Ultrahigh-purity graphite felt surface treatment device for semiconductors

Abstract

The utility model relates to the technical field of graphite felt dust removal, in particular to an ultra-pure graphite felt surface treatment device for a semiconductor. Comprising a shell, an unwinding roller on the left side of the shell and a winding roller on the right side of the shell, first guide rollers are installed above the left side and the right side of an inner cavity of the shell, second guide rollers are symmetrically installed below the middle of the inner cavity of the shell, a rotating disc is installed in the middle of the inner cavity of the shell, and a spring is fixedly installed on the outer wall of the rotating disc; a motor in transmission connection with the rotating disc is installed on one side of the back of the shell, dust collection mechanisms are installed at the top and the bottom of an inner cavity of the shell, and a dust sticking mechanism is installed on the upper portion of the right side of the shell. The graphite felt can be effectively beaten, impurities attached to the surface of the graphite felt can be shaken off, meanwhile, the graphite felt can be secondarily cleaned, secondary attachment of the impurities is avoided, and it is guaranteed that the surface of the graphite felt is clean.

Description

Technical Field

[0001] The utility model relates to the technical field of graphite felt dust removal, in particular to a surface treatment device for ultra-high purity graphite felt for semiconductors. Background Art

[0002] Ultra-high purity graphite for semiconductors is the raw material for manufacturing ultra-high purity graphite felt for semiconductors. According to the "Guiding Catalog for the First Batch of Applications of Key New Materials (2024 Edition)", the ash content of ultra-high purity graphite is ≤ 5 ppm; the contents of B, Al, and Fe are ≤ 0.01 ppm; and the resistivity (μΩ·m) is 11 - 15. During the production and preparation process of ultra-high purity graphite felt, some impurities will adhere to the felt body, and these impurities need to be removed during the production process.

[0003] Currently, cleaning is usually carried out by striking in combination with a brush. For example, in the prior art, there is a surface dust removal device for graphite felt processing with a publication number of CN219378128U, which includes a dust removal box and a feed slot opened on the back of the dust removal box. A fixed roller is rotatably installed between the two sides of the inner wall of the feed slot. A pressing roller is arranged on the top of the fixed roller, and a pressing component is arranged on the top of the pressing roller. The pressing component is arranged inside the dust removal box. Two brush plates are arranged inside the dust removal box. A driving component is arranged between the top of the brush plate and the top of the inner wall of the dust removal box, and the driving component is used to drive the brush plate to move vertically. An outlet slot is opened on the front of the dust removal box. Another example is an automatic dust suction device for carbon felt and graphite felt with a publication number of CN212397392U, which includes a dust removal box; a support column is fixedly installed at the bottom end of the inner cavity of the dust removal box, and a lower brush plate is fixedly installed at the upper end of the support column. A column is fixedly installed at the upper end of the inner cavity of the dust removal box. A sleeve is sleeved on the lower side of the column, and the sleeve is movably connected to the column. A spring is fixedly installed at the bottom end of the inner cavity of the sleeve, and the upper end of the spring is fixedly connected to the column. The lower end of the sleeve is fixedly connected to an upper brush plate, and brush hairs are fixedly connected to the lower end of the upper brush plate and the upper end of the lower brush plate. A vacuum cleaner is arranged at the upper end of the dust removal box. The left end of the vacuum cleaner is fixedly communicated with a dust suction pipe, and the dust suction pipe is placed inside the dust removal box. An outlet and an inlet are respectively opened on the left and right ends of the dust removal box. Support frames are fixedly installed on the left and right ends of the dust removal box. A unwinding roller and a winding roller are respectively arranged on the two support frames. A driven wheel is fixedly installed at the front end of the winding roller. A rotating motor is fixedly connected to the left end of the support frame, and a driving wheel is fixedly installed at the front end of the motor shaft of the rotating motor. The driving wheel and the driven wheel are connected by a belt.

[0004] The above devices have the following defects when in use: 1. During the process of patting the graphite felt, the shaken-off impurities are prone to being not sucked in time, resulting in secondary adhesion of the impurities. 2. The dust removal effect of striking the graphite felt is not good. Summary of the Utility Model

[0005] (1) Technical Problem to be Solved

[0006] To solve the above problems of the prior art, the present utility model provides a surface treatment device for ultra-high purity graphite felt used in semiconductors, which can effectively strike the graphite felt to shake off the impurities attached to the surface of the graphite felt, and at the same time can perform secondary cleaning on the graphite felt to avoid secondary attachment of impurities and ensure the cleanliness of the surface of the graphite felt.

[0007] (2) Technical Solution

[0008] To achieve the above object, the main technical solutions adopted by the present utility model include:

[0009] A surface treatment device for ultra-high purity graphite felt used in semiconductors, including a housing, a unwinding roller at the left side of the housing, and a winding roller at the right side of the housing. First guiding rollers are installed above the left and right sides of the inner cavity of the housing, second guiding rollers are symmetrically installed below the middle of the inner cavity of the housing, a rotating disk is installed in the middle of the inner cavity of the housing, springs are fixedly installed on the outer wall of the rotating disk, hitting balls are fixedly installed at the ends of the springs away from the rotating disk, a motor drivingly connected to the rotating disk is installed on one side of the back of the housing, dust suction mechanisms are installed at the top and bottom of the inner cavity of the housing, and a dust sticking mechanism is installed above the right side of the housing. It can effectively strike the graphite felt to shake off the impurities attached to the surface of the graphite felt, and at the same time can perform secondary cleaning on the graphite felt to avoid secondary attachment of impurities and ensure the cleanliness of the surface of the graphite felt.

[0010] Preferably, the dust suction mechanism includes a dust suction box, a dust suction pipe and a dust suction fan, and through holes are formed on the side of the dust suction box close to the inner cavity of the housing.

[0011] Preferably, it further includes a water tank, and the air outlet end of the dust suction fan is arranged below the liquid level of the water tank.

[0012] Preferably, the dust sticking mechanism includes a housing and dust sticking rollers symmetrically installed inside the housing.

[0013] Preferably, an air inlet is further provided at the side wall of the housing, and a filter grille is arranged inside the air inlet.

[0014] (3) Advantageous Effects

[0015] The present utility model provides a surface treatment device for ultra-high purity graphite felt used in semiconductors. It has the following advantageous effects:

[0016] (1), By driving the rotation of the hitting balls through the rotating disk, the hitting balls can strike the graphite felt during the conveying process, shake off the impurities attached to the outer wall of the graphite felt, and cooperate with the dust suction mechanism to extract the impurities.

[0017] (2) By using the dust adhesion mechanism, the impurities secondarily adhered to the graphite felt can be adhered. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] Figure 1 It is a structural diagram of the present utility model;

[0019] Figure 2 It is a rear view cross-sectional view of the present utility model.

[0020] In the figure: 1. Outer shell; 2. Unwinding roller; 3. Rewinding roller; 4. First guiding roller; 5. Second guiding roller; 6. Rotating disk; 7. Spring; 8. Striking ball; 9. Motor; 10. Dust suction mechanism; 11. Dust adhesion mechanism; 1001. Dust suction box; 1002. Dust suction pipe; 1003. Dust suction fan; 12. Through hole; 13. Water tank; 1101. Housing; 1102. Dust adhesion roller; 14. Filter grille. DETAILED DESCRIPTION OF THE EMBODIMENTS

[0021] Next, the technical solutions in the embodiments of the present utility model will be clearly and completely described in conjunction with the accompanying drawings in the embodiments of the present utility model. Obviously, the described embodiments are only a part of the embodiments of the present utility model, rather than all the embodiments. All other embodiments obtained by those of ordinary skill in the art based on the embodiments of the present utility model without creative efforts shall fall within the protection scope of the present utility model.

[0022] Embodiment 1:

[0023] As Figure 1-2 shown, a surface treatment device for ultra-high purity graphite felt for semiconductors includes an outer shell 1, an unwinding roller 2 at the left side of the outer shell 1, and a rewinding roller 3 at the right side of the outer shell 1. A first guiding roller 4 is installed above the left and right sides of the inner cavity of the outer shell 1. Second guiding rollers 5 are symmetrically installed below the middle part of the inner cavity of the outer shell 1. A rotating disk 6 is installed at the middle part of the inner cavity of the outer shell 1. A spring 7 is fixedly installed on the outer wall of the rotating disk 6. A striking ball 8 is fixedly installed at one end of the spring 7 away from the rotating disk 6. A motor 9 drivingly connected to the rotating disk 6 is installed on one side of the back of the outer shell 1. During the process of the motor 9 driving the rotating disk 6 to rotate, the rotating disk 6 drives the striking ball 8 to rotate to strike the graphite felt, shaking off the impurities adhered to the outer wall of the graphite felt. A dust suction mechanism 10 is installed at the top and bottom of the inner cavity of the outer shell 1. The dust suction mechanism 10 is used to suck the shaken-off impurities. A dust adhesion mechanism 11 is installed above the right side of the outer shell 1. The dust adhesion mechanism 11 performs secondary adhesion cleaning on the outer wall of the graphite felt.

[0024] Embodiment 2:

[0025] The dust suction mechanism 10 includes a dust suction box 1001, a dust suction pipe 1002, and a dust suction fan 1003. A through hole 12 is provided on one side of the dust suction box 1001 close to the inner cavity of the outer shell 1. The dust suction fan 1003 extracts the air with impurities inside the outer shell 1 through the dust suction pipe 1002 and the dust suction box 1001.

[0026] Embodiment 3:

[0027] It further includes a water tank 13, and the air outlet end of the dust suction fan 1003 is arranged below the liquid level of the water tank 13. The air with impurities will be filtered by water during the discharge process.

[0028] Furthermore, the dust adhesion mechanism 11 includes a housing 1101 and dust adhesion rollers 1102 symmetrically installed inside the housing 1101. The dust adhesion rollers 1102 are used to adhere to the impurities on the outer wall of the graphite felt.

[0029] Furthermore, an air inlet is also provided at the side wall of the outer shell 1, and a filter grille 14 is arranged inside the air inlet. The outside air is filtered by the filter grille 14 and then supplemented into the outer shell 1.

[0030] Working principle: After the surface of the graphite felt unrolled by the unrolling roller 3 is cleaned, it is wound by the winding roller 2. During the process that the motor 9 drives the rotating disk 6 to rotate, the rotating disk 6 drives the hitting ball 8 to rotate to hit the graphite felt, shaking off the impurities attached to the outer wall of the graphite felt. The dust suction fan 1003 extracts the air with impurities inside the outer shell 1 through the dust suction pipe 1002 and the dust suction box 1001. The air with impurities is extracted through the through hole 12. The outside air is filtered by the filter grille 14 and then supplemented into the outer shell 1. When the graphite felt passes through the dust adhesion mechanism 11, the dust adhesion rollers 1102 can adhere to the impurities on the outer wall of the graphite felt to achieve secondary cleaning.

Claims

1. An ultra-high purity graphite felt surface treatment device for semiconductors, characterized in that: It includes a housing (1), an unwinding roller (2) located on the left side of the housing (1), and a winding roller (3) located on the right side of the housing (1). At the upper positions on the left and right sides of the inner cavity of the housing (1), a first guiding roller (4) is installed. Symmetrically installed at the lower position in the middle of the inner cavity of the housing (1) are second guiding rollers (5). At the middle position of the inner cavity of the housing (1), a rotating disk (6) is installed. A spring (7) is fixedly installed on the outer wall of the rotating disk (6). One end of the spring (7) far from the rotating disk (6) is fixedly installed with a striking ball (8). On one side of the back of the housing (1), a motor (9) drivingly connected to the rotating disk (6) is installed. At the top and bottom positions of the inner cavity of the housing (1), a dust suction mechanism (10) is installed. At the upper position on the right side of the housing (1), a dust sticking mechanism (11) is installed.

2. The surface treatment device for ultra-high purity graphite felt for semiconductor according to claim 1, wherein: The dust suction mechanism (10) includes a dust suction box (1001), a dust suction pipe (1002), and a dust suction fan (1003). A through hole (12) is formed on one side of the dust suction box (1001) close to the inner cavity of the housing (1).

3. The surface treatment device for ultra-high purity graphite felt for semiconductors according to claim 1, characterized in that: It further includes a water pool (13), and the air outlet end of the dust suction fan (1003) is arranged below the liquid level of the water pool (13).

4. The surface treatment device for ultra-high purity graphite felt for semiconductors according to claim 1, characterized in that: The dust sticking mechanism (11) includes a housing (1101) and dust sticking rollers (1102) symmetrically installed inside the housing (1101).

5. The surface treatment device for ultra-high purity graphite felt for semiconductor according to claim 1, wherein: A gas inlet is further provided at the side wall of the housing (1), and a filter grille (14) is arranged inside the gas inlet.

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