Microwave shielding device of microwave plasma chemical vapor deposition equipment

Abstract

The utility model discloses a microwave shielding device of microwave plasma chemical vapor deposition equipment, belongs to the technical field of microwave shielding, and aims to solve the problems that the height and the position of a supporting column are inconvenient to adjust according to equipment with different sizes, and the mounting efficiency of a wave-absorbing material partition plate is reduced. Four bottom grooves distributed circumferentially are formed in the bottom face of the operation table, limiting grooves are formed in the top faces of the inner side walls of the bottom grooves, threaded rod bodies are rotationally connected between the side faces, close to each other, of the inner side walls of the limiting grooves, and a bottom hole is formed in the center of the bottom face of the operation table. The height of the telescopic assembly at the top can be adjusted according to the heights of vapor deposition equipment of different sizes, and the width of the telescopic assembly can be adjusted according to the width of the vapor deposition equipment through the bidirectional threaded rod, the movable sleeve and the threaded sleeve. Therefore, the height and the position of the supporting column can be adjusted according to vapor deposition equipment of different sizes, and the installation efficiency of the wave-absorbing material partition plate is improved.

Description

Technical Field

[0001] The utility model belongs to the technical field of microwave shielding, and in particular relates to a microwave shielding device for microwave plasma chemical vapor deposition equipment. Background Art

[0002] Microwave plasma chemical vapor deposition (MPCVD) is a method of preparing optical fiber preform rods by deposition in a quartz tube using microwave plasma as a reaction source. The difference between this method and other plasma chemical vapor deposition methods is that the raw gas is excited and ionized by microwave energy to produce plasma, and the core component of the microwave plasma chemical vapor deposition equipment used in the MPCVD method is the microwave resonant cavity used to generate microwave plasma. Microwave-excited plasma has a series of advantages such as no electrode material pollution, good controllability, and high plasma density. However, at the same time, the microwave resonant cavity will produce microwave radiation that is harmful to equipment and personnel, so it needs to be microwave shielded.

[0003] At present, the microwave shielding method for microwave plasma chemical vapor deposition equipment is generally to install support columns around the equipment, and then fix the absorbing material partition on the support columns, so that the absorbing material partition is installed on the four sides and the top surface of the equipment. Although this method has a good shielding effect on microwaves, it is inconvenient to adjust the height and position of the support columns according to equipment of different sizes in actual use, which reduces the installation efficiency of the absorbing material partition.

[0004] Therefore, a microwave shielding device for microwave plasma chemical vapor deposition equipment is needed to solve the problem in the prior art that it is inconvenient to adjust the height and position of the support column according to equipment of different sizes, thereby reducing the installation efficiency of the absorbing material partition. Utility Model Content

[0005] The purpose of the utility model is to provide a microwave shielding device for microwave plasma chemical vapor deposition equipment to solve the problems raised in the above background technology.

[0006] To achieve the above-mentioned purpose, the utility model provides the following technical solutions: a microwave shielding device for microwave plasma chemical vapor deposition equipment, comprising an operating table, the bottom surface of the operating table is provided with four bottom grooves distributed in a circle, the top surface of the inner side wall of the bottom groove is provided with a limiting groove, a threaded rod body is rotatably connected between the inner side walls of the limiting groove close to each other, a bottom hole is provided at the center of the bottom surface of the operating table, one end of the threaded rod body can move through the bottom hole, a movable block is movably engaged in the limiting groove, the movable block is movably connected to the outer side wall of the threaded rod body, a moving rod is fixed to the bottom surface of the movable block, the moving rod is engaged in the bottom groove, four electric telescopic rods distributed in a circle are arranged on the periphery of the operating table, and telescopic components are respectively arranged on the top and bottom of the electric telescopic rod.

[0007] It should be noted in the scheme that the telescopic assembly includes a fixed plate, a fixed frame is fixed on the top surface of the fixed plate, a bidirectional threaded rod is rotatably connected between the inner side walls of the fixed frame close to one side, fixed sleeves are respectively fixed on the opposite sides of the outer side wall of the fixed plate, a movable sleeve is movably engaged inside the fixed sleeve, a threaded sleeve is fixed on the inner side wall of the movable sleeve close to the fixed frame, the two threaded sleeves are respectively movably connected to the two sides of the bidirectional threaded rod, the top surface of the electric telescopic rod is fixed to the bottom surface of the fixed plate at the top, the bottom surface of the electric telescopic rod is fixed to the top surface of the fixed frame at the bottom, and one side of the fixed plate at the bottom is fixed to one end of the movable rod.

[0008] It is further worth mentioning that an annular groove is provided near the bottom of the inner wall of the bottom hole, a toothed disk is rotatably connected in the annular groove, a gear is fixed to one end of the threaded rod body, and the gear is meshed with the toothed disk.

[0009] It should be further explained that a rotating shaft is fixed at the center of the bottom surface of the toothed disk, and a hand wheel is fixed to the bottom surface of the rotating shaft.

[0010] As a preferred implementation, a PLC controller is fixed to one side of the outer side wall of the operating table, and the four electric telescopic rods are electrically connected to the PLC controller respectively.

[0011] As a preferred embodiment, a fixing block is fixed to one side of the outer side wall of the movable sleeve, and a thumbtack is detachably connected to one side of the fixing block.

[0012] As a preferred implementation, a rotating wheel is fixed to the middle portion of the outer side wall of the bidirectional threaded rod.

[0013] Compared with the prior art, the microwave shielding device of microwave plasma chemical vapor deposition equipment provided by the utility model has at least the following beneficial effects:

[0014] By setting the toothed disk, gears, threaded rod body and movable block, the toothed disk can drive the four gears to rotate when it rotates, and then drive the four threaded rod bodies to rotate synchronously, so that the movable rod moves; by setting the electric telescopic rod, the telescopic component on the top can be adjusted in height according to the height of vapor deposition equipment of different sizes; by setting the bidirectional threaded rod, movable sleeve and threaded sleeve, the width can be adjusted according to the width of the vapor deposition equipment, so that the height and position of the support column can be adjusted according to the vapor deposition equipment of different sizes, thereby improving the installation efficiency of the absorbing material partition. BRIEF DESCRIPTION OF THE DRAWINGS

[0015] Figure 1 It is a schematic diagram of the overall structure of the utility model;

[0016] Figure 2 This is a schematic diagram of the fixed frame structure of the utility model;

[0017] Figure 3 For this utility model Figure 2 A is a schematic diagram of the partially enlarged structure of the middle part;

[0018] Figure 4 This is a schematic diagram of the structure of the movable block of the utility model;

[0019] Figure 5 This is a schematic diagram of the structure of the mobile rod of the utility model.

[0020] In the figure:

[0021] 100, operating table; 101, bottom hole; 102, annular groove; 103, toothed disk; 104, rotating shaft; 105, hand wheel;

[0022] 200, limit groove; 201, movable block; 202, threaded rod body; 203, gear; 204, moving rod; 205, bottom groove;

[0023] 300, fixed plate; 301, fixed frame; 302, fixed sleeve; 303, movable sleeve; 304, fixed block; 305, thumbtack;

[0024] 400, bidirectional threaded rod; 401, threaded sleeve; 402, rotating wheel;

[0025] 500, electric telescopic rod;

[0026] 600.PLC controller. DETAILED DESCRIPTION

[0027] See also Figure 1-5 The utility model provides a microwave shielding device for microwave plasma chemical vapor deposition equipment, comprising an operating table 100, wherein the bottom surface of the operating table 100 is provided with four bottom grooves 205 distributed in a circumference, the top surface of the inner side wall of the bottom groove 205 is provided with a limiting groove 200, a threaded rod body 202 is rotatably connected between the inner side walls of the limiting groove 200 close to each other, a bottom hole 101 is provided at the center of the bottom surface of the operating table 100, one end of the threaded rod body 202 movably passes through the bottom hole 101, a movable block 201 is movably engaged in the limiting groove 200, the movable block 201 is movably connected to the outer side wall of the threaded rod body 202, a moving rod 204 is fixed to the bottom surface of the moving block 201, and the moving rod 204 is engaged in the bottom groove 205, and four electric telescopic rods 500 distributed in a circumference are arranged on the periphery of the operating table 100, and telescopic components are respectively arranged on the top and bottom of the electric telescopic rod 500.

[0028] Further as Figure 2 As shown, the telescopic assembly includes a fixed plate 300, a fixed frame 301 is fixed to the top surface of the fixed plate 300, a bidirectional threaded rod 400 is rotatably connected between the inner side walls of the fixed frame 301 close to one side, fixed sleeves 302 are respectively fixed to the opposite sides of the outer side wall of the fixed plate 300, a movable sleeve 303 is movably engaged inside the fixed sleeve 302, a threaded sleeve 401 is fixed to the inner side wall of the movable sleeve 303 close to the fixed frame 301, and the two threaded sleeves 401 are respectively movably connected to the two sides of the bidirectional threaded rod 400, the top surface of the electric telescopic rod 500 is fixed to the bottom surface of the top fixed plate 300, the bottom surface of the electric telescopic rod 500 is fixed to the top surface of the bottom fixed frame 301, and one side of the bottom fixed plate 300 is fixed to one end of the movable rod 204.

[0029] By providing the bidirectional threaded rod 400 , the threaded sleeves 401 on both sides can move to both sides respectively, thereby driving the movable sleeve 303 to move to both sides respectively.

[0030] Further as Figure 4 As shown, an annular groove 102 is opened near the bottom of the inner wall of the bottom hole 101, and a toothed disk 103 is rotatably connected in the annular groove 102. A gear 203 is fixed to one end of the threaded rod body 202, and the gear 203 meshes with the toothed disk 103.

[0031] The position of the toothed disk 103 can be movably limited by the provided annular groove 102 , and the four gears 203 can be synchronously rotated by the provided toothed disk 103 , thereby driving the four threaded rod bodies 202 to rotate synchronously.

[0032] This solution has the following working process: when installing absorbing material partitions on vapor deposition equipment of different sizes, first turn the hand wheel 105, the rotation of the hand wheel 105 drives the rotating shaft 104 to rotate, and then drives the toothed disk 103 to rotate, and finally makes the four gears 203 rotate at the same time, the rotation of the gear 203 drives the four threaded rod bodies 202 to rotate at the same time, the rotation of the threaded rod body 202 drives the movable block 201 to move outward, the movement of the movable block 201 drives the moving rod 204 to move, and then the telescopic component at the bottom moves outward, and then the vapor deposition equipment is placed from the top to the center of the top surface of the operating table 100, and then the distance between the moving rod 204 and the vapor deposition equipment is adjusted according to the size of the vapor deposition equipment, so that the distance between the four electric telescopic rods 500 and the vapor deposition equipment is at a suitable position. , then operate the PLC controller 600 to start the four electric telescopic rods 500 synchronously, so that the four telescopic components on the top are at a suitable distance from the top surface of the vapor deposition equipment, and manually rotate the upper and lower rotating wheels 402 respectively. The rotation of the rotating wheel 402 drives the bidirectional threaded rod 400 to rotate, and the rotation of the bidirectional threaded rod 400 drives the threaded sleeve 401 to move. The movement of the threaded sleeve 401 drives the movable sleeve 303 to move, and finally the movable sleeves 303 on both sides are moved to the appropriate position, and then the thumbtacks 305 are removed, and the absorbing material partition is fixed to the four fixed blocks 304 on the same side by the thumbtacks 305. Similarly, the absorbing material partitions are fixed on the other three sides, and then the top absorbing material partition is fixed to the top surface of the eight movable sleeves 303 on the top by other thumbtacks.

[0033] According to the above working process, it can be known that: by setting the toothed disk 103, gear 203, threaded rod body 202 and movable block 201, the toothed disk 103 can drive the four gears 203 to rotate when it rotates, and then drive the four threaded rod bodies 202 to rotate synchronously, so that the movable rod 204 moves, and by setting the electric telescopic rod 500, the telescopic component on the top can be adjusted in height according to the height of the vapor deposition equipment of different sizes, and by setting the bidirectional threaded rod 400, the movable sleeve 303 and the threaded sleeve 401, the width can be adjusted according to the width of the vapor deposition equipment, so that the height and position of the support column can be adjusted according to the vapor deposition equipment of different sizes, thereby improving the installation efficiency of the absorbing material partition.

[0034] Further as Figure 4 As shown, a rotating shaft 104 is fixed at the center of the bottom surface of the toothed disk 103 , and a hand wheel 105 is fixed to the bottom surface of the rotating shaft 104 .

[0035] By providing the hand wheel 105 , when the hand wheel 105 rotates, it can drive the rotating shaft 104 to rotate and then drive the toothed disk 103 to rotate, so that the four gears 203 can rotate synchronously.

[0036] Further as Figure 1 As shown, a PLC controller 600 is fixed to one side of the outer wall of the operating table 100, and the four electric telescopic rods 500 are electrically connected to the PLC controller 600 respectively.

[0037] By means of the PLC controller 600, the four electric telescopic rods 500 can be controlled synchronously, thereby driving the four top telescopic components to move upward or downward synchronously.

[0038] Further Figure 2 As shown, a fixing block 304 is fixed to one side of the outer wall of the movable sleeve 303 , and a thumbtack 305 is detachably connected to one side of the fixing block 304 .

[0039] The absorbing material partition can be fixed by the provided pushpins 305 .

[0040] Further Figure 2 As shown, a rotating wheel 402 is fixed to the middle of the outer side wall of the bidirectional threaded rod 400 .

[0041] The rotating wheel 402 is provided to facilitate the bidirectional threaded rod 400 to rotate, thereby driving the moving sleeves 303 on both sides to move.

[0042] In summary: when installing absorbing material partitions on vapor deposition equipment of different sizes, first rotate the hand wheel 105. The rotation of the hand wheel 105 drives the rotating shaft 104 to rotate, and then drives the toothed disk 103 to rotate, and finally the four gears 203 rotate at the same time. The rotation of the gear 203 drives the four threaded rod bodies 202 to rotate at the same time. The rotation of the threaded rod body 202 drives the movable block 201 to move outward. The movement of the movable block 201 drives the moving rod 204 to move, and then the telescopic component at the bottom moves outward. Then, the vapor deposition equipment is placed from the top into the center of the top surface of the operating table 100. Then, the distance between the moving rod 204 and the vapor deposition equipment is adjusted according to the size of the vapor deposition equipment, so that the distance between the four electric telescopic rods 500 and the vapor deposition equipment is at a suitable position, and then the operation is carried out. Use the PLC controller 600 to start the four electric telescopic rods 500 synchronously, so that the four telescopic components on the top are at a suitable distance from the top surface of the vapor deposition equipment, and manually rotate the upper and lower rotating wheels 402 respectively. The rotation of the rotating wheel 402 drives the bidirectional threaded rod 400 to rotate, and the rotation of the bidirectional threaded rod 400 drives the threaded sleeve 401 to move. The movement of the threaded sleeve 401 drives the movable sleeve 303 to move, and finally the movable sleeves 303 on both sides are moved to the appropriate position, and then the thumbtacks 305 are removed, and the absorbing material partition is fixed to the four fixed blocks 304 on the same side by the thumbtacks 305. Similarly, the absorbing material partitions are fixed on the other three sides, and then the top absorbing material partition is fixed to the top surface of the eight movable sleeves 303 on the top by other thumbtacks.

[0043] The electric telescopic rod 500 and the PLC controller 600 can both be purchased on the market, and are mature technologies in this field and have been fully disclosed, so they are not repeated in the specification.

[0044] Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present invention, and that the scope of the present invention is defined by the appended claims and their equivalents.

Claims

1. A microwave shielding device for microwave plasma chemical vapor deposition equipment, comprising an operating table (100), characterized in that: The bottom surface of the operating table (100) is provided with four bottom grooves (205) distributed in a circumference, the top surface of the inner wall of the bottom groove (205) is provided with a limit groove (200), the inner walls of the limit groove (200) are close to each other and a threaded rod body (202) is rotatably connected between the side surfaces, a bottom hole (101) is provided at the center of the bottom surface of the operating table (100), one end of the threaded rod body (202) movably passes through the bottom hole (101), and the limit groove (200 ) is movably engaged with a movable block (201), the movable block (201) is movably connected to the outer wall of the threaded rod body (202), a moving rod (204) is fixed to the bottom surface of the movable block (201), the moving rod (204) is engaged in the bottom groove (205), and four electric telescopic rods (500) distributed in a circle are arranged on the periphery of the operating table (100), and telescopic components are respectively arranged on the top and bottom of the electric telescopic rod (500).

2. The microwave shielding device of microwave plasma chemical vapor deposition equipment according to claim 1, characterized in that: The telescopic assembly comprises a fixed plate (300), a fixed frame (301) is fixed on the top surface of the fixed plate (300), a bidirectional threaded rod (400) is rotatably connected between the inner side walls of the fixed frame (301) and the sides close to each other, fixed sleeves (302) are respectively fixed on the opposite sides of the outer side wall of the fixed plate (300), a movable sleeve (303) is movably engaged inside the fixed sleeve (302), a threaded sleeve (401) is fixed on the inner side wall of the movable sleeve (303) close to the fixed frame (301), and the two threaded sleeves (401) are respectively and movably connected to the two sides of the bidirectional threaded rod (400), the top surface of the electric telescopic rod (500) is fixed to the bottom surface of the top fixed plate (300), the bottom surface of the electric telescopic rod (500) is fixed to the top surface of the bottom fixed frame (301), and one side of the bottom fixed plate (300) is fixed to one end of the movable rod (204).

3. The microwave shielding device of microwave plasma chemical vapor deposition equipment according to claim 2, characterized in that: An annular groove (102) is provided on the inner wall of the bottom hole (101) near the bottom, a toothed disc (103) is rotatably connected in the annular groove (102), a gear (203) is fixed to one end of the threaded rod body (202), and the gear (203) is meshed with the toothed disc (103).

4. The microwave shielding device of microwave plasma chemical vapor deposition equipment according to claim 3, characterized in that: A rotating shaft (104) is fixed at the center of the bottom surface of the toothed disk (103), and a hand wheel (105) is fixed to the bottom surface of the rotating shaft (104).

5. The microwave shielding device of microwave plasma chemical vapor deposition equipment according to claim 4, characterized in that: A PLC controller (600) is fixed to one side of the outer wall of the operating table (100), and the four electric telescopic rods (500) are electrically connected to the PLC controller (600) respectively.

6. The microwave shielding device of microwave plasma chemical vapor deposition equipment according to claim 5, characterized in that: A fixing block (304) is fixed to one side of the outer wall of the movable sleeve (303), and a pushpin (305) is detachably connected to one side of the fixing block (304).

7. The microwave shielding device of microwave plasma chemical vapor deposition equipment according to claim 6, characterized in that: A rotating wheel (402) is fixed to the middle of the outer side wall of the bidirectional threaded rod (400).

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