Developing and cleaning device

Abstract

The utility model relates to a developing and cleaning device, including a machine base and a working chamber arranged in the machine base, wherein a liftable immersion tray is arranged inside the working chamber, a through hole is arranged in the middle of the immersion tray, a silicon wafer and glass wafer adsorption rotating assembly is arranged in the through hole, and a sealing structure is arranged on the outer wall of the silicon wafer and glass wafer adsorption rotating assembly, when the immersion tray descends, an annular drainage groove is formed between the inner wall of the through hole and the outer wall of the silicon wafer and glass wafer adsorption rotating assembly, and when the immersion tray rises, a seal is formed between the sealing structure of the outer wall of the silicon wafer and glass wafer adsorption rotating assembly and the inner wall of the through hole. The utility model has reasonable design and is easy to use. The immersion tray is raised to make the silicon wafer on the silicon wafer and glass wafer adsorption rotating assembly contact and immerse with the developer quantitatively input into the immersion tray to complete the developing work, and the immersion tray is lowered to make the developer in the immersion tray empty through the annular drainage groove, so as to ensure that the silicon wafer is developed evenly, and the developing time and effect are controllable, thereby effectively improving the developing work efficiency and quality.

Description

Technical Field

[0001] The utility model relates to a developing and cleaning device. Background Art

[0002] The photolithography process is a very important process in the manufacture of semiconductor chips. It uses photoresist (also known as photoresist) to transfer the pattern on the mask to the substrate. Generally, it goes through the processes of cleaning and drying the substrate surface, coating, photoresist coating, soft baking, alignment exposure, post-baking, development, hard baking, etching, and testing. At present, in the development process, manual development is required in the production process of microfluidic chips. Manual development is not only inefficient, but also uncontrollable in development time and effect. Operators are also prone to artificial damage to the chip / silicon wafer. The existing spray-type development and cleaning machine sprays the developer on the silicon wafer by setting a developer spray head above the silicon wafer and pointing downward. However, when the area of ​​the silicon wafer is relatively large, the spray head cannot spray the developer on all areas of the silicon wafer, resulting in uneven development on the silicon wafer. Utility Model Content

[0003] The utility model improves the above-mentioned problem, that is, the technical problem to be solved by the utility model is to provide a developing and cleaning device to ensure uniform development of silicon wafers, controllable development time and effect, and improve development work efficiency and effect.

[0004] The utility model is constructed as follows: it includes a machine base and a working chamber arranged in the machine base, wherein a liftable immersion tray is arranged inside the working chamber, a through opening is arranged in the middle of the immersion tray, a silicon wafer and glass wafer adsorption rotating assembly is arranged in the through opening, and a sealing structure is arranged on the outer wall of the silicon wafer and glass wafer adsorption rotating assembly, when the immersion tray descends, an annular drainage groove is formed between the inner wall of the through opening and the outer wall of the silicon wafer and glass wafer adsorption rotating assembly, and when the immersion tray rises, a seal is formed between the sealing structure of the outer wall of the silicon wafer and glass wafer adsorption rotating assembly and the inner wall of the through opening, so that the silicon wafer on the silicon wafer and glass wafer adsorption rotating assembly is contacted and immersed in a quantitative developer input into the immersion tray.

[0005] Furthermore, three push rod motors for pushing the liquid inlet tray to rise and fall vertically are arranged below the working chamber, and the movable ends of the push rod motors pass through the bottom of the working chamber and are connected to the liquid immersion tray.

[0006] Furthermore, a liquid inlet pipeline is provided on the side of the immersion tray.

[0007] Furthermore, the working chamber includes an inner cavity and a cover arranged above the inner cavity, the inner bottom surface of the inner cavity is provided with an annular drainage groove, and the inner bottom surface of the annular drainage groove is provided with a drainage pipeline.

[0008] Furthermore, a spray cleaning nozzle is arranged above the immersion tray.

[0009] Furthermore, the silicon wafer and glass sheet adsorption rotating assembly includes a tray, a rotating seat and a hollow shaft servo motor arranged in sequence from top to bottom, the rotating seat is connected to the tray at the top, and a closed chamber is formed between the upper part of the rotating seat and the lower part of the tray, the rotating seat is connected to the hollow shaft of the hollow shaft servo motor at the bottom, the tray has a suction hole connected to the closed chamber, a suction pipe is arranged inside the hollow shaft, the upper end of the suction pipe is connected to the closed chamber, the lower end of the suction pipe is connected to a vacuum pump arranged outside via a vacuum pump pipeline, and the hollow shaft servo motor drives the tray to rotate.

[0010] Furthermore, an annular protrusion is provided in the middle of the bottom surface of the working chamber, and an annular groove is provided below the rotating seat to cooperate with the annular protrusion. The diameter of the annular protrusion is smaller than the through opening. The sealing structure is provided on the outer wall of the rotating seat, and the outer wall of the rotating seat is adapted to the size of the through opening.

[0011] Furthermore, the sealing mechanism is a sealing ring.

[0012] Furthermore, a push rod motor for driving the immersion tray to rise and fall is arranged below the working chamber, and the movable end of the push rod motor passes through the bottom of the working chamber and is connected to the immersion tray.

[0013] Compared with the prior art, the utility model has the following beneficial effects: the device has reasonable design, simple structure, convenient use, controllable developing time and effect, accurate developing time, uniform development of silicon wafers, and improved development efficiency of silicon wafers; during use, the cover of the machine base is opened, the silicon wafers are placed on the tray, and the vacuum pump is started. The negative pressure generated by the vacuum pump adsorbs and fixes the silicon wafers on the tray through the suction pipe, the closed chamber, and the suction port, and the cover is closed to make the working chamber in a closed state; the push rod motor drives the immersion tray to move upward, so that the inner wall of the through hole of the immersion tray contacts the sealing ring of the outer wall of the silicon wafer glass sheet adsorption rotating assembly and blocks the through hole to achieve sealing; the developer is input and quantitatively supplied from the liquid inlet pipeline beside the immersion tray, and at this time the developer does not contact the silicon wafer; after the quantitative input of the developer in the immersion tray is completed, the push rod motor continues to drive the immersion tray to move a certain distance upward, so that the silicon wafer is immersed in the quantitative developer in the immersion tray, and the silicon wafer is immersed in the quantitative developer in the immersion tray. When the wafer is soaked, the hollow shaft servo motor drives the tray and the silicon wafer on the tray to rotate slowly, so that the silicon wafer and the developer have relative flow, ensuring that the silicon wafer and the developer are in uniform contact with each other; after the development work is completed, the push rod motor drives the immersion tray to move downward, so that the inner wall of the through hole of the immersion tray is separated from the sealing ring of the outer wall of the silicon wafer glass wafer adsorption rotating assembly, and an annular drainage groove is formed between the inner wall of the through hole of the immersion tray and the outer wall of the silicon wafer glass wafer adsorption rotating assembly. The used developer is discharged outward through the annular drainage groove, the working chamber, the annular drainage groove, and the drainage pipeline to empty the developer in the immersion tray; the hollow shaft servo motor drives the silicon wafer on the tray to rotate at a high speed to centrifugally dry the developer on the silicon wafer; the spray cleaning nozzle on the cover evenly sprays pure water on the silicon wafer downward to clean the silicon wafer. After cleaning, the hollow shaft servo motor continues to drive the silicon wafer on the tray to rotate at a high speed to dry the water on the silicon wafer; finally, the cover is opened, the vacuum pump is turned off, and the silicon wafer is taken out. BRIEF DESCRIPTION OF THE DRAWINGS

[0014] Figure 1 It is a three-dimensional diagram of an embodiment of the utility model;

[0015] Figure 2 It is a schematic diagram of the local structure of an embodiment of the utility model;

[0016] Figure 3 This is a cross-sectional view of the immersion tray in the embodiment of the utility model in a raised state;

[0017] Figure 4 This is a cross-sectional view of the immersion tray in the descending state of the embodiment of the utility model;

[0018] Figure 5 for Figure 4 A partial enlarged view of the middle A;

[0019] In the figure: 1-machine base, 101-working chamber, 102-inner cavity, 103-cover, 104-spray cleaning nozzle, 105-annular drainage groove, 106-drainage pipeline, 2-immersion tray, 201-port, 202-annular lower protrusion, 203-liquid inlet pipeline, 3-silicon wafer glass sheet adsorption rotation assembly, 301-tray, 302-rotating seat, 303-hollow shaft, 304-hollow shaft servo motor, 305-closed chamber, 306-suction hole, 307-air suction pipeline, 308-annular protrusion, 309-annular groove, 310-sinking tank, 311-vacuum pump pipeline, 4-sealing structure, 5-annular drainage groove, 6-push rod motor, 7-silicon wafer. DETAILED DESCRIPTION

[0020] The present invention will be further described in detail below in conjunction with the accompanying drawings and specific implementation methods.

[0021] Example: Figures 1 to 5 As shown, in this embodiment, a developing and cleaning device is provided, including a machine base 1 and a working chamber 101 arranged in the machine base, wherein a liftable immersion tray 2 is arranged inside the working chamber, a through hole 201 is arranged in the middle of the immersion tray, and the inner wall of the through hole has a certain height, an annular lower protrusion 202 is arranged at the bottom of the immersion tray, and the through hole is arranged in the middle of the annular lower protrusion, a silicon wafer and glass wafer adsorption rotating assembly 3 is arranged in the through hole, and a sealing structure 4 is arranged on the outer wall of the silicon wafer and glass wafer adsorption rotating assembly, and the sealing mechanism is a sealing ring, when the immersion tray descends, an annular drainage groove 5 is formed between the inner wall of the through hole and the outer wall of the silicon wafer and glass wafer adsorption rotating assembly, when the immersion tray rises, a seal is formed between the sealing structure of the outer wall of the silicon wafer and glass wafer adsorption rotating assembly and the inner wall of the through hole, so that the silicon wafer on the silicon wafer and glass wafer adsorption rotating assembly is contacted and immersed with the quantitative developer input into the immersion tray, thereby completing the work of developing and etching.

[0022] During operation: (1) the cover of the machine base is opened, the silicon wafer is placed on the tray, and the vacuum pump is started. The negative pressure generated by the vacuum pump is sucked and fixed on the silicon wafer 7 on the tray through the suction pipe, the closed chamber, and the suction port. The cover is closed to make the working chamber closed; (2) the push rod motor drives the immersion tray to move upward, so that the inner wall of the through hole of the immersion tray contacts the sealing ring of the outer wall of the silicon wafer glass sheet adsorption rotating assembly and blocks the through hole to achieve sealing; the developer is input and quantitatively supplied from the liquid inlet pipeline beside the immersion tray. At this time, the developer does not contact the silicon wafer; (3) after the quantitative input of the developer in the immersion tray is completed, the push rod motor continues to drive the immersion tray to move upward for a distance, so that the silicon wafer is immersed in the quantitative developer in the immersion tray for a period of time. The immersion time here can be 3-4 seconds or other required time. When the silicon wafer is immersed, the hollow shaft servo motor drives the tray and the silicon wafer on the tray to rotate slowly, so that the silicon wafer and the developer have relative flow, ensuring that the silicon wafer and the developer are in uniform contact with the developer. In addition, when the push rod motor continues to drive the immersion tray to move upward for a certain distance, the sealing ring of the inner wall of the through hole of the immersion tray and the outer wall of the silicon wafer glass sheet adsorption rotating assembly are still in a sealed state; (4) After the development work is completed, the push rod motor drives the immersion tray to move downward, so that the inner wall of the through hole of the immersion tray and the sealing ring of the outer wall of the silicon wafer glass sheet adsorption rotating assembly are separated, and an annular drainage groove is formed between the inner wall of the through hole of the immersion tray and the outer wall of the silicon wafer glass sheet adsorption rotating assembly. The used developer is discharged outward through the annular drainage groove, the working chamber, the annular drainage groove, and the drainage pipeline to empty the developer in the immersion tray; (5) The hollow shaft servo motor drives the silicon wafer on the tray to rotate at a high speed to centrifugally dry the developer on the silicon wafer; the spray cleaning nozzle on the cover sprays pure water evenly on the silicon wafer downward to clean the silicon wafer. After cleaning, the hollow shaft servo motor continues to drive the silicon wafer on the tray to rotate at a high speed to dry the water on the silicon wafer; (6) Finally, the cover is opened, the vacuum pump is turned off, and the silicon wafer is taken out.

[0023] In an embodiment of the utility model, three push rod motors 6 for pushing the liquid inlet plate to rise and fall vertically are arranged below the working chamber, and the movable end of the push rod motor passes through the bottom of the working chamber and is connected to the immersion plate; the three push rod motors are evenly distributed, the movements are precisely synchronized, and the ejection displacements are the same. The arrangement of the three push rod motors can ensure that the plane of the immersion plate is perpendicular to the movement axis of the push rod motor, so that the immersion plate can be vertically lifted while maintaining a horizontal state, thereby ensuring that the outer wall of the silicon wafer and glass sheet adsorption rotating assembly and the opening in the middle of the immersion plate are coaxial and smoothly realize relative movement, ensuring that they will not get stuck during the lifting process, which is beneficial to liquid accumulation and drainage.

[0024] The push rod motor is a stepping push rod motor.

[0025] In the embodiment of the utility model, a liquid inlet pipeline 203 is arranged on the side of the immersion tray; the liquid inlet pipeline is connected to an external developer source through a pipeline to quantitatively input the developer into the closed immersion tray.

[0026] In the embodiment of the utility model, the working chamber 101 includes an inner cavity 102 and a cover 103 arranged above the inner cavity, the cover is movably connected to the machine base, one end of the cover is hinged to the base, and the other end of the cover is connected to the machine base through a lock, and the inner cavity can be closed or opened by controlling the lock; an annular drainage groove is provided on the inner bottom surface of the inner cavity, and a drainage pipeline 106 is provided on the inner bottom surface of the annular drainage groove 105; after the silicon wafer is immersed in the developer, the immersion plate moves downward relative to the silicon wafer glass sheet adsorption rotating assembly, and the used developer in the immersion plate is discharged to the outside through the annular drainage groove, the inner bottom surface of the working chamber, and the drainage pipeline.

[0027] In the embodiment of the utility model, a spray cleaning nozzle 104 is arranged above the immersion tray; the spray cleaning nozzle is directly above the silicon wafer. After the silicon wafer completes the development work, the motor of the silicon wafer glass sheet adsorption rotating assembly drives the tray and the silicon wafer to rotate, and the silicon wafer is spun dry. Then the spray cleaning nozzle sprays pure water downward to the silicon wafer. The water sprayed by the spray cleaning nozzle is in mist form, and then the tray and the silicon wafer are driven to rotate by the hollow shaft servo motor again to spin dry the moisture on the silicon wafer by centrifugation.

[0028] In an embodiment of the utility model, the silicon wafer glass sheet adsorption rotating assembly 3 includes a tray 301, a rotating seat 302 and a hollow shaft servo motor 304 arranged in sequence from top to bottom, the rotating seat is connected to the tray at the top, and a closed chamber 305 is formed between the upper part of the rotating seat and the lower part of the tray, the rotating seat is connected to the hollow shaft 303 of the hollow shaft servo motor at the bottom, the tray has a plurality of suction holes 306 connected to the closed chamber, a suction pipe 307 is arranged inside the hollow shaft of the hollow shaft servo motor, the upper end of the suction pipe is connected to the closed chamber, the lower end of the suction pipe is connected to a vacuum pump arranged outside via a vacuum pump pipeline 311, and the hollow shaft servo motor drives the tray to rotate; the hollow shaft of the hollow shaft servo motor extends to the bottom of the sealed chamber and is fixed to the rotating seat.

[0029] The cross section of the above-mentioned tray is U-shaped, and the cross section of the circular groove on the upper part of the rotating seat is also U-shaped.

[0030] In the embodiment of the utility model, an annular protrusion 308 is provided in the middle of the bottom surface of the working chamber, and an annular groove 309 is provided below the rotating seat to cooperate with the annular protrusion. The diameter of the annular protrusion is smaller than the through opening. The sealing structure is provided on the outer wall of the rotating seat, and the outer wall of the rotating seat is adapted to the size of the through opening.

[0031] The annular protrusion has a certain height, and the setting of the annular protrusion can prevent the liquid in the working chamber from flowing into the axial position of the hollow shaft servo motor, thereby achieving better waterproof effect.

[0032] In the embodiment of the utility model, a sink 310 is provided in the middle of the immersion tray to accommodate the rotating seat and tray on the upper part of the silicon wafer and glass wafer adsorption rotating assembly, and the opening is provided on the inner bottom surface of the sink.

[0033] Unless otherwise stated, any technical solution disclosed in the above utility model, if it discloses a numerical range, then the disclosed numerical range is a preferred numerical range. Any technician in the field should understand that the preferred numerical range is only a numerical value with a more obvious technical effect or representative value among many feasible numerical values. Since there are too many numerical values ​​to be exhaustive, the utility model discloses only some numerical values ​​to illustrate the technical solution of the utility model, and the numerical values ​​listed above should not constitute a limitation on the scope of protection of the utility model.

[0034] At the same time, if the above-mentioned utility model discloses or involves components or structural parts that are fixedly connected to each other, then, unless otherwise stated, the fixed connection can be understood as: a detachable fixed connection (for example, connected by bolts or screws), and can also be understood as: a non-detachable fixed connection (for example, riveting, welding). Of course, the mutual fixed connection can also be replaced by an integrated structure (for example, manufactured by one-piece molding using a casting process) (except when it is obviously impossible to use an one-piece molding process).

[0035] In addition, unless otherwise stated, the terms used to indicate positional relationships or shapes in any of the technical solutions disclosed in the above utility model include states or shapes that are approximate, similar or close thereto.

[0036] Any component provided by the utility model can be assembled from multiple separate components, or can be a separate component manufactured by an integrated forming process.

[0037] Finally, it should be noted that the above embodiments are only used to illustrate the technical solution of the utility model rather than to limit it. Although the utility model has been described in detail with reference to the preferred embodiments, ordinary technicians in the relevant field should understand that the specific implementation methods of the utility model can still be modified or some technical features can be replaced by equivalents without departing from the spirit of the technical solution of the utility model, which should be included in the scope of the technical solution for protection of the utility model.

Claims

1. A developing and cleaning device, characterized in that: The invention comprises a machine base and a working chamber arranged in the machine base, wherein a liftable immersion tray is arranged inside the working chamber, a through opening is arranged in the middle of the immersion tray, a silicon wafer and glass wafer adsorption rotating assembly is arranged in the through opening, and a sealing structure is arranged on the outer wall of the silicon wafer and glass wafer adsorption rotating assembly, and when the immersion tray descends, an annular drainage groove is formed between the inner wall of the through opening and the outer wall of the silicon wafer and glass wafer adsorption rotating assembly, and when the immersion tray rises, a seal is formed between the sealing structure of the outer wall of the silicon wafer and glass wafer adsorption rotating assembly and the inner wall of the through opening, so that the silicon wafer on the silicon wafer and glass wafer adsorption rotating assembly contacts and is immersed in a quantitative developer input into the immersion tray.

2. A developing and cleaning device according to claim 1, characterized in that: Three push rod motors are arranged below the working chamber to push the liquid inlet plate to rise and fall vertically. The movable end of each push rod motor passes through the bottom of the working chamber and is connected to the liquid immersion plate. The three push rod motors have the same ejection displacement and synchronous action.

3. A developing and cleaning device according to claim 1, characterized in that: A liquid inlet pipeline is arranged on the side of the immersion tray.

4. A developing and cleaning device according to claim 1, characterized in that: The working chamber comprises an inner cavity and a cover arranged above the inner cavity. The inner bottom surface of the inner cavity is provided with an annular drainage groove, and the inner bottom surface of the annular drainage groove is provided with a drainage pipeline.

5. A developing and cleaning device according to claim 1, characterized in that: A spray cleaning nozzle is arranged above the immersion tray.

6. A developing and cleaning device according to claim 1, characterized in that: The silicon wafer and glass sheet adsorption rotating assembly includes a tray, a rotating seat and a hollow shaft servo motor which are arranged in sequence from top to bottom. The rotating seat is connected to the tray at the top, and a closed chamber is formed between the upper part of the rotating seat and the lower part of the tray. The rotating seat is connected to the hollow shaft of the hollow shaft servo motor at the bottom. The tray has a suction hole connected to the closed chamber, and a suction pipe is arranged inside the hollow shaft. The upper end of the suction pipe is connected to the closed chamber, and the lower end of the suction pipe is connected to a vacuum pump arranged outside via a vacuum pump pipeline. The hollow shaft servo motor drives the tray to rotate.

7. A developing and cleaning device according to claim 6, characterized in that: An annular protrusion is arranged in the middle of the bottom surface of the working chamber, an annular groove for matching with the annular protrusion is arranged below the rotating seat, the diameter of the annular protrusion is smaller than the through opening, the sealing structure is arranged on the outer wall of the rotating seat, and the outer wall of the rotating seat is adapted to the size of the through opening.

8. A developing and cleaning device according to claim 1, characterized in that: The sealing structure is a sealing ring.

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