Wafer supporting device for trough type cleaning equipment

Abstract

The utility model discloses a wafer supporting device for groove type cleaning equipment, which comprises two swing arms, two rolling shafts and a crosspiece, the two rolling shafts and the crosspiece are positioned between the two swing arms, and the two rolling shafts and the crosspiece are provided with corresponding wafer placing grooves; external threads are arranged at the two ends of the rolling shaft, a first through hole for a fixing nut to penetrate through is formed in the swing arm, and the fixing nut penetrates through the first through hole to be matched with the external threads; an internal thread hole is formed in the external thread, a second through hole allowing a fixing screw to penetrate through is formed in the fixing nut, and the fixing screw penetrates through the second through hole to be matched with the internal thread hole; a reinforcing rod is arranged in the rolling shaft in the axial direction. According to the supporting device provided by the invention, the wafer can be stably erected, and meanwhile, the rigidity and applicability of the rolling shaft and the joint of the rolling shaft and the swing arm are greatly improved, so that the rolling shaft is not easy to break, deform and loosen, and wafer scrapping caused by the abnormity of the rolling shaft is reduced.

Description

Technical Field

[0001] The utility model belongs to the technical field of semiconductor production, and particularly relates to a wafer support device for a tank cleaning device. Background Art

[0002] In the process of semiconductor wafer processing and manufacturing, cleaning the wafer is a very important process. After processes such as slicing, grinding, polishing, surface treatment, and epitaxy, the wafer will adhere to impurities such as dust particles, organic substances, inorganic substances, and metal ions, which will affect the subsequent process. The main purpose of cleaning is to remove harmful contaminants attached to the wafer surface, but at the same time, it is required not to damage the wafer surface. The main cleaning process is: SC1 → QDR (quick drain and quick rinse tank) → SC2. In order to clean the wafer more effectively, the SC1 tank is equipped with ultrasonic vibration to remove impurities on the wafer surface, and has heating and circulation functions to increase the reaction rate of the chemical solution. In order to further improve the cleaning effect, a support device is needed to drive the wafer to swing left and right or up and down in the chemical solution. To avoid metal contamination, the material of the support device in contact with the wafer is limited. Moreover, during the swinging process, the support device is affected by the gravity of the wafer, the horizontal torsion during the swinging on both sides, and the resistance generated when the wafer and the support device swing in the chemical solution. If the performance of the support device is poor and it is prone to displacement or fracture, it will directly cause the wafer to break and be scrapped during the cleaning process. Therefore, high requirements are imposed on the performance of the support device. Summary of the Utility Model

[0003] The purpose of the utility model is to provide a wafer support device for a tank cleaning device to solve the deficiencies of the prior art.

[0004] The purpose of the utility model is achieved by the following technical solutions:

[0005] A wafer support device for a tank cleaning device includes two swing arms, two rollers located between the two swing arms, and a crossbar. The crossbar is located between the two rollers. Corresponding wafer placement grooves are provided on both the two rollers and the crossbar, and the three wafer placement grooves can support the wafer upright in a three-point manner.

[0006] External threads are provided at both ends of the roller. A first through hole for a fixing nut to pass through is provided on the swing arm, and the fixing nut passes through the first through hole and cooperates with the external thread. An internal threaded hole is provided inside the external thread, and a second through hole for a fixing screw to pass through is provided inside the fixing nut. The fixing screw passes through the second through hole and cooperates with the internal threaded hole.

[0007] A reinforcing bar is axially provided inside the roller, and both ends of the reinforcing bar extend to the internal threaded hole.

[0008] Preferably, the swing arm is in a shape of "7", including a horizontal section and a vertical section, and the first through hole is located at the bottom of the vertical section.

[0009] Preferably, the cross bar and the swing arm are also connected through the external thread, the fixing nut, the internal thread hole and the fixing screw.

[0010] Preferably, the fixing screw is an anti-slip tooth screw.

[0011] Preferably, both ends of the reinforcing bar extend at least to half of the position of the internal thread hole.

[0012] Preferably, the fixing screw abuts against the reinforcing bar.

[0013] Preferably, the connection position of the cross bar and the swing arm is lower than the connection position of the roller and the swing arm.

[0014] Preferably, the wafer placement groove is in a V shape.

[0015] Preferably, the material of the swing arm is quartz.

[0016] Preferably, the materials of the roller, the cross bar and the fixing nut are PCTFE, the material of the reinforcing bar is PEEK; the material of the fixing screw is PTFE.

[0017] The support device provided by this application can not only make the wafer stand firmly, but also greatly improve the rigidity and applicability of the roller and the connection part with the swing arm, making it not easy to break, deform or loosen, reducing the wafer scrapping caused by abnormal rollers, and having high value and significance of technical improvement in the wafer slot cleaning equipment and the whole wafer cleaning process. Description of the Drawings

[0018] Figure 1 is a schematic three-dimensional structure diagram of a support device provided by a preferred embodiment of this application;

[0019] Figure 2 is a schematic side structure diagram of a support device provided by a preferred embodiment of this application;

[0020] Figure 3 is an exploded structure diagram of the roller, the fixing nut and the fixing screw;

[0021] Figure 4 is a connection structure diagram of the roller, the fixing nut and the fixing screw;

[0022] Description of the Reference Numerals:

[0023] 1 - Swing arm; 2 - Wafer; 3 - Roller; 4 - Cross bar; 5 - Reinforcing bar; 6 - External thread; 7 - Internal threaded hole; 8 - Fixing nut; 9 - Fixing screw; 10 - Connecting hole. Detailed implementation mode

[0024] The present application will be further described below with reference to the accompanying drawings.

[0025] The wafer support device for a slot cleaning device provided by the present application, as Figures 1 to 4 shown, includes two swing arms 1, two rollers 3 located between the two swing arms 1, and one cross bar 4. The two rollers 3 and one cross bar 4 connect the two swing arms 1 to form a support device for supporting the wafer.

[0026] The two rollers 3 are respectively located on the left and right sides of the swing arm 1, connecting the swing arm from both sides, and the cross bar 4 is located between the two rollers, connecting the swing arm in the middle. A plurality of corresponding wafer placement grooves are provided on the two rollers and one cross bar. The wafer placement grooves are preferably V-shaped, and the three wafer placement grooves support the wafer 2 at three points. Connecting the swing arm to a driving mechanism can drive multiple wafers to swing vertically in the liquid medicine. The wafers can stand firmly on the three wafer placement grooves without falling, enhancing the cleaning effect.

[0027] Preferably, the swing arm is in a 7-shaped configuration, including a horizontal section and a vertical section. The horizontal section is provided with a connecting hole 10 for connecting to an external driving mechanism, and the external driving mechanism drives the swing arm to drive the wafer to swing. It should be noted that there is no contact between the inner side wall of the vertical section and the adjacent wafer to avoid affecting the cleaning effect.

[0028] Since the wafer has very strict requirements for impurity content, to avoid metal contamination and reduce wear on the wafer, the swing arm is generally made of quartz, and the rollers and cross bar are made of PCTFE (polychlorotrifluoroethylene). As described in the background art, during the swinging process of the swing arm, the rollers on both sides of the cross bar are subject to the gravity of the wafer and the lateral torque when one swing arm drives the other swing arm to swing, plus the resistance generated when the wafer and the rollers swing in the liquid medicine. The rollers are prone to loosening, dislocation, and fracture. Especially at the vulnerable position where the roller is connected to the quartz swing arm, fractures are most likely to occur. To solve the above problems, the present application uses an internal and external two-group threaded connection structure to firmly connect the swing arm and the roller, preventing the roller from loosening during the swinging process, and a reinforcing bar 5 is axially provided inside the roller to enhance the rigidity of the roller 3 and prevent the roller from breaking. The reinforcing bar is preferably made of PEEK (polyetheretherketone). Specifically:

[0029] External thread connection mechanism: External threads 6 are provided at both ends of the roller. A first through-hole for the fixing nut 8 to pass through is provided on the swing arm. The fixing nut 8 passes through the first through-hole and mates with the external thread 6. Internal thread connection mechanism: An internal thread hole 7 is provided inside the external thread. A second through-hole for the fixing screw 9 to pass through is provided inside the fixing nut. The fixing screw passes through the second through-hole and mates with the internal thread hole. To further prevent the roller from loosening, the fixing screw is preferably an anti-slip tooth screw. The second through-hole is preferably a countersunk hole, and the fixing screw can be completely located inside the fixing nut to avoid exposure. After connection, the head end of the fixing screw may not protrude from the inner side wall of the swing arm or be flush with the inner side wall of the swing arm.

[0030] The material of the fixing nut is preferably PCTFE (polychlorotrifluoroethylene), and the material of the fixing screw is preferably PTFE (polytetrafluoroethylene). The chemical inertness of the PTFE material is better than that of PCTFE, but the mechanical properties are slightly weaker. Considering that the fixing screw mainly plays an anti-slip role here and is subjected to less force, PTFE with better chemical properties is preferred. The fixing nut mainly connects the swing arm and the roller, so PCTFE with good mechanical properties is selected. In addition, the unit price of PCTFE is 1.5 times more expensive than that of PTFE. Using PTFE for the fixing screw can reduce the production cost.

[0031] The threaded connection mechanism is preferably located at the bottom of the vertical section of the swing arm.

[0032] Preferably, the connection position between the crossbar and the swing arm is lower than the connection positions between the two side rollers and the swing arm, so that the wafer can be stably erected.

[0033] It is found through experiments that the bottoms of the external thread and the internal thread hole are the most vulnerable parts and are prone to fracture. Therefore, both ends of the reinforcing bar extend to the internal thread hole. Further, at least extend to half of the position of the internal thread hole and abut against the fixing screw, increasing the rigidity of the vulnerable part and effectively preventing fracture at this part during the swinging of the swing arm.

[0034] To further improve the stability of the entire support device, the connection mechanism between the crossbar and the swing arm is the same as that of the roller, and also adopts an internal and external two-group threaded connection structure, that is, external threads are provided at both ends of the crossbar, and an internal thread hole is provided inside the external thread. The crossbar and the swing arm are connected by a fixing nut that mates with the external thread and a fixing screw that mates with the internal thread hole. The support device provided in this application uses 2 rollers and 1 crossbar to effectively support multiple wafers to stand stably without falling during swinging, improving the wafer cleaning effect.

[0035] The roller adopts an external PCTFE main body and an internal PEEK material reinforcing bar. The whole roller has good rigidity and is not easily deformed. The vulnerable part is covered and supported by the PEEK reinforcing bar and is not easily broken.

[0036] The materials of the swing arm, roller, crossbar, fixing nut and fixing screw can reduce the pollution of the SC1 groove and the wafer, and at the same time have good acid and alkali resistance and can withstand the erosion of the cleaning liquid.

[0037] The thread connection mechanism for fixing the swing arm and the roller adopts an anti-slip tooth design, effectively reducing the looseness of the roller. The reinforcing bar extends to the weakest part of the connection between the swing arm and the roller (half of the external thread and the internal thread), enhancing the rigidity here and effectively avoiding fracture at this part when the swing arm swings.

[0038] Therefore, the support device provided by this application can not only make the wafer stand firmly, but also greatly improve the rigidity and applicability of the roller and the connection with the swing arm, making it not easy to break, deform or loosen, reducing the wafer scrapping caused by abnormal rollers, and having high value and significance for technological improvement in the wafer slot cleaning equipment and the entire wafer cleaning process.

[0039] Although the preferred embodiments of the present invention have been described, those skilled in the art can make additional changes and modifications to these embodiments once they know the basic creative concept. Therefore, the appended claims are intended to be construed to include the preferred embodiments and all changes and modifications falling within the scope of the present invention. Obviously, those skilled in the art can make various changes and variations to the present invention without departing from the spirit and scope of the present invention. Thus, if these modifications and variations of the present invention fall within the scope of the claims of the present invention and their equivalent technologies, the present invention is also intended to include these modifications and variations.

Claims

1. A wafer support device for a tank cleaning device, characterized in that: It comprises two swing arms, two rollers located between the two swing arms and a crossbar, wherein the crossbar is located between the two rollers, and the two rollers and the crossbar are provided with corresponding wafer placement grooves, and the three wafer placement grooves can support the wafer upright at three points; External threads are provided at both ends of the roller, a first through hole is provided on the swing arm for a fixing nut to pass through, and the fixing nut passes through the first through hole and cooperates with the external thread; an internal thread hole is provided inside the external thread, and a second through hole is provided inside the fixing nut for a fixing screw to pass through, and the fixing screw passes through the second through hole and cooperates with the internal thread hole; A reinforcing rod is axially arranged inside the roller, and both ends of the reinforcing rod extend to the internal threaded hole.

2. The wafer support device for a tank cleaning device according to claim 1, characterized in that: The swing arm is in a 7-shape, including a horizontal section and a vertical section, and the first through hole is located at the bottom of the vertical section.

3. The wafer support device for a tank cleaning device according to claim 1, characterized in that: The crossbar and the swing arm are also connected via the external thread, the fixing nut, the internal thread hole and the fixing screw.

4. The wafer support device for a tank cleaning device according to claim 1, characterized in that: The fixing screw is an anti-slip screw.

5. The wafer support device for a tank cleaning device according to claim 1, characterized in that: Both ends of the reinforcing rod extend to at least half of the internal threaded hole.

6. The wafer support device for a tank cleaning device according to claim 1, characterized in that: The fixing screw abuts against the reinforcing rod.

7. The wafer support device for a tank cleaning device according to claim 1, characterized in that: The connection position between the crossbar and the swing arm is lower than the connection position between the roller and the swing arm.

8. The wafer support device for tank cleaning equipment according to claim 1, characterized in that: The wafer placement groove is V-shaped.

9. The wafer support device for a tank cleaning device according to claim 1, characterized in that: The swing arm is made of quartz.

10. The wafer support device for tank cleaning equipment according to claim 1, characterized in that: The roller, the crossbar, and the fixing nut are made of PCTFE, the reinforcing rod is made of PEEK; and the fixing screw is made of PTFE.

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