Silicon carbide wafer on-line cleaning diversion trench

Abstract

The utility model relates to the technical field of silicon wafer cleaning, and discloses a silicon carbide wafer online cleaning diversion trench which comprises a trench body, a support, a cleaning basket, a diversion assembly and a driving assembly, the support is installed in the trench body, the cleaning basket is arranged in the trench body, and the diversion assembly and the driving assembly are both installed on the support. The flow guide assembly drives the cleaning agent in the tank body to flow up and down, and the driving assembly drives the flow guide assembly to operate. According to the silicon wafer cleaning device, in the whole using process, the cleaning agent in the groove body flows up and down through the flow guide assembly to drive dirt on the surfaces of the silicon wafers, under the structure, dirt between the adjacent silicon wafers can be effectively washed away, and therefore the cleaning efficiency and the cleaning effect can be effectively improved, and the service life of the silicon wafer cleaning device is prolonged. In addition, cleaning in the groove body continuously flows through the liquid outlet holes in the diversion groove main body, so that dirt contained in the cleaning agent can be intercepted by the liquid outlet holes, the dirt can be prevented from returning to the surface of the silicon wafer again, and the cleaning effect is effectively guaranteed.

Description

Technical Field

[0001] The utility model relates to the technical field of silicon wafer cleaning, and more specifically to a guide groove for online cleaning of silicon carbide wafers. Background Art

[0002] The main application areas of silicon carbide wafers include LED solid lighting and high-frequency devices. This material has excellent properties such as bandgap, drift velocity, breakdown voltage, thermal conductivity, high temperature resistance, etc. that are several times higher than traditional silicon. It has irreplaceable advantages in electronic application fields such as high temperature, high pressure, high frequency, high power, optoelectronics, radiation resistance, microwave, and extreme environment applications such as aerospace, military industry, and nuclear energy.

[0003] After the silicon carbide wafer is cut and before it is used, it is generally necessary to use a cleaning machine to clean its surface in order to facilitate the subsequent gluing or coating process. That is, it is placed in the cleaning tank of the cleaning machine, which contains a special cleaning agent that can quickly remove dirt on the surface of the silicon carbide wafer.

[0004] In order to increase the cleaning efficiency, the cleaning tank of the existing conventional cleaning machine is equipped with an ultrasonic device and a heating device in addition to containing a special cleaning liquid inside to enhance the cleaning effect, so as to improve the cleaning efficiency. However, in the actual cleaning process, batch cleaning is generally carried out, that is, a batch of silicon wafers are placed in a cleaning basket for cleaning. In this way, the gap between adjacent silicon wafers is relatively narrow, so that the dirt shaken off by the ultrasonic wave is not easy to flow out from the gap, resulting in a longer cleaning time. Otherwise, the dirt shaken off will re-attach to the surface of the silicon wafer when the cleaning basket is taken out. Generally speaking, it still has certain defects in use. Utility Model Content

[0005] In order to overcome the above-mentioned defects of the prior art, the utility model provides a guide trough for online cleaning of silicon carbide wafers to solve the problems existing in the above-mentioned background technology.

[0006] The utility model provides the following technical solution: a guide trough for online cleaning of silicon carbide wafers, comprising: a trough body, a bracket, a cleaning basket, a guide assembly and a driving assembly, the bracket being installed in the trough body, the cleaning basket being placed in the trough body, the guide assembly and the driving assembly being both installed on the bracket, the cleaning agent in the trough body being driven to flow up and down by the guide assembly, and the guide assembly being driven to operate by the driving assembly.

[0007] Furthermore, the guide assembly includes a guide trough body and an impeller. The guide trough body is fixedly installed on the bracket. A liquid inlet is provided on the lower surface of the guide trough body. The impeller is rotatably installed in the guide trough body and is above the liquid inlet. A plurality of liquid outlet holes are provided on the upper surface of the guide trough body. The cleaning basket is placed on the guide trough body and is above the liquid outlet holes.

[0008] Furthermore, gaps are left between the lower surface of the guide trough body and the bottom of the trough body, and between the side surfaces of the guide trough body and the side surfaces of the trough body.

[0009] Furthermore, a guide plate is fixedly installed inside the guide trough body, the guide plate gradually spreads from the impeller to the direction away from the impeller, and the liquid outlet is connected to the space separated by the guide plate, and the impeller is located in the space separated by the guide plate.

[0010] Furthermore, an installation opening is provided on the upper surface of the guide trough body, and the impeller can pass through the installation opening to enter the guide trough body. The installation opening is equipped with a sealing cover, and the sealing cover is sleeved on the rotating shaft of the impeller.

[0011] Furthermore, the driving assembly includes a motor, which is fixedly mounted on the bracket, and the rotating shaft of the motor extends into the tank body and is coaxially connected to the rotating shaft of the impeller.

[0012] Furthermore, the motor is equipped with a protective cover, which is fixedly mounted on the bracket and covers the motor.

[0013] Furthermore, the bracket includes a side frame and an auxiliary frame. There are two side frames, which are respectively installed on both sides of the guide trough body. The auxiliary frame is fixedly installed on the surface of the guide trough body, and the end of the auxiliary frame away from the guide trough body is fixed to the side frame.

[0014] Furthermore, a drain pipe is installed at the bottom of the tank body, and an electric control valve is installed in the middle of the drain pipe. An equipment seat is installed at the bottom of the tank body, and the equipment seat has a built-in electric heater and an ultrasonic vibrator.

[0015] Technical effects and advantages of the utility model:

[0016] 1. In the whole use process of the utility model, the cleaning agent in the tank body is made to flow up and down through the guide component to drive the dirt on the surface of the silicon wafer. Under this structure, the dirt between adjacent silicon wafers can be effectively washed away, thereby effectively improving the cleaning efficiency and cleaning effect.

[0017] 2. During use of the utility model, since the cleaning inside the tank body is continuously flowing through the liquid outlet hole on the guide tank body, the dirt contained in the cleaning agent will also be retained by the liquid outlet hole, thereby preventing the dirt from returning to the surface of the silicon wafer, effectively ensuring the cleaning effect. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] Figure 1 It is a schematic diagram of the three-dimensional structure of the utility model;

[0019] Figure 2 This is a schematic diagram of the internal structure of the utility model;

[0020] Figure 3 For this utility model Figure 2 The enlarged structural diagram at A in the middle;

[0021] Figure 4 It is a schematic diagram of the internal structure of the guide trough body of the utility model.

[0022] The accompanying drawings are marked as follows: 1. trough body; 2. bracket; 3. cleaning basket; 4. guide trough body; 5. impeller; 6. liquid inlet; 7. liquid outlet; 8. drainage plate; 9. installation port; 10. sealing cover; 11. protective cover; 12. side frame; 13. auxiliary frame; 14. drain pipe; 15. equipment base; 16. motor. DETAILED DESCRIPTION

[0023] The technical solution of the present invention will be clearly and completely described below in conjunction with the drawings in the present invention. In addition, the forms of the various structures recorded in the following embodiments are merely examples. The silicon carbide wafer online cleaning guide trough involved in the present invention is not limited to the various structures recorded in the following embodiments. All other implementations obtained by ordinary technicians in this field without making creative work are within the scope of protection of the present invention.

[0024] Reference Figure 1-4 The utility model provides a guide trough for online cleaning of silicon carbide wafers, comprising: a trough body 1, a bracket 2, a cleaning basket 3, a guide assembly and a driving assembly, wherein the bracket 2 is installed in the trough body 1, the cleaning basket 3 is placed in the trough body 1, the guide assembly and the driving assembly are both installed on the bracket 2, the cleaning agent inside the trough body 1 is driven to flow up and down by the guide assembly, and the guide assembly is driven to operate by the driving assembly.

[0025] The guide assembly includes a guide trough body 4 and an impeller 5. The guide trough body 4 is fixedly mounted on the bracket 2. A liquid inlet 6 is provided on the lower surface of the guide trough body 4. The impeller 5 is rotatably mounted in the guide trough body 4 and is located above the liquid inlet 6. A plurality of liquid outlets 7 are provided on the upper surface of the guide trough body 4. The cleaning basket 3 is placed on the guide trough body 4 and is located above the liquid outlets 7. In this way, it is only necessary to place the silicon wafer to be cleaned in the cleaning basket 3, and then place the cleaning basket 3 as a whole into the trough body 1 so that it is located on the liquid outlet 7 of the guide trough body 4. Then, the impeller 5 is driven to rotate by the driving assembly, and the impeller 5 will suck the cleaning agent from the liquid inlet 6 and push it to the liquid outlet 7 so that it flows out from the liquid outlet 7. In this way, a cleaning agent flowing up and down will be formed in the trough body 1, thereby continuously flushing and cleaning the surface of the silicon wafer.

[0026] There are gaps between the lower surface of the guide trough body 4 and the bottom of the trough body 1, and between the side surfaces of the guide trough body 4 and the side surfaces of the trough body 1, so that the cleaning agent in the upper and lower parts of the trough body 1 can flow easily.

[0027] A guide plate 8 is fixedly installed inside the guide trough body 4. The guide plate 8 gradually spreads from the impeller 5 to the direction away from the impeller 5, and the liquid outlet 7 is connected to the space separated by the guide plate 8. The impeller 5 is in the space separated by the guide plate 8. In this way, the rapid flow generated by the impeller 5 can be effectively slowed down, and the radiation range of the rapid flow generated by the impeller 5 can also be increased.

[0028] An installation opening 9 is opened on the upper surface of the guide trough body 4, and the impeller 5 can enter the guide trough body 4 through the installation opening 9. The installation opening 9 is equipped with a sealing cover 10, and the sealing cover 10 is sleeved on the rotating shaft of the impeller 5. In this way, it is convenient to disassemble the impeller 5 to clean the inside of the guide trough body 4.

[0029] The driving assembly includes a motor 16, which is fixedly mounted on the bracket 2. The rotating shaft of the motor 16 extends into the tank body 1 and is coaxially connected to the rotating shaft of the impeller 5. In this way, the motor 16 only needs to be started, and the motor 16 will drive the impeller 5 to rotate.

[0030] The motor 16 is equipped with a protective cover 11 , which is fixedly mounted on the bracket 2 and covers the motor 16 , thereby protecting the motor 16 .

[0031] The bracket 2 includes a side frame 12 and an auxiliary frame 13. There are two side frames 12, which are respectively installed on both sides of the guide trough body 4. The auxiliary frame 13 is fixedly installed on the surface of the guide trough body 4, and the end of the auxiliary frame 13 away from the guide trough body 4 is fixed to the side frame 12, so that it can be easily disassembled and assembled.

[0032] A drain pipe 14 is installed at the bottom of the tank body 1, and an electric control valve is installed in the middle of the drain pipe 14. An equipment base 15 is installed at the bottom of the tank body 1. The equipment base 15 has an electric heater and an ultrasonic vibrator built in.

[0033] Therefore, the complete usage process is to first place the silicon wafer to be cleaned in the cleaning basket 3. The cleaning basket 3 is a conventional cleaning basket. You only need to place the silicon wafer neatly in the limiting groove of the cleaning basket 3, and then place the cleaning basket 3 as a whole into the tank body 1 so that it is on the liquid outlet 7 of the guide tank body 4, and then start the motor 16. The motor 16 will drive the impeller 5 to rotate, and the impeller 5 will suck the cleaning agent from the liquid inlet 6 and push it to the liquid outlet 7 so that it flows out from the liquid outlet 7. In this way, a cleaning agent that flows up and down will be formed in the tank body 1, thereby continuously flushing and cleaning the surface of the silicon wafer. In this process, the electric heater and ultrasonic vibrator in the equipment seat 15 can also be started to enhance the cleaning effect of the cleaning agent in the tank body 1.

[0034] In summary, during the entire use process, the cleaning agent inside the tank body 1 flows up and down through the guide component to drive the dirt on the surface of the silicon wafer. Under this structure, the dirt between adjacent silicon wafers can be effectively washed away, thereby effectively improving the cleaning efficiency and cleaning effect.

[0035] At the same time, during use, since the cleaning inside the trough body 1 continuously flows through the liquid outlet 7 on the guide trough body 4, the dirt contained in the cleaning agent will also be retained by the liquid outlet 7, thereby preventing the dirt from returning to the surface of the silicon wafer and effectively ensuring the cleaning effect.

[0036] Finally, it should be noted that: the drawings of the embodiments disclosed in the present utility model only involve structures related to the embodiments disclosed in the present utility model, and other structures can refer to the general design. In the absence of conflict, the same embodiment and different embodiments of the present utility model can be combined with each other;

[0037] The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the present invention should be included in the protection scope of the present invention.

Claims

1. A guide trough for online cleaning of silicon carbide wafers, characterized in that: include: A tank body (1), a bracket (2), a cleaning basket (3), a flow guide assembly and a driving assembly, wherein the bracket (2) is mounted in the tank body (1), the cleaning basket (3) is placed in the tank body (1), the flow guide assembly and the driving assembly are both mounted on the bracket (2), the flow guide assembly drives the cleaning agent in the tank body (1) to flow up and down, and the driving assembly drives the flow guide assembly to operate, the flow guide assembly comprises a flow guide tank body (4) and an impeller (5), the flow guide tank body (4) is fixedly mounted on the bracket (2), and the lower surface of the flow guide tank body (4) is provided with a The invention discloses a liquid inlet (6), an impeller (5) rotatably mounted in a guide trough body (4) and located above the liquid inlet (6), a plurality of liquid outlet holes (7) are opened on the upper surface of the guide trough body (4), a cleaning basket (3) is placed on the guide trough body (4) and located above the liquid outlet holes (7), a liquid discharge pipe (14) is installed at the bottom of the trough body (1), and an electric control valve is installed in the middle of the liquid discharge pipe (14), and an equipment base (15) is installed at the bottom of the trough body (1), and the equipment base (15) has a built-in electric heater and an ultrasonic vibrator.

2. The guide trough for online cleaning of silicon carbide wafers according to claim 1, characterized in that: Gaps are left between the lower surface of the guide trough body (4) and the bottom of the trough body (1), and between the side surfaces of the guide trough body (4) and the side surfaces of the trough body (1).

3. The guide trough for online cleaning of silicon carbide wafers according to claim 2, characterized in that: A guide plate (8) is fixedly installed inside the guide trough body (4), the guide plate (8) gradually spreads from the impeller (5) in a direction away from the impeller (5), and the liquid outlet hole (7) is connected to the space separated by the guide plate (8), and the impeller (5) is located in the space separated by the guide plate (8).

4. The guide trough for online cleaning of silicon carbide wafers according to claim 3, characterized in that: The upper surface of the guide trough body (4) is provided with a mounting opening (9), and the impeller (5) can pass through the mounting opening (9) to enter the guide trough body (4). The mounting opening (9) is provided with a sealing cover (10), and the sealing cover (10) is sleeved on the rotating shaft of the impeller (5).

5. The silicon carbide wafer online cleaning guide trough according to any one of claims 2 to 4, characterized in that: The driving assembly comprises a motor (16), which is fixedly mounted on the bracket (2), and the rotating shaft of the motor (16) extends into the tank body (1) and is coaxially connected to the rotating shaft of the impeller (5).

6. The guide trough for online cleaning of silicon carbide wafers according to claim 5, characterized in that: The motor (16) is provided with a protective cover (11), which is fixedly mounted on the bracket (2) and covers the motor (16).

7. The guide trough for online cleaning of silicon carbide wafers according to claim 6, characterized in that: The bracket (2) comprises a side frame (12) and an auxiliary frame (13); there are two side frames (12) respectively mounted on two sides of the guide channel body (4); the auxiliary frame (13) is fixedly mounted on the surface of the guide channel body (4); and the end of the auxiliary frame (13) away from the guide channel body (4) is fixed to the side frame (12).

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