Method for manufacturing a solar cell, solar cell

Abstract

The application relates to a preparation method of a solar cell and the solar cell. The preparation method comprises the following steps: depositing at least one first passivation layer and at least one first conductive type doping layer on a first surface of a silicon wafer, depositing at least one second passivation layer and at least one second conductive type doping layer on a second surface of the silicon wafer; depositing a first transparent conductive layer on the first conductive type doping layer and depositing a second transparent conductive layer on the second conductive type doping layer on a carrier plate with a mask to form a cell wafer; screening out the cell wafer with offset second transparent conductive layer through detection; and removing the offset part of the second transparent conductive layer through electrochemical reduction reaction etching of the second transparent conductive layer by taking an acidic solid-state conductive gel as an electrolyte, so that the etching rate of an indium tin-free or low-indium tin-based transparent conductive layer can be improved, and the non-etching area can be prevented from being damaged.

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