Then, a textured structure 130 is formed on the microcrystalline glass body 140, as described in Example 1 above. Unlike Example 1, in Example 8, the textured structure 130 is designed as a concentric ring, or in other words, the textured structure 130 can be considered as a concentric array. The etching time is 40 seconds, and the etching depth is 0.5 μm.

[0472] Next, the uneven structure 130 undergoes a first treatment, as detailed in Example 1 above. However, unlike Example 1, in Example 8, the mass concentration of the alkaline solution used for ultrasonic alkaline washing is 1%, the ultrasonic frequency is 40 kHz, and the treatment time is 6000 s. The polishing pad for polishing is a soft sponge with a Shore hardness of 12D, and the abrasive particles are cerium dioxide and alumina particles with a particle size of 1.2 μm. The polishing time is 3 min, and the amount of material removed during polishing is 0.3 μm.

[0473] The microcrystalline glass 100 obtained by the process in Example 8 above has a transmittance of 89.9% for light with a wavelength of 550nm, a haze of 0.9%, and an arithmetic mean roughness of 0.9nm on the surface of the uneven structure 130. White light testing revealed that the cross-sectional shape of the uneven structure 130 is similar to a chord shape with smooth edges, and the light and shadow of the microcrystalline glass 100 under a point light source are smooth.

[0474] For Example 9, firstly, a microcrystalline glass body 140 can be obtained, as detailed in Example 1 above. The difference from Example 1 is that the composition of the microcrystalline glass body 140 in Example 9 is different, as detailed in Table 1 above. The first heat treatment temperature can be 580°C, and the second heat treatment temperature can be 700°C. The main crystalline phases of the microcrystalline glass block include lithium disilicate and lithium feldspar, with a crystallinity of 90%.

[0475] Then, a concave-convex structure 130 is formed on the microcrystalline glass body 140, as described in Embodiment 1 above. Unlike Embodiment 1, in Embodiment 9, the concave-convex structure 130 is designed as a concentric ring, or in other words, the concave-convex structure 130 can be regarded as a concentric array of circles.

[0476] Next, the uneven structure 130 undergoes a first treatment, which can be referred to in Example 1 above. However, unlike Example 1, in Example 9, the mass concentration of the alkaline solution used for ultrasonic alkaline washing can be 10%, the solute in the alkaline solution is sodium hydroxide, the ultrasonic frequency is 40kHz, and the treatment time is 600s. For polishing, the polishing pad can be a soft sponge with a Shore hardness of 18D, the abrasive particles can be cerium dioxide particles and alumina particles, the particle size can be 1.2μm, the polishing time can be 12min, and the amount of material removed by polishing can be 0.9μm.

[0477] The microcrystalline glass 100 obtained by the process in Example 9 above has a transmittance of 91.2% for light with a wavelength of 550nm, a haze of 0.25%, and an arithmetic mean roughness of 0.5nm on the surface of the uneven structure 130. White light testing revealed that the cross-sectional shape of the uneven structure 130 is similar to a chord shape with smooth edges, and the light and shadow of the microcrystalline glass 100 under a point light source are smooth.

[0478] For Example 10, firstly, a microcrystalline glass body 140 can be obtained, as detailed in Example 1 above. The difference from Example 1 is that the composition of the microcrystalline glass body 140 in Example 10 is different, as detailed in Table 1 above. The first heat treatment temperature can be 580°C, and the second heat treatment temperature can be 700°C. The main crystalline phases of the microcrystalline glass block include lithium disilicate and petalite, with a crystallinity of 90%.

[0479] Then, a concave-convex structure 130 is formed on the microcrystalline glass body 140, as described in Embodiment 1 above. Unlike Embodiment 1, in Embodiment 10, the concave-convex structure 130 is designed as a concentric ring, or in other words, the concave-convex structure 130 can be regarded as a concentric array of circles.

[0480] Next, the uneven structure 130 undergoes a first treatment, which can be referred to in Example 1 above. However, unlike Example 1, in Example 9, the mass concentration of the alkaline solution used for ultrasonic alkaline washing can be 10%, the ultrasonic frequency for ultrasonic alkaline washing is 40kHz, and the treatment time for ultrasonic alkaline washing can be 600s; the polishing pad for polishing can be a soft sponge with a Shore hardness of 18D, the abrasive particles for polishing can be cerium dioxide particles and alumina particles, the particle size of the abrasive particles can be 1.2μm, the polishing time can be 25min, and the amount of material removed by polishing can be 2μm.

[0481] The microcrystalline glass 100 obtained by the process in Example 10 above has a transmittance of 91.4% for light with a wavelength of 550nm, a haze of 0.4%, and an arithmetic mean roughness of 0.2nm on the surface of the uneven structure 130. White light testing revealed that the cross-sectional shape of the uneven structure 130 is similar to a chord shape with smooth edges, and the light and shadow of the microcrystalline glass 100 under a point light source are smooth.

[0482] It should be noted that the above comparative examples 1 to 3 and examples 1 to 10 are merely exemplary descriptions of the technical solutions of this application. Those skilled in the art can make other modifications. For example, the composition of the microcrystalline glass 100, the mass concentration, solute type and treatment time of the alkaline solution for ultrasonic alkaline washing, and the parameters such as the type of polishing pad and abrasive particles and the amount of material removed during polishing can be changed. This application does not impose specific limitations in these regard.

[0483] Based on the above Figure 7A The microcrystalline glass 100 shown in Figure 16, and the above-mentioned Figures 17 to 19 The microcrystalline glass 100 obtained by the molding method shown is also described in this application as a microcrystalline glass article, which will be exemplarily described below with reference to the accompanying drawings.

[0484] Figure 20 An exemplary structure of a microcrystalline glass article 10 according to an embodiment of this application is shown. (Reference) Figure 20 The microcrystalline glass article 10 may include a substrate 200, which may be made of microcrystalline glass 100. Figure 20 In the illustrated embodiment, the microcrystalline glass 100 is similar to the one described above. Figure 7A and Figure 7B The microcrystalline glass 100 in the illustrated embodiment is substantially the same, but this is only an illustration. In reality, the microcrystalline glass 100 can be as described above. Figures 7A to 16B Any of the microcrystalline glass 100 in the embodiments shown, or the microcrystalline glass 100 may be made using the methods described above. Figures 17 to 19 The microcrystalline glass 100 obtained by any of the molding methods in the illustrated embodiments can therefore be referred to the above. Figures 7A to 19 The relevant descriptions in the illustrated embodiments will not be repeated here.

[0485] In some embodiments of this application, the microcrystalline glass article may further include a functional film layer 300, which may be disposed on the substrate 200 to achieve different functions.

[0486] In some implementations, the functional film layer 300 can be an anti-fingerprint (AF) layer, an anti-reflective (AR) layer, an anti-scratch (AS) layer, or colored ink deposited on the substrate 200. Alternatively, the functional film layer can also be other types of decorative films, and this application does not impose specific limitations on this. Specifically, the anti-fingerprint layer reduces the probability of users' fingers leaving dirt on the surface of the microcrystalline glass product 10, ensuring a cleaner surface; the anti-reflective layer reduces light reflection by the microcrystalline glass product 10; the anti-scratch layer improves the scratch resistance of the microcrystalline glass product 10; the colored ink allows the microcrystalline glass product 10 to have rich colors, improving its decorative properties; and the decorative film enhances the aesthetics of the microcrystalline glass product 10.

[0487] It should be noted that the type, quantity, and orientation of the functional membrane layer 300 can be set according to actual functional requirements, and this application does not impose specific restrictions on this.

[0488] For example, in Figure 20 In the illustrated embodiment, the number of functional film layers 300 can be two, with the two functional film layers 300 respectively disposed on opposite sides of the substrate 200 along the Z1 direction. One functional film layer 300 can be an anti-fingerprint layer; the other functional film layer 300 can be a decorative film, a coated structure, or a colored ink. In other embodiments, the number of functional film layers 300 can also be one, three, four, or five, etc., and each functional film layer 300 can be stacked on the substrate 200. The types of each functional film layer 300 can be the same or different.

[0489] The aforementioned microcrystalline glass product 10, the combination of the concave-convex structure 130 of the microcrystalline glass 100 and the functional film layer 300 can jointly form the specific color-material-finish (CMF) design language of the microcrystalline glass product 10. When the microcrystalline glass product 10 is applied to electronic devices, it can enable the electronic devices to achieve a balance and aesthetics in terms of vision, touch and performance.

[0490] It should be noted that the above Figure 20 The illustrations are merely illustrative of this application and do not represent the actual size of the product. Furthermore, the thickness of each film layer and the proportional relationship between the thicknesses of each film layer in the illustrations are not intended to limit the actual product of this application.

[0491] This application also provides an electronic device, which may include electronic components and a housing. The electronic components are disposed within the housing, and the housing may include a microcrystalline glass product. The microcrystalline glass product may be as described above. Figure 20The microcrystalline glass article 10 in the illustrated embodiment can therefore be referred to the above. Figure 20 The relevant descriptions in the illustrated embodiments will not be repeated here.

[0492] In some embodiments of this application, the housing may include a back cover, a display screen cover, and a camera decorative cover, wherein one or more of the back cover, display screen cover, and camera decorative cover include the microcrystalline glass article 10 described above. It is understood that the back cover, display screen cover, and camera decorative cover can be specifically referred to in the above description. Figure 1A and Figure 1B The descriptions of the back cover 12a, the display cover 13a, and the camera decorative cover 15a in the illustrated embodiment will not be repeated here.

[0493] The above description illustrates the implementation of this application through specific embodiments. Those skilled in the art can easily understand other advantages and effects of this application from the content disclosed in this specification. Although the description of this application is presented in conjunction with some embodiments, this does not mean that the features of this application are limited to these embodiments, and this application can also be implemented without using these details. Furthermore, to avoid confusion or obscuring the focus of this application, some specific details have been omitted in the description. It should be noted that, unless otherwise specified, the embodiments and features in the embodiments of this application can be combined with each other.

[0494] In the description of this application, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "outer", "inner", "circumferential", "radial", "axial", etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this application.

[0495] In the description of this application, it should be noted that, unless otherwise expressly specified and limited, the terms "set," "install," "connect," and "fit" should be interpreted broadly. For example, they can refer to fixed connections, detachable connections, or integral connections; they can refer to mechanical connections or electrical connections; they can refer to direct connections or indirect connections through an intermediate medium; and they can refer to the internal communication between two components. Those skilled in the art can understand the specific meaning of the above terms in this application based on the specific circumstances.

Claims

1. A microcrystalline glass (100), characterized in that, It includes multiple grooves (120) and multiple protrusions (110), with the area between any two adjacent grooves (120) forming the protrusion (110) and the area between any two adjacent protrusions (110) forming the groove (120). The surface (111) of the protrusion (110) is a smooth surface, and the arithmetic mean roughness of the surface (111) of the protrusion (110) is less than or equal to 1.5 nm. The haze of the microcrystalline glass (100) is less than or equal to 1%, the transmittance of the microcrystalline glass (100) for light with a wavelength of 550 nm is greater than or equal to 89%, and the mass percentage of the crystalline phase in the microcrystalline glass (100) is greater than or equal to 30%.

2. The microcrystalline glass (100) according to claim 1, characterized in that, The parameters of the microcrystalline glass (100) must satisfy at least one of the following: The arithmetic mean roughness of the surface (111) of the protrusion (110) is preferably 0.5 nm to 1 nm, preferably 0.5 nm to 0.7 nm, preferably 0.3 nm to 0.7 nm, and preferably 0.3 nm to 1.2 nm. The haze of the microcrystalline glass (100) is preferably 0.18% to 0.32%, preferably 0.2% to 0.5%, preferably 0.5% to 0.6%, and preferably 0.5% to 0.9%. The transmittance of the microcrystalline glass (100) for light with a wavelength of 550 nm is preferably 89.5% to 91.5%, preferably 89.8% to 91.2%, preferably 90.2% to 91.5%, and preferably 90.5% to 91.5%. The crystalline phase of the microcrystalline glass (100) preferably accounts for 30% to 40% of the mass of the microcrystalline glass (100), preferably 40% to 50%, preferably 75% to 80%, and preferably 85% to 92%.

3. The microcrystalline glass (100) according to claim 1 or 2, characterized in that, The main crystalline phase of the microcrystalline glass (100) includes at least one of lithium disilicate, petalite, lithium silicate, quartz, quartz solid solution, spinel, sodium nepheline, potassium nepheline, cordierite, and zirconium oxide.

4. The microcrystalline glass (100) according to any one of claims 1 to 3, characterized in that, The microcrystalline glass (100) comprises the following components by mass percentage: Lithium oxide: 5% to 15%; Silica: 50% to 78%; Alumina: 4% to 15%; Phosphorus pentoxide: 1% to 5%; Zirconium dioxide: 2% to 10%; Sodium oxide: 0 to 5%; Potassium oxide: 0 to 5%; Boron trioxide: 0 to 5%; Other components: 0 to 5%.

5. The microcrystalline glass (100) according to claim 4, characterized in that, The composition of the microcrystalline glass (100) must satisfy at least one of the following: The lithium oxide is preferably 8% to 15% by mass, more preferably 9% to 14%, even more preferably 10% to 13%, and even more preferably 11% to 12% by mass. The mass percentage of the silicon dioxide is preferably 60% to 75%, more preferably 62% to 73%, even more preferably 65% ​​to 70%, and even more preferably 66% to 68%. The mass percentage of the alumina is preferably 4% to 12%, more preferably 4% to 10%, even more preferably 4% to 8%, and even more preferably 4% to 7%. The preferred mass percentage of phosphorus pentoxide is 1% to 4%, more preferably 1% to 3%, even more preferably 1% to 2%, and even more preferably 1.2% to 1.5%. The zirconium dioxide is preferably 2% to 9% by mass, more preferably 3% to 8%, even more preferably 4% to 8%, and even more preferably 4% to 7% by mass. The mass percentage of sodium oxide is preferably 0 to 4%, more preferably 0 to 3%, even more preferably 0 to 2%, and even more preferably 0 to 1%. The mass percentage of potassium oxide is preferably 0 to 4%, more preferably 0 to 3%, and even more preferably 0 to 2% or 0 to 1%. The mass percentage of boron trioxide is preferably 0 to 4%, more preferably 0 to 3%, even more preferably 0 to 2%, and even more preferably 0 to 1%. The mass percentage of the remaining components is preferably 0 to 4%, more preferably 0 to 3%, even more preferably 0 to 2%, and even more preferably 0 to 1%.

6. The microcrystalline glass (100) according to claim 4 or 5, characterized in that, The remaining components include titanium dioxide.

7. The microcrystalline glass (100) according to any one of claims 1 to 6, characterized in that, The maximum height roughness of the surface (111) of the protrusion (110) is less than 100 nm.

8. The microcrystalline glass (100) according to any one of claims 1 to 7, characterized in that, The surface (121) of the trench (120) is a smooth surface, and the arithmetic mean roughness of the surface (121) of the trench (120) is less than or equal to 1.5 nm.

9. The microcrystalline glass (100) according to claim 8, characterized in that, The maximum height roughness of the surface (121) of the trench (120) is less than 100 nm.

10. The microcrystalline glass (100) according to claim 8 or 9, characterized in that, The microcrystalline glass (100) produces smooth and continuous light and shadow under point or surface light sources.

11. The microcrystalline glass (100) according to any one of claims 1 to 10, characterized in that, The dimensions of the microcrystalline glass (100) satisfy at least one of the following: In the cross-section of the groove (120), the ratio between the average width of the groove (120) and the depth of the groove (120) is 10 to 500, and the cross-section of the groove (120) is perpendicular to the extension direction of the groove (120). The ratio between the average width of the groove (120) and the average width of the protrusion (110) is 0.1 to 10; The depth of the trench (120) is from 0.1 μm to 30 μm; The average width of the groove (120) is greater than or equal to 10 μm; The average width of the protrusion (110) is greater than or equal to 10 μm.

12. The microcrystalline glass (100) according to any one of claims 1 to 11, characterized in that, The dimensions of the microcrystalline glass (100) satisfy at least one of the following: On the cross-section of the groove (120), the ratio between the average width of the groove (120) and the depth of the groove (120) is preferably 20 to 50, preferably 10 to 30, preferably 10 to 50, preferably 50 to 100, and the cross-section of the groove (120) is perpendicular to the extension direction of the groove (120). The ratio between the average width of the groove (120) and the average width of the protrusion (110) is preferably 1 to 5, preferably 5 to 7, preferably 7 to 9, and preferably 7 to 10. The depth of the groove (120) is preferably 1 μm to 5 μm, preferably 3 μm to 5 μm, preferably 4 μm to 10 μm, and preferably 10 μm to 20 μm; The average width of the groove (120) is preferably 10 μm to 50 μm, preferably 50 μm to 150 μm, preferably 100 μm to 200 μm, and preferably 100 μm to 300 μm; The average width of the protrusion (110) is preferably 10 μm to 50 μm, preferably 50 μm to 150 μm, preferably 100 μm to 200 μm, and preferably 100 μm to 300 μm.

13. The microcrystalline glass (100) according to any one of claims 1 to 12, characterized in that, The surface (111) of the protrusion (110) includes a first side (1111) and a second side (1112). The first side (1111) and the second side (1112) are arranged opposite to each other along the width direction of the protrusion (110), and the distance between the first side (1111) and the second side (1112) gradually decreases along the protrusion direction of the protrusion (110).

14. The microcrystalline glass (100) according to claim 13, characterized in that, The first side surface (1111) and the second side surface (1112) are inclined surfaces that are inclined relative to the protrusion direction of the protrusion (110).

15. The microcrystalline glass (100) according to claim 14, characterized in that, The angle (α1) between the first side surface (1111) and the protrusion direction of the protrusion (110) is 5° to 45°, and / or the angle (α2) between the second side surface (1112) and the protrusion direction of the protrusion (110) is 5° to 45°.

16. The microcrystalline glass (100) according to claim 14 or 15, characterized in that, The surface (111) of the protrusion (110) includes a top surface (1113), which connects the first side surface (1111) and the second side surface (1112). The top surface (1113) is a curved surface that protrudes along the protrusion direction of the protrusion (110).

17. The microcrystalline glass (100) according to claim 16, characterized in that, The surface (121) of the groove (120) includes a bottom surface (1211), which connects a first side surface (1111) of a protrusion (110) adjacent to the groove (120) and a second side surface (1112) of another protrusion (110) adjacent to the groove (120). The bottom surface (1211) is a curved surface that protrudes in the opposite direction to the protrusion direction of the protrusion (110).

18. The microcrystalline glass (100) according to any one of claims 1 to 17, characterized in that, The groove (120) can be a straight groove, a curved groove, or an annular groove.

19. The microcrystalline glass (100) according to any one of claims 1 to 18, characterized in that, The arithmetic mean roughness of the surface (111) of the protrusion (110) was tested using an atomic force microscope, and the length and width of the test area were less than or equal to 1 μm.

20. The microcrystalline glass (100) according to any one of claims 1 to 19, characterized in that, The haze and transmittance of the microcrystalline glass (100) were tested using a colorimeter with a D65 light source.

21. The microcrystalline glass (100) according to any one of claims 1 to 20, characterized in that, The morphology of the surface (111) of the protrusion (110) is tested using any of the following methods: The test was conducted using a white light interferometer, with a white LED light source, and in a multi-focal plane superposition mode; or The microcrystalline glass (100) is sliced ​​along a direction perpendicular to the extension direction of the protrusion (110) and tested using an optical microscope at a magnification of 20x to 200x.

22. The microcrystalline glass (100) according to any one of claims 1 to 21, characterized in that, The morphology of the surface (111) of the protrusion (110) is obtained by any of the following methods: The surface (111) of the protrusion (110) is polished; The surface (111) of the protrusion (110) is polished and the protrusion (110) is placed in an alkaline solution for ultrasonic alkaline washing, wherein the mass concentration of the alkaline solution is 1% to 50%.

23. The microcrystalline glass (100) according to claim 22, characterized in that, The polishing process parameters satisfy at least one of the following: The polishing pads used in the polishing process have a Shore hardness of 5D to 60D. The polishing pad used in the polishing process is made of sponge. The abrasive particles used in the polishing process have a particle size of 0.1 μm to 5 μm; The polishing particles include at least one of cerium dioxide particles, alumina particles, and silicon dioxide particles. The amount of material removed by polishing is greater than or equal to 0.3 μm; The ratio between the amount of material removed by the polishing process and the depth of the groove (120) before the polishing process is 1 / 30 to 3 / 4.

24. The microcrystalline glass (100) according to claim 22 or 23, characterized in that, The morphology of the surface (111) of the protrusion (110) is obtained by polishing the surface (111) of the protrusion (110) and placing the protrusion (110) in an alkaline solution for ultrasonic alkaline washing, wherein the mass concentration of the alkaline solution is 1% to 50%. The process parameters for the ultrasonic alkaline washing treatment satisfy at least one of the following: The ultrasonic frequency of the ultrasonic alkaline washing treatment is 40kHz to 100kHz. The ultrasonic alkaline washing treatment takes 30 seconds or more.

25. A method for forming a microcrystalline glass (100), characterized in that, The molding method includes: A concave-convex structure (130) is formed on the first surface (101) of the microcrystalline glass body (140). The concave-convex structure (130) includes a plurality of grooves (120) and a plurality of protrusions (110). The region between any two adjacent grooves (120) forms the protrusion (110), and the region between any two adjacent protrusions (110) forms the groove (120). The concave-convex structure (130) is subjected to a first processing, the first processing including at least polishing the surface (111) of the convex part (110), the surface (111) of the convex part (110) after the first processing is a smooth surface, and the arithmetic mean roughness of the surface (111) of the convex part (110) is less than or equal to 1.5 nm.

26. The molding method according to claim 25, characterized in that, The first process also includes polishing the surface (121) of the trench (120), the surface (121) of the trench (120) after the first process is a smooth surface, and the arithmetic mean roughness of the surface (121) of the trench (120) is less than or equal to 1.5 nm.

27. The molding method according to claim 25 or 26, characterized in that, The polishing process parameters satisfy at least one of the following: The polishing pads used in the polishing process have a Shore hardness of 5D to 60D. The polishing pad used in the polishing process is made of sponge. The abrasive particles used in the polishing process have a particle size of 0.1 μm to 5 μm; The polishing particles include at least one of cerium dioxide particles, alumina particles, and silicon dioxide particles. The amount of material removed by polishing is greater than or equal to 0.3 μm; The ratio between the amount of material removed by the polishing process and the depth of the groove (120) before the polishing process is 1 / 30 to 3 / 4.

28. The molding method according to any one of claims 25 to 27, characterized in that, The polishing process parameters satisfy at least one of the following: The polishing pad used for the polishing treatment preferably has a Shore hardness of 7D to 12D, more preferably 7D to 18D, more preferably 12D to 24D, and more preferably 12D to 18D. The particle size of the polishing particles is preferably 0.5 μm to 1.5 μm, preferably 1 μm to 1.5 μm, preferably 1 μm to 2.5 μm, and preferably 0.5 μm to 2 μm. The preferred amount of abrasive removal in the polishing process is 1 μm to 2 μm, more preferably 10 μm to 15 μm, more preferably 5 μm to 10 μm, and more preferably 3 μm to 5 μm; The ratio between the amount of material removed by the polishing process and the depth of the groove (120) before the polishing process is preferably 1 / 6 to 1 / 2, preferably 1 / 6 to 1 / 3, preferably 1 / 10 to 1 / 6, and preferably 1 / 3 to 1 / 2.

29. The molding method according to any one of claims 25 to 28, characterized in that, The method of forming a concave-convex structure (130) on the first surface (101) of the microcrystalline glass body (140) includes: etching the first surface (101) with hydrofluoric acid to obtain the concave-convex structure (130). The first process further includes: The uneven structure (130) is placed in an alkaline solution for ultrasonic alkaline washing, wherein the mass concentration of the alkaline solution is 1% to 50%.

30. The molding method according to claim 29, characterized in that, The process parameters for ultrasonic alkaline washing treatment must meet at least one of the following: The ultrasonic frequency of the ultrasonic alkaline washing treatment is 40kHz to 100kHz. The ultrasonic alkaline washing treatment takes 30 seconds or more.

31. The molding method according to claim 29 or 30, characterized in that, The process parameters for the ultrasonic alkaline washing treatment satisfy at least one of the following: The ultrasonic frequency of the ultrasonic alkaline washing treatment is preferably 50kHz to 60kHz, preferably 40kHz to 60kHz, preferably 60kHz to 80kHz, and preferably 80kHz to 100kHz. The preferred processing time for the ultrasonic alkaline washing treatment is 180s to 240s, more preferably 240s to 300s, more preferably 300s to 600s, and more preferably 600s to 900s. The mass concentration of the alkaline solution is preferably 5% to 10%, preferably 20% to 30%, preferably 30% to 40%, and preferably 40% to 50%.

32. A microcrystalline glass product (10), characterized in that, The microcrystalline glass article (10) includes a substrate (200), which is made of microcrystalline glass (100) according to any one of claims 1 to 24, or microcrystalline glass (100) obtained by molding microcrystalline glass (100) according to the molding method of microcrystalline glass (100) according to any one of claims 25 to 31.

33. The microcrystalline glass article (10) according to claim 32, characterized in that, The microcrystalline glass product (10) further includes a functional film layer (300) disposed on the substrate (200).

34. An electronic device, characterized in that, The electronic device includes electronic components and a housing, wherein the electronic components are disposed in the housing, and the housing includes the microcrystalline glass article (10) as described in claim 32 or 33.

35. The electronic device according to claim 34, characterized in that, The housing includes a display cover and a back cover assembled on opposite sides of the electronic device, wherein the display cover and / or the back cover includes the microcrystalline glass article (10).

36. The electronic device according to claim 34 or 35, characterized in that, The electronic device includes a camera, and the housing also includes a camera decorative cover, which is disposed on the camera and includes the microcrystalline glass product (10).

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