A CO2 separation membrane silicon-based substrate cleaning machine with high-efficiency drying function

Abstract

The utility model discloses a CO2 separation membrane silicon-based substrate cleaning machine with an efficient drying function, comprising a machine body, an ultrasonic oscillation pool and a drying box, an ultrasonic oscillation pool is fixed on one side of the machine body, a plurality of discharge pipes are inserted along the bottom of the ultrasonic oscillation pool, a plurality of input ends of the discharge pipes are connected to a silicon dioxide cleaning agent delivery pipeline, and the silicon dioxide cleaning agent delivery pipeline is connected to a delivery pump, an ultrasonic oscillator is installed on one side of the pool wall of the ultrasonic oscillation pool, and a side baffle plate for preventing cleaning agent from sputtering is welded on the upper end of the ultrasonic oscillation pool. When the CO2 separation membrane silicon-based substrate cleaning machine with an efficient drying function is used, the entire drying box serves as a drying component for the entire silicon dioxide-based substrate, and a heating lamp is used as a heating component as a whole, which is respectively distributed along the slide table and the middle position of the drying box, so as to meet the demand of rapid drying of the silicon dioxide-based substrate.

Description

Technical Field

[0001] The utility model relates to the technical field of processing CO2 separation membrane silicon-based substrates, in particular to a CO2 separation membrane silicon-based substrate cleaning machine with a high-efficiency drying function. Background Art

[0002] CO2 separation membranes are mainly composed of three categories: silica, zeolite and metal organic frameworks. These membranes can be selective for CO2 or H2, and have met the needs of CO2 separation processing. Among them, the silica-based substrate is an important component. After processing, the silica-based substrate needs to be cleaned. A good cleaning machine can improve the processing efficiency of the silicon-based substrate, bring good economic benefits to the enterprise, and facilitate the use of the enterprise.

[0003] The utility model relates to the technical field of processing silicon-based substrates of CO2 separation membranes. The utility model discloses a silicon dioxide cleaning device (CN212525136U), including a water storage tank, the water storage tank is in the shape of a hollow box without an upper surface, a baffle is fixedly connected to the left end of the upper surface of the water storage tank, the baffle is in a transverse U shape opening to the right, and a flushing device is fixedly connected to the inner side wall of the baffle, the flushing device collects flushing water by running above the water storage tank, and the flushing device includes a feed hopper. The silicon dioxide cleaning device is arranged to place raw materials on the inner side wall of a channel net made of a metal mesh for movement, so that impurities and flushing water generated by flushing are collected by the water storage tank through the mesh of the channel net, and the flushing water in the water storage tank is preliminarily filtered by the filter net and then lifted by a water pump again and sprayed from a nozzle under the guidance of a hose, and the raw materials are flushed again, and the above process is circulated, so that the silicon dioxide cleaning device has the characteristics of saving water resources. However, it does not have the function of drying during use, resulting in the need for further drying of the processed silicon dioxide, thereby reducing the efficiency of the silicon dioxide cleaning process and causing trouble for company personnel.

[0004] To this end, we propose a CO2 separation membrane silicon-based substrate cleaning machine with efficient drying function. Utility Model Content

[0005] The utility model aims to provide a CO2 separation membrane silicon-based substrate cleaning machine with an efficient drying function to solve the problems raised in the above-mentioned background technology.

[0006] To achieve the above-mentioned purpose, the utility model provides the following technical solutions: a CO2 separation membrane silicon-based substrate cleaning machine with an efficient drying function, comprising a machine body, an ultrasonic oscillation pool and a drying box, an ultrasonic oscillation pool is fixed on one side of the machine body, a plurality of discharge pipes are inserted along the bottom of the ultrasonic oscillation pool, a plurality of input ends of the discharge pipes are connected to a silicon dioxide cleaning agent delivery pipeline, and the silicon dioxide cleaning agent delivery pipeline is connected to a delivery pump, an ultrasonic oscillator is installed on one side of the pool wall of the ultrasonic oscillation pool, and a side baffle is welded on the upper end of the ultrasonic oscillation pool to prevent the cleaning agent from sputtering, a plurality of moisture absorption tubes are arranged along one side of the ultrasonic oscillation pool of the machine body, a slide table for sliding the silicon dioxide-based substrate is set on the upper surface of the machine body, and a belt transmission system is set on the end of the machine body away from the ultrasonic oscillation pool.

[0007] Furthermore, a pair of mounting brackets are provided on the top of the drying box, and curtains are hung on both side openings of the drying box. Several heating lamps with heating and drying functions are provided on the inner side of the mounting brackets, and the mounting brackets and the heating lamps constitute a drying assembly.

[0008] Furthermore, the slide is provided with a plurality of openings along the middle of the drying box for facilitating the circulation of water vapor.

[0009] Furthermore, a group of drying components are distributed along the lower end of the slide where the hole is opened, and the drying components in the slide correspond to the drying components in the drying box.

[0010] Furthermore, the input ends of several of the moisture absorption tubes are connected to a blower access pipeline, and the blower access pipeline is connected to the blower.

[0011] Furthermore, the belt transmission system is connected to a conveyor belt via a pulley, and a groove is provided on the conveyor belt near the machine body.

[0012] Furthermore, the conveyor belt is embedded in the slot, and a plurality of limit strips are integrally injection-molded on one side of the conveyor belt away from the slot.

[0013] Furthermore, the spacing between the limiting bars is 1.5-2 times the width of the silicon dioxide-based substrate.

[0014] Compared with the prior art, the beneficial effect of the utility model is that when the CO2 separation membrane silicon-based substrate cleaning machine with high-efficiency drying function is in use, the entire drying box serves as a drying component for the entire silica-based substrate, and heating lamps are used as heating components as a whole, which are distributed along the slide and the middle position of the drying box, so as to achieve the requirement of rapid drying of the silica-based substrate.

[0015] Curtains are hung on both sides of the drying box to reduce the evaporation of gas along the two sides of the drying box, which may cause gas pollution to the processing workshop and improve the safety production needs of the workshop. At the same time, the entire drying box is distributed along one side of the ultrasonic oscillation pool. The silica-based substrates after ultrasonic oscillation cleaning can be directly dried without transportation, which improves the production speed of the entire silica-based substrate and brings good economic income to the company.

[0016] The ultrasonic oscillation pool serves as a cleaning system for silica-based substrates. The ultrasonic wave is used to clean the surface of the silica-based substrate. The cleaning system has a high degree of cleaning and can fully clean the silica-based substrate. At the same time, the ultrasonic oscillation pool is pumped to meet the liquid filling and discharge processing requirements. There is no need to manually pour the cleaning liquid, which further brings convenience to the user. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] Figure 1 It is a schematic diagram of the three-dimensional structure of the utility model;

[0018] Figure 2 This is a schematic diagram of the three-dimensional structure of the machine body of the utility model;

[0019] Figure 3 This is an enlarged structural diagram of the drying box of the utility model;

[0020] Figure 4 For this utility model Figure 2 Schematic diagram of the local enlarged structure at location A.

[0021] In the figure: 1. machine body; 2. ultrasonic oscillator pool; 3. moisture absorption tube; 4. drying box; 5. slide; 6. belt drive system; 21. ultrasonic oscillator; 22. side baffle; 23. discharge pipe; 24. silica cleaning agent delivery pipeline; 31. blower access pipeline; 41. mounting bracket; 42. curtain; 43. heating lamp; 51. opening hole; 61. conveyor belt; 62. opening groove; 63. limit strip. DETAILED DESCRIPTION

[0022] The following will be combined with the drawings in the embodiments of the utility model to clearly and completely describe the technical solutions in the embodiments of the utility model. Obviously, the described embodiments are only part of the embodiments of the utility model, not all of the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the utility model.

[0023] Example 1

[0024] See also Figure 1-3The utility model provides a technical solution: a CO2 separation membrane silicon-based substrate cleaning machine with an efficient drying function, comprising a machine body 1, an ultrasonic oscillation pool 2 and a drying box 4, an ultrasonic oscillation pool 2 is fixed on one side of the machine body 1, a plurality of discharge pipes 23 are inserted along the bottom of the ultrasonic oscillation pool 2, a silicon dioxide cleaning agent delivery pipeline 24 is connected to the input end of the plurality of discharge pipes 23, and the silicon dioxide cleaning agent delivery pipeline 24 is connected to the delivery pump, an ultrasonic oscillator 21 is installed on one side of the pool wall of the ultrasonic oscillation pool 2, and a side baffle 22 for preventing the cleaning agent from sputtering is welded on the upper end of the ultrasonic oscillation pool 2, a plurality of moisture absorption pipes 3 are arranged on one side of the machine body 1 along the ultrasonic oscillation pool 2, a slide 5 for sliding the silicon dioxide-based substrate is set on the upper surface of the machine body 1, and a slide 5 for sliding the silicon dioxide-based substrate is set on the end of the machine body 1 away from the ultrasonic oscillation pool 2 Belt drive system 6, the ultrasonic oscillation pool 2 is used as a cleaning system for silica-based substrates, and ultrasonic cleaning is adopted as a whole to clean the surface of the silica-based substrates. The cleaning system has a high degree of cleaning and can fully clean the silica-based substrates. At the same time, in order to reduce the possibility of splashing of silica-based cleaning liquid during the processing of silica-based substrates, the upper part of the ultrasonic oscillation pool 2 is raised. At the same time, in order to meet the needs of timely replenishment and replacement of silica-based cleaning liquid, a plurality of discharge pipes 23 are penetrated along the bottom of the ultrasonic oscillation pool 2. The discharge pipe 23 is connected to the silica cleaning agent delivery pipeline 24, and the silica cleaning agent delivery pipeline 24 is connected to the delivery pump. By pumping, the ultrasonic oscillation pool 2 is filled with liquid and discharged to meet the processing needs, without manual pouring of cleaning liquid, which further brings convenience to the user.

[0025] Example 2

[0026] See also Figure 1-3The utility model provides a technical solution: a CO2 separation membrane silicon-based substrate cleaning machine with high-efficiency drying function, the input ends of several moisture absorption pipes 3 are connected with blower access pipes 31, and the blower access pipes 31 are connected with the blower, a pair of mounting brackets 41 are arranged on the top of the upper end of the drying box 4, and curtains 42 are hung on the two side openings of the drying box 4, several heating lamps 43 with heating and drying functions are arranged on the inner side of the mounting brackets 41, and the mounting brackets 41 and the heating lamps 43 form a drying assembly, a slide 5 is provided with several openings 51 for convenient circulation of water vapor along the middle position of the drying box 4, a group of drying assemblies are also distributed at the lower end of the slide 5 along the openings 51, and the drying assemblies in the slide 5 correspond to the drying assemblies in the drying box 4, the entire drying box 4 is used as a drying component for the entire silicon dioxide-based substrate, and the heating lamps 43 are used as the whole. The heating components are respectively distributed along the slide 5 and the middle part of the drying box 4. When the blower is connected to the pipeline 31 to blow air outward, the bottom of the slide 5 is in a negative pressure state, and the airflow flows along the opening 51. The water vapor on the surface of the silica-based substrate is heated and evaporated by the heating lamp 43, and the evaporated gas flows into the moisture absorption tube 3 from the opening 51, and is discharged from the blower connected pipeline 31, so as to meet the demand of rapid drying of the silica-based substrate. In addition, curtains 42 are hung on the two side openings of the entire drying box 4 to reduce the evaporation gas from scattering along the two side openings of the drying box 4, which may cause gas pollution to the processing workshop and improve the demand for safe production in the workshop. At the same time, the entire drying box 4 is distributed along one side of the ultrasonic oscillation pool 2. The silica-based substrate after ultrasonic oscillation cleaning can be directly dried without transportation, thereby improving the production speed of the entire silica-based substrate and bringing good economic income to the enterprise.

[0027] See also Figure 4 The utility model provides a technical solution: a CO2 separation membrane silicon-based substrate cleaning machine with an efficient drying function, wherein a belt transmission system 6 is connected to a conveyor belt 61 through a pulley, and a groove 62 is provided near the conveyor belt 61 near the machine body 1, and the conveyor belt 61 is embedded in the groove 62, and a plurality of limit strips 63 are integrally molded on the side of the conveyor belt 61 away from the groove 62, and the spacing between the limit strips 63 and the limit strips 63 is 1.5-2 times the width of the silicon dioxide-based substrate. The entire belt transmission system 6 adopts a slow motor as a power source, drives the pulley transmission in the form of shaft transmission, and then drives the pulley on the conveyor belt 61 to rotate through a gear set until the conveyor belts 61 on both sides are pulled to rotate synchronously. When the silicon dioxide-based substrate enters the ultrasonic oscillation pool 2, the two limit strips 63 form a rectangular frame, and the silicon dioxide-based substrate is pulled along the surface of the slide 5 from the ultrasonic oscillation pool 2 to the drying box 4 for processing. The entire processing technology does not require manual operation, reduces the labor intensity of manual labor, and brings convenience to enterprises.

[0028] Working principle: For this type of CO2 separation membrane silicon-based substrate cleaning machine with high-efficiency drying function, the delivery pump is first started, and the silica cleaning liquid is delivered to the silica cleaning agent delivery pipeline 24 by pumping, and is introduced into the ultrasonic oscillation pool 2 from the discharge pipe 23. At this time, the belt transmission system 6 is started, and the pulley on the conveyor belt 61 is driven to rotate through the gear set until the conveyor belts 61 on both sides are pulled to rotate synchronously. When the silica-based substrate enters the ultrasonic oscillation pool 2, the two limit bars 63 form a rectangular frame, pulling the silica-based substrate along The surface of the slide 5 goes from the ultrasonic oscillation pool 2 to the drying box 4, and then the blower is started. When the blower is connected to the pipe 31 to blow air outward, the bottom of the slide 5 is in a negative pressure state, and the air flow flows along the opening 51. The water vapor on the surface of the silica-based substrate is heated and evaporated by the heating lamp 43, and the evaporated gas flows into the moisture absorption tube 3 from the opening 51, and is discharged from the blower connection pipe 31, thereby meeting the requirement of rapid drying of the silica-based substrate. Finally, the silica-based substrate flows out from one side of the drying box 4, and the processed silica-based substrate is taken out from the machine body 1 and placed in the designated position.

Claims

1. A CO2 separation membrane silicon-based substrate cleaning machine with high-efficiency drying function, comprising a machine body (1), an ultrasonic oscillation pool (2) and a drying box (4), characterized in that: An ultrasonic oscillation pool (2) is fixed on one side of the body (1), and a plurality of discharge pipes (23) are inserted into the ultrasonic oscillation pool (2) along the bottom of the pool, and the input ends of the plurality of discharge pipes (23) are connected to a silicon dioxide cleaning agent delivery pipeline (24), and the silicon dioxide cleaning agent delivery pipeline (24) is connected to a delivery pump. An ultrasonic oscillator (21) is installed on one side of the pool wall of the ultrasonic oscillation pool (2), and a side baffle (22) for preventing the cleaning agent from sputtering is welded on the upper end of the ultrasonic oscillation pool (2). A plurality of moisture absorption pipes (3) are arranged on one side of the ultrasonic oscillation pool (2), and a slide table (5) for sliding a silicon dioxide-based substrate is arranged on the upper surface of the body (1), and a belt transmission system (6) is arranged on the end of the body (1) away from the ultrasonic oscillation pool (2).

2. A CO2 separation membrane silicon-based substrate cleaning machine with high-efficiency drying function according to claim 1, characterized in that: A pair of mounting brackets (41) are mounted on the top of the upper end of the drying box (4), and curtains (42) are hung on the two side openings of the drying box (4). A plurality of heating lamps (43) with heating and drying functions are mounted on the inner side of the mounting brackets (41), and the mounting brackets (41) and the heating lamps (43) form a drying assembly.

3. A CO2 separation membrane silicon-based substrate cleaning machine with high-efficiency drying function according to claim 2, characterized in that: The slide (5) is provided with a plurality of openings (51) along the middle of the drying box (4) for facilitating the circulation of water vapor.

4. A CO2 separation membrane silicon-based substrate cleaning machine with high-efficiency drying function according to claim 3, characterized in that: A group of drying components is also distributed along the lower end of the slide (5) where the hole (51) is opened, and the drying components in the slide (5) correspond to the drying components in the drying box (4).

5. The CO2 separation membrane silicon-based substrate cleaning machine with high-efficiency drying function according to claim 1 is characterized in that: The input ends of the plurality of moisture absorption tubes (3) are connected to a blower access pipeline (31), and the blower access pipeline (31) is connected to the blower.

6. The CO2 separation membrane silicon-based substrate cleaning machine with high-efficiency drying function according to claim 1 is characterized in that: The belt transmission system (6) is connected to a conveyor belt (61) via a pulley, and a groove (62) is provided on the conveyor belt (61) near the machine body (1).

7. A CO2 separation membrane silicon-based substrate cleaning machine with high-efficiency drying function according to claim 6, characterized in that: The conveyor belt (61) is embedded in the opening groove (62), and a plurality of limiting strips (63) are integrally injection-molded on the side of the conveyor belt (61) away from the opening groove (62).

8. The CO2 separation membrane silicon-based substrate cleaning machine with high-efficiency drying function according to claim 7 is characterized in that: The spacing between the limiting bars (63) is 1.5 to 2 times the width of the silicon dioxide-based substrate.

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