Homogenization lighting device and method for exposure light machine

Abstract

The invention relates to the technical field of exposure, and particularly provides an exposure light machine homogenization lighting device and method, the device comprises a laser, a light dissipater and a light homogenizer, the laser is used for emitting target laser; the light dissipater is arranged on one side of the laser and is used for receiving the target laser, homogenizing the target laser and outputting first homogenized light; the light homogenizer is arranged on one side of the light dissipater and comprises a collimation piece, a digital micromirror device and a miniature lens; the collimation piece is used for receiving the first homogenized light, performing collimation and secondary homogenization processing on the first homogenized light, and outputting second homogenized light entering the digital micromirror device in the middle; the digital micromirror device is used for spatially modulating the second homogenized light and outputting target pattern light; the miniature lens and the digital micro-mirror device are sequentially arranged at intervals, and the miniature lens is used for receiving the target pattern light and conducting focusing processing so that the target pattern light can be projected to the surface of the target workpiece. The homogenizing effect is effectively improved, and the local light intensity peak of the laser is eliminated.

Description

Technical Field

[0001] This invention relates to the field of exposure technology, and in particular to an exposure machine homogenization illumination device and method. Background Technology

[0002] In high-precision exposure technologies such as semiconductor packaging and micro / nano fabrication, the homogenization effect of the optomechanical structure directly determines the exposure accuracy and product yield, representing a core technological requirement for industries like optoelectronic manufacturing and semiconductor packaging. Current technologies typically employ integrating rod / compound eye lens combinations or high-diffusion-coefficient diffusers with lens groups to achieve homogenized illumination. The integrating rod / compound eye lens combination relies on multiple reflections / refractions for homogenization, while the high-diffusion-coefficient diffuser with lens groups relies on scattering effects. However, these methods lack sufficient homogenization effectiveness, failing to completely eliminate localized laser intensity spikes and thus failing to meet the homogenization requirements of high-precision exposure. Summary of the Invention

[0003] The exposure machine homogenization illumination device and method provided in this invention at least solves the problem of insufficient homogenization effect and local laser intensity spikes in existing devices. By combining a light diffuser and a light homogenizer, the homogenization effect is effectively improved and local laser intensity spikes are eliminated.

[0004] In a first aspect, the present invention provides a homogenization illumination device for an exposure optical machine, comprising: a laser for emitting a target laser; a light dissipator disposed on one side of the laser; the light dissipator being used to receive the target laser and homogenize the target laser, outputting a first homogenized light; a light homogenizer disposed on one side of the light dissipator; the light homogenizer comprising a collimator, a digital micromirror device, and a miniature lens; the collimator being used to receive the first homogenized light and to collimate and homogenize the first homogenized light, outputting a second homogenized light incident centrally on the digital micromirror device; the digital micromirror device being used to spatially modulate the second homogenized light, outputting a target pattern light; the miniature lens and the digital micromirror device being arranged sequentially at intervals, the miniature lens being used to receive the target pattern light and to focus the target pattern light, so that the target pattern light is projected onto the surface of a target workpiece.

[0005] In one embodiment of the present invention, the collimating element includes: a diffractive optical element for receiving the first homogenized light and redistributing the spot energy of the first homogenized light to obtain intermediate light; a collimating lens disposed on one side of the diffractive optical element; the collimating lens for receiving the intermediate light and performing collimation and secondary homogenization on the intermediate light to output the second homogenized light; and a first reflecting mirror disposed between the diffractive optical element and the collimating lens, the first reflecting mirror for receiving the intermediate light and centered the intermediate light onto the collimating lens.

[0006] In one embodiment of the present invention, along a first direction, the diffractive optical element and the first reflector are arranged at intervals in sequence; along a second direction, the first reflector and the collimating lens are arranged at intervals in sequence, and the second direction is perpendicular to the first direction; the light homogenizer further includes a second reflector, along the second direction, the second reflector is disposed on the side of the collimating lens away from the first reflector; the second reflector is used to receive the second homogenized light and to center the second homogenized light incident on the digital micromirror device; along the second direction, the digital micromirror device and the miniature lens are both disposed between the collimating lens and the second reflector, and along the first direction, the digital micromirror device and the miniature lens are respectively disposed on both sides of the second reflector.

[0007] In one embodiment of the present invention, the collimator includes a collimating lens and a first reflecting mirror; the collimating lens is used to receive the first homogenized light, and to collimate and homogenize the first homogenized light in a secondary manner, and output the second homogenized light; along a first direction, the first reflecting mirror and the collimating lens are arranged at intervals in sequence; the first reflecting mirror is used to receive the second homogenized light and to adjust the propagation direction deviation of the second homogenized light; the light homogenizer further includes a second reflecting mirror, along a second direction, the first reflecting mirror and the second reflecting mirror are arranged at intervals in sequence, and the second direction is perpendicular to the first direction; the second reflecting mirror is used to receive the second homogenized light and to center the second homogenized light incident on the digital micromirror device; along the second direction, the digital micromirror device and the miniature lens are both disposed between the first reflecting mirror and the second reflecting mirror, and along the first direction, the digital micromirror device and the miniature lens are respectively disposed on both sides of the second reflecting mirror.

[0008] In one embodiment of the present invention, it further includes: a light field shaper disposed between the light dissipator and the light homogenizer; the light field shaper has a plurality of arrayed micro-nano units, the micro-nano units being used to receive the first homogenized light, perform wavefront phase modulation and energy spatial redistribution processing on the first homogenized light, and input the processed first homogenized light to the light homogenizer.

[0009] In one embodiment of the present invention, the optical homogenizer further includes a polarization control element and a phase retarder; the polarization control element is disposed on the output side of the collimator, and is used to receive the second homogenized light, perform polarization state adjustment processing on the second homogenized light, and input the processed second homogenized light to the phase retarder; the phase retarder is disposed between the polarization control element and the digital micromirror device, and is used to receive the second homogenized light, perform phase deviation correction processing on the second homogenized light, and input the processed second homogenized light to the digital micromirror device.

[0010] In one embodiment of the present invention, the light dissipator includes a first lens, a second lens, a diffuser wheel, a third lens, a third reflector, and a fourth lens arranged sequentially at intervals; the first lens is used to receive the target laser, collimate the target laser, and input the processed target laser to the second lens; the second lens is used to focus the target laser and input the processed target laser to the diffuser wheel; the diffuser wheel is used to homogenize the target laser and input the processed target laser to the third lens; the third lens is used to collimate the target laser and input the processed target laser to the third reflector; the third reflector is used to center the target laser onto the fourth lens; the fourth lens is used to shape the target laser and output the first homogenized light.

[0011] In one embodiment of the present invention, the optical scattering device and the laser, as well as the optical scattering device and the optical homogenizer, are all connected by optical fiber.

[0012] In one embodiment of the present invention, the light homogenizer further includes a focusing adjustment component, which includes a guide cylinder, an adjusting guide pin, a connecting seat, and a locking screw. The guide cylinder has a curved groove and a locking screw hole on its wall, and the adjusting guide pin is movably disposed in the curved groove. The connecting seat is disposed on the guide cylinder and is connected to the adjusting guide pin and the miniature lens, respectively. The connecting seat is rotatable and axially movable relative to the guide cylinder. The locking screw is threadedly connected to the locking screw hole, and the locking screw rotates relative to the locking screw hole to fix or unlock the connecting seat.

[0013] Secondly, the present invention also provides a homogenization illumination method for an exposure machine, applied to the homogenization illumination device for an exposure machine as described in any of the above claims, comprising the steps of: controlling a laser to emit a target laser, a light dissipator receiving the target laser and homogenizing the target laser to output a first homogenized light; wherein the light dissipator is disposed on one side of the laser; the collimator of the light homogenizer receiving the first homogenized light and performing collimation and secondary homogenization on the first homogenized light to output a second homogenized light; wherein the light homogenizer is disposed on one side of the light dissipator, the light homogenizer further comprising a digital micromirror device and a miniature lens, the miniature lens and the digital micromirror device being arranged sequentially at intervals; the second homogenized light being incident centrally on the digital micromirror device, the digital micromirror device spatially modulating the second homogenized light to output a target pattern light; the miniature lens receiving the target pattern light and focusing the target pattern light so that the target pattern light is projected onto the surface of the target workpiece.

[0014] Compared with the prior art, the above-described technical solution of the present invention has the following advantages:

[0015] The exposure homogenization illumination device of this invention utilizes a light dissipator and a light homogenizer in tandem. The light dissipator performs initial homogenization on the target laser emitted from the laser, breaking up the Gaussian energy distribution of the laser to obtain first homogenized light. Subsequently, the collimator based on the light homogenizer performs collimation and secondary homogenization on the first homogenized light, correcting the beam attitude and ensuring that the second homogenized light is centered and incident on a digital micromirror device. The digital micromirror device modulates the second homogenized light to obtain target patterned light, which is then focused by a miniaturized lens and finally projected onto the surface of the target workpiece with a uniform light field. This effectively improves the light homogenization effect and eliminates local intensity spikes in the laser. Thus, it overcomes the performance limitations of homogenization schemes such as integrating bars, compound eye lenses, and diffusers, and can meet the stringent requirements for light field uniformity in high-precision exposure in fields such as semiconductor packaging, high-precision electronic component manufacturing, optoelectronic display device processing, micro-nano fabrication, photopolymerization 3D printing, and flexible electronics, ensuring consistency and product yield in high-precision exposure. Attached Figure Description

[0016] The accompanying drawings, which are included to provide a further understanding of the invention and form part of this invention, illustrate exemplary embodiments of the invention and are used to explain the invention, but do not constitute an undue limitation of the invention. In the drawings:

[0017] Figure 1 This is one of the structural schematic diagrams of the homogenization illumination device for the exposure machine in a preferred embodiment of the present invention.

[0018] Figure 2 This is one of the structural schematic diagrams of the optical homogenizer in a preferred embodiment of the present invention.

[0019] Figure 3 This is the second schematic diagram of the structure of the optical homogenizer in a preferred embodiment of the present invention.

[0020] Figure 4 This is the second schematic diagram of the structure of the homogenizing illumination device for the exposure machine in a preferred embodiment of the present invention.

[0021] Figure 5 This is a schematic diagram of the structure of the light dissipation device in a preferred embodiment of the present invention.

[0022] Figure 6 This is a cross-sectional view of the focusing adjustment component in a preferred embodiment of the present invention.

[0023] Figure 7 This is a schematic flowchart of the exposure machine homogenization illumination method in a preferred embodiment of the present invention.

[0024] Figure 8 This is one of the comparison images of lighting effects.

[0025] Figure 9 This is the second comparison image of lighting effects.

[0026] Figure 10 This is the third comparison image of lighting effects.

[0027] Figure 11 This is one of the illumination effect diagrams of the homogenization illumination device for the exposure machine in a preferred embodiment of the present invention.

[0028] Figure 12 This is the second illumination effect diagram of the homogenization illumination device for the exposure machine in a preferred embodiment of the present invention.

[0029] The above figures include the following reference numerals: D1, first direction; D2, second direction; 10, laser; 11, target laser; 20, light dissipator; 201, first homogenizing light; 21, first lens; 22, second lens; 23, third lens; 24, fourth lens; 25, diffuser wheel; 26, third mirror; 30, light homogenizer; 31, collimator; 3101, second homogenizing light; 311, diffractive optical element; 3111, Intermediate light; 312, First reflecting mirror; 313, Collimating lens; 32, Digital micromirror device; 321, Target pattern light; 33, Miniature lens; 34, Second reflecting mirror; 35, Polarization control component; 36, Phase delay plate; 371, Guide tube; 3711, Curved groove; 3712, Locking screw hole; 372, Adjusting guide pin; 373, Connecting seat; 374, Locking screw; 40, Light field shaper; 50, Optical fiber. Detailed Implementation

[0030] It should be noted that, unless otherwise specified, the embodiments and features described in the present invention can be combined with each other. The present invention will now be described in detail with reference to the accompanying drawings and embodiments.

[0031] It should be noted that the terminology used herein is for the purpose of describing particular embodiments only and is not intended to limit the scope of exemplary embodiments according to the invention. As used herein, the singular form is intended to include the plural form as well, unless the context clearly indicates otherwise. Furthermore, it should be understood that when the terms "comprising" and / or "including" are used in this specification, they indicate the presence of features, steps, operations, devices, components, and / or combinations thereof.

[0032] Unless otherwise specifically stated, the relative arrangement, numerical expressions, and values ​​of the components and steps set forth in these embodiments do not limit the scope of the invention. It should also be understood that, for ease of description, the dimensions of the various parts shown in the drawings are not drawn to actual scale. Techniques, methods, and devices known to those skilled in the art may not be discussed in detail, but where appropriate, such techniques, methods, and devices should be considered part of the specification. In all examples shown and discussed herein, any specific values ​​should be interpreted as merely exemplary and not as limitations. Therefore, other examples of exemplary embodiments may have different values. It should be noted that similar reference numerals and letters in the following figures denote similar items; therefore, once an item is defined in one figure, it need not be further discussed in subsequent figures.

[0033] To address the issue of insufficient homogenization effect and localized laser intensity spikes in the homogenization illumination device of the exposure machine in related technologies, referring to... Figure 1 As shown, an embodiment of the present invention provides an exposure machine homogenization illumination device, including a laser 10, a light dissipator 20 and a light homogenizer 30.

[0034] Laser 10 is used to emit target laser 11, which is the base beam required for exposure. In actual use, different types of lasers 10 can be set to provide the corresponding light according to different exposure requirements.

[0035] The optical dissipator 20 is disposed on one side of the laser 10. For example, the optical dissipator 20 can be disposed directly on the light-emitting side of the laser 10, or it can be disposed on one side of the laser 10 along a direction perpendicular to the light-emitting direction of the laser 10, and the optical dissipator 20 can be used to reverse the direction of the target laser 11 through the optical fiber 50, the reflector, etc.

[0036] The optical dissipator 20 is used to receive the target laser 11 and homogenize it, outputting a first homogenized light 201. By setting the optical dissipator 20, the target laser 11 output by the laser 10 can be initially homogenized and dissipated. The output first homogenized light 201 has a better homogenization effect than the initial target laser 11.

[0037] Reference Figure 2 and Figure 3 As shown, the optical homogenizer 30 is disposed on one side of the optical diffractor 20. For example, the optical homogenizer 30 can be disposed directly on the light-emitting side of the optical diffractor 20, or it can be disposed on one side of the optical diffractor 20 along a direction perpendicular to the light-emitting direction of the optical diffractor 20, and the optical homogenizer 30 can be used to commutate the target laser 11 through the optical fiber 50, a reflector, etc.

[0038] The light homogenizer 30 works in conjunction with the light dissipator 20 to further improve the uniformity of the light field. Specifically, the light homogenizer 30 includes a collimator 31, a digital micromirror device 32 (DMD), and a miniature lens 33. Preferably, the collimator 31, the digital micromirror device 32, and the miniature lens 33 are integrated together, for example, by integrating them into a single optomechanical housing.

[0039] Collimator 31 receives the first homogenized light 201, performs collimation and secondary homogenization on the first homogenized light 201, and outputs the second homogenized light 3101. The output second homogenized light 3101 has a further improved homogenization effect compared to the first homogenized light 201. Collimator 31 can also correct the orientation of the first homogenized light 201, and the output second homogenized light 3101 is centered on the digital micromirror device 32.

[0040] It should be noted that if only the light extinction device 20 is used to homogenize the target laser 11 of the laser 10, although homogenization can be achieved, the beam is prone to angular and positional shifts after passing through the light extinction device 20, resulting in uneven collimated light field and affecting the homogenization and exposure uniformity of the digital micromirror device 32. Conventional collimators, integrating bars, compound eye lenses, and other structures cannot cope with homogenization degradation caused by such off-center incident light due to differences in architecture and precision. Therefore, in this embodiment of the invention, a collimator 31 is used to correct the beam attitude, indirectly improving the uniformity of the light field.

[0041] The digital micromirror device 32 is used to spatially modulate the second homogenizing light 3101 to output target pattern light 321. The digital micromirror device 32 has a plurality of arrayed micromirror components, which are configured to be flip-flop. After the digital micromirror device 32 receives an electrical signal command for the desired exposure pattern, the array of micromirror components flips, thereby spatially modulating the second homogenizing light 3101 and forming target pattern light 321 that matches the desired pattern.

[0042] The miniature lens 33 and the digital micromirror device 32 are arranged alternately. The miniature lens 33 is used to receive the target pattern light 321 and focus the target pattern light 321 so that the target pattern light 321 is projected onto the surface of the target workpiece. In this way, dynamic adjustment is performed to ensure that the image is always on the focal plane, thus completing the exposure operation.

[0043] The magnification of the miniature lens 33 is preferably set between 5 and 50x. The magnification of the miniature lens 33 should not be too low; if the magnification is less than 5x, it cannot meet the requirements for high-precision exposure and image reduction, resulting in insufficient resolution. The magnification of the miniature lens 33 should not be too high; if the magnification is greater than 50x, light energy attenuation is severe, easily leading to distortion and defocusing.

[0044] In practical use, a target laser 11 of a specific wavelength is emitted by laser 10. The target laser 11 first enters the optical dissipator 20, which initially disperses the Gaussian energy distribution of the laser, completing the initial homogenization process. Subsequently, the first homogenized light 201 is transmitted to the optical homogenizer 30, where the collimator 31 performs collimation and secondary homogenization, centered the second homogenized light 3101 onto the digital micromirror device 32. The digital micromirror device 32 modulates the pattern of the second homogenized light 3101, and finally, the target patterned light 321 is focused by the miniaturized lens 33, ultimately projecting a uniform light field onto the surface of the target workpiece, effectively improving the uniformity of the beam energy distribution and eliminating local intensity spikes in the laser.

[0045] In summary, the exposure machine homogenization illumination device of the present invention, through the cooperation of a light dissipator 20 and a light homogenizer 30, performs preliminary homogenization processing on the target laser 11 emitted by the laser 10 by the light dissipator 20, breaking up the Gaussian energy distribution of the laser to obtain a first homogenized light 201. Subsequently, based on the collimator 31 of the light homogenizer 30, the first homogenized light 201 is collimated and subjected to secondary homogenization processing to correct the beam attitude, so that the second homogenized light 3101 is centered and incident on the digital micromirror device 32. The digital micromirror device 32 modulates the second homogenized light 3101 to obtain a target patterned light 321, which is then focused by the miniaturized lens 33, and finally projected onto the surface of the target workpiece with a uniform light field, effectively improving the light homogenization effect and eliminating local light intensity peaks of the laser. In this way, the performance limitations of light homogenization solutions such as integrating bars, compound eye lenses, and diffusers are overcome, and the stringent requirements for light field uniformity in high-precision exposure in fields such as semiconductor packaging, high-precision electronic component manufacturing, optoelectronic display device processing, micro-nano processing, photopolymerization 3D printing, and flexible electronics can be met, ensuring the consistency of high-precision exposure and product yield.

[0046] Reference Figure 2 As shown, in some embodiments of the exposure machine homogenization illumination device of the present invention, the collimator 31 includes a diffractive optical element 311 (DOE), a collimating lens 313, and a first reflecting mirror 312.

[0047] The diffractive optical element 311 is used to receive the first homogenized light 201 and redistribute the spot energy of the first homogenized light 201 to obtain the intermediate light 3111. Specifically, the diffractive optical element 311 has a microstructure, which is based on the principle of light wave diffraction. The microstructure causes the incident light to generate multiple diffraction orders, and these diffracted light waves superimpose to form a preset light intensity distribution.

[0048] The collimating lens 313 is disposed on one side of the diffractive optical element 311. For example, both can be disposed on the same plane, or their centers can be disposed on the same straight line. The collimating lens 313 is used to receive the intermediate light 3111, and to collimate and homogenize the intermediate light 3111, and output the second homogenized light 3101.

[0049] The first reflecting mirror 312 is disposed between the diffractive optical element 311 and the collimating lens 313. The first reflecting mirror 312 is used to receive the intermediate light 3111 and to center the intermediate light 3111 onto the collimating lens 313.

[0050] For example, when the diffractive optical element 311 and the collimating lens 313 are arranged on the same plane, or when the centers of the diffractive optical element 311 and the collimating lens 313 are arranged on the same straight line, the first reflecting mirror 312 can be arranged between the two along the arrangement direction of the diffractive optical element 311 and the collimating lens 313, and at the same side of the two along a direction perpendicular to the arrangement direction of the diffractive optical element 311 and the collimating lens 313.

[0051] It should be noted that although the beam after initial homogenization by the dissipation module has suppressed local intensity spikes, there are still slight deviations in the propagation direction. If the beam is incident on the collimating lens 313 in a non-perpendicular and non-centered manner, it will cause problems such as edge intensity attenuation and center intensity shift in the collimated parallel light field, which will affect the digital homogenization accuracy of the subsequent digital micromirror device 32 and ultimately result in poor homogenization effect on the exposure working surface.

[0052] To address this issue, the problem can be effectively overcome by coordinating the diffractive optical element 311, the collimating lens 313, and the first reflecting mirror 312. The first reflecting mirror 312 ensures that the intermediate light 3111 is centered within the collimating lens 313, guaranteeing the uniformity of the collimated light field from the source. Furthermore, the entire collimating element 31 has a simple structure, minimal light efficiency loss, no significant energy loss, good integration, small size, and high space utilization.

[0053] Furthermore, refer to Figure 2 As shown, in some embodiments of the exposure machine homogenization illumination device of the present invention, diffractive optical elements 311 and first reflecting mirrors 312 are arranged sequentially at intervals along the first direction D1. Along the second direction D2, the first reflecting mirrors 312 and collimating lenses 313 are arranged sequentially at intervals. Preferably, the second direction D2 is perpendicular to the first direction D1.

[0054] The light homogenizer 30 also includes a second reflector 34, which is disposed along the second direction D2 on the side of the collimating lens 313 away from the first reflector 312. The second reflector 34 is used to receive the second homogenized light 3101 and to center the second homogenized light 3101 onto the digital micromirror device 32.

[0055] Along the second direction D2, the digital micromirror device 32 and the miniature lens 33 are both disposed between the collimating lens 313 and the second reflecting mirror 34, and along the first direction D1, the digital micromirror device 32 and the miniature lens 33 are respectively disposed on both sides of the second reflecting mirror 34. It should be noted that, to avoid interference between lights, the collimating element 31 and the second reflecting mirror 34, as well as the digital micromirror device 32 and the miniature lens 33, can be offset in a third direction, so that the second homogenizing light 3101 and the target pattern light 321 are misaligned. Preferably, the third direction is perpendicular to the first direction D1 and the second direction D2, respectively.

[0056] In actual use, the first homogenized light 201 first passes through the diffractive optical element 311, and the diffractive optical element 311 redistributes the energy of the input light spot before inputting it into the first reflecting mirror 312.

[0057] The first reflecting mirror 312 is pre-adjusted at an angle to correct the deviation in the propagation direction of the intermediate light 3111, so that the intermediate light 3111 enters the center of the collimating lens 313 in a regular posture, ensuring that the energy distribution of the parallel light field output by the entire collimator 31 is more uniform and the propagation direction is more consistent.

[0058] After being redirected, the intermediate light 3111 enters the collimating lens 313, and the collimating lens 313 calibrates the diverging beam into a parallel beam. At the same time, the optical characteristics of the collimating lens 313 are used to further optimize the small energy distribution unevenness remaining in the beam, so as to avoid the energy distribution unevenness caused by the propagation angle deviation. The second homogenizing light 3101 is output and input to the second reflector 34.

[0059] The second reflector 34 is pre-adjusted at an angle, and the propagation direction of the second homogenizing light 3101 is adjusted by the second reflector 34 so that it is transmitted to the digital micromirror device 32.

[0060] The digital micromirror device 32 controls the micromirror array to flip according to the electrical signal command of the exposure pattern, and spatially modulates the light beam to form an optical signal that perfectly matches the target pattern, namely the target pattern light 321.

[0061] The modulated target pattern light 321 enters the miniature lens 33, which can be pre-adjusted to its axial position, so that a uniform and precise light field is irradiated onto the surface of the target workpiece, ensuring that the image is always at the focal plane and completing the exposure operation.

[0062] Thus, the collimator 31, the second reflector 34, and the two sets of components, the digital micromirror device 32 and the miniature lens 33, are arranged in a cross-shaped structure. The overall optical path is fixed, eliminating the need for additional complex adjustment mechanisms, effectively reducing the device failure rate and maintenance costs. High homogenization and dynamic adjustment of the miniature lens 33 enable precise exposure, supporting fine patterning in various scenes. Furthermore, compared to directly arranging the collimator 31, digital micromirror device 32, and miniature lens 33 in a straight line, this arrangement fully utilizes the space in the first direction D1 and saves space in the second direction D2, improving space utilization, optimizing the overall volume, increasing structural integration, and adapting to the miniaturization needs of the device.

[0063] Reference Figure 3 As shown, in some embodiments of the exposure machine homogenization illumination device of the present invention, the collimating element 31 includes a collimating lens 313 and a first reflecting mirror 312. The collimating lens 313 is used to receive the first homogenized light 201, and to collimate and homogenize the first homogenized light 201, and output the second homogenized light 3101.

[0064] In this embodiment, the first homogenizing light 201 directly enters the collimating lens 313, and the collimating lens 313 calibrates the diverging beam into a parallel beam. At the same time, the optical characteristics of the collimating lens 313 are used to further optimize the small energy distribution unevenness remaining in the beam, so as to avoid the uneven energy distribution caused by the propagation angle deviation. The second homogenizing light 3101 is output and input to the first reflecting mirror 312.

[0065] Along the first direction D1, a first reflecting mirror 312 and a collimating lens 313 are arranged at intervals. The first reflecting mirror 312 is used to receive the second homogenized light 3101 and adjust the propagation direction deviation of the second homogenized light 3101.

[0066] The light homogenizer 30 also includes a second reflector 34. Along the second direction D2, the first reflector 312 and the second reflector 34 are arranged alternately, with the second direction D2 perpendicular to the first direction D1. The second reflector 34 is used to receive the second homogenized light 3101 and to center the second homogenized light 3101 onto the digital micromirror device 32.

[0067] Along the second direction D2, the digital micromirror device 32 and the miniature lens 33 are both disposed between the first reflector 312 and the second reflector 34, and along the first direction D1, the digital micromirror device 32 and the miniature lens 33 are respectively disposed on both sides of the second reflector 34.

[0068] It should be noted that, to avoid interference between lights, the collimator 31, the second reflector 34, the digital micromirror device 32, and the miniature lens 33 can be offset in the third direction, so that the second homogenizing light 3101 and the target pattern light 321 are misaligned. Preferably, the third direction is perpendicular to the first direction D1 and the second direction D2, respectively.

[0069] In actual use, the first homogenized light 201 first passes through the collimating lens 313, which precisely collimates the first homogenized light 201, converting the divergent beam into a parallel light field. At the same time, the optical characteristics of the collimating lens 313 are used to perform preliminary optimization of the small uneven distribution of residual energy in the beam.

[0070] The collimated second homogenized light 3101 is incident on the first reflector 312. By pre-setting the angle of the first reflector 312, the propagation direction deviation of the beam is corrected, so that the beam is incident on the second reflector 34 in a regular posture. By pre-setting the angle of the second reflector 34, it is ensured that the parallel light field can be centered and incident on the digital micromirror device 32.

[0071] The digital micromirror device 32 controls the micromirror array to flip according to the electrical signal command of the exposure pattern, and spatially modulates the light beam to form an optical signal that perfectly matches the target pattern, namely the target pattern light 321.

[0072] The modulated target pattern light 321 enters the miniature lens 33, which can be pre-adjusted to its axial position, so that a uniform and precise light field is irradiated onto the surface of the target workpiece, ensuring that the image is always at the focal plane and completing the exposure operation.

[0073] Thus, the structure differs from that of the first collimator 31. In this embodiment, the collimator 31, the second reflector 34, and the two sets of components, the digital micromirror device 32 and the miniature lens 33, are arranged in a cross-shaped structure. The overall optical path is fixed, eliminating the need for additional complex adjustment mechanisms, effectively reducing the device failure rate and maintenance costs. High homogenization and dynamic adjustment of the miniature lens 33 enable precise exposure, supporting fine patterning processing in various scenes. Furthermore, compared to directly arranging the collimator 31, digital micromirror device 32, and miniature lens 33 in a straight line, this arrangement fully utilizes the space in the first direction D1 and saves space in the second direction D2, improving space utilization, optimizing the overall volume, increasing structural integration, and adapting to the miniaturization needs of the device.

[0074] Reference Figure 4 As shown, the exposure optical engine homogenization illumination device of the present invention, in some embodiments, further includes a light field shaper 40. The light field shaper 40 is disposed between the light dissipator 20 and the light homogenizer 30, and preferably the connection between the components is realized through an optical fiber 50.

[0075] The light field shaper 40 has multiple arrayed micro-nano units, which are used to receive the first homogenized light 201, perform wavefront phase modulation and energy spatial redistribution processing on the first homogenized light 201, and input the processed first homogenized light 201 into the light homogenizer 30. Preferably, the light field shaper 40 is a passive structure, without electrical control, drive, or moving parts.

[0076] An additional light field shaper 40 is set between the light dissipator 20 and the light homogenizer 30. The first homogenized light 201 is subjected to wavefront phase modulation and energy spatial redistribution through a preset micro-nano unit structure. During the beam propagation process, the angular offset, positional eccentricity and local energy peaks of the output beam of the light dissipator 20 are passively corrected, so that the beam is incident in a centered, parallel and uniform state, which can further improve the overall homogenization effect.

[0077] In practical use, the light field shaper 40 can perform dual processing on the first homogenized light 201 after initial homogenization by the light dissipator 20: energy redistribution and beam profile regularization. For areas of local convergence and uneven energy density in the beam, the optical shaping effect evenly disperses the converged energy across the entire beam cross-section, completely eliminating energy distribution defects in the beam itself. At the same time, it can regularize the beam profile, making the energy distribution of the beam cross-section more uniform and the edges smoother, avoiding homogenization deviations caused by abrupt energy changes at the beam edges.

[0078] The first homogenized light 201, after being processed by the light field shaper 40, enters the light homogenizer 30 and is collimated by the collimator 31. The collimated parallel light field has a more uniform energy distribution, with no local energy convergence or attenuation, which greatly reduces the homogenization load of the digital micromirror device 32. This allows the digital micromirror device 32 to focus on extremely small light intensity fluctuations and achieve higher precision homogenization output.

[0079] Reference Figure 4 As shown, in some embodiments of the exposure homogenization illumination device of the present invention, the light homogenizer 30 further includes a polarization control element 35 and a phase retardation film 36. It should be noted that the polarization control element 35 and the phase retardation film 36 can be set independently or used in conjunction with the light field shaper 40.

[0080] A polarization control element 35 is disposed on the output side of the collimator 31. The polarization control element 35 receives the second homogenized light 3101, performs polarization state adjustment processing on the second homogenized light 3101, and inputs the processed second homogenized light 3101 to the phase retarder 36. In this way, by detecting and adjusting the polarization state of the beam through the polarization control element 35, the beam can maintain a stable polarization direction, ensuring that the modulation efficiency of the digital micromirror device 32 on the beam is uniform.

[0081] A phase retarder 36 is disposed between the polarization control element 35 and the digital micromirror device 32. The phase retarder 36 receives the second homogenized light 3101, performs phase deviation correction processing on the second homogenized light 3101, and inputs the processed second homogenized light 3101 into the digital micromirror device 32. In this way, the beam propagation direction shift and uneven energy distribution caused by phase deviation can be avoided, further optimizing the light field energy distribution.

[0082] Preferably, the homogenization illumination device of the exposure machine is also equipped with a homogenization monitor. The actual homogenization data is obtained through the homogenization monitor, and the corresponding polarization adjustment parameters are dynamically adjusted to ensure the stability of the beam polarization state and adapt to the digital homogenization requirements of the subsequent digital micromirror device 32.

[0083] The polarization control element 35 and the phase retardation film 36 work together to ensure stable polarization state and consistent phase, preventing uneven reflection efficiency and insufficient local intensity modulation of the beam caused by polarization state shifts in the digital micromirror device 32. This results in more precise pixel-level modulation and better homogenization effect of the digital micromirror device 32. Simultaneously, it effectively avoids homogenization degradation caused by polarization state fluctuations, significantly improving homogenization stability, making it particularly suitable for high-precision exposure scenarios involving long-term continuous operation.

[0084] Reference Figure 5 As shown, in some embodiments of the exposure machine homogenization illumination device of the present invention, the light dissipator 20 includes a first lens 21, a second lens 22, a diffuser 25, a third lens 23, a third reflector 26 and a fourth lens 24 arranged sequentially at intervals.

[0085] The first lens 21 is used to receive the target laser 11, collimate the target laser 11, reduce the beam divergence angle, and input the processed target laser 11 into the second lens 22.

[0086] The second lens 22 is used to focus the target laser 11 and input the processed target laser 11 into the diffuser wheel 25, so that the beam converges into the effective working area of ​​the diffuser wheel 25, ensuring sufficient homogenization.

[0087] The diffuser wheel 25 is used to homogenize the target laser 11, break up the original Gaussian energy distribution of the laser, suppress energy spikes, and input the processed target laser 11 into the third lens 23.

[0088] The third lens 23 is used to collimate the divergent target laser 11 after passing through the diffuser wheel 25, so that the divergent beam is calibrated into a parallel beam, and the processed target laser 11 is input into the third reflector 26.

[0089] The third reflecting mirror 26 is used to center the target laser 11 onto the fourth lens 24.

[0090] The fourth lens 24 is used to shape the target laser 11, further optimize the beam aperture and energy distribution, and output the first homogenized light 201.

[0091] In this way, the Gaussian energy distribution of the laser can be initially dispersed through coupling and scattering processing of the optical fiber 50 in the optical diffuser 20, thus completing the initial homogenization process.

[0092] Reference Figure 1 , Figure 4 and Figure 5 As shown, in some embodiments of the exposure machine homogenization illumination device of the present invention, the light dissipator 20 and the laser 10, as well as the light dissipator 20 and the light homogenizer 30, are all connected by optical fibers 50. By setting the optical fibers 50 to connect the corresponding components, a stable optical signal can be provided for subsequent homogenization processing.

[0093] Reference Figure 6 As shown, in some embodiments of the exposure light machine homogenizing illumination device of the present invention, the light homogenizer 30 further includes a focus adjustment component.

[0094] The focusing adjustment component includes a guide cylinder 371, an adjusting guide pin 372, a connecting seat 373, and a locking screw 374. The guide cylinder 371 has a curved groove 3711 and a locking screw hole 3712 on its wall. The adjusting guide pin 372 is movably disposed within the curved groove 3711. Preferably, multiple sets of curved grooves 3711 are provided to ensure structural stability.

[0095] A connecting seat 373 is disposed on the guide cylinder 371. The connecting seat 373 is connected to the adjusting guide pin 372 and the miniature lens 33 respectively. The connecting seat 373 is rotatable and axially movable relative to the guide cylinder 371. A locking screw 374 is threadedly connected to a locking screw hole 3712. The locking screw 374 rotates relative to the locking screw hole 3712 to fix or unlock the connecting seat 373.

[0096] When adjustment is required, simply loosen the locking screw 374 and then slide the adjusting guide pin 372 in the curved groove 3711 as needed. This will allow the connecting seat 373 to make a spiral motion within the guide cylinder 371, i.e., rotate and move axially, thereby adjusting the relative position of the miniature lens 33 to achieve focusing and ensure that the image is always on the focal plane.

[0097] On the other hand, refer to Figure 7 As shown, this embodiment of the invention also provides an exposure machine homogenization illumination method, which is applied to the exposure machine homogenization illumination device described in any of the above embodiments.

[0098] The exposure machine homogenization illumination method includes steps S10, S20, S30 and S40.

[0099] In step S10, the laser 10 is controlled to emit the target laser 11, and the optical dissipator 20 receives the target laser 11 and homogenizes it, outputting the first homogenized light 201. The optical dissipator 20 is located on one side of the laser 10.

[0100] In step S20, the collimator 31 of the light homogenizer 30 receives the first homogenized light 201, and performs collimation and secondary homogenization processing on the first homogenized light 201, outputting the second homogenized light 3101. The light homogenizer 30 is disposed on one side of the light dissipator 20, and the light homogenizer 30 also includes a digital micromirror device 32 and a miniature lens 33, which are arranged sequentially at intervals.

[0101] In step S30, the second homogenizing light 3101 is incident on the digital micromirror device 32 in the center, and the digital micromirror device 32 performs spatial modulation on the second homogenizing light 3101 to output the target pattern light 321.

[0102] In step S40, the miniature lens 33 receives the target pattern light 321 and focuses the target pattern light 321 so that the target pattern light 321 is projected onto the surface of the target workpiece.

[0103] To verify the effectiveness of the invention, the inventors conducted multiple sets of comparative tests.

[0104] Reference Figures 8 to 10 As shown, Figure 8 A schematic diagram showing the lighting effect when the laser 10 and the light homogenizer 30 are directly connected, i.e., the light dissipator 20 is removed. Figure 9 A schematic diagram showing the illumination effect when the laser 10 and the light homogenizer 30 are directly connected, and the diffractive optical element 311 is replaced with a scattering sheet. Figure 10 A schematic diagram showing the illumination effect when only the diffractive optical element 311 is replaced with a diffuser is presented.

[0105] Correspondingly, Figure 11 and Figure 12 These are schematic diagrams illustrating the lighting effects of two different collimators 31. Figure 11 The collimating element 31 includes a diffractive optical element 311, a collimating lens 313, and a first reflecting mirror 312. Figure 12 The collimating element 31 includes a collimating lens 313 and a first reflecting mirror 312.

[0106] Based on these schematic diagrams, it can be determined that both the diffractive optical element 311 and the scattering sheet can improve the homogenization effect of the exposure optical machine. However, the homogenization effect of the diffractive optical element 311 is better than that of the scattering sheet. At the same time, simply setting the collimating lens 313 and the first reflecting mirror 312, and placing the collimating lens 313 in front of the first reflecting mirror 312, can also improve the homogenization effect of the exposure optical machine.

[0107] For ease of description, spatial relative terms such as "above," "on top of," "on the upper surface of," "above," etc., are used herein to describe the spatial positional relationship of a device or feature as shown in the figures to other devices or features. It should be understood that spatial relative terms are intended to encompass different orientations in use or operation beyond the orientation of the device as described in the figures. For example, if the device in the figures were inverted, a device described as "above" or "on top of" other devices or structures would subsequently be positioned as "below" or "under" other devices or structures. Thus, the exemplary term "above" can include both "above" and "below." The device may also be positioned in other different ways (rotated 90 degrees or in other orientations), and the spatial relative descriptions used herein will be interpreted accordingly.

[0108] Furthermore, it should be noted that the use of terms such as "first" and "second" to define components is merely for the purpose of distinguishing the corresponding components. Unless otherwise stated, the above terms have no special meaning and therefore should not be construed as limiting the scope of protection of this invention.

[0109] The above are merely preferred embodiments of the present invention and are not intended to limit the present invention. Various modifications and variations can be made to the present invention by those skilled in the art. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of the present invention should be included within the scope of protection of the present invention.

Claims

1. A homogenization illumination device for an exposure machine, characterized in that, include: A laser used to emit laser light from a target; A light dissipator is disposed on one side of the laser; The light dissipator is used to receive the target laser and homogenize the target laser, and output the first homogenized light; A light homogenizer is disposed on one side of the light dissipator; the light homogenizer includes a collimator, a digital micromirror device, and a miniature lens; the collimator is used to receive the first homogenized light and to collimate and homogenize the first homogenized light, outputting a second homogenized light incident centrally on the digital micromirror device; the digital micromirror device is used to spatially modulate the second homogenized light and output target pattern light; the miniature lens and the digital micromirror device are arranged alternately in sequence, the miniature lens is used to receive the target pattern light and to focus the target pattern light so that the target pattern light is projected onto the surface of the target workpiece.

2. The homogenizing illumination device for an exposure machine according to claim 1, characterized in that, The collimator includes: A diffractive optical element is used to receive the first homogenized light and redistribute the spot energy of the first homogenized light to obtain intermediate light; A collimating lens is disposed on one side of the diffractive optical element; the collimating lens is used to receive the intermediate light, collimate and homogenize the intermediate light in a second manner, and output the second homogenized light. A first reflecting mirror is disposed between the diffractive optical element and the collimating lens. The first reflecting mirror is used to receive the intermediate light and to center the intermediate light onto the collimating lens.

3. The homogenizing illumination device for an exposure machine according to claim 2, characterized in that: Along a first direction, the diffractive optical element and the first reflector are arranged at intervals in sequence; along a second direction, the first reflector and the collimating lens are arranged at intervals in sequence, and the second direction is perpendicular to the first direction. The light homogenizer further includes a second mirror, which is disposed on the side of the collimating lens away from the first mirror along the second direction; the second mirror is used to receive the second homogenized light and to center the second homogenized light onto the digital micromirror device. Along the second direction, the digital micromirror device and the miniature lens are both disposed between the collimating lens and the second reflector, and along the first direction, the digital micromirror device and the miniature lens are respectively disposed on both sides of the second reflector.

4. The homogenizing illumination device for an exposure machine according to claim 1, characterized in that: The collimating element includes a collimating lens and a first reflecting mirror; the collimating lens is used to receive the first homogenized light, collimate and homogenize the first homogenized light, and output the second homogenized light. Along a first direction, the first reflecting mirror and the collimating lens are arranged at intervals in sequence; the first reflecting mirror is used to receive the second homogenized light and adjust the propagation direction deviation of the second homogenized light; The light homogenizer further includes a second reflector. Along the second direction, the first reflector and the second reflector are arranged at intervals. The second direction is perpendicular to the first direction. The second reflector is used to receive the second homogenized light and to center the second homogenized light onto the digital micromirror device. Along the second direction, the digital micromirror device and the miniature lens are both disposed between the first reflector and the second reflector, and along the first direction, the digital micromirror device and the miniature lens are respectively disposed on both sides of the second reflector.

5. The homogenizing illumination apparatus for an exposure machine according to any one of claims 1 to 4, characterized in that, Also includes: An optical field shaper is disposed between the optical dissipator and the optical homogenizer; the optical field shaper has multiple arrayed micro-nano units, the micro-nano units are used to receive the first homogenized light, perform wavefront phase modulation and energy spatial redistribution processing on the first homogenized light, and input the processed first homogenized light into the optical homogenizer.

6. The homogenizing illumination apparatus for an exposure machine according to any one of claims 1 to 4, characterized in that: The optical homogenizer also includes a polarization control element and a phase delay plate; The polarization control element is disposed on the output side of the collimator. The polarization control element is used to receive the second homogenized light, perform polarization state adjustment processing on the second homogenized light, and input the processed second homogenized light into the phase delay plate. The phase retarder is disposed between the polarization control device and the digital micromirror device. The phase retarder is used to receive the second homogenized light, perform phase deviation correction processing on the second homogenized light, and input the processed second homogenized light into the digital micromirror device.

7. The homogenizing illumination device for an exposure machine according to claim 1, characterized in that: The light dissipator includes a first lens, a second lens, a diffuser wheel, a third lens, a third reflector, and a fourth lens arranged in sequence at intervals. The first lens is used to receive the target laser, collimate the target laser, and input the processed target laser into the second lens; The second lens is used to focus the target laser and input the processed target laser into the diffuser wheel; The diffusion wheel is used to homogenize the target laser and input the processed target laser into the third lens; The third lens is used to collimate the target laser and input the processed target laser into the third reflecting mirror; The third reflecting mirror is used to center the target laser onto the fourth lens; The fourth lens is used to shape the target laser and output the first homogenized light.

8. The homogenizing illumination device for an exposure machine according to claim 1 or 7, characterized in that: The optical scattering device and the laser, as well as the optical scattering device and the optical homogenizer, are all connected by optical fibers.

9. The homogenizing illumination apparatus for an exposure machine according to any one of claims 1 to 4, characterized in that: The light homogenizer also includes a focusing adjustment component, which comprises a guide cylinder, an adjusting guide pin, a connecting seat, and a locking screw. The guide cylinder has a curved groove and a locking screw hole on its wall, and the adjusting guide pin is movably disposed within the curved groove. The connecting seat is disposed on the guide cylinder and connects to the adjusting guide pin and the microlens, respectively. The connecting seat is rotatable and axially movable relative to the guide cylinder. The locking screw is threadedly connected to the locking screw hole, and the locking screw rotates relative to the locking screw hole to fix or unlock the connecting seat.

10. A method for homogenizing illumination in an exposure machine, applied to the homogenizing illumination apparatus for an exposure machine as described in any one of claims 1 to 9, characterized in that, Including the following steps: A laser is controlled to emit a target laser, and an optical dissipator receives the target laser and homogenizes it, outputting a first homogenized light; wherein, the optical dissipator is disposed on one side of the laser. The collimator of the optical homogenizer receives the first homogenized light and performs collimation and secondary homogenization on the first homogenized light, and outputs the second homogenized light; wherein, the optical homogenizer is disposed on one side of the optical dissipator, and the optical homogenizer further includes a digital micromirror device and a miniature lens, the miniature lens and the digital micromirror device being arranged alternately in sequence. The second homogenized light is incident on the digital micromirror device in the center, and the digital micromirror device spatially modulates the second homogenized light to output the target pattern light; The miniature lens receives the target pattern light and focuses the target pattern light so that it is projected onto the surface of the target workpiece.

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