Shell assembly, plasma generation device and plasma processing equipment

Abstract

The utility model discloses a shell assembly, a plasma generating device and plasma processing equipment, and relates to the technical field of plasma processing, the shell assembly is applied to the plasma generating device, the plasma generating device comprises the shell assembly, a diffusion assembly and an ionization assembly, and the ionization assembly comprises an electrode assembly. The electrode assembly is used for ionizing process gas to generate plasma, the diffusion assembly is used for diffusing the process gas before and / or after ionization, the shell assembly comprises a first shell and a second shell, a first channel is formed in the first shell, a second channel is formed in the second shell, and the first shell is detachably connected with the second shell; the first channel and the second channel are communicated to form the airflow channel, the ionization assembly and the diffusion assembly are installed on the first shell and the second shell, the two shells can be rapidly disassembled and assembled so that internal parts can be conveniently maintained or replaced, a modular structure is formed, and the disassembly and assembly difficulty of the plasma generation device is reduced.

Description

Technical Field

[0001] The utility model relates to the technical field of plasma processing, in particular to a shell component, a plasma generating device and plasma processing equipment. Background Art

[0002] Plasma processing equipment generally includes a plasma generating device and a plasma treating device. The plasma treating device has a reaction chamber for placing circuit boards or wafers. The process gas is transported to the plasma generating device for ionization to generate plasma, and the plasma is allowed to enter the reaction chamber of the plasma treating device to etch / clean / deposit the circuit boards or wafers to form the desired components.

[0003] Current plasma generating devices generally include a shell and an electrode assembly and a diffusion assembly arranged inside the shell, which are used to ionize and diffuse the process gas. In conventional schemes, the process gas before and / or after ionization is generally diffused by the diffusion assembly. When meeting different diffusion requirements, the diffusion plates are increased or decreased according to the actual situation. When repairing and replacing the components in the shell, the electrode assembly and / or the diffusion assembly need to be disassembled. The steps are complicated and repetitive, which affects the processing efficiency. Utility Model Content

[0004] The main purpose of the utility model is to provide a shell component, a plasma generating device and a plasma processing device, aiming to improve the problem of troublesome assembly and disassembly of components of the plasma generating device.

[0005] To achieve the above-mentioned purpose, the housing assembly proposed in the utility model is applied to a plasma generating device, wherein the plasma generating device comprises a diffusion assembly for diffusing a process gas and an ionization assembly for ionizing the process gas to generate plasma, wherein the ionization assembly comprises an electrode assembly, and the housing assembly comprises:

[0006] a first housing, wherein the first housing is formed with a first passage;

[0007] A second shell, wherein the second shell is formed with a second channel, the first shell and the second shell are detachably connected, and the first channel and the second channel are connected to form an air flow channel;

[0008] The first shell and the second shell are used for installing the diffusion assembly and the electrode assembly, and the gas flow channel is used for flowing process gas processed by the diffusion assembly and the electrode assembly.

[0009] In one embodiment, an electrode mounting groove is provided in the first shell and / or the second shell, the electrode mounting groove is communicated with the air flow channel, and the electrode mounting groove is used for mounting the electrode assembly.

[0010] In one embodiment, the gas flow channel includes an air inlet and an air outlet. The air inlet is arranged on the first housing, and the air outlet is arranged on the second housing. The air outlet of the gas flow channel is used to dock with the reaction chamber of the plasma processing device to supply plasma to the reaction chamber. The electrode mounting groove is arranged in the second housing and is communicated with the gas flow channel.

[0011] In one embodiment, the electrode mounting groove includes a first electrode mounting groove and a second electrode mounting groove. The first electrode mounting groove and the second electrode mounting groove are arranged at intervals on both sides of the gas flow channel. The electrode assembly includes a first electrode and a second electrode. The first electrode mounting groove is used to mount the first electrode, and the second electrode mounting groove is used to mount the second electrode.

[0012] In one embodiment, the housing assembly further includes a first sealing member. The first housing has a first abutting surface, and the second housing has a second abutting surface. The first abutting surface and the second abutting surface abut against each other. A limiting portion is provided on one of the first abutting surface and the second abutting surface, and the first sealing member is arranged at the limiting portion and abuts against the other one of the first abutting surface and the second abutting surface.

[0013] Alternatively, a limiting portion is provided on one of the first abutting surface and the second abutting surface, and a mating portion is provided on the other one. The limiting portion and the mating portion are in limiting cooperation, and the first sealing member is arranged between the limiting portion and the mating portion.

[0014] In one embodiment, the housing assembly further includes an end cover assembly. The end cover assembly includes a first end cover and a second sealing member. The first end cover is provided with a mounting hole communicated with the electrode mounting groove of the second housing. The first end cover is connected to the second housing. The second sealing member is arranged in a ring shape, and the second sealing member is arranged between the first end cover and the second housing to seal the gap between the first end cover and the second housing.

[0015] In one embodiment, the end cover assembly further includes a third sealing member. A mounting groove is provided on the inner wall of the mounting hole, and the third sealing member is arranged in the mounting groove and abuts and seals against the electrode assembly.

[0016] The present utility model also provides a plasma generating device, which includes a diffusion component, an ionization component, and the housing assembly in any one of the foregoing embodiments. The ionization component includes an electrode assembly. The diffusion component and the electrode assembly are arranged in the gas flow channel, and the diffusion component is used to diffuse the process gas before and / or after ionization.

[0017] In one embodiment, the electrode assembly includes a first electrode and a second electrode, and the ionization assembly further includes a power supply module. The power supply module is electrically connected to the first electrode and the second electrode respectively, and is configured to periodically change the power supply polarities output to the first electrode and the second electrode.

[0018] And / or, the diffusion assembly includes a first diffusion plate, a second diffusion plate, and a third diffusion plate. The first diffusion plate and the second diffusion plate are disposed in the first channel, and the third diffusion plate is disposed in the second channel.

[0019] The present utility model further provides a plasma processing apparatus, which includes a plasma processing device and the plasma generating device in any of the foregoing embodiments. The plasma processing device has a reaction chamber, and the gas outlet of the gas flow channel is docked with the reaction chamber.

[0020] The technical solution of the present utility model is to install the electrode assembly and the diffusion assembly by using a housing assembly, so that the plasma generating device forms a modular structure for easy disassembly and assembly of components. Specifically, the housing assembly is applied to the plasma generating device. The plasma generating device includes a diffusion assembly and an ionization assembly. The ionization assembly includes an electrode assembly for ionizing a process gas to generate plasma, and the diffusion assembly is configured to diffuse the process gas before and / or after ionization. The housing assembly includes a first housing and a second housing. A first channel is formed in the first housing, and a second channel is formed in the second housing. The first housing and the second housing are detachably connected, so that the first channel and the second channel are communicated to form a gas flow channel for introducing the process gas. The first housing and the second housing are also used for installing the diffusion assembly and the electrode assembly, and the electrode assembly and the diffusion assembly process the process gas flowing through the gas flow channel.

[0021] It should be noted that the first housing and the second housing are used for installing the diffusion assembly and the electrode assembly. It can be selected to install the diffusion assembly on the first housing and located in the first channel, install the electrode assembly on the second housing and located in the second channel, and then cover the first housing on the second housing to communicate the first channel and the second channel to form a gas flow channel. The process gas diffuses through the diffusion assembly from the first channel and then enters the second channel, and is then ionized by the electrode assembly to generate plasma. As can be seen from the above, the first housing and the diffusion assembly can form an independent diffusion module, and the second housing and the electrode assembly can form an independent ionization module. The first housing and the second housing are detachably connected, so that the two housings can be quickly disassembled and assembled, and the internal components can be repaired or replaced, forming a modular structure and reducing the disassembly and assembly difficulty of the plasma generating device. Of course, the diffusion assembly can also be disposed in the second housing, and the electrode assembly can be disposed in the first housing, which is not specifically limited herein. Description of the Drawings

[0022] To more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the following will briefly introduce the drawings required for use in the description of the embodiments or the prior art. Obviously, the drawings in the following description are only some embodiments of the present invention. For those of ordinary skill in the art, without creative efforts, other drawings can be obtained based on the structures shown in these drawings.

[0023] Figure 1 Structural schematic diagram of a housing assembly in an embodiment of the present invention;

[0024] Figure 2 For Figure 1 Exploded view of the housing assembly in

[0025] Figure 3 Partial structural schematic diagram of a housing assembly in an embodiment of the present invention;

[0026] Figure 4 Partial structural schematic diagram of a housing assembly in an embodiment of the present invention;

[0027] Figure 5 Structural schematic diagram of a plasma generating device in an embodiment of the present invention;

[0028] Figure 6 For Figure 5 Exploded view of the plasma generating device in

[0029] Figure 7 For Figure 5 Cross-sectional view in the A-A direction in

[0030] Figure 8 For Figure 7 Partial cross-sectional view in the B-B direction in

[0031] Explanation of the reference numerals in the drawings:

[0032] 100, housing assembly; 110, first housing; 111, first channel; 112, first abutting surface; 112a, limiting portion; 113, through hole; 120, second housing; 121, second channel; 122, second abutting surface; 123, annular groove; 124, threaded hole; 130, air flow channel; 131, air inlet; 132, air outlet; 140, electrode mounting groove; 141, first electrode mounting groove; 142, second electrode mounting groove; 150, first sealing member; 160, end cover assembly; 161, first end cover; 161a, mounting hole; 161b, limiting groove; 162, second sealing member; 163, third sealing member.

[0033] 200. Plasma generating device; 210. Diffusion component; 211. First diffusion plate; 212. Second diffusion plate; 213. Third diffusion plate; 214. Screw; 220. Electrode component; 221. First electrode; 222. Second electrode; 223. Insulating sleeve.

[0034] The realization of the purpose, functional features and advantages of the present utility model will be further described with reference to the embodiments and the accompanying drawings. Detailed implementation manners

[0035] Next, the technical solutions in the embodiments of the present utility model will be clearly and completely described with reference to the accompanying drawings in the embodiments of the present utility model. Obviously, the described embodiments are only a part of the embodiments of the present utility model, rather than all of the embodiments. All other embodiments obtained by those of ordinary skill in the art based on the embodiments of the present utility model without creative efforts shall fall within the protection scope of the present utility model.

[0036] It should be noted that if there are directional indications (such as up, down, left, right, front, back,...) involved in the embodiments of the present utility model, the directional indications are only used to explain the relative positional relationship and movement conditions between components in a specific posture. If the specific posture changes, the directional indications will also change accordingly.

[0037] In addition, if there are descriptions such as "first" and "second" involved in the embodiments of the present utility model, the descriptions of "first" and "second" are only for descriptive purposes and cannot be understood as indicating or implying their relative importance or implicitly indicating the quantity of the indicated technical features. Thus, the features defined with "first" and "second" may explicitly or implicitly include at least one of such features. In addition, if "and / or" or "and / or" appears throughout the text, its meaning includes three parallel solutions. Taking "A and / or B" as an example, it includes solution A, solution B, or the solution where A and B are satisfied simultaneously. In addition, the technical solutions between the embodiments can be combined with each other, but it must be based on the fact that those of ordinary skill in the art can implement them. When the combination of technical solutions is contradictory or cannot be implemented, it should be considered that such a combination of technical solutions does not exist and is not within the protection scope required by the present utility model.

[0038] The present utility model provides a housing assembly 100.

[0039] Please refer to Figures 1 to 4 , in an embodiment of the present utility model, the housing assembly 100 is applied to a plasma generating device 200. Please refer to Figure 6 and Figure 7, the plasma generating device 200 includes a diffusion component 210 and an ionization component. The ionization component includes an electrode assembly 220 which is used to ionize the process gas to generate plasma, and the diffusion component 210 is used to diffuse the process gas before and / or after ionization. The housing assembly 100 includes a first housing 110 and a second housing 120. A first channel 111 is formed in the first housing 110, and a second channel 121 is formed in the second housing 120. The first housing 110 and the second housing 120 are detachably connected so that the first channel 111 and the second channel 121 communicate to form an air flow channel 130. The air flow channel 130 is used to access the process gas. The first housing 110 and the second housing 120 are also used for installing the diffusion component 210 and the electrode assembly 220. The electrode assembly 220 and the diffusion component 210 process the process gas flowing through the air flow channel 130.

[0040] It should be noted that the first housing 110 and the second housing 120 are used for installing the diffusion component 210 and the electrode assembly 220. It can be selected to install the diffusion component 210 on the first housing 110 and inside the first channel 111, install the electrode assembly 220 on the second housing 120 and inside the second channel 121, and then cover the first housing 110 on the second housing 120 so that the first channel 111 and the second channel 121 communicate to form an air flow channel 130. The process gas diffuses through the diffusion component 210 from the first channel 111 and then enters the second channel 121, and is then ionized by the electrode assembly 220 to generate plasma. As can be seen above, the first housing 110 and the diffusion component 210 can form an independent diffusion module, and the second housing 120 and the electrode assembly 220 can form an independent ionization module. The first housing 110 and the second housing 120 are detachably connected so that the two housings can be quickly disassembled and assembled and the internal components can be repaired or replaced, forming a modular structure and reducing the disassembly and assembly difficulty of the plasma generating device 200. Of course, the diffusion component 210 can also be arranged inside the second housing 120, and the electrode assembly 220 is arranged inside the first housing 110, which is not specifically limited here.

[0041] Furthermore, please refer to Figure 3 and Figure 7 , a plurality of through holes 113 are formed through the first housing 110 along the length direction. The plurality of through holes 113 are distributed on both sides of the first channel 111. Threaded holes 124 are provided at positions corresponding to the first through holes 113 on the second housing 120. Screws are used as connecting pieces to pass through the through holes 113 and be screwed into the threaded holes 124 so that the first housing 110 and the second housing 120 are detachably connected. In addition, connecting pieces can also adopt components such as pins, and it is subject to being able to detachably connect the first housing 110 and the second housing 120, without specific limitations.

[0042] In one embodiment, an electrode mounting groove 140 is provided in the first housing 110 and / or the second housing 120. The electrode mounting groove 140 communicates with the air flow channel 130 and is used for mounting the electrode assembly 220.

[0043] As Figure 2 , Figure 5 and Figure 7 shown, in one embodiment of the present utility model, an electrode mounting groove 140 is provided in the first housing 110 and / or the second housing 120. The electrode mounting groove 140 communicates with the air flow channel 130, and the electrode assembly 220 is mounted in the electrode mounting groove 140, so that at least a part of the electrode assembly 220 is in contact with the process gas flowing through the air flow channel 130 to ionize it to generate plasma. It can be understood that, in order to meet different ionization requirements, the electrode mounting groove 140 can be provided in the first housing 110, or in the second housing 120, or in both housings. The product structure can be selected according to requirements and will not be specifically limited here.

[0044] In one embodiment, the air flow channel 130 includes an air inlet 131 and an air outlet 132. The air inlet 131 is provided on the first housing 110, and the air outlet 132 is provided on the second housing 120. The air outlet 132 of the air flow channel 130 is used to dock with the reaction chamber of the plasma processing device to supply plasma to the reaction chamber. The electrode mounting groove 140 is provided in the second housing 120 and communicates with the air flow channel 130.

[0045] As Figure 7 shown, in one embodiment of the present utility model, the air flow channel 130 includes an air inlet 131 provided on the first housing 110 and an air outlet 132 provided on the second housing 120. The air inlet 131 is located on the side of the first housing 110 away from the second housing 120, and the air outlet 132 is located on the side of the second housing 120 away from the first housing 110. The second housing 120 is used to connect with a plasma processing device (not shown), and the plasma processing device has a reaction chamber for placing a circuit board or a wafer. The reaction chamber is docked with the air outlet 132 of the second housing 120. The electrode mounting groove 140 is provided in the second housing 120, and the electrode assembly 220 is correspondingly mounted in the electrode mounting groove 140. The process gas enters the first channel 111 from the air inlet 131 of the first housing 110, is diffused by the diffusion assembly 210 and then enters the second channel 121. The electrode assembly 220 ionizes the process gas to generate plasma. The generated plasma is diffused again by the diffusion assembly 210 and then enters the reaction chamber through the air outlet 132 for etching, cleaning or deposition.

[0046] In one embodiment, the electrode mounting grooves 140 include a first electrode mounting groove 141 and a second electrode mounting groove 142. The first electrode mounting groove 141 and the second electrode mounting groove 142 are spaced apart on both sides of the air flow channel 130. The electrode assembly 220 includes a first electrode 221 and a second electrode 222. The first electrode mounting groove 141 is used for mounting the first electrode 221, and the second electrode mounting groove 142 is used for mounting the second electrode 222.

[0047] As Figure 2 and Figure 7 shown, in an embodiment of the present utility model, the electrode mounting grooves 140 include a first electrode mounting groove 141 and a second electrode mounting groove 142. Both the first electrode mounting groove 141 and the second electrode mounting groove 142 are arranged to penetrate along the length direction of the second housing 120 and are located on both sides of the air flow channel 130. The electrode assembly 220 includes a first electrode 221 and a second electrode 222. Insulating sleeves 223 with side openings are respectively sleeved on the first electrode 221 and the second electrode 222. The insulating sleeves 223 are used to prevent the electrodes from contacting the second housing 120. The first electrode 221 is inserted into the first electrode mounting groove 141, and the second electrode 222 is inserted into the second electrode mounting groove 142. A first preset distance is reserved between the first electrode 221 and the second electrode 222, so that the process gas enters the position in the second housing 120 where the electric field generated by the first electrode 221 and the second electrode 222 has the best effect for ionization, and the process gas is more evenly distributed on the first electrode 221 and the second electrode 222, thereby improving the efficiency of forming plasma by the process gas and further avoiding the problem that most of the process gas is transported above the electrodes without being ionized.

[0048] In one embodiment, the housing assembly 100 further includes a first seal 150. The first housing 110 has a first abutting surface 112, and the second housing 120 has a second abutting surface 122. The first abutting surface 112 and the second abutting surface 122 abut against each other; a limiting portion 112a is provided on one of the first abutting surface 112 and the second abutting surface 122, and the first seal 150 is provided at the limiting portion 112a and abuts against the other of the first abutting surface 112 and the second abutting surface 122;

[0049] Alternatively, a limiting portion 112a is provided on one of the first abutting surface 112 and the second abutting surface 122, and a matching portion is provided on the other. The limiting portion 112a and the matching portion are in limiting cooperation, and the first seal 150 is provided between the limiting portion 112a and the matching portion.

[0050] As Figures 3 to 6As shown in the figure, in an embodiment of the present utility model, the housing assembly 100 further includes a first seal 150. One side of the first housing 110 facing the second housing 120 has a first abutting surface 112, and one side of the second housing 120 facing the first housing 110 has a second abutting surface 122. When the first housing 110 is covered on the second housing 120, the first abutting surface 112 and the second abutting surface 122 are in abutment. In this embodiment, the limiting portion 112a is a limiting groove circumferentially arranged on the first abutting surface 112 around the first channel 111. The first seal 150 is an annular sealing ring. The first seal 150 is embedded in the limiting portion 112a, abuts against the second abutting surface 122, and is circumferentially arranged around the second channel 121 to seal the gap between the first housing 110 and the second housing 120.

[0051] In another embodiment of the present utility model, the limiting portion 112a is a limiting groove formed on the second abutting surface 122, so that the first seal 150 abuts against the first abutting surface 112. Alternatively, a limiting portion 112a is provided on one of the first housing 110 and the second housing 120, and a mating portion is provided on the other. The limiting portion 112a can be a groove, and the mating portion is a protrusion matching the shape of the groove. The first seal 150 is disposed in the groove, and the protrusion extends into the groove to press the seal, achieving a sealing effect. The above three methods can all achieve sealing, and the limiting portion 112a and the mating portion can be actually set according to requirements.

[0052] In an embodiment, the housing assembly 100 further includes an end cover assembly 160. The end cover assembly 160 includes a first end cover 161 and a second seal 162. The first end cover 161 is provided with a mounting hole 161a communicating with the electrode mounting groove 140 of the second housing 120. The first end cover 161 is connected to the second housing 120. The second seal 162 is annularly arranged. The second seal 162 is disposed between the first end cover 161 and the second housing 120 to seal the gap between the first end cover 161 and the second housing 120.

[0053] Please refer to Figure 3 、 Figure 4 and Figure 8, in an embodiment of the present utility model, the second housing 120 is provided with an electrode mounting groove 140 running through in the length direction. The housing assembly 100 further includes end cap assemblies 160. The number of the end cap assemblies 160 is two and they are respectively arranged at both ends of the second housing 120 in the length direction. The end cap assembly 160 includes a first end cap 161 and a second seal 162. The first end cap 161 is provided with a mounting hole 161a communicating with the electrode mounting groove 140. The mounting hole 161a is used for the electrode to pass through. The two first end caps 161 are respectively connected to both ends of the second housing 120. On one side of the second housing 120 facing each first end cap 161, there is an annular groove 123. The annular groove 123 is arranged around the circumference of the two electrode mounting grooves 140. The second seal 162 is an annular sealing ring. The annular sealing ring is embedded in the annular groove 123 and abuts against the first end cap 161 to seal the gap between the first end cap 161 and the second housing 120, ensuring the airtightness of the housing assembly 100 and preventing the leakage of process gas.

[0054] In one embodiment, the end cap assembly 160 further includes a third seal 163. There is a mounting groove on the inner wall of the mounting hole 161a. The third seal 163 is arranged in the mounting groove and abuts against the electrode assembly 220 for sealing.

[0055] As Figure 4 and Figure 8 shown, further, in order to improve the sealing effect of the housing assembly 100, the end cap assembly 160 further includes a third seal 163. The third seal 163 is an annular sealing ring. A limiting groove 161b is provided on the inner wall of the mounting hole 161a of the first end cap 161. The third seal 163 is limit-mounted in the limiting groove 161b and sleeved on the first electrode 221 and / or the second electrode 222. The first electrode 221 and / or the second electrode 222 and the bottom wall of the limiting groove press the third seal 163 to seal the gap between the first electrode 221 and / or the second electrode 222 and the first end cap 161, further improving the sealing effect of the housing assembly 100.

[0056] The present utility model also proposes a plasma generating device 200. The plasma generating device 200 includes a diffusion assembly 210, an ionization assembly, and a housing assembly 100. The specific structure of the housing assembly 100 refers to the above embodiment. Since the present plasma generating device 200 adopts all the technical solutions of the above all embodiments, it has at least all the beneficial effects brought by the technical solutions of the above embodiments, which will not be elaborated here one by one. Among them, the ionization assembly includes an electrode assembly 220. The diffusion assembly 210 and the electrode assembly 220 are arranged in the gas flow channel 130. The diffusion assembly 210 is used for diffusing the process gas before and / or after being ionized.

[0057] In one embodiment, the electrode assembly 220 includes a first electrode 221 and a second electrode 222. The ionization assembly further includes a power supply module, which is electrically connected to the first electrode 221 and the second electrode 222 respectively. The power supply module is used to periodically change the power supply polarities output to the first electrode 221 and the second electrode 222.

[0058] And / or, the diffusion assembly 210 includes a first diffusion plate 211, a second diffusion plate 212 and a third diffusion plate 213. The first diffusion plate 211 and the second diffusion plate 212 are arranged in the first channel 111, and the third diffusion plate 213 is arranged in the second channel 121.

[0059] Please refer to Figures 5 to 8 , in one embodiment of the present utility model, the ionization assembly further includes a power supply module (not shown), which is electrically connected to the first electrode 221 and the second electrode 222 respectively. The power supply module is used to periodically change the power supply polarities output to the first electrode 221 and the second electrode 222, so as to change the positive and negative polarities of the first electrode 221 and the second electrode 222, which can avoid the problem of uneven etching / cleaning / deposition of a single positive and negative electrode, and further improve the uniformity of etching / cleaning / deposition.

[0060] The diffusion assembly 210 includes a first diffusion plate 211, a second diffusion plate 212 and a third diffusion plate 213. The first diffusion plate 211 and the second diffusion plate 212 are arranged at intervals in the first channel 111 of the first housing 110, and the third diffusion plate 213 is arranged in the second channel 121 of the second housing 120 and is close to the air outlet 132. The third diffusion plate 213 is connected to the first diffusion plate 211 and the second diffusion plate 212 by screws 214. The first diffusion plate 211 preliminarily diffuses the process gas entering the first channel 111 through the air inlet 131, and the second diffusion plate 212 performs a second diffusion, so that the process gas enters the second channel 121 more uniformly to contact the electrode assembly 220, making the ionization more sufficient. After the process gas is ionized to generate plasma, it is diffused through the third diffusion plate 213 and enters the reaction chamber of the plasma processing device through the air outlet 132, for etching / cleaning / depositing the wafer or circuit board in the reaction chamber. As can be seen above, setting multiple diffusion plates is beneficial to the ionization and uniform distribution of the process gas, and further improves the uniformity of etching / cleaning / deposition.

[0061] The present utility model further provides a plasma processing device, including a plasma processing apparatus and a plasma generating device 200. The specific structure of the plasma generating device 200 refers to the above embodiments. Since the plasma generating device 200 adopts all the technical solutions of the above embodiments, it at least has all the beneficial effects brought by the technical solutions of the above embodiments, which will not be elaborated herein one by one. Among them, the plasma processing apparatus has a reaction chamber, and the air outlet 132 of the air flow channel 130 is docked with the reaction chamber.

[0062] The above are only exemplary embodiments of the present utility model, and do not limit the patent scope of the present utility model accordingly. Any equivalent structural transformation made under the technical concept of the present utility model by using the content of the specification and drawings of the present utility model, or any direct / indirect application in other related technical fields shall be included within the patent protection scope of the present utility model.

Claims

1. A housing assembly, applied to a plasma generating device, characterized in that: The plasma generating device comprises a diffusion component for diffusing a process gas and an ionization component for ionizing the process gas to generate plasma, wherein the ionization component comprises an electrode component, and the housing component comprises: a first housing, wherein the first housing is formed with a first passage; A second shell, wherein the second shell is formed with a second channel, the first shell and the second shell are detachably connected, and the first channel and the second channel are connected to form an air flow channel; The first shell and the second shell are used for installing the diffusion assembly and the electrode assembly, and the gas flow channel is used for flowing process gas processed by the diffusion assembly and the electrode assembly.

2. The housing assembly according to claim 1, wherein: An electrode mounting groove is provided in the first shell and / or the second shell. The electrode mounting groove is communicated with the air flow channel and is used for mounting the electrode assembly.

3. The housing assembly according to claim 2, wherein: The air flow channel includes an air inlet and an air outlet, the air inlet is arranged on the first shell, and the air outlet is arranged on the second shell. The air outlet of the air flow channel is used to dock with the reaction chamber of the plasma processing device to supply plasma to the reaction chamber. The electrode mounting groove is arranged in the second shell and is connected to the air flow channel.

4. The housing assembly according to claim 3, wherein: The electrode mounting groove includes a first electrode mounting groove and a second electrode mounting groove, and the first electrode mounting groove and the second electrode mounting groove are arranged at intervals on both sides of the airflow channel. The electrode assembly includes a first electrode and a second electrode, and the first electrode mounting groove is used to install the first electrode, and the second electrode mounting groove is used to install the second electrode.

5. The housing assembly according to any one of claims 1 to 4, characterized in that: The housing assembly further comprises a first sealing member, the first housing has a first abutting surface, the second housing has a second abutting surface, the first abutting surface and the second abutting surface abut each other; a limiting portion is provided on one of the first abutting surface and the second abutting surface, the first sealing member is provided at the limiting portion and abuts against the other of the first abutting surface and the second abutting surface; Alternatively, a limiting portion is provided on one of the first abutting surface and the second abutting surface, and a matching portion is provided on the other one, the limiting portion and the matching portion are limitedly matched, and the first sealing member is provided between the limiting portion and the matching portion.

6. The housing assembly according to any one of claims 1 to 4, characterized in that: The shell assembly also includes an end cover assembly, which includes a first end cover and a second seal. The first end cover is provided with a mounting hole connected to the electrode mounting groove of the second shell. The first end cover is connected to the second shell. The second seal is arranged in an annular shape and is arranged between the first end cover and the second shell to seal the gap between the first end cover and the second shell.

7. The housing assembly according to claim 6, wherein: The end cap assembly further includes a third sealing member. A mounting groove is provided on the inner wall of the mounting hole. The third sealing member is disposed in the mounting groove and abuts against and seals the electrode assembly.

8. A plasma generating device, characterized in that: It comprises a diffusion component, an ionization component and a shell component as described in any one of claims 1 to 7, wherein the ionization component comprises an electrode component, the diffusion component and the electrode component are arranged in the air flow channel, and the diffusion component is used to diffuse the process gas before and / or after ionization.

9. The plasma generating device according to claim 8, characterized in that: The electrode assembly includes a first electrode and a second electrode, and the ionization assembly also includes a power module, the power module is electrically connected to the first electrode and the second electrode respectively, and the power module is used to periodically change the polarity of the power output to the first electrode and the second electrode; And / or, the diffusion assembly includes a first diffusion plate, a second diffusion plate and a third diffusion plate, the first diffusion plate and the second diffusion plate are arranged in the first channel, and the third diffusion plate is arranged in the second channel.

10. A plasma processing device, characterized in that: It comprises a plasma processing device and a plasma generating device as claimed in any one of claims 8 to 9, wherein the plasma processing device has a reaction chamber, and the gas outlet of the gas flow channel is connected to the reaction chamber.

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