Material surface treatment device

By designing a material surface treatment device with circulating flow and guide roller set in aluminum foil material processing, the problem of unstable nanocoat quality caused by the difference in reaction liquid concentration is solved, and a more stable surface treatment effect is achieved.

CN222313313UActive Publication Date: 2025-01-07SHENZHEN ANBORUI NEW MATERIAL TECH CO LTD
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Patent Information

Application Number
CN202421054771.4
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-05-13
Publication Date
2025-01-07
Estimated Expiration
2034-05-13

AI Technical Summary

Technical Problem

During the production and processing of aluminum foil materials, the concentration difference in the reaction liquid tank leads to unstable nanocoating quality.

Method used

A material surface treatment device is designed, including a plurality of buffer liquid pools and reservoirs that are connected in sequence and are sequentially reduced in height. The circulating circulation of the reaction liquid is realized through the circulation pipeline, reducing concentration differences, and equipped with a guide roller group and Blow the assembly to speed up the reaction and drain process.

Benefits of technology

Through the coordination of circulating flow and guide roller set, the stability of the material surface treatment is significantly improved and the quality consistency of the nanocoat is ensured.

✦ Generated by Eureka AI based on patent content.

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Abstract

The utility model belongs to the field of material surface treatment, and particularly relates to a material surface treatment device, which is characterized by comprising a buffer solution pool group, the buffer solution pool group comprises a plurality of buffer solution pools for containing reaction solution, the plurality of buffer solution pools are sequentially communicated, and the buffer solution pools are communicated with the reaction solution. The heights of the plurality of buffer solution pools are sequentially reduced to form a step shape; the liquid storage tank is positioned below the buffer solution tank group; two ends of the first circulating pipeline are respectively communicated with the buffer solution pool with the lowest height on one side of the solution storage pool and one side of the buffer solution pool group; the two ends of the second circulating pipeline are communicated with the buffer solution pool with the highest height on the other side of the solution storage pool and the other side of the buffer solution pool group respectively, and a pump is arranged at the second circulating pipeline. According to the utility model, the concentration difference of the reaction liquid contained in the plurality of buffer liquid pools is small, so that the surface treatment of the material is more stable.
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Description

Technical Field

[0001] The utility model belongs to the field of material surface treatment, and particularly relates to a material surface treatment device. Background Art

[0002] In the existing production and processing technology of aluminum foil materials, there is a process of generating a nano coating on the surface of the aluminum foil material. Specifically, the aluminum foil material reacts repeatedly with the reaction liquid in the reaction liquid pool to finally form multiple layers of nano coatings to eliminate pinholes on the aluminum foil and form a high-strength aluminum foil material. However, in this process, since the reaction liquid pool has to meet the needs of multiple reactions, its length is relatively long. During processing, it is easy to have a large difference in the concentration of the reaction liquid at different positions in the reaction liquid pool, resulting in unstable quality of the multiple layers of nano coatings formed on the aluminum foil material. Utility Model Content

[0003] In order to solve the above problems, the purpose of the utility model is to provide a material surface treatment device, which can avoid large differences in buffer concentration in the buffer pool, thereby making the surface treatment of the material more stable.

[0004] In order to achieve the above-mentioned purpose, the technical solution of the utility model is as follows.

[0005] A material surface treatment device, characterized in that the device comprises:

[0006] A buffer pool group for reacting with the material, the buffer pool group comprising a plurality of buffer pools for containing reaction liquids, the plurality of buffer pools are connected in sequence, and the heights of the plurality of buffer pools decrease in sequence to form a step shape;

[0007] A liquid reservoir for containing a reaction solution, wherein the liquid reservoir is located below the buffer pool group;

[0008] A first circulation pipeline, wherein both ends of the first circulation pipeline are respectively connected to a buffer tank with the lowest height on one side of the liquid storage tank and one side of the buffer tank group;

[0009] The second circulation pipeline has two ends respectively connected to the other side of the liquid storage tank and the buffer tank with the highest height on the other side of the buffer tank group, and a pump is arranged at the second circulation pipeline.

[0010] In the device, under the action of gravity, the buffer solution pool with the lowest height on one side of the buffer solution pool group discharges the reaction liquid in the buffer solution pool group to the liquid storage pool through the first circulation pipeline; and the liquid storage pool, under the action of the pump, discharges its reaction liquid into the buffer solution pool with the highest height on the other side of the buffer solution pool group through the second circulation pipeline; and based on the fact that the heights of a plurality of buffer solution pools connected in sequence decrease in sequence to form a step-like shape, the reaction liquid in the buffer solution pool group itself is also under the influence of gravity, and flows in sequence from the buffer solution pool on the other side of the buffer solution pool group with the highest height to the buffer solution pool on the side of the buffer solution pool group with the lowest height, so that the reaction liquid in the plurality of buffer solution pools in the buffer solution pool group and the reaction liquid in the liquid storage pool can be circulated; the concentration difference of the reaction liquid contained in the plurality of buffer solution pools is small, so that the surface treatment of the material is more stable.

[0011] Furthermore, a liquid adding port for adding reaction liquid is provided above the liquid storage tank. The liquid adding port can be used to supplement the reaction liquid in the liquid storage tank.

[0012] Furthermore, the buffer pool group includes twenty buffer pools.

[0013] Furthermore, the device also includes a guide roller group for guiding the material to pass through a plurality of buffer tanks in sequence.

[0014] Furthermore, the guide roller group includes a plurality of reaction rollers and a plurality of drain rollers, the plurality of reaction rollers are respectively arranged in a plurality of buffer pools; the drain roller is arranged above the buffer pool, and the drain roller is located between two adjacent groups of reaction rollers. The reaction roller drives the material into the buffer pool to contact the reaction liquid for reaction; the drain roller drives the material out of the buffer pool to drain and form a layer of nano coating; the plurality of reaction rollers and the plurality of drain rollers cooperate to make the material react and drain repeatedly to form a plurality of layers of nano coating.

[0015] Furthermore, the device also includes a plurality of blowing components, and the plurality of blowing components correspond to the plurality of draining rollers respectively. The blowing components are used to accelerate the draining of the material on the draining rollers.

[0016] The beneficial effect of the utility model lies in that, in the device, under the action of gravity, the buffer solution pool with the lowest height on one side of the buffer solution pool group discharges the reaction liquid in the buffer solution pool group to the liquid storage pool through the first circulation pipeline; and the liquid storage pool, under the action of the pump, discharges its reaction liquid into the buffer solution pool with the highest height on the other side of the buffer solution pool group through the second circulation pipeline; and based on the fact that the heights of a plurality of buffer solution pools connected in sequence decrease in a stepped shape, the reaction liquid in the buffer solution pool group itself is also under the influence of gravity, and flows in sequence from the buffer solution pool on the other side of the buffer solution pool group with the highest height to the buffer solution pool on the side of the buffer solution pool group with the lowest height, so that the reaction liquid in the plurality of buffer solution pools in the buffer solution pool group and the reaction liquid in the liquid storage pool can be circulated; the concentration difference of the reaction liquid contained in the plurality of buffer solution pools is small, so that the surface treatment of the material is more stable. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] Figure 1 It is a structural schematic diagram of the utility model. DETAILED DESCRIPTION

[0018] In order to make the purpose, technical solution and advantages of the utility model more clear, the utility model is further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the utility model and are not used to limit the utility model.

[0019] See also Figure 1 This embodiment provides a material surface treatment device, characterized in that the device includes:

[0020] A buffer pool group 1 for reacting with the material, the buffer pool group 1 comprises a plurality of buffer pools 11 for containing reaction liquids, the plurality of buffer pools 11 are connected in sequence, and the heights of the plurality of buffer pools 11 are successively decreased to form a step shape;

[0021] A liquid storage tank 2 for containing a reaction solution, the liquid storage tank 2 is located below the buffer tank group 1;

[0022] A first circulation pipeline 3, both ends of which are connected to the buffer tank 11 with the lowest height on one side of the liquid storage tank 2 and one side of the buffer tank group 1;

[0023] The second circulation pipeline 4 has two ends respectively connected to the highest buffer tank 11 on the other side of the liquid storage tank 2 and the other side of the buffer tank group 1 , and a pump 5 is provided at the second circulation pipeline 4 .

[0024] In this embodiment, a liquid adding port 21 for adding reaction liquid is arranged above the liquid storage tank 2 .

[0025] In this embodiment, the buffer pool group 1 includes twenty buffer pools 11 .

[0026] In this embodiment, the device further comprises a guide roller set for guiding the material to pass through a plurality of buffer tanks 11 in sequence.

[0027] In this embodiment, the guide roller group includes a plurality of reaction rollers 6 and a plurality of draining rollers 7. The plurality of reaction rollers 6 are respectively arranged in a plurality of buffer pools 11; the draining roller 7 is arranged above the buffer pool 11, and the draining roller 7 is located between two adjacent groups of reaction rollers 6.

[0028] In this embodiment, the device further comprises a plurality of blowing components 8, and the plurality of blowing components 8 respectively correspond to the plurality of draining rollers 7. The blowing component 8 may be a fan structure, or other blowing structures.

[0029] The above are only preferred embodiments of the present invention and are not intended to limit the present invention. Any modifications, equivalent substitutions and improvements made within the spirit and principles of the present invention should be included in the protection scope of the present invention.

Claims

1. A material surface treatment device, characterized in that: The device includes: A buffer pool group for reacting with the material, the buffer pool group comprising a plurality of buffer pools for containing reaction liquids, the plurality of buffer pools are connected in sequence, and the heights of the plurality of buffer pools decrease in sequence to form a step shape; A liquid reservoir for containing a reaction solution, wherein the liquid reservoir is located below the buffer pool group; A first circulation pipeline, wherein both ends of the first circulation pipeline are respectively connected to a buffer tank with the lowest height on one side of the liquid storage tank and one side of the buffer tank group; The second circulation pipeline has two ends respectively connected to the other side of the liquid storage tank and the buffer tank with the highest height on the other side of the buffer tank group, and a pump is arranged at the second circulation pipeline.

2. A material surface treatment device according to claim 1, characterized in that: A liquid adding port for adding reaction liquid is arranged above the liquid storage tank.

3. A material surface treatment device according to claim 1, characterized in that: The buffer pool group includes twenty buffer pools.

4. A material surface treatment device according to any one of claims 1 to 3, characterized in that: The device also includes a guide roller group for guiding the material to pass through a plurality of buffer tanks in sequence.

5. A material surface treatment device according to claim 4, characterized in that: The guide roller group includes a plurality of reaction rollers and a plurality of drain rollers. The plurality of reaction rollers are respectively arranged in a plurality of buffer pools; the drain roller is arranged above the buffer pool, and the drain roller is located between two adjacent groups of reaction rollers.

6. A material surface treatment device according to claim 5, characterized in that: The device also includes a plurality of blowing components, and the plurality of blowing components correspond to the plurality of draining rollers respectively.