Rapid positioning ion etching system

Abstract

The utility model relates to the field of semiconductors, in particular to a fast positioning ion etching system, which comprises an etching jig which suddenly stops after being driven by a power source to linearly advance, and a base positioning groove for positioning a base is arranged on the surface of the etching jig along the advancing direction of the etching jig; from top to bottom, the base positioning groove is designed in a closing-up shape, a front guide inclined plane is arranged at the front end of the base positioning groove in the advancing direction of the etching jig, and a two-section type inclined plane is arranged at the rear end of the base positioning groove and comprises a rear first guide inclined plane and a rear second guide inclined plane which are sequentially arranged from bottom to top; the gradient of the second rear guide slope is larger than that of the first rear guide slope. According to the utility model, the front and back positions of each base can be consistent with the ion etching position, so that ion etching is smoothly carried out, and the problem of abnormal resistance caused by non-correspondence of the front and back positions of the vibrating arms of the tuning fork of the base is avoided.

Description

Technical Field

[0001] The utility model relates to the field of semiconductors, and specifically relates to an ion etching system with rapid positioning. Background Art

[0002] With the progress of technology and the change of market applications, quartz crystal resonators show a development trend towards miniaturization, high precision, and low power consumption. Secondly, quartz crystal resonators are developing towards higher precision and higher stability. Quartz crystal resonators are gradually miniaturized, thinned, and chip-shaped, which poses greater challenges for improving their precision and stability. From the perspective of market applications, quartz crystal resonators provide stable clock frequencies for electronic products, and their precision and stability have a crucial impact on the quality, performance, and later maintenance costs of downstream products.

[0003] As described in the existing miniaturized tuning fork products such as the patent number "CN219999347U", which includes two groups of vibrating arms arranged in parallel. After the tuning fork product is fixed on the base of the product, ion etching needs to be carried out at the designated positions of the two groups of vibrating arms of the tuning fork product. In the existing ion etching, the base of the product is often placed in the positioning groove of the etching fixture first. The notch of the positioning groove of the etching fixture is designed to be larger than the size of the base, so that the base can be smoothly placed into the positioning groove. After the base is placed in the positioning groove, it is necessary to manually adjust the front and back positions of the base to make the positions of the vibrating arms of the tuning fork on the base correspond to the ion etching positions front and back. If the front and back positions do not correspond, it is easy to cause abnormal resistance of the product. Adjusting the position of the base manually is time-consuming and laborious, and the efficiency is extremely low. Therefore, it needs to be solved urgently. Summary of the Utility Model

[0004] In order to avoid and overcome the technical problems existing in the prior art, the utility model provides an ion etching system with rapid positioning. The utility model can make the front and back positions of each base consistent with the ion etching positions, so as to smoothly carry out ion etching and avoid the problem of abnormal resistance caused by the non-corresponding front and back positions of the vibrating arms of the base tuning fork.

[0005] To achieve the above object, the utility model provides the following technical solutions:

[0006] An ion etching system with rapid positioning includes an etching fixture that moves linearly under the drive of a power source and then stops suddenly. A base positioning groove for positioning the base is opened on the surface of the etching fixture along the traveling direction of the etching fixture. From top to bottom, the base positioning groove is designed in a converging shape. Along the traveling direction of the etching fixture, a front guiding slope is opened at the front end of the base positioning groove, and a two-stage slope is opened at the rear end of the base positioning groove, including a rear first guiding slope and a rear second guiding slope arranged in sequence from bottom to top. The slope of the rear second guiding slope is greater than that of the rear first guiding slope.

[0007] As a further solution of the present utility model: The distance between the top surface of the rear first guiding inclined surface and the bottom surface of the front guiding inclined surface corresponds to the length of the base.

[0008] As a further solution of the present utility model: The slopes of the front guiding inclined surface and the rear second guiding inclined surface are both 75 degrees, and the slope of the rear first guiding inclined surface is 30 degrees.

[0009] As a further solution of the present utility model: The four corner ends of the base positioning groove are provided with outward-expanded arc-shaped openings.

[0010] As a further solution of the present utility model: Clamping openings for clamping the base are symmetrically arranged on both sides of the base positioning groove.

[0011] As a further solution of the present utility model: The ion etching surface of the base is arranged downward, and ion etching holes are provided on the groove bottom surface of the base positioning groove; the power source is a linear guide rail, the etching fixture is fixed on the slide of the linear guide rail, the ion etching machine is arranged below the linear guide rail and is offset from the sliding track position of the etching fixture, a buffer pad for stopping the etching fixture is provided on the linear guide rail, and the stopping position of the etching fixture corresponds vertically to the etching position of the ion etching machine.

[0012] As a further solution of the present utility model: Two groups of linear guide rails are arranged in parallel, fixture positioning holes are symmetrically arranged on both sides of the etching fixture, the etching fixture is fixedly connected to the sliders of the two linear guide rails through the fixture positioning holes, and the ion etching machine is fixedly connected to the two linear guide rails.

[0013] Compared with the prior art, the beneficial effects of the present utility model are:

[0014] 1. By providing guiding inclined surfaces with slopes at the front and rear ends of the base positioning groove of the etching fixture, and the guiding inclined surface at the rear end being a two-stage inclined surface, after the etching fixture is driven by the linear guide rail to move linearly and is instantaneously stopped, due to inertia, the base in the etching fixture slides along the inclined surfaces at the front and rear ends. Under the action of the slope difference, the tail end of the base abuts against the top end of the rear first guiding inclined surface, and the head end of the base abuts against the bottom surface of the front guiding inclined surface, being arranged in an inclined state with the rear end higher than the front end. The front and rear positions of each base are kept consistent, so that ion etching can be carried out smoothly, avoiding the problem of abnormal resistance caused by the inconsistent front and rear positions of the vibrating arms of the base tuning fork.

[0015] 2. By providing outward-expanded arc-shaped openings at the four corners of the base, the burrs at the corner ends of the base are prevented from rubbing against the notch; the clamping openings on both sides are provided to facilitate clamping out the base from the etching fixture by components such as clamping hands or tweezers after ion etching.

[0016] 3. The arrangement of the double linear guide rails of the present utility model can provide a stable driving force for the sliding of the etching fixture, and the etching fixture is stopped by the buffer pad to avoid damage caused by rigid collision of the etching fixture. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] Figure 1 It is a schematic structural diagram of the present utility model.

[0018] Figure 2 It is a schematic structural diagram of the etching fixture in the present utility model.

[0019] Figure 3 It is a top view of the fixture positioning hole in the present utility model.

[0020] Figure 4 It is a cross-sectional view of the fixture positioning hole in the present utility model.

[0021] In the figure:

[0022] 1. Etching fixture; 11. Base positioning groove; 111. Front guiding inclined surface;

[0023] 112. Rear first guiding inclined surface; 113. Rear second guiding inclined surface; 114. Ion etching hole;

[0024] 115. Arc-shaped opening; 116. Clamping opening; 12. Fixture positioning hole;

[0025] 2. Linear guide rail; 21. Buffer pad; 3. Ion etching machine. DETAILED DESCRIPTION OF THE EMBODIMENTS

[0026] Next, the technical solutions in the embodiments of the present utility model will be clearly and completely described in conjunction with the accompanying drawings in the embodiments of the present utility model. Obviously, the described embodiments are only a part of the embodiments of the present utility model, rather than all the embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present utility model.

[0027] Please refer to Figures 1 to 4 , in the embodiment of the present utility model, a rapid positioning ion etching system includes two groups of linear guide rails 2 arranged symmetrically left and right. The etching fixture 1 is fixed to the sliders on the two linear guide rails 2 by bolts through the fixture positioning holes 12 opened at the edges. The etching fixture 1 is driven by the linear guide rails 2 and slides from the head end to the tail end of the linear guide rails 2. Buffer pads 21 are provided at the tail ends of the two linear guide rails 2, and the etching fixture 1 is stopped after hitting the buffer pads 21.

[0028] An ion etching machine 3 is fixed between the two linear guide rails 2 directly below the stopping position of the etching fixture 1, and the ion etching machine 3 performs ion etching from bottom to top.

[0029] The central area of the etching fixture 1 is evenly provided with a base positioning groove 11 for fixing the product base. The groove length direction of the base positioning groove 11 is the same as the sliding direction of the etching fixture 1. The product base is placed into the base positioning groove 11, and the arrangement direction of the tuning fork vibrating arm in the product base is the same as the sliding direction of the etching fixture 1. The four corner ends of the base positioning groove 11 are provided with outward-expanded arc-shaped openings 115 to prevent the burrs at the four corner ends of the base from directly contacting the groove wall. The clamping openings 116 are symmetrically arranged on the left and right sides of the side surface of the base positioning groove 11 and are used to directly clamp and remove the base from the base positioning groove 11 after the ion etching is completed.

[0030] The overall size of the base positioning groove 11 is slightly larger than the size of the base to facilitate the placement of the base therein. The front end of the base positioning groove 11 is provided with a front guiding inclined surface 111, and the rear end of the base positioning groove 11 is provided with a two-stage inclined surface, including a rear first guiding inclined surface 112 and a rear second guiding inclined surface 113 arranged in sequence from bottom to top. The slope of the rear second guiding inclined surface 113 is greater than the slope of the rear first guiding inclined surface 112. The distance between the top surface of the rear first guiding inclined surface 112 and the bottom surface of the front guiding inclined surface 111 corresponds to the length of the base.

[0031] During the process of the forward movement of the etching fixture 1 being intercepted and stopped, under the guiding of the slope of the inclined surface due to inertia, it slides along the inclined surface and maintains the same attitude with the front end lower and the rear end higher. At this time, the position to be ion-etched exactly corresponds to the position of the ion etching hole 114 at the bottom of the base positioning groove 11. After the etching fixture 1 stops moving, the ion etching machine 3 starts to perform ion etching from bottom to top through the ion etching hole 114.

[0032] In a preferred embodiment, the slopes of the front guiding inclined surface 111 and the rear second guiding inclined surface 113 are equal, both being 75 degrees, and the slope of the rear first guiding inclined surface 112 is 30 degrees.

[0033] The basic principles of the present application have been described above in combination with specific embodiments. However, it should be noted that the advantages, advantages, effects, etc. mentioned in the present application are only examples and not limitations. It cannot be considered that these advantages, advantages, effects, etc. are essential for each embodiment of the present application. In addition, the above-disclosed specific details are only for the purposes of illustration and easy understanding, rather than limitations. The above details do not limit the present application to necessarily adopt the above specific details to implement.

[0034] The block diagrams of the devices, apparatuses, equipment, and systems involved in this application are only illustrative examples and are not intended to require or imply that they must be connected, arranged, and configured in the manner shown in the block diagrams. As those skilled in the art will recognize, these devices, apparatuses, equipment, and systems can be connected, arranged, and configured in any manner. Words such as "including," "comprising," "having," etc. are open-ended terms that mean "including but not limited to" and can be used interchangeably with each other. The word "or" and "and" used herein refer to the phrase "and / or" and can be used interchangeably with it, unless the context clearly indicates otherwise. The phrase "such as" used herein refers to the phrase "such as but not limited to" and can be used interchangeably with it.

Claims

1. A rapid positioning ion etching system, characterized in that, It includes an etching jig (1) that travels linearly driven by a power source and then suddenly stops. A base positioning groove (11) for positioning the base is provided on the surface of the etching jig (1) along the traveling direction of the etching jig (1); from top to bottom, the base positioning groove (11) is designed in a converging shape. Along the traveling direction of the etching jig (1), a front guiding inclined surface (111) is provided at the front end of the base positioning groove (11), and a two-stage inclined surface is provided at the rear end of the base positioning groove (11), including a rear first guiding inclined surface (112) and a rear second guiding inclined surface (113) arranged in sequence from bottom to top. The slope of the rear second guiding inclined surface (113) is greater than that of the rear first guiding inclined surface (112).

2. The ion etching system for rapid positioning according to claim 1, characterized in that, The distance between the top surface of the rear first guiding inclined surface (112) and the bottom surface of the front guiding inclined surface (111) corresponds to the length of the base.

3. The ion etching system for rapid positioning according to claim 1 or 2, characterized in that, The slopes of both the front guiding inclined surface (111) and the rear second guiding inclined surface (113) are 75 degrees, and the slope of the rear first guiding inclined surface (112) is 30 degrees.

4. A rapid positioning ion etching system according to claim 1 or 2, characterized in that, Expanded arc-shaped openings (115) are provided at the four corner ends of the base positioning groove (11).

5. A rapid positioning ion etching system according to claim 1 or 2, characterized in that, Clamping openings (116) for clamping the base are symmetrically provided on both sides of the base positioning groove (11).

6. A rapid positioning ion etching system according to claim 1 or 2, characterized in that, The ion etching surface of the base is arranged downward. Ion etching holes (114) are provided on the bottom surface of the base positioning groove (11); the power source is a linear guide rail (2), the etching jig (1) is fixed on the slider of the linear guide rail (2), the ion etching machine (3) is arranged below the linear guide rail (2) and is offset from the sliding track position of the etching jig (1), and a buffer pad (21) for stopping the etching jig (1) is provided on the linear guide rail (2). The stopping position of the etching jig (1) corresponds vertically to the etching position of the ion etching machine (3).

7. An ion etching system for rapid positioning according to claim 6, characterized in that, Two groups of the linear guide rails (2) are arranged in parallel. Fixture positioning holes (12) are symmetrically provided on both sides of the etching jig (1). The etching jig (1) is fixedly connected to the sliders of the two linear guide rails (2) through the fixture positioning holes (12), and the ion etching machine (3) is fixedly connected to the two linear guide rails (2).

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