Isolation device and semiconductor equipment
By setting up an isolation device in the reaction chamber of the semiconductor equipment, the reaction chamber is separated into two parts of the space, the maintenance of the swing valve is achieved without interrupting production and without changing the chamber conditions, and the production during the swing valve maintenance is solved The problems of interruption and changes in chamber conditions improve production efficiency and system stability.
Patent Information
- Application Number
- CN202421277514.7
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-06-05
- Publication Date
- 2025-02-14
- Estimated Expiration
- 2034-06-05
AI Technical Summary
In semiconductor equipment, maintenance and troubleshooting of swing valves requires stopping major equipment, resulting in interruptions in production processes and changes in chamber conditions, affecting the performance of other equipment, and increasing maintenance costs and complexity.
Design an isolation device, including an isolation valve body and a driving mechanism, the isolation valve body is located in the reaction chamber close to the swing valve, and the distance between the isolation cover and the inner wall of the reaction chamber is adjusted through the driving mechanism, and the reaction chamber is divided into two parts of the space, only in the Some of the spaces are maintained for the pendulum valve.
It realizes safe and effective maintenance of the swing valve without interrupting the production process and without changing the chamber conditions, reduces maintenance costs, improves production efficiency, and enhances the stability and reliability of the fluid control system.
Smart Images
Figure CN222479638U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to the field of semiconductor equipment, in particular to an isolation device and semiconductor equipment. Background Art
[0002] In semiconductor production and process control, pendulum valves are widely used in various fluid control systems as an important control element. The design of pendulum valves allows them to adjust the flow and direction of fluids (such as gas, liquid, etc.) by rotating or swinging, thereby achieving precise process control. However, with the long-term operation of the pendulum valve and changes in the working environment, its performance may be affected, so regular maintenance and troubleshooting are required.
[0003] Currently, when troubleshooting a pendulum valve, equipment engineers need to stop the turbine and drain the vent chamber to remove the valve cover for internal inspection and repair. However, if the chamber condition is good and only the valve body needs to be maintained, performing this operation will cause the chamber condition of the reaction chamber to change. Therefore, after the pendulum valve maintenance or troubleshooting, the reaction chamber must be prevented from maintenance (PM). Although the above method can ensure the safety of the maintenance process, it also brings some potential problems. First, stopping the main equipment (such as the turbine) will interrupt the entire production process, resulting in production stoppages and reduced output. For industrial processes with continuous production, this interruption may cause serious economic losses. Second, draining the chamber will change the conditions in the chamber (such as temperature, pressure, etc.), which may affect the performance of other equipment or pipelines connected to the pendulum valve. If the chamber conditions change too much, additional preventive maintenance (PM) may be required for the entire system, which further increases the cost and complexity of maintenance.
[0004] Therefore, an isolation device and a semiconductor device are urgently needed to improve the above problems. Utility Model Content
[0005] The utility model aims to provide an isolation device and a semiconductor device, which can realize safe and effective maintenance of a swing valve without interrupting the production process and changing the chamber conditions.
[0006] In a first aspect, the utility model provides an isolation device, which is applied to a semiconductor device, wherein the semiconductor device comprises a reaction chamber and a swing valve connected to each other, including an isolation valve body;
[0007] The isolation valve body is located in the reaction chamber and is arranged close to the swing valve;
[0008] The isolation valve body includes an isolation cover and a driving mechanism connected to each other;
[0009] The isolation cover and the driving mechanism are both arranged in the reaction chamber, and the isolation cover is arranged close to the swing valve relative to the driving mechanism;
[0010] The driving mechanism is used to adjust the distance between the isolation cover and the inner wall of the reaction chamber so that the end surface of the isolation cover and part of the inner wall of the reaction chamber are in conflict with each other, so as to separate the reaction chamber into a first space and a second space, and the second space is used for swing valve maintenance.
[0011] The beneficial effects of the utility model are as follows: an isolation valve body is arranged near the swing valve in the reaction chamber of the semiconductor device; the isolation valve body includes an isolation cover and a driving mechanism connected to each other; the isolation cover and the driving mechanism are both arranged in the reaction chamber, and the isolation cover is arranged near the swing valve relative to the driving mechanism; the driving mechanism is used to adjust the distance between the isolation cover and the inner wall of the reaction chamber so that the end face of the isolation cover and a part of the inner wall of the reaction chamber are in conflict with each other, so as to separate the reaction chamber into a first space and a second space, and the second space is used for the maintenance of the swing valve. The isolation cover and a part of the inner wall of the reaction chamber are controlled by the driving structure to conflict with each other, so as to separate the reaction chamber into a first space and a second space, and the second space is used for the maintenance of the swing valve. Before and after the maintenance, only the vacuum environment of the second space is changed, and the vacuum environment of the first space is not affected, so as to ensure the stability of the overall environment of the chamber, and to achieve safe and effective maintenance of the swing valve without interrupting the production process and changing the chamber conditions, which not only improves the production efficiency and reduces the maintenance cost, but also enhances the stability and reliability of the entire fluid control system.
[0012] Optionally, the top of the isolation cover is connected to the bottom of the biasing device of the reaction chamber through the driving mechanism so as to be centrally arranged in the reaction chamber. The beneficial effect is that by centrally arranging the isolation valve body in the reaction chamber, the telescopic distance of the driving mechanism can be reduced, and the contact stability between the isolation cover and the inner wall of the reaction chamber can be improved, thereby improving the isolation effect.
[0013] Optionally, a sealing ring is also included;
[0014] The sealing ring is arranged on the end surface of the isolation cover or on the inner wall of the reaction chamber, and is used to form a seal when the isolation cover contacts the inner wall of the reaction chamber. The beneficial effect is that by arranging the sealing ring between the end surface of the isolation cover and part of the inner wall of the reaction chamber, the isolation effect can be improved, and the backflow of particles in the turbine can be further prevented.
[0015] Optionally, it also includes sensors and controllers;
[0016] The sensor and the driving mechanism are electrically connected to the controller respectively;
[0017] The sensor is used to monitor the working state of the swing valve;
[0018] The controller is used to control the drive mechanism to start when the sensor detects that the swing valve has failed, so that the end surface of the isolation cover and the part of the inner wall of the reaction chamber collide with each other, so as to separate the reaction chamber into a first space and a second space, and the second space is used for swing valve maintenance. The beneficial effect is that by setting the sensor and the controller, the drive mechanism can be automatically controlled to start when the swing valve fails, so as to separate the reaction chamber into two independent spaces. Before and after maintenance, only the vacuum environment of one of the spaces needs to be changed, so as to ensure the stability of the overall environment of the chamber and reduce losses.
[0019] Optionally, a communication module is also included;
[0020] The communication module is electrically connected to the controller;
[0021] The controller is also used to receive the instruction for controlling the start of the driving mechanism through the communication module. The beneficial effect is that by setting up the communication module and using the communication module to receive the instruction for controlling the start of the driving mechanism, it is convenient for the equipment engineer to isolate the reaction chamber and the swing valve according to actual needs during regular maintenance, thereby improving the maintenance efficiency.
[0022] Optionally, it also includes an air flow hole and a control valve;
[0023] The air flow hole is arranged in the second space, and the air flow hole is communicated with the control valve;
[0024] The gas flow hole is used to purge gas after the gas is introduced to adjust the gas pressure of the second space;
[0025] The control valve is used to control the type and flow rate of the gas entering the gas flow hole. The beneficial effect is that by arranging the gas flow hole in the isolation cover and using the control valve to control the type and flow rate of the gas in the gas flow hole, it is convenient to adjust the gas pressure of the second space, thereby balancing the pressure difference between the inside and outside of the swing valve cover, so that the swing valve cover can be disassembled for maintenance.
[0026] Optionally, the isolation cover and the driving mechanism are fixedly connected or detachably connected, and / or the driving mechanism and the biasing device are detachably connected. The beneficial effect is that by arranging that the isolation cover and the driving mechanism are detachable, and the driving mechanism and the biasing device are detachable, it is convenient to clean after disassembly.
[0027] Optionally, the side of the isolation cover facing the swing valve is a concave surface, and the isolation cover is an arc-shaped cover, a cone-shaped cover or a stepped cover. The beneficial effect is that by setting the side of the isolation cover facing the swing valve to be a concave surface, and the isolation cover is an arc-shaped cover, a cone-shaped cover or a stepped cover, it is possible to reduce the adhesion of particles and facilitate cleaning.
[0028] Optionally, the surface of the isolation cover and the surface of the drive mechanism are both provided with a metal protective layer. The beneficial effect is that by providing the metal protective layer on the surface of the isolation cover and the surface of the drive mechanism, the isolation valve body itself can be prevented from being etched by the etching gas to generate particles and damage.
[0029] In a second aspect, the utility model further provides a semiconductor device, comprising an isolation device, a swing valve and a reaction chamber in any possible combination of the above-mentioned first aspect;
[0030] The isolation valve body of the isolation device is located in the reaction chamber and is arranged close to the swing valve to separate the reaction chamber into a first space and a second space, and the second space is used for swing valve maintenance.
[0031] For the beneficial effects of the second aspect, reference may be made to the description of the first aspect. BRIEF DESCRIPTION OF THE DRAWINGS
[0032] Figure 1 A schematic diagram of the structure of an isolation device provided in an embodiment of the utility model;
[0033] Figure 2 A schematic diagram of the use process of the isolation device provided in an embodiment of the utility model;
[0034] Figure 3 A top view of an isolation cover of an isolation device provided in an embodiment of the utility model;
[0035] Figure 4 A schematic diagram of the principle of the isolation device provided by the embodiment of the utility model;
[0036] Figure 5 A cross-sectional view in the vertical direction of an isolation cover of an isolation device provided in an embodiment of the utility model;
[0037] Figure 6 A vertical cross-sectional view of another isolation cover of the isolation device provided in an embodiment of the utility model.
[0038] Description of reference numerals:
[0039] 1. Isolation valve body; 2. Reaction chamber; 3. Swing valve; 4. Bias device; 5. Turbine; 6. Pumping pipeline; 7. Controller; 8. Sensor; 9. Communication module;
[0040] 11. Driving mechanism; 12. Isolation cover; 13. Connecting wire. DETAILED DESCRIPTION
[0041] In order to make the purpose, technical solution and advantages of the utility model clearer, the technical solution in the embodiment of the utility model will be clearly and completely described below in conjunction with the drawings of the utility model. Obviously, the described embodiment is a part of the embodiment of the utility model, not all of the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by ordinary technicians in this field without making creative work are within the scope of protection of the utility model. Unless otherwise defined, the technical terms or scientific terms used herein should be understood by people with general skills in the field to which the utility model belongs. "Including" and similar words used in this article mean that the elements or objects appearing before the word include the elements or objects listed after the word and their equivalents, without excluding other elements or objects.
[0042] In view of the problems existing in the existing technology, such as Figure 1-3 As shown, the utility model provides an isolation device, which is applied to semiconductor equipment, wherein the semiconductor equipment includes a reaction chamber 2 and a swing valve 3 connected to each other, and the isolation device includes an isolation valve body 1; the isolation valve body 1 is located in the reaction chamber 2 and is arranged close to the swing valve 3; the isolation valve body 1 includes a connected isolation cover 12 and a driving mechanism 11 (such as a driving motor or a driving cylinder); the isolation cover 12 and the driving mechanism 11 are both arranged in the reaction chamber 2, and the top of the isolation cover 12 is connected to the bottom of the biasing device 4 of the reaction chamber 2 through the driving mechanism 11, so as to be centrally arranged in the reaction chamber 2 and located above the connection between the reaction chamber 2 and the swing valve 3; when the swing valve 3 needs to be maintained, the driving mechanism 11 is started and continuously extended so that the isolation cover 12 moves toward the swing valve 3. During this process, the distance between the isolation cover 12 and the inner wall of the reaction chamber 2 is continuously reduced until the end face of the isolation cover 12 conflicts with part of the inner wall of the reaction chamber 2, that is, from Figure 1 The displayed state moves to Figure 2 The state shown is to divide the reaction chamber 2 into a first space (i.e. Figure 2 The space above the isolation cover 12 shown in the figure) and the second space with a smaller proportion (i.e. Figure 2The space below the isolation cover 12 shown in the figure), and the second space is used for the maintenance of the swing valve 3 (that is, during maintenance, only air is ventilated into the second space to balance the pressure difference on both sides of the swing valve cover, thereby maintaining the swing valve 3), and the smaller the proportion of the second space, the smaller the impact on the overall environment of the chamber during maintenance, and the higher the stability of the chamber environment. Before and after maintenance, only the vacuum environment of the second space with a small proportion is changed, and the environment of the first space is not affected (that is, the first space maintains a vacuum environment before and after maintenance), thereby ensuring the stability of the overall environment of the chamber. Without interrupting the production process and changing the chamber conditions, the swing valve 3 can be safely and effectively maintained without the need for additional preventive maintenance (PM), which not only improves production efficiency and reduces maintenance costs, but also enhances the stability and reliability of the entire fluid control system. In addition, by centrally arranging the isolation valve body 1 in the reaction chamber 2, the telescopic distance of the drive mechanism 11 can be reduced, and the stability of the contact between the isolation cover 12 and the inner wall of the reaction chamber 2 can be improved, thereby improving the isolation effect. It is worth noting that, Figure 3 As shown, when the driving mechanism 11 is a driving motor, the connecting wire 13 is a signal wire and a power wire, and when the driving mechanism 11 is a driving cylinder, the connecting wire 13 is a signal wire and an air pipe.
[0043] In some embodiments, in order to further improve the isolation effect and further prevent the backflow of particulate matter in the turbine 5, the isolation device also includes a sealing ring (not shown); the sealing ring is arranged on the end face of the isolation cover 12 or on the inner wall of the reaction chamber 2 (such as a detachable connection to facilitate regular replacement of the sealing ring to ensure sealing), and is used to form a seal when the isolation cover 12 and the inner wall of the reaction chamber 2 are in contact.
[0044] In some embodiments, Figure 4 As shown, in order to automatically control the drive mechanism 11 to start when the swing valve 3 fails, so as to separate the reaction chamber 2 into a first space and a second space, and the second space is used for the maintenance of the swing valve 3, to ensure the stability of the internal environment of the reaction chamber 2 and reduce losses, the isolation device also includes a sensor 8 and a controller 7; the sensor 8 and the drive mechanism 11 are electrically connected to the controller 7 respectively; the sensor 8 (such as a voltage probe or a position sensor) is used to monitor the working state of the swing valve 3; the controller 7 is used to control the drive mechanism 11 to start when the sensor 8 detects that the swing valve 3 fails, so that the end surface of the isolation cover 12 and the part of the inner wall of the reaction chamber 2 are in conflict, so as to separate the reaction chamber 2 into the first space and the second space, and the second space is used for the maintenance of the swing valve 3. Exemplarily, the working voltage of the swing valve 3 can be monitored by a voltage probe, and when the working voltage changes beyond a threshold value, it is determined that the swing valve 3 has a fault, and the position change of the swing valve 3 can also be monitored by a position sensor, and when the position change deviates (such as exceeding a threshold value), it is determined that the swing valve 3 has a fault.
[0045] In some embodiments, Figure 4 As shown, in order to facilitate the equipment engineer to isolate the reaction chamber 2 and the swing valve 3 according to actual needs during regular maintenance, thereby improving maintenance efficiency, the isolation device also includes a communication module 9; the communication module 9 is electrically connected to the controller 7; the controller 7 is also used to receive an instruction to control the start of the drive mechanism 11 through the communication module 9; wherein the instruction to control the start of the drive mechanism 11 can be generated by a semiconductor device, or by a mobile terminal (such as a mobile phone of an equipment engineer or a smart wearable device such as a bracelet).
[0046] In some embodiments, in order to facilitate the adjustment of the gas pressure of the second space, so as to balance the pressure difference between the inside and outside of the swing valve cover, so as to remove the swing valve cover for maintenance, the isolation device also includes an air flow hole (not shown) and a control valve (not shown); the air flow hole is arranged in the second space (such as on the inner wall of the isolation cover 12 or on part of the inner wall of the reaction chamber 2), and the air flow hole is connected to the control valve; the air flow hole is used to purge the gas after the gas is introduced to adjust the gas pressure of the second space; the control valve is used to control the type and flow rate of the gas introduced into the air flow hole. It is worth noting that after the reaction chamber 2 and the swing valve 3 are closed, the internal environment of the reaction chamber 2 is vacuum, that is, the closed space (i.e., the second space) formed by the isolation cover 12 after it moves down and part of the inner wall of the reaction chamber 2 is vacuum, while the space where the swing valve 3 is located is non-vacuum. Therefore, before removing the swing valve cover, it is necessary to ventilate the second space through the air flow hole to balance the pressure difference between the inside and outside of the swing valve cover, so as to remove the swing valve cover for maintenance. It is worth noting that when the air flow holes are arranged on the inner wall of the isolation cover 12, since the air flow holes need to move up and down with the isolation cover 12, it is necessary to use a hose / telescopic tube to achieve this; and when the air flow holes are directly arranged on part of the inner wall of the reaction chamber 2, there is no need to consider the movement of the air flow holes, the structure is simpler, easier to implement, and has high stability.
[0047] In some specific embodiments, the isolation cover 12 and the driving mechanism 11 are fixedly connected (such as fixed connection methods such as welding or integral molding) or detachably connected (such as detachable connection methods such as threads and snap-fitting), and / or the driving mechanism 11 and the biasing device 4 are detachably connected. The isolation cover 12 and the driving mechanism 11 are detachable, and the driving mechanism 11 and the biasing device 4 are detachable, which is convenient for cleaning after disassembly.
[0048] In some embodiments, in order to reduce the adhesion of particles and facilitate cleaning, the side of the isolation cover 12 facing the swing valve 3 is concave, and the isolation cover 12 is an arc-shaped cover, a conical cover or a stepped cover. Figure 5 As shown, the stepped cover is composed of curved surfaces with different curvatures, or as Figure 6As shown, the stepped cover is composed of inclined surfaces with different slopes. It should be understood that the stepped cover can also be composed of two or more different inclined surfaces or curved surfaces.
[0049] In some embodiments, in order to prevent the isolation valve body 1 itself from being etched by etching gas to generate particles and be damaged, the surface of the isolation cover 12 and the surface of the driving mechanism 11 are both provided with a metal protective layer (such as yttrium oxide).
[0050] Based on the above isolation device, such as Figure 2 As shown, the utility model also provides a semiconductor device, comprising the isolation device, the swing valve 3, the reaction chamber 2, the turbine 5 and the pumping pipeline 6; the isolation device is arranged on the isolation valve body 1 between the reaction chamber 2 and the swing valve 3, the turbine 5 is arranged below the swing valve 3, and the pumping pipeline 6 is arranged below the turbine 5, which can not only automatically control the start of the driving mechanism 11 when the swing valve 3 fails, but also adjust the distance between the isolation cover 12 and the inner wall of the reaction chamber 2, so that the end surface of the isolation cover 12 and the part of the inner wall of the reaction chamber 2 are in conflict, thereby dividing the reaction chamber 2 into a first space with a large proportion (i.e. Figure 2 The space above the isolation cover 12 shown in the figure) and the second space with a smaller proportion (i.e. Figure 2 The second space is used for the maintenance of the swing valve 3. The second space is used for the maintenance of the swing valve. Before and after the maintenance, only the vacuum environment of the second space is changed, and the vacuum environment of the first space is not affected. The stability of the internal environment of the reaction chamber 2 is ensured, the loss is reduced, and the equipment engineer can isolate the reaction chamber 2 and the swing valve 3 according to actual needs during regular maintenance, thereby improving the maintenance efficiency. It should be understood that the isolation device of the utility model can be used not only between the swing valve and the reaction chamber, but also in other identical or similar scenarios that require isolation.
[0051] Although the embodiments of the present invention are described in detail above, it is obvious to those skilled in the art that various modifications and variations can be made to these embodiments. However, it should be understood that such modifications and variations are within the scope and spirit of the present invention as described in the claims. Moreover, the present invention described herein may have other embodiments and may be implemented or realized in a variety of ways.
Claims
1. An isolation device, applied to a semiconductor device, wherein the semiconductor device comprises a reaction chamber and a swing valve connected to each other, characterized in that: Includes isolation valve body; The isolation valve body is located in the reaction chamber and is arranged close to the swing valve; The isolation valve body includes an isolation cover and a driving mechanism connected to each other; The isolation cover and the driving mechanism are both arranged in the reaction chamber, and the isolation cover is arranged close to the swing valve relative to the driving mechanism; The driving mechanism is used to adjust the distance between the isolation cover and the inner wall of the reaction chamber so that the end surface of the isolation cover and part of the inner wall of the reaction chamber are in conflict with each other, so as to separate the reaction chamber into a first space and a second space, and the second space is used for swing valve maintenance.
2. The device according to claim 1, characterized in that The top of the isolation cover is connected to the bottom of the biasing device of the reaction chamber through the driving mechanism so as to be centrally arranged in the reaction chamber.
3. The device according to claim 1, characterized in that Also includes a sealing ring; The sealing ring is arranged on the end surface of the isolation cover or on the inner wall of the reaction chamber, and is used to form a seal when the isolation cover contacts the inner wall of the reaction chamber.
4. The device according to claim 1, characterized in that It also includes sensors and controllers; The sensor and the driving mechanism are electrically connected to the controller respectively; The sensor is used to monitor the working state of the swing valve; The controller is used to control the drive mechanism to start when the sensor detects that the swing valve has failed, so that the end surface of the isolation cover and part of the inner wall of the reaction chamber are in conflict with each other, so as to separate the reaction chamber into a first space and a second space, and the second space is used for swing valve maintenance.
5. The device according to claim 4, characterized in that Also includes a communication module; The communication module is electrically connected to the controller; The controller is further used to receive an instruction for controlling the start-up of the driving mechanism through the communication module.
6. The device according to claim 1, characterized in that Also includes an air flow hole and a control valve; The air flow hole is arranged in the second space, and the air flow hole is communicated with the control valve; The gas flow hole is used to purge gas after the gas is introduced to adjust the gas pressure of the second space; The control valve is used to control the type and flow rate of the gas entering the gas flow hole.
7. The device according to claim 2, characterized in that The isolation cover and the driving mechanism are fixedly connected or detachably connected, and / or the driving mechanism and the biasing device are detachably connected.
8. The device according to claim 1, characterized in that The side of the isolation cover facing the swing valve is a concave surface, and the isolation cover is an arc-shaped cover, a conical cover or a stepped cover.
9. The device according to any one of claims 1 to 8, characterized in that: The surface of the isolation cover and the surface of the driving mechanism are both provided with a metal protective layer.
10. A semiconductor device, characterized in that: It comprises an isolation device, a swing valve and a reaction chamber as described in any one of claims 1 to 9; The isolation valve body of the isolation device is located in the reaction chamber and is arranged close to the swing valve to separate the reaction chamber into a first space and a second space, and the second space is used for swing valve maintenance.