An assembly fixture for protecting sputtering target

Abstract

The utility model relates to an assembly fixture for protecting a sputtering target, including a target mounting seat and a baffle base, wherein the target mounting seat is fixedly connected to the baffle base, a receiving hole for receiving the target is provided on the target mounting seat, a plurality of baffles are provided on the baffle base, the baffles are movably connected to the baffle base, the baffles can block the receiving hole to protect the target in the receiving hole, and a driving unit for driving the baffle to move is also provided on the baffle base. In this solution, the baffle is set on the assembly fixture, and when the target target needs to be sputtered, the baffle is opened by the driving unit, and the particles of secondary sputtering on the target target will be blocked by the baffle on the non-target target assembly fixture, so as to prevent the secondary sputtering particles from falling onto the non-target target, and avoid the non-target target from being contaminated by the secondary sputtering particles.

Description

Technical Field

[0001] The utility model relates to the technical field of target material clamps, and more specifically, to an assembly clamp for protecting a sputtering target material. Background Art

[0002] Magnetron sputtering is a type of physical vapor deposition method. The metal film obtained by sputtering a metal target onto a substrate has a strong adhesion on the substrate. For a magnetron sputtering device with multiple target working positions, the sputtering port of the sputtering target is usually not perpendicular to the plane of the substrate to be sputtered, and the planes of the sputtering ports of each sputtering target are not parallel to each other. When the target target is sputtered, the surface of the non-target target that is not working lacks protection measures, and the incident particles will splash onto the non-target target, and a layer of metal film will be coated on the surface of the non-target target, which will affect the subsequent normal use of the non-target target. In order to solve the problem that the irregular movement of the incident particles is easy to splash onto the non-target target, affecting the normal use of the non-target target, a baffle is provided between the ion source device and the target in the prior art, and the non-target target is shielded by the baffle to prevent the non-target target from being splashed by the incident particles emitted from the ion source device.

[0003] However, when the incident particles collide elastically with the target atoms, part of the kinetic energy of the incident particles will be transferred to the target atoms; the target atoms are collided out of the lattice. If the energy of the incident particles is too large and the kinetic energy of the atoms is greater than the surface binding energy, these atoms will detach from the target surface and sputter onto the non-target target adjacent to the target target, causing secondary sputtering. The secondary sputtered atoms will splash onto the non-target target adjacent to the target target, and will also coat a layer of metal film on the surface of the non-target target, affecting the subsequent normal use of the non-target target. Utility Model Content

[0004] In order to overcome the problem in the prior art that target atoms will be plated with a layer of metal film on the surface of non-target target materials during secondary sputtering, thus affecting the subsequent normal use of the non-target target materials, the utility model provides an assembly fixture for protecting the sputtering target materials to prevent the non-target target materials from being contaminated by secondary sputtering.

[0005] In order to solve the above technical problems, the technical solution adopted by the utility model is: an assembly fixture for protecting sputtering targets, including a target mounting seat and a baffle base, the target mounting seat is fixedly connected to the baffle base, the target mounting seat is provided with a receiving hole for accommodating the target, the baffle base is provided with a plurality of baffles, the baffles are movably connected to the baffle base, the baffles can cover the receiving hole to protect the target in the receiving hole, and the baffle base is also provided with a driving part for driving the baffle to move.

[0006] Each target in the device is fixed in the device by a corresponding assembly fixture. When the target target needs to be sputtered, the driving unit on the target target assembly fixture starts to work, driving the baffle on the target target assembly fixture to move on the baffle base, so that the baffle is opened, the receiving hole on the target mounting seat is exposed, so that the target target in the receiving hole is exposed, and then the target target is sputtered. At this time, the baffle on the non-target target assembly fixture is not opened. When secondary sputtering occurs on the surface of the target target, the secondary sputtered particles will be blocked by the baffle on the non-target target when they splash onto the non-target target and cannot fall onto the surface of the non-target target, thus preventing the non-target target from being contaminated.

[0007] In this solution, a baffle is set on the assembly fixture. When the target target material needs to be sputtered, the baffle is opened by the driving unit. The particles that are secondary sputtered on the target target material will be blocked by the baffle on the non-target target material assembly fixture to prevent the secondary sputtered particles from falling onto the non-target target material, thereby avoiding contamination of the non-target target material by the secondary sputtered particles.

[0008] Preferably, the receiving hole is a stepped hole, and the receiving hole includes a first through hole and a second through hole, the first through hole is closer to the baffle base and the inner diameter of the first through hole is smaller than the inner diameter of the second through hole. The receiving hole is a stepped hole, and when the target is located in the second through hole, it is also closely fitted with the sputtering station, and the first through hole allows particles sputtered onto the target to fly out.

[0009] Preferably, the distance between the baffle and the bottom surface of the first through hole is 3mm-10mm. The target material is located at the bottom surface of the first through hole. When the distance between the baffle and the bottom surface of the first through hole is too close, the secondary splashed particles on the target material are more likely to fly out of the target target assembly fixture. It has been experimentally measured that when the distance between the baffle and the bottom surface of the first through hole is 3mm-10mm, a part of the secondary splashed particles can be prevented from flying out of the target target assembly fixture.

[0010] Preferably, the target mounting seat and the baffle base are both annular, and the baffle base and the baffle are in a shutter structure. The baffle base and the baffle of the shutter structure can quickly complete the opening and closing of the baffle, and the effect of closing is good, and the overlapping parts between the baffles can further reduce the probability of secondary splashing particles falling on non-target targets.

[0011] Preferably, there are a plurality of baffles, which are arranged in a circular array on the baffle base with the dot of the baffle base as the center, the baffles are rotatably connected to the baffle base, and each baffle is connected to the driving unit. The plurality of baffles form shutter blades in the shutter structure, and the driving unit drives each baffle to rotate on the baffle base to open and close the baffles of the shutter structure.

[0012] Preferably, a circular slide groove is provided on the baffle base, a slide rail is provided in the slide groove, the slide rail is located in the slide groove and is slidably connected to the slide groove, the baffle is connected to the slide rail, the driving unit is connected to the slide rail to drive the slide rail to slide in the slide groove, and the baffle is connected to the driving unit through the slide rail. The slide rail is provided on the baffle base, all baffles are connected to the slide rail, and the driving unit drives the baffle to rotate on the baffle base by driving the slide rail to slide, so that the driving unit can simultaneously drive all baffles to move synchronously.

[0013] Preferably, the baffle is further provided with a positioning member and a transmission member, one end of the positioning member is rotatably connected to the baffle base, and the other end passes through the baffle and is rotatably connected to the baffle; one end of the transmission member is connected to the slide rail, and the other end is rotatably connected to the baffle. The baffle is rotatably connected to the baffle base through the positioning member, and is rotatably connected to the slide rail through the transmission member. After the driving unit drives the slide rail to rotate, the baffle rotates on the baffle base.

[0014] Preferably, the baffle is triangular and each sharp corner of the baffle is chamfered, and the positioning member and the transmission member are both located at the same sharp corner of the baffle. When the triangular baffle rotates, it is more difficult for two adjacent baffles to interfere with each other. The positioning member and the transmission member are both located at a sharp corner of the baffle, so that the area of ​​the first through hole that can be covered by the baffle when rotating is the largest.

[0015] Preferably, a rotating shaft is provided on the baffle base, the axis of the rotating shaft is parallel to the axis of the baffle base, the rotating shaft is rotatably connected to the baffle base, and one end of the baffle is fixedly connected to the rotating shaft. There are two baffles and two rotating shafts, and the two rotating shafts are respectively located on both sides of the target mounting seat and are symmetrically arranged with the midpoint of the baffle base as the center. The baffle is a flip-type structure. When the target target needs to be coated, the driving unit drives the rotating shaft to rotate, driving the baffle to flip, so that the target target is exposed, while the baffle on the non-target target is not flipped, so as to prevent the secondary sputtered particles from splashing onto the non-target target. The flip-type baffle is suitable for target mounting seats of more shapes.

[0016] Compared with the prior art, the beneficial effect of the utility model is: in this scheme, the baffle is set on the assembly fixture. When the target target material needs to be sputtered and coated, the baffle is opened by the driving unit, and the particles of secondary sputtering on the target target material will be blocked by the baffle on the non-target target material assembly fixture, preventing the secondary sputtering particles from falling onto the non-target target material, thereby avoiding the non-target target material from being contaminated by the secondary sputtering particles. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] Figure 1 The utility model is a structural schematic diagram of an assembly fixture for protecting a sputtering target.

[0018] Figure 2 The utility model is a structural schematic diagram of a target material mounting seat of an assembly fixture for protecting a sputtering target material.

[0019] Figure 3 It is a structural schematic diagram of a baffle base in Example 2 of an assembly fixture for protecting a sputtering target of the utility model.

[0020] Figure 4 This is a schematic diagram of the installation state of a baffle base and a baffle in Example 2 of an assembly fixture for protecting a sputtering target of the utility model;

[0021] Figure 5 It is a schematic diagram of the installation status of the baffle base and the baffle in Example 3 of an assembly fixture for protecting a sputtering target of the utility model. DETAILED DESCRIPTION

[0022] The drawings are only for illustrative purposes and cannot be construed as limiting the present invention. To better illustrate the present embodiment, some parts of the drawings may be omitted, enlarged, or reduced, and do not represent the size of the actual product. For those skilled in the art, it is understandable that some well-known structures and their descriptions may be omitted in the drawings. The positional relationships described in the drawings are only for illustrative purposes and cannot be construed as limiting the present invention.

[0023] The same or similar numbers in the drawings of the embodiments of the present invention correspond to the same or similar parts; in the description of the present invention, it should be understood that if the terms "upper", "lower", "left", "right", "long", "short" and the like indicate directions or positional relationships based on the directions or positional relationships shown in the drawings, they are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific direction, be constructed and operated in a specific direction. Therefore, the terms describing the positional relationship in the drawings are only used for illustrative purposes and cannot be understood as limitations on this patent. For ordinary technicians in this field, the specific meanings of the above terms can be understood according to specific circumstances.

[0024] The technical solution of the present invention is further described in detail below through specific embodiments and in conjunction with the accompanying drawings:

[0025] Example 1

[0026] like Figure 1 and Figure 2 The figure shows an embodiment of an assembly fixture for protecting a sputtering target, comprising a target mounting seat 1 and a baffle base 2. The target mounting seat 1 is fixedly connected to the baffle base 2. The target mounting seat 1 is provided with a receiving hole for receiving the target. The baffle base 2 is provided with a plurality of baffles 3. The baffles 3 are movably connected to the baffle base 2. The baffles 3 can cover the receiving hole to protect the target in the receiving hole. The baffle base 2 is also provided with a driving part for driving the baffle 3 to move.

[0027] Specifically, the receiving hole is stepped, and includes a first through hole 101 and a second through hole 102. The first through hole 101 is closer to the baffle base 2, and the inner diameter of the first through hole 101 is smaller than the inner diameter of the second through hole 102. The distance between the baffle 3 and the bottom surface of the first through hole 101 is 3mm-10mm.

[0028] The working principle or working process of this embodiment is as follows: each target material in the device is fixed in the device by an assembly fixture. When the target target material needs to be sputter-coated, the driving part on the target target material assembly fixture starts to work, driving the baffle 3 on the target target material assembly fixture to move on the baffle base 2, so that the baffle 3 is opened, exposing the receiving hole on the target material mounting seat 1, so that the target target material in the receiving hole is exposed, and then the target target material is sputter-coated. At this time, the baffle 3 on the non-target target material assembly fixture is not opened. When secondary sputtering occurs on the surface of the target target material, the secondary sputtered particles will be blocked by the baffle 3 on the non-target target material when they splash onto the non-target target material, and cannot fall onto the surface of the non-target target material, thereby preventing the non-target target material from being contaminated.

[0029] Beneficial effects of this embodiment: In this scheme, the baffle 3 is set on the assembly fixture. When the target target material needs to be sputtered, the baffle 3 is opened by the driving unit, and the particles of secondary sputtering on the target target material will be blocked by the baffle 3 on the non-target target assembly fixture, preventing the secondary sputtering particles from falling onto the non-target target material, thereby avoiding the non-target target material from being contaminated by the secondary sputtering particles.

[0030] The receiving hole is a stepped hole, the target is located in the second through hole 102, and the first through hole 101 allows particles sputtered onto the target to fly out. When the distance between the baffle 3 and the bottom surface of the first through hole 101 is 3mm-10mm, it can prevent some of the secondary splashed particles from flying out of the target assembly fixture.

[0031] Example 2

[0032] Embodiment 2 of an assembly fixture for protecting a sputtering target, based on embodiment 1, as Figure 1-Figure 4 As shown, the structures of the baffle base 2 and the baffle 3 are further defined.

[0033] Specifically, the target mounting seat 1 and the baffle base 2 are both in annular shape, the baffle base 2 and the baffle 3 form a shutter structure, and the baffle 3 forms a shutter blade in the shutter structure.

[0034] Specifically, there are a plurality of baffles 3, which are arranged in a circular array on the baffle base 2 with the dot of the baffle base 2 as the center of the circle. The baffle 3 is rotatably connected to the baffle base 2, and each baffle 3 is connected to the driving unit. The baffle base 2 is provided with a circular slide groove 201, and a circular slide rail 202 is provided in the slide groove 201. The slide rail 202 is located in the slide groove 201 and is slidably connected to the slide groove 201. The baffle 3 is connected to the slide rail 202, and the driving unit is connected to the slide rail 202 to drive the slide rail 202 to move in the slide groove 201. The baffle 3 is connected to the driving unit through the slide rail 202. The baffle 3 is also provided with a positioning member 301 and a transmission member 302. One end of the positioning member 301 is rotatably connected to the baffle base 2, and the other end passes through the baffle 3 and is rotatably connected to the baffle 3; one end of the transmission member 302 is connected to the slide rail 202, and the other end is rotatably connected to the baffle 3. The blocking piece 3 is triangular in shape and each sharp corner of the blocking piece 3 is chamfered. The positioning member 301 and the transmission member 302 are both located at the same sharp corner of the blocking piece 3 .

[0035] The working principle or workflow of this embodiment is as follows: when the target target is to be coated, the driving unit drives the slide rail 202 to move in the slide groove 201. Since the slide rail 202 is circular, the movement of the slide rail 202 is to rotate along the slide groove 201 in the slide groove 201. When the slide rail 202 rotates, the position of the transmission member 302 on the slide rail 202 is changed, so that the transmission member 302 drives the baffle 3 to move. The baffle 3 starts to rotate away from the center of the slide groove 201 on the baffle base 2 with the positioning member 301 as the center, exposing the target target in the target mounting seat 1, and coating the target target. The driving member on the non-target target does not drive the slide rail 202 to move, so that the baffle 3 on the non-target target still shields the non-target target, and the secondary splashed particles on the target target cannot fall on the non-target target.

[0036] Beneficial effects of this embodiment: a slide rail 202 is provided on the baffle base 2, and all baffles 3 are connected to the slide rail 202. The driving unit drives the slide rail 202 to slide to drive the baffle 3 to rotate on the baffle base 2, so that the driving unit can simultaneously drive all baffles 3 to move synchronously. The baffle 3 is rotationally connected to the baffle base 2 through the positioning member 301, and is rotationally connected to the slide rail 202 through the transmission member 302. After the driving unit drives the slide rail 202 to rotate, the baffle 3 rotates on the baffle base 2. When the triangular baffle 3 rotates, it is more difficult for two adjacent baffles 3 to interfere with each other. The positioning member 301 and the transmission member 302 are both located at a sharp corner of the baffle 3, so that the area of ​​the first through hole 101 that can be covered by the baffle 3 when rotating is the largest.

[0037] Example 3

[0038] An embodiment of an assembly fixture for protecting a sputtering target, based on embodiment 1, as Figure 5As shown, a structure of a baffle base 2 and a baffle 3 is provided which is different from that of the second embodiment.

[0039] Specifically, a rotating shaft 4 is provided on the baffle base 2, the axis of the rotating shaft 4 is parallel to the axis of the baffle base 2, the rotating shaft 4 is rotatably connected to the baffle base 2, and one end of the baffle 3 is fixedly connected to the rotating shaft 4. There are two baffles 3 and two rotating shafts 4, which are respectively located on both sides of the target mounting seat 1 and are symmetrically arranged with the midpoint of the baffle base 2 as the center.

[0040] The working principle of this embodiment is as follows: when the target target is to be coated, the driving unit drives the rotating shaft 4 to rotate, and the rotating shaft 4 drives the baffle 3 to flip on the baffle base 2 in a direction away from the target target. After the baffle 3 flips, the target target is exposed, and the target target is coated. The driving unit on the non-target target does not drive the rotating shaft 4 to move, so that the baffle 3 on the non-target target still shields the non-target target, and the secondary splashed particles on the target target do not fall on the non-target target.

[0041] Beneficial effects of this embodiment: the flip-type baffle 3 is applicable to target mounting seats 1 of more shapes.

[0042] Obviously, the above embodiments of the present invention are merely examples for clearly illustrating the present invention, and are not intended to limit the implementation methods of the present invention. For those skilled in the art, other different forms of changes or modifications can be made based on the above description. It is not necessary and impossible to list all implementation methods here. Any modifications, equivalent substitutions, and improvements made within the spirit and principles of the present invention shall be included in the protection scope of the claims of the present invention.

Claims

1. An assembly fixture for protecting a sputtering target, characterized in that: The invention comprises a target material mounting seat (1) and a baffle base (2), wherein the target material mounting seat (1) is fixedly connected to the baffle base (2), the target material mounting seat (1) is provided with a receiving hole for receiving a target material, the baffle base (2) is provided with a plurality of baffles (3), the baffles (3) are movably connected to the baffle base (2), the baffles (3) can cover the receiving hole to protect the target material in the receiving hole, and the baffle base (2) is also provided with a driving part for driving the baffle (3) to move.

2. The assembly fixture for protecting a sputtering target according to claim 1, characterized in that: The accommodating hole is in a step shape, and comprises a first through hole (101) and a second through hole (102), wherein the first through hole (101) is closer to the blocking piece base (2), and the inner diameter of the first through hole (101) is smaller than the inner diameter of the second through hole (102).

3. The assembly fixture for protecting a sputtering target according to claim 2, characterized in that: The distance between the blocking piece (3) and the bottom surface of the first through hole (101) is 3 mm-10 mm.

4. The assembly fixture for protecting a sputtering target according to claim 3, characterized in that: The target material mounting seat (1) and the baffle base (2) are both in the shape of a ring, and the baffle base (2) and the baffle (3) are in the form of a shutter structure.

5. The assembly fixture for protecting a sputtering target according to claim 4, characterized in that: There are a plurality of baffles (3), which are arranged in a circular array on the baffle base (2) with the dot of the baffle base (2) as the center of the circle, and the baffles (3) are rotatably connected to the baffle base (2), and each baffle (3) is connected to the driving unit.

6. The assembly fixture for protecting a sputtering target according to claim 5, characterized in that: A circular slide groove (201) is provided on the baffle base (2), a slide rail (202) is provided in the slide groove (201), the slide rail (202) is located in the slide groove (201) and is slidably connected to the slide groove (201), the baffle (3) is connected to the slide rail (202), the driving unit is connected to the slide rail (202) to drive the slide rail (202) to slide in the slide groove (201), and the baffle (3) is connected to the driving unit via the slide rail (202).

7. The assembly fixture for protecting a sputtering target according to claim 6, characterized in that: The baffle (3) is also provided with a positioning member (301) and a transmission member (302); one end of the positioning member (301) is rotatably connected to the baffle base (2), and the other end passes through the baffle (3) and is rotatably connected to the baffle (3); one end of the transmission member (302) is connected to the slide rail (202), and the other end is rotatably connected to the baffle (3).

8. The assembly fixture for protecting a sputtering target according to claim 7, characterized in that: The baffle (3) is triangular and each sharp corner of the baffle (3) is provided with a chamfer; the positioning member (301) and the transmission member (302) are both located at the same sharp corner of the baffle (3).

9. The assembly fixture for protecting a sputtering target according to claim 3, characterized in that: A rotating shaft (4) is provided on the baffle base, the axis of the rotating shaft (4) is parallel to the axis of the baffle base (2), the rotating shaft (4) is rotatably connected to the baffle base (2), and one end of the baffle (3) is fixedly connected to the rotating shaft (4).

10. The assembly fixture for protecting a sputtering target according to claim 9, characterized in that: There are two baffles (3) and two rotating shafts (4), and the two rotating shafts (4) are respectively located on two sides of the target mounting seat (1).

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