Wet cleaning device
By setting up partitions and exhaust holes in the wet cleaning device, combined with the exhaust component and auxiliary exhaust component, the accumulation of volatile gas and by-product fallback caused by the small wind speed design of the exhaust equipment is solved, and the timely discharge of mixed gas is achieved and the protection of silicon wafer surface improves productivity.
Patent Information
- Application Number
- CN202421011945.9
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-05-10
- Publication Date
- 2025-02-07
- Estimated Expiration
- 2034-05-10
AI Technical Summary
In the prior art, the air speed of the exhaust equipment of the cleaning device is designed to be small, resulting in the inability to discharge volatile gases in time, the mixed gas leaks from the connecting gaps of the components, and the by-product fluorosiliic acid falls back to the surface of the silicon wafer, reducing the product yield.
Design a wet cleaning device, divide the box into an exhaust chamber and a cleaning chamber by setting up a partition, and set up an exhaust hole to connect the exhaust chamber and the cleaning chamber, and realize the mixed gas through the exhaust assembly and auxiliary exhaust assembly. Exhaust in time.
Reduces the accumulation of volatile gases, prevents mixed gas leakage, and reduces the risk of by-products falling back to the surface of the silicon wafer, thereby improving the cleaning quality and the yield of the silicon wafer.
Smart Images
Figure CN222428723U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to the technical field of photovoltaic silicon wafer manufacturing, in particular to a wet cleaning device. Background Art
[0002] In the production process of solar cell silicon wafers, a chain cleaning device is usually used to remove the borosilicate glass or phosphosilicate glass layer on the surface of the silicon wafer. The chemical agent used to remove the borosilicate glass or phosphosilicate glass layer is generally a hydrofluoric acid aqueous solution. When the roller at the bottom of the cleaning device drives the silicon wafer through the cleaning device, the back and side of the silicon wafer contact the hydrofluoric acid aqueous solution in the cleaning device, thereby removing the borosilicate glass or phosphosilicate glass layer on the surface of the silicon wafer. Since the hydrofluoric acid aqueous solution is very volatile, it will produce silicon tetrafluoride gas after reacting with the borosilicate glass or phosphosilicate glass on the surface of the silicon wafer. The mixture of the two gases is easy to form a mist gas and adsorb on the observation window and other parts of the cleaning device, thereby affecting the operator's observation of the inside of the cleaning device.
[0003] In the current technical solution, an exhaust device is usually used to exhaust the mixed gas in the cleaning device to reduce the deposition of by-products on components such as the observation window and to form a negative pressure environment. Considering that the silicon wafer is not only subjected to the thrust of the roller, but also to the resistance of the hydrofluoric acid aqueous solution to the movement of the silicon wafer, if its force system changes, it is easy to cause the hydrofluoric acid liquid to have insufficient contact area with the silicon wafer or to pass over the side of the silicon wafer to reach the front of the silicon wafer, resulting in incomplete or excessive removal of the borosilicate glass or phosphosilicate glass layer. Therefore, the wind speed of the exhaust device is usually designed to be relatively small to avoid affecting the force system of the silicon wafer.
[0004] However, since the wind speed of the exhaust equipment is usually designed to be low, the volatile gas cannot be discharged in time. As time goes by, the mixed gas accumulated in the cleaning device will gradually increase, causing the internal air pressure of the cleaning device to increase, and the mixed gas will leak from the connection gaps of the components. At the same time, the volatile gas of the hydrofluoric acid aqueous solution will react with the silicon tetrafluoride gas after mixing, and a large amount of by-product fluorosilicic acid will fall back to the surface of the silicon wafer, causing adverse effects on the front of the silicon wafer and reducing the product yield. Utility Model Content
[0005] The utility model aims to provide a wet cleaning device to solve the problem that the wind speed of the exhaust equipment of the cleaning device in the prior art is designed to be small, the volatile gas cannot be discharged in time, it is easy to cause the mixed gas to leak from the connection gaps of the components, and a large amount of by-product fluorosilicic acid will be generated and fall back to the surface of the silicon wafer, thereby resulting in a low production yield of the silicon wafer.
[0006] In order to solve the above technical problems, the technical solution adopted by the utility model is:
[0007] A wet cleaning device, comprising:
[0008] A cleaning box, comprising a box body, an observation window arranged on the box body, and a partition arranged in the box body, wherein the partition divides the box body into an exhaust chamber and a cleaning chamber arranged up and down, and the cleaning chamber is filled with a cleaning agent;
[0009] A roller assembly is horizontally arranged in the cleaning chamber and disposed near the top of the cleaning chamber, and is used to transport silicon wafers, and a portion of the roller assembly is immersed in the cleaning agent;
[0010] A plurality of exhaust holes are arranged on the partition and connect the exhaust cavity and the cleaning cavity, wherein in the height direction, the orthographic projection of the top end of the exhaust hole does not overlap with the orthographic projection of the bottom end;
[0011] The air extraction component is communicated with the exhaust cavity.
[0012] Furthermore, the partition is arranged obliquely in the cleaning box to form a relatively high end and a low end, and a plurality of the exhaust holes are arranged in a matrix on the partition and are disposed close to the high end.
[0013] Furthermore, the axis of the exhaust hole is perpendicular to the partition.
[0014] Furthermore, the axis of the exhaust hole is arranged to be inclined from the top end to the bottom end toward the high end of the partition.
[0015] Furthermore, the cross section of the exhaust hole is a rectangle with a side length of 1 cm to 2 cm.
[0016] Further, the box body includes a top wall and a bottom wall arranged oppositely, a front wall and a rear wall arranged oppositely, and two side walls arranged oppositely;
[0017] The high end of the partition is installed on the rear wall, the low end of the partition is installed on the front wall, the observation window is arranged on the front wall and is located below the low end of the partition, and the exhaust assembly is installed on the rear wall and is located above the high end of the partition.
[0018] Furthermore, it also includes an auxiliary exhaust component, and the auxiliary exhaust component is connected to the cleaning chamber.
[0019] Further, the auxiliary exhaust assembly is arranged on the rear wall and is located below the high end of the partition.
[0020] Furthermore, the partition is detachably mounted on the box body, and a handle is also provided on the partition, and the handle is arranged close to the low end.
[0021] Furthermore, a confluence groove is also provided on the lower end of the partition.
[0022] Due to the application of the above technical solution, the beneficial effects of the present application compared with the prior art are:
[0023] A wet cleaning device provided in the present application divides a box into an exhaust chamber and a cleaning chamber by setting a partition, thereby reducing the volatilization space of the cleaning agent, thereby reducing volatilization, avoiding waste of cleaning agent due to excessive volatilization, reducing costs, and reducing by-products produced by mixed gas reactions.
[0024] At the same time, by setting exhaust holes on the separator, the mixed gas can enter the exhaust chamber to avoid accumulation in the cleaning chamber, prevent the mixed gas from leaking from the connection gaps of the components or adhering to the observation window to affect the operator's observation. The mixed gas can be discharged in time without increasing the wind speed of the exhaust component, avoiding changes in the force system of the silicon wafer, thereby improving the cleaning quality.
[0025] In addition, in the height direction, the orthographic projection of the top of the exhaust hole does not overlap with the orthographic projection of the bottom, that is, the exhaust hole is tilted in the cleaning box to prevent the by-products produced by the mixed gas reaction from falling directly back to the surface of the silicon wafer and causing contamination to the silicon wafer, thereby improving the production yield of the silicon wafer. BRIEF DESCRIPTION OF THE DRAWINGS
[0026] In order to more clearly illustrate the specific implementation methods of the utility model or the technical solutions in the prior art, the drawings required for use in the specific implementation methods or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are some implementation methods of the utility model. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.
[0027] Figure 1 It is a schematic cross-sectional structural diagram of a wet cleaning device shown in an embodiment of the utility model.
[0028] 1-box body; 11-top wall; 12-bottom wall; 13-rear wall; 15-side wall; 3-partitioning piece; 31-handle; 32-partitioning body; 4-exhaust hole; 5-roller assembly; 6-exhaust chamber; 7-cleaning chamber; 8-exhaust assembly. DETAILED DESCRIPTION
[0029] In order to enable those skilled in the art to better understand the solution of the present application, the technical solution in the embodiments of the present application will be clearly and completely described below in conjunction with the drawings in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, not all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by ordinary technicians in this field without creative work should fall within the scope of protection of the present application.
[0030] It should be noted that the terms "first", "second", etc. in the specification and claims of the present application and the above-mentioned drawings are used to distinguish similar objects, and are not necessarily used to describe a specific order or sequential order. It should be understood that the data used in this way can be interchanged where appropriate, so that the embodiments of the present application described here. In addition, the terms "including" and "having" and any of their variations are intended to cover non-exclusive inclusions, for example, a process, method, system, product or device comprising a series of steps or units is not necessarily limited to those steps or units clearly listed, but may include other steps or units that are not clearly listed or inherent to these processes, methods, products or devices.
[0031] In this application, the terms "upper", "lower", "left", "right", "front", "back", "top", "bottom", "inner", "outer", "middle", "vertical", "horizontal", "lateral", "longitudinal" and the like indicate positions or positional relationships based on the positions or positional relationships shown in the drawings. These terms are mainly used to better describe the utility model and its embodiments, and are not used to limit the indicated devices, elements or components to have a specific orientation, or to be constructed and operated in a specific orientation.
[0032] In addition, some of the above terms may be used to express other meanings in addition to indicating orientation or positional relationship. For example, the term "on" may also be used to express a certain dependency or connection relationship in some cases. For those skilled in the art, the specific meanings of these terms in this utility model can be understood according to specific circumstances.
[0033] In addition, the terms "installed", "set", "provided with", "connected", "connected", and "socketed" should be understood in a broad sense. For example, it can be a fixed connection, a detachable connection, or an integral structure; it can be a mechanical connection, or an electrical connection; it can be a direct connection, or an indirect connection through an intermediate medium, or it can be an internal connection between two devices, elements, or components. For those of ordinary skill in the art, the specific meanings of the above terms in this utility model can be understood according to specific circumstances.
[0034] It should be noted that, in the absence of conflict, the embodiments and features in the embodiments of the present application can be combined with each other. The present application will be described in detail below with reference to the accompanying drawings and in combination with the embodiments.
[0035] See also Figure 1 An embodiment of the present application provides a wet cleaning device, which includes a cleaning box, a roller assembly 5, a plurality of exhaust holes 4 and an exhaust assembly 8.
[0036] Specifically, the cleaning box includes a box body 1, an observation window (not shown) arranged on the box body 1 and a partition 3 arranged in the box body 1. The partition 3 divides the box body 1 into an exhaust chamber 6 and a cleaning chamber 7 arranged vertically. The cleaning chamber 7 is filled with a cleaning agent (not shown).
[0037] The above cleaning agent can be a hydrofluoric acid aqueous solution, which has strong volatility. After the hydrofluoric acid aqueous solution reacts with the borosilicate glass or phosphosilicate glass on the surface of the silicon wafer, silicon tetrafluoride gas is generated. After the silicon tetrafluoride gas is mixed with the volatile gas of the hydrofluoric acid aqueous solution, a byproduct of fluorosilicic acid is generated. All of them are existing known chemical agents and are not described in detail here.
[0038] A plurality of exhaust holes 4 are provided on the partition 3 and connect the exhaust chamber 6 and the cleaning chamber 7. In the height direction, the orthographic projection of the top end of the exhaust hole 4 does not overlap with the orthographic projection of the bottom end, so that the byproduct fluorosilicic acid produced in the exhaust chamber 6 will not directly fall back to the surface of the silicon wafer, thereby avoiding affecting the surface of the silicon wafer.
[0039] At the same time, it can be known from the above that the byproduct fluorosilicic acid will be produced by the reaction after the silicon tetrafluoride gas and the volatile gas of the hydrofluoric acid aqueous solution are mixed. In order to prevent the byproduct fluorosilicic acid from flowing back from the exhaust hole 4 into the cleaning chamber 7. In this embodiment, the partition 3 is arranged obliquely in the cleaning box to form a relatively arranged high end and a low end, and a plurality of exhaust holes 4 are arranged in a matrix on the partition 3 and are arranged close to the high end, so that the byproduct fluorosilicic acid flows to the low end of the partition 3 under the action of gravity, and avoids flowing back from the exhaust hole 4 into the cleaning chamber 7.
[0040] In this embodiment, a confluence trough (not shown) is also provided on the lower end of the separator 3. Under the guidance of the separator 3, the by-product fluorosilicic acid will be collected into the reflux trough under the action of gravity, which is convenient for subsequent recovery and treatment.
[0041] In an optional embodiment, the axis of the exhaust hole 4 is perpendicular to the partition 3, and the exhaust hole 4 is tiltedly arranged in the cleaning box only by tilting the partition 3.
[0042] In another optional embodiment, the axis of the exhaust hole 4 is arranged to be inclined from the top to the bottom toward the high end of the partition 3. This application does not make any specific limitation to this, and it can be adjusted according to actual needs.
[0043] In this embodiment, the cross-section of the exhaust hole 4 is a rectangle with a side length of 1 cm to 2 cm. In other embodiments, the cross-section of the exhaust hole 4 may also be circular, elliptical or triangular. The present application does not specifically limit the shape and size of the exhaust hole 4.
[0044] The roller assembly 5 is arranged horizontally in the cleaning chamber 7 and is arranged near the top of the cleaning chamber 7 for conveying silicon wafers, and part of the roller assembly 5 is immersed in the cleaning agent. It should be noted that the roller assembly 5 is used to connect with the conveying line to continuously convey the silicon wafers into the cleaning chamber 7. It is a conventional structure.
[0045] In the process of removing the borosilicate glass or phosphosilicate glass layer on the surface of the silicon wafer, when the roller assembly 5 rotates, it can drive the silicon wafer thereon to move. Since part of the roller assembly 5 is immersed in the cleaning agent, when the roller assembly rotates, the side of the roller originally immersed in the cleaning agent will rotate to contact the silicon wafer, and the other side of the roller will be immersed in the cleaning agent after rotation, and after the cleaning agent is attached, it will continue to contact the silicon wafer under continuous rotation. This cycle allows the cleaning liquid attached to the roller to remove the borosilicate glass or phosphosilicate glass layer on the surface of the silicon wafer, and leave the cleaning chamber 7 to the next workstation under the continuous rotation of the roller assembly 5.
[0046] In this embodiment, the box body 1 includes a top wall 11 and a bottom wall 12 arranged oppositely, a front wall (not shown) and a rear wall 13 arranged oppositely, and two side walls 15 arranged oppositely. The high end of the partition 3 is installed on the rear wall 13, and the low end of the partition 3 is installed on the front wall. The observation window is arranged on the front wall and is located below the low end of the partition 3. The exhaust assembly 8 is installed on the rear wall 13 and is located above the high end of the partition 3.
[0047] The air extraction assembly 8 is connected to the exhaust chamber 6 and is used to extract the mixed gas in the box body 1. It is suitable for generating an airflow from the cleaning chamber 7 into the exhaust hole 4 and flowing to the exhaust chamber 6 under the action of a power member (not shown). In detail, the air extraction assembly 8 includes a plurality of fans, and the power member is specifically a motor, which is a conventional setting and will not be described in detail here.
[0048] In order to further improve the exhaust rate of the mixed gas in the cleaning chamber 7, in this embodiment, the wet cleaning device further includes an auxiliary exhaust assembly (not shown), which is connected to the cleaning chamber 7. Specifically, the auxiliary exhaust assembly is arranged on the rear wall 13 and is located below the high end of the partition 3. In this embodiment, the structure of the auxiliary exhaust assembly is the same as that of the exhaust assembly 8, and will not be described in detail here.
[0049] The air extraction assembly 8 and the auxiliary exhaust assembly are arranged on the rear wall 13 where the high end of the partition 3 is located, so that the mixed gas is easier to be discharged under the guidance of the partition 3. In the process of discharging the mixed gas, the mixed gas near the air extraction assembly 8 and the auxiliary exhaust assembly is easy to be extracted, which makes the air pressure there lower, while the mixed gas far away from the air extraction assembly 8 and the auxiliary exhaust assembly is not easy to be extracted, which makes the air pressure there higher, thereby forming an obvious air pressure difference between the position near the air extraction assembly 8 and the auxiliary exhaust assembly and the position far away from the air extraction assembly 8, thereby the mixed gas far away from the air extraction assembly 8 and the auxiliary exhaust assembly can actively approach the air extraction assembly 8 and the auxiliary exhaust assembly, that is, autonomously flow to the air extraction assembly 8 and the auxiliary exhaust assembly, so as to further improve the discharge efficiency of the mixed gas.
[0050] In order to facilitate the cleaning of the drum assembly and the separator 3, in this embodiment, the separator 3 is detachably mounted on the housing 1, and a handle 31 is also provided on the separator 3, and the handle 31 is provided near the lower end. Specifically, the separator 3 and the housing 1 are connected by plug-in connection, snap-on connection or threaded connection, which is not limited in this application. In order to facilitate the disassembly and assembly of the separator 3, in this embodiment, the separator 3 includes a plurality of separators 32, and the plurality of separators 32 are independent of each other, or the plurality of separators 32 are detachably connected.
[0051] Finally, it should be noted that the above are only preferred embodiments of the present invention and are not intended to limit the present invention. Although the present invention has been described in detail with reference to the aforementioned embodiments, those skilled in the art can still modify the technical solutions described in the aforementioned embodiments or make equivalent substitutions for some of the technical features therein. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the present invention should be included in the protection scope of the present invention.
Claims
1. A wet cleaning device, characterized in that: include: A cleaning box, comprising a box body, an observation window arranged on the box body, and a partition arranged in the box body, wherein the partition divides the box body into an exhaust cavity and a cleaning cavity arranged up and down, and the cleaning cavity is filled with a cleaning agent; A roller assembly is horizontally arranged in the cleaning chamber and disposed near the top of the cleaning chamber, and is used to transport silicon wafers, and a portion of the roller assembly is immersed in the cleaning agent; A plurality of exhaust holes are arranged on the partition and connect the exhaust cavity and the cleaning cavity, wherein in the height direction, the orthographic projection of the top end of the exhaust hole does not overlap with the orthographic projection of the bottom end; The air extraction component is communicated with the exhaust cavity.
2. A wet cleaning device as claimed in claim 1, characterized in that: The partition is arranged obliquely in the cleaning box to form a relatively high end and a low end, and a plurality of exhaust holes are arranged in a matrix on the partition and are disposed close to the high end.
3. A wet cleaning device as claimed in claim 2, characterized in that: An axis of the exhaust hole is perpendicular to the partition.
4. A wet cleaning device as claimed in claim 2, characterized in that: The axis of the exhaust hole is arranged to be inclined from the top end to the bottom end toward the high end of the partition.
5. A wet cleaning device as claimed in claim 3 or 4, characterized in that: The cross section of the exhaust hole is a rectangle with a side length of 1 cm to 2 cm.
6. A wet cleaning device as claimed in claim 2, characterized in that: The box body comprises a top wall and a bottom wall arranged oppositely, a front wall and a rear wall arranged oppositely, and two side walls arranged oppositely; The high end of the partition is installed on the rear wall, the low end of the partition is installed on the front wall, the observation window is arranged on the front wall and is located below the low end of the partition, and the exhaust assembly is installed on the rear wall and is located above the high end of the partition.
7. A wet cleaning device as claimed in claim 6, characterized in that: It also includes an auxiliary exhaust component, which is communicated with the cleaning chamber.
8. A wet cleaning device as claimed in claim 7, characterized in that: The auxiliary exhaust assembly is disposed on the rear wall and below the high end of the partition.
9. A wet cleaning device as claimed in claim 2, characterized in that: The partition is detachably mounted on the box body, and a handle is also provided on the partition, and the handle is arranged close to the low end.
10. A wet cleaning device as claimed in claim 2, characterized in that: A confluence groove is also arranged on the lower end of the partition.