Bushing assembly and extension equipment

Abstract

The utility model provides a bushing assembly and extension equipment. The bushing assembly is characterized in that an upper ring body comprises a first inner surface and a first outer surface; the lower ring body comprises a second inner surface and a second outer surface; a gas channel is formed between the upper ring body and the lower ring body in a first direction; the gas inlet is formed in one side, in the first direction, of the first main body; the gas outlet is formed in the other side, in the first direction, of the first main body and is opposite to the gas inlet; the temperature measurement ventilation through hole is formed in the upper ring body or the lower ring body, located between the gas inlet and the gas outlet and used for inputting gas into the cavity in the second direction and stretching into a temperature measurement assembly from the temperature measurement ventilation through hole during temperature correction. The temperature measurement ventilation through hole provided by the utility model has the advantages of no air leakage, high strength and low manufacturing cost.

Description

Technical Field

[0001] The utility model relates to the technical field of epitaxial equipment for semiconductor devices, and particularly relates to a bushing assembly and an epitaxial equipment with the bushing assembly. Background Art

[0002] In epitaxial equipment, a second air inlet is arranged in the cross direction of the main air flow of the bushing assembly to achieve air flow uniformity. However, in the prior art, the second air inlet is composed of semi-circular holes respectively arranged on the upper bushing and the lower bushing to form a complete circular hole. Therefore, the following problems exist: air leakage will occur in the gap between the upper bushing and the lower bushing, and if the two semi-circular holes are not aligned, the air flow uniformity will also be affected; at the same time, since the bushing is made of quartz, the exposed semi-circular holes are easily damaged; moreover, special temperature measurement holes need to be arranged on the bushing, increasing the processing difficulty and cost of the bushing. Summary of the Utility Model

[0003] The purpose of the utility model is to provide a bushing assembly and a semiconductor epitaxial equipment, which are used to solve the problems of air leakage, misalignment and high processing cost of the bushing.

[0004] In order to achieve the above purpose, the utility model is realized through the following technical solutions:

[0005] A bushing assembly for semiconductor epitaxial equipment, the semiconductor epitaxial equipment includes a cavity, a bushing assembly and a base, the base is horizontally arranged in the cavity for carrying wafers; the bushing assembly is arranged on the inner surface of the side wall of the cavity and surrounds the base; the bushing assembly includes:

[0006] An upper ring body, the upper ring body includes a first inner surface and a first outer surface;

[0007] A lower ring body, the lower ring body includes a second inner surface and a second outer surface; the lower ring body is arranged below the upper ring body, and a gas channel is formed between the upper ring body and the lower ring body in a first direction;

[0008] A gas inlet, arranged on one side of the bushing assembly along the first direction, for guiding gas to flow into the gas channel;

[0009] A gas outlet, arranged on the other side of the bushing assembly along the first direction, opposite to the gas inlet, for guiding gas to flow out of the gas channel;

[0010] A temperature measurement ventilation through hole, the temperature measurement ventilation through hole is arranged on the upper ring body or the lower ring body, between the gas inlet and the gas outlet, for inputting gas into the cavity in a second direction and inserting a temperature measurement component into the temperature measurement ventilation through hole during temperature calibration.

[0011] Optionally, the upper ring body further includes a boss, and the lower ring body further includes a notch. The temperature-measuring and ventilation through-hole is located on the boss of the upper ring body, and the boss and the notch are arranged in cooperation with each other.

[0012] Optionally, the upper ring body further includes a notch, and the lower ring body further includes a boss. The temperature-measuring and ventilation through-hole is located on the boss of the lower ring body, and the notch and the boss are arranged in cooperation with each other.

[0013] Optionally, the cross-sectional shape of the boss is rectangular.

[0014] Optionally, the cross-section of the temperature-measuring and ventilation through-hole is circular.

[0015] Optionally, the inner diameter of the temperature-measuring and ventilation through-hole in the second direction decreases from the direction away from the base to the direction close to the base.

[0016] Optionally, at least a part of the opening of the temperature-measuring and ventilation through-hole in the direction close to the base is higher than the upper surface of the base.

[0017] Optionally, the second direction forms an angle with the first direction, and the angle is greater than 0° and less than or equal to 90°.

[0018] Optionally, the angle is equal to 90°.

[0019] Optionally, the upper ring body is provided with protrusions on both the gas inlet side and the gas outlet side.

[0020] Optionally, the lower ring body is provided with steps on both the gas inlet side and the gas outlet side. The protrusions and the steps are arranged in cooperation with each other to form a gas inlet and a gas outlet respectively.

[0021] Optionally, the lower ring body is provided with a wafer transfer port, and the wafer transfer port is located between the gas inlet and the gas outlet.

[0022] The present utility model also discloses an epitaxial device, including:

[0023] A cavity;

[0024] A base, which is horizontally arranged in the cavity and is used for carrying a wafer;

[0025] A bushing assembly, which is arranged on the inner surface of the side wall of the cavity and surrounds the base.

[0026] Compared with the prior art, the present utility model has the following advantages:

[0027] (1) By setting the temperature-measuring and ventilation through-holes only in the upper ring body or the lower ring body of the bushing assembly, the problem of gas leakage that easily occurs when the gas in the second direction passes between the upper ring body and the lower ring body of the bushing assembly can be solved.

[0028] (2) When calibrating the temperature, insert the temperature-measuring component through the temperature-measuring and ventilation through-holes, and the temperature of the equipment can be calibrated, which is beneficial to accurate temperature control. By designing the temperature-measuring and ventilation through-holes to have both the functions of temperature measurement and ventilation, the structure is simple, the processing is convenient, and the cost is lower.

[0029] (3) The design of the convex platform and the notch facilitates the positioning and installation of the upper ring body and the lower ring body. BRIEF DESCRIPTION OF THE DRAWINGS

[0030] In order to more clearly illustrate the technical solutions of the present invention, the drawings required for description will be briefly introduced below. Obviously, the drawings in the following description are an embodiment of the present invention. For those of ordinary skill in the art, without creative efforts, other drawings can also be obtained based on these drawings:

[0031] Figure 1 Structural schematic diagram of the epitaxial device of the present invention;

[0032] Figure 2 Structural schematic diagram of the bushing assembly of the first embodiment of the present invention;

[0033] Figure 3 Cross-sectional schematic diagram in the top view direction of the lower ring body of the first embodiment of the present invention;

[0034] Figure 4 Top view structural schematic diagram of the upper ring body of the first embodiment of the present invention;

[0035] Figure 5 Structural schematic diagram of the lower ring body of the first embodiment of the present invention;

[0036] Figure 6 Structural schematic diagram of the bushing assembly of the second embodiment of the present invention;

[0037] Figure 7 Structural schematic diagram of the bushing assembly of the third embodiment of the present invention;

[0038] Figure 8 Structural schematic diagram of the bushing assembly of the fourth embodiment of the present invention;

[0039] Figure 9 Cross-sectional schematic diagram along the second direction of the temperature-measuring and ventilation through-holes of the present invention provided on the lower ring body. DETAILED DESCRIPTION OF THE EMBODIMENTS

[0040] The following further elaborates on the solution proposed by the present utility model in conjunction with the accompanying drawings and specific embodiments. According to the following description, the advantages and features of the present utility model will be clearer. It should be noted that the accompanying drawings are in a very simplified form and use non-precise scales, only for conveniently and clearly assisting in explaining the purpose of the embodiments of the present utility model. In order to make the purpose, features, and advantages of the present utility model more obvious and understandable, please refer to the accompanying drawings. It should be noted that the structures, scales, sizes, etc. shown in the drawings of this specification are only used to cooperate with the content disclosed in the specification for those familiar with this technology to understand and read, and are not used to limit the limiting conditions for the implementation of the present utility model. Therefore, they do not have technical essence. Any modification of the structure, change of the proportional relationship, or adjustment of the size, without affecting the efficacy that the present utility model can produce and the purpose that can be achieved, should still fall within the scope covered by the technical content disclosed by the present utility model.

[0041] Figure 1 The structural schematic diagram of the epitaxial device of the present utility model is shown, as Figure 1As shown, the epitaxial device 100 includes a reaction chamber (i.e., a cavity), an inlet gas pipeline 102, a gas injection plug 110, a heating component 106, a temperature measuring instrument 108, a rotary support component, an outlet plug 134, an exhaust connection piece 158, and an exhaust pipeline 103. The reaction chamber includes a wall portion 112 (i.e., a side wall), an upper ring body 114, a lower ring body 116, an upper dome 118, a lower dome 120, an upper flange 122, and a lower flange 124. The upper ring body 114 and the lower ring body 116 are both ring bodies formed of quartz and are arranged inside the annular wall portion 112. The upper dome 118 and the lower dome 120 are generally circular formed of quartz. The upper ring body 114 is arranged above the lower ring body 116 to form a bushing assembly, and a gas inlet and a gas outlet are respectively provided at two opposite sides of the bushing assembly for the entry and discharge of process gases. The upper dome 118 is arranged above the upper ring body 114, and the upper dome 118 is fixed above the wall portion 112 through the upper flange 122. The lower dome 120 is arranged below the lower ring body 116, and the lower dome 120 is fixed below the wall portion 112 through the lower flange 123. The heating component 106 is arranged above and below the reaction chamber, and the emitted infrared light can penetrate the upper dome 118 and the lower dome 120 to enter the reaction chamber to provide heating energy for the reaction chamber. The rotary support component includes a base 123, a rotary support shaft 124, a lifting support frame 126, and a pin 128. The base 123 is horizontally arranged inside the reaction chamber and is used to horizontally carry the wafer 130 (or substrate) to be processed. Specifically, the base 123 is arranged at the center of the ring body of the bushing assembly, and is located between the gas inlet and the gas outlet, and is at the same horizontal plane as the gas inlet and the gas outlet. The rotary support shaft 124 is used to support the rotation and lifting of the base 122. The lifting support frame 126 is used to support the pin 128 when the rotary support shaft 124 descends, so as to separate the substrate 130 from the base 123 during the transfer of the substrate. The temperature measuring instrument 108 is arranged above and below the reaction chamber and is used to monitor the temperature near the substrate 130. The epitaxial device 100 further includes a preheating ring 132 and a pump. The preheating ring 132 is arranged around the base 123.The intake pipeline 102 is connected to the gas inlet through the gas injection plug-in 110 and is used to introduce the process gas into the reaction chamber. The heating component 106 heats and decomposes the process gas, which is deposited on the surface of the substrate 130, thereby forming an epitaxial layer on the substrate 130. One end of the gas outlet plug-in 134 is connected to the gas outlet of the bushing assembly, and the other end of the gas outlet plug-in 134 is connected to the exhaust connection piece 136. The gas outlet of the exhaust connection piece 158 is connected to the exhaust pipeline 103, and the pump is connected to the exhaust pipeline 103 and is used to discharge the gas in the reaction chamber; the process exhaust gas enters the exhaust pipeline 103 from the gas outlet plug-in 134 through the exhaust connection piece 136 and is discharged from the reaction chamber through the pump.

[0042] Figure 2 The structural schematic diagram of the bushing assembly according to the first embodiment of the present invention is shown. As Figure 2 shown, the bushing assembly includes an upper ring body 114 and a lower ring body 116. The upper ring body 114 is located above the lower ring body 116, and a gas channel is formed between the upper ring body 114 and the lower ring body 116 in a first direction; the bushing assembly further includes a gas inlet 142 and a gas outlet 144. The gas inlet 142 is arranged on one side of the bushing assembly along the first direction and is used to guide gas to flow into the gas channel. The gas outlet 144 is arranged on the other side of the bushing assembly along the first direction and is arranged opposite to the gas inlet 142 and is used to guide gas to flow out of the gas channel; a wafer transfer port 138 and a temperature measurement ventilation through hole 140 are arranged on the lower ring body 116. The wafer transfer port 138 and the temperature measurement ventilation through hole 140 are arranged opposite to each other and are both located between the gas inlet 142 and the gas outlet 144. The temperature measurement ventilation through hole 140 is used to input gas into the cavity along a second direction. In addition, when the temperature of the temperature measuring instrument needs to be calibrated, the staff can extend the temperature measuring component from the temperature measurement ventilation through hole 140.

[0043] Figure 3 The cross-sectional schematic diagram of the lower ring body in the top view direction according to the first embodiment of the present invention is shown. As Figure 3 shown, the temperature measurement ventilation through hole 140 can be arranged at any position between the gas inlet 142 and the gas outlet 144. The first direction and the second direction form an included angle θ, and the included angle θ is greater than 0° and less than or equal to 90°; preferably, the included angle θ is equal to 90°, that is, the center line of the temperature measurement ventilation through hole in the axial direction is parallel to the center line of the wafer transfer port 138 in the axial direction, wherein the second direction is parallel to the center line of the axial direction.

[0044] Figure 4The top view structural schematic diagram of the upper ring body of the first embodiment of the present utility model is shown. As Figure 4 shown, the upper ring body 114 includes a first outer surface 1141, a first inner surface 1143, a first upper surface 1149 and a first lower surface. The first outer surface 1141 is the side of the upper ring body 114 away from the base, and the first outer surface 1141 is disposed opposite to the first inner surface 1143; the first body further includes a first protrusion 1145 on the gas inlet side and a second protrusion 1147 on the gas outlet side. The first protrusion 1145 and the second protrusion 1147 extend along the first outer surface 1141, and the extending direction is the direction towards the first lower surface.

[0045] Figure 5 The structural schematic diagram of the lower ring body of the first embodiment of the present utility model is shown. As Figure 5 shown, the lower ring body 116 includes a second outer surface 1161, a second inner surface 1163, a second upper surface 1165 and a second lower surface 1167. The second outer surface 1161 is the side of the lower ring body 116 away from the base, and the second outer surface 1161 is disposed opposite to the second inner surface 1163; the second body further includes a first step 1169 on the gas inlet side and a second step 1171 on the gas outlet side. The first step 1169 and the second step 1171 are located on the second outer surface 1161 and are formed on the second outer surface 1161 by extending from the second upper surface 1165 to the second lower surface 1167. Both the first step 1169 and the second step 1171 include a first step surface 1175 and a second step surface 1179, and the first step surface 1175 is connected to the second step surface 1179 to form an L shape.

[0046] Optionally, the cross sections of both the first step 1169 and the second step 1171 are in an "L" shape. The first step surface 1175 extends along the radial direction of the bushing assembly, and the second step surface 1179 extends along the axial direction of the bushing assembly. Support bodies 1173 are disposed on both the first step 1169 and the second step 1171. The support bodies 1173 are used to support the protrusions (the first protrusion 1145 and the second protrusion 1147). The support bodies 1173 include a transverse support body 1177 and a vertical support body 1181, and the transverse support body 1177 and the vertical support body 1181 are connected to form an L shape. Optionally, the number of the support bodies 1173 on the first step 1169 and the second step 1171 is at least 2 respectively.

[0047] The first protrusion 1145 of the upper ring body 114 and the first step 1169 of the lower ring body 116 cooperate with each other to form a gas inlet of the gas channel in the first direction, and the second protrusion 1147 of the upper ring body 114 and the second step 1171 of the lower ring body 116 cooperate with each other to form a gas outlet of the gas channel in the first direction.

[0048] Figure 6 The structural schematic diagram of the bushing assembly according to the second embodiment of the present invention is shown, as Figure 6 shown. The difference from the first embodiment is that the temperature-measuring ventilation through hole 140 is arranged on the upper ring body 114, and the rest of the structures are the same.

[0049] Arranging the temperature-measuring ventilation through hole 140 only on the upper ring body 114 or only on the lower ring body 116 can solve the problem of gas leakage of the process gas in the second direction between the upper ring body 114 and the lower ring body 116.

[0050] Figure 7 The structural schematic diagram of the bushing assembly according to the third embodiment of the present invention is shown, as Figure 7 shown. The upper ring body further includes a boss 146, the temperature-measuring ventilation through hole 140 is arranged on the boss 146, the boss 146 is located between the gas inlet 142 and the gas outlet 144, and is arranged on the first lower surface of the upper ring body; a notch 148 is arranged on the lower ring body 116, the notch 148 is arranged on the second upper surface of the lower ring body, the notch 148 is used to receive the boss 146, and the two are arranged in cooperation with each other. The wafer transfer port 138 is arranged opposite to the groove 148.

[0051] Arranging the temperature-measuring ventilation through hole 140 on the boss 146 and the boss 146 cooperating with the notch 148 is also beneficial to the positioning connection of the upper ring body 114 and the lower ring body 116, and can more conveniently achieve the alignment and assembly of the upper ring body 114 and the lower ring body 116.

[0052] Optionally, the cross-sectional shape of the boss 146 along the outer surface of the upper ring body can be rectangular.

[0053] Figure 8 The structural schematic diagram of the bushing assembly according to the fourth embodiment of the present invention is shown, as Figure 8 shown. Different from the third embodiment, the boss 146 is arranged on the lower ring body 116, the temperature-measuring ventilation through hole 140 is arranged on the boss 146, the upper ring body 114 further includes a notch 148, and the notch 148 is adapted to the boss 146, and the two are arranged in cooperation with each other.

[0054] The following provides a detailed description of the relevant features of the temperature-measuring and ventilation through-holes, taking the first embodiment as an example.

[0055] The cross-sectional shape of the temperature-measuring and ventilation through-hole 140 along the outer surface direction of the ring body is circular. Figure 9 Fig. shows a cross-sectional view of the temperature-measuring and ventilation through-hole of the present utility model provided on the lower ring body along the second direction of the process gas. As Figure 9 shown, the temperature-measuring and ventilation through-hole 140 is a tapered hole, extending from the second outer surface 1161 of the lower ring body 116 to the second inner surface 1163, and the inner diameter of the temperature-measuring and ventilation through-hole 140 decreases from the direction away from the base to the direction close to the base, that is, the opening of the temperature-measuring and ventilation through-hole 140 on the side of the second outer surface 1161 is larger than the opening on the side of the second inner surface 1163. With such a design, the rate of the process gas in the second direction can be increased, and the process efficiency can be improved. At least part of the opening of the temperature-measuring and ventilation through-hole in the direction close to the base is higher than the upper surface of the base, which is convenient for the gas to enter the upper surface of the wafer.

[0056] In summary, by providing the temperature-measuring and ventilation through-holes only on the upper ring body or the lower ring body of the bushing assembly, the problem that the gas in the second direction is likely to leak when passing between the upper ring body and the lower ring body of the bushing assembly can be solved. In addition, when calibrating the temperature, the temperature-measuring assembly is inserted through the temperature-measuring and ventilation through-hole, so that the temperature of the equipment can be calibrated, which is beneficial to accurate temperature control. By designing the temperature-measuring and ventilation through-hole to have both the functions of temperature measurement and ventilation at the same time, the structure is simple, the processing is convenient, and the cost is lower. Moreover, the design of the convex platform and the notch facilitates the positioning and installation of the upper ring body and the lower ring body.

[0057] It should be noted that in this article, relational terms such as first and second are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any actual relationship or order between these entities or operations. Moreover, the term "comprising", "including" or any other variant thereof is intended to cover non-exclusive inclusion, so that a process, method, article or device including a series of elements not only includes those elements, but also includes other elements not expressly listed, or also includes elements inherent in such a process, method, article or device. Without further limitation, an element defined by the statement "including a..." does not exclude the existence of additional identical elements in the process, method, article or device including the element. In addition, the term "connection" in this article means that A and B are directly connected, or means that A and B are indirectly connected. Indirect connection means that A and B are connected through C, or even through more components such as C and D. The connection between A and B can be integral or separated, detachable or fixed. The term "optional" in this article means that this technical feature can be combined with any feature in the article or not combined.

[0058] Although the content of the present utility model has been introduced in detail through the above preferred embodiments, it should be recognized that the above description should not be considered as a limitation to the present utility model. After those skilled in the art have read the above content, various modifications and alternatives to the present utility model will be obvious. Therefore, the protection scope of the present utility model should be defined by the appended claims.

Claims

1. A bushing assembly for epitaxial equipment, the epitaxial equipment comprising a cavity, a bushing assembly and a base, the base being horizontally arranged in the cavity for carrying a wafer; the bushing assembly being arranged on the inner surface of the side wall of the cavity and surrounding the base; characterized in that: The bushing assembly comprises: an upper ring body, the upper ring body comprising a first inner surface and a first outer surface; A lower ring body, the lower ring body comprising a second inner surface and a second outer surface; the lower ring body is arranged below the upper ring body, and a gas channel is formed between the upper ring body and the lower ring body in a first direction; A gas inlet, disposed on one side of the bushing assembly along the first direction, for guiding gas to flow into the gas channel; A gas outlet, arranged at the other side of the bushing assembly along the first direction, arranged opposite to the gas inlet, and used for guiding the gas to be discharged from the gas passage; The temperature measuring ventilation hole is arranged on the upper ring body or the lower ring body, located between the gas inlet and the gas outlet, and is used to input gas into the cavity along the second direction, and to extend the temperature measuring component from the temperature measuring ventilation hole when calibrating the temperature.

2. The bushing assembly according to claim 1, characterized in that The upper ring body further includes a boss, and the lower ring body further includes a recess. The temperature measurement ventilation hole is located on the boss of the upper ring body, and the boss and the recess are arranged in cooperation with each other.

3. The bushing assembly according to claim 1, characterized in that The upper ring body further includes a recess, and the lower ring body further includes a boss. The temperature measurement ventilation through hole is located on the boss of the lower ring body, and the recess and the boss are arranged in cooperation with each other.

4. The bushing assembly according to claim 2 or 3, characterized in that: The cross-sectional shape of the boss is a rectangle.

5. The bushing assembly according to any one of claims 1 to 3, characterized in that: The cross section of the temperature measuring ventilation through hole is circular.

6. The bushing assembly according to claim 5, characterized in that The inner diameter of the temperature measuring ventilation hole decreases in the second direction from away from the base to close to the base.

7. The bushing assembly according to any one of claims 1 to 3, characterized in that: At least a portion of the opening of the temperature measuring ventilation hole in the direction close to the base is higher than the upper surface of the base.

8. The bushing assembly according to any one of claims 1 to 3, characterized in that: The second direction forms an angle with the first direction, and the angle is greater than 0° and less than or equal to 90°.

9. The bushing assembly according to claim 8, characterized in that The angle is equal to 90°.

10. The bushing assembly according to any one of claims 1 to 3, characterized in that: The upper ring body is provided with protrusions on both the gas inlet side and the gas outlet side.

11. The bushing assembly according to claim 10, wherein: The lower ring body is provided with steps on both the gas inlet side and the gas outlet side, and the protrusion and the steps are arranged in cooperation with each other to form a gas inlet and a gas outlet respectively.

12. The bushing assembly according to any one of claims 1 to 3, characterized in that: The lower ring body is provided with a wafer transfer port, and the wafer transfer port is located between the gas inlet and the gas outlet.

13. An epitaxial device, characterized in that: include: Cavity; A base, the base is horizontally arranged in the cavity and is used to carry the wafer; The bushing assembly according to any one of claims 1 to 12 is arranged on the inner surface of the side wall of the cavity and surrounds the base.

Images