Multifunctional silicon wafer detection device

By heating water to steam in the silicon wafer detection device and using an atomizing nozzle to spray the water vapor, and combining the inclined baffle to block the water mist, the problem of spraying dead corners in the existing technology is solved and the detection effect is improved.

CN222379609UActive Publication Date: 2025-01-21WUHAN ZHITONG VISION TECHNOLOGY CO LTD
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Patent Information

Application Number
CN202420912531.7
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-04-29
Publication Date
2025-01-21
Estimated Expiration
2034-04-29

AI Technical Summary

Technical Problem

Existing silicon wafer detection devices are prone to spraying blind spots when spraying high-pressure steam, which reduces the detection effect.

Method used

A multifunctional silicon wafer detection device is designed. It heats water to steam and uses an atomizing nozzle to spray water vapor onto the surface of the silicon wafer. At the same time, an inclined baffle is used to block the sprayed water mist, so that the water vapor is evenly scattered on the silicon wafer. slice surface.

Benefits of technology

It effectively avoids spraying dead corners and improves the reliability and effect of silicon wafer detection.

✦ Generated by Eureka AI based on patent content.

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Abstract

The utility model relates to the technical field of silicon wafer detection, and discloses a multifunctional silicon wafer detection device. Comprising a bottom plate, a detection box is fixedly connected to the upper surface of the bottom plate, a water tank is fixedly connected to the rear surface of the detection box, an electric heating pipe is arranged in the water tank, a gas guide hopper is fixedly connected to the position, above the electric heating pipe, in the water tank, and a steam conveying pipe is fixedly connected to the upper surface of the water tank; the interior of the detection box is fixedly connected with a long connecting rod, one end, far away from the detection box, of the long connecting rod is fixedly connected with a fixed seat, the lower surface of the fixed seat is fixedly connected with an atomizing nozzle, the lower surface of the fixed seat is fixedly connected with inclined baffles, and the inclined baffles are located on two sides of the atomizing nozzle; according to the utility model, water is heated, vaporized, atomized and sprayed to the surface of the silicon wafer to be detected, and meanwhile, sprayed water mist is blocked, so that the atomized water vapor is uniformly scattered on the surface of the silicon wafer, spraying dead angles are avoided, and the detection effect is improved.
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Description

Technical Field

[0001] The utility model relates to the technical field of silicon wafer detection, in particular to a multifunctional silicon wafer detection device. Background Art

[0002] Silicon wafers are an important basis for chip production and are mainly used in microelectronics technology. During the production process of silicon wafers, corresponding inspections need to be carried out on silicon wafers to check whether they meet the production standards. For example, the patent subject "A silicon wafer hidden crack detection device" with application number "202122045958.0" uses a jet mechanism to spray high-pressure steam onto the surface of the silicon wafer. When the hidden cracks of the silicon wafer encounter steam, white lines will appear, which is convenient for the visual inspection camera above to take pictures and detect; at the same time, the lighting under the silicon wafer can make the white lines at the hidden cracks appear more clearly, further improving the reliability of the detection. The sprayed steam cannot be guided, and it is easy to spray dead corners, reducing the detection effect. Utility Model Content

[0003] In view of the shortcomings of the prior art, the utility model provides a multifunctional silicon wafer detection device, which has the function of heating and vaporizing water and then atomizing and spraying it onto the surface of the silicon wafer to be detected. At the same time, the sprayed water mist is blocked so that the atomized water vapor is evenly scattered on the surface of the silicon wafer, avoiding dead corners of spraying, improving the detection effect, and solving the above-mentioned technical problems.

[0004] To achieve the above object, the utility model provides the following technical solution: comprising a bottom plate, the upper surface of the bottom plate is fixedly connected to a detection box, and the rear surface of the detection box is fixedly connected to a water tank;

[0005] The water tank is provided with an electric heating pipe inside, the inside of the water tank is fixedly connected to the air guide scoop above the electric heating pipe, the upper surface of the water tank is fixedly connected to a steam delivery pipe, and the steam delivery pipe is in communication with the air guide scoop;

[0006] A connecting long rod is fixedly connected inside the detection box, and a fixing seat is fixedly connected to one end of the connecting long rod away from the detection box, and the fixing seat is communicated with the air guide hopper, an atomizing nozzle is fixedly connected to the lower surface of the fixing seat, and an inclined baffle is fixedly connected to the lower surface of the fixing seat, and the inclined baffles are located on both sides of the atomizing nozzle.

[0007] Through the above technical scheme, during the process of testing the silicon wafer, an external power supply is connected to start the electric heating tube to heat the water inside the water tank. The heated water generates water vapor, which is transported into the interior of the fixed seat and sprayed out using an atomizing nozzle. At the same time, the sprayed water mist is blocked by the inclined baffles installed on both sides of the atomizing nozzle, so that the atomized water vapor is evenly scattered on the surface of the silicon wafer, avoiding dead corners of spraying and improving the detection effect.

[0008] As the preferred technical solution of the utility model, connecting grooves are provided on both side surfaces of the detection box, support rods are fixedly connected to the upper surface of the base plate, and the support rods are located on both sides of the upper detection box, and a connecting strip is fixedly connected to one end of the support rod away from the base plate, and the connecting strip is connected through the connecting groove.

[0009] Through the above technical solution, the connecting strip plate connected to the conveying assembly is supported and fixed by the support rod, so that the connecting strip plate can extend through the connecting groove, thereby providing conditions for the conveying of silicon wafers.

[0010] As a preferred technical solution of the utility model, the front surface of the connecting strip is fixedly connected to the motor three, the output end of the motor three is fixedly connected to the conveying component, and the conveying component is through-connected with the connecting groove.

[0011] Through the above technical solution, before testing the silicon wafer, the silicon wafer to be tested is placed on the upper surface of the conveying component, and an external power source is connected to start the motor three to drive the conveying component to transport the silicon wafer.

[0012] As a preferred technical solution of the utility model, an electric push rod 1 is fixedly connected to the upper surface of the detection box, an output end of the electric push rod 1 is fixedly connected to a motor 1, and an output end of the motor 1 is fixedly connected to a connecting block.

[0013] Through the above technical solution, after the surface of the silicon wafer to be tested is sprayed with water mist, the electric push rod 1 is started to push the motor 1 and the connecting block to move downward, so that the connecting block drives the oblique clamp seat to fit the surface of the conveying component.

[0014] As a preferred technical solution of the utility model, the right side surface of the connecting block is fixedly connected to the motor 2, the output end of the motor 2 is fixedly connected to the rotating rod, and the end of the rotating rod away from the motor 2 is fixedly connected to the oblique clamp seat.

[0015] Through the above technical scheme, after the surface of the silicon wafer to be inspected is sprayed with water mist, the silicon wafer is driven by the conveying component to move into the interior of the bevel clamp for clamping and fixing, and the first motor is started to rotate the silicon wafer to the bottom of the camera to take pictures to detect whether there are bright lines on the surface of the silicon wafer. At the same time, the second motor can be started to drive the bevel clamp to rotate, and the side surface of the silicon wafer can be photographed for inspection, so that the side surface of the silicon wafer can be inspected, thereby improving the functionality of the device.

[0016] As a preferred technical solution of the utility model, a second electric push rod is fixedly connected to the upper surface of the detection box, and the second electric push rod is located on the left side of the first electric push rod, and a camera is fixedly connected to the output end of the second electric push rod.

[0017] Through the above technical solution, when the silicon wafer is inspected, the electric push rod 2 is started to push the camera to move up and down, so that the silicon wafer can be photographed and inspected conveniently.

[0018] As a preferred technical solution of the utility model, a slide groove is provided on the left side of the detection box, and the slide groove is located above the connecting groove, a spring is fixedly connected to the inside of the slide groove, a slider is fixedly connected to the end of the spring away from the slide groove, and the slider is slidably connected to the slide groove, and a fixed short rod is fixedly connected to the left side of the detection box, and the fixed short rod is located in front and behind the slide groove.

[0019] Through the above technical solution, during the inspection of silicon wafers, the light shielding plate is pressed to drive the slider to move downward to block the light. When the inspection is completed, the light shielding plate is pulled and the stress rebound of the spring is used to drive the light shielding plate to move upward to reset it to avoid blocking the transmission of the silicon wafer.

[0020] As a preferred technical solution of the utility model, a sunshade is fixedly connected to the left side of the slider, and a connecting short rod is fixedly connected to the front and rear surfaces of the sunshade. The end of the connecting short rod away from the sunshade is fixedly connected to a limiting clamp ring, and the limiting clamp ring is located above the fixed short rod.

[0021] Through the above technical solution, during the process of inspecting the silicon wafer, the light shielding plate is pressed to drive the limit clamping ring to move downward, so that the limit clamping ring is engaged and fixed with the fixed short rod, and the light shielding plate 23 is fixed at the notch of the connecting groove on the left side of the inspection box to block the light penetrating into the interior of the inspection box through the notch, thereby avoiding exposure when photographing the silicon wafer and ensuring the shooting effect.

[0022] Compared with the prior art, the utility model provides a multifunctional silicon wafer detection device, which has the following beneficial effects:

[0023] 1. The utility model heats the water inside the water tank by installing a starting electric heating tube, and the heated water generates water vapor. The water vapor evaporating upward is passed into the inside of the air pipe through the air guide hopper, and the generated water vapor is transported into the inside of the fixed seat, and the water vapor is sprayed out by the atomizing nozzle. At the same time, the sprayed water mist is blocked by the inclined baffles installed on both sides of the atomizing nozzle, so that the atomized water vapor is evenly scattered on the surface of the silicon wafer, avoiding the occurrence of spraying dead angles and improving the detection effect.

[0024] 2. The utility model installs the shading plate by pressing it to drive the connecting short rod to move downward, so that the limit clamping ring moves downward and squeezes the fixed short rod, so that the limit clamping ring and the fixed short rod are engaged and fixed, and the shading plate is fixed at the notch of the connecting groove on the left side of the detection box to block the light penetrating into the detection box through the notch, thereby avoiding exposure when shooting the silicon wafer and ensuring the shooting effect. BRIEF DESCRIPTION OF THE DRAWINGS

[0025] Figure 1 This is a schematic diagram of the front internal structure of the utility model;

[0026] Figure 2 It is a schematic diagram of the overall structure of the utility model;

[0027] Figure 3 This is a schematic diagram of the split structure of the fixing seat of the utility model;

[0028] Figure 4 for Figure 1 Schematic diagram of the structure at A in the middle;

[0029] Figure 5 This is a left-side structural schematic diagram of the detection box of the utility model;

[0030] Figure 6 for Figure 5 Schematic diagram of the structure at point B in the middle.

[0031] Among them: 1. Bottom plate; 2. Detection box; 3. Connecting groove; 4. Water tank; 5. Electric heating pipe; 6. Air guide hopper; 7. Steam pipe; 8. Fixed seat; 9. Connecting long rod; 10. Atomizing nozzle; 11. Oblique baffle; 12. Electric push rod 1; 13. Motor 1; 14. Connecting block; 15. Motor 2; 16. Rotating rod; 17. Oblique clamp seat; 18. Electric push rod 2; 19. Camera; 20. Slide; 21. Spring; 22. Slider; 23. Sunshade; 24. Connecting short rod; 25. Limiting clamp ring; 26. Fixed short rod; 27. Support rod; 28. Connecting strip; 29. ​​Motor 3; 30. Conveying component. DETAILED DESCRIPTION

[0032] The following is a further detailed description of the implementation of the present invention in conjunction with the accompanying drawings and examples. The following examples are used to illustrate the present invention, but cannot be used to limit the scope of the present invention.

[0033] In the description of the present invention, unless otherwise specified, "multiple" means two or more; the terms "upper", "lower", "left", "right", "inner", "outer", "front end", "rear end", "head", "tail" and the like indicate the orientation or positional relationship based on the orientation or positional relationship shown in the drawings, which is only for the convenience of describing the present invention and simplifying the description, and does not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operate in a specific orientation, and therefore cannot be understood as limiting the present invention. In addition, the terms "first", "second", "third" and the like are only used for descriptive purposes and cannot be understood as indicating or implying relative importance.

[0034] In the description of the present invention, it should be noted that, unless otherwise clearly specified and limited, the terms "connected" and "connection" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0035] See also Figure 1-Figure 3 A multifunctional silicon wafer detection device includes a base plate 1, a detection box 2 is fixedly connected to the upper surface of the base plate 1, and a water tank 4 is fixedly connected to the rear surface of the detection box 2.

[0036] The water tank 4 is provided with an electric heating pipe 5, and the water tank 4 is fixedly connected with an air guide scoop 6 above the electric heating pipe 5. The upper surface of the water tank 4 is fixedly connected with a steam delivery pipe 7, and the steam delivery pipe 7 is communicated with the air guide scoop 6.

[0037] A connecting long rod 9 is fixedly connected inside the detection box 2, and a fixed seat 8 is fixedly connected to the end of the connecting long rod 9 away from the detection box 2, and the fixed seat 8 is communicated with the air guide hopper 6, and an atomizing nozzle 10 is fixedly connected to the lower surface of the fixed seat 8, and an inclined baffle 11 is fixedly connected to the lower surface of the fixed seat 8, and the inclined baffle 11 is located on both sides of the atomizing nozzle 10.

[0038] During the inspection of the silicon wafer, an external power source is connected to start the electric heating tube 5 to heat the water inside the water tank 4. The heated water generates water vapor. The water vapor evaporating upward is passed into the steam pipe 7 through the air guide hopper 6, and the generated water vapor is transported into the interior of the fixed seat 8. The water vapor is sprayed out by the atomizing nozzle 10. At the same time, the sprayed water mist is blocked by the inclined baffles 11 installed on both sides of the atomizing nozzle 10, so that the atomized water vapor is evenly scattered on the surface of the silicon wafer, avoiding the occurrence of spraying dead angles and improving the inspection effect.

[0039] See also Figure 1 and Figure 2 , connecting grooves 3 are provided on both side surfaces of the detection box 2, and a support rod 27 is fixedly connected to the upper surface of the bottom plate 1, and the support rod 27 is located on both sides of the upper detection box 2, and a connecting strip 28 is fixedly connected to one end of the support rod 27 away from the bottom plate 1, and the connecting strip 28 is connected through the connecting groove 3.

[0040] The connecting strip plate 28 connected to the conveying assembly 30 is supported and fixed by the supporting rod 27, so that the connecting strip plate 28 can extend through the connecting groove 3, thereby providing conditions for the conveying of silicon wafers.

[0041] See also Figure 1 and Figure 2A motor 3 29 is fixedly connected to the front surface of the connecting strip 28 , a conveying assembly 30 is fixedly connected to the output end of the motor 3 29 , and the conveying assembly 30 is connected through the connecting groove 3 .

[0042] Before testing the silicon wafer, the silicon wafer to be tested is placed on the upper surface of the conveying assembly 30, and an external power source is connected to start the motor 3 29 to drive the conveying assembly 30 to transport the silicon wafer.

[0043] See also Figure 1 and Figure 4 The upper surface of the detection box 2 is fixedly connected with an electric push rod 12, the output end of the electric push rod 12 is fixedly connected with a motor 13, and the output end of the motor 13 is fixedly connected with a connecting block 14.

[0044] After the surface of the silicon wafer to be tested is sprayed with water mist, the electric push rod 12 is started to extend it into the inside of the test box 2, pushing the motor 13 and the connecting block 14 to move downward, so that the connecting block 14 drives the oblique clamp seat 17 to move downward and fit with the surface of the conveying component 30.

[0045] See also Figure 4 The right side of the connecting block 14 is fixedly connected to a second motor 15 , the output end of the second motor 15 is fixedly connected to a rotating rod 16 , and the end of the rotating rod 16 away from the second motor 15 is fixedly connected to an oblique clamp seat 17 .

[0046] After the surface of the silicon wafer to be tested is sprayed with water mist, the silicon wafer is transported by the conveying assembly 30 to move the silicon wafer to the left, driving the silicon wafer to move into the interior of the oblique clamp 17 for clamping and fixing, and the motor 13 is started to drive the connecting block 14 to deflect to the left, and the silicon wafer is rotated to the bottom of the camera 19 to take pictures to detect whether there are bright lines on the surface of the silicon wafer. At the same time, the motor 2 15 can be started to drive the rotating rod 16 to rotate, thereby driving the oblique clamp 17 to rotate, and the side surface of the silicon wafer is photographed for inspection, so that the side surface of the silicon wafer can be inspected, thereby improving the functionality of the device.

[0047] See also Figure 1 The upper surface of the detection box 2 is fixedly connected with an electric push rod 18, and the electric push rod 18 is located on the left side of the electric push rod 12, and the output end of the electric push rod 18 is fixedly connected with a camera 19.

[0048] When the silicon wafer is inspected, the electric push rod 18 is started to push the camera 19 to move up and down, so that the silicon wafer can be photographed and inspected conveniently.

[0049] See also Figure 5 and Figure 6A slide groove 20 is provided on the left side of the detection box 2, and the slide groove 20 is located above the connecting groove 3. A spring 21 is fixedly connected inside the slide groove 20, and a slider 22 is fixedly connected to the end of the spring 21 away from the slide groove 20, and the slider 22 is slidably connected to the slide groove 20. A fixed short rod 26 is fixedly connected to the left side of the detection box 2, and the fixed short rod 26 is located in front and behind the slide groove 20.

[0050] During the inspection of the silicon wafer, the shading plate 23 is pressed to drive the slider 22 to move downward, squeezing the spring 21. When the inspection is completed, the shading plate 23 is pulled and the stress rebound of the spring 21 is used to drive the shading plate 23 to move upward to reset it to avoid blocking the transmission of the silicon wafer.

[0051] See also Figure 5 and Figure 6 A shading plate 23 is fixedly connected to the left side of the slider 22, and a connecting short rod 24 is fixedly connected to the front and rear surfaces of the shading plate 23. The end of the connecting short rod 24 away from the shading plate 23 is fixedly connected to a limiting clamp 25, and the limiting clamp 25 is located above the fixed short rod 26.

[0052] During the inspection of the silicon wafer, by pressing the shading plate 23, it drives the connecting short rod 24 to move downward, so that the limiting clamp 25 moves downward, and the fixed short rod 26 is squeezed, so that the limiting clamp 25 and the fixed short rod 26 are engaged and fixed, and the shading plate 23 is fixed at the notch of the connecting groove 3 on the left side of the inspection box 2 to block the light penetrating into the inspection box 2 through the notch, so as to avoid exposure when shooting the silicon wafer and ensure the shooting effect.

[0053] When in use, the silicon wafer to be tested is placed on the upper surface of the conveying assembly 30, and the external power supply is connected to start the motor 3 29 to drive the conveying assembly 30 to convey the silicon wafer. After the silicon wafer to be tested is conveyed into the interior of the testing box 2, the electric heating tube 5 is started to heat the water inside the water tank 4. The heated water generates water vapor. The water vapor evaporating upward is passed into the interior of the steam transmission pipe 7 through the air guide hopper 6, and the generated water vapor is conveyed into the interior of the fixed seat 8. The water vapor is sprayed out by the atomizing nozzle 10, and the sprayed water mist is blocked by the inclined baffles 11 installed on both sides of the atomizing nozzle 10, so that the atomized water vapor is evenly scattered on the surface of the silicon wafer. After the water mist is sprayed on the surface of the silicon wafer to be tested, the silicon wafer is conveyed by the conveying assembly 30 to move the silicon wafer to the left, driving the silicon wafer to move into the oblique clamp The inside of the seat 17 is clamped and fixed, and the motor 13 is started to drive the connecting block 14 to deflect to the left, and the silicon wafer is rotated to the bottom of the camera 19 to take pictures to detect whether there are bright lines on the surface of the silicon wafer. At the same time, the motor 2 15 can be started to drive the rotating rod 16 to rotate, thereby driving the oblique clamp seat 17 to rotate, and the side surface of the silicon wafer is photographed and checked, so that the side surface of the silicon wafer can be detected. In the process of detecting the silicon wafer, the shading plate 23 is pressed to drive the connecting short rod 24 to move downward, so that the limiting clamp ring 25 moves downward, and the fixed short rod 26 is squeezed, so that the limiting clamp ring 25 and the fixed short rod 26 are engaged and fixed, and the shading plate 23 is fixed at the notch of the connecting groove 3 on the left side of the detection box 2, The light penetrating into the inside of the detection box 2 through the notch is blocked to complete the detection.

[0054] Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present invention, and that the scope of the present invention is defined by the appended claims and their equivalents.

Claims

1. A multifunctional silicon wafer inspection device, comprising a base plate (1), characterized in that: The upper surface of the bottom plate (1) is fixedly connected to a detection box (2), and the rear surface of the detection box (2) is fixedly connected to a water tank (4); An electric heating pipe (5) is arranged inside the water tank (4), an air guide scoop (6) is fixedly connected to the interior of the water tank (4) above the electric heating pipe (5), a steam delivery pipe (7) is fixedly connected to the upper surface of the water tank (4), and the steam delivery pipe (7) is in communication with the air guide scoop (6); A connecting long rod (9) is fixedly connected inside the detection box (2); an end of the connecting long rod (9) away from the detection box (2) is fixedly connected to a fixing seat (8), and the fixing seat (8) is communicated with the air guide hopper (6); an atomizing nozzle (10) is fixedly connected to the lower surface of the fixing seat (8); an inclined baffle (11) is fixedly connected to the lower surface of the fixing seat (8), and the inclined baffle (11) is located on both sides of the atomizing nozzle (10).

2. A multifunctional silicon wafer detection device according to claim 1, characterized in that: The surfaces of both sides of the detection box (2) are provided with connecting grooves (3); the upper surface of the bottom plate (1) is fixedly connected with a support rod (27), and the support rod (27) is located on both sides of the upper detection box (2); one end of the support rod (27) away from the bottom plate (1) is fixedly connected with a connecting strip (28), and the connecting strip (28) is connected through the connecting groove (3).

3. A multifunctional silicon wafer detection device according to claim 2, characterized in that: The front surface of the connecting strip plate (28) is fixedly connected to a motor three (29), the output end of the motor three (29) is fixedly connected to a conveying assembly (30), and the conveying assembly (30) is connected through the connecting groove (3).

4. The multifunctional silicon wafer detection device according to claim 1, characterized in that: An electric push rod 1 (12) is fixedly connected to the upper surface of the detection box (2), an output end of the electric push rod 1 (12) is fixedly connected to a motor 1 (13), and an output end of the motor 1 (13) is fixedly connected to a connection block (14).

5. A multifunctional silicon wafer detection device according to claim 4, characterized in that: The right side surface of the connecting block (14) is fixedly connected to a second motor (15), the output end of the second motor (15) is fixedly connected to a rotating rod (16), and the end of the rotating rod (16) away from the second motor (15) is fixedly connected to an oblique clamp seat (17).

6. The multifunctional silicon wafer detection device according to claim 1, characterized in that: The upper surface of the detection box (2) is fixedly connected to a second electric push rod (18), and the second electric push rod (18) is located on the left side of the first electric push rod (12), and the output end of the second electric push rod (18) is fixedly connected to a camera (19).

7. The multifunctional silicon wafer detection device according to claim 1, characterized in that: The left side surface of the detection box (2) is provided with a slide groove (20), and the slide groove (20) is located above the connecting groove (3); a spring (21) is fixedly connected inside the slide groove (20); an end of the spring (21) away from the slide groove (20) is fixedly connected to a slider (22), and the slider (22) is slidably connected to the slide groove (20); a fixed short rod (26) is fixedly connected to the left side surface of the detection box (2), and the fixed short rod (26) is located in front of and behind the slide groove (20).

8. A multifunctional silicon wafer detection device according to claim 7, characterized in that: The left side surface of the slider (22) is fixedly connected to a sunshade (23), the front surface and the rear surface of the sunshade (23) are both fixedly connected to a connecting short rod (24), one end of the connecting short rod (24) away from the sunshade (23) is fixedly connected to a limiting clamp ring (25), and the limiting clamp ring (25) is located above the fixed short rod (26).

Citation Information

Patent Citations

  • Silicon wafer subfissure detection device

    CN215640935U