Tube to prevent gas liquefaction and equipment for wafer epitaxial growth
By introducing a heating unit into the gas pipeline and dynamically adjusting the heating temperature, the problem of uneven gas liquefaction and heating temperature in the prior art is solved, and the reliability of gas transportation and the performance of wafer processing are improved, while reducing production costs.
Patent Information
- Application Number
- CN202421366911.1
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-06-14
- Publication Date
- 2025-04-01
- Estimated Expiration
- 2034-06-14
AI Technical Summary
In the prior art, the heating temperature of the gas pipeline is uneven during the heating process, resulting in gas liquefaction, causing pipeline damage and contamination, and affecting the yield and performance of the chip.
A pipe body is designed to prevent gas liquefaction, including an inner pipe, a heating unit and an outer pipe. The heating unit consists of a heater and a gas detector. The gas detector detects the type of gas. The controller adjusts the heater temperature according to the detection results to ensure that the inner tube remains heated properly.
By dynamically adjusting the heating temperature, gas liquefaction is avoided, gas transportation is guaranteed, particle and metal pollution is reduced, wafer processing performance and yield are improved, and production costs are reduced.
Smart Images
Figure CN222700468U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to the technical field of wafer processing, in particular to a tube body for preventing gas from liquefying and equipment for wafer epitaxial growth. Background Art
[0002] The epitaxy (EPI) process has become an indispensable process because it can provide compressive stress and improve the mobility of carriers. The EPI process is an interfacial reaction, which requires the crystal interface to have good lattice integrity and flatness in order to grow a layer of single crystal material with the same lattice arrangement on the crystal interface. The EPI machine can usually perform pre-cleaning process and epitaxial growth process. The existing pre-cleaning process is to use gaseous HF, gaseous NH 3 It reacts with the oxide on the silicon surface to form (NH4)2SiF6 which is easily sublimated, thus achieving pre-cleaning of the silicon surface. 3 It will cause irreversible damage to the gas pipeline and bring about particle and metal pollution, which will affect the yield and performance of the chip. Therefore, measures are usually taken in the prior art to reduce the HF and NH 3 Install heating tape on the pipes to prevent condensation.
[0003] However, the installation method of the heating belt and the way the heating belt covers the pipeline in the prior art will affect the actual heating temperature of the pipeline. Moreover, in a closed and narrow gas cabinet, the heating belt will affect the heating effect of the adjacent gas pipeline, resulting in uneven heating temperature. In addition, since the types of gases transported by the pipeline may be different, if a single fixed temperature is used to heat the pipeline, the heating temperature may be too high or too low. When the heating temperature is too high, electricity will be wasted, which will increase production costs. When the heating temperature is too low, the gas in the pipeline will condense. Utility Model Content
[0004] The purpose of the utility model is to provide a tube body that prevents gas liquefaction and a device for wafer epitaxial growth, thereby avoiding the occurrence of gas liquefaction when cooled, ensuring the reliability of gas transportation, improving the performance and yield of wafer processing, and reducing production costs.
[0005] To achieve the above-mentioned purpose, in a first aspect, the utility model provides a pipe body for preventing gas from liquefying, comprising an inner pipe, a heating unit and an outer pipe;
[0006] The inner tube is inserted into the outer tube, and a gap is provided between the outer wall of the inner tube and the inner wall of the outer tube to form an annular installation area, and the inner tube is used for conveying gas;
[0007] The heating unit has a heater and a gas detector. The gas detector is arranged on the inner wall of the inner tube and is used to detect the type of gas in the inner tube. The heater is arranged in the installation area and surrounds the outer wall of the inner tube. The heater is electrically connected to the gas detector and is used to heat the inner tube.
[0008] The beneficial effect of the tube body for preventing gas liquefaction provided by the utility model is that: the type of gas in the inner tube is detected by a gas detector, and the gas detector is used in conjunction with a heater, so that the heater can adjust the appropriate temperature according to the type of gas to heat the inner tube, thereby avoiding damage to the tube body caused by gas liquefaction when it is cooled, and preventing the generation of particles and metal pollution. More importantly, since the heater can heat and adjust the temperature according to the temperature value required by different types of gas to maintain a vaporized state, it avoids the situation where the heater heats the tube body at an excessively high temperature, thereby wasting electricity, thereby reducing production costs.
[0009] In some embodiments, the heating unit includes a controller;
[0010] The controller is electrically connected to the gas detector and the heater. The controller controls the heater to heat according to the type of gas detected by the gas detector so as to keep the gas in the inner tube in a vaporized state.
[0011] In some embodiments, the heating unit further comprises a temperature sensor;
[0012] The temperature sensor is arranged in the inner tube and is electrically connected to the controller. The temperature sensor is used to detect the actual temperature value in the inner tube.
[0013] In some embodiments, the tube body further comprises an insulating sleeve;
[0014] The insulating sleeve is sleeved on the outer side wall of the inner tube to separate the heating unit from the inner tube;
[0015] and / or,
[0016] The tube body also includes a heat-insulating sleeve, which is sleeved on the outer side wall of the heating unit to separate the heating unit from the outer tube.
[0017] In some embodiments, the heater is a heating resistance wire or a heating plate, and the heating resistance wire or the heating plate is wound around the outer wall of the inner tube.
[0018] In some embodiments, the heater is a heating plate;
[0019] A plurality of heating plates are arranged around the outer side wall of the inner tube at intervals, each heating plate extends along the axial direction of the inner tube, and the spacing between adjacent heating plates is the same.
[0020] In some embodiments, the inner tube includes a first sub-inner tube and a second sub-inner tube;
[0021] The first sub-inner tube is inserted into the second sub-inner tube, and there is a gap between the first sub-inner tube and the second sub-inner tube to form a radiation layer, the radiation layer is used to fill gas or liquid, and the first sub-inner tube is used to transport gas;
[0022] The heater surrounds the second sub-inner tube and is used to heat the radiation layer;
[0023] The gas detector is arranged in the first sub-inner tube.
[0024] In some embodiments, the thickness of the outer tube is greater than the thickness of the inner tube.
[0025] In some embodiments, the tube body includes a straight tube, an arc-shaped tube or a special-shaped tube, and the straight tube, the arc-shaped tube or the special-shaped tube can be detachably connected to each other.
[0026] The beneficial effect of the tube body for preventing gas liquefaction provided by the utility model is that the inner tube is heated by the heating unit, thereby preventing the gas from liquefying during the transportation process, so as to ensure the reliability of gas transportation.
[0027] In a second aspect, an embodiment of the utility model provides an apparatus for epitaxial growth of wafers, comprising a reaction chamber and a tube body for preventing gas liquefaction;
[0028] The tube body is in communication with the reaction chamber and is used to transport the gas into the reaction chamber;
[0029] The reaction chamber is used for holding wafers.
[0030] The beneficial effects of the equipment for epitaxial growth of wafers provided by the utility model are: by adopting the tube body provided in this embodiment to transport gas, the reliability of gas transportation is guaranteed, damage to the tube body caused by gas liquefaction when cooled is avoided, the generation of particles and metal pollution is eliminated, the performance and yield of the wafer after processing are improved, and the heater can heat and adjust the temperature according to the type of gas, thereby reducing production costs. BRIEF DESCRIPTION OF THE DRAWINGS
[0031] Figure 1 A cross-sectional view of a tube body for preventing gas liquefaction along its axial direction provided by the first embodiment of the utility model;
[0032] Figure 2 This is a cross-sectional view of a tube body along its axial direction for preventing gas liquefaction according to a second embodiment of the present invention.
[0033] Figure 3This is a schematic structural diagram of a first embodiment of the utility model in which a heater is sleeved on the outer side wall of an inner tube;
[0034] Figure 4 A schematic diagram of the structure of the second embodiment of the utility model in which the heater is sleeved on the outer wall of the inner tube;
[0035] Figure 5 A cross-sectional view of a tube body for preventing gas liquefaction along its axial direction provided by the third embodiment of the utility model;
[0036] Figure 6 This is a cross-sectional view of a tube body along its axial direction for preventing gas liquefaction according to a fourth embodiment of the present invention.
[0037] Reference numerals:
[0038] Inner tube 1, first sub-inner tube 11, second sub-inner tube 12, radiation layer 13, heating unit 2, heater 21, gas detector 22, controller 23, temperature sensor 24, outer tube 3, insulation sleeve 4, thermal insulation sleeve 5. DETAILED DESCRIPTION
[0039] In order to make the purpose, technical solution and advantages of the utility model clearer, the technical solution in the embodiment of the utility model will be clearly and completely described below in conjunction with the drawings of the utility model. Based on the embodiments in the utility model, all other embodiments obtained by ordinary technicians in this field without making creative work are within the scope of protection of the utility model. Unless otherwise defined, the technical terms or scientific terms used herein should be the usual meanings understood by people with general skills in the field to which the utility model belongs. "Including" and similar words used in this article mean that the elements or objects appearing before the word include the elements or objects listed after the word and their equivalents, without excluding other elements or objects. Unless otherwise specified, the "connection" described in this article can be a direct connection or an indirect connection, that is, a connection through an intermediate.
[0040] EPI machines can usually perform pre-cleaning and epitaxial growth processes. The existing pre-cleaning process is to use gaseous HF, gaseous NH 3 It reacts with the oxide on the silicon surface to form (NH4)2SiF6 which is easily sublimated, thus achieving pre-cleaning of the silicon surface. 3 When condensed and liquefied to form liquid, liquid HF and NH 3 It will cause irreversible damage to the gas pipeline and bring about particle and metal pollution, affecting the yield and performance of the chip.
[0041] In view of the problems existing in the prior art, the embodiment of the utility model provides a pipe body to prevent gas liquefaction, referring to Figure 1 As shown, the tube body includes an inner tube 1, a heating unit 2 and an outer tube 3. The inner tube 1 is inserted into the outer tube 3 and is coaxially arranged with the outer tube 3, and there is a gap between the outer wall of the inner tube 1 and the inner wall of the outer tube 3 to form an annular installation area, and the inner tube 1 is used to transport gas. The heating unit 2 has a heater 21 and a gas detector 22, and the gas detector 22 is arranged on the inner wall of the inner tube 1 to detect the type of gas in the inner tube 1. The heater 21 is arranged in the installation area and is arranged around the outer wall of the inner tube 1, and the heater 21 is electrically connected to the gas detector 22, and the heater 21 is used to heat the inner tube 1 to prevent the gas in the inner tube 1 from condensing.
[0042] In this embodiment, by arranging the heating unit 2 between the inner tube 1 and the outer tube 3 for heating the inner tube 1, the gas in the tube body is prevented from being cooled and liquefied during the gas transportation process, thereby ensuring the reliability of gas transportation, avoiding damage to the tube body caused by the gas being cooled and liquefied, and thus preventing the formation of particles and metal pollution in the tube body. More importantly, since the heating unit 2 has a heater 21 and a gas detector 22, the heater 21 is electrically connected to the gas detector 22, and the gas detector 22 is used to detect the type of gas in the inner tube 1, the heater 21 can be controlled to heat and adjust the temperature according to the received information of different gas types, avoiding the situation where the heater 21 heats the inner tube 1 at too high a temperature and wastes electricity, thereby reducing production costs.
[0043] Continue to refer Figure 1 As shown, in some embodiments, the heating unit 2 further includes a controller 23. The heater 21 is disposed in the installation area and surrounds the outer wall of the inner tube 1 to uniformly heat the inner tube 1. The controller 23 is electrically connected to the gas detector 22 and the heater 21, and the controller 23 controls the heater 21 to heat according to the type of gas detected by the gas detector 22, so that the gas in the inner tube 1 remains in a vaporized state.
[0044] In this embodiment, the controller 23 stores the minimum temperature values required for different types of gases to maintain a vaporized state. When the gas detector 22 detects the type of gas in the inner tube 1, the detected gas type is sent to the controller 23, and the controller 23 selects the corresponding minimum temperature value according to the gas type, and controls the heater 21 to work, so that the temperature in the inner tube 1 reaches the minimum temperature required for the type of gas to maintain a vaporized state.
[0045] It can be seen that the heating unit 2 in this embodiment can adjust the heating temperature according to different gases, improve the reliability of heating different gases to keep them in a vaporized state, reduce production costs, and avoid the situation where the heating temperature of the inner tube 1 is too high or too low. Because when the heater 21 heats the inner tube 1 and the temperature inside the inner tube 1 is too high, the production cost will increase. When the heater 21 heats the inner tube 1 and the temperature inside the inner tube 1 is too low, the gas will liquefy again.
[0046] In some embodiments, the heating unit 2 further includes a temperature sensor 24 , which is disposed in the inner tube 1 and electrically connected to the controller 23 , and is used to detect an actual temperature value in the inner tube 1 .
[0047] In this embodiment, by setting the temperature sensor 24 in the inner tube 1, the actual temperature value in the inner tube 1 can be detected in real time. The temperature sensor 24 feeds back the detected actual temperature value to the controller 23. If there is a deviation between the actual temperature value and the temperature value that the controller 23 wants to control the heater 21 to heat, the controller 23 controls the heater 21 to appropriately increase or decrease the heating temperature to compensate for the deviation value, thereby realizing the function of automatic calibration and temperature adjustment.
[0048] refer to Figure 2 As shown, in some embodiments, the tube body further includes an insulating sleeve 4, which is sleeved on the outer side wall of the inner tube 1 to separate the heating unit 2 from the inner tube 1. And / or, the tube body further includes a heat insulating sleeve 5, which is sleeved on the outer side wall of the heating unit 2 to separate the heating unit 2 from the outer tube 3.
[0049] In this embodiment, by arranging the insulating sleeve 4 on the outer wall of the inner tube 1, the heater 21 can be prevented from short-circuiting, thereby ensuring the reliability of the heater 21 heating the inner tube 1. In addition, by arranging the heat-insulating sleeve 5 on the outer wall of the heating unit 2, the tube body can be insulated and kept warm, and the temperature of adjacent tube bodies can be prevented from affecting each other during use, thereby ensuring the uniformity of the temperature inside the tube body.
[0050] The insulating sleeve 4 can be made of polymer compounds such as phenolic resin, polyvinyl chloride, polytetrafluoroethylene, etc. The heat insulating sleeve 5 can be made of heat insulating materials such as polystyrene foam, polyurethane foam, glass wool, etc.
[0051] refer to Figure 3As shown, in some embodiments, the heater 21 is a heating resistance wire or a heating plate, and the heating resistance wire or the heating plate is wound around the outer wall of the inner tube 1 so that the heating resistance wire or the heating plate has a spiral structure.
[0052] In some embodiments, the heater 21 is a heating resistor, and the heating resistor is wound around the outer wall of the inner tube 1 so that the heating resistor has a spiral structure, and its shape is similar to Figure 3 The structures shown are similar.
[0053] refer to Figure 4 As shown, in other embodiments, the heater 21 is a heating plate, and a plurality of the heating plates are arranged at intervals around the outer wall of the inner tube 1. The heating plates extend along the axial direction of the inner tube 1, and the spacing between adjacent heating plates is the same to ensure uniform heating of the inner tube 1.
[0054] refer to Figure 5 As shown, in some embodiments, the inner tube 1 includes a first sub-inner tube 11 and a second sub-inner tube 12. The first sub-inner tube 11 is inserted into the second sub-inner tube 12 and is coaxially arranged. There is a gap between the first sub-inner tube 11 and the second sub-inner tube 12 to form a radiation layer 13, and the radiation layer 13 is used to fill gas or liquid. The first sub-inner tube 11 is used to transport gas. The heater in the heating unit 2 surrounds the second sub-inner tube 12 and is used to heat the radiation layer 13. The gas detector 22 in the heating unit 2 is arranged in the first sub-inner tube 11 to detect the type of gas in the first sub-inner tube 11.
[0055] In this embodiment, there is a gap between the first inner sub-tube 11 and the second inner sub-tube 12 to form a radiation layer 13, and the radiation layer 13 is used to fill gas or liquid, wherein the gas filled in the radiation layer 13 may be an inert gas, and the liquid filled in the radiation layer 13 may be water or oil. The heater is used to heat the radiation layer 13 and the gas or liquid conducts heat to ensure uniform heating of the transported gas in the inner tube 1.
[0056] In some embodiments, the thickness of the outer tube 3 is greater than the thickness of the inner tube 1. In this case, the outer tube 3 is equivalent to a protective layer structure, which can not only play a role in heat insulation, but also provide stress protection for the tube body.
[0057] refer to Figure 6 As shown, in some embodiments, when the outer tube 3 is designed to be thicker, the heater 21 can also be arranged in the outer tube 3. At this time, the installation area formed between the outer tube 3 and the inner tube 1 is used to fill liquid or gas.
[0058] In some embodiments, both the inner tube 1 and the outer tube 3 can be made of stainless steel.
[0059] In some embodiments, the tube body includes a straight tube, an arc-shaped tube or a special-shaped tube, and the straight tube, the arc-shaped tube or the special-shaped tube can be detachably connected to each other.
[0060] In this embodiment, by setting the shape of the tube body to be a straight tube, an arc tube and a special-shaped tube, the installation of the tube body is facilitated to be suitable for different installation spaces.
[0061] In another embodiment provided by the utility model, there is provided a device for epitaxial growth of wafers, the device comprising a reaction chamber and a tube body for preventing gas liquefaction, the tube body being connected to the reaction chamber and being used to transport gas into the reaction chamber, the reaction chamber being used to hold wafers.
[0062] In this embodiment, the tube is used to transfer gaseous HF and gaseous NH 3 The gas is transported into the reaction chamber, thereby pre-cleaning the wafer surface. By using the tube in this embodiment, the gas is prevented from liquefying during the transportation process, so as to ensure the reliability of gas transportation, thereby ensuring the processing effect of the wafer and improving the performance and yield of the wafer after processing.
[0063] The above is only a specific implementation of the embodiment of the present application, but the protection scope of the embodiment of the present application is not limited thereto, and any changes or replacements within the technical scope disclosed in the embodiment of the present application should be included in the protection scope of the embodiment of the present application. Therefore, the protection scope of the embodiment of the present application should be based on the protection scope of the claims.
Claims
1. A tube for preventing gas liquefaction, characterized in that: comprising an inner tube, a heating unit and an outer tube; The inner tube is inserted into the outer tube, and a gap is provided between the outer wall of the inner tube and the inner wall of the outer tube to form an annular installation area, and the inner tube is used for conveying gas; The heating unit has a heater and a gas detector. The gas detector is arranged on the inner wall of the inner tube and is used to detect the type of gas in the inner tube. The heater is arranged in the installation area and surrounds the outer wall of the inner tube. The heater is electrically connected to the gas detector and is used to heat the inner tube.
2. The tube for preventing gas liquefaction according to claim 1, characterized in that: The heating unit includes a controller; The controller is electrically connected to the gas detector and the heater. The controller controls the heater to heat according to the type of gas detected by the gas detector so as to keep the gas in the inner tube in a vaporized state.
3. The tube for preventing gas liquefaction according to claim 2, characterized in that: The heating unit also includes a temperature sensor; The temperature sensor is arranged in the inner tube and is electrically connected to the controller. The temperature sensor is used to detect the actual temperature value in the inner tube.
4. The tube for preventing gas liquefaction according to claim 1, characterized in that: Also includes insulation sleeve The insulating sleeve is sleeved on the outer side wall of the inner tube to separate the heating unit from the inner tube; and / or, It also includes a heat insulation sleeve, which is arranged on the outer side wall of the heating unit to separate the heating unit from the outer tube.
5. The tube for preventing gas liquefaction according to claim 2, characterized in that: The heater is a heating resistance wire or a heating plate, and the heating resistance wire or the heating plate is wound around the outer side wall of the inner tube.
6. The tube for preventing gas liquefaction according to claim 2, characterized in that: The heater is a heating plate; A plurality of heating plates are arranged around the outer side wall of the inner tube at intervals, each of the heating plates extends along the axial direction of the inner tube, and the spacing between adjacent heating plates is the same.
7. The tube for preventing gas liquefaction according to claim 2, characterized in that: The inner tube comprises a first sub-inner tube and a second sub-inner tube; The first sub-inner tube is inserted into the second sub-inner tube, and there is a gap between the first sub-inner tube and the second sub-inner tube to form a radiation layer, the radiation layer is used to fill gas or liquid, and the first sub-inner tube is used to transport gas; The heater surrounds the second sub-inner tube and is used to heat the radiation layer; The gas detector is arranged in the first sub-inner tube.
8. The tube for preventing gas liquefaction according to claim 7, characterized in that: The thickness of the outer tube is greater than the thickness of the inner tube.
9. The tube for preventing gas liquefaction according to claim 3, characterized in that: The tube body includes a straight tube, an arc-shaped tube or a special-shaped tube, and the straight tube, the arc-shaped tube or the special-shaped tube can be detachably connected to each other.
10. An apparatus for wafer epitaxial growth, characterized in that: A device comprising a reaction chamber and a tube body for preventing gas liquefaction according to any one of claims 1 to 9; The tube body is in communication with the reaction chamber and is used to transport the gas into the reaction chamber; The reaction chamber is used for holding wafers.