Ion beam directional flow optimization insulation guide piece

Abstract

The utility model relates to the technical field of semiconductor processing, in particular to an ion beam directional flow optimization insulation guide element, which is butted with an ion beam outlet of an ion implanter and comprises an insulation anti-radiation shell and a guide channel arranged in the insulation anti-radiation shell and used for orienting an ion beam. An even number of electrode plates and a multi-path control module which is electrically connected with the electrode plates and is used for independently adjusting the voltage difference between the electrode plates are also embedded in the insulating anti-radiation shell; the electrode plates surround the guide channel in an array manner; according to the utility model, the guide channel is in butt joint with the ion beam outlet of the ion implanter, and the voltage difference between the electrode plates on the periphery of the guide channel is independently and accurately controlled through the multi-path control module, so that efficient orientation and accurate focusing of the ion beam are realized. And the insulating anti-radiation shell can effectively reflect or weaken radiation possibly leaked by the ion beam in the guiding process, so that the safety of equipment is maintained.

Description

Technical Field

[0001] The utility model relates to the technical field of semiconductor processing, in particular to an ion beam directional flow optimization insulating guide. Background Art

[0002] Ion implanters play a vital role in the manufacturing process of semiconductor devices. Their working principle is to first extract the required ions through the ionization process, and then gather them into an ion beam, which is then injected into the semiconductor wafer to achieve the purpose of doping, thereby changing the electrical properties of the semiconductor material. However, it is found that during the ion implantation process, the ion beam will diverge and cannot accurately implant ions into the preset target area (such as a specific lattice position), resulting in uneven doping concentration distribution, which in turn affects the performance and yield of semiconductor devices. Utility Model Content

[0003] In order to solve the problems of the prior art, the utility model provides an ion beam directional flow optimization insulating guide; the utility model aims to provide a guide that can accurately direct the ion beam and perform radiation protection and insulation.

[0004] The solution adopted by the utility model to solve its technical problems is: an insulating guide for optimizing ion beam directional flow, which is connected to the ion beam outlet of an ion implanter, and includes an insulating radiation-proof shell and a guide channel arranged in the insulating radiation-proof shell for orienting the ion beam, an even number of electrode plates and a multi-way control module electrically connected to each electrode plate for independently adjusting the voltage difference between each electrode plate are also embedded in the insulating radiation-proof shell, and each of the electrode plates is arranged in an array surrounding the guide channel.

[0005] By adopting the above technical solution, a fine and adjustable electric field can be formed by arranging multiple electrode plates around the guide channel and using a multi-way control module to independently adjust the voltage difference between the electrode plates, thereby achieving precise orientation and focusing of the ion beam output by the ion implanter, effectively preventing its divergence, and ensuring that the ion beam is accurately injected into the semiconductor according to the preset path. The outer shell is made of radiation-proof insulating material, which can reflect or weaken the radiation that may leak from the ion beam during the guiding process, thereby ensuring the safety of the guiding process.

[0006] Furthermore, the multi-channel control module includes a multi-channel micro power supply and a control circuit board electrically connected to the multi-channel micro power supply for controlling the output voltage.

[0007] By adopting the above technical solution, each electrode plate is precisely controlled by multiple micro power supplies and control circuit boards, so that each electrode plate can receive an independent and finely adjusted voltage and can be customized according to specific process requirements, thereby achieving very precise ion energy control, beam density, ion injection angle and other parameters; and each electrode plate works independently of each other, avoiding electromagnetic interference and thermal effects between each other, ensuring the stability and reliability of the entire system.

[0008] Furthermore, a communication interface is provided on the control circuit board.

[0009] By adopting the above technical solution, the voltage difference between the electrode plate groups can be remotely controlled, and the orientation process can also be monitored and optimized.

[0010] Furthermore, a plurality of mounting slots adapted for the electrode plates are provided in the insulating radiation-proof shell, and each of the electrode plates is plugged into the mounting slot respectively.

[0011] By adopting the above technical solution, the electrode plate group can be accurately and firmly installed to ensure the stability and accuracy of use; when the electrode plate needs to be replaced or maintained, it can be plugged in and replaced without disassembling the entire device, effectively improving work efficiency and reducing maintenance costs.

[0012] Furthermore, the insulating radiation-proof housing is provided with a connecting portion on a side facing the ion source, and the connecting portion is threadedly connected to an ion beam outlet of the ion source.

[0013] By adopting the above technical solution, the internal thread is arranged at the connection part and is tightly connected with the ion beam outlet thread of the ion source, so that the device can be installed and docked to the ion source output port.

[0014] Compared with the prior art, the beneficial effects of the utility model are:

[0015] 1. The utility model can form a finely controllable electric field by setting a multi-channel control module to independently adjust the voltage difference between each electrode plate, accurately orient and focus the ion beam, effectively prevent the ion beam from diverging, and ensure that the ion beam is accurately injected into the semiconductor according to the preset path.

[0016] 2. The utility model adopts a combination of a micro multi-channel power supply and a control circuit board to achieve independent and precise voltage control of each electrode plate, ensuring the high precision and stability of the device while avoiding electromagnetic interference between the electrode plates.

[0017] 3. The utility model has an integrated communication interface on the control circuit board, which is convenient for remote control to adjust the voltage difference between electrode plate groups and optimize the orientation process.

[0018] The above description is only an overview of the technical solution of the present invention. In order to more clearly understand the technical means of the present invention, it can be implemented in accordance with the contents of the specification. In order to make the above and other purposes, features and advantages of the present invention more obvious and easy to understand, the following specifically cites a preferred embodiment and describes it in detail with the accompanying drawings as follows. BRIEF DESCRIPTION OF THE DRAWINGS

[0019] Figure 1 Schematic diagram of the overall structure of this embodiment;

[0020] Figure 2 This is a schematic diagram of a multi-channel control module of this embodiment;

[0021] Figure 3 Schematic diagram of electrode plate installation in this embodiment.

[0022] In the figure: 1. Insulated radiation-proof shell; 2. Guide channel; 3. Electrode plate; 4. Multi-channel control module; 41. Multi-channel micro power supply; 42. Control circuit board; 421. Communication interface; 5. Mounting slot; 6. Connecting part. DETAILED DESCRIPTION

[0023] In order to make the content of the utility model more clearly understood, the utility model is further described below based on specific embodiments in combination with the accompanying drawings.

[0024] It should be noted that the terms "center", "upper", "lower", "front", "back", "left", "right", "top", "inside", "outside" and the like used herein to indicate positions or positional relationships are based on the positions or positional relationships shown in the drawings, and are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific position, be constructed and operated in a specific position, and therefore cannot be understood as a limitation on the present invention. Unless otherwise specified, "plurality" means two or more.

[0025] Unless otherwise clearly specified and limited, the terms "installed", "connected" and "connected" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium, or it can be the internal communication of two components. For ordinary technicians in this field, the specific meanings of the above terms in this utility model can be understood by specific circumstances.

[0026] like Figures 1 to 3As shown, an ion beam directional flow optimization insulating guide is intended to accurately direct the ion beam, which is installed and docked at the ion beam output port of the ion source, wherein this embodiment includes an insulating radiation-proof shell 1 and a guide channel 2 arranged in the insulating radiation-proof shell 1 for directing the ion beam, six electrode plates 3 and a multi-way control module 4 electrically connected to each electrode plate 3 for independently adjusting the voltage difference between each electrode plate 3 are also embedded in the insulating radiation-proof shell 1, and each of the electrode plates 3 is arranged in an array surrounding the guide channel 2.

[0027] In this embodiment, by arranging a plurality of electrode plates 3 around the guide channel 2 and independently adjusting the voltage difference between the electrodes using a multi-channel control module 4, a fine and adjustable electric field can be formed, thereby achieving accurate orientation and focusing of the ion beam output by the ion implanter, effectively preventing it from diverging, and ensuring that the ion beam is accurately injected into the semiconductor according to the preset path, and the insulating radiation-proof shell 1 is made of radiation-proof insulating material, composed of high molecular polymer, insulating material and radiation-proof material, so that the shell has high strength, high insulation performance and can effectively prevent radiation. It can reflect or weaken the radiation that may be leaked by the ion beam during the guiding process, ensuring the safety of the guiding process.

[0028] like Figure 2 As shown, the multi-channel control module 4 of this embodiment includes a multi-channel micro power supply 41 installed in the insulating radiation-proof housing 1 and a control circuit board 42 electrically connected to the multi-channel micro power supply 41 for controlling the output voltage, wherein each output end of the multi-channel micro power supply 41 is connected to the top of the electrode plate 3 through a wire, and can provide a stable and adjustable voltage output. The control circuit board 42 connected to the power supply by wire can accurately and independently control the output voltage of each output end of the multi-channel micro power supply 41, can accurately allocate the required working voltage to each electrode plate 3, and at the same time avoid electromagnetic interference between the electrode plates 3, and accurately and independently direct the ion beam in the ion channel.

[0029] like Figure 2 As shown, the control circuit board 42 of this embodiment is provided with a communication interface 421, which can realize signal connection with an external computer control system or other intelligent devices. The operator remotely controls the voltage difference setting between the three groups of electrode plates, thereby dynamically optimizing the orientation and focusing of the ion beam, and can also perform data transmission and status feedback, thereby enhancing the controllability and flexibility of the equipment.

[0030] like Figure 3As shown, in order to further optimize the installation mode and maintenance convenience of the electrode plate 3, six installation slots 5 adapted to the electrode plate 3 are provided in the insulating radiation-proof housing 1 of this embodiment, and each electrode plate 3 is respectively plugged and installed in the corresponding installation slot 5 to ensure the position accuracy and stability of the electrode plate 3 group during installation, thereby ensuring the accuracy of the ion beam orientation and focusing effect; and when the electrode plate 3 needs to be replaced or routinely maintained, the operator only needs to complete the replacement or maintenance of the electrode plate 3 through a simple plug-in action. The maintenance process is simplified and the work efficiency is effectively improved.

[0031] like Figure 1 As shown, the insulating radiation-proof housing 1 of this embodiment is provided with a connecting portion 6 facing the ion source side, and the connecting portion is embedded with an internal thread structure and is tightly connected to the ion beam outlet of the ion source, so that the device can be installed and docked to the ion beam outlet of the ion source.

[0032] The working principle of this embodiment is as follows: This embodiment uses a micro multi-channel power supply and a control circuit board 42 to control the voltage difference of the internal electrode plates 3, thereby realizing independent and precise voltage control of each electrode plate 3 and avoiding electromagnetic interference between the electrode plates 3. The ion beam of the ion channel is accurately directed and focused, effectively preventing the divergence of the ion beam, and ensuring that the ion beam is accurately injected into the semiconductor according to the preset path. In addition, a communication interface 421 is integrated on the control circuit board 42, and the voltage difference between the electrode plates 3 can be remotely controlled and adjusted. In addition, the insulating radiation-proof shell 1 composed of a composite of a high molecular polymer, an insulating material and a radiation-proof material can ensure high strength and high insulation performance of the shell, and has good radiation-proof capability.

[0033] The embodiments described above are only preferred implementation modes of the present utility model and cannot be used to limit the protection scope of the present utility model. Any non-substantial changes and modifications made by technicians in this field on the basis of the utility model shall fall within the protection scope of the present utility model.

Claims

1. An ion beam directional flow optimization insulating guide, connected to the ion beam outlet of an ion source, characterized in that: It includes an insulating radiation-proof shell and a guide channel arranged in the insulating radiation-proof shell for orienting the ion beam. An even number of electrode plates and a multi-way control module electrically connected to each electrode plate for independently adjusting the voltage difference between each electrode plate are also embedded in the insulating radiation-proof shell. Each of the electrode plates is in an array surrounding the guide channel.

2. The ion beam directional flow optimization insulating guide according to claim 1, characterized in that: The multi-channel control module includes a multi-channel micro power supply and a control circuit board electrically connected to the multi-channel micro power supply for controlling the output voltage.

3. The ion beam directional flow optimization insulating guide according to claim 2, characterized in that: The control circuit board is provided with a communication interface.

4. The ion beam directional flow optimization insulating guide according to claim 1, characterized in that: The insulating radiation-proof shell is provided with a plurality of mounting slots adapted for the electrode plates, and each of the electrode plates is plugged into the mounting slot respectively.

5. The ion beam directional flow optimization insulating guide according to claim 4, characterized in that: The insulating radiation-proof housing is provided with a connecting portion on a side facing the ion source, and the connecting portion is threadedly connected to an ion beam outlet of the ion source.

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