Plate feeding frame structure of photoetching machine

Abstract

The utility model provides an upper plate frame structure of a photoetching machine, which relates to the technical field of upper plate frames of photoetching machines and comprises a plate frame body, a vacuum cavity is arranged on the inner surface of the plate frame body, a plurality of first adsorption holes are uniformly formed in the inner top of the vacuum cavity, and joints are symmetrically and fixedly connected to the outer surface of the plate frame body. According to the mask adsorption device, under the cooperation of the limiting block, the first adsorption hole, the second adsorption hole, the vacuum cavity, the connecting pipes, the gas collecting pipe, the vacuum pump, the gas outlet pipe and the adsorption plate, vacuum adsorption can be conducted on the mask, the vacuum cavity can be separated through the partition plate, and therefore adsorption can be conducted through the two connecting pipes at the same time; according to the mask plate vacuum adsorption device, uniform distribution of negative pressure in the vacuum cavity can be kept, so that the adsorption uniformity and stability are improved, through vacuum adsorption of the mask plate, disassembly and assembly are convenient, direct contact with the surface of the mask plate is not needed, the risks of scratches and deformation are avoided, and the integrity of the mask plate is protected.

Description

Technical Field

[0001] The utility model relates to the technical field of a mask loading rack of a lithography machine, in particular to a mask loading rack structure of a lithography machine. Background Art

[0002] During the production process of a mask, it is necessary to send the mask to a lithography machine for processing. Basically, existing lithography machines are equipped with corresponding mask loading racks to facilitate the loading and unloading of masks.

[0003] In the prior art, as disclosed in the Chinese patent: CN205620672U, a mask loading rack of a lithography machine includes: a bottom plate, at least two guide rails parallelly arranged on the top surface of the bottom plate, sliders slidably placed on the guide rails, a connecting plate detachably locked on the top surface of the slider, a raw material loading platform detachably and fixedly connected to the connecting plate, and a stop block provided at one end close to the guide rail for limiting the stroke range of the connecting plate moving with the slider. The mask loading rack of the lithography machine includes at least two alternative connecting plates, and the widths of the connecting plates in the length direction of the guide rail are different. The mask loading rack of the lithography machine of the utility model can be applicable to mask products of different specifications only by flexibly replacing one component, namely the connecting plate. By arranging multiple sets of connecting plates, a lithography machine can be applicable to the processing of mask products of multiple specifications, which can effectively reduce the equipment cost, and the disassembly, assembly and adjustment are flexible and convenient, which can effectively improve the processing efficiency.

[0004] In the above patent, it can process mask products of multiple specifications, effectively reduce the equipment cost, and the disassembly, assembly and adjustment are flexible and convenient. However, when fixing the mask, the traditional mechanical clamping method is adopted, which not only makes the disassembly and assembly of the mask inconvenient, but also causes damage to the mask, such as scratches and deformation. These damages will affect the pattern transfer quality. Summary of the Utility Model

[0005] The purpose of the utility model is to solve the problem that in the above patent, it can process mask products of multiple specifications, effectively reduce the equipment cost, and the disassembly, assembly and adjustment are flexible and convenient. However, when fixing the mask, the traditional mechanical clamping method is adopted, which not only makes the disassembly and assembly of the mask inconvenient, but also causes damage to the mask, such as scratches and deformation. These damages will affect the pattern transfer quality, and a mask loading rack structure of a lithography machine is proposed.

[0006] To achieve the above object, the present utility model adopts the following technical solution: An upper plate frame structure of a lithography machine, comprising: a plate frame body, a vacuum chamber is provided on the inner surface of the plate frame body, a plurality of first adsorption holes are evenly opened at the inner top of the vacuum chamber, connectors are symmetrically and fixedly connected to the outer surface of the plate frame body, one ends of the two connectors are fixedly connected with connecting pipes, a gas collecting pipe is fixedly connected between the ends of the two connecting pipes away from the connectors, an air outlet pipe is fixedly connected to the outer surface of the gas collecting pipe, one end of the air outlet pipe away from the gas collecting pipe is fixedly connected with a vacuum pump, and partitions are symmetrically and fixedly connected to the inner surface of the vacuum chamber.

[0007] Preferably, a plurality of limiting blocks are equidistantly and fixedly connected to the top of the plate frame body, and the tops of the plurality of limiting blocks are all arc-shaped.

[0008] Preferably, an adsorption plate is fixedly connected to the center position of the top of the plate frame body, and a plurality of second adsorption holes are evenly opened on the top of the adsorption plate.

[0009] Preferably, the plurality of first adsorption holes and the plurality of second adsorption holes are in communication with each other, and the outer surface of the adsorption plate and the inner surfaces of the plurality of limiting blocks are in a matching setting.

[0010] Preferably, a mask plate is arranged between the inner surfaces of the plurality of limiting blocks, and the two connectors are in communication with the vacuum chamber.

[0011] Preferably, clamping blocks are symmetrically and fixedly connected to the outer surfaces on both sides of the plate frame body, and the inner surfaces of the plurality of clamping blocks are respectively in a matching setting with the outer surfaces of the two connecting pipes.

[0012] Preferably, a plurality of arc-shaped grooves are opened near the edge of the top of the adsorption plate, and the bottom of the mask plate is in a fitting setting with the top of the adsorption plate.

[0013] Compared with the prior art, the advantages and positive effects of the present utility model are as follows.

[0014] 1. In the present utility model, through the cooperation of the limiting blocks, the first adsorption holes, the second adsorption holes, the vacuum chamber, the connecting pipes, the gas collecting pipe, the vacuum pump, the air outlet pipe and the adsorption plate, the mask plate can be vacuum-adsorbed, and the vacuum chamber can be partitioned by the partition plates, so that the two connecting pipes can adsorb simultaneously, which helps to maintain the uniform distribution of the negative pressure in the vacuum chamber, thereby improving the uniformity and stability of the adsorption. By vacuum-adsorbing the mask plate, it is not only convenient to disassemble and assemble, but also does not need to directly contact the surface of the mask plate, avoiding the risk of scratches and deformation, and protecting the integrity of the mask plate.

[0015] 2. In the present utility model, when the mask plate is removed, through the arc-shaped grooves opened on the adsorption plate, it is convenient for the staff to take the mask plate, further improving the convenience of disassembling the mask plate. Brief Description of the Drawings

[0016] Figure 1 FIG. 1 is a perspective view of a structure of a mask carrier for a lithography machine according to the present utility model;

[0017] Figure 2 FIG. 2 is a cross-sectional view of a structure of a mask carrier for a lithography machine according to the present utility model;

[0018] Figure 3 FIG. 3 is an exploded view of a structure of a mask carrier for a lithography machine according to the present utility model;

[0019] Figure 4 FIG. 4 is a schematic diagram of an adsorption plate structure of a structure of a mask carrier for a lithography machine according to the present utility model.

[0020] Legend: 1. Plate frame body; 2. Mask plate; 3. Limit block; 4. Adsorption plate; 5. Connector; 6. Connecting pipe; 7. Gas collecting pipe; 8. Vacuum pump; 9. Exhaust pipe; 10. Block; 11. Vacuum chamber; 12. Partition board; 13. First adsorption hole; 14. Arc groove; 15. Second adsorption hole. Detailed Description of the Embodiments

[0021] In order to more clearly understand the above objects, features and advantages of the present utility model, the present utility model will be further described below with reference to the accompanying drawings and embodiments. It should be noted that, without conflict, the embodiments of the present application and the features in the embodiments may be combined with each other.

[0022] In the following description, many specific details are set forth in order to fully understand the present utility model. However, the present utility model may be implemented in other ways different from those described herein. Therefore, the present utility model is not limited by the specific embodiments disclosed in the following specification.

[0023] Embodiment 1, as Figures 1 - 4As shown in the figure, the present utility model provides a loading rack structure for a lithography machine, including: a rack body 1, a vacuum chamber 11 is arranged on the inner surface of the rack body 1, a plurality of first adsorption holes 13 are evenly opened at the inner top of the vacuum chamber 11, joints 5 are symmetrically and fixedly connected to the outer surface of the rack body 1, one ends of the two joints 5 are fixedly connected with connecting pipes 6 respectively, a gas collecting pipe 7 is fixedly connected between the ends of the two connecting pipes 6 far away from the joints 5, an air outlet pipe 9 is fixedly connected to the outer surface of the gas collecting pipe 7, one end of the air outlet pipe 9 far away from the gas collecting pipe 7 is fixedly connected with a vacuum pump 8, partition plates 12 are symmetrically and fixedly connected to the inner surface of the vacuum chamber 11, a plurality of limiting blocks 3 are equidistantly and fixedly connected to the top of the rack body 1, the tops of the plurality of limiting blocks 3 are all arranged in an arc shape, an adsorption plate 4 is fixedly connected to the center position of the top of the rack body 1, a plurality of second adsorption holes 15 are evenly opened at the top of the adsorption plate 4, the plurality of first adsorption holes 13 are respectively communicated with the plurality of second adsorption holes 15, the outer surface of the adsorption plate 4 is matched with the inner surfaces of the plurality of limiting blocks 3, a mask plate 2 is arranged between the inner surfaces of the plurality of limiting blocks 3, and the two joints 5 are communicated with the vacuum chamber 11.

[0024] The effect achieved by the entire embodiment 1 is that when fixing the mask plate 2, the mask plate 2 is positioned and placed along the limiting blocks 3. Through the arc-shaped setting of the limiting blocks 3, the positioning of the mask plate 2 can be better guided, so that the bottom of the mask plate 2 is completely attached to the top of the adsorption plate 4. Then, the vacuum pump 8 is started, and the air inside the two connecting pipes 6 is extracted through the air outlet pipe 9 and the gas collecting pipe 7. Then, the air inside the vacuum chamber 11 is extracted through the joints 5 to form a negative pressure. As the negative pressure inside the vacuum chamber 11 gradually increases, the air inside the first adsorption holes 13 and the second adsorption holes 15 is extracted to form an adsorption force. These adsorption forces act on the bottom of the mask plate 2 through the adsorption plate 4 and firmly adsorb it on the rack body 1. During the adsorption process, through the setting of the partition plates 12, the vacuum chamber 11 is divided into two parts, so that adsorption is carried out simultaneously through the two connecting pipes 6, which helps to maintain the uniform distribution of the negative pressure inside the vacuum chamber 11, thereby improving the uniformity and stability of adsorption. Thus, through the vacuum adsorption of the mask plate 2, there is no need to directly contact the surface of the mask plate 2, thereby avoiding the risk of scratches and deformation and protecting the integrity of the mask plate 2. At the same time, when disassembling the mask plate 2, only need to turn off the vacuum pump 8, stop extracting the air inside the vacuum chamber 11, and wait for a period of time for the air pressure inside the vacuum chamber 11 to gradually return to the atmospheric pressure level, then the mask plate 2 can be removed from the adsorption plate 4, and the disassembly and assembly are convenient.

[0025] Embodiment 2, as Figures 1 - 4 shown, a plurality of arc-shaped grooves 14 are opened at the top of the adsorption plate 4 near the edge, the bottom of the mask plate 2 is attached to the top of the adsorption plate 4, and clamping blocks 10 are symmetrically and fixedly connected to the outer surfaces of both sides of the rack body 1, and the inner surfaces of the plurality of clamping blocks 10 are respectively matched with the outer surfaces of the two connecting pipes 6.

[0026] The effect achieved by the entire Embodiment 2 is that when removing the mask plate, through the arc-shaped groove 14 formed on the adsorption plate 4, it is convenient for the staff to take the mask plate 2, further improving the convenience of disassembling the mask plate 2. At the same time, through the setting of the clamping block 10, the connecting pipe 6 can be fixed to ensure the aesthetic appearance of the device.

[0027] Working principle: When fixing the mask plate 2, place the mask plate 2 along the limiting block 3 for positioning. Through the arc-shaped setting of the limiting block 3, it can better guide the positioning of the mask plate 2, so that the bottom of the mask plate 2 is completely attached to the top of the adsorption plate 4. Then start the vacuum pump 8, and extract the air inside the two connecting pipes 6 through the air outlet pipe 9 and the collecting pipe 7, and then extract the air inside the vacuum chamber 11 to form a negative pressure. As the negative pressure inside the vacuum chamber 11 gradually increases, the air inside the first adsorption holes 13 and the second adsorption holes 15 is extracted to form an adsorption force. These adsorption forces act on the bottom of the mask plate 2 through the adsorption plate 4 to firmly adsorb it on the plate frame body 1. During the adsorption process, through the setting of the partition plate 12, the vacuum chamber 11 is divided into two, so that adsorption is carried out simultaneously through the two connecting pipes 6, which helps to maintain the uniform distribution of the negative pressure inside the vacuum chamber 11, thereby improving the uniformity and stability of adsorption. Thus, through the vacuum adsorption of the mask plate 2, there is no need to directly contact the surface of the mask plate 2, thereby avoiding the risk of scratches and deformation and protecting the integrity of the mask plate 2. At the same time, when disassembling the mask plate 2, only need to turn off the vacuum pump 8, stop extracting the air inside the vacuum chamber 11, and wait for a period of time for the air pressure inside the vacuum chamber 11 to gradually return to the atmospheric pressure level. Through the arc-shaped groove 14 formed on the adsorption plate 4, it is convenient for the staff to take the mask plate 2, and then remove the mask plate 2 from the adsorption plate 4, and the disassembly and assembly are convenient.

[0028] The wiring diagram of the vacuum pump 8 in the present utility model belongs to the common knowledge in the field. Its working principle is a known technology, and its model is selected according to the actual use. Therefore, the control method and wiring layout of the vacuum pump 8 will not be explained in detail.

[0029] The above is only the preferred embodiment of the present utility model, and it does not limit the present utility model in other forms. Any person skilled in the art may use the disclosed technical content to make changes or modifications into equivalent embodiments with equivalent changes and apply them to other fields. However, as long as it does not depart from the technical solution content of the present utility model, any simple modification, equivalent change and modification made to the above embodiments based on the technical essence of the present utility model still belong to the protection scope of the technical solution of the present utility model.

Claims

1. A plate holder structure for a photolithography machine, characterized in that: include: A plate frame body (1), wherein a vacuum cavity (11) is arranged on the inner surface of the plate frame body (1), a plurality of first adsorption holes (13) are evenly arranged on the inner top of the vacuum cavity (11), a joint (5) is symmetrically fixedly connected to the outer surface of the plate frame body (1), one end of each of the two joints (5) is fixedly connected to a connecting pipe (6), an air collecting pipe (7) is fixedly connected between the ends of the two connecting pipes (6) away from the joint (5), an air outlet pipe (9) is fixedly connected to the outer surface of the air collecting pipe (7), and an end of the air outlet pipe (9) away from the air collecting pipe (7) is fixedly connected to a vacuum pump (8), and a partition plate (12) is symmetrically fixedly connected to the inner surface of the vacuum cavity (11).

2. The plate holder structure of the photolithography machine according to claim 1, characterized in that: A plurality of limit blocks (3) are fixedly connected to the top of the plate frame body (1) at equal intervals, and the tops of the plurality of limit blocks (3) are all arranged in the shape of circular arcs.

3. The plate holder structure of the photolithography machine according to claim 2, characterized in that: A suction plate (4) is fixedly connected to the center position of the top of the plate frame body (1), and a plurality of second suction holes (15) are evenly arranged on the top of the suction plate (4).

4. The plate holder structure of the photolithography machine according to claim 3, characterized in that: The plurality of first adsorption holes (13) are respectively connected to the plurality of second adsorption holes (15), and the outer surface of the adsorption plate (4) is matched with the inner surfaces of the plurality of limit blocks (3).

5. The plate holder structure of the photolithography machine according to claim 4, characterized in that: A mask plate (2) is arranged between the inner surfaces of the plurality of limit blocks (3), and the two joints (5) are arranged in communication with the vacuum chamber (11).

6. The plate holder structure of the photolithography machine according to claim 5, characterized in that: Blocks (10) are symmetrically and fixedly connected to the outer surfaces of both sides of the plate frame body (1), and the inner surfaces of the plurality of blocks (10) are respectively matched with the outer surfaces of the two connecting pipes (6).

7. The plate holder structure of the photolithography machine according to claim 6, characterized in that: A plurality of arc-shaped grooves (14) are provided on the top of the adsorption plate (4) near the edge, and the bottom of the mask plate (2) is arranged to fit the top of the adsorption plate (4).

Images