LDI exposure equipment
By adopting a split-designed telescopic connection sleeve and position sensor in the LDI exposure device, the height of the optical lens assembly is independently adjusted, the equipment defocusing problem is solved, the accuracy and exposure graphics quality of the DMD lighting assembly are ensured, and dust and light sources are avoided Influence.
Patent Information
- Application Number
- CN202421045362.8
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-05-14
- Publication Date
- 2025-01-14
- Estimated Expiration
- 2034-05-14
AI Technical Summary
High-precision LDI exposure devices are prone to defocusing when exposing uneven substrate surfaces, resulting in a decrease in the quality of exposure patterns. In the prior art, the overall settings of DMD lighting components and optical lenses affect the position accuracy.
The LDI exposure device adopts a separate design. By setting a retractable connection sleeve between the optical lens assembly and the DMD lighting assembly, the height of the optical lens assembly can be independently adjusted, and the position sensor is used to automatically adjust the lens height to ensure the position of the DMD lighting assembly. Accuracy and focus of optical lens.
It solves the defocusing problem of LDI exposure equipment, ensures the position accuracy of the DMD lighting components, avoids the entry of dust and light sources, and improves the quality and accuracy of the exposure graphics.
Smart Images
Figure CN222354271U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to the field of photolithography equipment, in particular to an LDI exposure equipment. Background Art
[0002] Laser Direct Imaging, abbreviated as LDI, is a type of direct imaging. LDI exposure equipment uses DMD lighting components to replace the mask of mask exposure equipment, so the efficiency is significantly improved, the adaptability is stronger, and the cost advantage is obvious. It can meet the processing needs of various products such as integrated circuits, semiconductor devices and printed circuit boards.
[0003] With the improvement of the requirements for the exposure pattern process, in order to process more precise patterns and finer lines, the accuracy requirements of LDI exposure equipment are also getting higher and higher. However, the high-precision LDI exposure equipment has a short focal depth, and it is easy to defocus when exposing uneven substrate surfaces, resulting in the inability to expose patterns on the substrate surface. In order to solve the above problem, it is necessary to adjust the position of the optical lens to refocus the LDI exposure equipment. In the prior art, the DMD lighting assembly and the optical lens are often set as an integral whole. When the optical lens is adjusted, the DMD lighting assembly also moves, resulting in the position accuracy of the DMD lighting assembly being affected, thereby affecting the quality of the exposed pattern on the substrate surface. Utility Model Content
[0004] In order to solve the above problems, the utility model provides an LDI exposure device to achieve independent adjustment of the height of the optical lens assembly.
[0005] The utility model provides an LDI exposure device, comprising an exposure platform for carrying a substrate, a driving mechanism for driving the exposure platform to perform multi-axis motion, the LDI exposure device also comprising an exposure lens device arranged on the upper side of the exposure platform, the exposure lens device comprising an optical lens assembly, a DMD lighting assembly located on the upper side of the optical lens assembly, a retractable connecting sleeve arranged between the optical lens assembly and the DMD lighting assembly, and an adjusting mechanism for adjusting the height of the optical lens assembly, one end of the connecting sleeve is connected to the DMD lighting assembly, and the other end is connected to the optical lens assembly, and the telescopic amount of the connecting sleeve can be automatically adjusted according to the height of the optical lens assembly.
[0006] As a further improvement of the present invention, the exposure lens device includes a position sensor for measuring the height of the substrate surface, and the adjustment mechanism is configured to adjust the height of the optical lens assembly according to the measurement result of the position sensor.
[0007] As a further improvement of the present invention, the position sensor is coaxially arranged with the optical lens assembly and is located on one side of the optical lens assembly along a stepping direction perpendicular to the exposure direction.
[0008] As a further improvement of the present invention, the LDI exposure equipment includes a base, the exposure platform and the driving mechanism are installed on the base, the LDI exposure equipment also includes a gantry connected to the base, and the DMD lighting assembly and the adjustment mechanism are respectively fixedly connected to the gantry.
[0009] As a further improvement of the present invention, the stepping direction is the left-right direction of the LDI exposure device, and the position sensor is located on the left or right side of the corresponding optical lens assembly.
[0010] As a further improvement of the present invention, multiple groups of exposure lens devices are arranged at positions corresponding to the gantry and the exposure platform along a stepping direction perpendicular to the exposure direction, and each group of exposure lens devices includes the optical lens assembly, the DMD lighting assembly, the connecting sleeve, a position sensor arranged on one side of the corresponding optical lens assembly along the stepping direction, and an adjustment mechanism arranged on one side of the corresponding optical lens assembly along the exposure direction.
[0011] As a further improvement of the utility model, the gantry includes two columns arranged opposite to each other along the stepping direction and a crossbeam arranged between the two columns, the two columns are fixedly connected to the base, the crossbeam is located on the upper side of the exposure platform, and multiple groups of exposure lens devices are installed on the crossbeam at equal distances along the stepping direction.
[0012] As a further improvement of the present invention, the adjustment mechanism includes a linear motor arranged on one side of the optical lens assembly along the exposure direction.
[0013] As a further improvement of the present invention, as a further improvement of the present invention, the optical lens assembly includes multiple groups of optical lenses, and the optical axes of the multiple groups of optical lenses overlap with each other.
[0014] As a further improvement of the present invention, the connecting sleeve is an accordion rubber sleeve.
[0015] The utility model provides an LDI exposure device, the LDI exposure device includes an exposure lens device arranged on the upper side of an exposure platform, a DMD lighting assembly in the exposure lens device is located on the upper side of the optical lens assembly, a retractable connection sleeve is arranged between the optical lens assembly and the DMD lighting assembly, the DMD lighting assembly and the optical lens assembly in the utility model adopt a separate design, which can realize the relative movement of the DMD lighting assembly and the optical lens assembly, and the DMD lighting assembly remains stationary when the adjustment mechanism adjusts the height of the optical lens assembly, which not only solves the problem of defocusing of the LDI exposure device, but also ensures the position accuracy of the DMD lighting assembly. In addition, the retractable connection sleeve arranged in the utility model can realize the free adjustment of the height of the optical lens assembly by changing its own telescopic amount and moving synchronously with the optical lens assembly, thereby solving the problem of defocusing of the LDI exposure device, and can also prevent dust and light sources in the environment from entering the exposure lens device, thereby further ensuring the accuracy of the exposure lens device. BRIEF DESCRIPTION OF THE DRAWINGS
[0016] Figure 1 It is a schematic diagram of the principle of defocusing;
[0017] Figure 2 This is a schematic diagram of the focusing principle;
[0018] Figure 3 It is a structural schematic diagram of the LDI exposure device of the utility model;
[0019] Figure 4 yes Figure 3 Front view of the LDI exposure equipment;
[0020] Figure 5 yes Figure 4 Schematic diagram of the cross section at AA;
[0021] Figure 6 yes Figure 5 Schematic diagram of the structure of the optical lens assembly, DMD lighting assembly and connecting sleeve. DETAILED DESCRIPTION
[0022] In order to make the purpose, technical solution and advantages of the present invention more clear, the present invention is described below by means of specific embodiments shown in the accompanying drawings.
[0023] First pass Figure 1 and Figure 2 Introduce the principle of automatic focusing. Figure 1 This is a schematic diagram of the defocus principle. Figure 2 This is a schematic diagram of the focusing principle. Figure 1 and Figure 2In the figure, the illumination component 10 projects a modulated pattern 20, and the modulated pattern 20 passes through the optical lens component 30 to finally generate an image 50. The image 50 will have a clear pattern within the focal depth of the optical lens component 30, and the pattern quality is highest at the optimal focal plane position. Since the surface of the substrate 40 is uneven, during the exposure process, if the surface of the substrate 40 is outside the focal depth of the optical lens component 30, the modulated pattern 20 cannot form a clear image 50 on the surface of the substrate 40, which is called defocusing. If the surface of the substrate 40 is within the focal depth of the optical lens component 30, the modulated pattern 20 projected by the illumination component 10 forms a clear image 50 on the surface of the substrate 40, which is called focusing. The process of adjusting the lens component 30 from defocusing to focusing is called focusing.
[0024] See also Figures 3 to 6 As shown, the utility model provides an LDI exposure device, the exposure device is used to expose a substrate 1, the substrate 1 can be a silicon wafer, a PCB plate, a ceramic plate, etc. Specifically, the exposure device includes an exposure platform 2 for carrying the substrate 1, a driving mechanism 3 for driving the exposure platform 2 to move, and the exposure platform 2 is driven by the driving mechanism 3 to achieve multi-axis movement such as X-axis, Y-axis and Z-axis. Further, the LDI exposure device also includes an exposure lens device 4 for exposing the substrate 1, the exposure lens device 4 is arranged on the upper side of the exposure platform 2, and the movement of the exposure platform 2 can cooperate with the modulation pattern generated by the exposure lens device 4 to form a complete exposure pattern.
[0025] The exposure lens device 4 also includes an optical lens assembly 41, and a DMD lighting assembly 44 located on the upper side of the optical lens assembly 41. The DMD lighting assembly generates a controllable modulation pattern, and the modulated pattern light is projected onto the surface of the substrate through the optical lens assembly 41. In the present utility model, the exposure lens device 4 also includes a retractable connecting sleeve 45 disposed between the optical lens assembly 41 and the DMD lighting assembly 44, and an adjusting mechanism 43 for adjusting the height of the optical lens assembly 41. Specifically, one end of the connecting sleeve 45 is connected to the DMD lighting assembly 44, and the other end is connected to the optical lens assembly 41. The retractable amount of the connecting sleeve 45 can be adjusted automatically according to the height of the optical lens assembly 41. Compared with the prior art, the DMD lighting assembly 44 and the optical lens assembly 41 in the present utility model adopt a separate design, which can realize the relative movement of the DMD lighting assembly 44 and the optical lens assembly 41. When the adjusting mechanism 43 adjusts the height of the optical lens assembly 41, the DMD lighting assembly 44 remains stationary, which not only solves the problem of defocusing of the LDI exposure equipment, but also ensures the position accuracy of the DMD lighting assembly 44. In addition, the retractable connecting sleeve 45 provided in the present invention can move synchronously with the optical lens assembly 41 by changing its own retractable amount, thereby realizing free adjustment of the height of the optical lens assembly 41 and solving the problem of defocusing of the LDI exposure device. Furthermore, compared with the solution in which the DMD lighting assembly 44 and the optical lens assembly 41 are designed to be separated without a connecting sleeve, the retractable connecting sleeve 45 provided in the present invention can prevent dust and light sources in the environment from entering the exposure lens device 4.
[0026] The movement process of the connecting sleeve 45 when the adjusting mechanism 43 adjusts the height of the optical lens assembly 41 is as follows: when the adjusting mechanism 43 drives the optical lens assembly 41 to move upward, the connecting sleeve 45 is folded under the thrust of the optical lens assembly 41 to reduce its own volume. When the adjusting mechanism 43 drives the optical lens assembly 41 to move downward, the connecting sleeve 45 is unfolded under the pulling force of the optical lens assembly 41 to increase its own volume, thereby achieving the synchronous movement of the connecting sleeve 45 with the optical lens assembly 41 while the DMD lighting assembly 44 remains stationary.
[0027] In a specific embodiment of the present invention, the optical lens assembly 41 includes multiple groups of optical lenses, and the optical axes of the multiple groups of optical lenses overlap with each other, thereby ensuring the quality of the exposure pattern on the substrate 1.
[0028] Furthermore, the connecting sleeve 45 may be a accordion rubber sleeve, see Figure 6 Of course, it is understandable that any elastic sleeve that can adjust its own expansion and contraction amount according to the height of the optical lens assembly 41 can be used as the connecting sleeve 45.
[0029] Furthermore, the adjustment mechanism 43 includes a linear motor arranged on one side of the optical lens assembly 41 along the exposure direction. The linear motor can accurately control the height of the optical lens assembly 41 to ensure that the imaging of the optical lens assembly 41 is focused on the surface of the substrate 1 in real time, thereby ensuring the quality of the exposure pattern.
[0030] Furthermore, the exposure lens device 4 includes a position sensor 42, which is used to measure the height of the surface of the substrate 1. The adjustment mechanism 43 is configured to adjust the height of the optical lens assembly 41 according to the measurement result of the position sensor 42. During the exposure process, the height of the position sensor 42 remains unchanged. The adjustment mechanism 43 can automatically adjust the height of the optical lens assembly 41 according to the height result of the surface of the substrate 1 measured by the position sensor 42. Without affecting the position accuracy of the DMD, the exposure pattern of the LDI exposure equipment can be focused on the surface of the substrate 1 in real time, thereby solving the problem of defocusing of the optical lens assembly 41 during the exposure process caused by the uneven surface of the substrate 1, thereby effectively ensuring the quality of the exposure pattern.
[0031] In a preferred embodiment of the present invention, the position sensor 42 is coaxially arranged with the optical lens assembly 41, and the position sensor 42 is arranged on one side of the optical lens assembly 41 along the stepping direction, and the stepping direction is a direction perpendicular to the exposure direction. The position sensor 42 is arranged as close as possible to the position of the optical lens assembly 41, and the position sensor 42 is coaxially arranged with the optical lens assembly 41 and is arranged on one side of the optical lens assembly 41 along the stepping direction so that the position measured by the position sensor 42 is close to the exposure position, thereby improving the measurement accuracy of the position sensor.
[0032] In a specific embodiment of the present invention, refer to Figure 6 As shown, the LDI exposure device includes a base 5, the exposure platform 2 and the driving mechanism 3 are installed on the base 5, the LDI exposure device also includes a gantry 6 connected to the base 5, and the DMD lighting component 44 and the adjustment mechanism 43 are fixedly connected to the gantry 6 respectively.
[0033] Further, a plurality of exposure lens devices 4 are arranged on the gantry 6, and the plurality of exposure lens devices 4 are arranged at positions corresponding to the gantry 6 and the exposure platform 2 along the stepping direction. Specifically, the gantry 6 includes two columns 61 arranged opposite to each other along the stepping direction, and a crossbeam 62 arranged between the two columns 61. The two columns 61 are fixedly connected to the base 5. The crossbeam 62 is located on the upper side of the exposure platform 2. Both sides of the crossbeam 62 are connected to the corresponding columns 61 respectively. The plurality of exposure lens devices 4 are equidistantly installed on the crossbeam 62 along the stepping direction. Each exposure lens device 4 includes an optical The lens assembly 41, the DMD lighting assembly 44, the connecting sleeve 43, a position sensor 42 arranged on the corresponding side of the optical lens assembly 41 along the stepping direction, and an adjustment mechanism 43 arranged on the corresponding side of the optical lens assembly 41 along the exposure direction. In the LDI exposure equipment of the utility model, multiple groups of exposure lens devices 4 are arranged, which can effectively improve the exposure efficiency. At the same time, each group of exposure lens devices 4 is provided with a position sensor 42 and an adjustment mechanism 43, so as to realize independent adjustment of the optical lens assembly 41 in each group of exposure lens devices 4, thereby improving the exposure efficiency and ensuring the quality of the exposure pattern.
[0034] The exposure direction is defined as the front-to-back direction of the LDI exposure device, that is, the Y-axis direction of the exposure platform is the front-to-back direction of the exposure device, and the stepping direction is the left-to-right direction of the LDI exposure device, that is, the X-axis direction of the exposure platform is the left-to-right direction of the exposure device. The position sensor 42 is located on the left or right side of the corresponding optical lens assembly 41. In a specific embodiment of the present utility model, Figure 3 In the direction shown, each position sensor 42 is located on the left side of the corresponding optical lens assembly 41, and the position sensor 42 is coaxially arranged with the optical lens assembly 41. The multiple exposure lens groups are arranged at equal intervals in the X-axis direction, and their projections in the Y-axis direction overlap.
[0035] Furthermore, the exposure lens device 4 also includes a laser that provides a light source for the DMD lighting component 44. The laser can provide a stable light source for the DMD lighting component, and the laser and the DMD lighting component can be connected via an optical fiber.
[0036] Compared with the prior art, the DMD lighting assembly 44 and the optical lens assembly 41 in the utility model adopt a separate design, which can realize the relative movement of the DMD lighting assembly 44 and the optical lens assembly 41. When the adjustment mechanism 43 adjusts the height of the optical lens assembly 41, the DMD lighting assembly 44 remains stationary, which not only solves the problem of defocusing of the LDI exposure device, but also ensures the position accuracy of the DMD lighting assembly 44. In addition, the retractable connecting sleeve 45 provided in the utility model can move synchronously with the optical lens assembly 41 by changing its own telescopic amount, so as to realize free adjustment of the height of the optical lens assembly 41 and solve the problem of defocusing of the LDI exposure device. In addition, compared with the solution in which the DMD lighting assembly 44 and the optical lens assembly 41 adopt a separate design and no connecting sleeve is provided, the retractable connecting sleeve 45 provided in the utility model can prevent dust and light sources in the environment from entering and affecting the exposure lens device 4, and further ensure the accuracy of the exposure lens device 4.
[0037] It should be understood that although this specification is described according to implementation modes, not every implementation mode contains only one independent technical solution. This description of the specification is only for the sake of clarity. Those skilled in the art should regard the specification as a whole. The technical solutions in each implementation mode may also be appropriately combined to form other implementation modes that can be understood by those skilled in the art.
[0038] The series of detailed descriptions listed above are only specific descriptions of feasible implementation methods of the utility model. They are not intended to limit the protection scope of the utility model. Any equivalent implementation methods or changes that do not deviate from the technical spirit of the utility model should be included in the protection scope of the utility model.
Claims
1. An LDI exposure device, comprising an exposure platform for carrying a substrate and a driving mechanism for driving the exposure platform to perform multi-axis motion, characterized in that: The LDI exposure equipment also includes an exposure lens device arranged on the upper side of the exposure platform, the exposure lens device includes an optical lens assembly, a DMD lighting assembly located on the upper side of the optical lens assembly, a retractable connecting sleeve arranged between the optical lens assembly and the DMD lighting assembly, and an adjusting mechanism for adjusting the height of the optical lens assembly, one end of the connecting sleeve is connected to the DMD lighting assembly, and the other end is connected to the optical lens assembly, and the telescopic amount of the connecting sleeve can be adjusted automatically according to the height of the optical lens assembly.
2. The LDI exposure device according to claim 1, characterized in that: The exposure lens device includes a position sensor for measuring the height of the substrate surface, and the adjustment mechanism is configured to adjust the height of the optical lens assembly according to the measurement result of the position sensor.
3. The LDI exposure device according to claim 2, characterized in that: The position sensor is coaxially arranged with the optical lens assembly and is located at one side of the optical lens assembly along a stepping direction perpendicular to an exposure direction.
4. The LDI exposure device according to claim 2, characterized in that: The LDI exposure device includes a base, the exposure platform and the driving mechanism are installed on the base, the LDI exposure device also includes a gantry connected to the base, and the DMD lighting assembly and the adjustment mechanism are respectively fixedly connected to the gantry.
5. The LDI exposure device according to claim 3, characterized in that: The stepping direction is the left-right direction of the LDI exposure device, and the position sensor is located on the left or right side of the corresponding optical lens assembly.
6. The LDI exposure device according to claim 4, characterized in that: A plurality of groups of exposure lens devices are arranged at positions corresponding to the gantry and the exposure platform along a stepping direction perpendicular to the exposure direction, and each group of exposure lens devices includes the optical lens assembly, the DMD lighting assembly, the connecting sleeve, a position sensor arranged on one side of the corresponding optical lens assembly along the stepping direction, and an adjustment mechanism arranged on one side of the corresponding optical lens assembly along the exposure direction.
7. The LDI exposure device according to claim 6, characterized in that: The gantry includes two columns arranged opposite to each other along the stepping direction and a crossbeam arranged between the two columns. The two columns are fixedly connected to the base. The crossbeam is located on the upper side of the exposure platform. Multiple groups of exposure lens devices are installed on the crossbeam at equal distances along the stepping direction.
8. The LDI exposure device according to claim 1, characterized in that: The adjustment mechanism comprises a linear motor arranged on one side of the optical lens assembly along the exposure direction.
9. The LDI exposure device according to claim 1, characterized in that: The optical lens assembly includes multiple groups of optical lenses, and the optical axes of the multiple groups of optical lenses overlap with each other.
10. The LDI exposure device according to claim 1, characterized in that: The connecting sleeve is an organ rubber sleeve.