Photomask taking device of chip photoetching machine

Abstract

The utility model relates to the technical field of chip photoetching machines, in particular to a photomask taking device of a chip photoetching machine, which comprises a bottom frame, a material table is arranged right above the top end of the bottom frame, a clamping table is arranged right above the top end of the material table, and a clamping groove is arranged in the middle of the clamping table. According to the utility model, the material table, the clamping table, the first cylinder, the second cylinder and the movable table are matched for use, after the photoetching plate is used, the chuck is loosened, the photoetching plate falls into the placing groove on the movable table, then the material table is pulled down and reset to the upper end of the bottom frame through the first cylinder, and then the second cylinder is started and pushes the movable table forwards, so that the photoetching plate can be clamped. And the movable table drives the photolithography mask in the placing groove to be pushed out, so that the loading and unloading processes are both operated at the lower end part of the photoetching machine, and dust cannot enter the upper end part of the photoetching machine.

Description

Technical Field

[0001] The utility model relates to the technical field of chip photolithography machines, in particular to a photolithography plate taking device for a chip photolithography machine. Background Art

[0002] A photoresist is an optical mask used for photolithography in the semiconductor manufacturing process. It is a transparent substrate covered with a photolithography pattern. The photolithography pattern is made by the designer according to the requirements of the integrated circuit design. It shows the shape, position and geometric parameters of each component on the chip. The photoresist transfers the pattern to the photoresist layer or photolithography mask through the light source on the lithography machine, and then transfers the pattern to the chip surface through subsequent chemical processing steps.

[0003] The existing photoresist plates on the market need to be taken out from the photolithography machine after processing. However, each time they are taken out, the upper part of the photolithography machine needs to be opened, so that external dust can easily enter into it, affecting the subsequent processing. For this reason, we propose a photoresist plate taking device for a chip photolithography machine. Utility Model Content

[0004] The utility model aims to provide a photomask material taking device for a chip photolithography machine to solve the problems raised in the above-mentioned background technology.

[0005] In order to achieve the above purpose, the utility model provides the following technical solutions:

[0006] A photolithography plate material taking device for a chip photolithography machine, comprising

[0007] A base frame, a material table is arranged just above the top of the base frame, a clamping table is arranged just above the top of the material table, a clamping groove is opened in the middle of the clamping table, a clamping mechanism is arranged inside the clamping table, the clamping mechanism includes a worm gear, a convex block and a push rod, and a chuck is fixedly installed at one end of the push rod close to the clamping groove;

[0008] A first cylinder is fixedly installed on both sides of the bottom end of the base frame, and the output shaft ends of the two first cylinders are respectively arranged on both sides of the bottom end of the material table, a movable groove is opened in the middle of the material table, and a movable table is movably installed in the middle of the movable groove, and a second cylinder is fixedly installed on the outside of one side of the material table, and the output shaft of the second cylinder is connected to one side of the movable table, and a placement groove is opened in the middle of the movable table.

[0009] Preferably, a worm wheel is movably mounted inside the clamping platform, four convex blocks of equal arc are arranged on the inner wall of the worm wheel, one end of the push rod away from the chuck is movably connected with the convex blocks, a servo motor is arranged at one end of the clamping platform close to the outer side of the worm wheel, a worm is fixedly mounted on the output shaft of the servo motor, and the worm is meshed with the worm wheel;

[0010] Preferably, a first spring is arranged on the outer side of one end of the clamping head close to the push rod, and the other end of the first spring is fixedly connected to the clamping platform;

[0011] Preferably, the four corners of the base frame are fixedly mounted with optical axes, the four corners of the material table are movably sleeved with the four optical axes respectively, and a second spring is arranged between the four corners of the material table and the clamping table, and the second spring is movably sleeved with the outside of the optical axis;

[0012] Preferably, both sides of the inner wall of the movable groove are provided with sliding grooves, and both sides of the movable platform are symmetrically provided with a plurality of sliding blocks, and the sliding blocks are slidably connected with the sliding grooves;

[0013] Preferably, the placement groove and the clamping groove have the same inner diameter and are located on the same central axis.

[0014] Compared with the prior art, the beneficial effects of the utility model are:

[0015] 1. A photolithography plate picking device for a chip lithography machine is used in coordination with a material table, a clamping table, a first cylinder, a second cylinder and a movable table. After the photolithography plate is used, the chuck is released, and the photolithography plate will fall into a placement slot on the movable table. The material table is then pulled down and reset to the upper end of the base frame by the first cylinder, and the second cylinder is started. The second cylinder pushes the movable table forward, and the movable table drives the photolithography plate in the placement slot to be pushed out. In this way, the loading and unloading processes are all operated at the lower end of the lithography machine, and dust will not enter the upper end of the lithography machine.

[0016] 2. A photolithography plate picking device of a chip lithography machine is used in combination with a worm gear, a bump, a push rod and a chuck. When loading and unloading, the material table is raised and lowered to drive the photolithography plate in and out of the clamping groove in the middle of the clamping table. The clamping mechanism arranged inside the clamping table is used to clamp the photolithography plate. The servo motor is started during clamping. After the servo motor is started, the worm is controlled to rotate. When the worm rotates, it drives the worm wheel to rotate. When the worm wheel rotates, the push rod is pushed forward by the bump. When the push rod is pushed forward, the first spring is compressed and the photolithography plate is clamped by the chuck, thereby achieving the purpose of facilitating clamping and fixing. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] Figure 1 It is a schematic diagram of the overall main structure of the utility model;

[0018] Figure 2 This is a schematic diagram of the internal structure of the clamping table of the utility model;

[0019] Figure 3 This is a schematic diagram of the material platform structure from a top view of the present utility model;

[0020] Figure 4 For this utility model Figure 2A magnified schematic diagram of center A.

[0021] In the figure: 1. base frame; 2. material table; 3. clamping table; 4. clamping groove; 5. clamping mechanism; 501. worm gear; 502. bump; 503. push rod; 6. chuck; 7. first cylinder; 8. movable groove; 9. movable table; 10. second cylinder; 11. placement groove; 12. servo motor; 13. worm; 14. first spring; 15. optical axis; 16. second spring; 17. slide groove; 18. slider. DETAILED DESCRIPTION

[0022] The following will be combined with the drawings in the embodiments of the utility model to clearly and completely describe the technical solutions in the embodiments of the utility model. Obviously, the described embodiments are only part of the embodiments of the utility model, not all of the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the utility model.

[0023] In addition, the terms "first" and "second" are used for descriptive purposes only and should not be understood as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Therefore, a feature defined as "first" or "second" may explicitly or implicitly include one or more of the features. In the description of the present utility model, the meaning of "several" is two or more, unless otherwise clearly and specifically defined.

[0024] like Figure 1-4 As shown, a technical solution provided by the utility model:

[0025] A photolithography plate taking device for a chip photolithography machine comprises a base frame 1, a material table 2 is arranged just above the top of the base frame 1, a clamping table 3 is arranged just above the top of the material table 2, a clamping groove 4 is opened in the middle of the clamping table 3, a clamping mechanism 5 is arranged inside the clamping table 3, the clamping mechanism 5 comprises a worm gear 501, a bump 502 and a push rod 503, and a chuck 6 is fixedly installed at one end of the push rod 503 close to the clamping groove 4; the worm gear 501 is movably installed inside the clamping table 3 01, four convex blocks 502 of equal arc are arranged on the inner wall of the worm wheel 501, one end of the push rod 503 away from the chuck 6 is movably connected with the convex block 502, a servo motor 12 is arranged at the outer end of the clamping platform 3 close to the worm wheel 501, a worm 13 is fixedly installed on the output shaft of the servo motor 12, and the worm 13 is meshed with the worm wheel 501; a first spring 14 is arranged at the outer side of one end of the chuck 6 close to the push rod 503, and the other end of the first spring 14 is fixedly connected with the clamping platform 3;

[0026] In this embodiment, when loading and unloading, the material table 2 is raised and lowered to drive the photolithography plate in and out of the clamping groove 4 in the middle of the clamping table 3. The clamping mechanism 5 arranged inside the clamping table 3 is used to clamp the photolithography plate. When clamping, the servo motor 12 is started. After the servo motor 12 is started, the worm 13 is controlled to rotate. When the worm 13 rotates, it drives the worm wheel 501 to rotate. When the worm wheel 501 rotates, the push rod 503 is pushed forward through the protrusion 502. When the push rod 503 is pushed forward, the first spring 14 is compressed and the photolithography plate is clamped through the chuck 6, thereby achieving the purpose of facilitating clamping and fixing.

[0027] like Figure 1 and Figure 3 As shown, first cylinders 7 are fixedly installed on both sides of the bottom end of the base frame 1, and the output shaft ends of the two first cylinders 7 are respectively arranged on both sides of the bottom end of the material table 2, a movable groove 8 is opened in the middle of the material table 2, and a movable table 9 is movably installed in the middle of the movable groove 8, and a second cylinder 10 is fixedly installed on the outside of one side of the material table 2, and the output shaft of the second cylinder 10 is connected to one side of the movable table 9, and a placement groove 11 is opened in the middle of the movable table 9; optical axes 15 are fixedly installed on the four corners of the base frame 1, and the four corners of the material table 2 are movably connected with the four optical axes 15 respectively, and second springs 16 are arranged between the four corners of the material table 2 and the clamping table 3, and the second springs 16 are movably connected with the outside of the optical axes 15;

[0028] In this embodiment, after the photolithography plate is used, the chuck 6 is released, and the photolithography plate will fall into the placement groove 11 on the movable table 9. Then, the material table 2 is pulled down and reset to the upper end of the base frame 1 by the first cylinder 7, and then the second cylinder 10 is started. The second cylinder 10 pushes the movable table 9 forward, and the movable table 9 drives the photolithography plate in the placement groove 11 to be pushed out. In this way, the loading and unloading processes are all operated at the lower end of the photolithography machine, and dust will not enter the upper end of the photolithography machine.

[0029] like Figure 3 As shown, both sides of the inner wall of the movable groove 8 are provided with slide grooves 17, and both sides of the movable platform 9 are symmetrically provided with a plurality of sliders 18, and the sliders 18 are slidably connected with the slide grooves 17;

[0030] In this embodiment, when the second cylinder 10 controls the movable platform 9 to move forward and backward, the sliders 18 on both sides of the movable platform 9 will slide along the inside of the slide groove 17 for guidance.

[0031] like Figure 1 As shown, the inner diameters of the placement groove 11 and the clamping groove 4 are equal and are located on the same central axis;

[0032] In this embodiment, when the movable table 9 moves to the inside of the movable groove 8, the placement groove 11 and the clamping groove 4 are in the same vertical direction. In this way, when the material table 2 lifts the photoresist inside the placement groove 11, the photoresist will enter the clamping groove 4 and be clamped and fixed, and will always be lifted at the bottom of the clamping table 3 during processing. In this way, the bottom end of the photoresist can be supported and sealed from the bottom of the clamping table 3 at the same time.

[0033] Working principle: The clamping table 3 in the device is arranged at the upper part of the photolithography machine, and the base frame 1 and the material table 2 are located at the lower part of the photolithography machine. When loading and unloading, the material table 2 is raised and lowered to drive the photolithography plate to enter and exit the clamping groove 4 in the middle of the clamping table 3. The clamping mechanism 5 arranged inside the clamping table 3 is used to clamp the photolithography plate. When clamping, the servo motor 12 is started. After the servo motor 12 is started, the worm 13 is controlled to rotate. When the worm 13 rotates, it drives the worm wheel 501 to rotate. When the worm wheel 501 rotates, the push rod 503 is pushed forward through the protrusion 502. When the push rod 503 is pushed forward, the first spring 14 is compressed and the photolithography plate is clamped by the chuck 6; after the photolithography plate is used, the chuck 6 is released, and the photolithography plate will fall into the placement groove 11 on the movable table 9, and then the material table 2 is pulled down and reset to the upper end of the base frame 1 by the first cylinder 7, and then the second cylinder 10 is started, and the second cylinder 10 pushes the movable table 9 forward, and the movable table 9 drives the photolithography plate in the placement groove 11 to be pushed out. In this way, the loading and unloading processes are all operated at the lower end of the photolithography machine, and dust will not enter the upper end of the photolithography machine.

[0034] The above shows and describes the basic principle, main features and advantages of the utility model. Those skilled in the art should understand that the utility model is not limited by the above embodiments. The above embodiments and descriptions are only preferred examples of the utility model and are not used to limit the utility model. Without departing from the spirit and scope of the utility model, the utility model may have various changes and improvements, which fall within the scope of the utility model to be protected. The scope of protection of the utility model is defined by the attached claims and their equivalents.

Claims

1. A photomask material taking device for a chip photolithography machine, characterized in that: include A base frame (1), a material table (2) is arranged directly above the top of the base frame (1), a clamping table (3) is arranged directly above the top of the material table (2), a clamping groove (4) is opened in the middle of the clamping table (3), a clamping mechanism (5) is arranged inside the clamping table (3), the clamping mechanism (5) comprises a worm gear (501), a protrusion (502) and a push rod (503), and a chuck (6) is fixedly installed at one end of the push rod (503) close to the clamping groove (4); A first cylinder (7) is fixedly mounted on both sides of the bottom end of the base frame (1), and the output shaft ends of the two first cylinders (7) are respectively arranged on both sides of the bottom end of the material platform (2). A movable groove (8) is provided in the middle of the material platform (2), and a movable platform (9) is movably mounted in the middle of the movable groove (8). A second cylinder (10) is fixedly mounted on the outside of one side of the material platform (2), and the output shaft of the second cylinder (10) is connected to one side of the movable platform (9), and a placement groove (11) is provided in the middle of the movable platform (9).

2. The photomask taking device of a chip photolithography machine according to claim 1, characterized in that: A worm wheel (501) is movably mounted inside the clamping platform (3); four protrusions (502) are arranged at equal arcs on the inner wall of the worm wheel (501); an end of the push rod (503) away from the chuck (6) is movably connected to the protrusion (502); a servo motor (12) is arranged at an outer end of the clamping platform (3) close to the worm wheel (501); a worm (13) is fixedly mounted on the output shaft of the servo motor (12); and the worm (13) is meshed with the worm wheel (501).

3. The photomask taking device of a chip photolithography machine according to claim 1, characterized in that: A first spring (14) is arranged on the outer side of one end of the clamping head (6) close to the push rod (503), and the other end of the first spring (14) is fixedly connected to the clamping platform (3).

4. The photomask material taking device of a chip photolithography machine according to claim 1, characterized in that: Optical axes (15) are fixedly mounted at the four corners of the base frame (1), and the four corners of the material platform (2) are movably sleeved with the four optical axes (15) respectively. Second springs (16) are arranged between the four corners of the material platform (2) and the clamping platform (3), and the second springs (16) are movably sleeved with the outside of the optical axes (15).

5. The photomask taking device of a chip photolithography machine according to claim 1, characterized in that: Slide grooves (17) are provided on both sides of the inner wall of the movable groove (8), and a plurality of sliding blocks (18) are symmetrically arranged on both sides of the movable platform (9), and the sliding blocks (18) are slidably connected to the slide grooves (17).

6. The photomask material taking device of a chip photolithography machine according to claim 1, characterized in that: The placement groove (11) and the clamping groove (4) have the same inner diameter and are located on the same central axis.

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