Semiconductor grade propylene glycol methyl ether acetate, and methods and systems for making same

By employing a series of dehydration, light component removal, acid removal, heavy component removal, deionization, and microparticle removal processes, the problem of substandard propylene glycol methyl ether acetate products in existing technologies has been solved. This enables the high-purity and efficient preparation of semiconductor-grade propylene glycol methyl ether acetate, meeting the solvent requirements of high-end photoresists.

CN122102906APending Publication Date: 2026-05-29CHINA PETROLEUM & CHEMICAL CORP +1
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
CHINA PETROLEUM & CHEMICAL CORP
Filing Date
2024-11-28
Publication Date
2026-05-29

AI Technical Summary

Technical Problem

Existing technologies cannot effectively control the metal ions, acid value, and moisture content in propylene glycol methyl ether acetate, resulting in product quality that cannot meet the standards for solvents used in the preparation of high-end photoresists.

Method used

Semiconductor-grade propylene glycol methyl ether acetate is prepared by using a dehydration tower, a light-light ...heavy-light-heavy-light-heavy-light-heavy-light-heavy-light-heavy-light-heavy-light-heavy-light-heavy-light-heavy-light-heavy-light-heavy-light-heavy-heavy-heavy-heavy-heavy-heavy-heavy-heavy-heavy-heavy-heavy-heavy-heavy-heavy-heavy-heavy-heavy-

Benefits of technology

The obtained semiconductor-grade propylene glycol methyl ether acetate product has a purity of up to 99.99 wt%, moisture content ≤ 50 ppm, acid value < 10 ppm, single metal ion content ≤ 10 ppt, single anion content ≤ 5 ppb, and particle content ≤ 10 particles/ml, meeting the requirements for matching solvents of high-end semiconductor photoresists.

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Abstract

The present application relates to the preparation field of wet electronic chemicals, and discloses a semiconductor-grade propylene glycol methyl ether acetate and a preparation method and a preparation system thereof, the preparation method comprising: sequentially performing dehydration treatment, light-removing treatment, acid-removing treatment, heavy-removing treatment, ion-removing treatment and microparticle-removing treatment on crude propylene glycol methyl ether acetate. The preparation method is green and efficient, the semiconductor-grade propylene glycol methyl ether acetate product prepared by the present application can reach a purity of more than 99.99wt%, a water content of less than or equal to 50ppm, a colority of less than or equal to 5 Hazen, an acid value of less than 10ppm, a single metal ion of less than or equal to 10ppt, a single anion of less than or equal to 5ppb, and microparticles with a size greater than or equal to 50nm of less than or equal to 10 / ml. Through the preparation method and system of the present application, the semiconductor-grade propylene glycol methyl ether acetate product meeting the above technical standards is obtained, and the demand for a matching solvent of high-end semiconductor photoresist is met.
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