Magnetron sputtering coating production line

Abstract

The utility model belongs to the field of coating, and particularly relates to a magnetron sputtering coating production line. Comprising a coating cabin, a feeding cabin and a discharging cabin, the feeding cabin and the discharging cabin are arranged at an inlet and an outlet of the coating cabin respectively, and the feeding cabin and the discharging cabin are both communicated with the coating cabin; the coating cabin, the feeding cabin and the discharging cabin are all provided with vacuumizing assemblies, and sealing mechanisms are arranged at the communicating positions of the feeding cabin and the coating cabin as well as the communicating positions of the discharging cabin and the coating cabin. The utility model provides a magnetron sputtering coating production line and aims to solve the problem of low efficiency during continuous magnetron sputtering coating.

Description

Technical Field

[0001] The utility model belongs to the field of coating, and particularly relates to a magnetron sputtering coating production line. Background Art

[0002] The magnetron sputtering coating technology uses the principle of cathode sputtering for coating, that is, argon ions bombard the surface of the target, and the sputtered atoms are deposited on the surface of the substrate to form a film. The device for coating using the magnetron sputtering technology is a magnetron sputtering coater.

[0003] When the magnetron sputtering coater uses the magnetron sputtering coating technology for coating, the substrate (on the surface of which a coating layer is formed) needs to complete the coating in a vacuum environment. Therefore, a conventional magnetron sputtering coater usually is equipped with a vacuum pumping assembly to form a vacuum environment inside the magnetron sputtering coater through the vacuum pumping assembly.

[0004] However, when a conventional magnetron sputtering coater needs to coat a substrate, the following steps will be carried out. First, the substrate enters the magnetron sputtering coater from the inlet of the magnetron sputtering coater. Then, the vacuum pumping assembly evacuates the inside of the magnetron sputtering coater to a predetermined state. Then, the magnetron sputtering coater coats the substrate. Finally, the magnetron sputtering coater returns to the atmospheric pressure state.

[0005] Therefore, during continuous coating, the conventional magnetron sputtering coating chamber needs to continuously repeat the whole process of evacuating from the atmospheric pressure state to the predetermined state and returning from the predetermined state to the atmospheric pressure state, resulting in a decrease in coating efficiency.

[0006] In summary, in the prior art, it is urgent to solve the problem of low efficiency during continuous magnetron sputtering coating. Summary of the Utility Model

[0007] The utility model provides a magnetron sputtering coating production line, and its purpose is to solve the problem of low efficiency during continuous magnetron sputtering coating.

[0008] To achieve the above purpose, the utility model provides a magnetron sputtering coating production line, including a coating chamber, a feeding chamber and a discharging chamber. The feeding chamber and the discharging chamber are respectively arranged at the inlet and the outlet of the coating chamber, and both the feeding chamber and the discharging chamber are communicated with the coating chamber;

[0009] The coating chamber, the feeding chamber and the discharging chamber are all equipped with a vacuum pumping assembly, and a sealing mechanism is arranged at the communication part between the feeding chamber and the discharging chamber and the coating chamber.

[0010] In this solution, the coating chamber, the feeding chamber, and the discharging chamber form a coating production line to cooperate in completing the coating. Moreover, the coating chamber, the feeding chamber, and the discharging chamber are all equipped with vacuum pumping components. Therefore, when continuous coating is required, the substrate enters the feeding chamber, and the feeding chamber is evacuated so that the substrate is in a vacuum environment. When the feeding chamber is being evacuated, the coating chamber is also being evacuated. After the air pressures in both the feeding chamber and the coating chamber reach the predetermined values, the substrate enters the interior of the coating chamber from the feeding chamber and the coating is completed inside the coating chamber. When the coating is being carried out in the coating chamber, the vacuum pumping components of the discharging chamber and the feeding chamber are evacuated simultaneously. After the coating in the coating chamber is completed and the air pressure in the discharging chamber reaches the predetermined value, the substrate enters the interior of the discharging chamber. When the substrate enters the discharging chamber, the subsequent substrate that has been evacuated in the feeding chamber enters the interior of the coating chamber.

[0011] As can be seen from the above process, in this solution, the coating chamber does not need to repeatedly switch between atmospheric pressure and the predetermined pressure. Compared with the prior art, the efficiency of magnetron sputtering coating can be greatly improved.

[0012] Preferably, in order to achieve automatic loading of the substrate, this solution preferably further includes a loading mechanism, and the loading mechanism is installed at the entrance of the feeding chamber.

[0013] In this solution, a loading mechanism is provided at the entrance of the feeding chamber, and the automatic loading of the substrate is realized through the loading mechanism. Compared with manual loading, the efficiency is obviously higher, and the entire coating line is more automated.

[0014] In order to achieve automatic unloading of the substrate, this solution preferably further includes an unloading mechanism, and the unloading mechanism is installed at the exit of the discharging chamber.

[0015] In this solution, an unloading mechanism is provided at the exit of the discharging chamber, and the substrate that has completed coating is received through the unloading mechanism. Compared with manually receiving the substrate, the efficiency is obviously higher, the entire coating line is more automated, and it is also safer.

[0016] Preferably, the loading mechanism and the unloading mechanism are for loading and unloading. In this solution, it is preferred that both the loading mechanism and the unloading mechanism include a lifting module and a conveying module. The conveying module is used to drive the substrate to move, and the lifting module is used to drive the substrate to reach a predetermined height.

[0017] In this solution, when loading is required, the lifting module moves the substrate to the predetermined height, and then the conveying module can convey the substrate into the interior of the feeding chamber; when unloading is required, the lifting module rises to the predetermined height to receive the substrate discharged from the exit of the discharging chamber, and then the substrate is removed from the exit of the discharging chamber through the conveying module. In this solution, through the conveying module and the lifting module, the usage requirements of both loading and unloading are satisfied simultaneously.

[0018] Preferably, in order to fix the substrate and prevent the substrate from moving during magnetron sputtering coating, this solution further includes a coating tooling for fixing the substrate.

[0019] In this solution, the coating tooling is configured to fix the substrate, so that the substrate can maintain a stable state during movement and coating, preventing the substrate from falling.

[0020] Preferably, in order to ensure that the edge of the substrate is not blocked and the substrate remains fixed, this solution preferably includes a receiving groove in the coating tooling for receiving the substrate, and the substrate is in an obliquely upward inclined state in the receiving groove.

[0021] In this solution, the substrate is obliquely upwardly received inside the receiving groove, and the receiving groove supports and fixes the substrate, preventing the substrate from tipping over. At the same time, since the receiving groove fixes the substrate, there is no need to configure a baffle to fix the substrate at the edge of the substrate, and the edge of the substrate is not blocked. In this solution, by placing the substrate obliquely upward inside the receiving groove, the substrate is not blocked and full coating of the substrate can be achieved.

[0022] Preferably, in order to achieve magnetron sputtering coating of the substrate inside the coating chamber, this solution preferably configures a magnetron sputtering coating cathode in the coating chamber for coating the substrate.

[0023] Preferably, in order to correspond to the substrate in an obliquely upward state, the magnetron sputtering coating cathode in this solution is installed obliquely downward so that the magnetron sputtering coating cathode faces the substrate.

[0024] In this solution, the magnetron sputtering coating cathode is obliquely downwardly arranged, so the magnetron sputtering coating cathode can be parallel to the substrate correspondingly, and a better coating effect can be achieved on the substrate.

[0025] To facilitate the maintenance of the magnetron sputtering coating cathode and the inside of the coating chamber, this solution preferably installs the magnetron sputtering coating cathode detachably in the coating chamber.

[0026] In this solution, when maintenance of the magnetron sputtering coating cathode or the inside of the coating chamber is required, the magnetron sputtering coating cathode can be detached from the coating chamber, thus realizing the maintenance of the magnetron sputtering coating cathode or the inside of the coating chamber, which is convenient for use.

[0027] Preferably, due to the heavy weight of the magnetron sputtering coating cathode and for the convenience of precise movement of the magnetron sputtering coating cathode, this solution preferably further includes a moving mechanism, the magnetron sputtering coating cathode is installed on the moving mechanism, and the moving mechanism is used to drive the magnetron sputtering coating cathode to move.

[0028] This solution realizes the movement of the magnetron sputtering coating cathode through a moving mechanism. Compared with manually moving the magnetron sputtering coating cathode, it is obviously more convenient to use. In addition, when the magnetron sputtering coating cathode needs to be accurately returned to its original position, the moving mechanism is used to achieve the return of the magnetron sputtering coating cathode, with higher accuracy.

[0029] Preferably, in order to facilitate the movement of the substrate from the feeding chamber to the coating chamber, from the coating chamber to the discharging chamber, and from the discharging chamber to the outside. This solution preferably configures a conveying mechanism inside the coating chamber, the feeding chamber, and the discharging chamber, and the conveying mechanism is used to drive the substrate to move.

[0030] In this solution, by setting the conveying mechanism as the power to drive the substrate to move in different chambers, different processing steps are realized, and the entire production line is more automated.

[0031] Preferably, in order to solve the problem of the substrate offset on the conveying mechanism, this solution preferably includes a conveying module and a guiding channel in the conveying mechanism. The conveying mechanism is used to drive the substrate to move, and the guiding channel is arranged above the conveying module, and the guiding channel is used to guide the substrate to move.

[0032] In this solution, a guiding channel is configured above the conveying module to guide the substrate to move, ensuring that the substrate can move accurately and solving the problem of the substrate offset without restriction.

[0033] The beneficial effect of the present utility model is that: in this solution, the coating chamber, the feeding chamber, and the discharging chamber form a coating production line to cooperate to complete coating. And the coating chamber, the feeding chamber, and the discharging chamber are all configured with vacuum pumping components. The coating chamber does not need to repeatedly switch between atmospheric pressure and a predetermined pressure, and compared with the prior art, it can greatly improve the efficiency of magnetron sputtering coating. Description of the Drawings

[0034] Figure 1 It is a schematic diagram of the magnetron sputtering coating production line in Embodiment 1.

[0035] Figure 2 It is a schematic structural diagram of the feeding chamber in Embodiment 1.

[0036] Figure 3 It is a schematic structural diagram of the coating tooling in Embodiment 2.

[0037] Figure 4 It is a side view of the coating tooling in Embodiment 2.

[0038] Figure 5 It is a schematic structural diagram of the coating chamber in Embodiment 2.

[0039] Figure 6Schematic diagram of the connection relationship between the magnetron sputtering coating cathode and the moving mechanism in Embodiment 2.

[0040] Figure 7 Schematic diagram of the correspondence between the coating tooling and the magnetron sputtering coating cathode in Embodiment 2.

[0041] Figure 8 Schematic diagram of the conveyor mechanism arranged in the feeding chamber, coating chamber, and discharging chamber in Embodiment 2.

[0042] Figure 9 Schematic diagram of the structure of the conveyor mechanism in Embodiment 2.

[0043] Figure 10 Schematic diagram of the magnetron sputtering coating production line in Embodiment 3.

[0044] Figure 11 Schematic diagram of the structure of the loading device in Embodiment 3.

[0045] Reference numerals include: coating chamber 1, magnetron sputtering coating cathode 11, moving mechanism 12, base 121, sliding module 122, mounting bracket 123, connection structure 124, feeding chamber 2, hatch 21, discharging chamber 3, closing mechanism 4, loading device 5, conveying module 51, first roller 511, first driving motor 512, lifting module 52, unloading device 6, coating tooling 7, accommodating component 71, constraint groove 711, base 72, roller 721, support column 73, conveyor mechanism 8, conveying module 81, second roller 811, second driving motor 812, guiding component 82. Detailed implementation manners

[0046] In order to make the objectives, technical solutions, and advantages of the embodiments clearer, the present invention will be further described in detail below with reference to the accompanying drawings and embodiments. When the following description refers to the accompanying drawings, unless otherwise indicated, the same numbers in different drawings represent the same or similar elements. The implementation manners described in the following exemplary embodiments do not represent all implementation manners consistent with the present disclosure. On the contrary, they are merely examples of devices and methods consistent with some aspects of the present disclosure as detailed in the appended claims.

[0047] It should be noted that all actions of obtaining signals, information, or data in this application are carried out on the premise of complying with the corresponding data protection regulations and policies of the country where the location is located and obtaining the authorization given by the owner of the corresponding device.

[0048] In the present disclosure, unless otherwise stated, the orientation terms such as "inside, outside" are defined according to the self-profile of the corresponding components. The terms such as "first, second" used in the present disclosure are used to distinguish one element from another and do not have sequentiality and importance. Example 1

[0049] Basically as shown in the attached Figure 1 figure, the magnetron sputtering coating production line can be used for continuous coating and has relatively high production efficiency.

[0050] The magnetron sputtering coating production line in the embodiment of the present disclosure specifically includes a coating chamber 1, a feeding chamber 2, and a discharging chamber 3. During implementation, according to the movement path of the substrate, they are arranged in the following order successively, that is, the feeding chamber 2, the coating chamber 1, and the discharging chamber 3. The feeding chamber 2, the coating chamber 1, and the discharging chamber 3 are all configured with vacuum pumping components. The vacuum pumping components can be conventional vacuum pumping devices applicable to magnetron sputtering coating machines in the prior art, which will not be elaborated in the embodiment of the present disclosure. The vacuum pumping components can be respectively installed on the outer walls of the feeding chamber 2, the coating chamber 1, and the discharging chamber 3 to respectively pump the interiors of the feeding chamber 2, the coating chamber 1, and the discharging chamber 3 into a vacuum, so that the substrate is in a vacuum environment.

[0051] The following introduces the movement process of the substrate between the feeding chamber 2, the coating chamber 1, and the discharging chamber 3:

[0052] When the substrate needs to be magnetron sputtered and coated. First, the substrate is loaded into the interior of the feeding chamber 2, and the vacuum pumping component configured in the feeding chamber 2 works, so that the substrate is in a vacuum environment. When the vacuum pumping component configured in the feeding chamber 2 works, the vacuum pumping component configured in the coating chamber 1 also works simultaneously. Then, when the air pressure in the feeding chamber 2 reaches a predetermined value, the substrate enters the interior of the coating chamber 1 from the outlet of the feeding chamber 2. Since a negative pressure is pre-formed in the interior of the coating chamber 1, when the substrate enters the interior of the coating chamber 1 from the outlet of the feeding chamber 2, the air pressure in the interior of the coating chamber 1 will not rise or rise too high. Then, the substrate enters the interior of the coating chamber 1, and devices such as the vacuum pumping component configured in the coating chamber 1 and the magnetron sputtering coating cathode 11 complete the coating operation of the substrate under vacuum, so that a coating layer is formed on the surface of the substrate. When the substrate is being coated in the coating chamber 1, the vacuum pumping component configured in the discharging chamber 3 also works simultaneously, so that a vacuum environment is pre-formed in the discharging chamber 3. Then, after the substrate is coated, the substrate enters the discharging chamber 3 from the coating chamber 1. Since a vacuum environment is pre-formed in the interior of the coating chamber 1, the air pressure in the coating chamber 1 will not rise or rise rapidly. Finally, when the substrate is located in the discharging chamber 3, after the coating chamber 1 and the discharging chamber 3 are separated, the discharging chamber 3 can be opened, so that the substrate is discharged from the outlet of the discharging chamber 3 to the outside.

[0053] It can be understood that: when continuously coating the substrate, when the current batch of substrates is being coated inside the coating chamber 1, the feeding chamber 2 is already evacuating the next batch of substrates. After the current batch of substrates is coated inside the coating chamber 1 and moved into the discharging chamber 3, the next batch of substrates in the feeding chamber 2 can enter the coating chamber 1 for coating. At the same time, since the discharging chamber 3 for discharging has been evacuated in advance, when the previous batch of substrates is transported from the coating chamber 1 to the discharging chamber 3, the air pressure inside the coating chamber 1 will not increase, and the air pressure inside the coating chamber 1 can be maintained within a predetermined range. Through the cooperation of the feeding chamber 2, the coating chamber 1, and the discharging chamber 3, this solution can achieve continuous and rapid coating of the substrate. The inside of the coating chamber 1 does not need to switch between the atmospheric pressure and the vacuum environment, and the efficiency is higher.

[0054] Since a sealed environment needs to be maintained during the evacuation process, and in order to ensure that the substrate can move from the feeding chamber 2 to the coating chamber 1 and from the coating chamber 1 to the discharging chamber 3 at the same time. As Figure 1 shown, in the embodiment of the present disclosure, a closing mechanism 4 is provided between the outlet of the feeding chamber 2 and the inlet of the coating chamber 1. The closing mechanism 4 is used to connect or disconnect the feeding chamber 2 and the coating chamber 1 from each other. That is to say, when it is necessary to supply the substrate to enter the coating chamber 1 from the feeding chamber 2, the closing mechanism 4 is opened to connect the feeding chamber 2 and the coating chamber 1; when the coating chamber 1 or the feeding chamber 2 needs to work independently (such as evacuation or coating), the closing mechanism 4 is closed to separate the feeding chamber 2 and the coating chamber 1 from each other.

[0055] At the same time, in the embodiment of the present disclosure, a closing mechanism 4 is also provided between the inlet and the outlet of the coating chamber 1. The closing mechanism 4 is used to connect or disconnect the discharging chamber 3 and the coating chamber 1 from each other. That is to say, when it is necessary to supply the substrate to enter the discharging chamber 3 from the coating chamber 1, the closing mechanism 4 is opened to connect the feeding chamber 2 and the coating chamber 1; when the coating chamber 1 or the discharging chamber 3 needs to work independently (such as evacuation or coating), the closing mechanism 4 is closed to separate the discharging chamber 3 and the coating chamber 1 from each other.

[0056] The closing mechanism 4 in the embodiment of the present disclosure can be a plug valve or other similar valve bodies in the prior art.

[0057] The feeding chamber 2 and the discharging chamber 3 in the embodiment of the present disclosure are both enclosed chambers, so as to prevent impurities from entering the inside and prevent gas from entering the inside during evacuation. The outlet of the feeding chamber 2 is connected to the inlet of the coating chamber 1, and the inlet of the coating chamber 1 is connected to the outlet of the coating chamber 1. Of course, in order to enable the feeding chamber 2 to load the substrate, a hatch 21 is configured at the inlet of the feeding chamber 2, as Figure 2As shown in the figure. The hatch 21 is used to open or close the feed chamber 2. When the hatch 21 is opened, the substrate can be loaded into the interior of the feed chamber 2; when the hatch 21 is closed, the interior of the feed chamber 2 can be evacuated. Of course, in order to enable the output of the coated substrate from the discharge chamber 3, a hatch 21 is also provided at the outlet of the discharge chamber 3. The hatch 21 is used to open or close the discharge chamber 3. When the hatch 21 is opened, the substrate can be output from the coating chamber 1; when the hatch 21 is closed, the interior of the discharge chamber 3 can be evacuated.

[0058] The coating chamber 1 in the embodiments of the present disclosure can be a conventional coating chamber 1 in the prior art, which is configured with a magnetron sputtering coating cathode 11, a vacuum pumping assembly, and other related supporting structures. After the substrate enters the interior of the magnetron sputtering coating chamber 1, the magnetron sputtering coating cathode 11 configured in the magnetron sputtering coating chamber 1 can achieve magnetron sputtering coating of the substrate. Embodiment 2

[0059] In the prior art, conventional coating methods usually include horizontal coating and vertical coating. However, horizontal coating will cause a large amount of coating slag on the surface of the substrate, while vertical coating cannot achieve full coating.

[0060] To solve the above problems, the difference between the embodiments of the present disclosure and Embodiment 1 is that. The embodiments of the present disclosure include a coating tooling 7 and a magnetron sputtering coating cathode 11 arranged in parallel with the coating tooling 7, as Figure 7 shown.

[0061] As Figure 3 and Figure 4 shown, the coating tooling 7 includes a receiving member 71, a base 72, and a support column 73. The base 72 and the support column 73 are used to support the receiving member 71 to keep the receiving member 71 stable. The receiving member 71 is configured with a constraint groove 711. The constraint groove 711 is a rectangular groove, and the interior of the constraint groove 711 is used to receive the substrate. In the embodiments of the present disclosure, the receiving member 71 is integrally arranged obliquely upward, so that when the substrate is located inside the constraint groove 711, the substrate is in an obliquely upward inclined state. The receiving member 71 is inclined obliquely upward by 5 to 10 degrees to ensure that the substrate can be stably received inside the receiving groove and the substrate will not fall forward.

[0062] It should be noted that: when the substrate is located inside the constraint groove 711, the bottom and the side wall of the constraint groove 711 can support the substrate to keep the substrate stable and prevent the substrate from sliding out of the constraint groove 711. At the same time, since the substrate is in an obliquely upward inclined state inside the constraint groove 711, even if the edge of the substrate is not constrained, the substrate will not fall forward. The edge of the substrate is not blocked, and the substrate can be fully coated.

[0063] It should be noted that since the substrate needs to be in an inclined state and does not fall forward. And it is also necessary to prevent the substrate from adhering to the dropped plating slag. Therefore, when the substrate is accommodated inside the constraint groove 711, the substrate being inclined upward by 5 to 10 degrees can meet the usage requirements. When the inclination angle is greater than 10 degrees, the probability of the plating slag falling on the substrate will increase significantly. When the inclination angle is less than 5 degrees, the probability of the substrate falling forward from inside the constraint groove 711 will also increase significantly. In addition, within the angle range of 5 to 10 degrees, the most preferred inclination angle of the substrate in the embodiments of the present disclosure is 7 degrees, as Figure 4 shown. At this time, the substrate will not fall forward, and the probability of the substrate adhering to the dropped plating slag is also low.

[0064] In the embodiments of the present disclosure, it is preferred that the constraint groove 711 is a rectangular groove, as Figure 3 shown, and the rectangular groove is adapted to the shape of the substrate. For example: when the substrate is rectangular, the constraint groove 711 is a rectangular groove; when the substrate is square, the constraint groove 711 is a square groove. At the same time, in order to enable the tooling to accommodate more substrates and there is no interference between the substrates. In the embodiments of the present disclosure, it is preferred that at least two constraint grooves 711 are provided, and each constraint groove 711 can accommodate one substrate. In the embodiments of the present disclosure, the number of the constraint grooves 711 is not specifically limited, and during implementation, 2, 3, 4, 5, etc. can be set according to the size of the accommodating member 71. At the same time, in order to construct more constraint grooves 711 on the accommodating member 71, in the embodiments of the present disclosure, it is preferred that the constraint grooves 711 are arranged in an array, ensuring that more accommodating members 71 can be constructed while the constraint grooves 711 do not interfere with each other.

[0065] In order to prevent the back surface of the substrate from being blocked and ensure that when the substrate is heated, there is no temperature difference or the temperature difference is small between the front and back surfaces of the substrate. Therefore, in the embodiments of the present disclosure, it is preferred that a through hole is provided at the inner bottom of the constraint groove 711. The through hole can be a circular opening, a rectangular opening, an irregular opening, etc. The through hole penetrates the entire accommodating member 71 to ensure that the back surface of the substrate is exposed when the substrate is accommodated inside the constraint groove 711.

[0066] The base 72 in the embodiments of the present disclosure is integrally plate-shaped and is arranged at the bottom end. The top of the base 72 can be installed with support columns 73 through fasteners. It is preferred that two support columns 73 are provided and are respectively located on the left and right sides of the base 72. The top ends of the support columns 73 on both sides are connected to the side walls of the accommodating member 71, so that the left and right sides of the accommodating member 71 are supported by the support columns 73, and the accommodating member 71 is more stable. During implementation, the top ends of the support columns 73 can be fixedly connected to the side walls of the accommodating member 71 by welding or configuring fasteners.

[0067] To adapt to the substrate that is inclined obliquely upward, the coating chamber 1 in the embodiments of the present disclosure is an enclosed chamber, and its interior is used for magnetron sputtering coating. The magnetron sputtering coating cathode 11 for coating the substrate is installed on the side wall of the coating chamber 1. When the magnetron sputtering coating cathode 11 is installed on the inner wall of the coating chamber 1, the magnetron sputtering coating cathode 11 is in a state of being inclined downward obliquely, as Figure 5 shown. The magnetron sputtering coating cathode 11 is parallel to the substrate to achieve a better coating effect. At the same time, since the substrate is inclined obliquely upward by 5-10 degrees inside the coating tooling 7, in order to ensure that the magnetron sputtering coating cathode 11 is parallel to the substrate, the magnetron sputtering coating cathode 11 is also inclined downward obliquely by 5-10 degrees to ensure that the magnetron sputtering coating cathode 11 is directly facing the substrate, as Figure 7 shown. The magnetron sputtering coating cathode 11 in the embodiments of the present disclosure is the magnetron sputtering coating cathode 11 used in magnetron sputtering coating in the prior art, so the specific structure of the magnetron sputtering coating cathode 11 in the embodiments of the present disclosure will not be elaborated.

[0068] To install the magnetron sputtering coating cathode 11 on the inner wall of the coating chamber 1, a rectangular installation opening is constructed on the side wall of the coating chamber 1. The magnetron sputtering coating cathode 11 can be installed at the installation opening by configuring fasteners, so that the working end of the magnetron coating cathode enters the interior of the coating chamber 1. At the same time, since the magnetron sputtering coating cathode 11 is installed at the installation opening by fasteners, the magnetron detection coating cathode can be removed from the installation opening by loosening the fasteners.

[0069] Since the magnetron sputtering coating cathode 11 is detachably installed on the side wall of the coating chamber 1, taking an application scenario as an example: when it is necessary to maintain the interior of the coating chamber 1 and when it is necessary to maintain the magnetron detection coating cathode, the fasteners can be rotated and loosened so that the magnetron detection coating cathode can be removed from the installation opening. After the magnetron detection coating cathode is removed from the installation opening, the interior of the coating chamber 1 can be maintained through the installation opening, which also meets the need for maintaining the magnetron sputtering coating cathode 11.

[0070] It should be noted that: in order to prevent the coating chamber 1 from failing to maintain a sealed state when the magnetron sputtering coating cathode 11 is installed at the installation opening. In the embodiments of the present disclosure, a sealing ring is configured at the edge of the magnetron sputtering coating cathode 11, and the sealing ring deforms under force, thereby sealing the edge of the installation opening to prevent the connection between the magnetron sputtering coating cathode 11 and the installation opening from being poorly sealed. At the same time, when installing through the fasteners, the fasteners make the magnetron sputtering coating cathode as tight as possible at the installation opening, further ensuring the sealing performance of the coating chamber 1.

[0071] Meanwhile, since the magnetron sputtering coating cathode 11 is relatively heavy. Therefore, in order to prevent the magnetron sputtering coating cathode from being dropped and damaged after being removed from the installation opening, in the embodiments of the present disclosure, it is preferably that the magnetron sputtering coating cathode is connected to a moving mechanism 12, such as Figure 6 shown. The magnetron sputtering coating cathode is supported by the moving mechanism 12, so that the magnetron sputtering coating cathode 11 is kept stable and prevented from dropping. Meanwhile, the moving of the magnetron sputtering coating cathode can be realized through the moving mechanism 12, so that the magnetron sputtering coating cathode 11 can be moved closer to or away from the installation opening, which is more labor-saving and convenient to operate.

[0072] The structure of the moving mechanism 12 described in the embodiments of the present disclosure can be of various structures.

[0073] Taking one kind of moving mechanism 12 as an example: such as Figure 6As shown, the moving mechanism 12 includes a base 121, a sliding module 122, and a mounting frame 123. The base 121 is disposed at the lowest end. The base 121 can be in a block shape or a frame shape, and the embodiments of the present disclosure do not limit this. The base 121 mainly functions to support, and the sliding module 122 is installed on the top of the base 121, and the mounting frame 123 is further installed on the sliding module 122. The mounting frame 123 is connected to the magnetron sputtering coating cathode 11 through a connection structure 124. In the embodiments of the present disclosure, the sliding module 122 specifically includes a slide rail and a slider. The slide rail can be installed on the top of the base 121 by welding or configuring fasteners, etc. The slider is then installed on the slide rail, and the slider can slide along the slide rail, so that the mounting frame 123 also moves accordingly. Preferably, at least two sliding modules 122 are configured and symmetrically arranged on the left and right sides of the base 121. The bottom of the mounting frame 123 is connected to all the sliding modules 122 at the same time, making the mounting frame 123 more stable when sliding. The mounting frame 123 in the embodiments of the present disclosure specifically includes a bottom plate and a vertical frame. The bottom plate is disposed at the lowest end and is used to be fixedly connected to the slider in the sliding module 122. The vertical frame is installed on the bottom plate and can be specifically connected by welding. The connection structure 124 is constructed on the vertical frame, and the magnetron sputtering coating cathode 11 is detachably connected through the connection structure 124. The connection structure 124 specifically includes a mating block and a mating groove. The mating block is fixedly connected to the magnetron sputtering coating cathode 11 by welding or fasteners, and a fixing pin is constructed on the mating block. The mating groove is directly constructed on the front surface of the mounting frame 123, and the fixing pin on the mating block can be inserted into the interior of the mating groove. At the same time, a fixing hole and a locking pin penetrating the mating groove are correspondingly constructed in the mating groove. When the fixing pin is inserted into the interior of the mating groove, the locking pin is inserted into the fixing hole to lock the fixing pin in the interior of the mating groove, realizing the stable connection between the mounting frame 123 and the magnetron sputtering coating cathode 11. In addition, in order to ensure that the magnetron sputtering coating cathode 11 is more stably installed, a plurality of connection structures 124 can be provided and distributed in a circle around the magnetron sputtering coating cathode 11 to further ensure the stable connection between the magnetron sputtering coating cathode 11 and the mounting frame 123.

[0074] It can be understood that: since the magnetron sputtering coating cathode 11 is connected to the moving mechanism 12, when the magnetron sputtering coating cathode 11 is removed from the side wall of the coating chamber 1, the magnetron sputtering coating cathode 11 can move along the sliding module 122, and the magnetron sputtering coating cathode 11 moves away from the side wall of the coating chamber 1. At the same time, when it is necessary to disassemble the magnetron sputtering cathode from the mounting frame 123, the locking pin can be taken out to unlock the magnetron sputtering coating cathode 11, and the magnetron sputtering coating cathode 11 can be disassembled and taken away.

[0075] Since the substrate is in an inclined upward state inside the coating chamber 1, in order to ensure that the magnetron sputtering coating cathode 11 is parallel to the substrate and achieve a better coating effect. In the embodiment of the present disclosure, the front end of the mounting frame 123 is inclined downward, so that when the magnetron sputtering coating cathode 11 is mounted on the mounting frame 123, the magnetron sputtering coating cathode 11 is in an inclined downward state. At the same time, when the magnetron sputtering coating cathode 11 is mounted at the mounting opening, the magnetron sputtering coating cathode 11 is also in an inclined downward state. Embodiment 3

[0076] The embodiment of the present disclosure is improved on the basis of Embodiment 2. In order to enable the coating tooling 7 loaded with the substrate to automatically enter the interior of the coating chamber 1 from the feeding chamber 2, and after the coating is completed, move from the coating chamber 1 to the interior of the discharging chamber 3. In the embodiment of the present disclosure, a conveying mechanism 8 is provided inside the coating chamber 1, the feeding chamber 2 and the discharging chamber 3, and the conveying mechanism 8 is used to drive the movement of the substrate, as Figure 8 shown.

[0077] The conveying mechanism 8 in the embodiment of the present disclosure includes a conveying module 81, and the conveying module 81 is a linear roller conveying mechanism 8, as Figure 9 shown. The coating tooling 7 is accommodated on the linear roller conveying mechanism 8, and the roller drives the coating tooling 7 to move. Thereby enabling the substrate located on the coating tooling 7 to automatically enter the interior of the coating chamber 1 from the feeding chamber 2, and after the coating is completed, move from the coating chamber 1 to the interior of the discharging chamber 3.

[0078] The linear roller conveying mechanism 8 in the embodiment of the present disclosure can be a linear roller conveying mechanism 8 commonly used in the prior art. As Figure 9As shown, the main structure of the linear roller conveyor mechanism 8 includes a plurality of second rollers 811 and a second drive motor 812. The plurality of second rollers 811 are arranged in a straight line, and the surface of the second roller 811 can be placed on the coating tool 7. The plurality of second rollers 811 can be directly rotatably mounted on the inner wall of the coating cabin 1, the feed cabin 2 or the discharge cabin 3, or the plurality of second rollers 811 can be rotatably mounted on a mounting base such as a frame, and then the mounting base such as a frame is mounted on the inner wall of the coating cabin 1, the feed cabin 2 or the discharge cabin 3. At the same time, one end of the second roller 811 is provided with a transmission component such as a pulley or a sprocket, and the output end of the second drive motor 812 is also provided with a transmission component such as a pulley or a sprocket, and the second drive motor 812 is connected to the second roller 811 through a belt or a chain. Therefore, when the second drive motor 812 is working, the second drive motor 812 can drive the second roller 811 to rotate. When the second roller 811 rotates, the second roller 811 drives the coating tool 7 to move. At the same time, the rotation direction of the second drive motor 812 is different, and the rotation direction of the second roller 811 can also change accordingly, thereby driving the coating tool 7 in different directions.

[0079] In order to prevent the second roller 811 from sliding against the bottom of the coating tooling 7, the bottom of the coating tooling 7 and / or the surface of the second roller 811 may be constructed with anti-slip textures (not shown in the figure), thereby solving the problem of sliding between the second roller 811 and the bottom of the coating tooling 7.

[0080] Since the coating tool 7 can be driven to move in different directions by the forward and reverse rotation of the second driving motor 812, in the embodiment of the present disclosure, after the coating tool 7 enters the coating chamber 1, the conveying module 81 can drive the coating tool 7 to move back and forth inside the coating chamber 1 to achieve a better coating effect.

[0081] It should be noted that when the magnetron sputtering coating cathode 11 is coating, the coating thickness is different at the middle and the two sides of the magnetron sputtering coating cathode 11. Therefore, by driving the coating tool 7 to move back and forth through the configured transmission module 81, a uniform coating can be formed at different positions on the surface of the substrate in the coating tool 7, and the coating effect is better.

[0082] In order to solve the problem that the coating tool 7 is offset when the coating tool 7 is driven by the transmission module 81, the transmission mechanism 8 in the embodiment of the present disclosure also includes a guide channel, such as Figure 8As shown in the figure. The guiding channel is composed of guiding components 82 arranged on the front and rear sides, that is, the guiding components 82 arranged on the front and rear sides are spaced apart from each other, and a guiding channel is formed between the guiding components 82. The guiding components 82 can be fixedly installed on the inner walls of the coating chamber 1, the feeding chamber 2 or the discharging chamber 3. Of course, the guiding components 82 can also be installed at other positions, as long as it is ensured that the guiding components 82 are located above the conveying mechanism 8 and do not interfere with the conveying mechanism 8. In the embodiment of the present disclosure, a guiding channel is formed between the guiding components 82 arranged on the front and rear sides, and the bottom plate of the coating tooling 7 is received in the guiding channel and moves along the guiding channel.

[0083] When the coating tooling 7 is located on the conveying mechanism 8, the front and rear sides of the bottom plate of the coating tooling 7 are respectively in contact with the guiding plates arranged on the front and rear sides. The guiding plates can guide the bottom plate of the coating tooling 7 to move, thereby realizing the overall movement of the guiding coating tooling 7 and avoiding the deviation of the coating tooling 7.

[0084] It should be noted that: in order to solve the problem of friction damage between the front and rear sides of the bottom plate of the coating tooling 7 and the side surfaces of the guiding plates, rolling components can be arranged on the front and rear sides of the bottom plate in the embodiment of the present disclosure. The fixing components can be rollers 721 or balls. By contacting the guiding plates with the rollers 721 or balls, the problem of friction damage between the front and rear sides of the bottom plate and the side surfaces of the guiding plates can be solved. At the same time, the friction force is also reduced by the rollers 721 or balls, and the movement of the coating tooling 7 is more smooth.

[0085] When the conveying mechanism 8 is installed inside the feeding chamber 2, both ends of the conveying mechanism 8 extend to the entrance and the exit of the feeding chamber 2 respectively. When the conveying mechanism 8 is installed inside the coating chamber 1, both ends of the conveying mechanism 8 extend to the entrance and the exit of the coating chamber 1 respectively. When the conveying mechanism 8 is installed in the discharging chamber 3, both ends of the conveying mechanism 8 extend to the entrance and the exit of the discharging chamber 3 respectively. That is to say, when the substrate moves in the feeding chamber 2, the coating chamber 1 and the discharging chamber 3, the substrate will always be located on the conveying mechanism 8. However, the conveying mechanisms 8 in the feeding chamber 2, the coating chamber 1 and the discharging chamber 3 are not in a connected state, but work independently of each other. Therefore, when the coating tooling 7 enters the entrance of the feeding chamber 2 from the outside, when the coating tooling 7 enters the conveying mechanism 8 of the coating chamber 1 from the exit of the feeding chamber 2, and when the coating tooling 7 enters the entrance of the discharging chamber 3 from the exit of the coating chamber 1, the coating tooling 7 is extremely likely to deviate.

[0086] In order to solve the above-mentioned problem, the end of the guide channel located at the entrance is trumpet-shaped. That is, the end of the guide channel of the feed cabin 2 located at the entrance of the feed cabin 2 is trumpet-shaped; the end of the guide channel of the coating cabin 1 located at the entrance of the coating cabin 1 is trumpet-shaped; the end of the guide channel in the discharge cabin 3 located at the entrance of the discharge cabin 3 is trumpet-shaped. Therefore, when the coating tool 7 entering the feed cabin 2, the coating cabin 1 or the discharge cabin 3 is offset to a certain extent, the trumpet-shaped guide channel can correct the offset coating tool 7, so that the coating tool 7 enters the guide channel at the correct position. Example 4

[0087] The embodiment of the present disclosure is improved on the basis of embodiment 1 or embodiment 2, such as Figure 10 As shown, the disclosed embodiment includes a loading device 5 and a discharging device. The loading mechanism is arranged at the entrance of the feed chamber 2, and is used to introduce the substrate into the feed chamber 2; the unloading mechanism is arranged at the exit of the discharging chamber 3, and is used to receive the coating tool 7 output from the exit of the discharging chamber 3.

[0088] The feeding device 5 in the embodiment of the present disclosure may include a conveying module 51 and a lifting module 52. Figure 11 As shown, the conveying module 51 can also be specifically a linear roller conveying mechanism 8. The movement of the coating tool 7 is achieved by the linear roller conveying mechanism 8. The linear roller conveying mechanism 8 usually includes a plurality of first rollers 511 and a first drive motor 512. The plurality of first rollers 511 are arranged in a straight line, and the first rollers 511 are rotatably mounted on the frame. The end of the first roller 511 is provided with a transmission component such as a pulley or a sprocket. At the same time, the first drive motor 512 is also installed on the frame, and the output shaft of the first drive motor 512 is also provided with a transmission component such as a pulley or a sprocket. The first drive motor 512 is connected to the first roller 511 through a belt or a chain. When the first drive motor 512 is working, the first roller 511 rotates accordingly. The coating tool 7 placed on the first roller 511 moves.

[0089] It should be noted that, in addition to the above-mentioned structure, the conveying module 51 in the embodiment of the present disclosure may also be a belt conveyor belt in the prior art.

[0090] The lifting module 52 in the embodiment of the present disclosure is specifically a lifting cylinder, which is installed below the conveying module 51 and is vertically arranged. The bottom end of the lifting cylinder is fixedly installed, and the top end of the lifting cylinder is fixedly connected to the frame of the conveying module 51. When the lifting cylinder performs lifting movement, the conveying module 51 also performs lifting movement accordingly.

[0091] Taking an application scenario as an example: When it is necessary to load the coating tooling 7, first, the lifting module 52 lifts the conveying module 51 to a predetermined height, so that the upper surface of the conveying module 51 is slightly higher than or parallel to the entrance of the feeding chamber 2. Then the conveying module 51 operates, and the conveying module 51 drives the coating tooling 7 to the entrance of the feeding chamber 2. After the conveying module 51 conveys the coating tooling 7 into the entrance of the feeding chamber 2, the lifting module 52 drives the conveying module 51 to descend to the initial position.

[0092] In the embodiments of the present disclosure, it is preferred that the unloading device 6 has the same structure as the loading device 5, so the embodiments of the present disclosure will not be described in detail. Of course, in some other embodiments, the unloading device 6 can also be other types of unloading devices 6.

[0093] Taking an application scenario as an example: When the coating tooling 7 is output from the outlet of the discharging chamber 3, first, the lifting module 52 lifts the conveying module 51 to a predetermined height, so that the upper surface of the conveying module 51 is slightly lower than or parallel to the outlet of the discharging chamber 3, enabling the coating tooling 7 to enter the upper surface of the conveying module 51. Then, the lifting module 52 drives the conveying module 51 to descend, facilitating the operator to take away the coating tooling 7.

[0094] The above are only the embodiments of the present utility model. Common knowledge such as specific structures and characteristics known in the solutions is not described in detail here. It should be noted that for those skilled in the art, without departing from the structure of the present utility model, several deformations and improvements can still be made, which should also be regarded as the protection scope of the present utility model, and these will not affect the implementation effect of the present utility model and the practicability of the patent. The protection scope required by this application should be based on the content of its claims, and the specific implementation manners described in the specification can be used to explain the content of the claims.

Claims

1. Magnetron sputtering coating production line, characterized by: It includes a coating chamber, a feeding chamber and a discharging chamber, wherein the feeding chamber and the discharging chamber are respectively arranged at the entrance and the exit of the coating chamber, and the feeding chamber and the discharging chamber are both connected with the coating chamber; The coating chamber, the feeding chamber and the discharging chamber are all provided with vacuum pumping components, and the connection points between the feeding chamber, the discharging chamber and the coating chamber are provided with sealing mechanisms.

2. The magnetron sputtering coating production line according to claim 1, characterized in that: It also includes a feeding mechanism, which is installed at the entrance of the feeding cabin; and / or; It also includes a material unloading mechanism, which is installed at the outlet of the material unloading cabin.

3. The magnetron sputtering coating production line according to claim 2, characterized in that: The loading mechanism and the unloading mechanism both include a lifting module and a conveying module. The conveying module is used to drive the substrate to move, and the lifting module is used to drive the substrate to reach a predetermined height.

4. The magnetron sputtering coating production line according to claim 1, characterized in that: Also included is a coating tool, which is used to fix the substrate.

5. The magnetron sputtering coating production line according to claim 4, characterized in that: The coating tooling comprises a receiving groove, the receiving groove is used to receive the substrate, and the substrate is inclined upward in the receiving groove.

6. The magnetron sputtering coating production line according to claim 1 or 5, characterized in that: The coating chamber is equipped with a magnetron sputtering coating cathode, and the magnetron sputtering coating cathode is used to coat the substrate.

7. The magnetron sputtering coating production line according to claim 6, characterized in that: The magnetron sputtering coating cathode is installed obliquely downward so that the magnetron sputtering coating cathode faces the substrate; and / or; The magnetron sputtering coating cathode can be detachably installed in the coating cabin.

8. The magnetron sputtering coating production line according to claim 7, characterized in that: It also includes a moving mechanism, the magnetron sputtering coating cathode is installed on the moving mechanism, and the moving mechanism is used to drive the magnetron sputtering coating cathode to move.

9. The magnetron sputtering coating production line according to claim 1, characterized in that: The coating chamber, the feeding chamber and the discharging chamber are all provided with a conveying mechanism inside, and the conveying mechanism is used to drive the substrate to move.

10. The magnetron sputtering coating production line according to claim 9, characterized in that: The conveying mechanism comprises a conveying module and a guide channel. The conveying mechanism is used to drive the substrate to move. The guide channel is arranged above the conveying module and is used to guide the substrate to move.

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