High-toughness composite coating preparation device

Abstract

The utility model discloses a preparation device for a high-toughness composite coating. The preparation device comprises a magnetic control chamber, a magnetic mirror magnetic field assembly, a mounting target and a magnetic control assembly, a magnetic control cavity is formed in the magnetic control chamber, and a target material is placed in the mounting target; the magnetic control assembly comprises a magnetic control sputtering source; the plurality of magnetron sputtering sources are uniformly distributed in the magnetron cavity; one side of the magnetic control cavity is communicated with a long cavity, the magnetic mirror magnetic field assembly is mounted in the middle of the long cavity, the mounting target is mounted at one end of the long cavity, and the other end of the long cavity is mounted in the magnetic control cavity between the adjacent magnetron sputtering sources; according to the utility model, the base material is deposited into the base material layer in the magnetic control cavity through the magnetic control assembly, the graphite target is vaporized into ions through the magnetic mirror magnetic field assembly, the ion flow is effectively restrained and guided through the magnetic mirror effect, and the ion flow is deposited on the base material layer in the magnetic control cavity in cooperation with the magnetic control assembly, so that the high-toughness composite coating is formed.

Description

Technical Field

[0001] The utility model relates to the technical field of coating preparation, in particular to a device for preparing a high-strength and high-toughness composite coating. Background Art

[0002] In modern industry, coating technology is widely used in fields such as tools, mechanical parts, electronic components, and aerospace to improve the hardness, wear resistance, corrosion resistance, and other properties of materials. Among them, the demand for high-strength and high-toughness coatings is increasing day by day, especially for composite coatings, which can maintain good toughness while providing high hardness, thus performing excellently under various extreme working conditions.

[0003] At present, commonly used high-strength coating materials include tetrahedral amorphous carbon (ta-C) and graphitelike carbon (GLC). These materials have excellent hardness and toughness respectively, but it is often difficult to balance hardness and toughness when used alone. For example, although the ta-C coating has high hardness, it is prone to brittle cracking; while the GLC coating has good toughness but relatively low hardness. Therefore, how to combine ta-C and GLC to form a composite coating with both high hardness and high toughness has become a research hotspot. In existing coating preparation technologies, methods such as magnetron sputtering and pulsed arc discharge are often used. However, these methods have some problems in practical applications. For example, due to the uneven distribution of plasma in traditional magnetron sputtering devices, it is easy to cause the problem of uneven coating thickness.

[0004] Therefore, it is necessary to design a device for preparing a high-strength and high-toughness composite coating to solve the above problems. Summary of the Utility Model

[0005] The utility model overcomes the deficiencies of the prior art and provides a device for preparing a high-strength and high-toughness composite coating.

[0006] To achieve the above purpose, the technical solution adopted by the utility model is: a device for preparing a high-strength and high-toughness composite coating, including: a magnetron chamber, a magnetic mirror magnetic field component, a mounting target, and a magnetron component; a magnetron cavity is arranged inside the magnetron chamber, and a target material is placed inside the mounting target;

[0007] The magnetron component includes: magnetron sputtering sources; several magnetron sputtering sources are provided and are evenly distributed inside the magnetron cavity;

[0008] One side of the magnetron cavity is communicated with a long cavity, the magnetic mirror magnetic field component is installed in the middle position of the long cavity, the mounting target is installed at one end of the long cavity, and the other end of the long cavity is installed in the magnetron cavity between adjacent magnetron sputtering sources.

[0009] In a preferred embodiment of the present utility model, the magnetron cavity is arranged in an octagonal structure. For the octagonal magnetron cavity, the lengths of every two separated faces are the same, and the lengths of every two adjacent faces are different.

[0010] In a preferred embodiment of the present utility model, the magnetic mirror magnetic field assembly includes: an iron core and coils; the iron core is installed on the outer wall of the long cavity, and a plurality of coils are provided. The plurality of coils are evenly wound around the iron core.

[0011] In a preferred embodiment of the present utility model, the plurality of coils are all connected to a power supply, with the same current direction and different current intensities.

[0012] In a preferred embodiment of the present utility model, a plurality of installation targets are provided, and they are of a cavity structure and are communicated with the long cavity.

[0013] In a preferred embodiment of the present utility model, a baffle is installed in the long cavity, and a plurality of dispersion grooves are arranged on the baffle.

[0014] In a preferred embodiment of the present utility model, the dispersion grooves include: a conical groove and an inverted conical groove; the cross section of the conical groove is in a shape that gradually narrows from large to small, and the cross section of the inverted conical groove is in a shape that gradually expands from small to large.

[0015] In a preferred embodiment of the present utility model, a heating filament is arranged at the central position of the magnetron cavity.

[0016] In a preferred embodiment of the present utility model, the magnetron cavity is of a sealed structure.

[0017] The present utility model solves the defects existing in the background technology and has the following beneficial effects:

[0018] (1) The present utility model provides a device for preparing a high-strength and tough composite coating. Through the cooperation of the magnetron chamber, the magnetic mirror magnetic field assembly, the installation target, and the magnetron assembly, the substrate is deposited into a substrate layer in the magnetron cavity by the magnetron assembly, and the graphite target is vaporized into ions by the magnetic mirror magnetic field assembly. The ion flow is effectively constrained and guided through the magnetic mirror effect. In cooperation with the magnetron assembly, the ion flow is deposited on the substrate layer inside the magnetron cavity to form a high-strength and tough composite coating.

[0019] (2) By arranging the magnetron cavity in an octagonal structure, the present utility model enables the plasma to be more evenly distributed throughout the cavity, reduces the problems of local overheating or uneven plasma, helps to form a uniform plasma distribution inside the cavity, and in cooperation with the magnetron assembly, different underlying layer materials can be evenly deposited inside the magnetron cavity, improving the sputtering efficiency of the target and the uniformity of the coating.

[0020] (3) By providing a baffle in the present utility model, and utilizing the conical grooves and reverse conical grooves on the baffle, a bidirectional dispersed ion flow can occur, avoiding the over-concentration of the ion flow in certain areas, ensuring that the ion flow evenly covers the surface of the substrate, and the conical holes can guide the ion flow to reduce the turbulence phenomenon, keeping the ion flow stable, improving the deposition uniformity. At the same time, large particles are blocked to prevent them from entering the magnetron cavity and affecting the composite coating, further improving the deposition uniformity. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] In order to more clearly illustrate the technical solutions in the embodiments of the present utility model or the prior art, the following will briefly introduce the drawings required for use in the description of the embodiments or the prior art. Obviously, the drawings in the following description are only some embodiments recorded in the present utility model. For those of ordinary skill in the art, without creative efforts, other drawings can also be obtained based on these drawings.

[0022] Figure 1 is a three-dimensional structural diagram of the preferred embodiment of the present utility model;

[0023] Figure 2 is a front view schematic diagram of the preferred embodiment of the present utility model;

[0024] Figure 3 is a top view schematic diagram of the internal structure of the preferred embodiment of the present utility model;

[0025] Figure 4 is a schematic diagram of the baffle structure of the preferred embodiment of the present utility model;

[0026] In the figure: 1, magnetron chamber; 2, mounting target; 3, magnetron cavity; 4, magnetron sputtering source; 5, long cavity; 6, iron core; 7, coil; 8, baffle; 9, conical groove; 10, reverse conical groove; 11, heating filament. DETAILED DESCRIPTION OF THE EMBODIMENTS

[0027] The following will clearly and completely describe the technical solutions in the embodiments of the present utility model with reference to the drawings in the embodiments of the present utility model. Obviously, the described embodiments are only a part of the embodiments of the present utility model, rather than all of the embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative efforts belong to the scope of protection of the present utility model.

[0028] In the following description, many specific details are set forth in order to fully understand the present utility model, but the present utility model can also be implemented in other ways different from those described herein. Therefore, the scope of protection of the present utility model is not limited by the specific embodiments disclosed below.

[0029] In the description of this application, it should be understood that the orientation or positional relationships indicated by the terms "center", "longitudinal", "transverse", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", etc. are based on the orientation or positional relationships shown in the drawings. These are only for the convenience of describing this application and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation. Therefore, it should not be construed as a limitation on the protection scope of this application. In addition, terms such as "first", "second", etc. are only used for descriptive purposes and cannot be understood as indicating or implying relative importance or implicitly specifying the quantity of the indicated technical features. Therefore, features defined with "first", "second", etc. may explicitly or implicitly include one or more of such features. In the description of the creation of this utility model, unless otherwise stated, the meaning of "a plurality" is two or more.

[0030] In the description of this application, it should be noted that unless otherwise clearly specified and limited, the terms "installed", "connected", "connected to" should be understood in a broad sense. For example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be directly connected or indirectly connected through an intermediate medium, and it can be the communication inside two elements. For those of ordinary skill in the art, the specific meanings of the above terms in this application can be understood through specific circumstances.

[0031] As Figure 1 、 Figure 2 and Figure 3 shown, a device for preparing a high-strength and tough composite coating includes: a magnetron chamber 1, a magnetic mirror magnetic field component, a mounting target 2, and a magnetron component; a magnetron cavity 3 is arranged inside the magnetron chamber 1. The magnetron cavity 3 is arranged in an octagonal structure. The lengths of every two separated faces of the octagonal magnetron cavity 3 are the same, and the lengths of every two adjacent faces are different, so that the plasma can be more evenly distributed in the whole cavity, reducing problems such as local overheating or uneven plasma, and helping to form a uniform plasma distribution inside the cavity;

[0032] The magnetron cavity 3 is a sealed structure, which is convenient for subsequent vacuum treatment of the magnetron cavity 3. That is, a vacuum pump is arranged on one side of the magnetron cavity 3, and the inside of the magnetron cavity 3 is evacuated through the vacuum pump;

[0033] The mounting target 2 contains a target material inside;

[0034] The magnetron component includes: a magnetron sputtering source 4; several magnetron sputtering sources 4 are provided and are evenly distributed inside the magnetron cavity 3;

[0035] One side of the magnetron cavity 3 is connected to a long cavity 5. The magnet mirror magnetic field assembly is installed in the middle of the long cavity 5. The mounting target 2 is installed at one end of the long cavity 5, and the other end of the long cavity 5 is installed in the magnetron cavity 3 between adjacent magnetron sputtering sources 4.

[0036] The magnetron sputtering source 4 is specifically a magnetron sputtering instrument, and a substrate is placed in each magnetron sputtering source 4. Among them, the substrate includes one of Cr, Cr+WC, Zr, Cr+CrN+CrCN; a graphite target is installed on the mounting target 2.

[0037] Through vacuum treatment of the magnetron cavity 3 and adjusting the parameters of the magnetron sputtering source 4, the substrate in the magnetron sputtering source 4 is evenly distributed in the magnetron cavity 3 to form a substrate layer. Pulse arc discharge is carried out on the graphite target on the mounting target 2 through the magnet mirror magnetic field assembly to generate C+ ions with a high ionization rate, and the C+ ion flow is constrained and guided through the magnetic mirror effect generated by the magnet mirror magnetic field assembly and enters the magnetron cavity 3 to be deposited on the substrate layer to form a high-strength and tough GLC / ta-C composite coating.

[0038] In the present utility model, the magnet mirror magnetic field assembly includes: an iron core 6 and a coil 7; the iron core 6 is installed on the outer wall of the long cavity 5, and several coils 7 are provided. Several coils 7 are evenly wound around the iron core 6; several coils 7 are all connected to a power supply, the current directions are the same, and the current intensities are different.

[0039] An electrode is installed inside the long cavity 5, and a voltage is applied through a power supply to form an electric field to initiate pulse arc discharge. The coil 7 is specifically a copper coil 7. The several coils 7 are energized to control the current intensity to generate magnetic fields of different intensities to form a magnetic mirror effect, which can effectively constrain and guide the C+ ion flow, and cooperate with the magnetron assembly to deposit the C+ ion flow on the substrate layer inside the magnetron cavity 3.

[0040] In the present utility model, several mounting targets 2 are provided and are of a cavity structure and are communicated with the long cavity 5.

[0041] As Figure 4 shown, in the present utility model, a baffle 8 is installed in the long cavity 5, and several dispersion grooves are provided on the baffle 8; the dispersion grooves include: a tapered groove 9 and a reverse tapered groove 10; the cross section of the tapered groove 9 is in a shape that gradually narrows from large to small, and the cross section of the reverse tapered groove 10 is in a shape that gradually expands from small to large.

[0042] During the guiding of the formed C+ ion flow towards the magnetron cavity 3, the C+ ion flow is guided through the dispersion grooves on the baffle 8, making the flow of the C+ ion flow more orderly, preventing particles in the gas flow from aggregating in a specific area, thereby promoting more uniform coating deposition. At the same time, it can block the particles generated by the graphite target and avoid large particles from entering the magnetron cavity 3 and affecting the composite coating, further improving the deposition uniformity.

[0043] In the present utility model, a heating filament 11 is disposed at the central position of the magnetron cavity 3. The interior of the magnetron cavity 3 is heated by the heating filament 11, so as to enable chemical bonding between the enhanced coating material and the substrate, thereby improving the adhesion of the coating and contributing to the formation of a more uniform and dense coating.

[0044] When the present utility model is in use, the magnetron cavity 3 is subjected to vacuum treatment, and the parameters of the magnetron sputtering source 4 are adjusted, so that the substrates in the magnetron sputtering source 4 are evenly distributed in the magnetron cavity 3 to form a substrate layer. Pulse arc discharge is carried out on the graphite target on the mounting target 2 through the magnetic mirror magnetic field assembly to generate C+ ions with a high ionization rate, and the magnetic mirror effect generated by the magnetic mirror magnetic field assembly is used to constrain and guide the C+ ion flow, and the C+ ion flow enters the magnetron cavity 3 and is deposited on the substrate layer to form a high-strength and tough GLC / ta-C composite coating.

[0045] Based on the ideal embodiments of the present utility model as the inspiration, through the above description, relevant personnel can completely make various changes and modifications within the scope not deviating from the technical idea of this utility model. The technical scope of this utility model is not limited to the content in the specification, and the technical scope must be determined according to the scope of the claims.

Claims

1. A high-strength and tough composite coating preparation device, comprising: A magneto control chamber (1), a magnetic mirror magnetic field assembly, a mounting target (2), and a magneto control assembly; characterized in that a magneto control cavity (3) is arranged inside the magneto control chamber (1), and a target material is placed inside the mounting target (2); The magnetron assembly comprises: a magnetron sputtering source (4); a plurality of the magnetron sputtering sources (4) are provided and are evenly distributed inside the magnetron cavity (3); One side of the magnetron cavity (3) is connected to a long cavity (5), the magnetic mirror magnetic field assembly is installed in the middle of the long cavity (5), the mounting target (2) is installed at one end of the long cavity (5), and the other end of the long cavity (5) is installed in the magnetron cavity (3) between adjacent magnetron sputtering sources (4).

2. The high-strength and tough composite coating preparation device according to claim 1, characterized in that: The magnetron cavity (3) is arranged in an octagonal structure, and each two separated faces of the octagonal magnetron cavity (3) have the same length, and each two adjacent faces have different lengths.

3. The high-strength and tough composite coating preparation device according to claim 1, characterized in that: The magnetic mirror magnetic field assembly comprises: an iron core (6) and a coil (7); the iron core (6) is mounted on the outer wall of the long cavity (5), and a plurality of coils (7) are provided, and the plurality of coils (7) are evenly wound on the iron core (6).

4. The high-strength and tough composite coating preparation device according to claim 3, characterized in that: The plurality of coils (7) are all connected to a power source, with current directions being the same but current intensities being different.

5. The high-strength and tough composite coating preparation device according to claim 1, characterized in that: The mounting targets (2) are provided with a plurality of hollow structures and are connected to the long cavity (5).

6. The high-strength and tough composite coating preparation device according to claim 1, characterized in that: A baffle (8) is installed in the long cavity (5), and a plurality of dispersion grooves are arranged on the baffle (8).

7. The high-strength and toughness composite coating preparation device according to claim 6, characterized in that: The dispersion groove comprises: a conical groove (9) and an inverse conical groove (10); the cross section of the conical groove (9) is in a shape that gradually narrows from large to small, and the cross section of the inverse conical groove (10) is in a shape that gradually expands from small to large.

8. The high-strength and tough composite coating preparation device according to claim 1, characterized in that: A heating filament (11) is arranged at the center of the magnetron cavity (3).

9. The high-strength and tough composite coating preparation device according to claim 1, characterized in that: The magnetron cavity (3) is a sealed structure.

Images