Polycrystalline silicon surface polishing device

By designing a polysilicon surface grinding device, including the feed transport component, the holding of the transfer component, and the surface grinding component, it solves the problem of inconvenience and adjustment difficulties when the polycrystalline silicon block is polished, and achieves efficient and comprehensive polishing treatment.

CN222404923UActive Publication Date: 2025-01-28SHANGHAI NANQI NEW ENERGY TECHNOLOGY CO LTD
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Patent Information

Application Number
CN202421161293.7
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-05-27
Publication Date
2025-01-28
Estimated Expiration
2034-05-27

AI Technical Summary

Technical Problem

When polishing the existing polysilicon blocks, it is inconvenient for loading and adjustment of grinding, resulting in low grinding efficiency.

Method used

A polysilicon surface polishing device is designed, including the installation platform, feeding transport component, clamping transfer component, processing box and surface grinding components. Through the collaborative work of these components Comprehensive polishing treatment.

Benefits of technology

This device can significantly improve the efficiency of the surface polishing of polycrystalline silicon blocks, reduce the labor intensity of staff, save working time, and can more comprehensively polish the surface of polycrystalline silicon blocks.

✦ Generated by Eureka AI based on patent content.

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Abstract

The utility model discloses a polycrystalline silicon surface polishing device, and relates to the technical field of polycrystalline silicon polishing. Comprising a polycrystalline silicon grinding mechanism, the polycrystalline silicon grinding mechanism comprises a mounting table, a control panel is mounted on the surface of the mounting table, a feeding and conveying assembly is mounted at the top of the mounting table, a clamping and transferring assembly is mounted at the top of the mounting table, and the clamping and transferring assembly is located on one side of the feeding and conveying assembly; a processing box is mounted at the top of the mounting table, an electric control door is mounted on one side of the processing box, and a control panel is mounted on the surface of the processing box; according to the polycrystalline silicon block polishing device, polycrystalline silicon blocks can be fed, the polycrystalline silicon blocks can be correspondingly clamped and fed, the labor intensity of workers is reduced, meanwhile, the polycrystalline silicon blocks can be installed and adjusted, the polishing positions of the polycrystalline silicon blocks can be adjusted, the surfaces of the polycrystalline silicon blocks can be polished comprehensively, and the polishing efficiency of the polycrystalline silicon blocks is improved. The polishing efficiency of the surfaces of the polycrystalline silicon blocks is improved, and the working time is saved.
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Description

Technical Field

[0001] The utility model relates to the technical field of polysilicon grinding, in particular to a polysilicon surface grinding device. Background Art

[0002] Polysilicon is a form of single silicon. When molten single silicon solidifies under supercooling conditions, silicon atoms are arranged in the form of diamond lattices to form many crystal nuclei. If these crystal nuclei grow into grains with different crystal plane orientations, these grains will combine and crystallize into polysilicon. Polysilicon material is the direct raw material for producing single crystal silicon. It is the basic electronic information material for contemporary semiconductor devices such as artificial intelligence, automatic control, information processing, and photoelectric conversion. It is called the "cornerstone of the microelectronics building." Polysilicon material is a silicon material that has been in short supply in the market in recent years. Due to bottlenecks such as technical restrictions in my country, it mainly relies on imports.

[0003] At present, a Chinese patent with the announcement number CN201420238800.2 discloses a single crystal or polycrystalline silicon material surface grinding device. By adopting the utility model, the single crystal or polycrystalline silicon material to be ground can be directly fed into the mobile platform, and the surface of the single crystal or polycrystalline silicon material with very high hardness can be ground by a plurality of parallel blades, which is fast and convenient, can improve the grinding efficiency and reduce the production cost.

[0004] During the production of existing polysilicon blocks, the surface needs to be polished, and the above-mentioned comparative document can polish the surface of single crystal or polycrystalline silicon materials with very high hardness through several parallel blades. However, when the above-mentioned device is used, it is inconvenient to load the polysilicon blocks, which is not conducive to efficient and accurate loading and processing of the polysilicon blocks. In addition, when the above-mentioned device is used, it is inconvenient to adjust and polish the polysilicon blocks, which is not conducive to comprehensive polishing of the surface of the polysilicon blocks, affecting the polishing efficiency. Therefore, we need to provide a polysilicon surface polishing device. Utility Model Content

[0005] The utility model provides a polysilicon surface grinding device, which has the advantages of being able to facilitate the feeding process of polysilicon blocks and better grind the polysilicon surface, thereby solving the problems raised in the above background technology.

[0006] To achieve the above objectives, the utility model is implemented through the following technical solutions: a polysilicon surface grinding device, comprising: a polysilicon grinding mechanism, the polysilicon grinding mechanism comprising a mounting table, a control panel is installed on the surface of the mounting table, a loading and transporting assembly is installed on the top of the mounting table, a clamping and transferring assembly is installed on the top of the mounting table, and the clamping and transferring assembly is located on one side of the loading and transporting assembly, a processing box is installed on the top of the mounting table, an electric control door is installed on one side of the processing box, a control panel is installed on the surface of the processing box, a grinding and cleaning assembly is installed on the surface of the processing box, a clamping adjustment assembly is installed inside the processing box, a surface grinding assembly is installed on the inner side of the processing box, and a liquid collecting box is installed inside the processing box.

[0007] As a polysilicon surface polishing device of the utility model, the loading and transporting assembly includes a support column, an installation frame, an electrically controlled conveyor belt, a transport controller, a transport guide plate and a polysilicon block body, the support column is fixedly connected to the installation platform, the installation frame is fixedly installed on the top of the support column, the electrically controlled conveyor belt is installed on the installation frame, the transport controller is installed on one end of the installation frame, the transport guide plate is fixedly installed on the surface of the installation frame, and the transport guide plate is used in conjunction with the electrically controlled conveyor belt, and the polysilicon block body is arranged on the electrically controlled conveyor belt.

[0008] As a polysilicon surface polishing device of the utility model, the clamping and transferring assembly includes a fixed frame, a transverse electric control rail, a connecting seat, a longitudinal electric control rail, a transfer controller and a clamping component. The fixed frame is fixedly connected to the mounting table, the transverse electric control rail is installed on the fixed frame, the connecting seat is installed on the transverse electric control rail, the longitudinal electric control rail is installed on the connecting seat, the transfer controller is installed on the surface of the connecting seat, and the clamping component is installed on the longitudinal electric control rail.

[0009] As a polysilicon surface polishing device of the utility model, the polishing and cleaning assembly includes a liquid storage tank, a liquid pump, a connecting pipe and a liquid outlet nozzle. The liquid storage tank is fixedly installed on the processing box, the liquid pump is installed on the processing box, and one end of the liquid pump is connected to the interior of the liquid storage tank, the connecting pipe is connected to the other end of the liquid pump, and the liquid outlet nozzle is installed on the top of the inner side of the processing box, and the liquid outlet nozzle is connected to one end of the connecting pipe.

[0010] As a polysilicon surface polishing device of the utility model, the clamping and adjustment component includes a first electrically controlled slide rail, a connecting table, an adjustment controller, a second electrically controlled slide rail, a fixed seat, a servo motor, a rotation controller and a limit top plate. The first electrically controlled slide rail is installed in a processing box, the connecting table is installed on the top of the first electrically controlled slide rail, the adjustment controller is installed on the connecting table, the second electrically controlled slide rail is installed on the top of the connecting table, and the number of the second electrically controlled slide rails is two, the fixed seat is installed on the second electrically controlled slide rail, the servo motor is installed in the fixed seat, the rotation controller is installed on the surface of the fixed seat, and the limit top plate is fixedly installed on the output end of the servo motor.

[0011] As a polysilicon surface grinding device of the utility model, the surface grinding assembly includes an electric linear slide, a mounting seat, an electric-controlled lifting rod, a lifting controller, a grinder, a grinding disc and a grinding controller, the electric linear slide is installed in a processing box, the mounting seat is installed on the top of the electric linear slide, the electric-controlled lifting rod is installed in the mounting seat, the lifting controller is installed on the surface of the mounting seat, the grinder is fixedly installed on the output end of the electric-controlled lifting rod, the grinding disc is installed on the output end of the grinder, and the grinding controller is installed on the surface of the grinder.

[0012] As a polysilicon surface polishing device of the utility model, the clamping component includes a connecting rod, a connecting plate, a clamping controller, a sliding rod, a clamping plate and an electrically controlled double-end telescopic rod, the connecting rod is connected to a longitudinal electrically controlled guide rail, the connecting plate is fixedly installed on one end of the connecting rod, the clamping controller is installed on the surface of the connecting plate, the sliding rod is slidably connected to the inner side of the connecting plate, and the number of sliding rods is two, the clamping plate is fixedly installed on the bottom end of the sliding rod, the electrically controlled double-end telescopic rod is installed inside the connecting plate, and the two ends of the electrically controlled double-end telescopic rod are respectively connected to the two sliding rods.

[0013] The utility model provides a polysilicon surface polishing device, which has the following beneficial effects:

[0014] The polysilicon surface grinding device, through the arrangement of a polysilicon grinding mechanism, a mounting platform, a control panel, a feeding and transporting assembly, a clamping and transferring assembly, a processing box, an electric control door, a control panel, a grinding and cleaning assembly, a clamping and adjusting assembly, a surface grinding assembly and a liquid collecting box, can perform feeding processing on polysilicon blocks, is conducive to corresponding clamping and feeding of the polysilicon blocks, reduces the labor intensity of the staff, and can also install and adjust the polysilicon blocks, is conducive to adjusting the grinding position of the polysilicon blocks, thereby comprehensively grinding the surfaces of the polysilicon blocks, improving the efficiency of the surface grinding of the polysilicon blocks, and saving working time. BRIEF DESCRIPTION OF THE DRAWINGS

[0015] Figure 1It is a three-dimensional structural schematic diagram of the utility model;

[0016] Figure 2 It is a side view of the three-dimensional structure of the utility model;

[0017] Figure 3 It is a three-dimensional diagram of the first partial structure of the utility model;

[0018] Figure 4 It is a third partial structural perspective view of the second embodiment of the present invention;

[0019] Figure 5 It is a three-dimensional diagram of the third partial structure of the utility model;

[0020] Figure 6 It is a three-dimensional structural cross-sectional view of the utility model;

[0021] Figure 7 It is a third perspective view of the fourth partial structure of the utility model;

[0022] Figure 8 It is a third perspective view of the fifth partial structure of the utility model;

[0023] Fig. 9 It is a sixth partial structural stereogram of the utility model;

[0024] Fig.10 It is a seventh partial structural stereogram of the utility model;

[0025] Fig.11 It is a partial structural cross-sectional view of the utility model.

[0026] In the figure: 1. Polysilicon grinding mechanism; 101. Mounting table; 102. Control panel; 103. Loading and transporting assembly; 10301. Support column; 10302. Mounting frame; 10303. Electric-controlled transport belt; 10304. Transport controller; 10305. Transport guide plate; 10306. Polysilicon block body; 104. Clamping and transferring assembly; 10401. Fixing frame; 10402. Horizontal electric-controlled guide rail; 10403. Connecting seat; 10404. Longitudinal electric-controlled guide rail; 10405. Transfer controller; 10406. Clamping member; 1040601. Connecting rod; 1040602. Connecting plate; 1040603. Clamping controller; 1040604. Sliding rod; 1040605. Clamping plate; 1040606. Electric-controlled double-end telescopic rod; 105. Processing box; 106, electric door; 107, control panel; 108, grinding and cleaning assembly; 10801, liquid storage tank; 10802, liquid pump; 10803, connecting pipe; 10804, liquid outlet nozzle; 109, clamping and adjusting assembly; 10901, first electric control slide; 10902, connecting table; 10903, shifting controller; 10904, second electric control slide; 10905, fixing seat; 10906, servo motor; 10907, rotation controller; 10908, limit top plate; 110, surface grinding assembly; 11001, electric linear slide; 11002, mounting seat; 11003, electric lifting rod; 11004, lifting controller; 11005, grinder; 11006, grinding disc; 11007, grinding controller; 111, liquid collecting tank. DETAILED DESCRIPTION

[0027] The following will be combined with the drawings in the practical embodiment to clearly and completely describe the technical solution in the practical embodiment. Obviously, the described embodiment is only a part of the embodiment of the practical embodiment, not all of the embodiments. Based on the embodiment in the practical embodiment, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of this practical embodiment.

[0028] See also Figure 1-Figure 11The utility model provides a technical solution: a polysilicon surface grinding device, comprising a polysilicon grinding mechanism 1, the polysilicon grinding mechanism 1 comprises a mounting platform 101, a control panel 102 is mounted on the surface of the mounting platform 101, a loading and transporting assembly 103 is mounted on the top of the mounting platform 101, a clamping and transferring assembly 104 is mounted on the top of the mounting platform 101, and the clamping and transferring assembly 104 is located on one side of the loading and transporting assembly 103, a processing box 105 is mounted on the top of the mounting platform 101, an electric control door 106 is mounted on one side of the processing box 105, a control panel 107 is mounted on the surface of the processing box 105, a grinding and cleaning assembly 108 is mounted on the surface of the processing box 105, a clamping and adjusting assembly 109 is mounted inside the processing box 105, and the inner side of the processing box 105 A surface grinding component 110 is installed, and a liquid collecting box 111 is installed inside the processing box 105. Through the arrangement of the polysilicon grinding mechanism 1, the mounting table 101, the control panel 102, the loading and transporting component 103, the clamping and transferring component 104, the processing box 105, the electric control door 106, the control panel 107, the grinding and cleaning component 108, the clamping and adjusting component 109, the surface grinding component 110 and the liquid collecting box 111, the polysilicon blocks can be fed, which is beneficial for the corresponding clamping and feeding of the polysilicon blocks, reducing the labor intensity of the staff, and at the same time, the polysilicon blocks can be installed and adjusted, which is beneficial for adjusting the grinding position of the polysilicon blocks, so as to comprehensively grind the surface of the polysilicon blocks, improve the efficiency of the surface grinding of the polysilicon blocks, and save working time.

[0029] See also Figure 3 The loading and transporting assembly 103 includes a support column 10301, a mounting frame 10302, an electric-controlled transport belt 10303, a transport controller 10304, a transport guide plate 10305 and a polycrystalline silicon block body 10306. The support column 10301 is fixedly connected to the mounting platform 101, the mounting frame 10302 is fixedly mounted on the top of the support column 10301, the electric-controlled transport belt 10303 is mounted on the mounting frame 10302, and the transport controller 10304 is mounted on the mounting frame 10302. At one end, the transport guide plate 10305 is fixedly mounted on the surface of the installation frame 10302, and the transport guide plate 10305 is used in conjunction with the electric-controlled conveyor belt 10303. The polysilicon block body 10306 is arranged on the electric-controlled conveyor belt 10303. Through the arrangement of the support column 10301, the installation frame 10302, the electric-controlled conveyor belt 10303, the transport controller 10304, the transport guide plate 10305 and the polysilicon block body 10306, a plurality of polysilicon blocks can be transported and loaded.

[0030] See also Figure 4The clamping and transferring assembly 104 includes a fixing frame 10401, a transverse electric control rail 10402, a connecting seat 10403, a longitudinal electric control rail 10404, a transfer controller 10405 and a clamping member 10406. The fixing frame 10401 is fixedly connected to the mounting table 101, the transverse electric control rail 10402 is installed on the fixing frame 10401, the connecting seat 10403 is installed on the transverse electric control rail 10402, and the longitudinal electric control rail 10 404 is installed on the connecting seat 10403, the transfer controller 10405 is installed on the surface of the connecting seat 10403, and the clamping component 10406 ​​is installed on the longitudinal electric control guide rail 10404. Through the arrangement of the fixed frame 10401, the transverse electric control guide rail 10402, the connecting seat 10403, the longitudinal electric control guide rail 10404, the transfer controller 10405 and the clamping component 10406, the transported polysilicon blocks can be conveniently clamped and loaded.

[0031] See also Figure 7 The polishing and cleaning component 108 includes a liquid storage tank 10801, a liquid pump 10802, a connecting pipe 10803 and a liquid outlet nozzle 10804. The liquid storage tank 10801 is fixedly installed on the processing box 105, the liquid pump 10802 is installed on the processing box 105, and one end of the liquid pump 10802 is connected to the interior of the liquid storage tank 10801, the connecting pipe 10803 is connected to the other end of the liquid pump 10802, and the liquid outlet nozzle 10804 is installed on the top of the inner side of the processing box 105, and the liquid outlet nozzle 10804 is connected to one end of the connecting pipe 10803. Through the arrangement of the liquid storage tank 10801, the liquid pump 10802, the connecting pipe 10803 and the liquid outlet nozzle 10804, the dust reduction polishing can be performed on the polishing position of the polysilicon block.

[0032] See also Figure 8The clamping and adjusting assembly 109 includes a first electrically controlled slide rail 10901, a connecting platform 10902, a displacement controller 10903, a second electrically controlled slide rail 10904, a fixing seat 10905, a servo motor 10906, a rotation controller 10907 and a limit top plate 10908. The first electrically controlled slide rail 10901 is installed in the processing box 105, the connecting platform 10902 is installed on the top of the first electrically controlled slide rail 10901, the displacement controller 10903 is installed on the connecting platform 10902, and the second electrically controlled slide rail 10904 is installed on the top of the connecting platform 10902. The number of the second electrically controlled slide rails 10904 is two, and the fixing seat 10905 is provided. 0905 is installed on the second electric-controlled slide rail 10904, the servo motor 10906 is installed in the fixed seat 10905, the rotation controller 10907 is installed on the surface of the fixed seat 10905, and the limiting top plate 10908 is fixedly installed on the output end of the servo motor 10906. Through the arrangement of the first electric-controlled slide rail 10901, the connecting platform 10902, the adjustment controller 10903, the second electric-controlled slide rail 10904, the fixed seat 10905, the servo motor 10906, the rotation controller 10907 and the limiting top plate 10908, the polysilicon block can be clamped and adjusted, thereby facilitating the adjustment of the grinding position of the polysilicon block.

[0033] See also Fig. 9 The surface grinding assembly 110 includes an electric linear slide 11001, a mounting seat 11002, an electric control lifting rod 11003, a lifting controller 11004, a grinder 11005, a grinding disc 11006 and a grinding controller 11007. The electric linear slide 11001 is installed in the processing box 105, the mounting seat 11002 is installed on the top of the electric linear slide 11001, the electric control lifting rod 11003 is installed in the mounting seat 11002, and the lifting controller 11004 is installed on the mounting seat 1100 2, the grinder 11005 is fixedly installed on the output end of the electric control lifting rod 11003, the grinding disc 11006 is installed on the output end of the grinder 11005, and the grinding controller 11007 is installed on the surface of the grinder 11005. Through the arrangement of the electric linear slide 11001, the mounting seat 11002, the electric control lifting rod 11003, the lifting controller 11004, the grinder 11005, the grinding disc 11006 and the grinding controller 11007, the surface of the polysilicon can be easily polished.

[0034] See also Fig.10The clamping member 10406 ​​includes a connecting rod 1040601, a connecting plate 1040602, a clamping controller 1040603, a sliding rod 1040604, a clamping plate 1040605 and an electrically controlled double-end telescopic rod 1040606, wherein the connecting rod 1040601 is connected to the longitudinal electrically controlled guide rail 10404, the connecting plate 1040602 is fixedly mounted on one end of the connecting rod 1040601, the clamping controller 1040603 is mounted on the surface of the connecting plate 1040602, the sliding rod 1040604 is slidably connected to the inner side of the connecting plate 1040602, and the sliding rod 1 There are two 040604, the clamping plate 1040605 is fixedly installed on the bottom end of the sliding rod 1040604, the electrically controlled double-end telescopic rod 1040606 is installed inside the connecting plate 1040602, and the two ends of the electrically controlled double-end telescopic rod 1040606 are respectively connected to the two sliding rods 1040604, through the setting of the connecting rod 1040601, the connecting plate 1040602, the clamping controller 1040603, the sliding rod 1040604, the clamping plate 1040605 and the electrically controlled double-end telescopic rod 1040606, the polysilicon block can be clamped more stably.

[0035] When in use, the staff first places the polysilicon block body 10306 on the installation frame 10302 in sequence, and then starts the loading and transporting assembly 103 through the control panel 102. At this time, the transport controller 10304 controls the electric-controlled conveyor belt 10303 to work, driving the polysilicon block body 10306 to move to the bottom of the clamping and transferring assembly 104, and then the transfer controller 10405 controls the horizontal electric-controlled guide rail 10402 and the longitudinal electric-controlled guide rail 10404 to work, and moves the clamping member 10406 ​​to the polysilicon block body 10306, and then controls the electric-controlled double-end telescopic rod 1040606 to retract through the clamping controller 1040603, thereby driving The two clamping plates 1040605 move towards each other to clamp the polysilicon block body 10306, and then the polysilicon block body 10306 is moved to the clamping adjustment component 109 in the processing box 105 through the transverse electric control rail 10402 and the longitudinal electric control rail 10404. At this time, the polysilicon block body 10306 moves between the two limit top plates 10908, and then the two second electric control slide rails 10904 are controlled by the adjustment controller 10903 to drive the fixed seat 10905 to move, and drive the limit top plate 10908 to clamp the polysilicon block body 10306, and then the clamping transfer component 104 moves to the original position, and then the control panel 107 controls the electric control door 106 to close;

[0036] Then, the polishing and cleaning component 108, the clamping and adjusting component 109 and the surface polishing component 110 are started to work through the control panel 102. At this time, the electric linear slide 11001 and the electric control lifting rod 11003 are controlled to work through the lifting controller 11004, and then the polishing disc 11006 is moved to the surface polishing position of the polysilicon block body 10306. Then, the polishing disc 11006 is started to polish through the polishing controller 11007. At the same time, the first electric control slide 10901 is started to work through the adjustment controller 10903, and then the clamped polysilicon block body 10306 is driven to move and polish, so as to realize the moving polishing of the surface of the polysilicon block body 10306. At the same time, the water in the liquid storage tank 10801 is pumped to the liquid outlet nozzle 10804 through the liquid pump 10802 for discharge, and then the water is led to the polished surface of the polysilicon block body 10306 for dust reduction and temperature reduction.

[0037] When it is necessary to grind the other side of the polysilicon block body 10306, the servo motor 10906 is controlled by rotating the controller 10907 to work, and then the servo motor 10906 drives the limiting top plate 10908 to rotate accordingly, thereby driving the polysilicon block body 10306 to rotate, and then the other side of the polysilicon block body 10306 is grinded. Finally, after the surface of the polysilicon block body 10306 is completely polished, the polysilicon block body 10306 can be clamped and taken out by the clamping and transferring assembly 104.

[0038] The above description is only a preferred specific implementation manner of the present invention, but the protection scope of the present invention is not limited thereto. Any technician familiar with the technical field can make equivalent replacements or changes within the technical scope disclosed by the present invention according to the technical scheme and the utility model concept of the present invention, which should be covered by the protection scope of the present invention.

Claims

1. A polysilicon surface polishing device, characterized in that: include: A polysilicon polishing mechanism (1), the polysilicon polishing mechanism (1) comprising a mounting platform (101), a control panel (102) being mounted on the surface of the mounting platform (101), a material loading and transporting assembly (103) being mounted on the top of the mounting platform (101), a clamping and transferring assembly (104) being mounted on the top of the mounting platform (101), and the clamping and transferring assembly (104) being located on one side of the material loading and transporting assembly (103), and a processing box (102) being mounted on the top of the mounting platform (101). 105), an electric control door (106) is installed on one side of the processing box (105), a control panel (107) is installed on the surface of the processing box (105), a grinding and cleaning component (108) is installed on the surface of the processing box (105), a clamping adjustment component (109) is installed inside the processing box (105), a surface grinding component (110) is installed on the inner side of the processing box (105), and a liquid collecting tank (111) is installed inside the processing box (105).

2. A polysilicon surface polishing device according to claim 1, characterized in that: The loading and transporting assembly (103) comprises a supporting column (10301), an installation frame (10302), an electrically controlled transport belt (10303), a transport controller (10304), a transport guide plate (10305) and a polycrystalline silicon block body (10306), wherein the supporting column (10301) is fixedly connected to the mounting platform (101), the installation frame (10302) is fixedly installed on the top of the supporting column (10301), and the electrically controlled transport belt (10303) is connected to the mounting platform (101). The electrically controlled conveyor belt (10303) is installed on the installation frame (10302), the transport controller (10304) is installed on one end of the installation frame (10302), the transport guide plate (10305) is fixedly installed on the surface of the installation frame (10302), and the transport guide plate (10305) is used in conjunction with the electrically controlled conveyor belt (10303), and the polycrystalline silicon block body (10306) is arranged on the electrically controlled conveyor belt (10303).

3. The polysilicon surface polishing device according to claim 1, characterized in that: The clamping and transferring assembly (104) comprises a fixed frame (10401), a transverse electric control rail (10402), a connecting seat (10403), a longitudinal electric control rail (10404), a transfer controller (10405) and a clamping component (10406); the fixed frame (10401) is fixedly connected to the mounting platform (101); the transverse electric control rail (10402) is installed on the fixed frame (10401); the connecting seat (10403) is installed on the transverse electric control rail (10402); the longitudinal electric control rail (10404) is installed on the connecting seat (10403); the transfer controller (10405) is installed on the surface of the connecting seat (10403); and the clamping component (10406) is installed on the longitudinal electric control rail (10404).

4. The polysilicon surface polishing device according to claim 1, characterized in that: The polishing and cleaning component (108) comprises a liquid storage tank (10801), a liquid extraction pump (10802), a connecting pipe (10803) and a liquid discharge nozzle (10804); the liquid storage tank (10801) is fixedly mounted on the processing box (105); the liquid extraction pump (10802) is mounted on the processing box (105), and one end of the liquid extraction pump (10802) is connected to the interior of the liquid storage tank (10801); the connecting pipe (10803) is connected to the other end of the liquid extraction pump (10802); the liquid discharge nozzle (10804) is mounted on the top of the inner side of the processing box (105), and the liquid discharge nozzle (10804) is connected to one end of the connecting pipe (10803).

5. The polysilicon surface polishing device according to claim 1, characterized in that: The clamping and adjusting assembly (109) comprises a first electrically controlled slide rail (10901), a connecting platform (10902), a displacement controller (10903), a second electrically controlled slide rail (10904), a fixing seat (10905), a servo motor (10906), a rotation controller (10907) and a limiting top plate (10908), wherein the first electrically controlled slide rail (10901) is installed in the processing box (105), the connecting platform (10902) is installed on the top of the first electrically controlled slide rail (10901), and the displacement controller (10903) is installed on the top of the second electrically controlled slide rail (10904). It is installed on a connecting platform (10902), the second electrically controlled slide rail (10904) is installed on the top of the connecting platform (10902), and the number of the second electrically controlled slide rails (10904) is two, the fixed seat (10905) is installed on the second electrically controlled slide rail (10904), the servo motor (10906) is installed in the fixed seat (10905), the rotation controller (10907) is installed on the surface of the fixed seat (10905), and the limiting top plate (10908) is fixedly installed on the output end of the servo motor (10906).

6. The polysilicon surface polishing device according to claim 1, characterized in that: The surface grinding assembly (110) comprises an electric linear slide (11001), a mounting seat (11002), an electric-controlled lifting rod (11003), a lifting controller (11004), a grinder (11005), a grinding disc (11006) and a grinding controller (11007); the electric linear slide (11001) is installed in a processing box (105); the mounting seat (11002) is installed on the electric linear slide (11001); At the top, the electric-controlled lifting rod (11003) is installed in the mounting seat (11002), the lifting controller (11004) is installed on the surface of the mounting seat (11002), the grinder (11005) is fixedly installed on the output end of the electric-controlled lifting rod (11003), the grinding disc (11006) is installed on the output end of the grinder (11005), and the grinding controller (11007) is installed on the surface of the grinder (11005).

7. The polysilicon surface polishing device according to claim 3, characterized in that: The clamping member (10406) comprises a connecting rod (1040601), a connecting plate (1040602), a clamping controller (1040603), a sliding rod (1040604), a clamping plate (1040605) and an electrically controlled double-end telescopic rod (1040606), wherein the connecting rod (1040601) is connected to the longitudinal electrically controlled guide rail (10404), the connecting plate (1040602) is fixedly mounted on one end of the connecting rod (1040601), and the clamping controller (1040603) is installed On the surface of the connecting plate (1040602), the sliding rod (1040604) is slidably connected to the inner side of the connecting plate (1040602), and the number of the sliding rods (1040604) is two, the splint (1040605) is fixedly installed on the bottom end of the sliding rod (1040604), the electrically controlled double-end telescopic rod (1040606) is installed inside the connecting plate (1040602), and the two ends of the electrically controlled double-end telescopic rod (1040606) are respectively connected to the two sliding rods (1040604).

Citation Information

Patent Citations

  • Surface polishing device for monocrystal or polycrystalline silicon materials

    CN203887666U