Post-pickling acid-base balance equipment for high-purity silicon production

Abstract

The utility model discloses post-pickling acid-base balance equipment for high-purity silicon production, which comprises a cleaning box, four support columns symmetrically distributed in pairs are fixedly mounted at the bottom of the cleaning box, a mounting frame is fixedly mounted on the inner wall of the bottom of the cleaning box, a conical sieve plate is movably mounted on the mounting frame, and a conical sieve plate is mounted on the conical sieve plate. A stirring mechanism for stirring the raw materials and a cleaning mechanism for flushing the raw materials are arranged on the cleaning box; the stirring mechanism comprises a mounting seat, a motor, a stirring shaft and two stirring rods. The raw material washing device is reasonable in design, good in practicability and capable of continuously stirring raw materials when the raw materials are washed, increasing the contact probability of the raw materials and clean water, improving the cleaning efficiency and cleaning quality of the raw materials, washing the raw materials from multiple angles, further improving the cleaning quality of the raw materials and further improving the cleaning efficiency of the raw materials after the raw materials are cleaned. And the raw materials are air-dried, the raw material drying efficiency is improved, and then the production efficiency is improved.

Description

Technical Field

[0001] The utility model relates to the technical field of high-purity silicon production equipment, in particular to an acid-base balance equipment after pickling for high-purity silicon production. Background Technique

[0002] Silicon is a chemical element with the chemical symbol Si and formerly known as silicium. Its atomic number is 14, and its relative atomic mass is 28.0855. It has two allotropes, amorphous silicon and crystalline silicon, and belongs to the metalloid elements in Group IVA of the third period of the periodic table. Silicon is also a very common element. However, it rarely appears in nature in the form of a simple substance, but exists widely in rocks, gravel, and dust in the form of complex silicates or silicon dioxide. Silicon ranks eighth in the reserves in the universe. In the process of preparing high-purity silicon, it is necessary to balance the acid-base after pickling for the next step of operation. In the existing acid-base balance equipment, the position of the nozzle is usually fixedly set when flushing the raw materials. The problem caused by this is that the flushing range is limited, and the flushing time needs to be increased, which has certain limitations.

[0003] For the above problems, a high-purity silicon processing acid-base balance equipment after pickling announced in the Chinese patent with the publication number CN210176467U has the following technical key points: a shell and legs, a plurality of legs are uniformly fixed on the lower surface of the shell, a drying mechanism is installed at the bottom end of the power mechanism, the drying mechanism is movably connected to the top end of the shell, water inlet mechanisms are installed at the upper left corner and the upper right corner inside the shell, a support frame is fixedly connected at a position slightly below the middle inside the shell, a water outlet is opened at the bottom end of the shell, and a ball valve is installed at the water outlet position of the shell.

[0004] The above solution is found to still have at least the following defects in actual operation: when the equipment cleans the raw materials, it needs to consume a large amount of water resources, and during the cleaning process, the inside of the raw materials cannot be cleaned, resulting in poor cleaning quality. Therefore, we propose an acid-base balance equipment after pickling for high-purity silicon production to solve the above problems. Content of the Utility Model

[0005] (I) Technical Problems to be Solved

[0006] Aiming at the deficiencies of the prior art, the utility model provides an acid-base balance equipment after pickling for high-purity silicon production, which solves the problems that a large amount of water resources need to be consumed when cleaning the raw materials, and the inside of the raw materials cannot be cleaned during the cleaning process, resulting in poor cleaning quality.

[0007] (II) Technical Solutions

[0008] To achieve the above object, the present utility model provides the following technical solutions: An acid-base balance device after pickling for high-purity silicon production, comprising a cleaning tank. Four support columns are fixedly installed at the bottom of the cleaning tank and are symmetrically distributed in pairs. An installation frame is fixedly installed on the inner bottom wall of the cleaning tank. A conical sieve plate is movably installed on the installation frame. A stirring mechanism for stirring the raw materials and a cleaning mechanism for flushing the raw materials are provided on the cleaning tank; The stirring mechanism includes a mounting seat, a motor, a stirring shaft and two stirring rods. The mounting seat is fixedly installed on the top of the cleaning tank. The motor is fixedly installed on the mounting seat. The stirring shaft is fixedly installed at the output shaft end of the motor. The bottom end of the stirring shaft extends into the cleaning tank. The two stirring rods are both fixedly installed on the stirring shaft and are symmetrically distributed; The cleaning mechanism includes an annular pipe, a plurality of connecting rods, a plurality of spray heads, a plurality of conduits, a water pump, a water outlet pipe, a mounting frame, a water tank and a water suction pipe. The annular pipe is fixedly installed in the cleaning tank. The plurality of connecting rods are all fixedly installed at the bottom of the annular pipe and are distributed in an annular array. The plurality of spray heads are respectively fixedly installed at the bottom ends of the corresponding connecting rods. The plurality of conduits are respectively fixedly installed on the plurality of spray heads. One end of each of the plurality of conduits away from the corresponding spray head is fixedly connected to the annular pipe. The water pump is fixedly installed on the top of the cleaning tank. The water outlet pipe is fixedly installed at the output end of the water pump. One end of the water outlet pipe away from the water pump is fixedly connected to the annular pipe. The mounting frame is fixedly installed at the bottom of the cleaning tank. The water tank is movably installed on the mounting frame. The water suction pipe is fixedly installed at the input end of the water pump. One end of the water suction pipe away from the water pump extends below the liquid level in the water tank.

[0009] Preferably, the inner bottom wall of the cleaning tank is of a funnel-shaped structure. A discharge pipe is fixedly installed at the bottom of the cleaning tank. The bottom end of the discharge pipe is fixedly connected to the water tank. A discharge valve is fixedly installed on the discharge pipe. A water injection port is opened at the top of the water tank. A rubber plug is threadedly installed in the water injection port.

[0010] Preferably, a feed hopper is fixedly installed on the top of the cleaning tank. A feed adjustment plate is slidably installed on the feed hopper.

[0011] Preferably, a blower is fixedly installed on the top of the cleaning tank on the left side of the feed hopper. An air duct is fixedly installed at the air outlet end of the blower. One end of the air duct away from the blower is fixedly connected to the annular pipe. A gas check valve is fixedly installed on the air duct.

[0012] Preferably, a liquid check valve is fixedly installed on the water outlet pipe.

[0013] Preferably, a material taking port is opened at the rear side of the cleaning tank. A box door is rotatably installed in the material taking port. A handle is fixedly installed on the box door.

[0014] (III) Beneficial effects

[0015] The present utility model provides an acid-base balance device after pickling for high-purity silicon production. It has the following

[0016] Beneficial effects:

[0017] (1) The acid-base balance equipment after pickling for high-purity silicon production can continuously stir the raw materials when they are being rinsed by using a stirring mechanism composed of a mounting base, a motor, a stirring shaft and two stirring rods, increasing the contact probability between the raw materials and clean water, and improving the cleaning efficiency and quality of the raw materials.

[0018] (2) The acid-base balance equipment after pickling for high-purity silicon production can rinse the raw materials from multiple angles by using a cleaning mechanism composed of an annular pipe, multiple connecting rods, multiple spray heads, multiple conduits, a water pump, a water outlet pipe, a mounting frame, a water tank and a water suction pipe, further improving the cleaning quality of the raw materials.

[0019] (3) The acid-base balance equipment after pickling for high-purity silicon production can perform an air-drying operation on the raw materials after cleaning them by using the combined action of a fan, a duct, a gas check valve, an annular pipe, multiple spray heads and multiple conduits, improving the efficiency of drying the raw materials, and thus improving the production efficiency. Brief description of the drawings

[0020] Figure 1 is a three-dimensional structural schematic diagram of the present utility model;

[0021] Figure 2 is a sectional structural schematic diagram of the front view of the present utility model;

[0022] Figure 3 is Figure 2 an enlarged schematic diagram of part A in

[0023] Figure 4 is a sectional structural schematic diagram inside the present utility model.

[0024] In the figure: 1. Cleaning tank; 2. Support column; 3. Mounting frame; 4. Conical sieve plate; 5. Mounting base; 6. Motor; 7. Stirring shaft; 8. Stirring rod; 9. Annular pipe; 10. Connecting rod; 11. Spray head; 12. Conduit; 13. Water pump; 14. Water outlet pipe; 15. Mounting frame; 16. Water tank; 17. Water suction pipe; 18. Discharge pipe; 19. Discharge valve; 20. Rubber plug; 21. Feed hopper; 22. Fan; 23. Duct; 24. Gas check valve; 25. Liquid check valve. Detailed implementation manners

[0025] The following will clearly and completely describe the technical solutions in the embodiments of the present utility model in conjunction with the accompanying drawings in the embodiments of the present utility model. Obviously, the described embodiments are only a part of the embodiments of the present utility model, rather than all of the embodiments. All other embodiments obtained by those of ordinary skill in the art based on the embodiments of the present utility model without creative efforts shall fall within the protection scope of the present utility model.

[0026] As Figures 1-4 shown, the present utility model provides a technical solution: an acid-base balance device after pickling for high-purity silicon production, including a cleaning tank 1. A material taking port is opened at the rear side of the cleaning tank 1. A tank door is rotatably installed in the material taking port, and a handle is fixedly installed on the tank door. Four support columns 2 are fixedly installed at the bottom of the cleaning tank 1 and are symmetrically distributed in pairs. An installation frame 3 is fixedly installed on the inner wall of the bottom of the cleaning tank 1. A conical sieve plate 4 is movably installed on the installation frame 3. It should be noted that the pores of the sieve plate 4 are relatively small, and only liquids such as clear water are allowed to pass through. A stirring mechanism for stirring the raw materials and a cleaning mechanism for rinsing the raw materials are provided on the cleaning tank 1. The stirring mechanism includes an installation seat 5, a motor 6, a stirring shaft 7, and two stirring rods 8. The installation seat 5 is fixedly installed on the top of the cleaning tank 1. The motor 6 is fixedly installed on the installation seat 5. The motor 6 is used to drive the stirring shaft 7 to rotate. The stirring shaft 7 is fixedly installed at the output shaft end of the motor 6. The bottom end of the stirring shaft 7 extends into the cleaning tank 1. The two stirring rods 8 are both fixedly installed on the stirring shaft 7 and are symmetrically distributed.

[0027] In this embodiment, the above-mentioned cleaning mechanism includes an annular pipe 9, a plurality of connecting rods 10, a plurality of spray nozzles 11, a plurality of conduits 12, a water pump 13, a water outlet pipe 14, a mounting frame 15, a water tank 16 and a water suction pipe 17. The annular pipe 9 is fixedly installed in the cleaning tank 1. The plurality of connecting rods 10 are all fixedly installed at the bottom of the annular pipe 9 and are distributed in a circular array. The plurality of spray nozzles 11 are respectively fixedly installed at the bottom ends of the corresponding connecting rods 10. By using the plurality of spray nozzles 11, the raw materials can be rinsed from multiple angles, improving the cleaning quality of the raw materials. The plurality of conduits 12 are respectively fixedly installed on the plurality of spray nozzles 11. One end of each of the plurality of conduits 12 away from the corresponding spray nozzle 11 is fixedly connected to the annular pipe 9. The water pump 13 is fixedly installed on the top of the cleaning tank 1. The water outlet pipe 14 is fixedly installed at the output end of the water pump 13. One end of the water outlet pipe 14 away from the water pump 13 is fixedly connected to the annular pipe 9. A liquid one-way valve 25 is fixedly installed on the water outlet pipe 14. By using the liquid one-way valve 25, air leakage and liquid backflow will not occur when the raw materials are air-dried. The mounting frame 15 is fixedly installed at the bottom of the cleaning tank 1. The water tank 16 is movably installed on the mounting frame 15. The water suction pipe 17 is fixedly installed at the input end of the water pump 13. One end of the water suction pipe 17 away from the water pump 13 extends below the liquid level in the water tank 16. It should be noted that a filter is fixedly installed at the end of the water suction pipe 17 located in the water tank 16 to prevent impurities from blocking the spray nozzles 11.

[0028] In this embodiment, a blower 22 is fixedly installed on the top of the above-mentioned cleaning tank 1 to the left of the feed hopper 21. An air duct 23 is fixedly installed at the air outlet end of the blower 22. One end of the air duct 23 away from the blower 22 is fixedly connected to the annular pipe 9. A gas one-way valve 24 is fixedly installed on the air duct 23. By using the gas one-way valve 24, clear water will not flow back through the air duct 23 when the raw materials are being cleaned. A feed hopper 21 is fixedly installed on the top of the cleaning tank 1. A feed adjustment plate is slidably installed on the feed hopper 21. The inner bottom wall of the cleaning tank 1 is in a funnel-shaped structure. A discharge pipe 18 is fixedly installed at the bottom of the cleaning tank 1. The bottom end of the discharge pipe 18 is fixedly connected to the water tank 16. Through the above settings, the water for cleaning the raw materials can be recycled. After precipitation and filtration, it can still be used for cleaning the raw materials, reducing water resource waste. A discharge valve 19 is fixedly installed on the discharge pipe 18. A water injection port is opened at the top of the water tank 16. A rubber plug 20 is threadedly installed in the water injection port.

[0029] In this embodiment, a control switch is installed on the cleaning tank 1. The motor 6, the water pump 13, the blower 22 and the control switch are electrically connected in sequence through wires to an external power supply line to form a circuit. The control switch can respectively control the start and stop of the motor 6, the water pump 13 and the blower 22.

[0030] With the above structure, an acid-base balance device for high-purity silicon production provided by the utility model can continuously stir the raw materials when the raw materials are being rinsed, increasing the contact probability between the raw materials and clean water, improving the cleaning efficiency and quality of the raw materials, rinsing the raw materials from multiple angles to further improve the cleaning quality of the raw materials, and can also perform an air-drying operation on the raw materials after cleaning, improving the efficiency of raw material drying, and thus improving the production efficiency. During specific use, an appropriate amount of raw materials is added into the cleaning tank 1 through the feed hopper 21, and the raw materials will accumulate on the conical sieve plate 4. The motor 6 and the water pump 13 are controlled to operate. The motor 6 drives the stirring shaft 7 to rotate, and the stirring shaft 7 drives the two stirring rods 8 to stir the raw materials. The water pump 13 pumps the clean water in the water tank 16, pressurizes and conveys it into the annular pipe 9, and rinses the raw materials from multiple angles through the multiple nozzles 11, greatly improving the cleaning efficiency and quality of the raw materials. The impurities and mixed sewage in the raw materials pass through the conical sieve plate 4, and the raw materials are retained on the conical sieve plate 4. When there is more sewage at the bottom of the cleaning tank 1, the discharge valve 19 can be opened to introduce the sewage into the water tank 16. If the water quality is too poor, the water in the water tank 16 can be replaced. After the raw materials are cleaned, the water pump 13 is turned off and the operating power of the motor 6 is reduced to slow down the rotation speed. The fan 22 is controlled to operate, extracting the external air and accelerating the blowing towards the raw materials to accelerate the drying of the raw materials, facilitating the next operation and improving the production efficiency.

[0031] As described above, the above is only the specific implementation manner of the utility model, but the protection scope of the utility model is not limited thereto. Any person skilled in the art in the technical field recorded by the utility model can easily think of changes or substitutions within the technical scope recorded by the utility model, and all should be covered by the protection scope of the utility model. Therefore, the protection scope of the utility model should be subject to the protection scope of the claims.

Claims

1. A post-pickling acid-base balance device for high-purity silicon production, characterized in that: The invention comprises a cleaning box (1), wherein four supporting columns (2) are fixedly mounted on the bottom of the cleaning box (1) and are symmetrically distributed in pairs, a mounting frame (3) is fixedly mounted on the inner wall of the bottom of the cleaning box (1), a conical sieve plate (4) is movably mounted on the mounting frame (3), and the cleaning box (1) is provided with a stirring mechanism for stirring the raw materials and a cleaning mechanism for flushing the raw materials; The stirring mechanism comprises a mounting seat (5), a motor (6), a stirring shaft (7) and two stirring rods (8); the mounting seat (5) is fixedly mounted on the top of the cleaning box (1); the motor (6) is fixedly mounted on the mounting seat (5); the stirring shaft (7) is fixedly mounted on the output shaft end of the motor (6); the bottom end of the stirring shaft (7) extends into the cleaning box (1); and the two stirring rods (8) are fixedly mounted on the stirring shaft (7) and are symmetrically distributed. The cleaning mechanism comprises an annular tube (9), a plurality of connecting rods (10), a plurality of nozzles (11), a plurality of conduits (12), a water pump (13), a water outlet pipe (14), a mounting frame (15), a water tank (16) and a water suction pipe (17); the annular tube (9) is fixedly mounted in the cleaning tank (1); a plurality of connecting rods (10) are fixedly mounted at the bottom of the annular tube (9) and are distributed in an annular array; a plurality of nozzles (11) are respectively fixedly mounted at the bottom ends of the corresponding connecting rods (10); a plurality of conduits (12) are respectively fixedly mounted on the plurality of nozzles (11); and a plurality of conduits (12) are spaced apart from the corresponding nozzles (11). One end of the spray head (11) is fixedly connected to the annular tube (9), the water pump (13) is fixedly mounted on the top of the cleaning tank (1), the water outlet pipe (14) is fixedly mounted on the output end of the water pump (13), one end of the water outlet pipe (14) away from the water pump (13) is fixedly connected to the annular tube (9), the mounting frame (15) is fixedly mounted on the bottom of the cleaning tank (1), the water tank (16) is movably mounted on the mounting frame (15), the water suction pipe (17) is fixedly mounted on the input end of the water pump (13), and one end of the water suction pipe (17) away from the water pump (13) extends below the liquid level in the water tank (16).

2. The post-pickling acid-base balancing device for high-purity silicon production according to claim 1, characterized in that: The inner wall of the bottom of the cleaning box (1) is funnel-shaped, and a discharge pipe (18) is fixedly installed at the bottom of the cleaning box (1), and the bottom end of the discharge pipe (18) is fixedly connected to the water tank (16).

3. The post-pickling acid-base balancing device for high-purity silicon production according to claim 2, characterized in that: A discharge valve (19) is fixedly mounted on the discharge pipe (18), and a water injection port is provided on the top of the water tank (16), wherein a rubber plug (20) is installed in the inner thread of the water injection port.

4. The post-acid-washing acid-base balance equipment for high-purity silicon production according to claim 1, characterized in that: A feed hopper (21) is fixedly mounted on the top of the cleaning box (1), and a feed adjustment plate is slidably mounted on the feed hopper (21).

5. The post-acid-washing acid-base balancing equipment for high-purity silicon production according to claim 4, characterized in that: A fan (22) located on the left side of the feed hopper (21) is fixedly mounted on the top of the cleaning box (1); an air guide pipe (23) is fixedly mounted on the air outlet end of the fan (22); one end of the air guide pipe (23) away from the fan (22) is fixedly connected to the annular pipe (9); and a gas one-way valve (24) is fixedly mounted on the air guide pipe (23).

6. The post-acid washing acid-base balance equipment for high-purity silicon production according to claim 1, characterized in that: A liquid one-way valve (25) is fixedly installed on the water outlet pipe (14).

7. The post-acid washing acid-base balance equipment for high-purity silicon production according to claim 1, characterized in that: The rear side of the cleaning box (1) is provided with a material taking opening, a box door is rotatably mounted in the material taking opening, and a handle is fixedly mounted on the box door.

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