Preparation method of yttrium oxide-zirconium oxide composite coating

Abstract

The invention discloses a preparation method of an yttrium oxide-zirconium oxide composite coating, which comprises the following steps: step S11, mounting a cleaned and dried glass substrate on a rotary base frame table in a coating chamber, and introducing argon plasma into the coating chamber to bombard and clean the surface of the glass substrate; and S12, argon and oxygen are introduced into the coating chamber, and the yttrium target and the zirconium target are started at the same time for magnetron sputtering, so that the yttrium oxide-zirconium oxide composite coating is deposited on the surface of the glass substrate which rotates in a reciprocating manner. The charge compensation effect is introduced through Zr < 4 + > doping, so that the oxygen vacancy concentration in the coating is reduced, and the visible light transmittance and chemical stability of the coating are improved. And meanwhile, through formation of zirconium oxide, columnar crystal growth of yttrium oxide is broken, so that the microstructure of the coating is optimized, and the coating has good etching resistance.

Description

Technical Field

[0001] This invention relates to the field of material surface treatment technology, specifically to a method for preparing a yttrium oxide-zirconia composite coating. Background Technology

[0002] Currently, as the semiconductor integrated circuit industry moves towards miniaturization, the high-density plasma environment in dry etching processes places extremely high demands on the protection of components within the reaction chamber. This is especially true for optical windows and transparent protective covers responsible for process monitoring; they not only need extremely strong resistance to chemical corrosion to prevent impurity particles from contaminating the wafer, but also must maintain excellent optical transmittance to ensure the accuracy of spectral monitoring. Yttrium oxide thin films, with their extremely low standard formation free energy and excellent thermodynamic stability, are widely recognized as the preferred protective material against fluorine- or chlorine-based plasma corrosion.

[0003] However, significant technical bottlenecks remain when using existing physical vapor deposition techniques such as magnetron sputtering to prepare yttrium oxide thin films. On the one hand, the high-energy particle bombardment and oxygen-deficient environment during the deposition process easily induce high concentrations of oxygen vacancies within the coating. These vacancies form deep-level defect states and absorption centers in the band gap, resulting in a pale yellow coating with significantly reduced transparency, making it difficult to meet the standards for use in precision optical components. On the other hand, pure yttrium oxide thin films tend to grow in columnar crystal form, with a loose structure and micropores at the grain boundaries. Corrosive plasma can easily penetrate inward along the grain boundary channels and accelerate etching, severely limiting the density and lifespan of the coating. Summary of the Invention

[0004] Based on this, the purpose of this invention is to provide a method for preparing a yttrium oxide-zirconia composite coating to improve the visible light transmittance and etching resistance of the coating, thereby extending the service life of semiconductor device components (such as viewing windows) in high-energy plasma environments.

[0005] A method for preparing a yttrium oxide-zirconia composite coating includes the following steps:

[0006] Step S11: Install the cleaned and dried glass substrate on the rotating base platform in the coating chamber, and introduce argon plasma into the coating chamber to bombard and clean the surface of the glass substrate.

[0007] In step S12, argon and oxygen are introduced into the coating chamber, and magnetron sputtering is performed on the yttrium target and zirconium target to deposit a yttrium oxide-zirconia composite coating on the surface of the reciprocating rotating glass substrate. The flow ratio of argon to oxygen is 12:1, the sputtering power of the yttrium target is 200~500W, and the sputtering power of the zirconium target is 20~60W.

[0008] Preferably, before step S11, the preparation method further includes:

[0009] The glass substrate was ultrasonically cleaned in an alcohol solution and then dried. The ultrasonic cleaning time was 5 to 30 minutes.

[0010] Preferably, in step S11, the rotating base platform is provided with a pulse bias power supply that applies a negative bias voltage to the glass substrate and a heating device for heating the glass substrate.

[0011] Preferably, the voltage range of the pulse bias power supply is 50~200V, and the heating temperature range of the heating device is 0~300℃.

[0012] Preferably, the reciprocating rotation angle of the rotating base platform is 30~120°, the rotation speed is 1~5 rpm, and the reciprocating cycle is 50~200 times.

[0013] Preferably, in step S11, the gas ion source is a linear anodic ion source, the argon flow rate is 5~30 sccm, the voltage is adjustable in the range of 800~1200V, and the bombardment time is 5~30min.

[0014] Preferably, in step S12, the flow rate of argon is 20~40 sccm, the flow rate of oxygen is 1~10 sccm, the sputtering voltage range of the yttrium target is 100~500V, and the sputtering voltage range of the zirconium target is 200~400V.

[0015] Preferably, in step S12, the yttrium target sputtering cathode is a magnetron sputtering rectangular cathode with an area of ​​(1~5)×10⁻⁶. 5 mm 3 And it uses a pulsed DC power supply;

[0016] The zirconium target sputtering cathode uses a magnetron sputtering circular cathode with an area of ​​(5~8)×10 3 mm 2 It uses a DC power supply.

[0017] Preferably, the distance between the yttrium target sputtering cathode and the zirconium target sputtering cathode and the surface of the glass substrate to be coated is 50~300mm.

[0018] Preferably, the total thickness of the yttrium oxide-zirconia composite coating is 1~10 μm.

[0019] Compared with the prior art, the beneficial effects of the present invention are as follows:

[0020] First, this invention uses Zr 4+ Doping introduces a charge compensation effect to reduce the oxygen vacancy concentration in the coating, thereby improving the visible light transmittance and chemical stability of the coating.

[0021] Secondly, by forming zirconium oxide, the present invention interrupts the columnar crystal growth of yttrium oxide, thereby optimizing the microstructure of the coating and giving it good etching resistance. This provides a durable solution for components such as observation windows of semiconductor etching equipment in plasma environments. Attached Figure Description

[0022] Figure 1 This is a schematic diagram of the preparation method of the yttrium oxide-zirconia composite coating proposed in this invention;

[0023] Figure 2 This is a schematic diagram illustrating the principle of reactive sputtering in the coating process chamber of this invention.

[0024] Figure 3 The images show the SEM surface morphology and EDS elemental analysis of the yttrium oxide-zirconia composite coatings corresponding to Examples 1-3 of this invention.

[0025] Figure 4 This is a graph showing the transmittance test results of the yttrium oxide-zirconia composite coating in Example 1 of the present invention;

[0026] Figure 5 The image shows the XRD pattern of the yttrium oxide-zirconia composite coating in Example 1 of this invention.

[0027] Figure 6 This is a graph showing the transmittance test results of the yttrium oxide-zirconia composite coating in Example 2 of the present invention;

[0028] Figure 7 This is a graph showing the transmittance test results of the yttrium oxide-zirconia composite coating in Example 3 of the present invention;

[0029] Figure 8 The graph shows the etching rate test results of the yttrium oxide-zirconia composite coatings corresponding to Examples 1-3 of this invention;

[0030] Figure 9 The images show the SEM surface morphology and EDS elemental analysis of the yttrium oxide-zirconia composite coatings corresponding to Examples 4-6 of this invention.

[0031] Figure 10 This is a graph showing the transmittance test results of the yttrium oxide-zirconia composite coating in Example 4 of the present invention;

[0032] Figure 11 This is a graph showing the transmittance test results of the yttrium oxide-zirconia composite coating in Example 5 of the present invention;

[0033] Figure 12 This is a graph showing the transmittance test results of the yttrium oxide-zirconia composite coating in Example 6 of the present invention;

[0034] Figure 13 The images show the SEM surface morphology and EDS elemental analysis of the yttrium oxide-zirconia composite coating in Comparative Example 1 of this invention.

[0035] Figure 14 The graph shows the transmittance test results of the yttrium oxide-zirconia composite coating in Comparative Example 1 of this invention.

[0036] The following detailed description, in conjunction with the accompanying drawings, will further illustrate the present invention. Detailed Implementation

[0037] The following description is intended to disclose the invention and enable those skilled in the art to implement it. The preferred embodiments described below are merely examples, and other obvious variations will occur to those skilled in the art.

[0038] Please see Figure 1 and Figure 2 An embodiment of the present invention provides a method for preparing a yttrium oxide-zirconia composite coating, comprising the following steps:

[0039] Step S11: Install the cleaned and dried glass substrate on the rotating base platform in the coating chamber, and introduce argon plasma into the coating chamber to bombard and clean the surface of the glass substrate.

[0040] It should be noted that in step S11, the rotating base platform is provided with a pulse bias power supply that applies a negative bias voltage to the glass substrate and a heating device for heating the glass substrate.

[0041] Specifically, the voltage range of the pulse bias power supply is 50~200V, and the heating temperature range of the heating device is 0~300℃.

[0042] Preferably, the reciprocating rotation angle of the rotating base platform is 30~120°, the rotation speed is 1~5 rpm, and the reciprocating cycle is 50~200 times.

[0043] It should be noted that in step S11, the gas ion source is a linear anodic ion source, the argon flow rate is 5~30 sccm, the voltage is adjustable in the range of 800~1200V, and the bombardment time is 5~30 min. The purpose is to remove the residual water molecule film and organic matter on the surface of the glass substrate to be coated after pretreatment, and to activate the glass substrate and improve the film-substrate adhesion through particle bombardment.

[0044] In step S12, argon and oxygen are introduced into the coating chamber, and magnetron sputtering is performed on the yttrium target and zirconium target to deposit a yttrium oxide-zirconia composite coating on the surface of the reciprocating rotating glass substrate. The flow ratio of argon to oxygen is 12:1, the sputtering power of the yttrium target is 200~500W, and the sputtering power of the zirconium target is 20~60W.

[0045] It should be noted that in step S12, when the cavity vacuum degree is 8×10 -4 ~1×10 -3 Within the Pa range, the coating process can begin. Since Zr is only used as a control component, while Y₂O₃ is the main phase of the coating, the yttrium and zirconium targets employ an asymmetric design in cathode size. Furthermore, the Zr target uses a DC power supply to achieve a gentler and more stable sputtering behavior, while the Y target uses a pulsed DC power supply primarily to improve discharge stability and film density.

[0046] Specifically, the yttrium target sputtering cathode uses a magnetron sputtering rectangular cathode with an area of ​​(1~5)×10 5 mm 3 And it uses a pulsed DC power supply;

[0047] The zirconium target sputtering cathode uses a magnetron sputtering circular cathode with an area of ​​(5~8)×10 3 mm 2 It uses a DC power supply.

[0048] Preferably, the distance between the yttrium target sputtering cathode and the zirconium target sputtering cathode and the surface of the glass substrate to be coated is 50~300mm.

[0049] Specifically, in step S12, the flow rate of argon is 20~40 sccm, the flow rate of oxygen is 1~10 sccm, the sputtering voltage range of the yttrium target is 100~500V, and the sputtering voltage range of the zirconium target is 200~400V.

[0050] It should be noted that, prior to step S11, the preparation method further includes:

[0051] The glass substrate was ultrasonically cleaned in an alcohol solution and then dried. The ultrasonic cleaning time was 5 to 30 minutes.

[0052] Specifically, the total thickness of the yttrium oxide-zirconia composite coating is 1~10μm.

[0053] The preparation method of the present invention will be described in detail below with specific embodiments:

[0054] Example 1

[0055] This embodiment provides a method for preparing a yttrium oxide-zirconia composite coating, comprising the following steps:

[0056] (1) Substrate preparation: Select glass slides as substrates and perform surface cleaning and drying treatment.

[0057] (2) Ion bombardment of glass substrate surface: The glass substrate is placed in a vacuum chamber and the vacuum is evacuated to 5×10⁻ 5 Pa; A linear anodic ion source was used, with argon as the working gas, the working pressure set to 0.3 Pa, and the ion bombardment time to 20 min.

[0058] (3) Deposition of yttrium oxide-zirconia composite coating: The glass substrate after ion bombardment is placed in a vacuum chamber and the vacuum is evacuated to 2×10⁻ 5 Pa; Adjust the rotating base stage to perform reciprocating rotation, with the rotation speed set to 1 r / min; Use argon and oxygen as working gases, with an argon-oxygen flow ratio of 30:2.5 sccm and a working gas pressure set to 0.4 Pa; Control the yttrium target power supply to 500W and the voltage range to 280 V; Simultaneously, control the zirconium target power supply to 20W and the voltage range to 300 V, with a sputtering time of 60 min.

[0059] (4) Cooling in the furnace: The thickness of the yttrium oxide-zirconia composite coating is 1200 nm.

[0060] Please see Figure 3 Figure a shows the EDS elemental content results of the yttrium oxide-zirconia composite coating prepared in this embodiment, indicating that zirconium was successfully incorporated into yttrium oxide.

[0061] Please see Figure 4 In this embodiment, the transmittance of the yttrium oxide-zirconia composite coating can reach up to 99.6%, and the average transmittance in the range of 300~1000nm is 91.71%. The fluctuation of the transmittance curve is caused by the interference effect between the thin film and the substrate.

[0062] Please see Figure 5 The yttrium oxide-zirconia composite coating obtained has a grain orientation of (101), and the composite coating prepared on the surface has a typical crystal structure of yttrium oxide-zirconia composite coating.

[0063] Please see Figure 8 In this embodiment, under an Ar (80%) / CF4 (20%) plasma etching environment, the yttrium oxide-zirconia composite coating exhibits an etching rate of 1.68 nm / min. The etching rates of glass, alumina, and yttrium oxide were compared, and the results show that this structure effectively reduces the etching rate of the glass substrate while maintaining high coating transparency.

[0064] Example 2

[0065] This embodiment provides a method for preparing a yttrium oxide-zirconia composite coating, comprising the following steps:

[0066] (1) Substrate preparation: Select glass slides as substrates and perform surface cleaning and drying treatment.

[0067] (2) Ion bombardment of glass substrate surface: The glass substrate is placed in a vacuum chamber and the vacuum is evacuated to 5×10⁻ 5 Pa; A linear anodic ion source was used, with argon as the working gas, the working pressure set to 0.3 Pa, and the ion bombardment time to 20 min.

[0068] (3) Deposition of yttrium oxide-zirconia composite coating: The glass substrate after ion bombardment is placed in a vacuum chamber and the vacuum is evacuated to 2×10⁻ 5 Pa. Adjust the rotating base stage to perform reciprocating rotation, with the rotation speed set to 1 r / min; use argon and oxygen as working gases, with an argon-oxygen flow ratio of 30:2.5 sccm and a working gas pressure set to 0.4 Pa; control the yttrium target power supply to 500W and the voltage range to 280 V; simultaneously, control the zirconium target power supply to 40W and the voltage range to 350 V, with a sputtering time of 60 min.

[0069] (4) Cooling in the furnace: The thickness of the yttrium oxide-zirconia composite coating is 1400 nm.

[0070] Please see Figure 3 Figure b shows the EDS elemental content results of the yttrium oxide-zirconia composite coating prepared in this embodiment, indicating that zirconium was successfully incorporated into yttrium oxide.

[0071] Please see Figure 6 The yttrium oxide-zirconia composite coating exhibits an average transmittance of 90.54% in the 300–1000 nm range, with fluctuations in the transmittance curve caused by interference effects between the film and the substrate. Furthermore, the yttrium oxide-zirconia composite coating demonstrates an etching rate of 1.89 nm / min.

[0072] Example 3

[0073] This embodiment provides a method for preparing a yttrium oxide-zirconia composite coating, comprising the following steps:

[0074] (1) Substrate preparation: Select glass slides as substrates and perform surface cleaning and drying treatment.

[0075] (2) Ion bombardment of glass substrate surface: The glass substrate is placed in a vacuum chamber and the vacuum is evacuated to 5×10⁻ 5 Pa; A linear anodic ion source was used, with argon as the working gas, the working pressure set to 0.3 Pa, and the ion bombardment time to 20 min.

[0076] (3) Deposition of yttrium oxide-zirconia composite coating: The glass substrate after ion bombardment is placed in a vacuum chamber and the vacuum is evacuated to 2×10⁻ 5 Pa; Adjust the rotating base stage to perform reciprocating rotation, with the rotation speed set to 1 r / min; Use argon and oxygen as working gases, with an argon-oxygen flow ratio of 30:2.5 sccm and a working gas pressure set to 0.4 Pa; Control the yttrium target power supply to 500W and the voltage range to 280 V; Simultaneously, control the zirconium target power supply to 60W and the voltage range to 400 V, with a sputtering time of 60 min.

[0077] (4) Cooling in the furnace: The thickness of the yttrium oxide-zirconia composite coating is 1400 nm.

[0078] Please see Figure 3 Figure c shows the EDS elemental content results of the yttrium oxide-zirconia composite coating prepared in this embodiment, indicating that zirconium was successfully incorporated into yttrium oxide.

[0079] Please see Figure 7 The yttrium oxide-zirconia composite coating exhibits an average transmittance of 91.89% in the 300–1000 nm range, with fluctuations in the transmittance curve caused by interference effects between the film and the substrate. Furthermore, the yttrium oxide-zirconia composite coating has an etching rate of 2.06 nm / min.

[0080] Example 4

[0081] This embodiment provides a method for preparing a yttrium oxide-zirconia composite coating, comprising the following steps:

[0082] (1) Substrate preparation: Select glass slides as substrates and perform surface cleaning and drying treatment.

[0083] (2) Ion bombardment of glass substrate surface: The glass substrate is placed in a vacuum chamber and the vacuum is evacuated to 5×10⁻ 5 Pa; A linear anodic ion source was used, with argon as the working gas, the working pressure set to 0.3 Pa, and the ion bombardment time to 20 min.

[0084] (3) Deposition of yttrium oxide-zirconia composite coating: The glass substrate after ion bombardment is placed in a vacuum chamber and the vacuum is evacuated to 2×10⁻ 5 Pa; Adjust the rotating base stage to perform reciprocating rotation, with the rotation speed set to 1 r / min; Use argon and oxygen as working gases, with an argon-oxygen flow ratio of 30:2.5 sccm and a working gas pressure set to 0.4 Pa; Control the yttrium target power supply to 200W and the voltage range to 200 V; Simultaneously, control the zirconium target power supply to 20W and the voltage range to 300 V, with a sputtering time of 60 min.

[0085] (4) Cooling in the furnace: The thickness of the yttrium oxide-zirconia composite coating is 1400 nm.

[0086] Please see Figure 9 Figure a shows the EDS elemental content results of the yttrium oxide-zirconia composite coating prepared in this embodiment, indicating that zirconium was successfully incorporated into yttrium oxide.

[0087] Please see Figure 10 In this embodiment, the yttrium oxide-zirconia composite coating has an average transmittance of 86.95% in the 300~1000 nm range, and the fluctuation in the transmittance curve is caused by the interference effect between the film and the substrate. Furthermore, the yttrium oxide-zirconia composite coating has an etching rate of 2.06 nm / min.

[0088] Example 5

[0089] This embodiment provides a method for preparing a yttrium oxide-zirconia composite coating, comprising the following steps:

[0090] (1) Substrate preparation: Select glass slides as substrates and perform surface cleaning and drying treatment.

[0091] (2) Ion bombardment of glass substrate surface: The glass substrate is placed in a vacuum chamber and the vacuum is evacuated to 5×10⁻ 5 Pa; A linear anodic ion source was used, with argon as the working gas, the working pressure set to 0.3 Pa, and the ion bombardment time to 20 min.

[0092] (3) Deposition of yttrium oxide-zirconia composite coating: The glass substrate after ion bombardment is placed in a vacuum chamber and the vacuum is evacuated to 2×10⁻ 5 Pa; Adjust the rotating base stage to perform reciprocating rotation, with the rotation speed set to 1 r / min; Use argon and oxygen as working gases, with an argon-oxygen flow ratio of 30:2.5 sccm and a working gas pressure set to 0.4 Pa; Control the yttrium target power supply to 300W and the voltage range to 240 V; Simultaneously, control the zirconium target power supply to 20W and the voltage range to 300 V, with a sputtering time of 60 min.

[0093] (4) Cooling in the furnace: The thickness of the yttrium oxide-zirconia composite coating is 1400 nm.

[0094] Please see Figure 9 Figure b shows the EDS elemental content results of the yttrium oxide-zirconia composite coating prepared in this embodiment, indicating that zirconium was successfully incorporated into yttrium oxide.

[0095] Please see Figure 11In this embodiment, the yttrium oxide-zirconia composite coating has an average transmittance of 88.70% in the 300~1000 nm range, and the fluctuation in the transmittance curve is caused by the interference effect between the film and the substrate. Furthermore, the yttrium oxide-zirconia composite coating has an etching rate of 2.56 nm / min.

[0096] Example 6

[0097] This embodiment provides a method for preparing a yttrium oxide-zirconia composite coating, comprising the following steps:

[0098] (1) Substrate preparation: Select glass slides as substrates and perform surface cleaning and drying treatment.

[0099] (2) Ion bombardment of glass substrate surface: The glass substrate is placed in a vacuum chamber and the vacuum is evacuated to 5×10⁻ 5 Pa; A linear anodic ion source was used, with argon as the working gas, the working pressure set to 0.3 Pa, and the ion bombardment time to 20 min.

[0100] (3) Deposition of yttrium oxide-zirconia composite coating: The glass substrate after ion bombardment is placed in a vacuum chamber and the vacuum is evacuated to 2×10⁻ 5 Pa; Adjust the rotating base stage to perform reciprocating rotation, with the speed set to 1 r / min. Argon and oxygen are used as working gases, with an argon-oxygen flow ratio of 30:2.5 sccm and a working gas pressure set to 0.4 Pa; control the yttrium target power supply to 400W and the voltage range to 260 V; simultaneously, control the zirconium target power supply to 20 W and the voltage range to 300 V, with a sputtering time of 60 min.

[0101] (4) Cooling in the furnace: The thickness of the yttrium oxide-zirconia composite coating is 1400 nm.

[0102] Please see Figure 9 Figure c shows the EDS elemental content results of the yttrium oxide-zirconia composite coating prepared in this embodiment, indicating that zirconium was successfully incorporated into yttrium oxide.

[0103] Please see Figure 12 In this embodiment, the yttrium oxide-zirconia composite coating has an average transmittance of 88.93% in the 300~1000 nm range, and the fluctuation in the transmittance curve is caused by the interference effect between the film and the substrate. Furthermore, the yttrium oxide-zirconia composite coating has an etching rate of 2.21 nm / min.

[0104] Comparative Example 1

[0105] The only difference between the preparation method provided in this comparative embodiment and the above embodiment is that the zirconium target sputtering power is 0W.

[0106] Please see Figure 13 The EDS element content results of the yttrium oxide coating obtained in this comparative example show that no zirconium element was found in the coating.

[0107] Please see Figure 14 The yttrium oxide coating prepared in Comparative Example 1 had an average transmittance of 83.02% in the 300–1000 nm range, indicating a significant decrease in coating transparency. Furthermore, the yttrium oxide coating prepared in the Comparative Example exhibited an etching rate of 1.32 nm / min.

[0108] The data results for the above implementation series and comparative examples are summarized in Table 1:

[0109] Table 1. Etching Rate and Transmittance Data Results

[0110] Etching rate Transmission rate Example 1 1.68 nm / min 91.71% Example 2 1.89 nm / min 90.54% Example 3 2.06 nm / min 91.89% Example 4 2.88 nm / min 86.95% Example 5 2.56 nm / min 88.70% Example 6 2.21 nm / min 88.93% Comparative Example 1 1.32 nm / min 83.02%

[0111] The foregoing has shown and described the basic principles, main features, and advantages of the present invention. Those skilled in the art should understand that the present invention is not limited to the above embodiments. The embodiments and descriptions in the specification are merely principles of the invention. Various changes and modifications can be made to the invention without departing from its spirit and scope, and all such changes and modifications fall within the scope of the claimed invention.

Claims

1. A method for preparing a yttrium oxide-zirconia composite coating, characterized in that, Includes the following steps: Step S11: Install the cleaned and dried glass substrate on the rotating base platform in the coating chamber, and introduce argon plasma into the coating chamber to bombard and clean the surface of the glass substrate. In step S12, argon and oxygen are introduced into the coating chamber, and magnetron sputtering is performed on the yttrium target and zirconium target to deposit a yttrium oxide-zirconia composite coating on the surface of the reciprocating rotating glass substrate. The flow ratio of argon to oxygen is 12:1, the sputtering power of the yttrium target is 200~500W, and the sputtering power of the zirconium target is 20~60W.

2. The method for preparing the yttrium oxide-zirconia composite coating according to claim 1, characterized in that, Prior to step S11, the preparation method further includes: The glass substrate was ultrasonically cleaned in an alcohol solution and then dried. The ultrasonic cleaning time was 5 to 30 minutes.

3. The method for preparing the yttrium oxide-zirconia composite coating according to claim 1, characterized in that, In step S11, the rotating base platform is provided with a pulse bias power supply that applies a negative bias voltage to the glass substrate and a heating device for heating the glass substrate.

4. The method for preparing the yttrium oxide-zirconia composite coating according to claim 3, characterized in that, The voltage range of the pulse bias power supply is 50~200V, and the heating temperature range of the heating device is 0~300℃.

5. The method for preparing the yttrium oxide-zirconia composite coating according to claim 3, characterized in that, The reciprocating rotation angle of the rotating base platform is 30~120°, the rotation speed is 1~5 rpm, and the reciprocating cycle is 50~200 times.

6. The method for preparing the yttrium oxide-zirconia composite coating according to claim 1, characterized in that, In step S11, the gas ion source is a linear anodic ion source, the argon flow rate is 5~30 sccm, the voltage is adjustable in the range of 800~1200V, and the bombardment time is 5~30min.

7. The method for preparing the yttrium oxide-zirconia composite coating according to claim 1, characterized in that, In step S12, the flow rate of argon is 20~40 sccm, the flow rate of oxygen is 1~10 sccm, the sputtering voltage range of the yttrium target is 100~500V, and the sputtering voltage range of the zirconium target is 200~400V.

8. The method for preparing the yttrium oxide-zirconia composite coating according to claim 1, characterized in that, In step S12, the yttrium target sputtering cathode is a magnetron sputtering rectangular cathode with an area of ​​(1~5)×10. 5 mm 3 And it uses a pulsed DC power supply; The zirconium target sputtering cathode uses a magnetron sputtering circular cathode with an area of ​​(5~8)×10 3 mm 2 It uses a DC power supply.

9. The method for preparing the yttrium oxide-zirconia composite coating according to claim 8, characterized in that, The distance between the yttrium target sputtering cathode and the zirconium target sputtering cathode and the surface of the glass substrate to be coated is 50~300mm.

10. The method for preparing the yttrium oxide-zirconia composite coating according to any one of claims 1 to 9, characterized in that, The total thickness of the yttrium oxide-zirconia composite coating is 1~10μm.

Images