Device for improving microcrystal residues of HJT rework piece

Abstract

The utility model discloses a device for improving microcrystal residues of an HJT rework piece, which comprises a cleaning tank with an upper opening, an overflow port is arranged on the upper portion of the cleaning tank and communicated with an overflow pipeline, a pipe valve and a filter element assembly are arranged on the overflow pipeline, the overflow pipeline is communicated with a circulating pump, the circulating pump is communicated with a return pipeline, and a return port is arranged on the lower portion of the cleaning tank. The backflow pipeline is communicated with the backflow opening. The cleaning device has the advantages that due to the simple design principle, an original cleaning tank and an original cleaning mode do not need to be changed too much, and only components such as a pipe, a valve and a pump need to be additionally arranged outside the tank; the liquid level and floating microcrystals are discharged and filtered, so that the problem of microcrystal floating object residues caused by no circulation of the tank body is solved, and the subsequent silicon wafer processing yield is ensured; microcrystals in a traditional cleaning tank float and gather, the phenomenon that the microcrystals are attached to the silicon wafers after being lifted is avoided, time and liquid medicine wasted by repeated cleaning are reduced, and the risk of product scrapping is reduced.

Description

Technical Field

[0001] The utility model belongs to the technical field of HJT (heterojunction) silicon wafer supporting auxiliary technology, and in particular relates to a device for improving microcrystalline residue of HJT reworked wafers. Background Art

[0002] After the CVD (chemical vapor deposition) reworked wafer is cleaned, a layer of microcrystals will float on the surface. When the cleaned silicon wafer is lifted out of the tank, the floating microcrystals will attach to the silicon wafer again, contaminating the silicon wafer again and affecting the subsequent silicon wafer processing yield. Currently, after cleaning, the floating objects will always gather on the liquid surface and cannot be dissipated or discharged, and the cleaning method needs to be optimized urgently. Utility Model Content

[0003] The utility model aims to provide a device for improving the residual microcrystals of HJT reworked sheets, thereby solving the problem of re-pollution caused by microcrystals floating on the liquid surface of the cleaning tank.

[0004] The purpose of the utility model is achieved through the following technical solutions:

[0005] A device for improving microcrystalline residue of HJT reworked sheets comprises a cleaning tank with an upper opening, an overflow port is arranged at the upper part of the cleaning tank, the overflow port is connected to an overflow pipeline, a pipe valve and a filter element assembly are arranged on the overflow pipeline, the overflow pipeline is connected to a circulation pump, the circulation pump is connected to a reflux pipeline, a reflux port is arranged at the lower part of the cleaning tank, and the reflux pipeline is connected to the reflux port.

[0006] Furthermore, the cleaning tank is a rectangular parallelepiped structure.

[0007] Furthermore, the overflow port includes a first overflow port and a second overflow port, and the first overflow port and the second overflow port are located on the same side of the cleaning tank.

[0008] Furthermore, the first overflow port and the second overflow port are respectively located at two ends of the same side of the cleaning tank.

[0009] Furthermore, the pipe valve is a pneumatic valve.

[0010] Furthermore, the circulation pump is a diaphragm pump.

[0011] Furthermore, the reflux port includes a first reflux port and a second reflux port, and the first reflux port and the second reflux port are located on the same side of the cleaning tank.

[0012] Furthermore, the first reflux port and the second reflux port are both located in the middle of the same side of the cleaning tank.

[0013] Furthermore, a flower basket support and a flow equalizing plate are provided in the cleaning tank, the flower basket supports are arranged opposite to each other, and the flow equalizing plate is arranged between the opposite flower basket supports.

[0014] Furthermore, the flower basket support comprises a support rod arranged along the width direction, an arc-shaped inner wing is provided in the middle of the support rod, arc-shaped side wings are provided on both sides of the support rod, and an arc-shaped protrusion is provided on the support rod between the inner wing and the side wings.

[0015] Furthermore, the cleaning tank, filter element assembly and circulation pump are all arranged on the base plate.

[0016] Beneficial effects of the utility model:

[0017] 1. Simple design principle, no need to make too many changes to the original cleaning tank and cleaning method, only need to add pipes, valves, pumps and other components outside the tank.

[0018] 2. The liquid surface and floating microcrystals are discharged for filtration to solve the problem of residual microcrystal floating objects caused by no circulation in the tank, thus ensuring the subsequent silicon wafer processing yield.

[0019] 3. Microcrystals float and gather in traditional cleaning tanks, and there is a phenomenon of adhesion to silicon wafers after the basket is lifted. This device reduces the time and liquid wasted due to repeated cleaning, and reduces the risk of product scrapping.

[0020] The aforementioned main scheme of the utility model and its further options can be freely combined to form multiple schemes, all of which are schemes that can be adopted and protected by the utility model; and in the utility model, (non-conflicting options) options and other options can also be freely combined. After understanding this scheme, those skilled in the art can understand that there are many combinations based on the existing technology and common knowledge, all of which are technical schemes to be protected by the utility model, and they are not exhaustively listed here. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] Figure 1 It is a three-dimensional diagram of the structure of the utility model.

[0022] Figure 2 It is the front view of the structure of the utility model.

[0023] Figure 3 It is a top view of the structure of the utility model.

[0024] In the figure: 1-cleaning tank, 2-overflow port, 3-overflow pipeline, 4-pipe valve, 5-filter element assembly, 6-circulation pump, 7-reflux pipeline, 8-reflux port, 9-flower basket bracket, 10-flow equalizing plate, 11-base plate; 21-first overflow port, 22-second overflow port, 81-first reflux port, 82-second reflux port, 91-bracket rod, 92-arc inner wing, 93-arc side wing, 94-arc protrusion. DETAILED DESCRIPTION

[0025] The present invention will be further described below in conjunction with specific embodiments and drawings.

[0026] refer to Figure 1 , Figure 2 and Figure 3 As shown, a device for improving microcrystalline residue of HJT reworked wafers includes a cleaning tank 1, an overflow port 2, an overflow pipeline 3, a pipe valve 4, a filter element assembly 5, a circulation pump 6, a reflux pipeline 7, a reflux port 8, a basket bracket 9, a flow equalizing plate 10 and a substrate 11.

[0027] The cleaning tank 1 is a rectangular parallelepiped structure with an upper opening. The tank is used to contain liquid for cleaning silicon wafers. Silicon wafers can be put into the tank from the upper opening, and after being cleaned by the cleaning liquid in the tank, they can be taken out from the tank from the upper opening.

[0028] An overflow port 2 is provided at the top of the cleaning tank 1. The height of the overflow port 2 is slightly lower than the slot position of the cleaning tank 1 and is substantially equal to the liquid level of the cleaning liquid, so that the liquid at the liquid level and the floating microcrystals can be discharged from the tank together.

[0029] The overflow port 2 includes a first overflow port 21 and a second overflow port 22. The multiple overflow ports ensure sufficient drainage without leaving dead corners. The first overflow port 21 and the second overflow port 22 are located on the same side of the cleaning tank 1, which facilitates the arrangement of the overflow pipeline 3.

[0030] The first overflow port 21 and the second overflow port 22 are respectively located at two ends of the same side of the cleaning tank 1. The positions of the two ends are not affected by the silicon wafers put in, so as to ensure the smooth flow of the liquid surface and the floating microcrystals.

[0031] The overflow port 2 is connected to the overflow pipeline 3, and the overflow pipeline 3 is provided with a pipe valve 4 and a filter element assembly 5. The pipe valve 4 is a pneumatic valve for controlling the on-off of the overflow pipeline 3, and the filter element assembly 5 filters the cleaning liquid flowing through, intercepts the microcrystals, and the purified and filtered cleaning liquid flows away.

[0032] The overflow pipe 3 is connected to the circulation pump 6, which is a diaphragm pump. The circulation pump 6 is used to provide hydraulic pressure for the circulation of the cleaning liquid, so that the liquid in the tank is extracted and then sent back into the tank, realizing circulation and reducing the waste of water resources.

[0033] The circulation pump 6 is connected with the reflux pipeline 7. A reflux port 8 is provided at the lower part of the cleaning tank 1. The reflux pipeline 7 is connected with the reflux port 8. The height of the reflux port 8 is slightly higher than the bottom of the cleaning tank. The purified cleaning liquid is sent back without disturbing the liquid surface. The liquid flow below the liquid surface is also strengthened to enhance the cleaning effect.

[0034] The reflux port 8 includes a first reflux port 81 and a second reflux port 82. The multiple reflux ports ensure uniform return of liquid. The first reflux port 81 and the second reflux port 82 are located on the same side of the cleaning tank 1, which facilitates the arrangement of the reflux pipeline. The overflow pipeline and the reflux pipeline are located on the same side, which can reduce the laying length of the pipeline and reduce the overall cost.

[0035] The first reflow port 81 and the second reflow port 82 are both located in the middle of the same side of the cleaning tank 1. The middle is conducive to the diffusion of the purified cleaning liquid to the surroundings, and the middle is directly facing the silicon wafer put into the tank, which is conducive to cleaning and flushing the silicon wafer.

[0036] A basket support 9 and a current equalizing plate 10 are provided in the cleaning tank 1. The basket supports 9 are arranged relatively to each other, so a silicon wafer basket can be placed on a group of relatively opposite basket supports 9 to ensure the stability of the placement of the silicon wafers.

[0037] A flow equalizing plate 10 is arranged between the relative flower basket brackets 9, and a number of flow equalizing holes arranged at equal intervals are provided on the flow equalizing plate 10. At this time, the height of the return port is slightly lower than the flow equalizing plate 10 or basically equal to the flow equalizing plate, so that the cleaning liquid entering the tank is evenly dispersed through the diversion effect of the flow equalizing plate.

[0038] The flower basket support 9 includes a support rod 91 arranged along the width direction, an arc-shaped inner wing 92 is provided in the middle of the support rod 91, arc-shaped side wings 93 are provided on both sides of the support rod 91, and an arc-shaped protrusion 94 located between the inner wing and the side wing is provided on the support rod 91. The arc-shaped inner wing, outer wing and protrusion can ensure that the silicon wafer flower basket fits better with the support, so that the silicon wafer flower basket can be placed stably.

[0039] The cleaning tank 1, the filter element assembly 5 and the circulation pump 6 are all welded or screwed on the base plate 11. The base plate 11 serves as the basis of the entire device to realize the placement and support of other components.

[0040] The working process of the utility model is as follows: the reworked wafers to be cleaned are placed in the tank for cleaning, the film layer on the surface of the silicon wafer falls off to form floating microcrystals, and when the process is completed, the pipe valve (pneumatic valve) and the circulation pump (diaphragm pump) are automatically opened to allow the microcrystals floating on the liquid surface to overflow and circulate in the filter element for filtration, and after the circulation is completed, the cleaned silicon wafers can be taken out by the robotic arm.

[0041] The above basic examples and further optional examples of the utility model can be freely combined to form multiple embodiments, which are all embodiments that can be adopted and claimed for protection by the utility model. In the scheme of the utility model, each optional example can be arbitrarily combined with any other basic examples and optional examples.

[0042] The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention. Any modifications, equivalent substitutions and improvements made within the spirit and principles of the present invention should be included in the protection scope of the present invention.

Claims

1. A device for improving microcrystalline residues in HJT reworked wafers, comprising a cleaning tank (1) with an upper opening, characterized in that: The upper part of the cleaning tank (1) is provided with an overflow port (2), the overflow port (2) is connected to an overflow pipeline (3), a pipe valve (4) and a filter element assembly (5) are provided on the overflow pipeline (3), the overflow pipeline (3) is connected to a circulation pump (6), the circulation pump (6) is connected to a return pipeline (7), and the lower part of the cleaning tank (1) is provided with a return port (8), the return pipeline (7) is connected to the return port (8).

2. The device for improving microcrystalline residue of HJT reworked wafer according to claim 1, characterized in that: The cleaning tank (1) is a rectangular parallelepiped structure.

3. The device for improving microcrystalline residue of HJT reworked wafer according to claim 1, characterized in that: The overflow port (2) comprises a first overflow port (21) and a second overflow port (22), and the first overflow port (21) and the second overflow port (22) are located on the same side of the cleaning tank (1).

4. The device for improving microcrystalline residue of HJT rework wafer according to claim 3, characterized in that: The first overflow port (21) and the second overflow port (22) are respectively located at two ends of the same side of the cleaning tank (1).

5. The device for improving microcrystalline residue of HJT rework wafer according to claim 1, characterized in that: The pipe valve (4) is a pneumatic valve.

6. The device for improving microcrystalline residue of HJT reworked wafer according to claim 1 or 5, characterized in that: The circulating pump (6) is a diaphragm pump.

7. The device for improving microcrystalline residue of HJT reworked wafer according to claim 1, 3 or 4, characterized in that: The reflux port (8) comprises a first reflux port (81) and a second reflux port (82), and the first reflux port (81) and the second reflux port (82) are located on the same side of the cleaning tank (1).

8. The device for improving microcrystalline residue of HJT reworked wafer according to claim 7, characterized in that: The first return port (81) and the second return port (82) are both located in the middle of the same side of the cleaning tank (1).

9. The device for improving microcrystalline residue of HJT rework wafer according to claim 1, characterized in that: The cleaning tank (1) is provided with a basket support (9) and a flow equalizing plate (10), the basket supports (9) are arranged opposite to each other, and the flow equalizing plate (10) is arranged between the opposite basket supports (9).

10. The device for improving microcrystalline residue of HJT rework wafer according to claim 9, characterized in that: The flower basket support (9) comprises a support rod (91) arranged along the width direction, a curved inner wing (92) is provided in the middle of the support rod (91), curved side wings (93) are provided on both sides of the support rod (91), and a curved protrusion (94) is provided on the support rod (91) between the inner wing and the side wings.

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