Photovoltaic silicon wafer wet process tank body air exhaust structure

Abstract

The utility model discloses a photovoltaic silicon wafer wet process tank body air exhaust structure, a tank body comprises a front side plate, a rear side plate and a cover plate, and the front side plate and the rear side plate are arranged in parallel; the air exhaust structure comprises an air inlet hole formed in the front side plate, an air outlet hole formed in the rear side plate and an air exhaust box which is installed on the outer side of the rear side plate and corresponds to the air outlet hole. According to the photovoltaic silicon wafer wet process tank body air exhaust structure provided by the utility model, the common air exhaust structure in the prior art is changed, the air inlet is changed from the cover plate to the front side plate of the tank body, and the air exhaust is changed from an air exhaust pipe to an air exhaust box, so that the problem of liquid accumulation of the air exhaust pipe is avoided, the daily maintenance operation is convenient, and the service life of the tank body is prolonged. And the acid gas can be quickly exhausted, so that the air exhausting effect is improved.

Description

Technical Field

[0001] The utility model relates to the technical field of photovoltaics, in particular to the technical field of photovoltaic cell production equipment, and in particular to a photovoltaic silicon slice wet process tank body exhaust structure. Background Art

[0002] Relying on the continuous reduction of production costs and the improvement of photoelectric conversion efficiency in recent years, photovoltaic power generation has become a technology that can replace fossil energy. In the production process of solar cells, the silicon wafers have been processed through multiple processes such as slicing, grinding, chamfering, and polishing. Various impurities have been adsorbed on the surface of the silicon wafers. Before diffusion, they need to be cleaned to eliminate various pollutants and make a velvet structure (velvet making) that can reduce the reflection of sunlight on the surface. The cleanliness of the cleaning directly affects the yield and reliability of the solar cell.

[0003] Currently, the commonly used silicon wafer cleaning and texturing equipment is wet chemical equipment, that is, a solution with a certain formula is added into a chemical tank, and then the silicon wafer is immersed in the solution in a basket or the silicon wafer is driven horizontally and continuously through the wet chemical tank by a chain transmission system, so that the solution acts chemically on the surface of the silicon wafer.

[0004] The tank exhaust structure of the wet chemical equipment currently used is as follows: holes are punched in the tank cover and air is introduced through the circular holes in the cover; an exhaust pipe is horizontally arranged in the tank and holes are punched in the axial bottom of the exhaust pipe, so that air is exhausted in the tank through the exhaust pipe to remove the acid gas generated during the product reaction.

[0005] The above-mentioned equipment tank exhaust form in the current industry is to take in air at the cover plate and exhaust air through the exhaust pipe. The acid gas cannot be quickly extracted and is easy to contaminate the product; and liquid is easy to accumulate and drip at the bottom of the exhaust pipe wall, causing product contamination; if it is a horizontal chain tank, the exhaust pipe must be removed first when disassembling and assembling the tank roller, which is inconvenient for daily maintenance. Utility Model Content

[0006] In order to solve the above-mentioned technical problems, the utility model provides an exhaust structure for a photovoltaic silicon wafer wet process trough body, wherein the trough body comprises a front side plate, a rear side plate and a cover plate, and the front side plate is arranged in parallel with the rear side plate; the exhaust structure comprises an air inlet hole opened on the front side plate, an air outlet hole opened on the rear side plate, and an exhaust box installed on the outside of the rear side plate and corresponding to the air outlet hole.

[0007] Among them, the exhaust box includes a box body installed on the outside of the rear side panel, a limiting slide rail symmetrically arranged on the outside of the rear side panel and located on the upper and lower sides of the air outlet, and a slide plate clamped in the limiting slide rail and sliding left and right for adjusting the opening size of the air outlet; an exhaust port for connecting an exhaust pipe is opened on the box body.

[0008] Among them, the exhaust box also includes a positioning pin, the rear side plate is provided with a positioning hole corresponding to the positioning pin, and the skateboard is provided with limiting holes in parallel on the left and right sides. The positioning pin clamped in the positioning hole cooperates with the limiting hole to realize the positioning and fixing of the skateboard at different positions.

[0009] Among them, the height of the rear side plate is greater than that of the front side plate, and the opening height of the air outlet is greater than the opening height of the air inlet. The two ends of the cover plate are respectively connected to the front side plate and the rear side plate and then tilted to form an angle α relative to the horizontal plane.

[0010] The inner opening height of the air inlet relative to the front side plate is higher than the outer opening height, thereby forming an oblique air intake from outside to inside to cooperate with the inclined cover plate to form an oblique rising airflow and exhaust through the air outlet.

[0011] Through the above technical scheme, the photovoltaic silicon wafer wet process tank exhaust structure provided by the utility model changes the exhaust structure commonly used in the prior art, changes the air inlet hole from the cover plate to the front side plate of the tank, and changes the exhaust from the exhaust pipe to the exhaust box. This structure not only avoids the problem of liquid accumulation in the exhaust pipe, facilitates daily maintenance operations, but also can quickly extract the acid gas, thereby improving the exhaust effect. BRIEF DESCRIPTION OF THE DRAWINGS

[0012] In order to more clearly illustrate the technical solutions in the embodiments of the present utility model, the following briefly introduces the drawings required for describing the embodiments.

[0013] Figure 1 A schematic diagram of the exhaust structure of the photovoltaic silicon wafer wet process tank disclosed in the embodiment of the utility model;

[0014] Figure 2 for Figure 1 Schematic diagram of the enlarged structure of part A in the middle.

[0015] In the figure: 10. front side panel; 11. air inlet; 20. rear side panel; 21. air outlet; 30. cover plate; 40. exhaust box; 41. box body; 411. exhaust port; 42. limit slide rail; 43. slide plate; 44. positioning pin. DETAILED DESCRIPTION

[0016] The technical solutions in the embodiments of the present invention will be described clearly and completely below in conjunction with the accompanying drawings in the embodiments of the present invention.

[0017] refer to Figure 1The embodiment of the utility model provides a photovoltaic silicon wafer wet process tank body exhaust structure, the tank body includes a front side plate 10, a rear side plate 20 and a cover plate 30, the front side plate 10 is arranged in parallel with the rear side plate 20; the exhaust structure includes an air inlet 11 opened on the front side plate 10, an air outlet 21 opened on the rear side plate 20, and an exhaust box 40 installed on the outside of the rear side plate 20 and corresponding to the air outlet 21.

[0018] Among them, the height of the rear side plate 20 is greater than the height of the front side plate 10, and the opening height of the air outlet 21 is greater than the opening height of the air inlet 11. The two ends of the cover plate 30 are respectively connected to the front side plate 10 and the rear side plate 20 and then tilted to form an angle α relative to the horizontal plane; the inner opening height of the air inlet 11 relative to the front side plate 10 is higher than the outer opening height, thereby forming an oblique air intake from the outside to the inside to cooperate with the inclined cover plate 30 to form an oblique rising airflow and exhaust through the air outlet 21.

[0019] Among them, reference Figure 2 The exhaust box 40 includes a box body 41 installed on the outside of the rear side plate 20, a limiting slide rail 42 symmetrically arranged on the outside of the rear side plate 20 and located on the upper and lower sides of the air outlet 21, and a slide plate 43 clamped in the limiting slide rail 42 and sliding left and right for adjusting the opening size of the air outlet 21; an exhaust port 411 for connecting the exhaust pipe is provided on the box body 41; the exhaust box 40 also includes a positioning pin 44, a positioning hole corresponding to the positioning pin 44 is provided on the rear side plate 20, and limiting holes are arranged in parallel on the left and right on the slide plate 43, and the positioning pin 44 clamped in the positioning hole cooperates with the limiting hole to realize the positioning and fixing of the slide plate 43 at different positions.

[0020] The working principle of this embodiment:

[0021] The product generates acid gas during the reaction with the medicine in the tank body. The exhaust box 40 is fixed on the rear side plate 20 of the tank body. The rear side plate 20 is provided with an air outlet 21 and air is exhausted through the exhaust box 40. The slide plate 43 in the exhaust box 40 is fixed with an L-shaped limit slide rail 42, and the opening size of the air outlet 21 can be adjusted by horizontal movement to adjust the air volume of the exhaust, which is convenient for maintenance and operation; the air inlet 11 is provided on the front side plate 10 and the air inlet 11 is tilted and arranged with the inner side higher and the outer side lower, and air is evenly inletted; the overall tank body structure and the cover plate 30 are tilted, and a height difference is formed between the exhaust and the air intake. The overall structure and the air flow direction of the tank body are simulated, and the acid gas can be quickly and evenly extracted;

[0022] In addition, in the exhaust structure of the prior art, the exhaust ducts are relatively densely packed in the tank, making it inconvenient for operators to observe the reaction of the products in the tank, and maintenance in the tank must be carried out after the exhaust ducts are removed because the components in the tank are removed and the disassembly and assembly process is likely to interfere with the exhaust ducts, increasing the difficulty of maintenance, and liquid is likely to accumulate at the bottom of the duct wall, contaminating the silicon wafer and affecting the yield. The structure of the utility model solves the problem of liquid accumulation during exhaust, makes it convenient to observe the reaction and transmission status of the products in the tank, and facilitates the cleaning and maintenance of daily equipment. It can quickly and effectively extract the acid gas, avoid acid gas contamination of the product, and improve the product qualification rate.

[0023] The above description of the disclosed embodiments enables those skilled in the art to implement or use the present invention. Various modifications to the above embodiments will be apparent to those skilled in the art, and the general principles defined herein may be implemented in other embodiments without departing from the spirit or scope of the present invention. Therefore, the present invention will not be limited to the embodiments shown herein, but will conform to the widest scope consistent with the principles and novel features disclosed herein.

Claims

1. A photovoltaic silicon wafer wet process tank body exhaust structure, the tank body comprising a front side plate (10), a rear side plate (20) and a cover plate (30), the front side plate (10) and the rear side plate (20) being arranged in parallel, characterized in that: The air extraction structure comprises an air inlet (11) provided on the front side plate (10), an air outlet (21) provided on the rear side plate (20), and an air extraction box (40) installed on the outside of the rear side plate (20) and corresponding to the air outlet (21).

2. The photovoltaic silicon wafer wet process tank exhaust structure according to claim 1, characterized in that: The exhaust box (40) comprises a box body (41) mounted on the outside of the rear side plate (20), a limiting slide rail (42) symmetrically arranged on the outside of the rear side plate (20) and located on the upper and lower sides of the air outlet (21), and a slide plate (43) clamped in the limiting slide rail (42) and sliding left and right for adjusting the opening size of the air outlet (21); an exhaust port (411) for connecting an exhaust pipe is provided on the box body (41).

3. The photovoltaic silicon wafer wet process tank exhaust structure according to claim 2, characterized in that: The exhaust box (40) further comprises a positioning pin (44); the rear side plate (20) is provided with a positioning hole corresponding to the positioning pin (44); and the slide plate (43) is provided with limit holes arranged in parallel on the left and right sides. The slide plate (43) at different positions can be positioned and fixed by the positioning pin (44) clamped in the positioning hole and cooperating with the limit hole.

4. The photovoltaic silicon wafer wet process tank exhaust structure according to claim 1, characterized in that: The height of the rear side plate (20) is greater than the height of the front side plate (10), and the opening height of the air outlet (21) is greater than the opening height of the air inlet (11), and the two ends of the cover plate (30) are respectively connected to the front side plate (10) and the rear side plate (20) and then tilted to form an angle α relative to the horizontal plane.

5. The photovoltaic silicon wafer wet process tank exhaust structure according to claim 4, characterized in that: The height of the inner opening of the air inlet (11) relative to the front side plate (10) is higher than the height of the outer opening, thereby forming an oblique air intake from the outside to the inside to cooperate with the obliquely arranged cover plate (30) to form an oblique rising airflow and exhaust through the air outlet (21).

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