Special gas system applied to multiple reaction chambers

Abstract

The utility model relates to the technical field of ALD (atomic layer deposition) equipment, in particular to a special gas system applied to multiple reaction chambers, which comprises a main source bottle connected with a liquid inlet pipeline for introducing precursor chemicals, a first gas inlet pipeline for introducing source-carrying gas and a first gas outlet pipeline for discharging gas to each reaction chamber, a heating device is arranged on the outer wall of the main source bottle; the plurality of buffer bottles are in one-to-one correspondence with the plurality of reaction chambers, and each buffer bottle is provided with a second gas inlet pipeline communicated with the first gas outlet pipeline and a second gas outlet pipeline communicated with each reaction chamber; and the third gas inlet pipeline is used for supplementing source-carrying gas, and the third gas inlet pipeline is communicated with the plurality of second gas outlet pipelines through a plurality of bypass gas channels. According to the special gas system applied to the multiple reaction chambers, provided by the embodiment of the utility model, the equipment cost can be effectively reduced, and the process consistency of different reaction chambers is ensured.

Description

Technical Field

[0001] The utility model relates to the technical field of ALD equipment, in particular to a special gas system applied to multiple reaction chambers. Background Art

[0002] ALD equipment is atomic layer deposition coating equipment, which can coat a single-atom-thick thin film on the surface of the substrate. The coating accuracy is very high, and it is a very advanced nano-level surface treatment technology. At present, ALD equipment has been widely used in the field of photovoltaic manufacturing. In order to achieve photovoltaic grid parity, improving the efficiency of solar cells and reducing manufacturing costs are the goals that the industry continues to pursue. Increasing the single-machine capacity of the equipment can effectively reduce the manufacturing cost of a single solar cell. In order to increase the capacity of the equipment, multi-chamber ALD equipment has become a trend. Multi-chamber ALD equipment usually requires multiple sets of special gas systems, which will increase the cost of the equipment itself. Utility Model Content

[0003] The purpose of the utility model is to provide a special gas system applied to multiple reaction chambers to solve the problems raised in the above background technology.

[0004] To achieve the above object, the utility model provides a special gas system applied to multiple reaction chambers, comprising:

[0005] A main source bottle, the main source bottle is connected with a liquid inlet pipe for introducing precursor chemicals, a first air inlet pipe for introducing source-carrying gas, and a first air outlet pipe for exhausting gas to each reaction chamber, and the outer wall of the main source bottle is provided with a heating device;

[0006] A plurality of buffer bottles, each of which corresponds to a plurality of reaction chambers, and each of which is provided with a second air inlet pipe connected to the first air outlet pipe and a second air outlet pipe connected to each reaction chamber;

[0007] A third air inlet pipeline is used to supplement the source-carrying gas, and the third air inlet pipeline is connected to multiple second air outlet pipelines respectively through multiple bypass airways.

[0008] Preferably, the first air inlet pipeline is provided with a first air inlet valve and a first pressure reducing valve, the first air outlet pipeline is provided with a first air outlet valve, and the liquid inlet pipeline is provided with a liquid inlet valve.

[0009] Preferably, a second air inlet valve is provided on the second air inlet pipeline, and the special gas system applied to the multi-reaction chamber further comprises a controller, and the controller is configured as follows:

[0010] When all of the plurality of second intake valves are in the closed state, the first intake valve is opened.

[0011] Preferably, the controller is further configured to:

[0012] Only one of the plurality of second intake valves is opened at the same time.

[0013] Preferably, a second air outlet valve is provided on the second air outlet pipe.

[0014] Preferably, a second pressure reducing valve is provided on the third air intake pipe.

[0015] Preferably, a flow meter and a third air intake valve are provided on the bypass air passage.

[0016] Compared with the prior art, the beneficial effects of the utility model are:

[0017] The special gas system for multiple reaction chambers provided by the embodiment of the utility model transfers the source-carrying gas and precursor chemical vapor in a main source bottle to multiple buffer bottles, which are then passed into each reaction chamber from the buffer bottles. The source-carrying gas can be replenished after the buffer bottles to increase the transport power of the precursor chemical vapor. The special gas system for multiple reaction chambers provided by the embodiment of the utility model can effectively reduce equipment costs and ensure process consistency in different reaction chambers. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] Figure 1 A schematic structural diagram of a special gas system applied to multiple reaction chambers provided in accordance with an embodiment of the present utility model.

[0019] In the figure: 1. main source bottle; 2. cache bottle; 3. reaction chamber; 4. first air inlet valve; 5. first pressure reducing valve; 6. first air outlet valve; 7. liquid inlet valve; 8. second air inlet valve; 9. second air outlet valve; 10. second pressure reducing valve; 11. flow meter; 12. third air inlet valve. DETAILED DESCRIPTION

[0020] The following will be combined with the drawings in the embodiments of the utility model to clearly and completely describe the technical solutions in the embodiments of the utility model. Obviously, the described embodiments are only part of the embodiments of the utility model, not all of the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the utility model.

[0021] Figure 1 The schematic diagram of the structure of the special gas system applied to multiple reaction chambers provided by the embodiment of the utility model. Figure 1 As shown, an embodiment of the utility model provides a special gas system applied to multiple reaction chambers, including:

[0022] A main source bottle 1, the main source bottle 1 is connected with a liquid inlet pipe for introducing precursor chemicals, a first gas inlet pipe for introducing source-carrying gas, and a first gas outlet pipe for exhausting gas to each reaction chamber 3, and a heating device is provided on the outer wall of the main source bottle 1;

[0023] A plurality of buffer bottles 2, each of which corresponds to a plurality of reaction chambers. The buffer bottles 2 are provided with a second air inlet pipe connected to the first air outlet pipe and a second air outlet pipe connected to each reaction chamber 3;

[0024] The third air inlet pipeline is used to supplement the source gas, and the third air inlet pipeline is connected with the multiple second air outlet pipelines respectively through multiple bypass airways.

[0025] The precursor chemicals used in the ALD equipment are usually liquids, and the main source bottle 1 needs to be heated and temperature-controlled to ensure that its temperature is stable so that the saturated vapor pressure of the precursor chemicals is stable. Inert gases such as nitrogen and argon are used as source-carrying gases to enter the main source bottle 1. The special gas system applied to multiple reaction chambers provided in the embodiment of the present invention can effectively reduce the equipment cost and ensure the process consistency of different reaction chambers 3 by transferring the source-carrying gas and precursor chemical vapor in a main source bottle 1 to multiple buffer bottles 2, and then passing the buffer bottles 2 into each reaction chamber 3.

[0026] like Figure 1 As shown, in one embodiment of the utility model, the first air inlet pipeline is provided with a first air inlet valve 4 and a first pressure reducing valve 5, the first air outlet pipeline is provided with a first air outlet valve 6, and the liquid inlet pipeline is provided with a liquid inlet valve 7. The liquid inlet valve 7 is used to control the entry of the precursor chemical, the first pressure reducing valve 5 is used to adjust the pressure of the source-carrying gas, the first air inlet valve 4 controls the entry of the source-carrying gas, and the first air outlet valve 6 is used to control the outlet of the source-carrying gas and the precursor chemical vapor in the main source bottle 1.

[0027] In one embodiment of the utility model, a second air inlet valve 8 is provided on the second air inlet pipeline, and the special gas system applied to the multi-reaction chamber further includes a controller, which is configured as follows:

[0028] When all of the plurality of second intake valves 8 are in the closed state, the first intake valve 4 is opened.

[0029] Through the above technical scheme, it is ensured that the multiple second air inlet valves 8 of the multiple cache bottles 2 are all closed, and the controller can open the first air inlet valve 4 of the main source bottle 1 to allow the source-carrying gas to enter, so that all the source-carrying gas enters the main source bottle 1. In this way, it can be ensured that the volume and pressure of the source-carrying gas in the main source bottle 1 are constant after each introduction of the source-carrying gas.

[0030] Furthermore, the controller is configured to:

[0031] Only one of the plurality of second intake valves 8 is opened at the same time.

[0032] Through the above technical solution, the controller controls only one of the multiple second air inlet valves 8 to be in the open state at the same time, so that the source-carrying gas in the main source bottle 1 will carry all the precursor chemical vapor into a cache bottle 2, thereby ensuring that the amount of source-carrying gas and chemical vapor entering different cache bottles 2 each time is constant.

[0033] like Figure 1 As shown, in one embodiment of the present invention, a second outlet valve 9 is provided on the second outlet pipeline. The second outlet valve 9 is used to control the outlet of the source gas and the precursor chemical vapor in the buffer bottle 2.

[0034] In one embodiment of the present utility model, the third air intake pipeline is provided with a second pressure reducing valve 10. The bypass air passage is provided with a flow meter 11 and a third air intake valve 12.

[0035] After the buffer bottle 2, the source-carrying gas can be supplemented through the third air inlet pipe to increase the transport power of the precursor chemical vapor. The second pressure reducing valve 10 is used to adjust the pressure of the supplemented source-carrying gas. The gas flow is controlled by the flow meter 11. The gas enters through the bypass airway controlled by the third air inlet valve 12, and is mixed with the source-carrying gas and the precursor chemical vapor in the second air outlet pipe, and then enters the reaction chamber 3.

[0036] In the specific application process, the working principle of the special gas system applied to multiple reaction chambers provided by the utility model is as follows:

[0037] During operation, the precursor chemical enters the main source bottle 1 through the liquid inlet pipe via the liquid inlet valve 7, and an inert gas such as nitrogen, argon, etc. is used as the source-carrying gas to enter the main source bottle 1 through the first air inlet pipe via the first pressure reducing valve 5 and the first air inlet valve 4. The precursor chemical is heated in the main source bottle 1 to form precursor chemical vapor, and the source-carrying gas and the precursor chemical vapor flow out through the first air outlet pipe via the first air outlet valve 6 into the second air inlet pipe, and enter each buffer bottle 2 through the second air inlet valve 8, and then the source-carrying gas and the precursor chemical vapor pass through the second air outlet pipe via the second air outlet valve 9 into each reaction chamber 3. During the process, the source-carrying gas can be supplemented through the third air inlet pipe via the second pressure reducing valve 10, and the source-carrying gas enters the second air outlet pipe through the bypass airway via the flowmeter 11 and the third air inlet valve 12, thereby increasing the transport power of the precursor chemical vapor.

[0038] Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present invention, and that the scope of the present invention is defined by the appended claims and their equivalents.

Claims

1. A special gas system applied to multiple reaction chambers, characterized in that: include: A main source bottle (1), the main source bottle (1) being connected to a liquid inlet pipe for introducing a precursor chemical, a first gas inlet pipe for introducing a source-carrying gas, and a first gas outlet pipe for exhausting gas to each reaction chamber (3), and a heating device being arranged on an outer wall of the main source bottle (1); A plurality of cache bottles (2), the plurality of cache bottles (2) corresponding one to one with the plurality of reaction chambers, the cache bottles (2) being provided with a second air inlet pipe connected to the first air outlet pipe and a second air outlet pipe connected to each reaction chamber (3); A third air inlet pipeline is used to supplement the source-carrying gas, and the third air inlet pipeline is connected to multiple second air outlet pipelines respectively through multiple bypass airways.

2. The special gas system for multiple reaction chambers according to claim 1, characterized in that: The first air inlet pipeline is provided with a first air inlet valve (4) and a first pressure reducing valve (5), the first air outlet pipeline is provided with a first air outlet valve (6), and the liquid inlet pipeline is provided with a liquid inlet valve (7).

3. The special gas system for multiple reaction chambers according to claim 2, characterized in that: The second air inlet pipeline is provided with a second air inlet valve (8), and the special gas system applied to the multi-reaction chamber further comprises a controller, wherein the controller is configured as follows: When all of the plurality of second intake valves (8) are in a closed state, the first intake valve (4) is opened.

4. The special gas system for multiple reaction chambers according to claim 3, characterized in that: The controller is also configured to: Only one of the plurality of second intake valves (8) is opened at the same time.

5. The special gas system for multiple reaction chambers according to claim 1, characterized in that: The second air outlet pipe is provided with a second air outlet valve (9).

6. The special gas system for multiple reaction chambers according to claim 1, characterized in that: The third air intake pipeline is provided with a second pressure reducing valve (10).

7. The special gas system for multiple reaction chambers according to claim 1, characterized in that: The bypass air passage is provided with a flow meter (11) and a third air intake valve (12).

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