Nitrogen cabinet structure and wafer transfer system

By setting up a temperature and humidity controller and a visible light illumination device with a wavelength greater than 500nm in the nitrogen cabinet structure, the problem of the change in the viscosity of the wafer UV film affecting yield is solved, and effective protection of the wafer and improvement of storage conditions are achieved.

CN223015219UActive Publication Date: 2025-06-24JINLAN POWER SEMICON (WUXI) CO LTD
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Patent Information

Application Number
CN202421897379.6
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-08-06
Publication Date
2025-06-24
Estimated Expiration
2034-08-06

AI Technical Summary

Technical Problem

During semiconductor wafer packaging manufacturing process, the viscosity of wafer UV films exceeding the optimal service life will vary to varying degrees, affecting the yield of wafers that have not been produced.

Method used

A nitrogen cabinet structure is designed, including a storage cabinet body, a temperature and humidity controller and a lighting device. The temperature and humidity controller is used to control the temperature and humidity in the storage cabinet. The lighting device is a visible light source with a wavelength greater than 500nm, which is used to hedge against the ultraviolet rays generated by the white light illumination system in the purification room.

Benefits of technology

By controlling temperature and humidity and using appropriate lighting, wafer storage conditions are improved, UV films are prevented from chronic degluing, and wafer yield is improved.

✦ Generated by Eureka AI based on patent content.

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Abstract

The utility model discloses a nitrogen cabinet structure and a wafer transfer system. The nitrogen cabinet structure comprises a storage cabinet body, a temperature and humidity controller and a lighting device, the temperature and humidity controller is arranged in the storage cabinet body and used for controlling the temperature and humidity in the storage cabinet body to be within a preset range; the lighting device is arranged at the top in the storage cabinet body, the lighting device is a visible light source with the wavelength larger than 500 nm, and light rays of the lighting device cover the interior of the storage cabinet body.
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Description

Technical Field

[0001] The utility model relates to the technical field of machinery, in particular to a nitrogen cabinet structure and a wafer transfer system. Background Art

[0002] In the existing semiconductor wafer packaging and manufacturing process, the best use period of the UV film after wafer dicing and degluing is 7-10 days. As the storage time of the wafers increases beyond the best use period, the viscosity of the wafer UV film will change to varying degrees, which will affect the yield of the wafers that have not completed production (such as residual glue on the back gold; the wafer detaching from the UV film, etc.).

[0003] The above content is only used to assist in understanding the technical solution of the utility model, and does not represent an admission that the above content is prior art. Summary of the Utility Model

[0004] The main purpose of the utility model is to provide a nitrogen cabinet structure and a wafer transfer system, aiming to solve the problem that in the prior art, as the storage time of the wafers increases beyond the best use period, the viscosity of the wafer UV film will change to varying degrees, which will affect the yield of the wafers that have not completed production.

[0005] To achieve the above purpose, the utility model provides a nitrogen cabinet structure, which includes:

[0006] A storage cabinet body;

[0007] A temperature and humidity controller, which is arranged in the storage cabinet body and is used to control the temperature and humidity in the storage cabinet body within a preset range; and,

[0008] A lighting device, which is arranged at the top inside the storage cabinet body. The lighting device is a visible light source with a wavelength greater than 500nm, and the light of the lighting device covers the inside of the storage cabinet body.

[0009] Preferably, in the nitrogen cabinet structure, a plurality of partition boards are arranged in the storage cabinet body. The plurality of partition boards divide the inside of the storage cabinet body into a plurality of storage spaces, and the plurality of storage spaces are communicated on one side;

[0010] The lighting device is arranged at the top of each storage space, and the light of the lighting device covers the corresponding storage space.

[0011] Preferably, in the nitrogen cabinet structure, the plurality of partition boards are installed on the first inner side wall of the storage cabinet body, and a circulation space is formed on the other side of the storage cabinet body opposite to the first inner side wall. The plurality of storage spaces form an up-and-down circulation through the circulation space.

[0012] Preferably, in the nitrogen cabinet structure, an ultraviolet disinfection device is further included, and the ultraviolet disinfection device is arranged in the storage cabinet body.

[0013] Preferably, in the nitrogen cabinet structure, the storage cabinet body is provided with a plurality of storage spaces, and the plurality of storage spaces are communicated on one side;

[0014] Each storage space is provided with the ultraviolet disinfection device, and the ultraviolet disinfection device corresponding to each storage space is arranged on the other side of the storage space and close to the inner wall of the storage cabinet body.

[0015] Preferably, in the nitrogen cabinet structure, the lighting device is a visible light source with a wavelength greater than 550 nm.

[0016] In order to achieve the above object, the present invention further provides a wafer transfer system, and the wafer transfer system includes the above nitrogen cabinet structure.

[0017] Preferably, in the wafer transfer system, a transfer box is further included, and the transfer box is used for storing wafers, and the transfer box can be selectively placed in the storage cabinet body of the nitrogen cabinet structure.

[0018] Preferably, in the wafer transfer system, the transfer box includes an upper cover and a lower cover, and the materials of the upper cover and the lower cover are antistatic transparent and light-transmitting materials. The upper cover and the lower cover are closed together, and the upper cover and the lower cover define a storage space for storing wafers.

[0019] Preferably, in the wafer transfer system, the upper cover and the lower cover are recessed in opposite directions and respectively form an upper installation space and a lower installation space;

[0020] Wherein, when the wafer is placed in the lower installation space, at least part of it extends out of the lower installation space. When the upper cover is closed on the lower cover, the extended part of the wafer is accommodated in the upper installation space.

[0021] The present invention has at least the following beneficial effects:

[0022] The utility model controls the temperature and humidity in a storage cabinet within a preset range by providing a temperature and humidity controller disposed in the storage cabinet. A lighting device is provided at the top of the storage cabinet. The lighting device is a visible light source with a wavelength greater than 500 nm, and the light of the lighting device covers the interior of the storage cabinet, which can counteract the ultraviolet rays generated by the white light illumination system in the purification room, improve the storage conditions of wafers, and achieve the protection of the performance of product materials, solving the problem in the prior art that for wafers beyond the optimal service life, the viscosity of the wafer UV film will change to varying degrees as the storage time of the material increases, which will affect the yield of wafers that have not completed production.

[0023] Furthermore, by providing an ultraviolet ray digestion module inside the cabinet, the storage conditions of the nitrogen cabinet are improved. BRIEF DESCRIPTION OF THE DRAWINGS

[0024] Figure 1 is the spectrogram of the LED lamp;

[0025] Figure 2 is the schematic diagram of the spectrum;

[0026] Figure 3 is the schematic diagram of the transfer system of the wafer;

[0027] Figure 4 is Figure 3 the cross-sectional view in

[0028] Figure 5 is Figure 4 the schematic diagram of the transfer box in

[0029] Figure 6 is Figure 5 the schematic diagram of a partial structure in

[0030] Serial number Name Serial number Name 100 Wafer transfer system 13 Lighting device 1 Nitrogen cabinet structure 14 Ultraviolet digestion device 11 Storage cabinet 2 Transfer box 111 Partition board 21 Upper cover 112 Cabinet door 22 Lower cover 12 Temperature and humidity controller 200 Wafer

[0031] The implementation, functional features, and advantages of the present utility model will be further described with reference to the embodiments and the accompanying drawings. DETAILED DESCRIPTION OF THE EMBODIMENTS

[0032] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are some but not all of the embodiments of the present utility model. The present utility model will be described in detail below with reference to the drawings and in combination with the embodiments. It should be noted that, without conflict, the embodiments in the present utility model and the features in the embodiments can be combined with each other.

[0033] In the embodiments of the present utility model, the term "and / or" describes the association relationship of associated objects, indicating that there can be three relationships. For example, A and / or B can represent three situations: A exists alone, A and B exist simultaneously, and B exists alone. The character " / " generally indicates that the associated objects before and after are in an "or" relationship.

[0034] It should be noted that the terms "first", "second", etc. in the description, claims and above-mentioned drawings of the present utility model are used to distinguish similar objects, and do not necessarily need to describe a specific order or sequence.

[0035] In the embodiments of the present utility model, the term "plurality" means two or more, and other quantifiers are similar.

[0036] In the present utility model, unless otherwise stated, the orientation terms such as "up", "down", "top", "bottom" are usually in reference to the direction shown in the drawings, or in reference to the component itself in the vertical, perpendicular or gravitational direction; similarly, for the sake of understanding and description, "inside" and "outside" refer to the inside and outside of the contour of each component itself, but the above orientation terms do not limit the present utility model.

[0037] In traditional semiconductor packaging purification workshops, energy-saving lamps using LED energy-saving lighting are generally adopted for the lighting system. This lighting system is energy-saving and environmentally friendly. Through the research on the failure of wafer materials, it is found that this lighting system causes the following problems to semiconductor wafer materials:

[0038] Energy-saving lamps, also known as trichromatic compact fluorescent lamps, emit electrons after being powered on. The electrons have elastic collisions with argon atoms. After the argon atoms obtain greater kinetic energy, they strike mercury atoms, causing the mercury vapor atoms to ionize and generate ultraviolet rays of 253.7 nm. The ultraviolet rays excite the phosphor to emit visible light. Since the ultraviolet rays cannot be completely absorbed by the phosphor, during the use of energy-saving lamps, part of the ultraviolet rays inside the lamp tube will radiate into the environment through the glass tube wall; coupled with factors such as the shedding of the phosphor, energy-saving lamps can generate relatively strong ultraviolet radiation.

[0039] From Figure 1 It can be seen that the visible light source spectral lines of LED lights are all linear. The energy of the ultraviolet part (wavelength 200 - 380 nm) is very high, while the energy of the visible light part (wavelength 380 - 780 nm) is relatively weak. The UV film is a special coating material, and its main component is a polymer material with special functions. The UV film uses ultraviolet radiation to cure the coating material to form a strong and transparent film.

[0040] Moreover, the lighting system used in traditional semiconductor packaging workshops generates high levels of ultraviolet light. In such an ultraviolet environment, during the existing wafer storage process, there is a situation of chronic debonding of the UV film. This situation becomes more serious as the wafer storage time increases, resulting in excessive debonding of the wafer UV film and failure of wafer material production.

[0041] To solve the above problems, please refer to Figure 3 and Figure 4 This embodiment relates to a nitrogen cabinet structure 1, which includes a storage cabinet body 11, a temperature and humidity controller 12, and a lighting device 13.

[0042] The temperature and humidity controller 12 is arranged inside the storage cabinet body 11 and is used to control the temperature and humidity inside the storage cabinet body 11 within a preset range. The temperature and humidity controller 12 includes a temperature and humidity monitoring device for detecting the temperature and humidity inside the storage cabinet body 11 and a temperature and humidity adjustment device connected to the temperature and humidity monitoring device. The temperature and humidity inside the storage cabinet body 11 are monitored by the temperature and humidity monitoring device, and when the temperature and humidity inside the storage cabinet body 11 are not within the preset range, the temperature and humidity inside the storage cabinet body 11 are adjusted by the temperature and humidity adjustment device.

[0043] The lighting device 13 is arranged at the top inside the storage cabinet body 11. The lighting device 13 is a visible light source with a wavelength greater than 500 nm, and the light of the lighting device 13 covers the inside of the storage cabinet body 11. By setting the visible light source of the lighting device 13 with a wavelength greater than 500 nm, it can counteract the ultraviolet light generated by the white light lighting system in the purification room of the storage cabinet body 11 (as shown in Figure 2 ), so as to avoid the occurrence of chronic debonding of the UV film and play a good role in protecting the UV film. In other embodiments, the light source used by the lighting device 13 has a wavelength greater than 550 nm.

[0044] A plurality of partition boards 111 are arranged inside the storage cabinet body 11. The plurality of partition boards 111 divide the inside of the storage cabinet body 11 into a plurality of storage spaces, and the plurality of storage spaces are communicated on one side.

[0045] The lighting device 13 is arranged at the top of each storage space, and the light of the lighting device 13 covers the corresponding storage space.

[0046] Generally, in order to improve the storage capacity of the nitrogen cabinet structure 1, the nitrogen cabinet structure 1 is provided with multiple layers. The multiple partition plates 111 are installed on the first inner wall of the storage cabinet body 11. A circulation space is formed on the other side of the storage cabinet body 11 opposite to the first inner wall. The multiple storage spaces are in upper and lower circulation through the circulation space. On the other side of the storage cabinet body 11 opposite to the first inner wall, there is also a cabinet door structure of the nitrogen cabinet structure 1. By opening the cabinet door structure, the transfer box 2 can be placed therein. The intervals of the multiple partition plates 111 in the up and down directions can be the same or different, which is specifically set according to requirements.

[0047] Correspondingly, by providing the multiple partition plates 111, the storage cabinet body 11 is provided with multiple storage spaces, and the multiple storage spaces are communicated on one side. The nitrogen cabinet structure 1 further includes an ultraviolet disinfection device 14, and the ultraviolet disinfection device 14 is arranged in the storage cabinet body 11. The storage conditions of the nitrogen cabinet are improved through the ultraviolet disinfection structure.

[0048] Specifically, each storage space is provided with the ultraviolet disinfection device 14, and the ultraviolet disinfection device 14 corresponding to each storage space is arranged on the other side of the storage space and close to the inner wall of the storage cabinet body 11.

[0049] The present utility model also provides a wafer transfer system 100, and the wafer transfer system 100 includes the above-mentioned nitrogen cabinet structure 1. The embodiments of the wafer transfer system 100 include the embodiments of the above-mentioned nitrogen cabinet structure 1, and the beneficial effects of the above-mentioned nitrogen cabinet structure 1 can be applied to the wafer transfer system 100.

[0050] The wafer transfer system 100 includes a transfer box 2, and the transfer box 2 is used for storing wafers 200. The transfer box 2 can be selectively placed in the storage cabinet body 11 of the nitrogen cabinet structure 1.

[0051] Please refer to Figure 5 and Figure 6 , the transfer box 2 includes an upper cover 21 and a lower cover 22. The materials of the upper cover 21 and the lower cover 22 are anti-static transparent and light-transmitting materials. The upper cover 21 and the lower cover 22 are covered together, and the upper cover 21 and the lower cover 22 define a storage space for storing wafers 200. It should be noted that the materials of the upper cover 21 and the lower cover 22 only need to be anti-static transparent and light-transmitting materials, and the specific materials to be selected can be set according to requirements.

[0052] To facilitate the transportation of the wafer 200, the upper cover 21 and the lower cover 22 are recessed in opposite directions, respectively forming an upper mounting space and a lower mounting space; wherein, when the wafer 200 is placed in the lower mounting space, at least a part of the wafer 200 protrudes from the lower mounting space, and when the upper cover 21 is covered on the lower cover 22, the protruding part of the wafer 200 is received in the upper mounting space.

[0053] Obviously, the above-described embodiments are only a part of the embodiments of the present invention, rather than all of the embodiments. Based on the embodiments of the present invention, those of ordinary skill in the art can make other different forms of changes or modifications without making creative efforts, and all of them should fall within the protection scope of the present invention.

Claims

1. A nitrogen cabinet structure, characterized in that: include: Storage cabinets; A temperature and humidity controller, disposed in the storage cabinet, for controlling the temperature and humidity in the storage cabinet within a preset range; as well as, The lighting device is arranged at the top of the storage cabinet. The lighting device is a visible light source with a wavelength greater than 500nm. The light of the lighting device covers the interior of the storage cabinet.

2. The nitrogen cabinet structure according to claim 1, characterized in that: The storage cabinet is provided with a multi-layer partition, which divides the storage cabinet into a plurality of storage spaces, and the plurality of storage spaces are connected and arranged on one side; The top of each storage space is provided with the lighting device, and the light of the lighting device covers the storage space corresponding thereto.

3. The nitrogen cabinet structure according to claim 1, characterized in that: The multi-layer partition is installed on the first inner wall of the storage cabinet, and a circulation space is formed on the other side of the storage cabinet opposite to the first inner wall, and multiple storage spaces are circulated up and down through the circulation space.

4. The nitrogen cabinet structure according to claim 1, characterized in that: It also includes an ultraviolet light detoxification device, which is arranged in the storage cabinet.

5. The nitrogen cabinet structure according to claim 4, characterized in that: The storage cabinet is provided with a plurality of storage spaces, and the plurality of storage spaces are arranged in communication on one side; Each storage space is provided with the ultraviolet light degrading device, and the ultraviolet light degrading device corresponding to each storage space is arranged on the other side of the storage space and close to the inner wall of the storage cabinet.

6. The nitrogen cabinet structure according to claim 1, characterized in that: The lighting device is a visible light source with a wavelength greater than 550nm.

7. A wafer transfer system, characterized in that: Comprising the nitrogen cabinet structure as described in any one of claims 1 to 6.

8. The wafer transport system according to claim 7, characterized in that: It also includes a transfer box, which is used to store wafers. The transfer box can be selectively placed in a storage cabinet of the nitrogen cabinet structure.

9. The wafer transport system according to claim 8, characterized in that: The transfer box includes an upper cover and a lower cover, and the upper cover and the lower cover are made of anti-static, transparent and light-transmitting materials. The upper cover and the lower cover are combined together to define a storage space for storing wafers.

10. The wafer transport system according to claim 9, characterized in that: The upper cover and the lower cover are recessed in opposite directions to form an upper installation space and a lower installation space respectively; When the wafer is placed in the lower installation space, at least a portion of the wafer extends out of the lower installation space. When the upper cover is closed on the lower cover, the extended portion of the wafer is accommodated in the upper installation space.