Coating buffer tank

By designing the liquid buffer structure in the coating tank, the low stability problem caused by frequent opening and closing of the feeding equipment is solved, and the liquid level and static pressure are stabilized, which extends the equipment life and reduces the risk of product scrapping.

CN222519051UActive Publication Date: 2025-02-25Taixing Topbang Lithium Battery Co., Ltd.
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Patent Information

Application Number
CN202421011983.4
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-05-10
Publication Date
2025-02-25
Estimated Expiration
2034-05-10

AI Technical Summary

Technical Problem

In existing coating tanks, frequent opening and closing of feed solenoid valves and feed screw pumps lead to a decrease in the total life of the equipment and low stability, which increases the risk of sudden abnormalities and product scrapping.

Method used

Design a coating buffer tank, including the tank body and the liquid buffer structure, the liquid buffer structure includes the liquid buffer space and a communication hole, which is used to replenish the liquid from the buffer space through static pressure after the feed is stopped. The liquid stirring chamber is used to stabilize the liquid level and static pressure.

Benefits of technology

Through the design of the feed liquid buffer structure, the opening and closing frequency of the feed solenoid valve and the feed screw pump is reduced, the stability of the feed equipment system is improved, and the risk of product scrapping is reduced.

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Abstract

The utility model relates to a coating buffer tank which comprises a tank body and a feed liquid buffer structure, and the tank body is provided with a feed port and a feed liquid stirring cavity arranged in the tank body; the feed liquid temporary storage structure is arranged in the tank body, a feed liquid temporary storage space and at least one communicating hole used for keeping static pressure balance in the cavity are formed in the feed liquid temporary storage structure, the feed liquid temporary storage space is communicated with the feed inlet, and the at least one communicating hole is communicated with the feed liquid temporary storage space and the feed liquid stirring cavity; and the feed liquid which enters the feed liquid buffer space from the feed port is supplemented into the feed liquid stirring cavity. During feeding, feed liquid enters the feed liquid buffer space from the feed inlet, the feed liquid in the feed liquid buffer space is supplemented to the feed liquid stirring cavity through the communication hole at the time of stopping feeding, and the liquid level in the feed liquid buffer space is reduced slowly, so that the stability of the liquid level and the stability of static pressure in the feed liquid stirring cavity are ensured; meanwhile, the opening and closing frequency of the feeding electromagnetic valve and the feeding screw pump is reduced, and the stability of the feeding system is guaranteed.
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Description

Technical Field

[0001] The utility model relates to the technical field of coating tanks, in particular to a coating buffer tank. Background Art

[0002] In the related art, when the liquid level sensor senses that the liquid level in the coating tank is low, the feed solenoid valve and the feed screw pump will be linked to open, and feed from the feed port to ensure the stability of the liquid level and static pressure in the coating tank. Frequent opening and closing of the feed solenoid valve and the feed screw pump will reduce the total life of the feed solenoid valve and the feed screw pump, resulting in low stability of the feed equipment system, which will increase the possibility of sudden abnormalities and even cause large quantities of products to be scrapped on site. Utility Model Content

[0003] The utility model aims at the above-mentioned defects of the prior art and provides an improved coating buffer tank.

[0004] The technical solution adopted by the utility model to solve the technical problem is: construct a coating buffer tank, including:

[0005] A tank body having a feed inlet and a material-liquid stirring chamber disposed inside the tank body; and

[0006] A liquid caching structure is arranged in the tank body, and the liquid caching structure forms a liquid caching space and is provided with at least one connecting hole for maintaining the static pressure balance in the cavity. The liquid caching space is connected with the feed port, and at least one connecting hole connects the liquid caching space with the liquid stirring chamber to replenish the liquid entering from the feed port into the liquid caching space into the liquid stirring chamber.

[0007] In some embodiments, the tank body includes a side wall, a bottom wall and an upper cover, and the feed port is located on the side wall; the liquid buffer space is located below the feed port and corresponds to the feed port in the vertical direction.

[0008] In some embodiments, the liquid caching structure includes a supporting wall and a circumferential baffle wall surrounding the supporting wall, the supporting wall and the baffle wall define the liquid caching space, and the baffle wall is arranged close to the side wall on the side close to the feed port; the supporting wall and / or the baffle wall are connected to the side wall.

[0009] In some embodiments, the liquid caching structure includes a supporting wall, a blocking wall disposed on the side of the supporting wall and connected to the side wall, the blocking wall and the side wall are jointly disposed in the circumference of the supporting wall, and the supporting wall, the blocking wall and the side wall jointly define the liquid caching space.

[0010] In some embodiments, at least one of the communicating holes is disposed on the supporting wall.

[0011] In some embodiments, at least one of the communicating holes is disposed close to the side wall.

[0012] In some embodiments, the total area of ​​the connecting holes is in the range of 10 mm 2 -200mm 2 .

[0013] In some embodiments, the upper end of the retaining wall is spaced apart from the upper cover.

[0014] In some embodiments, the coating buffer tank further includes a stirring paddle disposed in the liquid stirring chamber, and the liquid buffer structure is disposed on one side of the stirring shaft of the stirring paddle and is located above the blades of the stirring paddle.

[0015] In some embodiments, the coating buffer tank further includes a liquid level sensor, which corresponds to the material liquid stirring chamber and is located on the other side of the stirring shaft of the stirring paddle.

[0016] The coating buffer tank of the utility model has the following beneficial effects:

[0017] The coating buffer tank is provided with a liquid caching structure, which includes a liquid caching space and a connecting hole. When feeding, the liquid enters the liquid caching space from the feed port. During the time when feeding is stopped, the liquid in the liquid caching space is replenished to the liquid stirring chamber through the connecting hole. The liquid level in the liquid caching space decreases slowly, thereby ensuring the stability of the liquid level and static pressure in the liquid stirring chamber. At the same time, the opening and closing frequencies of the feed solenoid valve and the feed screw pump are reduced, thereby ensuring the stability of the feeding equipment system. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] The present invention will be further described below with reference to the accompanying drawings and embodiments, in which:

[0019] Figure 1 It is a front structural schematic diagram of a coating buffer tank according to an embodiment of the utility model;

[0020] Figure 2 yes Figure 1 A schematic diagram of the top view of the coating buffer tank shown;

[0021] Figure 3 It is a front structural schematic diagram of a coating buffer tank of another embodiment of the utility model;

[0022] Figure 4 It is a schematic diagram of the top structure of a coating buffer tank according to another embodiment of the utility model.

[0023] In the accompanying drawings, 10. coating buffer tank, 1. tank body, 11. feed port, 12. material liquid stirring chamber, 13. side wall, 14. bottom wall, 15. upper cover, 16. cavity, 17. feed pipe, 18. discharge port, 2. material liquid buffer structure, 21. material liquid buffer space, 22. supporting wall, 23. baffle wall, 24. connecting hole, 3. stirring paddle, 31. paddle, 32. stirring shaft, 4. motor, 5. liquid level sensor. DETAILED DESCRIPTION

[0024] In order to have a clearer understanding of the technical features, purposes and effects of the present invention, the specific implementation methods of the present invention are now described in detail with reference to the accompanying drawings. In the following description, it should be understood that the directions or positional relationships indicated by "upper", "lower", "vertical", "horizontal", "top", "bottom", "inside", "outside", etc. are based on the directions or positional relationships shown in the accompanying drawings, are constructed and operated in specific directions, and are only for the convenience of describing the present technical solution, rather than indicating that the device or element referred to must have a specific direction, and therefore cannot be understood as a limitation on the present invention.

[0025] It should also be noted that, unless otherwise clearly specified and limited, the terms such as "installed", "connected", "connected", "fixed", "set" and the like should be understood in a broad sense. For example, it can be a fixed connection, a detachable connection, or an integral one; it can be a mechanical connection or an electrical connection; it can be directly connected or indirectly connected through an intermediate medium, and it can be the internal connection of two elements or the interaction relationship between two elements. When an element is referred to as being "on" or "under" another element, the element can be "directly" or "indirectly" located on the other element, or there may be one or more intermediate elements. For those of ordinary skill in the art, the specific meanings of the above terms in the present utility model can be understood according to the specific circumstances.

[0026] Figure 1 and Figure 2 The coating buffer tank 10 of one embodiment of the utility model is shown. Figure 1 and Figure 2 As shown, the coating buffer tank 10 includes a tank body 1 and a liquid material buffer structure 2, wherein the tank body 1 has a feed port 11 and a liquid material stirring chamber 12 disposed therein, wherein the tank body 1 may include a side wall 13, a bottom wall 14 and an upper cover 15, wherein the side wall 13, the bottom wall 14 and the upper cover 15 together define a cavity 16, wherein the liquid material stirring chamber 12 is located in the cavity 16, for example, the liquid material stirring chamber 12 is formed by the middle and lower part of the cavity 16. The liquid material buffer structure 2 is disposed in the tank body 1, and plays a role in ensuring the stability of the liquid level and the static pressure in the liquid material stirring chamber 12, thereby reducing the frequency of opening and closing of the feed solenoid valve and the feed screw pump, and ensuring the stability of the feed equipment system.

[0027] The liquid caching structure 2 is formed with a liquid caching space 21 and is provided with at least one connecting hole 24 for maintaining the static pressure balance in the liquid stirring chamber 12. The liquid caching space 21 is connected with the feed port 11 to cache the feed liquid. At least one connecting hole 24 connects the liquid caching space 21 with the liquid stirring chamber 12 to replenish the liquid entering from the feed port 11 into the liquid caching space 21 into the liquid stirring chamber 12.

[0028] The feed port 11 is located on the side wall 13 of the tank body 1, and the feed port 11 may be connected to a feed pipe 17 to facilitate connection with an external feed pipe. The liquid feed buffer space 21 is located below the feed port 11 and corresponds to the feed port 11 in the vertical direction, so that the liquid feed entering from the feed port 11 can directly flow into the liquid feed buffer space 21 and be buffered by the liquid feed buffer space 21 without the need for additional connection pipes.

[0029] In this embodiment, the liquid caching structure 2 includes a supporting wall 22, a baffle wall 23 disposed on the side of the supporting wall 22 and connected to the side wall 13, the baffle wall 23 and the side wall 13 are jointly disposed in the circumferential direction of the supporting wall 22, and the supporting wall 22, the baffle wall 23 and the side wall 13 jointly define a liquid caching space 21. It can be understood that the baffle wall 23, the side wall 13 and the supporting wall 22 are sealed and connected, and the liquid caching space 21 is defined by the side wall 13, which is conducive to the liquid entering from the feed port 11 flowing into the liquid caching space 21 along the side wall 13.

[0030] like Figure 3 As shown, in another embodiment of the coating buffer tank 10, the liquid caching structure 2 includes a supporting wall 22 and a baffle wall 23 arranged in the circumferential direction around the supporting wall 22, the supporting wall 22 and the baffle wall 23 are sealed and connected, and the supporting wall 22 and the baffle wall 23 jointly define a liquid caching space 21. Among them, the side of the baffle wall 23 close to the feed port 11 is arranged close to the side wall 13, so that the liquid entering from the feed port 11 can flow into the liquid caching space 21 along the side wall 13. The liquid caching structure 2 is connected to the side wall 13, specifically, the supporting wall 22 and / or the baffle wall 23 are connected to the side wall 13, that is, one of the supporting wall 22 and the baffle wall 23 is connected to the side wall 13, or both are connected to the side wall 13 at the same time, so as to be firmly arranged in the tank body 1.

[0031] Combination Figure 1 and Figure 2As shown, the at least one connecting hole 24 is arranged on the supporting wall 22. It can be understood that the supporting wall 22 can be arranged horizontally, the retaining wall 23 can be arranged vertically, and the side wall 13 can also be arranged to extend vertically, thereby forming a groove-shaped liquid caching space 21. The supporting wall 22 serves as the bottom of the liquid caching space 21. By arranging the connecting hole 24 on the supporting wall 22, the liquid in the liquid caching space 21 can flow downward into the liquid stirring chamber 12 under the action of the pressure difference.

[0032] The at least one connecting hole 24 is arranged close to the side wall 13. Preferably, the connecting hole 24 is arranged on the edge of the supporting wall 22 close to the side wall 13, so that the connecting hole 24 is as close to the side wall 13 as possible, so that the liquid flowing out of the connecting hole 24 can flow along the side wall 13 to the liquid stirring chamber 12, so as to reduce the generation of bubbles and make the coating stable. Of course, the connecting hole 24 can also be arranged at any position of the supporting wall 22, for example, at the middle position of the supporting wall 22, so that some bubbles can be eliminated when the liquid is stirred by the stirring paddle 3.

[0033] The communicating hole 24 may be provided with one or more than two. Figure 1 and Figure 2 As shown, the communicating hole 24 may be provided with one. Figure 4 As shown, in another embodiment of the coating buffer tank 10, there are more than two connecting holes 24, and the more than two connecting holes 24 can be spaced apart on the supporting wall 22, and the more than two connecting holes 24 are spaced apart on one side of the supporting wall 22 close to the side wall 13.

[0034] The liquid buffer space 21 can continuously provide liquid to the liquid stirring chamber 12 through the connecting hole 24, ensuring the stability of the liquid level in the liquid stirring chamber 12. In this embodiment, the total area of ​​the connecting hole 24 is small, so that the flow speed of the liquid is slow, and the liquid level of the liquid in the liquid buffer space 21 decreases slowly, so that the liquid can be continuously replenished in the liquid stirring chamber 12, ensuring the stability of the static pressure in the liquid stirring chamber 12.

[0035] In this embodiment, the total area of ​​the connecting holes 24 is within the range of 10 mm 2 -200mm 2 For example, the total area of ​​the connecting hole 24 may be 10 mm 2 , 20mm 2 , 200mm 2 Etc. It can be understood that the total area of ​​the connecting holes 24 is related to the coating process. For example, when the solid content and viscosity of the slurry are the same, when the thickness to be coated is greater, the total area of ​​the connecting holes 24 is set to be larger, so that more liquid can be added in time; when the thickness to be coated is smaller, the total area of ​​the connecting holes 24 is set to be smaller.

[0036] It can be understood that when there is one connecting hole 24, the area of ​​the connecting hole 24 is 10 mm 2 -200mm 2 When there are more than two communicating holes 24, that is, two or more communicating holes 24, the total area of ​​the two or more communicating holes 24 is 10mm 2 -200mm 2 .

[0037] The connecting holes 24 may be arranged in regular or irregular shapes such as circular, elliptical, square, triangular, etc. Optionally, the aperture of the connecting holes 24 may range from 5 mm to 1 cm.

[0038] like Figure 1 As shown, the upper end of the retaining wall 23 is spaced apart from the upper cover 15. It can be understood that the coating buffer tank 10 also includes a stirring paddle 3 disposed in the liquid stirring chamber 12 and a motor 4 driving the stirring paddle 3 to rotate, wherein the upper cover 15 can rotate relative to the side wall 13, and the stirring paddle 3 can be connected to the upper cover 15, so when the motor 4 drives the stirring paddle 3 to rotate, the upper cover 15 rotates together. It can be understood that the upper end of the retaining wall 23 is spaced apart from the bottom surface of the upper cover 15, which can prevent the liquid in the liquid buffer space 21 from leaking out of the gap between the side wall 13 and the upper cover 15.

[0039] Combination Figure 1 and Figure 2 As shown, in this embodiment, the liquid caching structure 2 is arranged on one side of the stirring shaft 32 of the stirring paddle 3 and is located above the blades 31 of the stirring paddle 3, so that the liquid caching structure 2 is conveniently arranged on the inner side of the side wall 13 without affecting the normal operation of the stirring paddle 3.

[0040] Of course, in other embodiments, the liquid caching structure 2 may be located above the blades 31 of the stirring paddle 3, and the baffle wall 23 may include an inner baffle wall and an outer baffle wall. The inner baffle wall avoids the stirring shaft 32 of the stirring paddle 3, and the outer baffle wall is arranged on the outer periphery of the inner baffle wall. The supporting wall 22 connects the inner baffle wall and the outer baffle wall at the bottom, thereby increasing the capacity of the liquid caching space 21 without affecting the normal operation of the stirring paddle 3.

[0041] Combination Figure 1 and Figure 2 As shown, in this embodiment, the coating buffer tank 10 also includes a liquid level sensor 5, which corresponds to the material liquid stirring chamber 12 and is linked with the feed solenoid valve and the feed screw pump. Thus, by detecting the liquid level height of the material liquid stirring chamber 12, the feed solenoid valve and the feed screw pump are controlled to be opened and closed.

[0042] The liquid level sensor 5 is located on the other side of the stirring shaft 32 of the stirring paddle 3, which can prevent the liquid buffer structure 2 from interfering with the detection of the liquid level sensor 5. Of course, in other embodiments, the liquid level sensor 5 can be set at other positions as long as the liquid level height detection in the liquid stirring chamber 12 can be achieved.

[0043] The working process of the coating buffer tank 10 of the utility model is as follows: when the liquid level sensor 5 senses that the liquid level in the liquid stirring chamber 12 is low, the feeding screw pump and the feeding solenoid valve are linked to open to feed from the feed port 11. At this time, the pumped slurry will be buffered in the liquid buffer space 21. When the amount of liquid pumped in is greater than the capacity of the liquid buffer space 21, since the feeding speed is relatively fast, a large part of the liquid will overflow the upper end of the baffle wall 23 and flow into the liquid stirring chamber 12 to ensure that the outlet 18 continues to have liquid passing through. A small part of the liquid flows into the liquid stirring chamber 12 below through the connecting hole 24 due to the pressure difference, and the feeding is stopped until the liquid level in the sensing area of ​​the coating buffer tank 10 reaches the set requirement.

[0044] From the time when feeding stops to the time when feeding next time, the speed at which the liquid in the liquid buffer space 21 flows into the liquid stirring chamber 12 below through the connecting hole 24 due to the pressure difference can be estimated by the Bernoulli equation of fluid mechanics. The maximum speed of the liquid flowing downward does not exceed 1m / s (affected by the liquid level difference between the liquid buffer space 21 and the coating buffer tank 10, as well as the liquid density). In addition, the total area of ​​the connecting hole 24 is very small. At this time, the amount of liquid flowing downward through the connecting hole 24 is very small, estimated to be 1% to 3% of the discharge flow rate. Therefore, during the time when feeding is stopped, the liquid level in the liquid buffer space 21 drops very little, and there is almost no obvious fluctuation. The connecting hole 24 plays the role of providing static pressure for downward transmission. Therefore, under the premise that the liquid level in the liquid buffer space 21 has almost no drop, the actual static pressure of the liquid level in the liquid stirring chamber 12 is guaranteed to be stable, thereby ensuring the stability of the slurry coating amount.

[0045] In addition, since the static pressure can be kept relatively unchanged for a long time, the feeding frequency of the liquid level sensor 5 and the linked feed solenoid valve and feed screw pump can be greatly reduced accordingly, thereby reducing the failure rate of the feed solenoid valve and feed screw pump, extending the life cycle of the feed solenoid valve and feed screw pump, and improving the stability of the feed equipment system.

[0046] It can be understood that the above embodiments only express the preferred implementation methods of the utility model, and the descriptions thereof are relatively specific and detailed, but they cannot be understood as limiting the patent scope of the utility model. It should be pointed out that, for ordinary technicians in this field, without departing from the concept of the utility model, the above-mentioned technical features can be freely combined, and several deformations and improvements can be made, which all belong to the protection scope of the utility model. Therefore, all equivalent changes and modifications made to the scope of the claims of the utility model should belong to the scope covered by the claims of the utility model.

Claims

1. A coating buffer tank, characterized in that: include: The tank body (1) has a feed inlet (11) and a feed liquid stirring chamber (12) arranged inside the tank body; as well as A liquid caching structure (2) is arranged in the tank body (1), the liquid caching structure (2) is formed with a liquid caching space (21) and is provided with at least one connecting hole (24) for maintaining the static pressure balance in the cavity, the liquid caching space (21) is connected with the feed inlet (11), and at least one connecting hole (24) connects the liquid caching space (21) with the liquid stirring chamber (12), so as to replenish the liquid entering from the feed inlet (11) into the liquid caching space (21) into the liquid stirring chamber (12).

2. The coating buffer tank according to claim 1, characterized in that: The tank body (1) comprises a side wall (13), a bottom wall (14) and an upper cover (15); the feed port (11) is located on the side wall (13); the liquid buffer space (21) is located below the feed port (11) and corresponds to the feed port (11) in the vertical direction.

3. The coating buffer tank according to claim 2, characterized in that: The liquid caching structure (2) comprises a supporting wall (22) and a baffle wall (23) arranged circumferentially around the supporting wall (22); the supporting wall (22) and the baffle wall (23) define the liquid caching space (21); the baffle wall (23) is arranged close to the side wall (13) on the side close to the feed port (11); the supporting wall (22) and / or the baffle wall (23) are connected to the side wall (13).

4. The coating buffer tank according to claim 2, characterized in that: The liquid caching structure (2) comprises a supporting wall (22), a blocking wall (23) disposed on the side of the supporting wall (22) and connected to the side wall (13), the blocking wall (23) and the side wall (13) being jointly disposed in the circumferential direction of the supporting wall (22), and the supporting wall (22), the blocking wall (23) and the side wall (13) jointly define the liquid caching space (21).

5. The coating buffer tank according to claim 3 or 4, characterized in that: At least one of the communicating holes (24) is arranged on the supporting wall (22).

6. The coating buffer tank according to claim 5, characterized in that: At least one of the communicating holes (24) is arranged close to the side wall (13).

7. The coating buffer tank according to claim 1, characterized in that: The total area of ​​the connecting holes (24) is in the range of 10 mm 2 -200mm 2 .

8. The coating buffer tank according to claim 3 or 4, characterized in that: The upper end of the retaining wall (23) is spaced apart from the upper cover (15).

9. The coating buffer tank according to claim 1, characterized in that: The coating buffer tank (10) further comprises a stirring paddle (3) arranged in the liquid stirring chamber (12), and the liquid buffer structure (2) is arranged on one side of the stirring shaft (32) of the stirring paddle (3) and is located above the blade (31) of the stirring paddle (3).

10. The coating buffer tank according to claim 9, characterized in that: The coating buffer tank (10) further comprises a liquid level sensor (5), wherein the liquid level sensor (5) corresponds to the material liquid stirring chamber (12) and is located on the other side of the stirring shaft (32) of the stirring paddle (3).

Citation Information

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