Auxiliary assembly frame for electron impact ion source

Abstract

The utility model belongs to the field of manufacturing of isotope magnetic mass spectrometers in analytical instruments, and particularly relates to an auxiliary assembly frame for an electron impact ion source. The problems that an existing bombardment type ion source is large in assembly difficulty, low in assembly quality, difficult to dismantle and overhaul in the later period and the like are solved. The device comprises a base, a support frame and a fixing device, a plurality of supporting frames are mounted on the base, fixing devices are mounted on the plurality of supporting frames, the fixing devices are used for fixing ion sources, and each fixing device comprises a clamp. According to the utility model, the assembly operation is more convenient and quicker. By using the assembly frame, an operator can quickly position the assembly part and reduce the searching and positioning time, so that the overall assembly efficiency is improved, the accurate alignment of the assembly part can be ensured, and the assembly error is reduced.

Description

Technical Field

[0001] The utility model belongs to the field of manufacturing isotope magnetic mass spectrometers in analytical instruments, and specifically relates to an auxiliary assembly rack for an electron bombardment ion source. Background Art

[0002] With the continuous development of science and technology, ion sources are increasingly used in scientific research, industry and other fields. As an important type of ion source, the performance and use effect of electron bombardment ion source directly affect the working efficiency and accuracy of related equipment. In order to optimize the performance of electron bombardment ion source and improve its assembly quality and maintenance efficiency, this design proposes an electron bombardment ion source auxiliary assembly rack.

[0003] The electron bombardment ion source is generally composed of an ionization box, an exit slit seat, four insulating pillars, several electrodes, and several insulating ceramic washers, which are assembled using pins and bolts in a specific assembly sequence and position. The various parts are connected and fixed by screws and pins. The position accuracy of each electrode and slit is guaranteed, thereby ensuring the performance of the ion source.

[0004] Since all parts of the ion source are interference fit, and the parts are small and mostly special-shaped, installation is extremely inconvenient. And after all parts are assembled, they need to be fixed with pins and nuts with spring washers. During assembly and disassembly and maintenance, the ion source insulating support column and ionization box need to be fixed before other operations can be performed. At present, there is no auxiliary assembly device, and other staff members need to cooperate to fix it manually, and then another staff member can perform assembly or disassembly and maintenance work. The coordination is difficult during the operation, the operation efficiency is low, and the assembly quality cannot be guaranteed.

[0005] Based on this, the utility model proposes an electron bombardment ion source auxiliary assembly rack. Utility Model Content

[0006] In order to solve the above problems in the prior art, namely, the problems that the current bombardment type ion source is difficult to assemble, the assembly quality is low, and the later disassembly and maintenance are difficult, the utility model provides an electron bombardment ion source auxiliary assembly frame, including a base, a support frame and a fixing device;

[0007] A plurality of support frames are installed on the base, and a fixing device is installed on each of the plurality of support frames. The fixing device is used to fix the ion source, and the fixing device includes a clamp.

[0008] In some preferred embodiments, a working disk is mounted on the base, and the working disk is used to limit the assembly area.

[0009] In some preferred embodiments, the working disk is provided with baffles along its edge, and the baffles are used to prevent parts from being scattered.

[0010] In some preferred embodiments, a plurality of support frames are installed at any position on the base, and the specific structure thereof is as follows:

[0011] A plurality of adjusting studs are fixed above the base, and the adjusting studs are threadedly connected to the first threaded holes, and the first threaded holes are coaxially arranged at one end of the support frame close to the base.

[0012] In some preferred embodiments, a plurality of the support frames are each provided with a fixing device, the specific structure of which is as follows:

[0013] A second threaded hole is coaxially formed at one end of the support frame away from the base, and the second threaded hole is threadedly connected to a screw, and the screw is fixed to a fixing device.

[0014] In some preferred embodiments, a protective cover is installed on the working disk, and the protective cover is used to cover the ion source to prevent pollutants from entering the interior of the ion source.

[0015] In some preferred embodiments, the number of the adjusting studs is greater than the number of the supporting frames.

[0016] In some preferred embodiments, the base is placed on the working disk.

[0017] In some preferred embodiments, the protective cover is placed on the working disk.

[0018] In some preferred embodiments, the clamp is an elastic clamp.

[0019] Beneficial effects of the utility model:

[0020] Improve assembly efficiency: The design of the assembly jig is often optimized for specific assembly tasks, making assembly operations more convenient and faster. By using the assembly jig, operators can quickly locate assembly parts, reducing the time of searching and locating, thereby improving overall assembly efficiency.

[0021] Ensure assembly quality: Assembly jigs usually have precise positioning and fixing functions, which can ensure accurate alignment of assembly parts and reduce assembly errors. This helps to improve product consistency and quality stability and reduce defective product rates.

[0022] Improved working environment: The rational design of the assembly rack can make the working area more neat and orderly, and reduce clutter. This is not only beneficial to the physical and mental health of the operators, but also improves job satisfaction and enthusiasm.

[0023] Strong adaptability: The above-mentioned assembly racks usually have a certain degree of versatility and adjustability, and can adapt to assembly tasks of different specifications and types. This makes the assembly racks have a wider range of applications on the production line and can meet diverse assembly needs.

[0024] In summary, the beneficial effects of the above-mentioned assembly rack are mainly reflected in improving assembly efficiency, ensuring assembly quality, improving working environment, reducing labor intensity and having strong adaptability. BRIEF DESCRIPTION OF THE DRAWINGS

[0025] Other features, objects and advantages of the present application will become more apparent by reading the detailed description of non-limiting embodiments made with reference to the following drawings:

[0026] Figure 1 It is a schematic diagram of the overall structure of an electron bombardment ion source auxiliary assembly frame of the utility model;

[0027] Figure 2 It is a schematic diagram of a base in an electron bombardment ion source auxiliary assembly frame of the utility model;

[0028] Figure 3 The utility model is a schematic diagram of a support frame in an electron bombardment ion source auxiliary assembly frame. DETAILED DESCRIPTION

[0029] The present application is further described in detail below in conjunction with the accompanying drawings and embodiments. It is to be understood that the specific embodiments described herein are only used to explain the relevant utility model, rather than to limit the utility model. It is also necessary to explain that, for ease of description, only the parts related to the relevant utility model are shown in the accompanying drawings.

[0030] It should be noted that, in the absence of conflict, the embodiments and features in the embodiments of the present application can be combined with each other. The present application will be described in detail below with reference to the accompanying drawings and in combination with the embodiments.

[0031] like Figure 1-Figure 3 As shown, see Figure 1 The utility model provides an electron bombardment ion source auxiliary assembly frame, comprising a base 2, a support frame 3 and a fixing device 5;

[0032] A plurality of support frames 3 are mounted on the base 2 , and a fixing device 5 is mounted on each of the plurality of support frames 3 . The fixing device 5 is used to fix the ion source, and the fixing device 5 includes a clamp.

[0033] The base 2 is made of 304 stainless steel, which can ensure that the assembly frame is not easy to fall over when placed. A fixing device 5 is provided on the top of the support frame 3 for fixing the ion source. The outer dimensions are determined according to the diameter of the ion source.

[0034] The fixing device 5 adopts a clamp-type design, which can be adaptively adjusted according to the size and shape of the ion source. The clamp is made of elastic material, has good clamping force and buffering performance, and can ensure the stability and safety of the ion source during the fixing process.

[0035] For further explanation of the present invention, see Figure 1 A working disk 1 is installed on the base 2, and the working disk 1 is used to limit the assembly area.

[0036] For further explanation of the present invention, see Figure 1 The working disk 1 is provided with a baffle along its edge, and the baffle is used to prevent parts from being scattered.

[0037] For further explanation of the present invention, see Figure 1 , Figure 2 and Figure 3 , a plurality of support frames 3 are installed at any position on the base 2, and the specific structure thereof is as follows:

[0038] A plurality of adjusting studs 4 are fixed above the base 2 . The adjusting studs 4 are threadedly connected to a first threaded hole 7 . The first threaded hole 7 is coaxially opened at one end of the support frame 3 close to the base 2 .

[0039] The adjusting screw 4 is designed according to the assembly size of the ion source and is used to adjust the position of the support frame 3 so as to meet the practical requirements of assembling various ion sources.

[0040] The material of the adjusting stud 4 is 304 stainless steel, and a first threaded hole 7 for fixing is provided at the bottom end of the supporting frame 3, which is convenient for disassembly and assembly and is used for position adjustment.

[0041] For further explanation of the present invention, see Figure 1 , Figure 2 and Figure 3 , a fixing device 5 is installed on each of the plurality of support frames 3, and its specific structure is as follows:

[0042] A second threaded hole 8 is coaxially formed at one end of the support frame 3 away from the base 2 . The second threaded hole 8 is threadedly connected to a screw, and the screw is fixed to the fixing device 5 .

[0043] The second threaded hole 8 is designed at the top of the support frame 3 for assembling the ion source fixing device 5 to meet the fixing requirements of ion source insulating pillars of different sizes.

[0044] For further explanation of the present invention, see Figure 1 A protective cover 6 is installed on the working disk 1, and the protective cover 6 is used to cover the ion source to prevent pollutants from entering the interior of the ion source.

[0045] The protective cover 6 is made of transparent material and has good light transmittance and protective performance. The protective cover 6 can cover the entire area of ​​the ion source working disk 1, effectively preventing external dust, impurities and other pollutants from entering the ion source. The protective cover 6 is placed on the working disk 1. There is no fixed connection between the protective cover 6 and the working disk 1, which is convenient for the staff to prepare in the early stage.

[0046] For further explanation of the present invention, see Figure 1 , the number of the adjusting studs 4 is greater than the number of the supporting frames 3.

[0047] Among them, the technicians in this field can install multiple adjustment studs 4 on the base 2, and the positions can be arbitrarily selected. By setting multiple adjustment studs 4, the position of the support frame 3 can be arbitrarily installed according to the size requirements of the actual ion source to meet the needs of various ion sources. In this embodiment, 8 adjustment studs 4 are set and 4 support frames 3 are set.

[0048] For further explanation of the present invention, see Figure 1 , the base 2 is placed on the working disk 1.

[0049] In the description of the present invention, the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer" and the like indicating directions or positional relationships are based on the directions or positional relationships shown in the drawings, which are only for the convenience of description, and do not indicate or imply that the device or element must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as limiting the present invention. In addition, the terms "first", "second", and "third" are used for descriptive purposes only, and cannot be understood as indicating or implying relative importance.

[0050] In addition, it should be noted that in the description of the present invention, unless otherwise clearly specified and limited, the terms "installation", "connection" and "connection" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or it can be indirectly connected through an intermediate medium, or it can be the internal communication of two components. For those skilled in the art, the specific meanings of the above terms in the present invention can be understood according to the specific circumstances.

[0051] The term "comprise" or any other similar term is intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus / device that includes a list of elements includes not only those elements but also other elements not expressly listed, or also includes elements inherent to such process, method, article, or apparatus / device.

[0052] So far, the technical solution of the utility model has been described in conjunction with the preferred embodiments shown in the accompanying drawings, but it is easy for those skilled in the art to understand that the protection scope of the utility model is obviously not limited to these specific embodiments. Without departing from the principle of the utility model, those skilled in the art can make equivalent changes or substitutions to the relevant technical features, and the technical solutions after these changes or substitutions will fall within the protection scope of the utility model.

Claims

1. An electron bombardment ion source auxiliary assembly stand, characterized in that: It comprises a base (2), a support frame (3) and a fixing device (5); A plurality of support frames (3) are mounted on the base (2), and a fixing device (5) is mounted on each of the plurality of support frames (3). The fixing device (5) is used to fix an ion source, and the fixing device (5) comprises a clamp.

2. The electron bombardment ion source auxiliary assembly stand according to claim 1, characterized in that: A working disk (1) is mounted on the base (2), and the working disk (1) is used to limit an assembly area.

3. The electron bombardment ion source auxiliary assembly stand according to claim 2, characterized in that: The working disk (1) is provided with a baffle plate along its edge, and the baffle plate is used to prevent parts from being scattered.

4. The electron bombardment ion source auxiliary assembly stand according to claim 1, characterized in that: A plurality of support frames (3) are installed at any position on the base (2), and the specific structure thereof is as follows: A plurality of adjustment studs (4) are fixed above the base (2), and the adjustment studs (4) are threadedly connected to a first threaded hole (7), and the first threaded hole (7) is coaxially arranged at one end of the support frame (3) close to the base (2).

5. The electron bombardment ion source auxiliary assembly stand according to claim 1, characterized in that: A fixing device (5) is installed on each of the plurality of support frames (3), and its specific structure is as follows: A second threaded hole (8) is coaxially formed at one end of the support frame (3) away from the base (2), and the second threaded hole (8) is threadedly connected to a screw, and the screw is fixed to the fixing device (5).

6. The electron bombardment ion source auxiliary assembly stand according to claim 2, characterized in that: A protective cover (6) is installed on the working disk (1), and the protective cover (6) is used to cover the ion source to prevent pollutants from entering the interior of the ion source.

7. The electron bombardment ion source auxiliary assembly stand according to claim 4, characterized in that: The number of the adjusting studs (4) is greater than the number of the supporting frames (3).

8. The electron bombardment ion source auxiliary assembly stand according to claim 2, characterized in that: The base (2) is placed on the working plate (1).

9. The electron bombardment ion source auxiliary assembly stand according to claim 6, characterized in that: The protective cover (6) is placed on the working plate (1).

10. The electron bombardment ion source auxiliary assembly stand according to claim 1, characterized in that: The clamp is an elastic clamp.

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