Wafer box cleaning equipment

Abstract

The utility model relates to wafer box cleaning equipment which comprises a bottom rack and a top support which are used for supporting and connecting all parts, the top support is installed above the bottom rack, the left end and the right end of the top support are respectively provided with an air shower device, and a cleaning conveying device is installed in the top support. A pick-and-place conveying device is installed at one end of the clean conveying device, automatic door devices are further installed at the positions, located at the two ends of the clean conveying device, of the top support respectively, and a control box used for controlling actions is further installed above the bottom rack. According to the technical scheme, automatic conveying and cleaning of the wafer box can be achieved, the device is matched with a crown block to act, manual operation is not needed in the whole process, two hands are completely liberated, and practicability is higher.

Description

Technical Field

[0001] The utility model relates to the technical field of semiconductor clean equipment, and more specifically, to a wafer box clean equipment. Background Art

[0002] With the trend of smart phones, computers and automobiles, the semiconductor components, which are crucial, have a growing market prospect. When producing semiconductors, the chemical element silicon is processed in the form of chips, that is, wafers. Wafers are thin, light, brittle and have high requirements for environmental cleanliness. In order to reduce the risk of wafer contamination, wafers are generally stored in special plastic boxes under clean room conditions and transported through wafer boxes. With the continuous growth of demand for semiconductors, the automation requirements of its production process are increasing.

[0003] When producing wafers, the wafer factory requires different clean room levels for different processes. When low-cleanliness wafers need to enter high-cleanliness processes after processing, the wafers need to be stacked in wafer boxes in advance for transportation to avoid damaging the wafers. The wafer boxes and the wafers inside are then cleaned to meet the high-cleanliness requirements.

[0004] At present, wafer boxes and the wafers inside are mainly placed manually into air showers for cleaning. After cleaning, they are manually taken out and transferred to the next process. This working method results in low production efficiency. Due to manual loading and unloading, there are great safety hazards and high labor intensity for workers. Utility Model Content

[0005] In view of the deficiencies in the prior art, the purpose of the utility model is to provide a wafer box cleaning device, which can realize automatic conveying and cleaning of the wafer box, cooperate with the overhead crane to operate, and does not require manual operation throughout the process, completely freeing hands and being more practical.

[0006] The above technical purpose of the utility model is achieved through the following technical solutions: a wafer box clean equipment, including a bottom frame and a top bracket for supporting and connecting various components, the top bracket is installed above the bottom bracket, and air shower devices are installed at the left and right ends of the top bracket respectively, a clean conveying device is installed in the top bracket, a pick-up and placement conveying device is installed at one end of the clean conveying device, automatic door devices are also installed on the top bracket at both ends of the clean conveying device, and a control box for controlling the action is also installed above the bottom frame.

[0007] Furthermore, the air shower device includes a centrifugal fan, a primary filter, a high-efficiency filter, an air shower nozzle and an outer cover, the primary filter is installed at one end close to the clean conveying device, the air shower nozzle is installed above the primary filter, the centrifugal fan is installed at one end of the primary filter, the high-efficiency filter is installed above the centrifugal fan, and the outer cover is installed on the outside of the centrifugal fan, the primary filter, the high-efficiency filter and the air shower nozzle.

[0008] Furthermore, the air shower device also includes a first mounting plate for mounting an air shower nozzle, and the four corners of the first mounting plate are respectively mounted with air shower nozzles.

[0009] Furthermore, the air shower device also includes an inner cover for covering the high-efficiency filter and the air shower nozzle, and the bottom of the inner cover is connected to the air outlet of the centrifugal fan.

[0010] Furthermore, the air shower device also includes a second mounting plate for mounting a primary filter.

[0011] Furthermore, an intermediate support plate is installed in the inner cover, and the high-efficiency filter is installed thereon.

[0012] Furthermore, the conveying surfaces of the clean conveying device and the pick-and-place conveying device are on the same horizontal plane.

[0013] Furthermore, a transition roller is installed on the top bracket between the clean conveying device and the pick-and-place conveying device.

[0014] Furthermore, height-adjusting brackets are respectively installed at the bottom of the clean conveying device and the pick-and-place conveying device.

[0015] Furthermore, the bottom of the inner cover is connected to the air outlet of the centrifugal fan by installing an air duct.

[0016] In summary, the utility model has the following beneficial effects:

[0017] The utility model discloses a wafer box cleaning equipment, by setting a top bracket, and installing air shower devices at the front and rear ends of the top bracket, the air shower device has primary and high-efficiency secondary dust removal components, and the dust removal effect is good to meet the high cleanliness requirement, automatic door devices are installed at the left and right ends of the top bracket, so as to form a closed air shower room, a clean conveying device is installed in the air shower room, the wafer box to be cleaned can be conveyed into the air shower room for automatic cleaning, the automatic door device is automatically closed and opened according to the clean state, when the wafer box is in the clean state, the automatic door is in the closed state, ensuring that it is in a relatively sealed clean environment, and the cleaning efficiency is higher, in other states, the automatic door device is closed and opened according to the flow direction of the wafer box, after the wafer box is cleaned, it enters the pick-and-place conveying device, the pick-and-place conveying device conveys the wafer box to the correct clamping position for external clamping and transfer, no manual operation is required in the whole process, the degree of automation is high, the wafer box will not be damaged, and it is safe and efficient. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] Figure 1 This is a structural diagram of a wafer box cleaning device of the utility model;

[0019] Figure 2 This is an exploded structural diagram of an air shower device in a wafer box clean equipment of the utility model;

[0020] Figure 3 This is a connection structure diagram of a clean conveying device and a pick-and-place conveying device in a wafer box clean equipment of the utility model;

[0021] Figure 4 The utility model discloses an internal structure diagram of a clean conveying device in a wafer box clean equipment.

[0022] In the figure: 1. bottom frame; 2. top bracket; 3. air shower device; 3a. centrifugal fan; 3b. primary filter; 3c. high efficiency filter; 3d. air shower nozzle; 3e. outer cover; 3f. first mounting plate; 3g. second mounting plate; 3h. inner cover; 3i. middle support plate; 3j. air duct; 4. clean conveying device; 5. pick-and-place conveying device; 6. automatic door device; 7. control box; 8. transition roller; 9. synchronous belt; 10. pulley; 11. transmission device; 12. support frame; 13. guide assembly; 14. sensor; 15. height adjustment bracket; 16. wafer box. DETAILED DESCRIPTION

[0023] The utility model is described in detail below in conjunction with the accompanying drawings and embodiments.

[0024] like Figure 1-4As shown, the utility model provides a wafer box 16 clean equipment, including a bottom frame 1 and a top bracket 2 for supporting and connecting various components. The top bracket 2 is installed above the bottom bracket. The bottom frame 1 and the top bracket 2 are both used to fix and support various structural components. Specifically, the bottom frame 1 and the top bracket 2 are assembled with aluminum profiles of different lengths. Compared with steel, the aluminum profile has a lighter weight, which makes the aluminum profile frame lighter and easier to carry, reducing the difficulty of installation and maintenance; it has high strength, can provide sufficient structural support and stability, and can withstand large loads and impacts; and it is corrosion-resistant and has a long service life. The length and width of the top bracket 2 are smaller than the bottom bracket. The bottom four corners of the bottom bracket are respectively installed with casters for easy movement. The bottom bracket is provided with an outer shell, and the inside of the shell can be used to install the electric control cabinet, and a movable door is provided for easy maintenance.

[0025] Air shower devices 3 are installed at the left and right ends of the top bracket 2, a clean conveying device 4 is installed in the top bracket 2, a pick-up and placement conveying device 5 is installed at one end of the clean conveying device 4, automatic door devices 6 are also installed at both ends of the clean conveying device 4 on the top bracket 2, and a control box 7 for controlling the action is also installed above the bottom frame 1.

[0026] The air shower device 3 includes a centrifugal fan 3a, a primary filter 3b, a high-efficiency filter 3c, an air shower nozzle 3d and an outer cover 3e. The primary filter 3b is installed at one end close to the clean conveying device 4, the air shower nozzle 3d is installed above the primary filter 3b, the centrifugal fan 3a is installed at one end of the primary filter 3b, the high-efficiency filter 3c is installed above the centrifugal fan 3a, and the outer cover 3e is installed on the outside of the centrifugal fan 3a, the primary filter 3b, the high-efficiency filter 3c and the air shower nozzle 3d.

[0027] Specifically, the air shower device 3 is further provided with a first mounting plate 3f for mounting the air shower nozzle 3d, and the four corners of the first mounting plate 3f are respectively mounted with the air shower nozzle 3d; an inner cover 3h for covering the high-efficiency filter 3c and the air shower nozzle 3d is further provided, and the bottom of the inner cover 3h is connected to the air outlet of the centrifugal fan 3a; a second mounting plate 3g for mounting the primary filter 3b is further provided, and a plurality of air inlet holes are evenly distributed on the second mounting plate 3g. The first mounting plate 3f and the second mounting plate 3g are both rectangular plates, and are mounted on the same vertical plane in an aligned manner, and the inner cover 3h is fixedly mounted on the first mounting plate 3f.

[0028] An intermediate support plate 3i is installed inside the inner cover 3h, and a high-efficiency filter 3c is installed thereon. The intermediate support plate 3i divides the inner cover 3h into two gas flow areas. The gas from the centrifugal fan 3a first enters the area far away from the air shower nozzle 3d, and then passes through the high-efficiency filter 3c to reach the area close to the air shower nozzle 3d, and finally the gas is sent out from the air shower nozzle 3d.

[0029] The bottom of the inner cover 3h is connected to the air outlet of the centrifugal fan 3a by installing an air duct 3j. The air duct 3j is a hollow cylindrical pipe, and a flange structure is provided at the bottom thereof for connecting with the centrifugal fan 3a. In order to ensure the sealing of the connection, a rubber ring is provided at the connection between the air duct 3j and the centrifugal fan 3a or the inner cover 3h. Prestress should be applied when installing the rubber ring to achieve a better sealing effect.

[0030] The clean conveying device 4 and the pick-and-place conveying device 5 both use a synchronous belt 9 for conveying. The conveying length of the clean conveying device 4 is greater than that of the pick-and-place conveying device 5. The clean conveying device 4 and the pick-and-place conveying device 5 have the same structure, both including a synchronous belt 9, a pulley 10, a transmission device 11 and a support frame 12.

[0031] Synchronous belts 9 are respectively installed at both ends of the support frame 12 in the width direction, and multiple pulleys 10 are installed at equal intervals in the length direction of the support frame 12. The synchronous belt 9 is sleeved on the outside of the multiple pulleys 10. In order to better tension the synchronous belt 9, a tensioning wheel is synchronously installed on the support frame 12. The tensioning wheel is installed on the outside of the synchronous belt 9, and a linear adjustment device is installed to adjust the tensioning degree of the tensioning wheel.

[0032] The transmission device 11 includes a motor, an intermediate shaft and a transmission wheel. The motor is a motor with a reducer. The output end of the motor is connected to the intermediate shaft to drive the intermediate shaft to rotate. Transmission wheels are installed at both ends of the intermediate shaft to drive the synchronous belt 9 to rotate respectively.

[0033] A guide assembly 13 is installed on the support frame 12 on each side of the synchronous belt 9 to prevent the wafer box 16 from deviating from its position during transportation and to keep it in the correct flow direction. The guide assembly 13 includes a fixing part and a guide part. The guide part and the top surface of the synchronous belt 9 are installed perpendicular to each other. The fixing part is used to fix the guide part on the support frame 12. Rubber pads are installed on the opposite sides of the guide part to cushion the impact force of the wafer box 16 on the guide part to avoid damaging the wafer box 16.

[0034] In addition, a plurality of sensors 14 are installed in the length direction of the support frame 12 to sense the transmission position of the wafer box 16 and send out signals in time for the next action. Specifically, two pairs of front and rear end sensors 14 are installed on the clean conveying device 4. When the wafer box 16 enters the clean room, it sends out a signal when it blocks the light of the front end sensor 14, and the automatic door at the front end is closed. After slowly moving, the wafer box 16 sends out a signal when it does not block the light of the sensor 14, and performs a cleaning action to meet the cleanliness requirements. After that, the conveying continues, and when the wafer box 16 passes the rear end sensor 14, a signal is sent out, and the automatic door at the rear end is opened, and the wafer box 16 continues to move to the pick-and-place conveying device 5.

[0035] Specifically, two pairs of front and rear end sensors 14 are also installed on the pick-and-place conveyor 5. When the wafer box 16 enters the front end sensor 14, it blocks the light and sends a signal. The automatic door at the end of the clean conveyor 4 slowly closes. The wafer box 16 continues to move to the rear end sensor 14 and blocks the light and sends a signal. The external overhead crane descends to grab and transfer the wafer box 16. In addition, a baffle is installed at the end of the pick-and-place conveyor 5 to prevent the wafer box 16 from continuing to move forward due to inertia and slipping out of the pick-and-place conveyor 5 to cause damage.

[0036] The conveying surfaces of the clean conveyor 4 and the pick-and-place conveyor 5 are at the same horizontal plane. In this way, the cleaned wafer box 16 can flow smoothly into the pick-and-place conveyor 5 and be grabbed and transferred to the next process by the overhead crane. The clean conveyor 4 and the pick-and-place conveyor 5 are respectively installed with a height adjustment bracket 15 at the bottom, and the height adjustment bracket 15 includes a mounting frame and a plurality of adjustment foot cups. Specifically, adjustable foot cups are provided at the four corners of the bottom of the mounting frame of the clean conveyor 4 and the pick-and-place conveyor 5, which can flexibly adjust the height and level of the conveyor, which is simple and efficient.

[0037] A transition roller 8 is installed on the top bracket 2 between the clean conveyor 4 and the pick-and-place conveyor 5. The function of the transition roller 8 is to make the transition of the wafer box 16 between the two conveyor devices smoother and more reliable. The transition roller 8 is not connected to a driving device and can rotate freely. The wafer box 16 has an inertial force during transportation, which can drive the transition roller 8 to rotate and shift freely. Specifically, two transition rollers 8 are installed.

[0038] The control box 7 is used to control the operation of the equipment and can display the status information of the equipment operation in real time. The display interface on the control box 7 digitally displays the status information, so that the operator can obtain information more quickly and make decisions in time.

[0039] The automatic door device 6 includes a door panel and a linear motion mechanism. The door panel moves linearly up and down driven by the linear motion mechanism, thereby realizing the action of closing and opening the door.

[0040] The utility model discloses a wafer box 16 cleaning equipment, by setting a top bracket 2, and installing an air shower device 3 at the front and rear ends of the top bracket 2, the air shower device 3 has primary and high-efficiency secondary dust removal components, and the dust removal effect is good to meet the high cleanliness requirement, automatic door devices 6 are installed at the left and right ends of the top bracket 2, so as to form a closed air shower room, and a clean conveying device 4 is installed in the air shower room, which can convey the wafer box 16 to be cleaned into the air shower room for automatic cleaning, and the automatic door device 6 is automatically closed and opened according to the clean state, and the automatic door device 6 is in a closed state when the wafer box 16 is in a clean state, so as to ensure that it is in a relatively sealed clean environment and the cleaning efficiency is higher, and the automatic door device 6 is closed and opened according to the flow direction of the wafer box 16 in other states, and the wafer box 16 enters the pick-and-place conveying device 5 after cleaning, and the pick-and-place conveying device 5 conveys the wafer box 16 to the correct clamping position for external clamping and transfer, and no manual operation is required in the whole process, and the degree of automation is high, and the wafer box 16 will not be damaged, which is safe and efficient.

[0041] The above is only a preferred embodiment of the present invention. The protection scope of the present invention is not limited to the above embodiments. All technical solutions under the concept of the present invention belong to the protection scope of the present invention. It should be pointed out that for ordinary technicians in this technical field, some improvements and modifications without departing from the principle of the present invention should also be regarded as the protection scope of the present invention.

Claims

1. A wafer box cleaning device, characterized in that: It includes a bottom frame and a top bracket for supporting and connecting various components. The top bracket is installed above the bottom frame. Air shower devices are installed at the left and right ends of the top bracket respectively. A clean conveying device is installed in the top bracket. A pick-up and placement conveying device is installed at one end of the clean conveying device. Automatic door devices are also installed on the top bracket at both ends of the clean conveying device respectively. A control box for controlling the action is also installed above the bottom frame.

2. A wafer box cleaning equipment according to claim 1, characterized in that: The air shower device includes a centrifugal fan, a primary filter, a high-efficiency filter, an air shower nozzle and an outer cover. The primary filter is installed at one end close to the clean conveying device, the air shower nozzle is installed above the primary filter, the centrifugal fan is installed at one end of the primary filter, the high-efficiency filter is installed above the centrifugal fan, and the outer cover is installed on the outside of the centrifugal fan, the primary filter, the high-efficiency filter and the air shower nozzle.

3. A wafer box cleaning equipment according to claim 2, characterized in that: The air shower device further comprises a first mounting plate for mounting an air shower nozzle, and the four corners of the first mounting plate are respectively mounted with air shower nozzles.

4. A wafer box cleaning equipment according to claim 2, characterized in that: The air shower device also includes an inner cover for covering a high-efficiency filter and an air shower nozzle, and the bottom of the inner cover is communicated with the air outlet of the centrifugal fan.

5. The wafer box cleaning equipment according to claim 2, characterized in that: The air shower device also includes a second mounting plate for mounting a primary filter.

6. The wafer box cleaning equipment according to claim 4, characterized in that: An intermediate support plate is installed in the inner cover, and the high-efficiency filter is installed thereon.

7. The wafer box cleaning equipment according to claim 1, characterized in that: The conveying surface of the clean conveying device and the pick-and-place conveying device are on the same horizontal plane.

8. The wafer box cleaning equipment according to claim 1, characterized in that: A transition roller is installed on the top bracket between the clean conveying device and the pick-and-place conveying device.

9. The wafer box cleaning equipment according to claim 7, characterized in that: The bottom of the clean conveying device and the pick-and-place conveying device are respectively equipped with height-adjusting brackets.

10. The wafer box cleaning equipment according to claim 4, characterized in that: The bottom of the inner cover is connected to the air outlet of the centrifugal fan by installing an air duct.

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