Reflection type micro-focus X-ray source composite target material
By using copper targets, diamond layers and tungsten layers in reflective microfocus X-ray sources, combined with vacuum heat welding and water cooling systems, the existing thin target ablation problem is solved, the X-ray brightness and output stability are improved, and the output stability is extended. The life of the equipment.
Patent Information
- Application Number
- CN202420284958.7
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-02-06
- Publication Date
- 2024-12-17
- Estimated Expiration
- 2034-02-06
AI Technical Summary
The existing end-window transmission thin targets are prone to ablation of the target surface under bombardment of high-power density electron beams, resulting in a decrease in the quality of X-ray output and complex production processes, which limits the development of high-quality microfocus X-ray sources.
Reflective microfocus X-ray source composite target material is used, the target body is made of copper, a diamond layer is deposited on the top surface, and tungsten is sputtered on the surface of the diamond layer, the support frame and substrate are copper material, and vacuum heat welding connection and water cooling system are used To improve heat dissipation and cooling efficiency.
It significantly improves the brightness of X-rays, efficient heat dissipation of diamond layer, prevents melting of tungsten, and accelerates cooling of copper materials, extends the service life of the target material and improves the stability of X-ray output.
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Figure CN222182419U_ABST
Abstract
Description
Technical Field
[0001] The utility model belongs to the field of target materials, in particular to a reflective micro-focus X-ray source composite target material. Background Art
[0002] In the prior art, charged particle beams are focused into micro-focus electron beams under the action of the field, and the electron beams bombard the target material to radiate micro-focus X-rays, which are the most widely used radiation sources. Among them, the new end window transmission thin target of the micro-focus radiation source has higher X-ray generation efficiency and irradiation flux density than the thick target of the conventional micro-focus X-ray tube. However, the large amount of heat generated by this end window transmission thin target under the bombardment of the high power density electron beam will ablate the target surface or even melt it, which will lead to a serious decline in the quality of X-ray output. In addition, its extremely complex manufacturing process restricts the development of high-quality micro-focus X-ray sources. Utility Model Content
[0003] In view of this, the utility model aims to propose a reflective micro-focus X-ray source composite target, the target body is made of copper, a diamond layer is attached to the top surface of the target body by deposition growth, and a layer of sputtered tungsten is provided on the surface of the diamond layer by magnetron sputtering. Tungsten has a high melting point, low vapor pressure and high atomic number, and can prevent melting even at high heat flux density.
[0004] In order to achieve the above object, the technical solution of the utility model is implemented as follows:
[0005] A reflective micro-focus X-ray source composite target comprises a support frame and a substrate, wherein the substrate is sleeved into a No. 1 inner cavity of the support frame to form a fit, the substrate is provided with a No. 2 inner cavity, and a side wall of the support frame is provided with a water outlet, so that cooling water can enter the No. 1 inner cavity from the No. 2 inner cavity and then be discharged from the water outlet; a target body is provided on the top of the support frame.
[0006] Furthermore, a fixing groove is formed on the top of the support frame, and the fixing groove is used to install the target body. The target body is connected to the fixing groove by vacuum heat welding, and the solder of the vacuum heat welding is silver-copper solder.
[0007] Furthermore, a plurality of sealing grooves are formed on the outer surface of the upper middle portion of the support frame, the sealing grooves are used to place sealing rings, and the water outlet holes are arranged below the sealing grooves; and an assembly hole is arranged at the bottom end of the support frame.
[0008] Furthermore, a sealing groove is provided on the bottom circumferential surface of the substrate, a matching hole is provided at the bottom end, and a limit platform is provided in the middle. The upper side of the limit platform is a cooling part, and the lower side of the limit platform serves as a fixing part; the cooling part is used to enter the No. 1 inner cavity of the support frame, and the fixing part is used to cooperate with the target head.
[0009] Furthermore, the side of the cooling part close to the limit table can fit tightly with the assembly hole of the support frame to achieve a fitting connection between the support frame and the substrate; the outer diameter of the cooling part decreases from one end close to the limit table to the other end; a gap is formed between the cooling part and the No. 1 inner cavity of the support frame, and the gap is used for the circulation of cooling water.
[0010] Furthermore, a water inlet hole is provided in the middle and lower part of the substrate, and the water inlet hole is connected to the second inner cavity of the substrate. A connecting hole is provided on the top of the substrate, and the connecting hole is connected to the first inner cavity and the second inner cavity.
[0011] Furthermore, the support frame and the substrate are both made of copper.
[0012] Furthermore, the target body is also made of copper, a diamond layer is attached to the top surface of the target body by growth, and a layer of sputtered tungsten is provided on the surface of the diamond layer by magnetron sputtering.
[0013] Compared with the prior art, the reflective micro-focus X-ray source composite target described in the present invention has the following advantages:
[0014] (1) The reflective micro-focus X-ray source composite target of the utility model uses diamond material for the target surface, which can significantly increase the brightness of the X-rays. Due to the extremely high thermal conductivity of diamond, the heat from the thin tungsten layer can be dissipated very efficiently. Tungsten is sputtered on the surface of the diamond layer. Tungsten has a high melting point, low vapor pressure and high atomic number, which can prevent melting even at high heat flux density.
[0015] (2) The reflective micro-focus X-ray source composite target material, the support frame and the substrate of the utility model are all made of copper material. Copper has the characteristics of high thermal conductivity and corrosion resistance, and is easy to process and shape. The heat dissipation capacity is improved. The cooling efficiency can be effectively improved by water cooling and the cooling time can be shortened. BRIEF DESCRIPTION OF THE DRAWINGS
[0016] The accompanying drawings constituting a part of the present invention are used to provide a further understanding of the present invention. The illustrative embodiments of the present invention and their descriptions are used to explain the present invention and do not constitute an improper limitation on the present invention. In the accompanying drawings:
[0017] Figure 1 This is a front view of the composite target material of the reflective micro-focus X-ray source according to an embodiment of the utility model;
[0018] Figure 2 This is a cross-sectional view of the composite target material of the reflective micro-focus X-ray source described in an embodiment of the present utility model.
[0019] Description of reference numerals:
[0020] 1. Support frame; 11. Inner cavity No. 1; 12. Fixing groove; 13. Sealing groove; 14. Water outlet hole; 15. Assembly hole; 2. Base material; 21. Inner cavity No. 2; 22. Matching hole; 23. Limiting platform; 24. Cooling part; 25. Fixing part; 26. Water inlet hole; 3. Target body. DETAILED DESCRIPTION
[0021] It should be noted that, in the absence of conflict, the embodiments of the present invention and the features in the embodiments can be combined with each other.
[0022] In the description of the present utility model, it should be understood that the terms "center", "longitudinal", "lateral", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside" and the like indicate positions or positional relationships based on the positions or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present utility model and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the present utility model. In addition, the terms "first", "second", etc. are only used for descriptive purposes, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Therefore, features defined as "first", "second", etc. may explicitly or implicitly include one or more of the features. In the description of the present utility model, unless otherwise specified, "multiple" means two or more.
[0023] In the description of the present invention, it should be noted that, unless otherwise clearly specified and limited, the terms "installation", "connection" and "connection" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or it can be an indirect connection through an intermediate medium, or it can be the internal communication of two components. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood by specific circumstances.
[0024] The present invention will be described in detail below with reference to the accompanying drawings and in combination with embodiments.
[0025] Reflective microfocus X-ray source composite target, such as Figure 1 Figure 2 As shown, it includes a support frame 1 and a substrate 2, the substrate 2 is sleeved into the No. 1 inner cavity 11 of the support frame 1 to form a fit, the substrate 2 is provided with a No. 2 inner cavity 21, and the side wall of the support frame 1 is provided with a water outlet 14, and cooling water can enter the No. 1 inner cavity 11 from the No. 2 inner cavity 21 and then be discharged from the water outlet 14; a target body 3 is provided on the top of the support frame 1.
[0026] Preferably, a fixing groove 12 is formed on the top of the support frame 1, and the fixing groove 12 is used to install the target body 3, and the target body 3 is connected to the fixing groove 12 by vacuum heat welding, and the solder of the vacuum heat welding is silver-copper solder;
[0027] The target body 3 of the sputtered tungsten is connected to the copper support frame 1 by vacuum heat welding. Copper has the characteristics of high thermal conductivity and corrosion resistance, and is easy to process and shape, with improved heat dissipation capacity and shortened cooling time.
[0028] Preferably, a plurality of sealing grooves are formed on the outer surface of the upper middle portion of the support frame 1, and the sealing grooves are used to place sealing rings for cooperating with the target head, and the water outlet 14 is arranged below the sealing grooves; an assembly hole 15 is provided at the bottom end of the support frame 1.
[0029] Preferably, a sealing groove is provided on the bottom circumferential surface of the substrate 2, a matching hole 22 is provided at the bottom end, and a limit platform 23 is provided in the middle; the upper side of the limit platform 23 is a cooling part 24, and the lower side of the limit platform 23 serves as a fixing part 25; the cooling part 24 is used to enter the No. 1 inner cavity 11 of the support frame 1, and the fixing part 25 is used to cooperate with the target head.
[0030] Preferably, the side of the cooling part 24 close to the limit platform 23 can be tightly matched with the assembly hole 15 of the support frame 1 to realize the matching connection between the support frame 1 and the substrate 2; the outer diameter of the cooling part 24 decreases from one end close to the limit platform 23 to the other end; a gap is formed between the cooling part 24 and the No. 1 inner cavity 11 of the support frame 1, and the gap is used for the circulation of cooling water; the cooling water enters from the waterway hole at the lower end of the substrate 2, overflows from the upper end hole of the substrate 2 to the gap between the substrate 2 and the support frame 1, and finally flows out from the waterway hole of the support frame 1, and takes away a large amount of heat generated by the target surface through water cooling.
[0031] Preferably, a water inlet hole 26 is provided in the middle and lower part of the substrate 2, and the water inlet hole 26 is connected to the second inner cavity 21 of the substrate 2. A connecting hole is provided on the top of the substrate 2, and the connecting hole connects the first inner cavity 11 and the second inner cavity 21.
[0032] Preferably, the support frame 1 and the substrate 2 are both made of copper, which has the characteristics of high thermal conductivity and corrosion resistance.
[0033] Preferably, the material of the target body 3 is also copper, and a diamond layer is attached to the top surface of the target body by growth, and a layer of sputtered tungsten is provided on the surface of the diamond layer by magnetron sputtering; tungsten is sputtered onto the surface of the diamond by magnetron sputtering technology. Tungsten has a high melting point and low high-temperature vapor pressure, which can avoid being ablated by the large amount of heat generated by the electron beam bombarding the target surface, thereby extending the service life of the target.
[0034] The target body 3 is formed in one go under vacuum conditions, is not easily contaminated, and has the advantages of high X-ray emission rate, good heat dissipation, and long life;
[0035] The target body 3 is mainly used in micro-focus tubes with transmission geometry, which can significantly increase the brightness of X-rays. However, it can also significantly increase the performance when used in reflection beam tubes.
[0036] The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the present invention should be included in the protection scope of the present invention.
Claims
1. Reflective micro-focus X-ray source composite target, characterized by: It includes a support frame and a substrate, the substrate is sleeved into the No. 1 inner cavity of the support frame to form a fit, the substrate is provided with a No. 2 inner cavity, the side wall of the support frame is provided with a water outlet, cooling water can enter the No. 1 inner cavity from the No. 2 inner cavity and then be discharged from the water outlet; a target body is provided on the top of the support frame.
2. The reflective micro-focus X-ray source composite target according to claim 1, characterized in that: A fixing groove is formed on the top of the support frame, and the fixing groove is used to install the target body. The target body is connected to the fixing groove by vacuum heat welding, and the solder of the vacuum heat welding is silver-copper solder.
3. The reflective micro-focus X-ray source composite target according to claim 1, characterized in that: A plurality of sealing grooves are formed on the outer surface of the upper middle portion of the support frame, the sealing grooves are used to place sealing rings, and the water outlet holes are arranged below the sealing grooves; and an assembly hole is arranged at the bottom end of the support frame.
4. The reflective micro-focus X-ray source composite target according to claim 1, characterized in that: A sealing groove is provided on the bottom circumferential surface of the substrate, a matching hole is provided at the bottom end, and a limit platform is provided in the middle. The upper side of the limit platform is a cooling part, and the lower side of the limit platform serves as a fixing part; the cooling part is used to enter the No. 1 inner cavity of the support frame, and the fixing part is used to cooperate with the target head.
5. The reflective micro-focus X-ray source composite target according to claim 4, characterized in that: The side of the cooling part close to the limit platform can fit tightly with the assembly hole of the support frame to achieve the matching connection between the support frame and the substrate; the outer diameter of the cooling part decreases from one end close to the limit platform to the other end; a gap is formed between the cooling part and the No. 1 inner cavity of the support frame, and the gap is used for the circulation of cooling water.
6. The reflective micro-focus X-ray source composite target according to claim 4, characterized in that: A water inlet hole is provided in the middle and lower part of the substrate, and the water inlet hole is connected to the second inner cavity of the substrate. A connecting hole is provided on the top of the substrate, and the connecting hole is connected to the first inner cavity and the second inner cavity.
7. The reflective micro-focus X-ray source composite target according to claim 1, characterized in that: The support frame and the substrate are both made of copper.
8. The reflective micro-focus X-ray source composite target according to claim 1, characterized in that: The target body is also made of copper, a diamond layer is attached to the top surface of the target body by deposition growth, and a layer of sputtered tungsten is provided on the surface of the diamond layer by magnetron sputtering.
