Stainless steel plate single-side etching device

Abstract

The utility model relates to the technical field of stainless steel plate production and processing equipment, and provides a stainless steel plate single-side etching device which comprises an etching pool, a feeding mechanism and a limiting mechanism, the etching pool is defined by side walls on the two sides, end walls at the two ends and a pool bottom, and the etching pool is connected with an external etching liquid agent source through a liquid circulating system; the feeding mechanism is positioned above the etching pool, is provided with a conveying working surface facing the etching pool, and can convey along the x-axis direction; the limiting mechanism comprises a pair of limiting grooves which are formed in the side walls of the two sides of the etching pool in a penetrating mode, each limiting groove comprises a feeding guide section, an etching section and a discharging guide section which are sequentially connected in the x-axis direction, the groove bottoms of the feeding guide sections and the groove bottoms of the discharging guide sections are equal to the end walls in height, and the width of the feeding guide sections is larger than that of the end walls. The etching section forms a sinking arc path, the groove height of the etching section is 3-10mm, and the sinking amount of the etching section is not greater than the groove height of the etching section.

Description

Technical Field

[0001] The utility model relates to the technical field of stainless steel production and processing equipment, in particular to a single-side etching device for a stainless steel plate. Background Art

[0002] Colored stainless steel plates are widely used in elevator car decoration, kitchen and bathroom and hardware appliance finishing, as well as indoor and outdoor decoration. Square wave etching can complete chemical etching and coloring at the same time. The steps and methods are simple and almost do not affect the mechanical properties of stainless steel plates. It is a new type of stainless steel plate surface modification technology.

[0003] Some etching devices in the prior art use an etching pool, and the etching is completed by immersing the stainless steel plate in the etching pool, such as the utility model patent with publication number CN219793186U and name "A square wave etching device for stainless steel plate".

[0004] In actual operation, the stainless steel plate used as the finishing material only needs one side to have a decorative effect. The utility model patent with the publication number CN219174623U and the name "a spray device for mold etching" records a device that can achieve single-sided etching of stainless steel plates. It includes an etching frame, the bottom of the inner wall of the etching frame is fixedly connected to a cylinder, the front and rear sides of the etching frame are fixedly connected to electric slide rails, the top of the electric slide rail is fixedly connected to a spray rack, the bottom of the spray rack is fixedly connected to a number of spray nozzles, the top of one side of the etching frame is fixedly connected to a fan, the other side of the etching frame is fixedly connected to an etching liquid recovery bin, and the outer side of the etching liquid recovery bin opening is rotatably connected to a docking plate. By setting the docking plate as a telescopic plate and rotatably connecting it to the etching frame, one end of the docking plate can be docked with the side of molds of different specifications. When docking, the right-angle plate is docked with the side of the mold, and the side of the mold is further fixed by the suction cup, so that the residual etching liquid blown by the fan can enter the etching liquid recovery bin along the docking plate.

[0005] However, in the above technical solution, the loading and unloading of the mold is relatively easy, but when the stainless steel plate is processed by the above technical solution, the stainless steel plate is not easy to load and unload, especially the stainless steel plate after single-sided etching, which can only be unloaded manually, so the work efficiency is relatively low. Utility Model Content

[0006] The technical purpose of the utility model is to overcome at least one of the above technical problems and provide a single-sided etching device for stainless steel plates, which can realize automatic loading and unloading of automatic single-sided etching processing and has relatively high production efficiency.

[0007] To achieve the above technical purpose, one aspect of the utility model provides a single-sided etching device for a stainless steel plate, comprising an etching pool, a feeding mechanism and a limiting mechanism;

[0008] The etching pool is composed of side walls on both sides, end walls at both ends, and a pool bottom, and the etching pool is connected to an external etching liquid agent source through a liquid circulation system;

[0009] The feeding mechanism is located above the etching pool, has a conveying working surface facing the etching pool, and can convey along the x-axis direction;

[0010] The limiting mechanism comprises a pair of limiting grooves which are through-set on the side walls on both sides of the etching pool, and along the x-axis direction, the limiting grooves comprise a loading guide section, an etching section and a unloading guide section which are connected in sequence, the groove bottoms of the loading guide section and the unloading guide section are both at the same height as the end wall, the etching section forms a sinking arc path, the groove height of the etching section is 3-10 mm, and the sinking amount of the etching section is not greater than the groove height of the etching section;

[0011] As the feeding mechanism is conveying, the setting height of its conveying working surface is always adapted to the setting height of the groove bottom of the corresponding portion of the limiting groove.

[0012] By means of the above structure, by setting the limit groove forming a sinking arc path, coordinating it with the height of the etching pool, and setting the feeding mechanism located above the etching pool, when the stainless steel plate enters the upper area of ​​the etching pool with the surface to be etched facing downward, the stainless steel plate is slightly bent under the limiting action of the top and bottom surfaces of the groove of the etching section, which does not affect the shape and mechanical strength of the stainless steel plate, and enables part of the thickness to be immersed in the etching liquid agent for etching treatment. The amount of etching liquid used in the technical solution of this case is relatively small and controllable, and the feeding mechanism transports the stainless steel plate from the top, which can relatively easily realize the loading and unloading of the stainless steel plate, and can realize automatic loading, moving, and unloading, thereby having high production efficiency.

[0013] As a preferred embodiment, the groove heights at various locations in the etching section are equal, the groove height of the loading guide section gradually decreases from the loading side to the etching section until it is equal to the etching section, and the groove height of the unloading guide section gradually decreases from the unloading side to the etching section until it is equal to the etching section.

[0014] In the above technical solution, the loading guide section and the unloading guide section can make the stainless steel plate enter or leave the etching section more easily.

[0015] As a preferred embodiment, the feeding mechanism includes a gantry beam arranged across the etching pool along the y-axis direction, the gantry beam has a gantry beam movable along the x-axis direction, and a vacuum adsorption unit is installed on the gantry beam in a liftable manner.

[0016] As a preferred embodiment, the vacuum adsorption unit includes a vacuum adsorption platform, an elastic gasket installed on the bottom surface of the vacuum adsorption platform, and a vacuum air source connected to the pipeline of the vacuum adsorption platform, and the elastic gasket has adsorption holes corresponding one to one with the vacuum adsorption platform.

[0017] By setting the elastic gasket, even if the stainless steel plate bends under the action of the limiting groove, it can adapt to the change of the shape of the back side of the stainless steel plate and always adhere to the back side to maintain effective vacuum adsorption force.

[0018] As a preferred implementation, the vacuum adsorption platform is a rectangular platform, and its length direction is arranged along the y-axis direction.

[0019] As a preferred embodiment, the pool bottom is an inclined slope, the lowest point of which is located on the material discharge side, and there is a gap between the pool bottom and the end wall on the material discharge side, the gap is covered by a filter screen, and an etching liquid recovery unit is arranged below the gap; the etching liquid recovery unit includes a recovery box arranged below the gap, the recovery box is connected or separated from the etching pool by an opening and closing unit, and the recovery box is connected to the liquid circulation system.

[0020] As a preferred embodiment, the opening and closing unit includes a sealing plate that is in contact with the back of the pool bottom and the back of the filter, a pushing plate that is bent downward and extended from one side of the sealing plate, a base fixedly arranged on the back of the pool bottom, and an electric cylinder connecting the pushing plate and the base, and the electric cylinder can push the sealing plate toward the side of the lower material until its end face abuts against the extension of the end wall to separate the etching pool from the recycling box.

[0021] As a preferred embodiment, the recovery box is detachably arranged below the etching pool.

[0022] As a preferred embodiment, the top surface of the end wall on the material discharge side and the outer facade are connected by a transitional arc surface.

[0023] To sum up, the single-sided etching device for stainless steel plates disclosed in the utility model application has at least the following advantages: the amount of etching liquid used is relatively small and controllable, the feeding mechanism transports the stainless steel plate from above, and the loading and unloading of the stainless steel plate can be realized relatively easily, and the loading, moving and unloading of the stainless steel plate can be realized automatically, thereby having higher production efficiency. BRIEF DESCRIPTION OF THE DRAWINGS

[0024] In order to more clearly illustrate the embodiments of the present application or the technical solutions in the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present application. For those skilled in the art, other drawings can be obtained based on these drawings without paying any creative labor.

[0025] Figure 1 A schematic structural diagram of a single-sided etching device for a stainless steel plate according to an embodiment of the present application.

[0026] Figure 2 for Figure 1 Schematic diagram of the cross-sectional structure along the AA direction.

[0027] Figure 3 A schematic diagram of the structure of the vacuum adsorption unit of an embodiment of the present application.

[0028] Figure 4 A schematic diagram of the structure of the limiting groove of an embodiment of the present application.

[0029] Figure 5 for Figure 2 A partial enlarged view of point B in the middle.

[0030] In the above figure: 1. Etching pool, 2. Feeding mechanism, 3. Limiting mechanism, 4. Etching liquid recovery unit, 5. Stainless steel plate, 11. Side wall, 12. End wall, 13. Pool bottom, 14. Filter, 15. Arc surface, 16. Extended baffle, 21. Gantry beam, 22. Vacuum adsorption unit, 221. Vacuum adsorption platform, 222. Elastic gasket, 223. Adsorption hole, 31. Feeding guide section, 32. Etching section, 33. Unloading guide section, 34. Elastic cushion, 41. Recovery box, 42. Opening and closing unit, 421. Sealing plate, 422. Pushing plate, 423. Base, 424. Electric cylinder. DETAILED DESCRIPTION

[0031] In order to enable those skilled in the art to better understand the technical solutions in the present application, the technical solutions in the embodiments of the present application will be clearly and completely described below in conjunction with the drawings in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, not all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by ordinary technicians in this field without creative work should fall within the scope of protection of this application.

[0032] Example: Refer to Figure 1 , Figure 2 A single-sided etching device for a stainless steel plate is shown, which comprises an etching pool 1, a feeding mechanism 2, a limiting mechanism 3, and a PLC control cabinet in the prior art.

[0033] The etching pool 1 is a rectangular concrete casting structure formed by side walls 11 on both sides, end walls 12 at both ends, and a pool bottom 13, and is suitable for loading etching liquid reagents. The etching pool 1 is connected to an external etching liquid reagent source through any liquid circulation system in the prior art (such as a liquid inlet, a liquid outlet, a connecting pipe, a connecting vessel, a hydraulic pump, a flow sensor, etc.).

[0034] The feeding mechanism 2 is located above the etching pool 1 , has a conveying working surface facing the etching pool 1 , and can convey along the x-axis direction.

[0035] In this embodiment, the feeding mechanism 2 includes a gantry beam 21 arranged across the etching pool 1 along the y-axis direction. The gantry beam 21 is a prior art, and includes tracks disposed on both sides of the etching pool 1, a gantry beam disposed on the track, and a servo mechanism driving the gantry beam to move along the x-axis direction. A vacuum adsorption unit 22 is installed on the gantry beam so that it can be raised and lowered. There are many solutions in the prior art that can enable the external unit installed on the gantry beam to be raised and lowered, and any technical solution that can enable the vacuum adsorption unit 22 to complete the movement in the x-axis direction and the lifting in the z-axis direction can meet the requirements of this embodiment.

[0036] Reference Figure 3 As shown, the vacuum adsorption unit 22 of this embodiment is improved based on the vacuum adsorption plate of the prior art, and includes a vacuum adsorption platform 221, an elastic gasket 222 installed on the bottom surface of the vacuum adsorption platform 221, and a vacuum air source connected to the vacuum adsorption platform 221 through a pipeline. The air circuit and electrical components of the vacuum adsorption unit 22 are integrated in the gantry beam 21 using the prior art.

[0037] The vacuum adsorption platform 221 is a vacuum adsorption plate of the prior art, and an elastic gasket 222 is installed on its adsorption surface (i.e., bottom surface) by bonding. The elastic gasket 222 is an elastic rubber plate, which has a larger format than the vacuum adsorption platform 221, and at the same time, it has adsorption holes 223 corresponding to the air holes on the vacuum adsorption platform 221.

[0038] Preferably, the vacuum adsorption platform 221 is a rectangular platform, and its length direction is arranged along the y-axis direction.

[0039] Replay Figure 2 Combined with Figure 4, the top surfaces of the side walls 11 on both sides of the etching pool 1 extend upward so that the height of the side walls 11 is greater than the end walls 12, and the end surfaces extend forward so that the length of the side walls is greater than the end walls 12 and the pool bottom 13. The limiting mechanism 3 includes a pair of limiting grooves on the inner wall surface of the upper extension of the side wall 11, the limiting grooves penetrate the upper extension of the side wall 11 along the x-axis direction, and along the x-axis direction, the limiting grooves include a feed guide section 31, an etching section 32 and a feed guide section 33 connected in sequence. The feed guide section 31 and the feed guide section 33 are straight sections, their groove bottoms are the same height as the end wall 12, and their groove heights are 3-10mm. The etching section 32 forms a sinking arc path, and the groove height of the etching section 32 is 3-10mm, but it is preferably the same height as the feed guide section 31 and the feed guide section 33, and the sinking amount (h) of the etching section 32 is not greater than the groove height of the etching section 32. Preferably, the groove heights at various locations of the etching section 32 are equal, the groove height of the loading guide section 31 gradually decreases from the loading side to the etching section 32 until it is equal to the etching section 32, and the groove height of the unloading guide section 33 gradually decreases from the unloading side to the etching section 32 until it is equal to the etching section 32.

[0040] In this embodiment, the distance between the bottom surface of the limiting groove and the pool bottom 13 is the pool depth of the etching pool 1, and the pool depth is 1 cm; the groove height of the feeding guide section 31 and the unloading guide section 33 is 5 mm, and the height is the same at all places, the groove height of the etching section 32 is 5 mm, and the sinking amount (h) of the etching section 32 is 3 mm; the groove widths of the feeding guide section 31, the etching section 32 and the unloading guide section 33 are all 2 cm; the thickness of the stainless steel plate 5 to be etched is 4 mm.

[0041] By means of the above structure, the stainless steel plate 5 entering the limiting groove is slightly bent under the limiting action of the groove top surface and groove bottom surface of the etching section 32, which does not affect the shape and mechanical strength of the stainless steel plate 5. In order to make the limiting groove adapt to stainless steel plates 5 of various thickness specifications, an elastic cushion layer 34 is fixedly provided on the groove top surface of the etching section 32 by screwing or bonding, and the width of the elastic cushion layer 34 is equal to the groove width of the limiting groove, or slightly smaller than the groove width of the limiting groove. At this time, the groove height of the etching section 32 is calculated by the distance between the elastic cushion layer 34 and the groove bottom surface.

[0042] In order to smoothly connect the feeding guide section 31 with the previous process (stainless steel plate surface ion water cleaning process), a non-powered roller conveyor 23 is installed on the front extension of the side wall 11, and the conveying surface of the roller conveyor 23 is at the same height as the end wall 12. The part of the side wall 11 located above the limiting groove extends inwardly to form an extension baffle 15 above the limiting groove.

[0043] The working principle of the single-sided etching device for the stainless steel plate of the embodiment of the present application is as follows:

[0044] Etching liquid is introduced into the etching pool 1, and the liquid level of the etching liquid is controlled to maintain a distance of 2 mm from the top surface of the end wall 12. The liquid level can be controlled by a liquid level sensor or by controlling the amount of the agent introduced each time.

[0045] The previous process delivers the stainless steel plate 5 to the roller conveyor 23. At this time, both sides of the stainless steel plate 5 are inserted into the limit grooves, and the surface to be processed (the downward surface) abuts against the conveying surface of the roller conveyor 23. At the same time, the gantry beam of the feeding mechanism 2 is located on the feeding side, and the vacuum adsorption unit 22 is lowered to allow the elastic gasket 222 to adsorb the back side (the upward surface) of the stainless steel plate 5.

[0046] Assuming that the thickness of the stainless steel plate 5 is a and the distance between the bottom surface of the limiting groove and the horizontal ground is b, the lifting of the vacuum adsorption unit 22 should be adjusted so that the distance between the adsorption surface of the elastic gasket 222 and the horizontal ground is always equal to the sum of the value a and the real-time value b. Thus, as the stainless steel plate 5 enters the etching section 32, the arc-shaped path of the etching section 32 causes the stainless steel plate 5 to sink, for example, 3mm in this embodiment, and the vacuum adsorption unit 22 can always adsorb the back of the stainless steel plate 5, and can always keep in contact with it by virtue of the elastic deformation of the elastic gasket 222; at the same time, the stainless steel plate 5 entering the limiting groove is slightly bent under the limiting action of the groove top surface and the groove bottom surface of the etching section 32, which does not affect the shape and mechanical strength of the stainless steel plate 5, and the 1mm thick part of the stainless steel plate 5 is immersed in the etching liquid agent, so that the etching process can be completed.

[0047] The processed stainless steel plate 5 is continuously moved by the feeding mechanism 2 toward the unloading side until it moves away from the etching pool 1. The next process may be a plate turning machine or others.

[0048] In order to prevent the stainless steel plate 5 from being scratched by the top of the end wall 12 on the unloading side when leaving, the top surface of the end wall 12 on the unloading side is transitionally connected to the outer facade through an arc surface 15.

[0049] Replay Figure 2 Combined with Figure 5 As a preferred embodiment, the pool bottom 13 is an inclined slope, the lowest point of which is located on the material discharge side. There is a gap between the pool bottom 13 and the end wall 12 on the material discharge side, and the gap is covered by a filter screen 14; there is a space between the pool bottom 13 and the horizontal ground, and an etching liquid recovery unit 4 is arranged below the gap in the space.

[0050] Specifically, the etching liquid recovery unit 4 includes a recovery box 41 placed just below the gap, and the recovery box 4 has no connection with the etching pool 1. The recovery box 41 is connected or disconnected with the etching pool 1 through an opening and closing unit 42, and the recovery box 41 is connected with the liquid circulation system of the prior art. The liquid circulation system can be independent or uniformly controlled with the liquid circulation system of the etching pool.

[0051] The opening and closing unit 42 includes a sealing plate 421 that is in contact with the back of the pool bottom 13 and the back of the filter screen 14, a pushing plate 422 that is bent downward and extended from one side of the sealing plate 421, a base 423 that is fixedly arranged on the back of the pool bottom 13 in a screwed manner, and an electric cylinder 424 that connects the pushing plate 422 and the base 423. The electric cylinder 424 can push the sealing plate 421 toward the lower material side until its end face abuts against the extension of the end wall 12 to separate the etching pool 1 from the recovery box 41.

[0052] The working principle of the single-sided etching device for stainless steel plates in the embodiment of the present application is as follows: after the etching process of a stainless steel plate 5 is completed, as the stainless steel plate 5 leaves, the electric cylinder 424 pulls the sealing plate 421 to open the gap, and the etching liquid agent inside the etching pool 1 flows from the filter 14 to the recovery box 41, and enters the recovery or reuse process through the liquid circulation system.

[0053] The above description is intended to be illustrative and not limiting. Upon reading the above description, many embodiments and many applications beyond the examples provided will be apparent to those skilled in the art. Therefore, the scope of the present teachings should not be determined with reference to the above description, but should be determined with reference to the appended claims and the full scope of equivalents to which such claims are entitled. For the purpose of comprehensiveness, all articles and references, including disclosures of patent applications and publications, are incorporated herein by reference. The omission of any aspect of the subject matter disclosed herein in the preceding claims is not intended to be a waiver of the subject matter, nor should it be considered that the applicant has not considered the subject matter to be part of the disclosed application subject matter.

Claims

1. A single-sided etching device for stainless steel plates, It is characterized in that It comprises an etching pool (1), a feeding mechanism (2) and a limiting mechanism (3); The etching pool (1) is constructed by side walls (11) at two sides, end walls (12) at two ends, and a pool bottom (13); the etching pool (1) is connected to an external etching liquid agent source through a liquid circulation system; The feeding mechanism (2) is located above the etching pool (1), has a conveying working surface facing the etching pool (1), and is capable of conveying along the x-axis direction; The limiting mechanism (3) comprises a pair of limiting grooves which are arranged through the side walls (11) on both sides of the etching pool (1); along the x-axis direction, the limiting grooves comprise a loading guide section (31), an etching section (32) and a unloading guide section (33) which are connected in sequence; the bottoms of the loading guide section (31) and the unloading guide section (33) are both at the same height as the end wall (12); the etching section (32) forms a sinking arc path; the groove height of the etching section (32) is 3-10 mm; and the sinking amount of the etching section (32) is not greater than the groove height of the etching section (32).

2. The stainless steel plate single-sided etching device according to claim 1, It is characterized in that The groove heights of the etching section (32) are equal at all locations, the groove height of the loading guide section (31) gradually decreases from the loading side to the etching section (32) until it is equal to the height of the etching section (32), and the groove height of the unloading guide section (33) gradually decreases from the unloading side to the etching section (32) until it is equal to the height of the etching section (32).

3. The stainless steel plate single-sided etching device according to claim 1, It is characterized in that The feeding mechanism (2) comprises a gantry beam (21) arranged across the etching pool (1) along the y-axis direction, the gantry beam (21) having a gantry crossbeam movable along the x-axis direction, and a vacuum adsorption unit (22) being mounted on the gantry crossbeam in a manner that allows it to be raised and lowered.

4. The stainless steel plate single-sided etching device according to claim 3, It is characterized in that The vacuum adsorption unit (22) comprises a vacuum adsorption platform (221), an elastic gasket (222) mounted on the bottom surface of the vacuum adsorption platform (221), and a vacuum air source connected to a pipeline of the vacuum adsorption platform (221); the elastic gasket (222) has adsorption holes (223) corresponding one-to-one with the air holes on the vacuum adsorption platform (221).

5. The stainless steel plate single-side etching device according to claim 4, It is characterized in that The vacuum adsorption platform (221) is a rectangular platform, and its length direction is arranged along the y-axis direction.

6. The stainless steel plate single-side etching device according to claim 1, It is characterized in that The pool bottom (13) is an inclined slope, the lowest point of which is located on the material discharge side. A gap is provided between the pool bottom (13) and the end wall (12) on the material discharge side, the gap being covered by a filter screen (14), and an etching liquid recovery unit (4) being provided below the gap. The etching liquid recovery unit (4) comprises a recovery box (41) provided below the gap, the recovery box (41) being connected to or separated from the inside of the etching pool (1) by an opening and closing unit (42), and the recovery box (41) being connected to a liquid circulation system.

7. The stainless steel plate single-side etching device according to claim 6, It is characterized in that The opening and closing unit (42) comprises a sealing plate (421) which is in contact with the back side of the pool bottom (13) and the back side of the filter screen (14), a pushing plate (422) which is bent and extended downward from one side of the sealing plate (421), a base (423) which is fixedly arranged on the back side of the pool bottom (13), and an electric cylinder (424) which connects the pushing plate (422) and the base (423), wherein the electric cylinder (424) is capable of pushing the sealing plate (421) toward the side of the lower material until its end face abuts against an extension of the end wall (12) to separate the etching pool (1) from the recovery box (41).

8. The stainless steel plate single-side etching device according to claim 7, It is characterized in that The recovery box (41) is detachably arranged below the etching pool (1).

9. The stainless steel plate single-side etching device according to claim 1, It is characterized in that The top surface of the end wall (12) located on the material discharge side and the outer facade are transitionally connected via an arc surface (15).

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