Conductive mechanism for double-sided electroplating of crystalline silicon plate

Abstract

The utility model discloses a conductive mechanism for double-sided electroplating of a crystalline silicon plate, which belongs to the technical field of conductive mechanisms for electroplating, and is characterized in that a current loop is formed by a photovoltaic upper cathode current and an anode current arranged in a tank body, so that the surface of the photovoltaic plate is plated with copper, and upper and lower rollers of each group of rollers are made of different materials. Except that the upper part and the lower part of the conductive roller are made of stainless steel materials to facilitate current transmission, the other water retaining wheels and the transmission gear are different in material, the density of the upper roller is light, and the density of the lower roller is heavy; the conductive system comprises a conductive roller, a rectifier, an anode plate, a corresponding cable and the like, the rectifier provides stable direct current for the whole electroplating process, the conductive roller is electrically connected with a cathode, the cathode is finally conducted to the photovoltaic panel, the anode plate is electrically connected with an anode and serves as an electroplating anode, double-sided synchronous electroplating is achieved, and the electroplating quality is improved. And an electroplating area is formed among the two groups of conductive rollers, the sponge roller and the line roller, so that a plurality of electroplating areas are spliced.

Description

Technical Field

[0001] The utility model relates to a conductive mechanism for double-sided electroplating of crystalline silicon plates, belonging to the technical field of conductive mechanisms for electroplating. Background Art

[0002] For example, a floating electroplating mechanism for crystalline silicon photovoltaic cells disclosed in the application number: 202320994230.9, which relates to the technical field of electroplating mechanisms, includes: an electroplating tank body, a shower head is arranged inside the electroplating tank body, and a fixing component, the fixing component includes a support plate. When electroplating a crystalline silicon photovoltaic cell, first place the crystalline silicon photovoltaic cell between four sliders, start two first forward and reverse motors respectively, drive the four sliders to move towards each other until the four sides of the crystalline silicon photovoltaic cell are fixed, start the electric push rod, when the electric push rod moves the crystalline silicon photovoltaic cell to the upper part of the shower head, open the shower head, so that the nozzles of the shower head spray electroplating solution upwards, and then start two multi-stage electric telescopic rods at the same time, drive the support frame to move, and through the movement of the support frame, the lower surface of the crystalline silicon photovoltaic cell is electrically connected to the electroplating solution evenly, reducing the usage amount of the electroplating solution.

[0003] Based on retrieval and analysis, it is found that there are still deficiencies in the existing technology:

[0004] The existing technology cannot realize the function of electroplating treatment in multiple regions and cannot realize the electroplating with alternating positive and negative currents. Therefore, a conductive mechanism for double-sided electroplating of crystalline silicon plates is needed to improve the above deficiencies. Content of the Utility Model

[0005] The main purpose of the utility model is to provide a conductive mechanism for double-sided electroplating of crystalline silicon plates.

[0006] The purpose of the utility model can be achieved by adopting the following technical solutions:

[0007] A conductive mechanism for double-sided electroplating of crystalline silicon plates includes an electroplating mechanism for electroplating;

[0008] An electroplating tank is installed inside the electroplating mechanism. The electroplating tank is composed of electroplating tank one and electroplating tank two. Roll one is distributed inside electroplating tank one, roll two is distributed inside electroplating tank two, and conductive rolls, sponge rolls and traveling rolls are distributed inside electroplating tank one and electroplating tank two;

[0009] Positive and negative electrode connection structures are installed on the conductive rolls, sponge rolls and traveling rolls, and a driving component structure is installed inside the electroplating mechanism.

[0010] Preferably, the positive and negative electrode connection structure includes an anode conductive part and a cathode conductive part. Traveling rolls are alternately installed on one side of the conductive rolls, sponge rolls and traveling rolls, and a cathode conductive part is installed between the conductive rolls, sponge rolls and traveling rolls.

[0011] Preferably, the driving component structure includes support legs and a driving member. A driving member is installed on one side of the electroplating tank within the electroplating mechanism, and support legs are installed on the electroplating mechanism.

[0012] Preferably, there is an electroplating area between every two groups of conductive rollers, sponge rollers and running rollers, and at least one electroplating area is distributed on the electroplating mechanism.

[0013] Preferably, the electroplating tank has a double-layer structure.

[0014] Preferably, the conductive roller is connected to the cathode conductive member, and the cathode conductive member is connected to the anode conductive member.

[0015] The beneficial technical effects of the present utility model:

[0016] A conductive mechanism for double-sided electroplating of crystalline silicon plates provided by the present utility model. When the photovoltaic panel passes between two water-blocking rollers, the potion is blocked by the water-blocking rollers, so that the photovoltaic panel is immersed in the potion. The cathode electricity is transmitted to the photovoltaic panel through the conductive tube and conductive roller, so that the cathode current on the photovoltaic panel and the anode electricity are provided in the tank body to form a current loop, thereby plating copper on the surface of the photovoltaic panel. The upper and lower rollers of each group of rollers are made of different materials. Except that the upper and lower parts of the conductive roller are made of stainless steel for convenient current transmission, the other water-blocking wheels and transmission gears are different in material. The upper roller has a lower density and the lower roller has a higher density; ensuring that the photovoltaic panel is not cracked or deformed. The conductive system includes a conductive roller, a rectifier, an anode plate and corresponding cables, etc. The rectifier provides a stable direct current for the entire electroplating. The conductive roller is connected to the cathode electricity and finally conducts the cathode electricity to the photovoltaic panel. The anode plate is connected to the anode electricity and serves as the electroplating anode to achieve double-sided synchronous electroplating. There is an electroplating area between two groups of conductive rollers, sponge rollers and running rollers, and multiple electroplating areas are spliced together. Description of the Drawings

[0017] Figure 1 It is a schematic internal view of the electroplating structure according to a preferred embodiment of a conductive mechanism for double-sided electroplating of crystalline silicon plates of the present utility model;

[0018] Figure 2 It is a top view of the electroplating structure according to a preferred embodiment of a conductive mechanism for double-sided electroplating of crystalline silicon plates of the present utility model;

[0019] Figure 3 It is a schematic three-dimensional structure view of the whole device according to a preferred embodiment of a conductive mechanism for double-sided electroplating of crystalline silicon plates of the present utility model.

[0020] In the figure: 1. Electroplating mechanism; 2. Support leg; 3. Driving part; 4. Electroplating tank; 5. Roller 1; 6. Roller 2; 7. Driving wheel; 8. Conductive roller; 9. Anode conductive part; 10. Cathode conductive part; 11. Sponge roller; 12. Traveling roller; 13. Electroplating tank 1; 14. Electroplating tank 2. Detailed implementation mode

[0021] To make the technical solutions of the present invention clearer and more definite for those skilled in the art, the present invention will be further described in detail below in conjunction with embodiments and the accompanying drawings. However, the implementation modes of the present invention are not limited thereto.

[0022] As Figure 1 - Figure 3 shown, a conductive mechanism for double-sided electroplating of crystalline silicon plates provided in this embodiment includes an electroplating mechanism 1 for electroplating;

[0023] An electroplating tank 4 is installed in the electroplating mechanism 1. The electroplating tank 4 is composed of an electroplating tank 13 and an electroplating tank 14. Roller 1 5 is distributed in the electroplating tank 13, roller 2 6 is distributed in the electroplating tank 14, and conductive roller 8, sponge roller 11 and traveling roller 12 are distributed in the electroplating tank 13 and the electroplating tank 14;

[0024] Positive and negative electrode connection structures are installed on the conductive roller 8, sponge roller 11 and traveling roller 12, and a driving component structure is installed in the electroplating mechanism 1.

[0025] The positive and negative electrode connection structures include an anode conductive part 9 and a cathode conductive part 10. Traveling rollers 12 are alternately installed on one side of the conductive roller 8, sponge roller 11 and traveling roller 12, and a cathode conductive part 10 is installed between the conductive roller 8, sponge roller 11 and traveling roller 12.

[0026] The driving component structure includes a support leg 2 and a driving part 3. A driving part 3 is installed on one side of the electroplating tank 4 in the electroplating mechanism 1, and a support leg 2 is installed on the electroplating mechanism 1.

[0027] There is an electroplating area between every two groups of conductive roller 8, sponge roller 11 and traveling roller 12, and at least one electroplating area is distributed on the electroplating mechanism 1.

[0028] The electroplating tank 4 is of a double-layer structure.

[0029] The conductive roller 8 is connected to the cathode conductive part 10, and the cathode conductive part 10 is connected to the anode conductive part 9.

[0030] As Figure 1 - Figure 3As shown in the figure, the working process of a conductive mechanism for double-sided electroplating of crystalline silicon plates provided in this embodiment is as follows: When the photovoltaic panel passes between two water-blocking rollers, the water-blocking rollers block the chemical solution, immersing the photovoltaic panel in the chemical solution. The cathode electricity is transmitted to the photovoltaic panel through the conductive tube and conductive roller 8, so that the cathode current on the photovoltaic panel and the anode electricity provided in the tank form a current loop, thereby plating copper on the surface of the photovoltaic panel. The upper and lower rollers of each group of rollers are made of different materials. Except that the upper and lower parts of the conductive roller 8 are made of stainless steel to facilitate current transmission, the other water-blocking wheels and transmission gears 7 are different in material. The upper rollers have a lower density, and the lower rollers have a higher density; to ensure that the photovoltaic panel is not cracked or deformed. The conductive system includes a conductive roller, a rectifier, an anode plate, and corresponding cables. The rectifier provides a stable DC current for the entire electroplating process. The conductive roller is connected to the cathode electricity and finally conducts the cathode electricity to the photovoltaic panel. The anode plate is connected to the anode electricity and serves as the electroplating anode.

[0031] Embodiment

[0032] As Figure 1 - Figure 3 As shown in the figure, an electroplating tank 13 and an electroplating tank 14 are installed in the electroplating tank 4 of the electroplating mechanism 1. Rollers 5 are distributed in the electroplating tank 13, and rollers 6 are distributed in the electroplating tank 14. Rolling gears 7 are sleeved on the outer ends of the rollers 5 and rollers 6. In the electroplating tank 13 and electroplating tank 14, the rollers 5 and rollers 6 are grouped in sets of 5. A conductive roller 8 is located in the middle of the rollers 5 and rollers 6. Sponge rollers 11 are installed on both sides of the conductive roller 8. A running roller 12 is located outside the sponge roller 11. An anode conductive member 9 is installed between the rollers 5 and rollers 6 in the electroplating tank 4. Cathode conductive members 10 are installed on both sides of the anode conductive member 9. When the photovoltaic panel passes between two water-blocking rollers, the water-blocking rollers block the chemical solution, immersing the photovoltaic panel in the chemical solution. The cathode electricity is transmitted to the photovoltaic panel through the conductive tube and conductive roller 8, so that the cathode current on the photovoltaic panel and the anode electricity provided in the tank form a current loop, thereby plating copper on the surface of the photovoltaic panel. The upper and lower rollers of each group of rollers are made of different materials. Except that the upper and lower parts of the conductive roller 8 are made of stainless steel to facilitate current transmission, the other water-blocking wheels and transmission gears 7 are different in material. The upper rollers have a lower density, and the lower rollers have a higher density; to ensure that the photovoltaic panel is not cracked or deformed. The conductive system includes a conductive roller, a rectifier, an anode plate, and corresponding cables. The rectifier provides a stable DC current for the entire electroplating process. The conductive roller is connected to the cathode electricity and finally conducts the cathode electricity to the photovoltaic panel. The anode plate is connected to the anode electricity and serves as the electroplating anode, realizing double-sided synchronous electroplating. An electroplating area is formed between two groups of conductive rollers 8, sponge rollers 11, and running rollers 12, and multiple electroplating areas are spliced together.

[0033] As described above, these are only further embodiments of the present utility model, but the protection scope of the present utility model is not limited thereto. Any person skilled in the art within the scope disclosed by the present utility model, making equivalent substitutions or changes according to the technical solution and concept of the present utility model, shall fall within the protection scope of the present utility model.

Claims

1. A conductive mechanism for double-sided electroplating of a crystalline silicon plate, comprising an electroplating mechanism (1) for electroplating; Features: The electroplating mechanism (1) is provided with an electroplating box (4), the electroplating box (4) is composed of an electroplating box 1 (13) and an electroplating box 2 (14), a roller 1 (5) is distributed in the electroplating box 1 (13), a roller 2 (6) is distributed in the electroplating box 2 (14), and a conductive roller (8), a sponge roller (11) and a reel roller (12) are distributed in the electroplating box 1 (13) and the electroplating box 2 (14); The conductive roller (8), the sponge roller (11) and the running roller (12) are provided with positive and negative electrode connection structures, and the electroplating mechanism (1) is provided with a driving component structure.

2. The conductive mechanism for double-sided electroplating of a crystalline silicon plate according to claim 1, characterized in that: The positive and negative electrode connection structure comprises an anode conductive member (9) and a cathode conductive member (10), and the conductive roller (8), the sponge roller (11) and the row roller (12) are alternately installed on one side, and the cathode conductive member (10) is installed between the conductive roller (8), the sponge roller (11) and the row roller (12).

3. The conductive mechanism for double-sided electroplating of a crystalline silicon plate according to claim 2, characterized in that: The driving component structure comprises a supporting leg (2) and a driving member (3); the driving member (3) is installed on one side of an electroplating box (4) in an electroplating mechanism (1); and the supporting leg (2) is installed on the electroplating mechanism (1).

4. The conductive mechanism for double-sided electroplating of a crystalline silicon plate according to claim 3, characterized in that: There is an electroplating area between every two groups of conductive rollers (8), sponge rollers (11) and running rollers (12), and at least one electroplating area is distributed on the electroplating mechanism (1).

5. The conductive mechanism for double-sided electroplating of a crystalline silicon plate according to claim 4, characterized in that: The electroplating box (4) is a double-layer structure.

6. The conductive mechanism for double-sided electroplating of a crystalline silicon plate according to claim 5, characterized in that: The conductive roller (8) is connected to the cathode conductive member (10), and the cathode conductive member (10) is connected to the anode conductive member (9).

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